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TW202209071A - Electronic device - Google Patents

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TW202209071A
TW202209071A TW109141744A TW109141744A TW202209071A TW 202209071 A TW202209071 A TW 202209071A TW 109141744 A TW109141744 A TW 109141744A TW 109141744 A TW109141744 A TW 109141744A TW 202209071 A TW202209071 A TW 202209071A
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vertical
vertical signal
lines
signal lines
signal line
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TW109141744A
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Chinese (zh)
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TWI740736B (en
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李家圻
陳政德
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友達光電股份有限公司
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Publication of TW202209071A publication Critical patent/TW202209071A/en

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Abstract

An electronic device including a substrate, transversal signal lines, first vertical signal lines, second vertical signal lines, pixel structures, touch pads and shielding vertical lines is providing. The transversal signal lines, the first vertical signal lines, the second vertical signal lines, the pixel structures, the touch pads and the shielding vertical lines are disposed on the substrate. The first vertical signal lines and the second vertical signal lines are intersected with the transversal signal lines and each of the second vertical signal lines is connected to one of the transversal signal lines. Each of the pixel structures is connected to one of the transversal signal lines and one of the first vertical signal lines, and includes a pixel electrode. Each of the shielding vertical lines is connected to one of the touch pads. The shielding vertical lines, the first vertical signal lines and the second vertical signal lines are the same layer. The shielding vertical lines are located between at least two of the lines chosen from the group of the first vertical signal lines and the second vertical signal lines between two adjacent pixel electrodes.

Description

電子裝置electronic device

本發明是有關於一種電子裝置。The present invention relates to an electronic device.

隨著電子產品的普及化,各種電子裝置中的線路佈局月亦複雜。因此,許多相鄰的線路可能用於傳遞不同類型的訊號。然而,相鄰線路之間的耦合作用往往影響訊號傳遞的品質,而導致最終呈現的功能不符預期。因此,線路佈局的規劃,往往是電子產品中的設計重點之一。With the popularization of electronic products, circuit layouts in various electronic devices are also complicated. Therefore, many adjacent lines may be used to carry different types of signals. However, the coupling effect between adjacent lines often affects the quality of signal transmission, resulting in the final performance not meeting expectations. Therefore, the planning of circuit layout is often one of the design priorities in electronic products.

本發明提供一種電子裝置,其設計可有助於降低線路之間的耦合而提供改進的品質。The present invention provides an electronic device whose design can help reduce coupling between lines to provide improved quality.

本發明提供另一種電子裝置,其設計也可助於降低線路之間的耦合,且具有較大且均勻的開口率(aperture ratio),而提供改進的品質。The present invention provides another electronic device, the design of which can also help reduce the coupling between lines, and has a larger and uniform aperture ratio to provide improved quality.

本發明的電子裝置包括基板、多條橫向訊號線、多條第一縱向訊號線、多條第二縱向訊號線、多個畫素結構、多個觸控墊以及多條屏蔽縱線,其中所述多條橫向訊號線、所述多條第一縱向訊號線、所述多條第二縱向訊號線、所述多個畫素結構、所述多個觸控墊以及所述多條屏蔽縱線配置於所述基板上。所述多條第一縱向訊號線及所述多條第二縱向訊號線與所述多條橫向訊號線相交,且所述多條第二縱向訊號線各自連接所述多條橫向訊號線的其中一條。所述多個畫素結構各自連接所述多條橫向訊號線的其中一者,並與所述多條第一縱向訊號線的其中一者電性連接且包括畫素電極。所述屏蔽縱線的其中一者與所述多個觸控墊的其中一者電性連接,所述多條屏蔽縱線、所述多條第一縱向訊號與所述多條第二縱向訊號為相同膜層,所述多條屏蔽縱線各自位於兩相鄰畫素電極之間的選自所述多條第一縱向訊號線與所述多條第二縱向訊號線群組中的至少兩條之間。The electronic device of the present invention includes a substrate, a plurality of horizontal signal lines, a plurality of first vertical signal lines, a plurality of second vertical signal lines, a plurality of pixel structures, a plurality of touch pads, and a plurality of shielding vertical lines, wherein the the plurality of horizontal signal lines, the plurality of first vertical signal lines, the plurality of second vertical signal lines, the plurality of pixel structures, the plurality of touch pads, and the plurality of shielding vertical lines arranged on the substrate. The plurality of first vertical signal lines and the plurality of second vertical signal lines intersect with the plurality of horizontal signal lines, and the plurality of second vertical signal lines are respectively connected to one of the plurality of horizontal signal lines one. Each of the plurality of pixel structures is connected to one of the plurality of horizontal signal lines, is electrically connected to one of the plurality of first vertical signal lines, and includes a pixel electrode. One of the shielding vertical lines is electrically connected to one of the plurality of touch pads, the plurality of shielding vertical lines, the plurality of first vertical signals and the plurality of second vertical signals For the same film layer, the plurality of shielding vertical lines are respectively located between two adjacent pixel electrodes and are selected from at least two of the plurality of first vertical signal lines and the plurality of second vertical signal line groups. between the bars.

在本發明的一實施例中,上述的多條屏蔽縱線各自位於相鄰兩畫素電極之間的所述第一縱向訊號線與所述第二縱向訊號線之間。In an embodiment of the present invention, the above-mentioned plurality of shielding vertical lines are respectively located between the first vertical signal line and the second vertical signal line between two adjacent pixel electrodes.

在本發明的一實施例中,在上述的多個畫素結構的每相鄰兩行之間設置所述第一縱向訊號線的其中一者與所述多條第二縱向訊號線的其中一者,且所述屏蔽縱線位於所述第一縱向訊號線與所述第二縱向訊號線之間。In an embodiment of the present invention, one of the first vertical signal lines and one of the plurality of second vertical signal lines are disposed between each adjacent two rows of the above-mentioned plurality of pixel structures and the shielding longitudinal line is located between the first longitudinal signal line and the second longitudinal signal line.

在本發明的一實施例中,在上述的電子裝置的俯視圖中,所述觸控墊與所述第一縱向訊號線及所述第二縱向訊號線重疊,所述觸控墊與所述屏蔽縱線不重疊。In an embodiment of the present invention, in the plan view of the above-mentioned electronic device, the touch pad overlaps with the first vertical signal line and the second vertical signal line, and the touch pad and the shielding The vertical lines do not overlap.

在本發明的一實施例中,上述的各畫素結構可包括橫向排列的三個子畫素,所述三個子畫素與同一條所述橫向訊號線電性連接,所述三個子畫素分別與位於所述子畫素第一側的不同所述第一縱向訊號線電性連接,所述第二縱向訊號線位於最外側子畫素的所述第一縱向訊號線的第一側,且所述屏蔽縱線位於所述第二縱向訊號線與最外側子畫素的所述第一縱向訊號線之間。In an embodiment of the present invention, each of the above-mentioned pixel structures may include three sub-pixels arranged horizontally, the three sub-pixels are electrically connected to the same horizontal signal line, and the three sub-pixels are respectively electrically connected to the different first vertical signal lines located on the first side of the sub-pixel, the second vertical signal line is located on the first side of the first vertical signal line of the outermost sub-pixel, and The shielding vertical line is located between the second vertical signal line and the first vertical signal line of the outermost sub-pixel.

在本發明的一實施例中,上述的電子裝置還可包括於各所述畫素結構的另外兩個所述子畫素的第一側分別設置所述屏蔽縱線。In an embodiment of the present invention, the above-mentioned electronic device may further include disposing the shielding vertical lines on the first sides of the other two sub-pixels of each of the pixel structures, respectively.

在本發明的一實施例中,在上述的各畫素結構中,兩相鄰所述子畫素之間的所述屏蔽縱線的數量為兩條。In an embodiment of the present invention, in each of the above pixel structures, the number of the shielding vertical lines between two adjacent sub-pixels is two.

在本發明的一實施例中,上述的多條橫向訊號線的相鄰兩行電性連接,各所述畫素結構包括縱向排列的兩個子畫素,其中所述兩個子畫素分別與電性連接的相鄰兩行的所述橫向訊號線電性連接,所述兩個子畫素所分別連接的所述第一縱向訊號線分設於所述畫素結構的相對側,所述第二縱向訊號線位於兩相鄰所述畫素結構所電性連接的兩相鄰所述第一縱向訊號線之間,所述屏蔽縱線位於所述第二縱向訊號線與各所述第一縱向訊號線之間。In an embodiment of the present invention, two adjacent rows of the above-mentioned plurality of horizontal signal lines are electrically connected, and each of the pixel structures includes two sub-pixels arranged vertically, wherein the two sub-pixels are respectively The horizontal signal lines of the adjacent two rows are electrically connected, and the first vertical signal lines respectively connected to the two sub-pixels are arranged on opposite sides of the pixel structure. The second longitudinal signal line is located between two adjacent first longitudinal signal lines electrically connected to two adjacent pixel structures, and the shielding longitudinal line is located between the second longitudinal signal line and each of the between the first longitudinal signal lines.

在本發明的一實施例中,在上述的電子裝置的俯視圖中,所述觸控墊與所述第一縱向訊號線重疊,所述第二縱向訊號線與所述觸控墊不重疊。In an embodiment of the present invention, in the plan view of the electronic device, the touch pad overlaps with the first vertical signal line, and the second vertical signal line does not overlap with the touch pad.

在本發明的一實施例中,在上述的電子裝置的俯視圖中,所述觸控墊與所述第一縱向訊號線重疊,所述第二縱向訊號線與所述觸控墊重疊。In an embodiment of the present invention, in the plan view of the above-mentioned electronic device, the touch pad overlaps with the first vertical signal line, and the second vertical signal line overlaps with the touch pad.

在本發明的一實施例中,上述的電子裝置還可包括絕緣層以及貫穿所述絕緣層的導通結構,所述絕緣層的所在膜層位於所述第一縱向訊號線的膜層與所述觸控墊的膜層之間,所述屏蔽縱線經由所述導通結構連接所述多個觸控墊的其中一者。In an embodiment of the present invention, the above-mentioned electronic device may further include an insulating layer and a conduction structure penetrating the insulating layer, where the insulating layer is located between the film layer of the first vertical signal line and the insulating layer. Between the film layers of the touch pads, the shielding vertical line is connected to one of the plurality of touch pads through the conductive structure.

在本發明的一實施例中,上述的多條屏蔽縱線各自位於相鄰兩畫素電極之間的兩條所述第一縱向訊號線之間。In an embodiment of the present invention, the above-mentioned plurality of shielding vertical lines are respectively located between the two first vertical signal lines between two adjacent pixel electrodes.

在本發明的一實施例中,上述的各畫素結構被兩相鄰所述橫向訊號線以及分設於所述畫素結構兩相對側的兩條所述第一縱向訊號線圍繞,各所述畫素結構包括橫向排列的兩個子畫素,所述第二縱向訊號線位於各所述畫素結構中的所述兩個子畫素之間,所述屏蔽縱線配置於兩相鄰所述畫素結構所電性連接的兩相鄰所述第一縱向訊號線之間。In an embodiment of the present invention, each of the above-mentioned pixel structures is surrounded by two adjacent horizontal signal lines and two of the first vertical signal lines disposed on two opposite sides of the pixel structure. The pixel structure includes two sub-pixels arranged horizontally, the second vertical signal line is located between the two sub-pixels in each of the pixel structures, and the shielding vertical line is arranged on two adjacent ones. The pixel structure is electrically connected between two adjacent first vertical signal lines.

在本發明的一實施例中,在上述的各畫素結構中,還可包括於所述第二縱向訊號線與各所述子畫素之間設置所述屏蔽縱線。In an embodiment of the present invention, in each of the above-mentioned pixel structures, the shielding vertical line may be disposed between the second vertical signal line and each of the sub-pixels.

在本發明的一實施例中,在上述的各畫素結構的兩相鄰所述子畫素之間可包括兩條所述屏蔽縱線以及位於所述兩條屏蔽縱線中的所述第二縱向訊號線。In an embodiment of the present invention, between two adjacent sub-pixels of each pixel structure described above may include two of the shielding vertical lines and the first shielding vertical line located in the two shielding vertical lines. Two vertical signal lines.

在本發明的一實施例中,在上述的各畫素結構的兩相鄰所述子畫素之間可包括兩條所述第二縱向訊號線以及位於所述兩條第二縱向訊號線之間的所述屏蔽縱線。In an embodiment of the present invention, two of the second vertical signal lines and two of the second vertical signal lines may be included between two adjacent sub-pixels of each pixel structure described above and between the two second vertical signal lines between the shielded longitudinal wires.

