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KR970065679A - 오염 방지막 형성용 조성물, 광학 소자, 및 표시 장치 - Google Patents

오염 방지막 형성용 조성물, 광학 소자, 및 표시 장치 Download PDF

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KR970065679A
KR970065679A KR1019970009523A KR19970009523A KR970065679A KR 970065679 A KR970065679 A KR 970065679A KR 1019970009523 A KR1019970009523 A KR 1019970009523A KR 19970009523 A KR19970009523 A KR 19970009523A KR 970065679 A KR970065679 A KR 970065679A
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optical element
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antifouling film
outermost inorganic
display device
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KR100436679B1 (ko
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히로후미 콘도
히데아끼 하나오까
토미오 고바야시
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이데이 노부유끼
소니 가부시끼가이샤
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    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
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    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
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    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/0427—Coating with only one layer of a composition containing a polymer binder
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/044—Forming conductive coatings; Forming coatings having anti-static properties
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
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    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/10—Block or graft copolymers containing polysiloxane sequences
    • C09D183/12—Block or graft copolymers containing polysiloxane sequences containing polyether sequences
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    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
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    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
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    • C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
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    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/14—Layer or component removable to expose adhesive
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    • Y10T428/1429—Fluorine

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  • Surface Treatment Of Glass (AREA)

Abstract

얼룩 저항성, 긁힘 저항성, 내용매성 등이 우수한 오염 방지 막을 형성할 수 있는 오염 방지막 형성용 조성물 및 상기 오염 방지막을 갖는 광학 소자, 예를 들면 반사 방지 필터가 제공된다.
오염 방지막은 하기 화학식(1)로 표시되는 퍼플루오로폴리에테르기를 갖는 알콕시실란 화합물을 함유하는 오염 방지막 형성용 조성물에 의해 형성된다.
Rf{COR1-R2-Si(OR3)3}j(1)
(상기 식에서, Rf는 퍼플루오로폴리에테르기를 나타내고, R1은 2가 원자 또는 기를 나타내고, R2는 알킬렌기를 나타내고, R3은 알킬기를 나타내고, j는 1 또는 2이다)

Description

오염 방지막 형성용 조성물, 광학 소자, 및 표시 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 광학 소자의 실시 태양의 단면도.

Claims (11)

  1. (A) 하기 화학식(1)로 표시되는 퍼플루오로폴리에테르기를 갖는 알콕시실란 화합물, 및 (B) 산 또는 염기, 인산 에스테르, 및 β-디케톤으로부터 선택된 하나 이상의 성분을 포함하는 오염 방지막 형성용 조성물.
    Rf{COR1-R2-Si(OR3)3}j(1)
    (상기 식에서, Rf는 퍼플루오로폴리에테르기를 나타내고, R1은 2가 원자 또는 기를 나타내고, R2는 알킬렌기를 나타내고, R3은 알킬기를 나타내고, j는 1 또는 2이다)
  2. 제1항에 있어서, 알콕시실란 화합물의 농도가 0.1 내지 5.0중량%이고, 산 또는 염기 또는 인산 에스테르의 농도가 0.001 내지 1mmol/L이고, β-디케톤의 농도가 0.1 내지 100mmol/L인 오염 방지막 형성용 조성물.
  3. 제1항에 있어서, 상기 화학식(1)에 의해 표시되는 퍼플루오로폴리에테르기를 갖는 알콕시실란 화합물의 수평균 분자량이 500 내지 10000인 오염 방지막 형성용 조성물.
  4. 플라스틱 기판; 하나 이상의 다른 막을 매개로 하여 또는 이러한 매개층 없이 상기 플라스틱 기판 상에 제공된 최외층 무기막; 및 하기 화학식(1)로 표시되는 퍼플루오로폴리에테르기를 갖는 알콕시실란 화합물 및 산 또는 염기, 인산 에스테르, 및 β-디케톤으로부터 선택된 하나 이상의 성분을 사용하는 상기 최외층 무기막의 표면을 덮는 오염 방지막을 갖는 광학 소자.
    Rf{COR1-R2-Si(OR3)3}j(1)
    (상기 식에서, Rf는 퍼플루오로폴리에테르기를 나타내고, R1은 2가 원자 또는 기를 나타내고, R2는 알킬렌기를 나타내고, R3은 알킬기를 나타내고, j는 1 또는 2이다)
  5. 제4항에 있어서, 상기 최외층 무기막이 주성분으로서 실리콘 옥사이드를 함유하는 광학 소자.
  6. 제4항에 있어서, 상기 플라스틱 기판이 시이트 또는 막인 광학 소자.
  7. 제4항에 있어서, 광학 소자가 상기 최외층 무기막을 포함하는 반사 방지 필터를 갖는 광학 소자.
  8. 제4항에 있어서, 반사 방지 필터가 최외층 무기막 및 전도성 층을 포함하는 광학 소자.
  9. 플라스틱 기판, 하나 이상의 다른 막을 매개로 하여 또는 이러한 매개층 없이 상기 플라스틱 기판 상에 제공된 최외층 무기막, 및 하기 화학식(1)로 표시되는 퍼플루오로폴리에테르기를 갖는 알콕시실란 화합물 및 산 또는 염기, 인산 에스테르, 및 β-디케톤으로부터 선택된 하나 이상의 성분을 사용하는 상기 최외층 무기막의 표면을 덮는 오염 방지막을 갖는 광학 소자가 표시 패널 표면 상에 부착된 표시 장치.
    Rf{COR1-R2-Si(OR3)3}j(1)
    (상기 식에서, Rf는 퍼플루오로폴리에테르기를 나타내고, R1은 2가 원자 또는 기를 나타내고, R2는 알킬렌기를 나타내고, R3은 알킬기를 나타내고, j는 1 또는 2이다)
  10. 제9항에 있어서, 표시 장치가 브라운관인 표시 장치.
  11. 제9항에 있어서, 상기 최외층 무기막이 주성분으로 실리콘 옥사이드를 함유하는 표시 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019970009523A 1996-03-21 1997-03-20 오염방지막형성용조성물,광학소자,및표시장치 KR100436679B1 (ko)

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JP96-064089 1996-03-21
JP06408996A JP3344199B2 (ja) 1996-03-21 1996-03-21 防汚膜形成用組成物および反射防止フィルター

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KR970065679A true KR970065679A (ko) 1997-10-13
KR100436679B1 KR100436679B1 (ko) 2004-08-09

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US (1) US5922787A (ko)
EP (1) EP0797111B1 (ko)
JP (1) JP3344199B2 (ko)
KR (1) KR100436679B1 (ko)
DE (1) DE69725369T2 (ko)

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DE69725369D1 (de) 2003-11-13
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