KR101115111B1 - 마이크로 리소그래프 투영 노광 장치 투영 대물 렌즈 - Google Patents
마이크로 리소그래프 투영 노광 장치 투영 대물 렌즈 Download PDFInfo
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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Abstract
Description
Claims (29)
- 투영 대물 렌즈(120; 120')의 대상 평면(122)에 배치될 수 있는 마스크(124)를, 상기 투영 대물 렌즈의 영상 평면(128)에 배치될 수 있는 감광 층(126)에 이미징(imaging)하기 위한 마이크로 리소그래피 투영 노광 장치(110)의 투영 대물 렌즈로서, 상기 투영 대물 렌즈(120; 120')는 담금 작업용으로 디자인되며, 담금 액(134)은, 담금 작업 동안에, 영상측의 상기 투영 대물 렌즈(120)의 최종 광학 요소인 광학 요소(L5)의 오목하게 굴곡진 영상측 표면(136) 및 상기 감광 층(126)에 직접적으로 인접하여 있고,상기 담금 액(134)의 굴절률은, 대상측의 상기 담금 액에 인접하는 상기 최종 광학 요소(L5)의 굴절률보다 크며,상기 최종 광학 요소의 상기 굴곡진 영상측 표면(136)은, 구(球)형이고, 상기 굴곡진 영상측 표면(136)과 상기 영상 평면(128) 사이의 축 방향 거리(s)의 0.9 배와 1.5배 사이에 있는 곡률 반경(R)을 갖는 것을 특징으로 하는 마이크로 리소그래피 투영 노광 장치의 투영 대물 렌즈.
- 투영 대물 렌즈(120; 120')의 대상 평면(122)에 배치될 수 있는 마스크(124)를, 상기 투영 대물 렌즈의 영상 평면(128)에 배치될 수 있는 감광 층(126)에 이미징(imaging)하기 위한 마이크로 리소그래피 투영 노광 장치(110)의 투영 대물 렌즈로서, 상기 투영 대물 렌즈(120; 120')는 담금 작업용으로 디자인되며, 담금 액(134)은, 담금 작업 동안에, 영상측의 상기 투영 대물 렌즈(120)의 최종 광학 요소인 광학 요소(L5)의 오목하게 굴곡진 영상측 표면(136) 및 상기 감광 층(126)에 직접적으로 인접하여 있고,상기 담금 액(134)의 굴절률은, 대상측의 상기 담금 액에 인접하는 상기 최종 광학 요소(L5)의 굴절률보다 크며,상기 최종 광학 요소의 상기 굴곡진 영상측 표면(136)은, 구(球)형이고, 상기 굴곡진 영상측 표면(136)과 상기 영상 평면(128) 사이의 축 방향 거리(s)의 0.9 배와 1.5배 사이에 있는 곡률 반경(R)을 갖고,상기 굴곡진 영상측 표면(136)이 방수 배리어(flood preventing barrier)(140)에 의해 둘러싸여 있는 것을 특징으로 하는, 마이크로 리소그래피 투영 노광 장치의 투영 대물 렌즈.
- 투영 대물 렌즈(120; 120')의 대상 평면(122)에 배치될 수 있는 마스크(124)를, 상기 투영 대물 렌즈의 영상 평면(128)에 배치될 수 있는 감광 층(126)에 이미징(imaging)하기 위한 마이크로 리소그래피 투영 노광 장치(110)의 투영 대물 렌즈로서, 상기 투영 대물 렌즈(120; 120')는 담금 작업용으로 디자인되며, 담금 액(134)은, 담금 작업 동안에, 영상측의 상기 투영 대물 렌즈(120)의 최종 광학 요소인 광학 요소(L5)의 오목하게 굴곡진 영상측 표면(136) 및 상기 감광 층(126)에 직접적으로 인접하여 있고,상기 담금 액(134)의 굴절률은, 대상측의 상기 담금 액에 인접하는 상기 최종 광학 요소(L5)의 굴절률보다 크며,상기 최종 광학 요소의 상기 굴곡진 영상측 표면(136)은, 구(球)형이고, 상기 굴곡진 영상측 표면(136)과 상기 영상 평면(128) 사이의 축 방향 거리(s)의 0.9 배와 1.5배 사이에 있는 곡률 반경(R)을 갖고,상기 굴곡진 영상측 표면(136)이 방수 배리어(140)에 의해 둘러싸여 있으며,상기 방수 배리어가 상기 투영 대물 렌즈(120')의 하우징(141)에 및/또는 상기 광학 요소(L5)에 결합된 링(140)으로서 디자인된 것을 특징으로 하는, 마이크로 리소그래피 투영 노광 장치의 투영 대물 렌즈.