在本發明的一實施例中,在上述的電子裝置的俯視圖中,所述第一縱向訊號線與所述觸控墊重疊,所述第二縱向訊號線與所述觸控墊重疊,且所述屏蔽縱線與所述觸控墊不重疊。In an embodiment of the present invention, in the plan view of the above-mentioned electronic device, the first vertical signal line overlaps with the touch pad, the second vertical signal line overlaps with the touch pad, and all the The shielding vertical line does not overlap with the touch pad.

本發明的電子裝置包括基板、多條橫向訊號線、多條第一縱向訊號線、多條第二縱向訊號線、多個畫素結構、多個觸控墊以及多條屏蔽縱線,其中所述多條橫向訊號線、所述多條第一縱向訊號線、所述多條第二縱向訊號線、所述多個畫素結構、所述多個觸控墊以及所述多條屏蔽縱線配置於所述基板上。所述多條第一縱向訊號線及所述多條第二縱向訊號線與所述多條橫向訊號線相交,且所述多條第二縱向訊號線各自連接所述多條橫向訊號線的其中一條。所述多個畫素結構各自連接所述多條橫向訊號線的其中一者,並與所述多條第一縱向訊號線的其中一者電性連接且包括畫素電極。所述屏蔽縱線的其中一者與所述多個觸控墊的其中一者電性連接,所述多條屏蔽縱線、所述多條第一縱向訊號與所述多條第二縱向訊號為相同膜層,所述多條屏蔽縱線各自位於兩相鄰畫素電極之間的選自所述多條第一縱向訊號線與所述多條第二縱向訊號線群組中的至少兩條之間。其中各畫素結構被兩相鄰所述橫向訊號線與兩條所述第一縱向訊號線圍繞且包括兩個橫向排列的子畫素,所述第二縱向訊號線的其中一者位於同一個所述畫素結構的所述兩個子畫素之間,所述屏蔽縱線位於所述第二縱向訊號線與所述兩個子畫素其中一者的畫素電極之間。The electronic device of the present invention includes a substrate, a plurality of horizontal signal lines, a plurality of first vertical signal lines, a plurality of second vertical signal lines, a plurality of pixel structures, a plurality of touch pads, and a plurality of shielding vertical lines, wherein the the plurality of horizontal signal lines, the plurality of first vertical signal lines, the plurality of second vertical signal lines, the plurality of pixel structures, the plurality of touch pads, and the plurality of shielding vertical lines arranged on the substrate. The plurality of first vertical signal lines and the plurality of second vertical signal lines intersect with the plurality of horizontal signal lines, and the plurality of second vertical signal lines are respectively connected to one of the plurality of horizontal signal lines one. Each of the plurality of pixel structures is connected to one of the plurality of horizontal signal lines, is electrically connected to one of the plurality of first vertical signal lines, and includes a pixel electrode. One of the shielding vertical lines is electrically connected to one of the plurality of touch pads, the plurality of shielding vertical lines, the plurality of first vertical signals and the plurality of second vertical signals For the same film layer, the plurality of shielding vertical lines are respectively located between two adjacent pixel electrodes and are selected from at least two of the plurality of first vertical signal lines and the plurality of second vertical signal line groups. between the bars. Each pixel structure is surrounded by two adjacent horizontal signal lines and two first vertical signal lines and includes two horizontally arranged sub-pixels, and one of the second vertical signal lines is located in the same Between the two sub-pixels of the pixel structure, the shielding vertical line is located between the second vertical signal line and a pixel electrode of one of the two sub-pixels.

基於上述,本發明一實施例的電子裝置中,藉由在相鄰的第一縱向訊號線和第二縱向訊號線之間設置屏蔽縱線,以降低線路之間的耦合所造成的不良影響,而提供改進的品質。Based on the above, in the electronic device according to an embodiment of the present invention, shielding vertical lines are arranged between the adjacent first vertical signal lines and the second vertical signal lines, so as to reduce the adverse effects caused by the coupling between the lines, instead provide improved quality.

基於上述,本發明另一實施例的電子裝置中,藉由將第一縱向訊號線和第二縱向訊號線以畫素電極隔開設置,因此降低線路之間的耦合所造成的不良影響,且具有較大且均勻的開口率,而提供改進的品質。Based on the above, in the electronic device according to another embodiment of the present invention, by separating the first vertical signal line and the second vertical signal line with pixel electrodes, the adverse effects caused by the coupling between the lines are reduced, and Provides improved quality with a larger and uniform aperture ratio.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more obvious and easy to understand, the following embodiments are given and described in detail with the accompanying drawings as follows.

在附圖中,為了清楚起見,放大了層、膜、面板、區域等的厚度。在整個說明書中,相同的附圖標記表示相同的元件。應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件「上」或「連接到」另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為「直接在另一元件上」或「直接連接到」另一元件時,不存在中間元件。如本文所使用的,「連接」可以指物理及/或電性連接。再者,「電性連接」或「耦合」係可為二元件間存在其它元件。In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. The same reference numerals refer to the same elements throughout the specification. It will be understood that when an element such as a layer, film, region or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element, or Intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to a physical and/or electrical connection. Furthermore, "electrically connected" or "coupled" may refer to the existence of other elements between the two elements.

應當理解,儘管術語「第一」、 「第二」等在本文中可以用於描述各種元件、部件、區域、層及/或部分,但是這些元件、部件、區域、及/或部分不應受這些術語的限制。這些術語僅用於將一個元件、部件、區域、層或部分與另一個元件、部件、區域、層或部分區分開。因此,下面討論的「第一元件」、 「部件」、 「區域」、 「層」或「部分」可以被稱為第二元件、部件、區域、層或部分而不脫離本文的教導。It will be understood that, although the terms "first", "second", etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, and/or sections should not be limited by limitations of these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Thus, "a first element," "component," "region," "layer" or "section" discussed below could be termed a second element, component, region, layer or section without departing from the teachings herein.

此外,諸如「下」或「底部」和「上」或「頂部」的相對術語可在本文中用於描述一個元件與另一元件的關係,如圖所示。應當理解,相對術語旨在包括除了圖中所示的方位之外的裝置的不同方位。例如,如果一個附圖中的裝置翻轉,則被描述為在其他元件的「下」側的元件將被定向在其他元件的「上」側。因此,示例性術語「下」可以包括「下」和「上」的取向,取決於附圖的特定取向。類似地,如果一個附圖中的裝置翻轉,則被描述為在其它元件「下方」或「下方」的元件將被定向為在其它元件「上方」。因此,示例性術語「下面」或「下面」可以包括上方和下方的取向。Furthermore, relative terms such as "lower" or "bottom" and "upper" or "top" may be used herein to describe one element's relationship to another element, as shown in the figures. It should be understood that relative terms are intended to encompass different orientations of the device in addition to the orientation shown in the figures. For example, if the device in one of the figures is turned over, elements described as being on the "lower" side of other elements would then be oriented on "upper" sides of the other elements. Thus, the exemplary term "lower" may include an orientation of "lower" and "upper", depending on the particular orientation of the figures. Similarly, if the device in one of the figures is turned over, elements described as "below" or "beneath" other elements would then be oriented "above" the other elements. Thus, the exemplary terms "below" or "below" can include an orientation of above and below.

除非另有定義,本文使用的所有術語(包括技術和科學術語)具有與本發明所屬領域的普通技術人員通常理解的相同的含義。將進一步理解的是,諸如在通常使用的字典中定義的那些術語應當被解釋為具有與它們在相關技術和本發明的上下文中的含義一致的含義,並且將不被解釋為理想化的或過度正式的意義,除非本文中明確地這樣定義。Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be construed as having meanings consistent with their meanings in the context of the related art and the present invention, and are not to be construed as idealized or excessive Formal meaning, unless expressly defined as such herein.

本文參考作為理想化實施例的示意圖的截面圖來描述示例性實施例。因此,可以預期到作為例如製造技術及/或公差的結果的圖示的形狀變化。因此,本文所述的實施例不應被解釋為限於如本文所示的區域的特定形狀,而是包括例如由製造導致的形狀偏差。例如,示出或描述為平坦的區域通常可以具有粗糙及/或非線性特徵。此外,所示的銳角可以是圓的。因此,圖中所示的區域本質上是示意性的,並且它們的形狀不是旨在示出區域的精確形狀,並且不是旨在限制權利要求的範圍。Exemplary embodiments are described herein with reference to cross-sectional illustrations that are schematic illustrations of idealized embodiments. Thus, variations in the shapes of the illustrations as a result of, for example, manufacturing techniques and/or tolerances, are to be expected. Accordingly, the embodiments described herein should not be construed as limited to the particular shapes of regions as shown herein, but rather include deviations in shapes resulting from, for example, manufacturing. For example, regions illustrated or described as flat may typically have rough and/or nonlinear features. Additionally, the acute angles shown may be rounded. Thus, the regions illustrated in the figures are schematic in nature and their shapes are not intended to illustrate the precise shape of a region and are not intended to limit the scope of the claims.

圖1為本發明一實施例的電子裝置的局部電路示意圖。在圖1中,電子裝置100A包括基板110、多條橫向訊號線120、多條縱向線130以及多個畫素結構150。多條橫向訊號線120朝x方向延伸,並沿著y方向排列於基板110上。多條縱向線130朝y方向延伸,沿著x方向排列於基板110上,並與多條橫向訊號線120相交,其中x方向可理解為橫向方向,而y方向可理解為縱向方向。因此以下實施例描述的橫向與縱向可分別視為圖1中的x方向與y方向。橫向訊號線120例如為閘極線。多條縱向線130包括多條第一縱向訊號線V1及多條第二縱向訊號線V2。如圖1所示,沿y方向延伸的縱向訊號線可劃分為直接連接畫素結構150的第一縱向訊號線V1以及沒有直接連接畫素結構150的第二縱向訊號線V2。第一縱向訊號線V1與第二縱向訊號線V2例如分別為資料線與閘極訊號轉接線。多個畫素結構150以陣列排列的方式配置於基板110上。換言之,所述畫素結構150沿著x方向以及y方向呈現陣列排列。每個畫素結構150至少包括一子畫素,且各自連接多條橫向訊號線120的其中一條及多條第一縱向訊號線V1的其中一條。每條第二縱向訊號線V2透過對應的導通結構VIA1連接多條橫向訊號線120的其中一條。畫素結構150、橫向訊號線120、第一縱向訊號線V1以及第二縱向訊號線V2的配置方式可以根據1D1G (1 Data 1 Gate Driving)、2DHG (2 Data Half Gate Driving)、HSD (Half Source Driving)或其他可能的驅動方式設計。FIG. 1 is a schematic diagram of a partial circuit of an electronic device according to an embodiment of the present invention. In FIG. 1 , the electronic device 100A includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical lines 130 , and a plurality of pixel structures 150 . The plurality of lateral signal lines 120 extend toward the x direction and are arranged on the substrate 110 along the y direction. The plurality of longitudinal lines 130 extend in the y direction, are arranged on the substrate 110 along the x direction, and intersect with the plurality of transverse signal lines 120 , where the x direction may be understood as the transverse direction, and the y direction may be understood as the longitudinal direction. Therefore, the horizontal and vertical directions described in the following embodiments can be regarded as the x-direction and the y-direction in FIG. 1 , respectively. The lateral signal line 120 is, for example, a gate line. The plurality of vertical lines 130 include a plurality of first vertical signal lines V1 and a plurality of second vertical signal lines V2. As shown in FIG. 1 , the vertical signal lines extending along the y direction can be divided into a first vertical signal line V1 directly connected to the pixel structure 150 and a second vertical signal line V2 not directly connected to the pixel structure 150 . The first vertical signal line V1 and the second vertical signal line V2 are, for example, data lines and gate signal transfer lines, respectively. A plurality of pixel structures 150 are arranged on the substrate 110 in an array manner. In other words, the pixel structure 150 presents an array arrangement along the x-direction and the y-direction. Each pixel structure 150 includes at least one sub-pixel, and is respectively connected to one of the plurality of horizontal signal lines 120 and one of the plurality of first vertical signal lines V1 . Each of the second vertical signal lines V2 is connected to one of the plurality of horizontal signal lines 120 through the corresponding conduction structure VIA1. The arrangement of the pixel structure 150, the horizontal signal line 120, the first vertical signal line V1 and the second vertical signal line V2 can be based on 1D1G (1 Data 1 Gate Driving), 2DHG (2 Data Half Gate Driving), HSD (Half Source Driving) Driving) or other possible driving design.

