TW200736827A - Light shielding resin composition for color filter, and color filter - Google Patents
Light shielding resin composition for color filter, and color filterInfo
- Publication number
- TW200736827A TW200736827A TW096107793A TW96107793A TW200736827A TW 200736827 A TW200736827 A TW 200736827A TW 096107793 A TW096107793 A TW 096107793A TW 96107793 A TW96107793 A TW 96107793A TW 200736827 A TW200736827 A TW 200736827A
- Authority
- TW
- Taiwan
- Prior art keywords
- solvent
- color filter
- light shielding
- shielding resin
- coating
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title abstract 2
- 239000002904 solvent Substances 0.000 abstract 6
- 239000003795 chemical substances by application Substances 0.000 abstract 3
- 239000011248 coating agent Substances 0.000 abstract 3
- 238000000576 coating method Methods 0.000 abstract 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Natural products CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 2
- 230000003213 activating effect Effects 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- JRXXEXVXTFEBIY-UHFFFAOYSA-N 3-ethoxypropanoic acid Chemical compound CCOCCC(O)=O JRXXEXVXTFEBIY-UHFFFAOYSA-N 0.000 abstract 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 1
- 150000001334 alicyclic compounds Chemical class 0.000 abstract 1
- 239000011247 coating layer Substances 0.000 abstract 1
- 238000010276 construction Methods 0.000 abstract 1
- UYAAVKFHBMJOJZ-UHFFFAOYSA-N diimidazo[1,3-b:1',3'-e]pyrazine-5,10-dione Chemical compound O=C1C2=CN=CN2C(=O)C2=CN=CN12 UYAAVKFHBMJOJZ-UHFFFAOYSA-N 0.000 abstract 1
- 238000001035 drying Methods 0.000 abstract 1
- 239000011737 fluorine Substances 0.000 abstract 1
- 229910052731 fluorine Inorganic materials 0.000 abstract 1
- 230000000977 initiatory effect Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000000049 pigment Substances 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 229920001296 polysiloxane Polymers 0.000 abstract 1
- 230000002265 prevention Effects 0.000 abstract 1
- 229940116423 propylene glycol diacetate Drugs 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
- Paints Or Removers (AREA)
Abstract
This invention provides a light shielding resin composition for color filter, which exhibits excellent characteristics in the flatness of coating layer in coating operation to comply with the requirements of material saving, prevention of drying of the discharge port of the coating device, and the coating substrate, and excellent solubility of solid components. The light shielding resin components for color filter of this invention contains: 80 ~ 90 wt% of a solvent, 8 ~ 35 wt% of an acrylic light sensitive resin, 45 ~ 65 wt% of a black pigment, a silicone surface activating agent or fluorine surface activating agent having an HLB value of 8 or lower, and a photo polymerization initiating agent, 30 ~ 50 wt% of a first solvent having a viscosity of 1.0~10.0 mPa.s, the first solvent having one acetic acid radical in the molecule, 0 ~ 25 wt% of propyleneglycol diacetate as a second solvent, 30 ~ 50 wt% of a third solvent having a construction of 3-ethoxy propionic acid in the molecule, and 10 ~ 30 wt% of a forth solvent containing an alicyclic compound having one carbonyl radical.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006093948A JP4828275B2 (en) | 2006-03-30 | 2006-03-30 | Light-shielding resin composition for color filter and color filter |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200736827A true TW200736827A (en) | 2007-10-01 |
TWI456343B TWI456343B (en) | 2014-10-11 |
Family
ID=38674583
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096107793A TWI456343B (en) | 2006-03-30 | 2007-03-07 | Light-shielding resin composition for color filter and color filter |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4828275B2 (en) |
KR (1) | KR101051403B1 (en) |
CN (1) | CN101045807B (en) |
TW (1) | TWI456343B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI506306B (en) * | 2007-11-22 | 2015-11-01 | Toyo Ink Mfg Co | Green colored composition for color filter, and color filter |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPWO2008123340A1 (en) * | 2007-03-30 | 2010-07-15 | 新日鐵化学株式会社 | Light-shielding resin composition for color filter and color filter |
CN101497759A (en) * | 2008-01-31 | 2009-08-05 | Jsr株式会社 | Resin composition for forming color filter by ink jetting, color filter and liquid crystal display device |
