TW359769B - Multidensity photomask and production process therefor - Google Patents
Multidensity photomask and production process thereforInfo
- Publication number
- TW359769B TW359769B TW087105391A TW87105391A TW359769B TW 359769 B TW359769 B TW 359769B TW 087105391 A TW087105391 A TW 087105391A TW 87105391 A TW87105391 A TW 87105391A TW 359769 B TW359769 B TW 359769B
- Authority
- TW
- Taiwan
- Prior art keywords
- photomask
- photo
- multidensity
- filtering layer
- production process
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000001914 filtration Methods 0.000 abstract 4
- 229920002120 photoresistant polymer Polymers 0.000 abstract 2
- 238000002834 transmittance Methods 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW087105391A TW359769B (en) | 1998-04-09 | 1998-04-09 | Multidensity photomask and production process therefor |
JP24253998A JPH11295876A (ja) | 1998-04-09 | 1998-08-12 | 多階層フォトマスクおよびその製造法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW087105391A TW359769B (en) | 1998-04-09 | 1998-04-09 | Multidensity photomask and production process therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
TW359769B true TW359769B (en) | 1999-06-01 |
Family
ID=21629839
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW087105391A TW359769B (en) | 1998-04-09 | 1998-04-09 | Multidensity photomask and production process therefor |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPH11295876A (zh) |
TW (1) | TW359769B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI415123B (zh) * | 2008-11-21 | 2013-11-11 | Sony Disc & Digital Solutions | 顯影方法及顯影裝置 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000045222A1 (fr) * | 1999-01-27 | 2000-08-03 | Citizen Watch Co., Ltd. | Masque photolithographique et procede de fabrication de celui-ci |
JP5163602B2 (ja) * | 2009-07-06 | 2013-03-13 | 大日本印刷株式会社 | 高低パターン層形成体の製造方法 |
-
1998
- 1998-04-09 TW TW087105391A patent/TW359769B/zh not_active IP Right Cessation
- 1998-08-12 JP JP24253998A patent/JPH11295876A/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI415123B (zh) * | 2008-11-21 | 2013-11-11 | Sony Disc & Digital Solutions | 顯影方法及顯影裝置 |
Also Published As
Publication number | Publication date |
---|---|
JPH11295876A (ja) | 1999-10-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK4A | Expiration of patent term of an invention patent |