[go: up one dir, main page]

TW364115B - Semiconductor nonvolatile memory device and computer system using the same - Google Patents

Semiconductor nonvolatile memory device and computer system using the same

Info

Publication number
TW364115B
TW364115B TW085110619A TW85110619A TW364115B TW 364115 B TW364115 B TW 364115B TW 085110619 A TW085110619 A TW 085110619A TW 85110619 A TW85110619 A TW 85110619A TW 364115 B TW364115 B TW 364115B
Authority
TW
Taiwan
Prior art keywords
voltage
memory
memory cell
word line
source electrode
Prior art date
Application number
TW085110619A
Other languages
English (en)
Inventor
Toshihiro Tanaka
Masataka Kato
Osamu Tsuchiya
Toshiaki Nishimoto
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of TW364115B publication Critical patent/TW364115B/zh

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3404Convergence or correction of memory cell threshold voltages; Repair or recovery of overerased or overprogrammed cells
    • G11C16/3413Circuits or methods to recover overprogrammed nonvolatile memory cells detected during program verification, usually by means of a "soft" erasing step
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0416Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a single floating gate transistor and no select transistor, e.g. UV EPROM
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/26Sensing or reading circuits; Data output circuits
    • G11C16/28Sensing or reading circuits; Data output circuits using differential sensing or reference cells, e.g. dummy cells
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3404Convergence or correction of memory cell threshold voltages; Repair or recovery of overerased or overprogrammed cells
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3404Convergence or correction of memory cell threshold voltages; Repair or recovery of overerased or overprogrammed cells
    • G11C16/3409Circuits or methods to recover overerased nonvolatile memory cells detected during erase verification, usually by means of a "soft" programming step
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3436Arrangements for verifying correct programming or erasure
    • G11C16/3454Arrangements for verifying correct programming or for detecting overprogrammed cells
    • G11C16/3459Circuits or methods to verify correct programming of nonvolatile memory cells

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Read Only Memory (AREA)
  • Non-Volatile Memory (AREA)
  • Semiconductor Memories (AREA)
TW085110619A 1995-08-31 1996-08-30 Semiconductor nonvolatile memory device and computer system using the same TW364115B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP22301695 1995-08-31
JP22499195 1995-09-01
JP23102595 1995-09-08

Publications (1)

Publication Number Publication Date
TW364115B true TW364115B (en) 1999-07-11

Family

ID=27330729

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085110619A TW364115B (en) 1995-08-31 1996-08-30 Semiconductor nonvolatile memory device and computer system using the same

Country Status (6)

