KR20020067183A - 리튬 이차 전지용 양극 활물질 및 그의 제조 방법 - Google Patents
리튬 이차 전지용 양극 활물질 및 그의 제조 방법 Download PDFInfo
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- KR20020067183A KR20020067183A KR1020010007600A KR20010007600A KR20020067183A KR 20020067183 A KR20020067183 A KR 20020067183A KR 1020010007600 A KR1020010007600 A KR 1020010007600A KR 20010007600 A KR20010007600 A KR 20010007600A KR 20020067183 A KR20020067183 A KR 20020067183A
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- 229910052744 lithium Inorganic materials 0.000 title claims abstract description 25
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 title claims abstract description 22
- 238000000034 method Methods 0.000 title claims description 39
- 239000007774 positive electrode material Substances 0.000 title claims description 26
- 239000002184 metal Substances 0.000 claims abstract description 73
- 229910052751 metal Inorganic materials 0.000 claims abstract description 71
- 150000002642 lithium compounds Chemical class 0.000 claims abstract description 46
- 150000001875 compounds Chemical class 0.000 claims abstract description 35
- 239000006182 cathode active material Substances 0.000 claims abstract description 19
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 13
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 13
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 12
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 12
- 229910000000 metal hydroxide Inorganic materials 0.000 claims abstract description 11
- 150000004692 metal hydroxides Chemical class 0.000 claims abstract description 11
- 229910052684 Cerium Inorganic materials 0.000 claims abstract description 10
- 229910052692 Dysprosium Inorganic materials 0.000 claims abstract description 10
- 229910052691 Erbium Inorganic materials 0.000 claims abstract description 10
- 229910052689 Holmium Inorganic materials 0.000 claims abstract description 10
- 229910052779 Neodymium Inorganic materials 0.000 claims abstract description 10
- 229910052777 Praseodymium Inorganic materials 0.000 claims abstract description 10
- 229910052772 Samarium Inorganic materials 0.000 claims abstract description 10
- 229910052771 Terbium Inorganic materials 0.000 claims abstract description 10
- 229910052775 Thulium Inorganic materials 0.000 claims abstract description 10
- 229910052769 Ytterbium Inorganic materials 0.000 claims abstract description 10
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 10
- 229910052742 iron Inorganic materials 0.000 claims abstract description 10
- 229910052746 lanthanum Inorganic materials 0.000 claims abstract description 10
- 229910052706 scandium Inorganic materials 0.000 claims abstract description 10
- 229910052727 yttrium Inorganic materials 0.000 claims abstract description 10
- 229910021518 metal oxyhydroxide Inorganic materials 0.000 claims abstract description 9
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 7
- 229910052765 Lutetium Inorganic materials 0.000 claims abstract description 6
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 6
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 6
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 5
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 5
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 5
- 239000000243 solution Substances 0.000 claims description 46
- 150000004703 alkoxides Chemical class 0.000 claims description 20
- 238000000576 coating method Methods 0.000 claims description 18
- 239000002335 surface treatment layer Substances 0.000 claims description 17
- 238000010438 heat treatment Methods 0.000 claims description 15
- 238000001035 drying Methods 0.000 claims description 13
- 238000002156 mixing Methods 0.000 claims description 13
- 239000007864 aqueous solution Substances 0.000 claims description 12