在圖1的實施例中,電子裝置100A是以1D1G的驅動方式設計。具體而言,電子裝置100A的每個畫素結構150各自包括一子畫素150a,其中所述子畫素150a包括一畫素電極152及一主動元件154。每個畫素結構150位於兩相鄰的不同橫向訊號線120之間。沿著x方向排列在同一行的不同畫素結構150電性連接至同一條橫向訊號線120。為清楚說明畫素結構與各訊號線之間的相對位置關係,將圖1的右側作為第一側,並以圖1的左側作為第二側。在本實施例中,每個畫素結構150的右側,即每個畫素電極152的右側,皆包含一與所述畫素電極152電性連接的第一縱向訊號線V1以及一位於所述第一縱向訊號線V1的第一側的第二縱向訊號線V2。也就是說,在本實施例中,相鄰兩畫素結構150之間設有一條第一縱向訊號線V1及一條第二縱向訊號線V2,且所述第二縱向訊號線V2位於所述第一縱向訊號線V1的第一側。In the embodiment of FIG. 1 , the electronic device 100A is designed in a 1D1G driving manner. Specifically, each pixel structure 150 of the electronic device 100A includes a sub-pixel 150 a, wherein the sub-pixel 150 a includes a pixel electrode 152 and an active element 154 . Each pixel structure 150 is located between two adjacent different lateral signal lines 120 . Different pixel structures 150 arranged in the same row along the x-direction are electrically connected to the same lateral signal line 120 . In order to clearly illustrate the relative positional relationship between the pixel structure and each signal line, the right side in FIG. 1 is taken as the first side, and the left side in FIG. 1 is taken as the second side. In this embodiment, the right side of each pixel structure 150 , that is, the right side of each pixel electrode 152 includes a first vertical signal line V1 electrically connected to the pixel electrode 152 and a first vertical signal line V1 located on the The second vertical signal line V2 on the first side of the first vertical signal line V1. That is to say, in this embodiment, a first vertical signal line V1 and a second vertical signal line V2 are disposed between two adjacent pixel structures 150, and the second vertical signal line V2 is located in the first vertical signal line V2. The first side of a vertical signal line V1.

在圖1的實施例中,所述縱向線130還包括多條屏蔽縱線V3。多條屏蔽縱線V3各自位於兩相鄰的第一縱向訊號線V1及第二縱向訊號線V2之間,換句話說,在所述多個畫素結構150的每相鄰兩行之間均設有所述第一縱向訊號線V1的其中一者與所述多條第二縱向訊號線V2的其中一者,且所述屏蔽縱線V3位於所述第一縱向訊號線V1與所述第二縱向訊號線V2之間。由於相鄰的第一縱向訊號線V1和第二縱向訊號線V2之間設有屏蔽縱線V3,因此可以避免第一縱向訊號線V1與第二縱向訊號線V2之間彼此耦合造成的不良影響。In the embodiment of FIG. 1 , the longitudinal wire 130 further includes a plurality of shielding longitudinal wires V3. The plurality of shielding vertical lines V3 are respectively located between the two adjacent first vertical signal lines V1 and the second vertical signal lines V2 , in other words, between every two adjacent rows of the plurality of pixel structures 150 . One of the first longitudinal signal lines V1 and one of the plurality of second longitudinal signal lines V2 are provided, and the shielding longitudinal line V3 is located between the first longitudinal signal line V1 and the first longitudinal signal line V1. between the two vertical signal lines V2. Since the shielding vertical line V3 is provided between the adjacent first vertical signal line V1 and the second vertical signal line V2, the adverse effect caused by the coupling between the first vertical signal line V1 and the second vertical signal line V2 can be avoided. .

圖2為圖1的電子裝置100A中沿剖線A-A’的剖面的一種實施方式的示意圖。FIG. 2 is a schematic diagram of one embodiment of the cross section of the electronic device 100A of FIG. 1 along the line A-A'.

請同時參照圖1及圖2。電子裝置100A還包括多個觸控墊140。多個觸控墊140以陣列排列的方式配置於基板110上,也就是說,觸控墊140以沿著x方向以及y方向呈現陣列排列。在電子裝置100A的俯視方向上,每個觸控墊140的涵蓋範圍可涵蓋多個畫素結構150,且每條屏蔽縱線V3透過對應的導通結構VIA2與多個觸控墊140的其中一個電性連接。例如,圖1的虛框處所示,穿越虛框處的屏蔽縱線V3透過所示導通結構VIA2而與觸控墊140電性連接。Please refer to Figure 1 and Figure 2 at the same time. The electronic device 100A further includes a plurality of touch pads 140 . The plurality of touch pads 140 are arranged on the substrate 110 in an array arrangement, that is, the touch pads 140 are arranged in an array along the x-direction and the y-direction. In the top view direction of the electronic device 100A, the coverage area of each touch pad 140 can cover a plurality of pixel structures 150 , and each shielding vertical line V3 passes through the corresponding conduction structure VIA2 and one of the plurality of touch pads 140 Electrical connection. For example, as shown at the dotted frame in FIG. 1 , the shielding vertical line V3 passing through the dotted frame is electrically connected to the touch pad 140 through the shown conductive structure VIA2 .

以圖2更詳細說明圖1各構件在電子裝置中的膜層關係。請參照圖1與圖2,橫向訊號線120、絕緣層I0、縱向線130、絕緣層I1、觸控墊140、絕緣層I2與畫素電極152依序堆疊於基板110上。具體而言,橫向訊號線120例如與主動元件154的閘極為相同膜層。第一縱向訊號線V1、第二縱向訊號線V2及屏蔽縱線V3位在相同膜層,其所在膜層例如與主動元件154的源極與汲極的膜層相同。絕緣層I0具有一貫孔,導通結構VIA1埋設於絕緣層I0的貫孔中,以使橫向訊號線120與第一縱向訊號線V1電性相連,絕緣層I0例如為閘極介電層。此外,如圖2所示,觸控墊140覆蓋於第一縱向訊號線V1及第二縱向訊號線V2上,並且觸控墊140在基板110上的投影範圍涵蓋第一縱向訊號線V1在基板110上的投影範圍以及第二縱向訊號線V2在基板110上的投影範圍,但觸控墊140在基板110上的投影與屏蔽縱線V3在基板110上的投影不重疊。The film-layer relationship of each component in the electronic device in FIG. 1 will be described in more detail with reference to FIG. 2 . Referring to FIGS. 1 and 2 , the horizontal signal lines 120 , the insulating layer I0 , the vertical lines 130 , the insulating layer I1 , the touch pads 140 , the insulating layer I2 and the pixel electrodes 152 are sequentially stacked on the substrate 110 . Specifically, the lateral signal line 120 and the gate electrode of the active element 154 have the same film layer, for example. The first vertical signal line V1 , the second vertical signal line V2 and the shielding vertical line V3 are located in the same film layer, for example, the same film layer as the source electrode and the drain electrode of the active element 154 . The insulating layer I0 has a through hole, and the conductive structure VIA1 is embedded in the through hole of the insulating layer I0 to electrically connect the lateral signal line 120 and the first vertical signal line V1. The insulating layer I0 is, for example, a gate dielectric layer. In addition, as shown in FIG. 2 , the touch pad 140 covers the first vertical signal line V1 and the second vertical signal line V2, and the projection range of the touch pad 140 on the substrate 110 covers the first vertical signal line V1 on the substrate 110 and the projection range of the second vertical signal line V2 on the substrate 110 , but the projection of the touch pad 140 on the substrate 110 and the projection of the shielding vertical line V3 on the substrate 110 do not overlap.

圖3為本發明另一實施例的電子裝置的局部電路示意圖,在圖3中省略繪示多個接觸墊140,僅繪示一個接觸墊140作為代表。圖3的電子裝置100B大致相似於圖1的電子裝置100A,因此兩實施例中所記載的相同構件可參照前述內容,而兩實施例中相同的配置,在此不再贅述。FIG. 3 is a schematic partial circuit diagram of an electronic device according to another embodiment of the present invention. In FIG. 3 , a plurality of contact pads 140 are omitted, and only one contact pad 140 is shown as a representative. The electronic device 100B of FIG. 3 is substantially similar to the electronic device 100A of FIG. 1 , so the same components described in the two embodiments may refer to the foregoing contents, and the same configurations in the two embodiments will not be repeated here.

請參照圖3,本實施例之電子裝置100B不同於圖1的實施例之處在於,電子裝置100B的畫素結構150A包括橫向排列的三個子畫素150a、150b、150c,且在本實施例之畫素結構150A的三個子畫素中,僅設置一條第二縱向訊號線V2於這三個子畫素中的一者。Referring to FIG. 3 , the electronic device 100B of this embodiment is different from the embodiment of FIG. 1 in that the pixel structure 150A of the electronic device 100B includes three sub-pixels 150 a , 150 b and 150 c arranged horizontally, and in this embodiment Among the three sub-pixels of the pixel structure 150A, only one second vertical signal line V2 is set in one of the three sub-pixels.

具體而言,在本實施例之單一畫素結構150A中,所述三個子畫素150a、150b、150c與同一條橫向訊號線120電性連接,且所述三個子畫素150a、150b、150c的第一側(如右側)各自設有一條第一縱向訊號線V1,以分別將各自的訊號經由各第一縱向訊號線V1傳遞至對應的子畫素150a、150b、150c中。本實施例之第二縱向訊號線V2位於與子畫素150c電性連接的第一縱向訊號線V1的第一側,屏蔽縱線V3位於所述第二縱向訊號線V2及與子畫素150c電性連接的第一縱向訊號線V1之間。換句話說,在本實施例之單一畫素結構150A中,每個子畫素150a、150b、150c的第一側皆設有與其電性相連的第一縱向訊號線V1,但第二縱向訊號線V2及屏蔽縱線V3僅位於子畫素150c的第一縱向訊號線V1的第一側,且屏蔽縱線V3位於所述第二縱向訊號線V2及子畫素150c的第一縱向訊號線V1之間。基於上述的配置,屏蔽縱線V3可有助於降低第一縱向訊號線V1與第二縱向訊號線V2之間彼此的訊號耦合,降低第一縱向訊號線V1與第二縱向訊號線V2之間訊號傳遞的干擾,並增加開口率,而提供改進的品質。Specifically, in the single-pixel structure 150A of this embodiment, the three sub-pixels 150a, 150b, 150c are electrically connected to the same horizontal signal line 120, and the three sub-pixels 150a, 150b, 150c A first vertical signal line V1 is respectively provided on the first side (eg, the right side) of the , so as to transmit respective signals to the corresponding sub-pixels 150a, 150b, 150c through each of the first vertical signal lines V1. The second vertical signal line V2 in this embodiment is located on the first side of the first vertical signal line V1 electrically connected to the sub-pixel 150c, and the shielding vertical line V3 is located on the second vertical signal line V2 and the sub-pixel 150c. Between the first vertical signal lines V1 that are electrically connected. In other words, in the single-pixel structure 150A of this embodiment, the first vertical signal line V1 electrically connected to the first side of each sub-pixel 150a, 150b, 150c is provided, but the second vertical signal line V2 and the shielding vertical line V3 are only located on the first side of the first vertical signal line V1 of the sub-pixel 150c, and the shielding vertical line V3 is located on the second vertical signal line V2 and the first vertical signal line V1 of the sub-pixel 150c between. Based on the above configuration, the shielded vertical line V3 can help reduce the signal coupling between the first vertical signal line V1 and the second vertical signal line V2, and reduce the distance between the first vertical signal line V1 and the second vertical signal line V2 Signal transmission interference and increase aperture ratio, while providing improved quality.

圖4為本發明另一實施例的電子裝置的局部電路示意圖。在圖4中省略繪示多個接觸墊140,僅繪示一個接觸墊140作為代表,並且,在本實施例中,省略了部分接觸墊140在基板投影方向上不覆蓋屏蔽縱線V3的斷開線的相關標示,以使圖式更為清楚。圖4的電子裝置100C大致相似於圖2的電子裝置100B,因此兩實施例中所記載的相同構件可參照前述內容,而兩實施例中相同的配置,在此不再贅述。FIG. 4 is a schematic diagram of a partial circuit of an electronic device according to another embodiment of the present invention. In FIG. 4 , a plurality of contact pads 140 are omitted, and only one contact pad 140 is shown as a representative, and in this embodiment, some of the contact pads 140 in the substrate projection direction that do not cover the shielding vertical line V3 are omitted. Relevant marking of open lines to make the diagram more clear. The electronic device 100C of FIG. 4 is substantially similar to the electronic device 100B of FIG. 2 , so the same components described in the two embodiments may refer to the foregoing contents, and the same configurations in the two embodiments will not be repeated here.