Country Link
US (3) US5978270A (zh)
JP (2) JP4038823B2 (zh)
KR (1) KR100460845B1 (zh)
AU (1) AU6837296A (zh)
TW (1) TW364115B (zh)
WO (1) WO1997008707A1 (zh)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000200842A (ja) * 1998-11-04 2000-07-18 Sony Corp 不揮発性半導体記憶装置、製造方法および書き込み方法
US6278633B1 (en) * 1999-11-05 2001-08-21 Multi Level Memory Technology High bandwidth flash memory that selects programming parameters according to measurements of previous programming operations
US6662263B1 (en) 2000-03-03 2003-12-09 Multi Level Memory Technology Sectorless flash memory architecture
JP3754600B2 (ja) * 2000-06-13 2006-03-15 シャープ株式会社 不揮発性半導体記憶装置およびそのテスト方法
US6501681B1 (en) * 2000-08-15 2002-12-31 Advanced Micro Devices, Inc. Using a low drain bias during erase verify to ensure complete removal of residual charge in the nitride in sonos non-volatile memories
JP2002299473A (ja) * 2001-03-29 2002-10-11 Fujitsu Ltd 半導体記憶装置及びその駆動方法
US6809965B2 (en) * 2001-09-19 2004-10-26 Virtual Silicon Technology, Inc. Control circuitry for a non-volatile memory
US6795357B1 (en) * 2002-10-30 2004-09-21 Advance Micro Devices, Inc. Method for reading a non-volatile memory cell
JP2004310904A (ja) * 2003-04-07 2004-11-04 Renesas Technology Corp 不揮発性半導体記憶装置
JP4315767B2 (ja) * 2003-09-04 2009-08-19 株式会社ルネサステクノロジ 不揮発性半導体記憶装置
US7652321B2 (en) * 2004-03-08 2010-01-26 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method of the same
US7450433B2 (en) * 2004-12-29 2008-11-11 Sandisk Corporation Word line compensation in non-volatile memory erase operations
US7457166B2 (en) * 2005-03-31 2008-11-25 Sandisk Corporation Erase voltage manipulation in non-volatile memory for controlled shifts in threshold voltage
US7522457B2 (en) * 2005-03-31 2009-04-21 Sandisk Corporation Systems for erase voltage manipulation in non-volatile memory for controlled shifts in threshold voltage
US7400537B2 (en) * 2005-03-31 2008-07-15 Sandisk Corporation Systems for erasing non-volatile memory using individual verification and additional erasing of subsets of memory cells
US7499317B2 (en) * 2006-10-13 2009-03-03 Sandisk Corporation System for partitioned erase and erase verification in a non-volatile memory to compensate for capacitive coupling
US7535766B2 (en) * 2006-10-13 2009-05-19 Sandisk Corporation Systems for partitioned soft programming in non-volatile memory
US7499338B2 (en) * 2006-10-13 2009-03-03 Sandisk Corporation Partitioned soft programming in non-volatile memory
US7495954B2 (en) * 2006-10-13 2009-02-24 Sandisk Corporation Method for partitioned erase and erase verification to compensate for capacitive coupling effects in non-volatile memory
US7414891B2 (en) 2007-01-04 2008-08-19 Atmel Corporation Erase verify method for NAND-type flash memories
US7778086B2 (en) * 2007-01-25 2010-08-17 Micron Technology, Inc. Erase operation control sequencing apparatus, systems, and methods
KR100824203B1 (ko) * 2007-04-03 2008-04-21 주식회사 하이닉스반도체 플래시 메모리 소자의 프로그램 방법
KR101420603B1 (ko) 2007-06-29 2014-07-17 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 제조 방법
US8094495B2 (en) * 2008-11-25 2012-01-10 Samsung Electronics Co., Ltd. Nonvolatile memory device
US7974114B2 (en) * 2009-04-28 2011-07-05 Infineon Technologies Ag Memory cell arrangements
KR101736457B1 (ko) * 2011-07-12 2017-05-17 삼성전자주식회사 불휘발성 메모리 장치, 불휘발성 메모리 장치의 소거 방법, 불휘발성 메모리 장치의 동작 방법, 불휘발성 메모리 장치를 포함하는 메모리 시스템, 메모리 시스템의 동작 방법, 불휘발성 메모리 장치를 포함하는 메모리 카드 및 솔리드 스테이트 드라이브
JP5219170B2 (ja) * 2011-09-21 2013-06-26 株式会社フローディア 不揮発性半導体記憶装置
KR102087444B1 (ko) * 2013-11-13 2020-03-11 매그나칩 반도체 유한회사 반도체 소자 및 그 제조방법
US9318208B1 (en) * 2014-12-17 2016-04-19 Yield Microelectronics Corp. Method for operating small-area EEPROM array
US10467432B2 (en) 2016-06-10 2019-11-05 OneTrust, LLC Data processing systems for use in automatically generating, populating, and submitting data subject access requests
CN114138170B (zh) * 2020-09-04 2024-02-27 兆易创新科技集团股份有限公司 非易失性存储器及其操作方法以及电子装置
CN118262754B (zh) * 2024-05-31 2024-07-26 宁波领开半导体技术有限公司 单边工作模式的组对结构非易失性存储器及其操作方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07109720B2 (ja) * 1988-07-29 1995-11-22 三菱電機株式会社 不揮発性半導体記憶装置
JP2809802B2 (ja) * 1990-03-30 1998-10-15 株式会社東芝 不揮発性半導体記憶装置
JPH04153999A (ja) * 1990-10-15 1992-05-27 Mitsubishi Electric Corp 不揮発性半導体記憶装置
JP2855948B2 (ja) * 1991-07-02 1999-02-10 日本電気株式会社 不揮発性半導体記憶装置
JPH0528783A (ja) * 1991-07-24 1993-02-05 Mitsubishi Electric Corp 不揮発性半導体メモリ
JP3348466B2 (ja) * 1992-06-09 2002-11-20 セイコーエプソン株式会社 不揮発性半導体装置
JPH0628875A (ja) * 1992-07-10 1994-02-04 Sony Corp フラッシュ型e2 promの消去方法
JPH06176587A (ja) * 1992-12-01 1994-06-24 Sharp Corp Eepromの消去書き込み方法
JP3197119B2 (ja) * 1993-06-30 2001-08-13 株式会社東芝 不揮発性半導体記憶装置
JPH07161194A (ja) * 1993-12-02 1995-06-23 Sony Corp 半導体不揮発性記憶装置
JP3402715B2 (ja) * 1993-12-17 2003-05-06 株式会社日立製作所 半導体集積回路装置
JPH07176196A (ja) * 1993-12-17 1995-07-14 Hitachi Ltd 一括消去型不揮発性記憶装置
JP3441140B2 (ja) * 1993-12-28 2003-08-25 株式会社東芝 半導体記憶装置
JPH08102198A (ja) * 1994-09-30 1996-04-16 Nec Corp 電気的書換え可能な不揮発性半導体記憶装置の初期化方 法
WO2004090908A1 (ja) * 1996-06-11 2004-10-21 Nobuyoshi Takeuchi ベリファイ機能を有する不揮発性記憶装置
JP3062730B2 (ja) * 1996-07-10 2000-07-12 株式会社日立製作所 不揮発性半導体記憶装置および書込み方法
JP4090570B2 (ja) * 1998-06-02 2008-05-28 株式会社ルネサステクノロジ 半導体装置、データ処理システム及び不揮発性メモリセルの閾値変更方法