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 229910052796 boron Inorganic materials 0.000 claims description 6
- NKCVNYJQLIWBHK-UHFFFAOYSA-N carbonodiperoxoic acid Chemical compound OOC(=O)OO NKCVNYJQLIWBHK-UHFFFAOYSA-N 0.000 claims description 4
- MMCOUVMKNAHQOY-UHFFFAOYSA-N carbonoperoxoic acid Chemical class OOC(O)=O MMCOUVMKNAHQOY-UHFFFAOYSA-N 0.000 claims description 4
- 238000003756 stirring Methods 0.000 claims description 2
- 229910017326 LixMn Inorganic materials 0.000 abstract 3
- 229910015947 LixNi Inorganic materials 0.000 abstract 3
- 229910014540 LiMn2O Inorganic materials 0.000 abstract 1
- 235000016027 Persea schiedeana Nutrition 0.000 abstract 1
- 244000261838 Persea schiedeana Species 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 229910012851 LiCoO 2 Inorganic materials 0.000 description 52
- 230000000052 comparative effect Effects 0.000 description 19
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 14
- 239000011572 manganese Substances 0.000 description 14
- 239000000203 mixture Substances 0.000 description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 9
- 239000000843 powder Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000010410 layer Substances 0.000 description 7
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 6
- 229910003002 lithium salt Inorganic materials 0.000 description 5
- 159000000002 lithium salts Chemical class 0.000 description 5
- 150000002696 manganese Chemical class 0.000 description 5
- 150000002815 nickel Chemical class 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- 238000007664 blowing Methods 0.000 description 4
- 150000001868 cobalt Chemical class 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- ZAUUZASCMSWKGX-UHFFFAOYSA-N manganese nickel Chemical compound [Mn].[Ni] ZAUUZASCMSWKGX-UHFFFAOYSA-N 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 125000001153 fluoro group Chemical class F* 0.000 description 3
- 230000002687 intercalation Effects 0.000 description 3
- 238000009830 intercalation Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 150000003463 sulfur Chemical class 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 2
- 239000005300 metallic glass Substances 0.000 description 2
- 239000004570 mortar (masonry) Substances 0.000 description 2
- 150000003017 phosphorus Chemical class 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- 229910013870 LiPF 6 Inorganic materials 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 229910021569 Manganese fluoride Inorganic materials 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- UNTBPXHCXVWYOI-UHFFFAOYSA-O azanium;oxido(dioxo)vanadium Chemical compound [NH4+].[O-][V](=O)=O UNTBPXHCXVWYOI-UHFFFAOYSA-O 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- ZADPBFCGQRWHPN-UHFFFAOYSA-N boronic acid Chemical compound OBO ZADPBFCGQRWHPN-UHFFFAOYSA-N 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 238000000975 co-precipitation Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229910021446 cobalt carbonate Inorganic materials 0.000 description 1
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt dinitrate Chemical compound [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 description 1
- 229910001981 cobalt nitrate Inorganic materials 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- ZOTKGJBKKKVBJZ-UHFFFAOYSA-L cobalt(2+);carbonate Chemical compound [Co+2].[O-]C([O-])=O ZOTKGJBKKKVBJZ-UHFFFAOYSA-L 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- CTNMMTCXUUFYAP-UHFFFAOYSA-L difluoromanganese Chemical compound F[Mn]F CTNMMTCXUUFYAP-UHFFFAOYSA-L 0.000 description 1
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- HHFAWKCIHAUFRX-UHFFFAOYSA-N ethoxide Chemical compound CC[O-] HHFAWKCIHAUFRX-UHFFFAOYSA-N 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- XIXADJRWDQXREU-UHFFFAOYSA-M lithium acetate Chemical compound [Li+].CC([O-])=O XIXADJRWDQXREU-UHFFFAOYSA-M 0.000 description 1