請參照圖4,本實施例之電子裝置100C不同於圖3的實施例之處在於,電子裝置100C更於畫素結構150A中的另外兩個子畫素中150a、150b的右側分別設置屏蔽縱線V3。亦即,在本實施例之在單一畫素結構150A中,相鄰兩子畫素之間(也就是子畫素150a、150b之間和子畫素150b、150c之間)包括一條第一縱向訊號線V1及一條屏蔽縱線V3。Referring to FIG. 4 , the electronic device 100C of this embodiment is different from the embodiment of FIG. 3 in that the electronic device 100C further sets shielding vertical lines on the right sides of the other two sub-pixels 150a and 150b in the pixel structure 150A, respectively. Line V3. That is, in the single pixel structure 150A of this embodiment, a first vertical signal is included between two adjacent sub-pixels (that is, between the sub-pixels 150a and 150b and between the sub-pixels 150b and 150c). Line V1 and a shielded vertical line V3.

具體而言,在單一畫素結構150A中,在子畫素150a、150b第一側的第一縱向訊號線V1的第一側還各自設有一條屏蔽縱線V3。也就是說,在單一畫素結構150A中,每個子畫素150a、150b、150c的第一側皆設有一條第一縱向訊號線V1及一條屏蔽縱線V3,而第二縱向訊號線V2僅位於子畫素150c第一側的屏蔽縱線V3的第一側。基於上述的配置,可避免第一縱向訊號線V1與第二縱向訊號線V2之間彼此耦合造成的不良影響,並可支援較多觸控墊140,而提供改進的品質。Specifically, in the single-pixel structure 150A, a shielding vertical line V3 is respectively provided on the first side of the first vertical signal line V1 on the first side of the sub-pixels 150a and 150b. That is to say, in the single pixel structure 150A, each sub-pixel 150a, 150b, 150c is provided with a first vertical signal line V1 and a shielding vertical line V3 on the first side, and the second vertical signal line V2 is only The first side of the shield vertical line V3 on the first side of the sub-pixel 150c. Based on the above configuration, adverse effects caused by coupling between the first vertical signal line V1 and the second vertical signal line V2 can be avoided, more touch pads 140 can be supported, and improved quality can be provided.

圖5為本發明另一實施例的電子裝置的局部電路示意圖。在圖5中省略繪示多個接觸墊140,僅繪示一個接觸墊140作為代表,並且,在本實施例中,省略了部分接觸墊140在基板投影方向上不覆蓋屏蔽縱線V3的斷開線的相關標示,以使圖式更為清楚。圖5的電子裝置100D大致相似於圖4的電子裝置100C,因此兩實施例中所記載的相同構件可參照前述內容,而兩實施例中相同的配置,在此不再贅述。FIG. 5 is a schematic diagram of a partial circuit of an electronic device according to another embodiment of the present invention. In FIG. 5 , a plurality of contact pads 140 are omitted, and only one contact pad 140 is shown as a representative, and in this embodiment, some of the contact pads 140 in the projection direction of the substrate do not cover the cutoff of the shielding vertical line V3 is omitted. Relevant marking of open lines to make the diagram more clear. The electronic device 100D of FIG. 5 is substantially similar to the electronic device 100C of FIG. 4 , so the same components described in the two embodiments can refer to the above-mentioned contents, and the same configurations in the two embodiments are not repeated here.

請參照圖5,本實施例之電子裝置100D不同於圖4的實施例之處在於,在單一畫素結構150A中,相鄰兩子畫素之間(也就是子畫素150a、150b之間和子畫素150b、150c之間)包括一條第一縱向訊號線V1及兩條屏蔽縱線V3。Referring to FIG. 5 , the electronic device 100D of this embodiment is different from the embodiment of FIG. 4 in that, in the single pixel structure 150A, between two adjacent sub-pixels (that is, between the sub-pixels 150a and 150b ) and the sub-pixels 150b, 150c) includes a first vertical signal line V1 and two shielding vertical lines V3.

具體而言,在單一畫素結構150A中,在子畫素150a、150b所電性連接的第一縱向訊號線V1的右側各自設有兩條屏蔽縱線V3。換句話說,在單一畫素結構150A中,子畫素150a、150b的第一側皆設有一條第一縱向訊號線V1及兩條屏蔽縱線V3,而子畫素150c的第一側依序設有第一縱向訊號線V1、屏蔽縱線V3及第二縱向訊號線V2。如此一來,可避免第一縱向訊號線V1與第二縱向訊號線V2之間彼此耦合造成的不良影響,並可使開口率一致,並降低屏蔽縱線V3的電阻值。Specifically, in the single-pixel structure 150A, two shielding vertical lines V3 are respectively provided on the right side of the first vertical signal line V1 to which the sub-pixels 150a and 150b are electrically connected. In other words, in the single-pixel structure 150A, the first sides of the sub-pixels 150a and 150b are both provided with a first vertical signal line V1 and two shielding vertical lines V3, and the first side of the sub-pixel 150c is provided with a first vertical signal line V1 and two shielding vertical lines V3 according to A first vertical signal line V1, a shielding vertical line V3 and a second vertical signal line V2 are arranged in sequence. In this way, the adverse effect caused by the coupling between the first vertical signal line V1 and the second vertical signal line V2 can be avoided, the aperture ratio can be made uniform, and the resistance value of the shielding vertical line V3 can be reduced.

圖6為本發明另一實施例的電子裝置的局部電路示意圖,在圖6中省略繪示多個接觸墊140,僅繪示一個接觸墊140作為代表,並且,在本實施例中,省略了接觸墊140在基板投影方向上不覆蓋屏蔽縱線V3的斷開線的相關標示,以使圖式更為清楚。有關本實施例的接觸墊140與屏蔽縱線V3在基板投影方向上的相對位置關係可參看後述圖7或圖8的剖面圖加以理解。圖6的電子裝置100E大致相似於圖1的電子裝置100A,因此兩實施例中所記載的相同構件可參照前述內容,而兩實施例中相同的配置,在此不再贅述。FIG. 6 is a schematic partial circuit diagram of an electronic device according to another embodiment of the present invention. In FIG. 6 , a plurality of contact pads 140 are omitted, and only one contact pad 140 is shown as a representative. In the projection direction of the substrate, the contact pads 140 do not cover the relevant marks of the disconnected lines of the shielding vertical line V3, so as to make the drawing clearer. The relative positional relationship between the contact pad 140 and the shielding vertical line V3 in the projection direction of the substrate in this embodiment can be understood by referring to the cross-sectional view of FIG. 7 or FIG. 8 described later. The electronic device 100E of FIG. 6 is substantially similar to the electronic device 100A of FIG. 1 , so the same components described in the two embodiments may refer to the foregoing contents, and the same configurations in the two embodiments will not be repeated here.

在圖6的實施例中,電子裝置100E包括基板110、多條橫向訊號線120、多條縱向線130、多個觸控墊140以及多個畫素結構150B。多條橫向訊號線120朝x方向延伸,並沿著y方向排列於基板110上,且多條橫向訊號線120的相鄰兩行彼此電性連接。多條縱向線130朝y方向延伸,沿著x方向排列於基板110上,並與多條橫向訊號線120相交。多條縱向線130包括多條第一縱向訊號線V1、多條第二縱向訊號線V2及多條屏蔽縱線V3。In the embodiment of FIG. 6 , the electronic device 100E includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical lines 130 , a plurality of touch pads 140 , and a plurality of pixel structures 150B. The plurality of lateral signal lines 120 extend toward the x direction and are arranged on the substrate 110 along the y direction, and two adjacent rows of the plurality of lateral signal lines 120 are electrically connected to each other. The plurality of longitudinal lines 130 extend toward the y direction, are arranged on the substrate 110 along the x direction, and intersect with the plurality of lateral signal lines 120 . The plurality of vertical lines 130 include a plurality of first vertical signal lines V1, a plurality of second vertical signal lines V2 and a plurality of shielding vertical lines V3.

在圖6的實施例中,電子裝置100E是以2DHG的驅動方式設計的。多個畫素結構150B以陣列排列的方式配置於基板110上,每個畫素結構150B位於電性連接的相鄰兩行的橫向訊號線120之間,其中所述每個畫素結構150B包括縱向排列的兩個子畫素150a、150b,所述兩個子畫素150a、150b分別與電性連接的相鄰兩行的所述橫向訊號線120電性連接,換句話說,所述兩個子畫素150a、150b實質上與同一條橫向訊號線120電性連接。In the embodiment of FIG. 6 , the electronic device 100E is designed in a 2DHG driving manner. A plurality of pixel structures 150B are arranged on the substrate 110 in an array, and each pixel structure 150B is located between two adjacent rows of lateral signal lines 120 that are electrically connected, wherein each pixel structure 150B includes The two sub-pixels 150a, 150b arranged vertically, the two sub-pixels 150a, 150b are respectively electrically connected to the horizontal signal lines 120 in two adjacent rows that are electrically connected, in other words, the two The sub-pixels 150a and 150b are substantially electrically connected to the same horizontal signal line 120 .

如圖6所示,在單一畫素結構150B中,第一縱向訊號線V1位於畫素結構150B的相對兩側,並分別與所述畫素結構150B的所述兩個子畫素150a、150b電性連接。第二縱向訊號線V2位於兩相鄰畫素結構150B所電性連接的兩相鄰第一縱向訊號線V1之間,且所述第二縱向訊號線V2透過對應的導通結構VIA1與多條電性連接的相鄰兩行的橫向訊號線120的其中一條連接。As shown in FIG. 6 , in the single pixel structure 150B, the first vertical signal lines V1 are located on opposite sides of the pixel structure 150B, and are respectively connected with the two sub-pixels 150a and 150b of the pixel structure 150B. Electrical connection. The second vertical signal line V2 is located between two adjacent first vertical signal lines V1 electrically connected to the two adjacent pixel structures 150B, and the second vertical signal line V2 is connected to a plurality of electrical circuits through the corresponding conductive structure VIA1 One of the horizontal signal lines 120 in the adjacent two rows that are sexually connected is connected.

屏蔽縱線V3位於兩相鄰畫素結構150B之間的各第一縱向訊號線V1和第二縱向訊號線V2之間。也就是說,相鄰兩畫素結構150B之間設置有兩條第一縱向訊號線V1、兩條屏蔽縱線V3及一條第二縱向訊號線V2,其中所述兩條第一縱向訊號線V1分別在相鄰兩畫素結構150B之間的兩側並分別與所述兩畫素結構150B電性連接,所述第二縱向訊號線V2位於所述兩條第一縱向訊號線V1之間,且所述兩條屏蔽縱線V3分別位於各所述第一縱向訊號線V1和第二縱向訊號線V2之間。由於相鄰的第一縱向訊號線V1和第二縱向訊號線V2之間設有屏蔽縱線V3,因此可以避免第一縱向訊號線V1與第二縱向訊號線V2之間彼此耦合造成的不良影響。The shielding vertical lines V3 are located between each of the first vertical signal lines V1 and the second vertical signal lines V2 between two adjacent pixel structures 150B. That is to say, two first vertical signal lines V1, two shielding vertical lines V3 and one second vertical signal line V2 are disposed between two adjacent pixel structures 150B, wherein the two first vertical signal lines V1 The second vertical signal line V2 is located between the two first vertical signal lines V1 on the two sides between the adjacent two pixel structures 150B and is electrically connected to the two pixel structures 150B, respectively. And the two shielding vertical lines V3 are respectively located between each of the first vertical signal lines V1 and the second vertical signal lines V2. Since the shielding vertical line V3 is provided between the adjacent first vertical signal line V1 and the second vertical signal line V2, the adverse effect caused by the coupling between the first vertical signal line V1 and the second vertical signal line V2 can be avoided. .

圖7為圖6的電子裝置100E中沿剖線A-A’的剖面的一種實施方式的示意圖。FIG. 7 is a schematic diagram of one embodiment of the cross section of the electronic device 100E of FIG. 6 along the line A-A'.