JP4593638B2 (en) * | 2008-02-18 | 2010-12-08 | ダイセル化学工業株式会社 | Method for producing ester solvent |
JP5156442B2 (en) * | 2008-03-13 | 2013-03-06 | 東京応化工業株式会社 | Colored photosensitive resin composition, black matrix, color filter, and liquid crystal display |
JP2009237362A (en) * | 2008-03-27 | 2009-10-15 | Fujifilm Corp | Polymerizable composition, color filter and method for manufacturing the same, and liquid crystal display |
CN101561524B (en) * | 2008-04-15 | 2011-11-30 | 鸿富锦精密工业(深圳)有限公司 | Colored filter and manufacturing method thereof |
JP5291405B2 (en) | 2008-07-31 | 2013-09-18 | 東京応化工業株式会社 | Colored photosensitive resin composition, color filter, and liquid crystal display |
JP5607346B2 (en) * | 2009-01-06 | 2014-10-15 | 住友化学株式会社 | Photosensitive resin composition, coating film, pattern and display device |
JP5416434B2 (en) * | 2009-03-03 | 2014-02-12 | 新日鉄住金化学株式会社 | Photosensitive resin composition for black resist and color filter light-shielding film |
JP2010275327A (en) * | 2010-09-15 | 2010-12-09 | Daicel Chem Ind Ltd | Ester solvent |
JP5485433B2 (en) * | 2013-02-08 | 2014-05-07 | 東京応化工業株式会社 | Colored photosensitive resin composition, color filter, and liquid crystal display |
KR101988257B1 (en) * | 2013-03-28 | 2019-06-12 | 동우 화인켐 주식회사 | Colored photosensitive resin composition |
KR102134633B1 (en) * | 2016-11-25 | 2020-07-16 | 삼성에스디아이 주식회사 | Photosensitive resin composition, black pixel defining layer using the same and display device |
KR102371945B1 (en) * | 2017-11-03 | 2022-03-08 | 동우 화인켐 주식회사 | Colored Photosensitive Resin Composition, Color Filter and Display Device |
KR102397084B1 (en) * | 2017-11-21 | 2022-05-11 | 동우 화인켐 주식회사 | Colored Photosensitive Resin Composition, Color Filter and Display Device |
JP7376978B2 (en) * | 2018-05-22 | 2023-11-09 | 日鉄ケミカル&マテリアル株式会社 | Photosensitive resin composition, method for producing cured product, and method for producing display device |
KR20210061011A (en) | 2019-11-19 | 2021-05-27 | 롬엔드하스전자재료코리아유한회사 | Photosensitive resin composition and insulating layer prepared therefrom |
TW202132362A (en) * | 2020-02-14 | 2021-09-01 | 日商富士軟片股份有限公司 | Photosensitive composition, method for forming pixel, method for producing optical filter, method for producing solid-state imaging element, and method for producing image display device |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3978255B2 (en) * | 1997-06-24 | 2007-09-19 | Azエレクトロニックマテリアルズ株式会社 | Lithographic cleaning agent |
JPH1124245A (en) * | 1997-07-07 | 1999-01-29 | Sumitomo Chem Co Ltd | Photosensitive liquid for forming a colored image and a method for producing a color filter using the same |
JP3915271B2 (en) * | 1998-09-24 | 2007-05-16 | Jsr株式会社 | Radiation sensitive composition for color filter |
JP2003330174A (en) * | 2002-05-14 | 2003-11-19 | Sumitomo Chem Co Ltd | Colored photosensitive resin composition |
TWI313397B (en) * | 2003-03-28 | 2009-08-11 | Sumitomo Chemical Co | Colored photosensitive resin composition |
JP4627617B2 (en) * | 2003-05-23 | 2011-02-09 | 東洋インキ製造株式会社 | Coloring composition, method for producing color filter, and method for producing black matrix substrate |
KR100579832B1 (en) * | 2003-06-02 | 2006-05-15 | 주식회사 삼양이엠에스 | Photo Resist Composition For Spinless Coating |
TWI342983B (en) * | 2003-07-16 | 2011-06-01 | Sumitomo Chemical Co | Coloring photosensitive resin composition |
JP2005300994A (en) * | 2004-04-13 | 2005-10-27 | Jsr Corp | Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display panel |
CN1715336B (en) * | 2004-06-28 | 2010-05-26 | 住友化学株式会社 | Colored photosensitive resin composition |
KR101171177B1 (en) * | 2004-09-15 | 2012-08-06 | 주식회사 동진쎄미켐 | Ink composition and color filter comprising the same |
-
2006
- 2006-03-30 JP JP2006093948A patent/JP4828275B2/en active Active
-
2007
- 2007-03-07 TW TW096107793A patent/TWI456343B/en active
- 2007-03-27 KR KR1020070029669A patent/KR101051403B1/en active Active
- 2007-03-30 CN CN2007100913541A patent/CN101045807B/en active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI506306B (en) * | 2007-11-22 | 2015-11-01 | Toyo Ink Mfg Co | Green colored composition for color filter, and color filter |
Also Published As
Publication number | Publication date |
---|---|
KR20070098575A (en) | 2007-10-05 |
CN101045807A (en) | 2007-10-03 |
TWI456343B (en) | 2014-10-11 |
JP4828275B2 (en) | 2011-11-30 |
KR101051403B1 (en) | 2011-07-22 |
JP2007271687A (en) | 2007-10-18 |
CN101045807B (en) | 2011-09-14 |
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