- YQNQTEBHHUSESQ-UHFFFAOYSA-N lithium aluminate Chemical compound [Li+].[O-][Al]=O YQNQTEBHHUSESQ-UHFFFAOYSA-N 0.000 description 1
- HZRMTWQRDMYLNW-UHFFFAOYSA-N lithium metaborate Chemical compound [Li+].[O-]B=O HZRMTWQRDMYLNW-UHFFFAOYSA-N 0.000 description 1
- 229910021450 lithium metal oxide Inorganic materials 0.000 description 1
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 1
- 229910052912 lithium silicate Inorganic materials 0.000 description 1
- GLNWILHOFOBOFD-UHFFFAOYSA-N lithium sulfide Chemical compound [Li+].[Li+].[S-2] GLNWILHOFOBOFD-UHFFFAOYSA-N 0.000 description 1
- 229940071125 manganese acetate Drugs 0.000 description 1
- UOGMEBQRZBEZQT-UHFFFAOYSA-L manganese(2+);diacetate Chemical compound [Mn+2].CC([O-])=O.CC([O-])=O UOGMEBQRZBEZQT-UHFFFAOYSA-L 0.000 description 1
- NBTOZLQBSIZIKS-UHFFFAOYSA-N methoxide Chemical compound [O-]C NBTOZLQBSIZIKS-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229940078494 nickel acetate Drugs 0.000 description 1
- BFDHFSHZJLFAMC-UHFFFAOYSA-L nickel(ii) hydroxide Chemical compound [OH-].[OH-].[Ni+2] BFDHFSHZJLFAMC-UHFFFAOYSA-L 0.000 description 1
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000002467 phosphate group Chemical class [H]OP(=O)(O[H])O[*] 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- OGHBATFHNDZKSO-UHFFFAOYSA-N propan-2-olate Chemical compound CC(C)[O-] OGHBATFHNDZKSO-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- CADICXFYUNYKGD-UHFFFAOYSA-N sulfanylidenemanganese Chemical compound [Mn]=S CADICXFYUNYKGD-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Landscapes
- Battery Electrode And Active Subsutance (AREA)
Abstract
Description
0.1C[mAh/g] | 1.0C[mAh/g] | |
비교예 1 | 161 | 113 |
실시예 4 | 162 | 143 |
실시예 10 | 160 | 140 |
실시예 16 | 158 | 145 |
0.1C[V] | 1.0C[V] | |
비교예 1 | 3.91 | 3.57 |
실시예 4 | 3.91 | 3.85 |
실시예 10 | 3.91 | 3.86 |
실시예 16 | 3.91 | 3.87 |
Claims (9)
- 표면에 비정질 또는 결정질 금속 수산화물, 금속 옥시하이드록사이드, 금속 옥시카보네이트 및 금속 하이드록시 카보네이트로 이루어진 군에서 선택되는 화합물, 또는 금속 산화물을 포함하는 표면처리층이 형성된 하기 화학식 1 내지 9의 화합물로부터 선택되는 하나 이상의 리튬 화합물; 및하기 화학식 1 내지 9의 화합물로부터 선택되는 하나 이상의 리튬 화합물을 포함하는 리튬 이차 전지용 양극 활물질.[화학식 1]LixMn1-yM'yA2[화학식 2]LixMn1-yM'yO2-zAz[화학식 3]LixMn2O4-zAz[화학식 4]LixMn2-yM'yA4[화학식 5]LixB1-yM"yA2[화학식 6]LixBO2-zAz[화학식 7]LixNi1-yCoyO2-zAz[화학식 8]LixNi1-y-zCoyM"zA2[화학식 9]LixNi1-y'-z'Mny'M'z'Aα(상기 식에서, 0.95 ≤ x ≤ 1.1, 0 ≤ y ≤ 0.5, 0 ≤ z ≤ 0.5, 0 ≤ y' ≤ 0.5, 0 ≤ z' ≤ 0.1, 0 < α ≤ 2이고, M'은 Al, Co, Cr, Fe, Mg, Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Ga, Tb, Dy, Ho, Er, Tm, Yb 및 Lu로 이루어진 군에서 선택되는 하나 이상의 원소이고, M"은 Al, Cr, Mn, Fe, Mg, Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Ga, Tb, Dy, Ho, Er, Tm, Yb 및 Lu로 이루어진 군에서 선택되는 하나 이상의 원소이며, A는 O, F, S 및 P로 이루어진 군에서 선택되고, B는 Ni 또는 Co이다.)
- 제 1 항에 있어서, 상기 양극 활물질은 상기 표면처리 층이 형성된 리튬 화합물을 10 내지 90 중량%로 포함하고, 상기 리튬 화합물을 90 : 90 내지 10 중량% 포함하는 것인 리튬 이차 전지용 양극 활물질.
- 표면에 비정질 또는 결정질 금속 수산화물, 금속 옥시하이드록사이드, 금속 옥시카보네이트 및 금속 하이드록시 카보네이트로 이루어진 군에서 선택되는 화화합, 또는 금속 산화물을 포함하는 표면처리 층이 형성된 하기 화학식 1 내지 9의 화합물로부터 선택되는 하나 이상의 리튬 화합물과 하기 화학식 1 내지 9의 화합물로부터 선택되는 하나 이상의 리튬 화합물을 혼합하는공정을 포함하는 리튬 이차 전지용 양극 활물질의 제조 방법.[화학식 1]LixMn1-yM'yA2[화학식 2]LixMn1-yM'yO2-zAz[화학식 3]LixMn2O4-zAz[화학식 4]LixMn2-yM'yA4[화학식 5]LixB1-yM"yA2[화학식 6]LixBO2-zAz[화학식 7]LixNi1-yCoyO2-zAz[화학식 8]LixNi1-y-zCoyM"zA2[화학식 9]LixNi1-y'-z'Mny'M'z'Aα(상기 식에서, 0.95 ≤ x ≤ 1.1, 0 ≤ y ≤ 0.5, 0 ≤ z ≤ 0.5, 0 ≤ y' ≤ 0.5, 0 ≤ z' ≤ 0.1, 0 < α ≤ 2이고, M'은 Al, Co, Cr, Fe, Mg, Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Ga, Tb, Dy, Ho, Er, Tm, Yb 및 Lu로 이루어진 군에서 선택되는 하나 이상의 원소이고, M"은 Al, Cr, Mn, Fe, Mg, Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Ga, Tb, Dy, Ho, Er, Tm, Yb 및 Lu로 이루어진 군에서 선택되는 하나 이상의 원소이며, A는 O, F, S 및 P로 이루어진 군에서 선택되고, B는 Ni 또는 Co이다.)
- 제 3 항에 있어서, 상기 혼합 공정은 상기 표면처리 층이 형성된 리튬 화합물 10 내지 90 중량%와 상기 리튬 화합물 90 내지 10 중량%를 혼합하여 실시하는 것인 제조 방법.