請同時參照圖6及圖7,電子裝置100E1還包括多個觸控墊140。多個觸控墊140以陣列排列的方式配置於基板110上,每個觸控墊140的涵蓋範圍可涵蓋多個畫素結構150B,且每條屏蔽縱線V3透過對應的導通結構VIA2與多個觸控墊140的其中一個電性連接(詳細於後文圖9、10進行說明)。Please refer to FIG. 6 and FIG. 7 at the same time, the electronic device 100E1 further includes a plurality of touch pads 140 . A plurality of touch pads 140 are arranged on the substrate 110 in an array. The coverage of each touch pad 140 can cover a plurality of pixel structures 150B. One of the touch pads 140 is electrically connected (details will be described later in FIGS. 9 and 10 ).

在圖7中,橫向訊號線120、絕緣層I0、縱向線130、絕緣層I1、觸控墊140、絕緣層I2與畫素電極152依序堆疊於基板110上。其中縱向線130包括第一縱向訊號線V1、第二縱向訊號線V2及屏蔽縱線V3位在相同膜層。絕緣層I0具有一貫孔,導通結構VIA1埋設於絕緣層I0的貫孔中,以使橫向訊號線120與第一縱向訊號線V1電性相連。此外,如圖7所示,觸控墊140覆蓋於第一縱向訊號線V1上,並且觸控墊140在基板110上的投影範圍涵蓋第一縱向訊號線V1在基板110上的投影範圍,但觸控墊140在基板110上的投影與屏蔽縱線V3在基板110上的投影及第二縱向訊號線V2在基板110上的投影不重疊。In FIG. 7 , the horizontal signal line 120 , the insulating layer I0 , the vertical line 130 , the insulating layer I1 , the touch pad 140 , the insulating layer I2 and the pixel electrode 152 are sequentially stacked on the substrate 110 . The longitudinal line 130 includes a first longitudinal signal line V1, a second longitudinal signal line V2 and a shielding longitudinal line V3 located in the same film layer. The insulating layer I0 has a through hole, and the conductive structure VIA1 is embedded in the through hole of the insulating layer I0, so that the lateral signal line 120 is electrically connected to the first vertical signal line V1. In addition, as shown in FIG. 7 , the touch pad 140 covers the first vertical signal line V1, and the projection range of the touch pad 140 on the substrate 110 covers the projection range of the first vertical signal line V1 on the substrate 110, but The projection of the touch pad 140 on the substrate 110 does not overlap with the projection of the shielding vertical line V3 on the substrate 110 and the projection of the second vertical signal line V2 on the substrate 110 .

圖8為圖6的電子裝置100E中沿剖線A-A’的剖面的另一種實施方式的示意圖。圖8的剖面示意圖大致相似於圖7的剖面示意圖,其差別在於在圖8中,觸控墊140不僅覆蓋第一縱向訊號線V1,亦覆蓋第二縱向訊號線V2,並且觸控墊140在基板110上的投影範圍涵蓋第一縱向訊號線V1在基板110上的投影範圍及第二縱向訊號線V2在基板110上的投影範圍,但觸控墊140在基板110上的投影範圍與屏蔽縱線V3在基板110上的投影範圍不重疊,如此一來,可減少線路耦合造成的不良影響。FIG. 8 is a schematic diagram of another embodiment of the cross section along the line A-A' in the electronic device 100E of FIG. 6 . The cross-sectional schematic diagram of FIG. 8 is substantially similar to the cross-sectional schematic diagram of FIG. 7 , except that in FIG. 8 , the touch pad 140 not only covers the first vertical signal line V1 but also covers the second vertical signal line V2 , and the touch pad 140 is in the The projection range on the substrate 110 covers the projection range of the first longitudinal signal line V1 on the substrate 110 and the projection range of the second longitudinal signal line V2 on the substrate 110 , but the projection range of the touch pad 140 on the substrate 110 and the shielding longitudinal The projection ranges of the line V3 on the substrate 110 do not overlap, so that the adverse effects caused by line coupling can be reduced.

圖9為本發明圖1的R區域中主動元件及沿剖線B-B’的剖面的一種實施方式的示意圖,在本實施例中,主動元件例如是底閘極型的非晶矽薄膜電晶體。FIG. 9 is a schematic diagram of an embodiment of the active element in the R region of FIG. 1 and a cross section along the section line BB' according to the present invention. In this embodiment, the active element is, for example, a bottom gate type amorphous silicon thin film battery. crystal.

請同時參照圖1及圖9,閘極1542及橫向訊號線120位於基板110上,絕緣層I0覆蓋於基板110上,並覆蓋閘極1542及橫向訊號線120。半導體層1541位於絕緣層I0上,並與閘極1542重疊,其中半導體層1541的材料例如為非晶矽(a-Si)。源極1543、汲極1544分別位於絕緣層I0上的半導體層1541的兩側,並且源極1543與汲極1544部分覆蓋半導體層1541,也就是說,半導體層1541並未完全被源極1543、汲極1544覆蓋。屏蔽縱線V3及第二縱向訊號線V2的所在膜層與源極1543與汲極1544的膜層相同,均位於絕緣層I0上源極1543、汲極1544。位於第二縱向訊號線V2及橫向訊號線120之間的絕緣層I0具有貫孔,導通結構VIA1埋設於絕緣層I0的貫孔中,以使第二縱向訊號線V2與橫向訊號線120電性連接。絕緣層I1覆蓋源極1543、汲極1544、絕緣層I0、半導體層1541、屏蔽縱線V3及第二縱向訊號線V2。觸控墊140位於絕緣層I1上,其中絕緣層I1具有一貫孔位於屏蔽縱線V3之上,導通結構VIA2埋設於絕緣層I1的貫孔中,以使設置於絕緣層I1上的觸控墊140與屏蔽縱線V3電性連接。絕緣層I2位於絕緣層I1上並覆蓋觸控墊140,畫素電極152位於絕緣層I2上,以與觸控墊140絕緣。在汲極1544上方具有貫穿絕緣層I1、I2的導通結構VIA3,以使畫素電極152與主動元件154電性連接。1 and FIG. 9 , the gate electrode 1542 and the lateral signal line 120 are located on the substrate 110 , and the insulating layer I0 covers the substrate 110 and covers the gate electrode 1542 and the lateral signal line 120 . The semiconductor layer 1541 is located on the insulating layer I0 and overlaps with the gate electrode 1542 , wherein the material of the semiconductor layer 1541 is, for example, amorphous silicon (a-Si). The source electrode 1543 and the drain electrode 1544 are respectively located on both sides of the semiconductor layer 1541 on the insulating layer I0, and the source electrode 1543 and the drain electrode 1544 partially cover the semiconductor layer 1541, that is to say, the semiconductor layer 1541 is not completely covered by the source electrode 1543, Drain 1544 overlay. The film layers of the shielding vertical line V3 and the second vertical signal line V2 are the same as the film layers of the source electrode 1543 and the drain electrode 1544, which are both located on the source electrode 1543 and the drain electrode 1544 on the insulating layer I0. The insulating layer I0 between the second vertical signal line V2 and the horizontal signal line 120 has a through hole, and the conduction structure VIA1 is embedded in the through hole of the insulating layer I0, so that the second vertical signal line V2 and the horizontal signal line 120 are electrically connected connect. The insulating layer I1 covers the source electrode 1543, the drain electrode 1544, the insulating layer I0, the semiconductor layer 1541, the shielding vertical line V3 and the second vertical signal line V2. The touch pad 140 is located on the insulating layer I1, wherein the insulating layer I1 has a through hole on the shielding vertical line V3, and the conductive structure VIA2 is embedded in the through hole of the insulating layer I1, so that the touch pad disposed on the insulating layer I1 140 is electrically connected to the shielding vertical wire V3. The insulating layer I2 is located on the insulating layer I1 and covers the touch pad 140 , and the pixel electrodes 152 are located on the insulating layer I2 to be insulated from the touch pad 140 . Above the drain electrode 1544 , there is a conduction structure VIA3 penetrating the insulating layers I1 and I2 to electrically connect the pixel electrode 152 and the active element 154 .

圖10為本發明圖1的R區域中主動元件及沿剖線B-B’的剖面的另一種實施方式的示意圖,在本實施例中,主動元件例如是頂閘極型的多晶矽薄膜電晶體。FIG. 10 is a schematic diagram of another embodiment of the active element in the R region of FIG. 1 and the cross section along the section line BB' of the present invention. In this embodiment, the active element is, for example, a top-gate type polysilicon thin film transistor. .

請同時參照圖1及圖10,在基板110上具有一層遮光金屬層(Shielding Metal),緩衝層114位於遮光金屬層SM 112上並覆蓋遮光金屬層SM 112。半導體層1541位於緩衝層114上,其中半導體層1541的材料例如為低溫多晶矽(Low Temperature Poly-Silicon, LTPS)。閘極介電層116位於緩衝層114上,並覆蓋半導體層1541。閘極1542位於閘極介電層116上,並與半導體層1541重疊。橫向訊號線120位於閘極介電層116上,且橫向訊號線120與閘極1542為同一膜層且彼此相連。絕緣層I0位於閘極介電層116上,並覆蓋橫向訊號線120與閘極1542。源極1543、汲極1544、屏蔽縱線V3及第二縱向訊號線V2位於絕緣層I0上,其中絕緣層I0具有一貫孔,導通結構VIA1埋設於絕緣層I0的貫孔中,以使第二縱向訊號線V2與橫向訊號線120電性連接。在源極1543與半導體層1541之間、以及汲極1544與半導體層1541之間還分別具有貫穿絕緣層I0及閘極介電層116的導通結構VIA4、VIA5,以使半導體層1541與源極1543、汲極1544電性連接。絕緣層I1位於絕緣層I0上,並覆蓋源極1543與汲極1544、屏蔽縱線V3及第二縱向訊號線V2。觸控墊140位於絕緣層I1上,其中絕緣層I1具有一貫孔,導通結構VIA2埋設於絕緣層I1的貫孔中,以使屏蔽縱線V3與觸控墊140電性連接。絕緣層I2位於絕緣層I1上並覆蓋觸控墊140,畫素電極152位於絕緣層I2上,以與觸控墊140絕緣。在畫素電極152與汲極1544之間具有貫穿絕緣層I1、I2的導通結構VIA3,以使畫素電極152與主動元件154電性連接。1 and FIG. 10 , the substrate 110 has a shielding metal layer (Shielding Metal), and the buffer layer 114 is located on the shielding metal layer SM 112 and covers the shielding metal layer SM 112 . The semiconductor layer 1541 is located on the buffer layer 114 , wherein the material of the semiconductor layer 1541 is, for example, Low Temperature Poly-Silicon (LTPS). The gate dielectric layer 116 is located on the buffer layer 114 and covers the semiconductor layer 1541 . The gate 1542 is located on the gate dielectric layer 116 and overlaps the semiconductor layer 1541 . The lateral signal line 120 is located on the gate dielectric layer 116 , and the lateral signal line 120 and the gate electrode 1542 are in the same film layer and are connected to each other. The insulating layer I0 is located on the gate dielectric layer 116 and covers the lateral signal line 120 and the gate electrode 1542 . The source electrode 1543, the drain electrode 1544, the shielding vertical line V3 and the second vertical signal line V2 are located on the insulating layer I0, wherein the insulating layer I0 has a through hole, and the conduction structure VIA1 is embedded in the through hole of the insulating layer I0, so that the second The vertical signal line V2 is electrically connected to the horizontal signal line 120 . Between the source electrode 1543 and the semiconductor layer 1541, and between the drain electrode 1544 and the semiconductor layer 1541, there are also conductive structures VIA4 and VIA5 penetrating the insulating layer I0 and the gate dielectric layer 116, respectively, so that the semiconductor layer 1541 and the source electrode are connected 1543 and the drain electrode 1544 are electrically connected. The insulating layer I1 is located on the insulating layer I0, and covers the source electrode 1543 and the drain electrode 1544, the shielding vertical line V3 and the second vertical signal line V2. The touch pad 140 is located on the insulating layer I1 , wherein the insulating layer I1 has a through hole, and the conductive structure VIA2 is embedded in the through hole of the insulating layer I1 , so that the shielding vertical line V3 is electrically connected to the touch pad 140 . The insulating layer I2 is located on the insulating layer I1 and covers the touch pad 140 , and the pixel electrodes 152 are located on the insulating layer I2 to be insulated from the touch pad 140 . Between the pixel electrode 152 and the drain electrode 1544 , there is a conduction structure VIA3 penetrating the insulating layers I1 and I2 , so that the pixel electrode 152 and the active element 154 are electrically connected.

圖11為本發明另一實施例的電子裝置的局部電路示意圖,在圖11中省略繪示多個接觸墊140,僅繪示一個接觸墊140作為代表。圖11的電子裝置100F大致相似於圖1的電子裝置100A,因此兩實施例中所記載的相同構件可參照前述內容,而兩實施例中相同的配置,在此不再贅述。FIG. 11 is a schematic partial circuit diagram of an electronic device according to another embodiment of the present invention. In FIG. 11 , a plurality of contact pads 140 are omitted, and only one contact pad 140 is shown as a representative. The electronic device 100F of FIG. 11 is substantially similar to the electronic device 100A of FIG. 1 , so the same components described in the two embodiments may refer to the foregoing contents, and the same configurations in the two embodiments will not be repeated here.

在圖11的實施例中,電子裝置100F包括基板110、多條橫向訊號線120、多條縱向線130、多個觸控墊140以及多個畫素結構150C。多條橫向訊號線120朝x方向延伸,並沿著y方向排列於基板110上。多條縱向線130朝y方向延伸,沿著x方向排列於基板110上,並與多條橫向訊號線120相交。其中多條縱向線130包括多條第一縱向訊號線V1、多條第二縱向訊號線V2及多條屏蔽縱線V3。In the embodiment of FIG. 11 , the electronic device 100F includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical lines 130 , a plurality of touch pads 140 , and a plurality of pixel structures 150C. The plurality of lateral signal lines 120 extend toward the x direction and are arranged on the substrate 110 along the y direction. The plurality of longitudinal lines 130 extend toward the y direction, are arranged on the substrate 110 along the x direction, and intersect with the plurality of lateral signal lines 120 . The plurality of longitudinal lines 130 include a plurality of first longitudinal signal lines V1, a plurality of second longitudinal signal lines V2 and a plurality of shielding longitudinal lines V3.

在圖11的實施例中,多個畫素結構150C以陣列排列的方式配置於基板110上,每個畫素結構150C位於兩相鄰的不同橫向訊號線120之間,其中每個畫素結構150C包括橫向排列的兩個子畫素150a、150b,所述兩個子畫素150a、150b與同一條橫向訊號線120電性連接。在單一畫素結構150C中,兩個子畫素150a、150b所電性連接的兩條第一縱向訊號線V1分別位於所述畫素結構150C的相對兩側。第二縱向訊號線V2位於所述兩個子畫素150a、150b之間,且所述第二縱向訊號線V2透過對應的導通結構VIA1與多條橫向訊號線120的其中一條連接。屏蔽縱線V3位於兩相鄰畫素結構150C所電性連接的兩相鄰第一縱向訊號線V1之間。換句話說,如圖11所示,相鄰兩畫素結構150C之間設置有兩條第一縱向訊號線V1及設置於兩條第一縱向訊號線之間的一條屏蔽縱線V3,其中位於屏蔽縱線V3第二側(左側)的第一縱向訊號線V1與左側的畫素結構150C電性連接,而位於屏蔽縱線V3第一側(右側)的第一縱向訊號線V1與右側的畫素結構150C電性連接。此外,如圖11所示,在單一畫素結構150C中,相鄰的兩子畫素150a、150b之間設有一條第二縱向訊號線V2。由於第一縱向訊號線V1和第二縱向訊號線V2之間有子畫素150a或150b將兩者隔開,因此可以避免第一縱向訊號線V1與第二縱向訊號線V2之間彼此耦合造成的不良影響。In the embodiment of FIG. 11 , a plurality of pixel structures 150C are disposed on the substrate 110 in an array arrangement, and each pixel structure 150C is located between two adjacent different lateral signal lines 120 , wherein each pixel structure 150C includes two sub-pixels 150a and 150b arranged in a horizontal direction, and the two sub-pixels 150a and 150b are electrically connected to the same horizontal signal line 120 . In the single pixel structure 150C, the two first vertical signal lines V1 electrically connected to the two sub-pixels 150a and 150b are located on opposite sides of the pixel structure 150C, respectively. The second vertical signal line V2 is located between the two sub-pixels 150a and 150b, and the second vertical signal line V2 is connected to one of the plurality of horizontal signal lines 120 through the corresponding conduction structure VIA1. The shielding vertical line V3 is located between the two adjacent first vertical signal lines V1 electrically connected to the two adjacent pixel structures 150C. In other words, as shown in FIG. 11 , two first vertical signal lines V1 are disposed between two adjacent pixel structures 150C and one shielding vertical line V3 is disposed between the two first vertical signal lines. The first vertical signal line V1 on the second side (left side) of the shielded vertical line V3 is electrically connected to the pixel structure 150C on the left side, and the first vertical signal line V1 on the first side (right side) of the shielded vertical line V3 is electrically connected with the right side of the pixel structure 150C. The pixel structure 150C is electrically connected. In addition, as shown in FIG. 11 , in the single pixel structure 150C, a second vertical signal line V2 is provided between two adjacent sub-pixels 150a and 150b. Since the first vertical signal line V1 and the second vertical signal line V2 are separated by a sub-pixel 150a or 150b, the coupling between the first vertical signal line V1 and the second vertical signal line V2 can be avoided. adverse effects.

圖12為圖11的電子裝置100F中沿剖線A-A’的剖面的一種實施方式的示意圖。FIG. 12 is a schematic diagram of one embodiment of a cross-section along the line A-A' in the electronic device 100F of FIG. 11 .

請同時參照圖11及圖12,電子裝置100F還包括多個觸控墊140。多個觸控墊140以陣列排列的方式配置於基板110上,每個觸控墊140的涵蓋範圍可涵蓋多個畫素結構150C,且每條屏蔽縱線V3透過對應的導通結構VIA2與多個觸控墊140的其中一個電性連接。此外,如圖12所示,觸控墊140覆蓋於第一縱向訊號線V1及第二縱向訊號線V2上,並且觸控墊140在基板110上的投影範圍涵蓋第一縱向訊號線V1在基板110上的投影範圍及第二縱向訊號線V2在基板110上的投影範圍,但觸控墊140在基板110上的投影範圍與屏蔽縱線V3在基板110上的投影範圍不重疊。如此一來,可減少線路耦合造成的不良影響。Please refer to FIG. 11 and FIG. 12 at the same time, the electronic device 100F further includes a plurality of touch pads 140 . A plurality of touch pads 140 are arranged on the substrate 110 in an array. The coverage of each touch pad 140 can cover a plurality of pixel structures 150C, and each shielding vertical line V3 passes through the corresponding conduction structure VIA2 and the plurality of pixel structures 150C. One of the touch pads 140 is electrically connected. In addition, as shown in FIG. 12, the touch pad 140 covers the first vertical signal line V1 and the second vertical signal line V2, and the projection range of the touch pad 140 on the substrate 110 covers the first vertical signal line V1 on the substrate 110 and the projection range of the second vertical signal line V2 on the substrate 110 , but the projection range of the touch pad 140 on the substrate 110 and the projection range of the shielding vertical line V3 on the substrate 110 do not overlap. In this way, adverse effects caused by line coupling can be reduced.

圖13為本發明另一實施例的電子裝置的局部電路示意圖。在圖13中省略繪示多個接觸墊140,僅繪示一個接觸墊140作為代表,並且,在本實施例中,省略了接觸墊140在基板投影方向上不覆蓋屏蔽縱線V3的斷開線的相關標示,以使圖式更為清楚。有關接觸墊140與屏蔽縱線V3在基板投影方向上的相對位置關係可參看說明書的其他剖面圖加以理解。圖14為圖13的電子裝置100G中沿剖線A-A’的剖面的一種實施方式的示意圖。圖13的電子裝置100G大致相似於圖11的電子裝置100F,因此兩實施例中所記載的相同構件可參照前述內容,而兩實施例中相同的配置,在此不再贅述。FIG. 13 is a schematic diagram of a partial circuit of an electronic device according to another embodiment of the present invention. In FIG. 13 , a plurality of contact pads 140 are omitted, only one contact pad 140 is shown as a representative, and in this embodiment, the disconnection of the contact pad 140 not covering the shielding vertical line V3 in the substrate projection direction is omitted Lines are marked for clarity. The relative positional relationship between the contact pad 140 and the shielding longitudinal line V3 in the projection direction of the substrate can be understood by referring to other cross-sectional views in the specification. FIG. 14 is a schematic diagram of one embodiment of the cross section of the electronic device 100G of FIG. 13 along the line A-A'. The electronic device 100G of FIG. 13 is substantially similar to the electronic device 100F of FIG. 11 , so the same components described in the two embodiments may refer to the foregoing content, and the same configurations in the two embodiments will not be repeated here.

請同時參照圖13、14,本實施例之電子裝置100G不同於圖11的實施例之處在於,在單一畫素結構150C中,相鄰兩子畫素150a、150b之間除了一條第二縱向訊號線V2外,還可包括於所述第二縱向訊號線V2與各所述子畫素150a、150b之間設置屏蔽縱線V3,也就是說,在單一畫素結構150C中,相鄰兩子畫素150a、150b之間設有一條第二縱向訊號線V2及兩條屏蔽縱線V3,且所述第二縱向訊號線V2位於所述兩條屏蔽縱線V3之間。如此一來,可支援較多觸控墊140,且可降低屏蔽縱線V3的電阻值。13 and 14 at the same time, the electronic device 100G of this embodiment is different from the embodiment of FIG. 11 in that, in the single pixel structure 150C, there is only one second longitudinal direction between two adjacent sub-pixels 150a and 150b. In addition to the signal line V2, a vertical shielding line V3 may be provided between the second vertical signal line V2 and each of the sub-pixels 150a and 150b. That is to say, in the single-pixel structure 150C, adjacent two A second vertical signal line V2 and two shielding vertical lines V3 are disposed between the sub-pixels 150a and 150b, and the second vertical signal line V2 is located between the two shielding vertical lines V3. In this way, more touch pads 140 can be supported, and the resistance value of the shielding vertical line V3 can be reduced.

圖15為本發明另一實施例的電子裝置的局部電路示意圖。在圖15中省略繪示多個接觸墊140,僅繪示一個接觸墊140作為代表,並且,在本實施例中,省略了接觸墊140在基板投影方向上不覆蓋屏蔽縱線V3的斷開線的相關標示,以使圖式更為清楚。有關接觸墊140與屏蔽縱線V3在基板投影方向上的相對位置關係可參看說明書的其他剖面圖加以理解。圖16為圖15的電子裝置100H中沿剖線A-A’的剖面的一種實施方式的示意圖。圖15的電子裝置100H大致相似於圖11的電子裝置100F,因此兩實施例中所記載的相同構件可參照前述內容,而兩實施例中相同的配置,在此不再贅述。FIG. 15 is a schematic diagram of a partial circuit of an electronic device according to another embodiment of the present invention. In FIG. 15 , a plurality of contact pads 140 are omitted, only one contact pad 140 is shown as a representative, and in this embodiment, the disconnection of the contact pad 140 not covering the shielding vertical line V3 in the substrate projection direction is omitted Lines are marked for clarity. The relative positional relationship between the contact pad 140 and the shielding longitudinal line V3 in the projection direction of the substrate can be understood by referring to other cross-sectional views in the specification. FIG. 16 is a schematic diagram of one embodiment of the cross section of the electronic device 100H of FIG. 15 along the line A-A'. The electronic device 100H of FIG. 15 is substantially similar to the electronic device 100F of FIG. 11 , so the same components described in the two embodiments may refer to the foregoing contents, and the same configurations in the two embodiments will not be repeated here.

請同時參照圖15、16,本實施例之電子裝置100H不同於圖11的實施例之處在於,在單一畫素結構150C中,相鄰兩子畫素150a、150b之間可包括兩條第二縱向訊號線V2及一條屏蔽縱線V3,其中所述屏蔽縱線V3位於兩所述第二縱向訊號線V2之間。如此一來,可支援較多橫向訊號線120,而使解析度增加。15 and 16 at the same time, the electronic device 100H of this embodiment is different from the embodiment of FIG. 11 in that in the single pixel structure 150C, two adjacent sub-pixels 150a and 150b may include two first pixels. Two longitudinal signal lines V2 and one shielding longitudinal line V3, wherein the shielding longitudinal line V3 is located between the two second longitudinal signal lines V2. In this way, more horizontal signal lines 120 can be supported, thereby increasing the resolution.