Also Published As

Publication number Publication date
KR19990044225A (ko) 1999-06-25
JP4038823B2 (ja) 2008-01-30
US5978270A (en) 1999-11-02
KR100460845B1 (ko) 2005-05-24
JP2009105448A (ja) 2009-05-14
WO1997008707A1 (fr) 1997-03-06
US6130841A (en) 2000-10-10
US6442070B1 (en) 2002-08-27
AU6837296A (en) 1997-03-19

Similar Documents

Publication Publication Date Title
TW364115B (en) Semiconductor nonvolatile memory device and computer system using the same
DE102018129451A1 (de) Nichtflüchtige Speichereinrichtung mit vertikaler Struktur und ein Speichersystem, das diese umfasst
US8174892B2 (en) Increased NAND flash memory read throughput
KR101053002B1 (ko) 비휘발성 반도체 기억 장치 및 그 소거 검증 방법
TW329519B (en) The non-volatile semiconductor memory device
KR890011092A (ko) 불휘발성 반도체 기억장치
JPS5771587A (en) Semiconductor storing device
TW333695B (en) The non-volatile memory device with NAND cell structure includes plural memory cell serials, BLs & selective transistors at 1st & 2nd memory cell serials are separately serial with BL contact & 2 ends of memory cell.
KR970029859A (ko) 비휘발성 메모리 소자 및 구동방법
CN107810534A (zh) 操作具有抹除去偏压的存储器的设备及方法
US20140029345A1 (en) Memory devices and programming memory arrays thereof
CN101345085A (zh) 闪存设备以及擦除闪存设备的方法
US10553283B2 (en) Semiconductor storage device
EP0251429A3 (en) Non-volatile semiconductor memory
JP2003204001A (ja) 半導体装置及びその動作方法
JP2020198141A (ja) 半導体記憶装置
JP4060938B2 (ja) 不揮発性半導体記憶装置
CN111798887A (zh) 存储器装置及半导体封装以及用于管理其中的峰值电力的方法
DE102021110403B4 (de) Nichtflüchtige Speichervorrichtung und Betriebsverfahren eines nichtflüchtigen Speichers
US9947620B2 (en) Semiconductor memory device
JP2022020287A (ja) 半導体記憶装置
CN203205073U (zh) 非易失性半导体存储装置
CN103177758B (zh) 半导体存储装置
KR20090000319A (ko) 비휘발성 메모리 소자 및 그것의 동작 방법
US7551511B2 (en) NAND flash memory device and method of forming a well of a NAND flash memory device

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees