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KR980005773A - 세정처리제 - Google Patents

세정처리제 Download PDF

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Publication number
KR980005773A
KR980005773A KR1019970023398A KR19970023398A KR980005773A KR 980005773 A KR980005773 A KR 980005773A KR 1019970023398 A KR1019970023398 A KR 1019970023398A KR 19970023398 A KR19970023398 A KR 19970023398A KR 980005773 A KR980005773 A KR 980005773A
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South Korea
Prior art keywords
acid
cleaning agent
agent according
group
ions
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KR1019970023398A
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English (en)
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KR100322392B1 (ko
Inventor
마사히꼬 가끼자와
오사무 이찌까와
이찌로 하야시다
Original Assignee
다나까 모또아끼
와꼬 쥰야꾸 고오교 가부시끼가이샤
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Publication of KR980005773A publication Critical patent/KR980005773A/ko
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Publication of KR100322392B1 publication Critical patent/KR100322392B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/264—Aldehydes; Ketones; Acetals or ketals
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/265—Carboxylic acids or salts thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3218—Alkanolamines or alkanolimines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3245—Aminoacids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)

Abstract

본 발명은, 1개 이상의 카르복실기를 갖는 유기산 및 킬레이트화 능력을 갖는 착화제로 구성된 세정처리제에 관한 것으로서, 본 발명의 세정처리제를 사용함으로써 금속화된 배선의 부식 및 반도체 기판 표면상의 평탄성에 역효과를 나타내지 않고 효과적으로 입자 및 금속성 오염물을 제거할 수 있다.

Description

세정처리제
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (16)

1개 이상의 카르복실기를 갖는 유기산 및 킬레이트화 능력을 갖는 착화제로 구성된 세정처리제.
제1항에 있어서, 세정처리제가 수용액인 세정처리제.
제1항 또는 제2항에 있어서, 유기산이 1 내지 3 개의 카르복실기를 갖는 세정처리제.
제1항 또는 제2항에 있어서, 유기산이 1 내지 2 개의 카르복실기를 갖는 세정처리제.
제1항 또는 제2항에 있어서, 유기산이 모노카르복실산, 디카르복실산, 트리카르복실산, 옥시카르복실산 및 아미노카르복실산으로 구성된 군으로부터 선택된 것인 세정처리제.
제1항에 또는 제2항에 있어서, 유기산이 디카르복실산 또는 옥시카르복실산인 세정처리제.
제6항에 있어서, 옥시카르복실산이 옥시디카르복실산 또는 옥시트리카르복실산인 세정처리제.
제6항에 있어서, 디카르복실산이 옥살산, 말론산, 숙신산, 글루타르산, 아디프산, 피멜산, 말레산, 푸마르산 및 프탈산으로 구성된 군으로부터 선택된 것인 세정처리제.
제6항에 있어서, 옥시카르복실산이 말산, 타르타르산 및 시트르산으로 구성된 군으로부터 선택된 것인 세정처리제.
제1항 또는 제2항에 있어서, 착화제가, 반도체 기판 표면상의 금속성 오염물과 착화합물을 형성하는 킬레이트화 능력을 갖는 것인 세정처리제.
제1항 또는 제2항에 있어서, 착화제가, 아미노폴리카릅고실산, 포스폰산 유도체, 응축 인상, 디케톤, 아민 및 할라이드 이온 시안화 이온, 티오시안산염 이온, 티오황산염 이온 및 암모늄 이온으로 구성된 군으로부터 선택되는 무기이온으로 구성된 군으로부터 선택되는 것인 세정처리제.
제1항 또는 제2항에 있어서, 착화제가 포스폰산 유도체인 세정처리제.
제12항에 있어서, 포스폰산 유동체가 에틸렌디아민테트라(메틸렌포스폰산), 에틸렌디아민디(메틸렌포스폰산), 니트릴로트리스(메틸렌포스폰산) 및 1-히드록시에틸리덴-1, 1′-디포스폰산) 으로 구성된 군으로부터 선택되는 것인 세정처리제.
제1항 또는 제2항에 있어서, 유기산이 디카르복실산 또는 옥시카르복실산이고 착화제가 포스폰산 유도체인 세정처리제.
1개 이상의 카르복실기를 갖는 유기산 및 킬레이트화 능력을 갖는 착화제로 구성된 세정처리제로 반도체 기판 표면을 처리하는 것으로 이루어진 반도체 기판 표면용 세정처리방법.
제15항에 있어서, 반도체 기판 표면의 처리가 상기 반도체를 세정처리제내에 담그는 것인 방법.
※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019970023398A 1996-06-05 1997-06-05 세정처리제 KR100322392B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP16535396 1996-06-05
JP96-165353 1996-06-05

Publications (2)

Publication Number Publication Date
KR980005773A true KR980005773A (ko) 1998-03-30
KR100322392B1 KR100322392B1 (ko) 2002-03-08

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Country Status (5)

Country Link
US (2) US6143705A (ko)
EP (1) EP0812011B1 (ko)
KR (1) KR100322392B1 (ko)
DE (1) DE69733102T2 (ko)
TW (1) TW416987B (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100381355B1 (ko) * 1997-11-28 2003-08-19 엔이씨 일렉트로닉스 코포레이션 기판의세정방법
KR100825844B1 (ko) * 2000-09-05 2008-04-28 와코 쥰야꾸 고교 가부시키가이샤 Ｔｉ계 막용 에칭제 및 에칭 방법

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US6514921B1 (en) 2003-02-04
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