圖17為本發明另一實施例的電子裝置的局部電路示意圖,在圖17中省略繪示多個接觸墊140,僅繪示一個接觸墊140作為代表,並且,在本實施例中,省略了接觸墊140在基板投影方向上不覆蓋屏蔽縱線V3的斷開線的相關標示,以使圖式更為清楚。有關接觸墊140與屏蔽縱線V3在基板投影方向上的相對位置關係可參看說明書的其他剖面圖加以理解。FIG. 17 is a schematic partial circuit diagram of an electronic device according to another embodiment of the present invention. In FIG. 17 , a plurality of contact pads 140 are omitted, and only one contact pad 140 is shown as a representative, and in this embodiment, omitted In the projection direction of the substrate, the contact pads 140 do not cover the relevant marks of the disconnected lines of the shielding vertical line V3, so as to make the drawing clearer. The relative positional relationship between the contact pad 140 and the shielding longitudinal line V3 in the projection direction of the substrate can be understood by referring to other cross-sectional views in the specification.

在圖17的實施例中,電子裝置100I包括基板110、多條橫向訊號線120、多條縱向線130、多個觸控墊140以及多個畫素結構150C。多條橫向訊號線120朝x方向延伸,並沿著y方向排列於基板110上。多條縱向線130朝y方向延伸,沿著x方向排列於基板110上,並與多條橫向訊號線120相交。其中多條縱向線130包括多條第一縱向訊號線V1、多條第二縱向訊號線V2及多條屏蔽縱線V3。In the embodiment of FIG. 17 , the electronic device 100I includes a substrate 110 , a plurality of horizontal signal lines 120 , a plurality of vertical lines 130 , a plurality of touch pads 140 , and a plurality of pixel structures 150C. The plurality of lateral signal lines 120 extend toward the x direction and are arranged on the substrate 110 along the y direction. The plurality of longitudinal lines 130 extend toward the y direction, are arranged on the substrate 110 along the x direction, and intersect with the plurality of lateral signal lines 120 . The plurality of longitudinal lines 130 include a plurality of first longitudinal signal lines V1, a plurality of second longitudinal signal lines V2 and a plurality of shielding longitudinal lines V3.

在圖17的實施例中,多個畫素結構150C以陣列排列的方式配置於基板110上,每個畫素結構150C位於兩相鄰的不同橫向訊號線120之間,其中每個畫素結構150C包括橫向排列的兩個子畫素150a、150b,所述兩個子畫素150a、150b與同一條橫向訊號線120電性連接。在單一畫素結構150C中,第一縱向訊號線V1位於所述畫素結構150C的相對兩側,並分別與所述畫素結構150C的兩個子畫素150a、150b電性連接。第二縱向訊號線V2位於所述兩個子畫素150a、150b之間,且所述第二縱向訊號線V2透過對應的導通結構VIA1與多條橫向訊號線120的其中一條連接。屏蔽縱線V3位於所述第二縱向訊號線V2的第一側。也就是說,各畫素結構150C被兩相鄰橫向訊號線120與兩條第一縱向訊號線V1圍繞,在單一畫素結構150C中,所述兩個子畫素150a、150b之間包括一條第二縱向訊號線V2及一條屏蔽縱線V3,其中所述屏蔽縱線V3位於所述第二縱向訊號線V2的第一側。基於上述配置,可以避免第一縱向訊號線V1與第二縱向訊號線V2之間彼此耦合造成的不良影響,且具有較大且均勻的開口率。In the embodiment of FIG. 17 , a plurality of pixel structures 150C are disposed on the substrate 110 in an array arrangement, and each pixel structure 150C is located between two adjacent different lateral signal lines 120 , wherein each pixel structure 150C includes two sub-pixels 150a and 150b arranged in a horizontal direction, and the two sub-pixels 150a and 150b are electrically connected to the same horizontal signal line 120 . In the single pixel structure 150C, the first vertical signal lines V1 are located on opposite sides of the pixel structure 150C, and are respectively electrically connected to the two sub-pixels 150a and 150b of the pixel structure 150C. The second vertical signal line V2 is located between the two sub-pixels 150a and 150b, and the second vertical signal line V2 is connected to one of the plurality of horizontal signal lines 120 through the corresponding conduction structure VIA1. The shielding vertical line V3 is located on the first side of the second vertical signal line V2. That is to say, each pixel structure 150C is surrounded by two adjacent horizontal signal lines 120 and two first vertical signal lines V1, and in the single pixel structure 150C, a single pixel structure 150C includes one between the two sub-pixels 150a, 150b The second longitudinal signal line V2 and a shielding longitudinal line V3, wherein the shielding longitudinal line V3 is located on the first side of the second longitudinal signal line V2. Based on the above configuration, the adverse effect caused by the coupling between the first vertical signal line V1 and the second vertical signal line V2 can be avoided, and the aperture ratio is large and uniform.

圖18為圖17的電子裝置100I中沿剖線A-A’的剖面的一種實施方式的示意圖。FIG. 18 is a schematic diagram of an embodiment of the cross section of the electronic device 100I of FIG. 17 along the line A-A'.

請同時參照圖17及圖18,電子裝置100I還包括多個觸控墊140。多個觸控墊140以陣列排列的方式配置於基板110上,每個觸控墊140的涵蓋範圍可涵蓋多個畫素結構150C,且每條屏蔽縱線V3透過對應的導通結構VIA2與多個觸控墊140的其中一個電性連接。此外,如圖18所示,觸控墊140覆蓋於第一縱向訊號線V1及第二縱向訊號線V2上,並且觸控墊140在基板110上的投影範圍涵蓋第一縱向訊號線V1在基板110上的投影範圍及第二縱向訊號線V2在基板110上的投影範圍,但觸控墊140在基板110上的投影範圍與屏蔽縱線V3在基板110上的投影範圍不重疊。如此一來,可減少線路耦合造成的不良影響。Please refer to FIG. 17 and FIG. 18 at the same time, the electronic device 100I further includes a plurality of touch pads 140 . A plurality of touch pads 140 are arranged on the substrate 110 in an array. The coverage of each touch pad 140 can cover a plurality of pixel structures 150C, and each shielding vertical line V3 passes through the corresponding conduction structure VIA2 and the plurality of pixel structures 150C. One of the touch pads 140 is electrically connected. In addition, as shown in FIG. 18 , the touch pad 140 covers the first vertical signal line V1 and the second vertical signal line V2, and the projection range of the touch pad 140 on the substrate 110 covers the first vertical signal line V1 on the substrate 110 and the projection range of the second vertical signal line V2 on the substrate 110 , but the projection range of the touch pad 140 on the substrate 110 and the projection range of the shielding vertical line V3 on the substrate 110 do not overlap. In this way, adverse effects caused by line coupling can be reduced.

綜上所述,本發明藉由在相鄰的第一縱向訊號線和第二縱向訊號線之間設置屏蔽縱線,以降低線路之間的耦合所造成的不良影響,而提供改進的品質。本發明亦可藉由將第一縱向訊號線和第二縱向訊號線以畫素電極隔開設置,以降低線路之間的耦合所造成的不良影響,且具有較大且均勻的開口率,而提供改進的品質。To sum up, the present invention provides improved quality by arranging shielded longitudinal lines between the adjacent first longitudinal signal lines and the second longitudinal signal lines to reduce the adverse effects caused by the coupling between the lines. In the present invention, the first vertical signal line and the second vertical signal line can also be separated by pixel electrodes, so as to reduce the adverse effect caused by the coupling between the lines, and have a large and uniform aperture ratio, and Provides improved quality.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed above by the embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, The protection scope of the present invention shall be determined by the scope of the appended patent application.

100A~100I:電子裝置 110:基板 112:遮光金屬層114:緩衝層 116:閘極介電層 120:橫向訊號線 130:縱向線 140:觸控墊 150、150A~150C:畫素結構 150a、150b、150c:子畫素 152:畫素電極 154:主動元件 1541:半導體層 1542:閘極 1543:源極 1544:汲極 A-A’、B-B’:剖線 I0~I2:絕緣層 R:區域 VIA1~VIA5:導通結構 V1:第一縱向訊號線 V2:第二縱向訊號線 V3:屏蔽縱線100A~100I: Electronic device 110: Substrate 112: shading metal layer 114: buffer layer 116: gate dielectric layer 120: Horizontal signal line 130: Longitudinal line 140: Touch pad 150, 150A~150C: pixel structure 150a, 150b, 150c: Subpixels 152: Pixel electrode 154: Active Components 1541: Semiconductor layer 1542: Gate 1543: Source 1544: Drain A-A', B-B': section line I0~I2: insulating layer R: area VIA1~VIA5: Conduction structure V1: The first vertical signal line V2: The second vertical signal line V3: Shielded vertical wire

圖1是本發明一實施例的電子裝置的局部電路示意圖。 圖2是圖1的電子裝置中沿剖線A-A’的剖面的一種實施方式的示意圖。 圖3是本發明另一實施例的電子裝置的局部電路示意圖。 圖4是本發明另一實施例的電子裝置的局部電路示意圖。 圖5是本發明另一實施例的電子裝置的局部電路示意圖。 圖6是本發明另一實施例的電子裝置的局部電路示意圖。 圖7是圖6的電子裝置中沿剖線A-A’的剖面的一種實施方式的示意圖。 圖8是圖6的電子裝置中沿剖線A-A’的剖面的另一種實施方式的示意圖。 圖9是圖1的R區域中主動元件及沿剖線B-B’的剖面的一種實施方式的示意圖。 圖10是圖1的R區域中主動元件及沿剖線B-B’的剖面的另一種實施方式的示意圖。 圖11是本發明另一實施例的電子裝置的局部電路示意圖。 圖12是圖11的電子裝置中沿剖線A-A’的剖面的一種實施方式的示意圖。 圖13是本發明另一實施例的電子裝置的局部電路示意圖。 圖14是圖13的電子裝置中沿剖線A-A’的剖面的一種實施方式的示意圖。 圖15是本發明另一實施例的電子裝置的局部電路示意圖。 圖16是圖15的電子裝置中沿剖線A-A’的剖面的一種實施方式的示意圖。 圖17是本發明另一實施例的電子裝置的局部電路示意圖。 圖18是圖17的電子裝置中沿剖線A-A’的剖面的一種實施方式的示意圖。FIG. 1 is a schematic diagram of a partial circuit of an electronic device according to an embodiment of the present invention. FIG. 2 is a schematic diagram of one embodiment of a cross-section along the line A-A' in the electronic device of FIG. 1 . FIG. 3 is a schematic partial circuit diagram of an electronic device according to another embodiment of the present invention. FIG. 4 is a schematic partial circuit diagram of an electronic device according to another embodiment of the present invention. FIG. 5 is a schematic partial circuit diagram of an electronic device according to another embodiment of the present invention. FIG. 6 is a schematic partial circuit diagram of an electronic device according to another embodiment of the present invention. FIG. 7 is a schematic diagram of one embodiment of a cross-section along the line A-A' in the electronic device of FIG. 6 . FIG. 8 is a schematic diagram of another embodiment of the cross section along the line A-A' in the electronic device of FIG. 6 . FIG. 9 is a schematic diagram of an embodiment of the active element in the R region of FIG. 1 and a cross section along the section line B-B'. FIG. 10 is a schematic diagram of another embodiment of the active element in the R region of FIG. 1 and a cross section along the section line B-B'. FIG. 11 is a schematic partial circuit diagram of an electronic device according to another embodiment of the present invention. FIG. 12 is a schematic diagram of one embodiment of a cross-section along the line A-A' in the electronic device of FIG. 11 . FIG. 13 is a schematic partial circuit diagram of an electronic device according to another embodiment of the present invention. FIG. 14 is a schematic diagram of one embodiment of a cross-section along line A-A' in the electronic device of FIG. 13 . FIG. 15 is a schematic partial circuit diagram of an electronic device according to another embodiment of the present invention. FIG. 16 is a schematic diagram of one embodiment of a cross-section along line A-A' in the electronic device of FIG. 15 . FIG. 17 is a schematic partial circuit diagram of an electronic device according to another embodiment of the present invention. FIG. 18 is a schematic diagram of one embodiment of a cross-section along line A-A' in the electronic device of FIG. 17 .