- 제 3 항에 있어서, 상기 표면처리 층이 형성된 리튬 화합물은 하기 화학식 1 내지 9의 화합물 중에서 선택되는 리튬 화합물을 금속 알콕사이드 용액 또는 금속 수용액으로 코팅하고;상기 금속 알콕사이드 용액 또는 금속 수용액이 코팅된 화합물을 열처리하여 제조되는 표면에 금속 산화물을 포함하는 표면처리 층이 형성된 것인 제조 방법.
- 제 4 항에 있어서, 상기 열처리 공정은 300 내지 800℃의 온도로 1 내지 12시간 동안 실시하는 것인 제조 방법.
- 제 3 항에 있어서, 상기 표면처리 층이 형성된 리튬 화합물은 하기 화학식 1 내지 9의 화합물 중에서 선택되는 리튬 화합물을 금속 알콕사이드 용액 또는 금속 수용액으로 코팅하고;상기 금속 알콕사이드 용액 또는 금속 수용액이 코팅된 화합물을 건조하여 제조되는 표면에 금속 수산화물, 금속 옥시하이드록사이드, 금속 옥시카보네이트 및 금속 하이드록시 카보네이트로 이루어진 군에서 선택되는 화합물을 포함하는 표면처리 층이 형성된 것인 제조 방법.
- 제 7 항에 있어서, 상기 건조 공정은 상온 내지 200℃에서 1 내지 24시간 동안 실시하는 것인 제조 방법.
- 제 5 항 또는 제 7 항에 있어서, 상기 코팅 공정은 상기 리튬 화합물과 금속 알콕사이드 용액 또는 금속 수용액을 혼합하고 교반하면서 온도를 증가시켜 실시하는 것인 제조 방법.
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100542184B1 (ko) * | 2001-07-19 | 2006-01-10 | 삼성에스디아이 주식회사 | 전지용 활물질 및 그의 제조 방법 |
KR100709205B1 (ko) * | 2001-04-02 | 2007-04-18 | 삼성에스디아이 주식회사 | 리튬 이차 전지용 양극 활물질 조성물 |
KR100739620B1 (ko) * | 2001-05-15 | 2007-07-16 | 삼성에스디아이 주식회사 | 리튬 이차 전지용 양극 활물질 및 그의 제조 방법 |
KR100824931B1 (ko) * | 2006-10-30 | 2008-04-28 | 한국전기연구원 | 활물질. 그 제조방법 및 이를 구비한 리튬 이차 전지 |
US8007941B2 (en) | 2000-10-09 | 2011-08-30 | Samsung Sdi Co., Ltd. | Positive active material for rechargeable lithium battery and method of preparing same |
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JPH0950810A (ja) * | 1995-08-08 | 1997-02-18 | Mitsui Toatsu Chem Inc | 非水電解液電池の電極活物質及びその製造方法 |
JP3582161B2 (ja) * | 1995-08-11 | 2004-10-27 | ソニー株式会社 | 正極活物質及びそれを用いた非水電解質二次電池 |
KR100307160B1 (ko) * | 1999-03-06 | 2001-09-26 | 김순택 | 리튬 이차 전지용 양극 활물질 및 그 제조 방법 |
KR100309773B1 (ko) * | 1999-06-17 | 2001-11-01 | 김순택 | 리튬 이차 전지용 양극 활물질 및 그의 제조 방법 |
KR100428616B1 (ko) * | 2001-01-19 | 2004-04-27 | 삼성에스디아이 주식회사 | 리튬 이차 전지용 양극 활물질 및 그의 제조 방법 |
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Cited By (7)
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US8007941B2 (en) | 2000-10-09 | 2011-08-30 | Samsung Sdi Co., Ltd. | Positive active material for rechargeable lithium battery and method of preparing same |
US8034486B2 (en) | 2000-10-09 | 2011-10-11 | Samsung Sdi Co., Ltd. | Positive active material for rechargeable lithium battery and method of preparing same |
KR100709205B1 (ko) * | 2001-04-02 | 2007-04-18 | 삼성에스디아이 주식회사 | 리튬 이차 전지용 양극 활물질 조성물 |
US7507501B2 (en) | 2001-04-02 | 2009-03-24 | Samsung Sdi Co., Ltd. | Positive active material composition for rechargeable lithium batteries |
KR100739620B1 (ko) * | 2001-05-15 | 2007-07-16 | 삼성에스디아이 주식회사 | 리튬 이차 전지용 양극 활물질 및 그의 제조 방법 |
KR100542184B1 (ko) * | 2001-07-19 | 2006-01-10 | 삼성에스디아이 주식회사 | 전지용 활물질 및 그의 제조 방법 |
KR100824931B1 (ko) * | 2006-10-30 | 2008-04-28 | 한국전기연구원 | 활물질. 그 제조방법 및 이를 구비한 리튬 이차 전지 |
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