100A:電子裝置100A: Electronics

110:基板110: Substrate

120:橫向訊號線120: Horizontal signal line

130:縱向線130: Longitudinal line

140:觸控墊140: Touch pad

150:畫素結構150: pixel structure

150a:子畫素150a: Subpixels

152:畫素電極152: Pixel electrode

154:主動元件154: Active Components

A-A’、B-B’:剖線A-A', B-B': section line

R:區域R: region

VIA1、VIA2:導通結構VIA1, VIA2: Conduction structure

V1:第一縱向訊號線V1: The first vertical signal line

V2:第二縱向訊號線V2: The second vertical signal line

V3:屏蔽縱線V3: Shielded vertical wire

Claims (18)

一種電子裝置,包括: 基板; 多條橫向訊號線,配置於所述基板上; 多條第一縱向訊號線,配置於所述基板上,與所述多條橫向訊號線相交; 多條第二縱向訊號線,配置於所述基板上,與所述多條橫向訊號線相交,且所述多條第二縱向訊號線各自連接所述多條橫向訊號線的其中一條;以及 多個畫素結構,配置於所述基板上,所述多個畫素結構各自連接所述多條橫向訊號線的其中一者與所述多條第一縱向訊號線的其中一者電性連接且包括畫素電極, 多個觸控墊,配置於所述基板上, 多條屏蔽縱線,配置於所述基板上,所述屏蔽縱線的其中一者與所述多個觸控墊的其中一者電性連接,所述多條屏蔽縱線、所述多條第一縱向訊號與所述多條第二縱向訊號為相同膜層,所述多條屏蔽縱線各自位於兩相鄰畫素電極之間的選自所述多條第一縱向訊號線與所述多條第二縱向訊號線群組中的至少兩條之間。An electronic device comprising: substrate; a plurality of horizontal signal lines, disposed on the substrate; a plurality of first vertical signal lines disposed on the substrate and intersecting with the plurality of horizontal signal lines; a plurality of second vertical signal lines disposed on the substrate, intersecting with the plurality of horizontal signal lines, and each of the plurality of second vertical signal lines is connected to one of the plurality of horizontal signal lines; and a plurality of pixel structures disposed on the substrate, each of the plurality of pixel structures is electrically connected to one of the plurality of horizontal signal lines and one of the plurality of first vertical signal lines and includes pixel electrodes, a plurality of touch pads, disposed on the substrate, A plurality of shielding vertical lines are arranged on the substrate, one of the shielding vertical lines is electrically connected to one of the plurality of touch pads, the plurality of shielding vertical lines, the plurality of The first longitudinal signal and the plurality of second longitudinal signals are the same film layer, and the plurality of shielding longitudinal lines are respectively located between two adjacent pixel electrodes and are selected from the plurality of first longitudinal signal lines and the between at least two of the plurality of second vertical signal line groups. 如請求項1所述的電子裝置,其中所述多條屏蔽縱線各自位於相鄰兩畫素電極之間的所述第一縱向訊號線與所述第二縱向訊號線之間。The electronic device of claim 1, wherein the plurality of shielding vertical lines are respectively located between the first vertical signal line and the second vertical signal line between two adjacent pixel electrodes. 如請求項2所述的電子裝置,其中在所述多個畫素結構的每相鄰兩行之間設置所述第一縱向訊號線的其中一者與所述多條第二縱向訊號線的其中一者,且所述屏蔽縱線位於所述第一縱向訊號線與所述第二縱向訊號線之間。The electronic device of claim 2, wherein one of the first vertical signal lines and the plurality of second vertical signal lines are arranged between every two adjacent rows of the plurality of pixel structures One of them, and the shielding longitudinal line is located between the first longitudinal signal line and the second longitudinal signal line. 如請求項3所述的電子裝置,其中在電子裝置的俯視圖中,所述觸控墊與所述第一縱向訊號線及所述第二縱向訊號線重疊,所述觸控墊與所述屏蔽縱線不重疊。The electronic device of claim 3, wherein in a plan view of the electronic device, the touch pad overlaps with the first vertical signal line and the second vertical signal line, and the touch pad and the shielding The vertical lines do not overlap. 如請求項2所述的電子裝置,其中各所述畫素結構包括橫向排列的三個子畫素,所述三個子畫素與同一條所述橫向訊號線電性連接,所述三個子畫素分別與位於所述子畫素第一側的不同所述第一縱向訊號線電性連接,所述第二縱向訊號線位於最外側子畫素的所述第一縱向訊號線的第一側,且所述屏蔽縱線位於所述第二縱向訊號線與最外側子畫素的所述第一縱向訊號線之間。The electronic device according to claim 2, wherein each of the pixel structures includes three sub-pixels arranged horizontally, the three sub-pixels are electrically connected to the same horizontal signal line, and the three sub-pixels are electrically connected to the same horizontal signal line. are respectively electrically connected with the different first vertical signal lines located on the first side of the sub-pixel, the second vertical signal line is located on the first side of the first vertical signal line of the outermost sub-pixel, And the shielding vertical line is located between the second vertical signal line and the first vertical signal line of the outermost sub-pixel. 如請求項5所述的電子裝置,更包括於各所述畫素結構的另外兩個所述子畫素的第一側分別設置所述屏蔽縱線。The electronic device according to claim 5, further comprising disposing the shielding vertical lines on the first sides of the other two sub-pixels of each of the pixel structures, respectively. 如請求項6所述的電子裝置,其中在各所述畫素結構中,兩相鄰所述子畫素之間的所述屏蔽縱線的數量為兩條。The electronic device according to claim 6, wherein in each of the pixel structures, the number of the shielding vertical lines between two adjacent sub-pixels is two. 如請求項2所述的電子裝置,其中所述多條橫向訊號線的相鄰兩行電性連接,各所述畫素結構包括縱向排列的兩個子畫素,其中所述兩個子畫素分別與電性連接的相鄰兩行的所述橫向訊號線電性連接,所述兩個子畫素所分別連接的所述第一縱向訊號線分設於所述畫素結構的相對側,所述第二縱向訊號線位於兩相鄰所述畫素結構所電性連接的兩相鄰所述第一縱向訊號線之間,所述屏蔽縱線位於所述第二縱向訊號線與各所述第一縱向訊號線之間。The electronic device of claim 2, wherein two adjacent rows of the plurality of horizontal signal lines are electrically connected, and each of the pixel structures includes two sub-pixels arranged vertically, wherein the two sub-pixels The pixels are respectively electrically connected to the horizontal signal lines of two adjacent rows that are electrically connected, and the first vertical signal lines respectively connected to the two sub-pixels are located on opposite sides of the pixel structure. , the second vertical signal line is located between two adjacent first vertical signal lines electrically connected to two adjacent pixel structures, and the shielding vertical line is located between the second vertical signal line and each between the first longitudinal signal lines. 如請求項8所述的電子裝置,其中在電子裝置的俯視圖中,所述觸控墊與所述第一縱向訊號線重疊,所述第二縱向訊號線與所述觸控墊不重疊。The electronic device of claim 8, wherein in a plan view of the electronic device, the touch pad overlaps with the first vertical signal line, and the second vertical signal line does not overlap with the touch pad. 如請求項8所述的電子裝置,其中在電子裝置的俯視圖中,所述觸控墊與所述第一縱向訊號線重疊,所述第二縱向訊號線與所述觸控墊重疊。The electronic device of claim 8, wherein in a plan view of the electronic device, the touch pad overlaps the first vertical signal line, and the second vertical signal line overlaps the touch pad. 如請求項1所述的電子裝置,更包括絕緣層以及貫穿所述絕緣層的導通結構,所述絕緣層的所在膜層位於所述第一縱向訊號線的膜層與所述觸控墊的膜層之間,所述屏蔽縱線經由所述導通結構連接所述多個觸控墊的其中一者。The electronic device as claimed in claim 1, further comprising an insulating layer and a conduction structure penetrating the insulating layer, wherein the insulating layer is located between the film layer of the first vertical signal line and the touch pad. Between the film layers, the shielding vertical line is connected to one of the plurality of touch pads through the conducting structure. 如請求項1所述的電子裝置,其中所述多條屏蔽縱線各自位於相鄰兩畫素電極之間的兩條所述第一縱向訊號線之間。The electronic device of claim 1, wherein each of the plurality of shielding vertical lines is located between the two first vertical signal lines between two adjacent pixel electrodes. 如請求項12所述的電子裝置,其中各所述畫素結構被兩相鄰所述橫向訊號線以及分設於所述畫素結構兩相對側的兩條所述第一縱向訊號線圍繞,各所述畫素結構包括橫向排列的兩個子畫素,所述第二縱向訊號線位於各所述畫素結構中的所述兩個子畫素之間,所述屏蔽縱線配置於兩相鄰所述畫素結構所電性連接的兩相鄰所述第一縱向訊號線之間。The electronic device of claim 12, wherein each of the pixel structures is surrounded by two adjacent horizontal signal lines and two first vertical signal lines disposed on two opposite sides of the pixel structure, Each of the pixel structures includes two sub-pixels arranged horizontally, the second vertical signal line is located between the two sub-pixels in each of the pixel structures, and the shielding vertical line is disposed on the two sub-pixels. between two adjacent first vertical signal lines electrically connected to adjacent pixel structures. 如請求項13所述的電子裝置,其中在各所述畫素結構中,更包括於所述第二縱向訊號線與各所述子畫素之間設置所述屏蔽縱線。The electronic device of claim 13, wherein in each of the pixel structures, the shielding vertical line is further arranged between the second vertical signal line and each of the sub-pixels. 如請求項14所述的電子裝置,其中在各所述畫素結構的兩相鄰所述子畫素之間包括兩條所述屏蔽縱線以及位於所述兩條屏蔽縱線中的所述第二縱向訊號線。The electronic device according to claim 14, wherein two of the shielding vertical lines and the two shielding vertical lines located between the two adjacent sub-pixels of each pixel structure are included. The second vertical signal line. 如請求項13所述的電子裝置,其中在各所述畫素結構的兩相鄰所述子畫素之間包括兩條所述第二縱向訊號線以及位於所述兩條第二縱向訊號線之間的所述屏蔽縱線。The electronic device of claim 13, wherein two of the second vertical signal lines and two of the second vertical signal lines are included between two adjacent sub-pixels of each of the pixel structures between the shielded longitudinal wires. 如請求項16所述的電子裝置,其中在電子裝置的俯視圖中,所述第一縱向訊號線與所述觸控墊重疊,所述第二縱向訊號線與所述觸控墊重疊,且所述屏蔽縱線與所述觸控墊不重疊。The electronic device of claim 16, wherein in a top view of the electronic device, the first vertical signal line overlaps the touch pad, the second vertical signal line overlaps the touch pad, and all The shielding vertical line does not overlap with the touch pad. 一種電子裝置,包括: 基板; 多條橫向訊號線,配置於所述基板上; 多條第一縱向訊號線,配置於所述基板上,與所述多條橫向訊號線相交; 多條第二縱向訊號線,配置於所述基板上,與所述多條橫向訊號線相交,且所述多條第二縱向訊號線各自連接所述多條橫向訊號線的其中一條;以及 多個畫素結構,配置於所述基板上,所述多個畫素結構各自連接所述多條橫向訊號線的其中一者與所述多條第一縱向訊號線的其中一者電性連接且包括畫素電極, 多個觸控墊,配置於所述基板上, 多條屏蔽縱線,配置於所述基板上,所述屏蔽縱線的其中一者與所述多個觸控墊的其中一者電性連接,所述多條屏蔽縱線、所述多條第一縱向訊號與所述多條第二縱向訊號為相同膜層, 其中各畫素結構被兩相鄰所述橫向訊號線與兩條所述第一縱向訊號線圍繞且包括兩個橫向排列的子畫素,所述第二縱向訊號線的其中一者位於同一個所述畫素結構的所述兩個子畫素之間,所述屏蔽縱線位於所述第二縱向訊號線與所述兩個子畫素其中一者的畫素電極之間。An electronic device comprising: substrate; a plurality of horizontal signal lines, disposed on the substrate; a plurality of first vertical signal lines disposed on the substrate and intersecting with the plurality of horizontal signal lines; a plurality of second vertical signal lines disposed on the substrate, intersecting with the plurality of horizontal signal lines, and each of the plurality of second vertical signal lines is connected to one of the plurality of horizontal signal lines; and a plurality of pixel structures disposed on the substrate, each of the plurality of pixel structures is electrically connected to one of the plurality of horizontal signal lines and one of the plurality of first vertical signal lines and includes pixel electrodes, a plurality of touch pads, disposed on the substrate, A plurality of shielding vertical lines are arranged on the substrate, one of the shielding vertical lines is electrically connected to one of the plurality of touch pads, the plurality of shielding vertical lines, the plurality of The first longitudinal signal and the plurality of second longitudinal signals are the same film layer, Each pixel structure is surrounded by two adjacent horizontal signal lines and two first vertical signal lines and includes two horizontally arranged sub-pixels, and one of the second vertical signal lines is located in the same Between the two sub-pixels of the pixel structure, the shielding vertical line is located between the second vertical signal line and a pixel electrode of one of the two sub-pixels.
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