- 청구항 1 내지 3 중 어느 한 항에 있어서, 상기 곡률 반경(R)은, 상기 굴곡진 영상측 표면(136)과 상기 영상 평면(128) 사이의 축 방향 거리(s)의 1.3배인 것을 특징으로 하는, 마이크로 리소그래피 투영 노광 장치의 투영 대물 렌즈.
- 투영 대물 렌즈의 영상 평면에 배치될 수 있는 감광 층에 마스크를 이미징하기 위한 마이크로 리소그래피 투영 노광 장치의 투영 대물 렌즈로서, 상기 투영 대물 렌즈는 담금 작업용으로 디자인되고, 담금 액(134)이 상기 감광 층(126)에 인접하며,상기 담금 액(134)이, 상기 투영 대물 렌즈의 대상 측에 담금 액(134)에 인접한 매체(L205)와의 경계면(236)을 형성하며, 상기 경계면(236)은, 최대 곡률 반경(R)이 곱 m?s와 동등하도록, 상기 마스크를 향하여 볼록하게 굴곡져 있고, s가 상기 경계면과 상기 영상 평면 사이의 축 방향 거리이며, m은 20과 120 사이의 실수 인 것을 특징으로 하는 마이크로 리소그래피 투영 노광 장치의 투영 대물 렌즈.
- 청구항 5에 있어서, m이 40과 100 사이인 것을 특징으로 하는, 마이크로 리소그래피 투영 노광 장치의 투영 대물 렌즈.
- 청구항 6에 있어서, m이 70과 90 사이인 것을 특징으로 하는, 마이크로 리소그래피 투영 노광 장치의 투영 대물 렌즈.
- 청구항 5 내지 7 중 어느 한 항에 있어서, 상기 경계면(236)은, 사인(sine)이 0.5와 0.98의 사이인 최대 입사각으로 광선이 상기 경계면(236)을 통과하도록, 대상 평면을 향해 볼록하게 굴곡진 것을 특징으로 하는, 마이크로 리소그래피 투영 노광 장치의 투영 대물 렌즈.
- 청구항 8에 있어서, 상기 최대 입사각의 사인이 0.85와 0.95 사이인 것을 특징으로 하는, 마이크로 리소그래피 투영 노광 장치의 투영 대물 렌즈.
- 청구항 9에 있어서, 상기 최대 입사각의 사인이 0.87와 0.94 사이인 것을 특징으로 하는, 마이크로 리소그래피 투영 노광 장치의 투영 대물 렌즈.
- 청구항 1 내지 3, 5 내지 7 중 어느 한 항에 있어서, 상기 투영 대물 렌즈(120)는, 적어도 2개의 이미징 미러(S1, S2)를 갖고 적어도 2개의 중간 영상이 형성되는, 반사 굴절 대물 렌즈인 것을 특징으로 하는, 마이크로 리소그래피 투영 노광 장치의 투영 대물 렌즈.
- 청구항 1 내지 3, 5 내지 7 중 어느 한 항에 따른 투영 대물 렌즈(120; 120')에 의한 것을 특징으로 하는, 마이크로 구조 컴포넌트를 제조하기 위한 마이크로 리소그래피 투영 노광 장치.
- a) 감광재 층(126)이 적어도 부분적으로 적용되는 기판(130)을 구비시키는 단계;b) 이미징될 구조를 포함하는 마스크(124)를 구비시키는 단계;c) 청구항 1 내지 3, 5 내지 7 중 어느 한 항에 따른 투영 대물 렌즈(120; 120')를 포함하는 투영 노광 장치를 구비시키는 단계;d) 상기 투영 노광 장치의 도움으로 상기 감광재 층(126)의 영역에 마스크(124)의 적어도 일부를 투영시키는 단계를 포함하는 마이크로 리소그래피에 의한 마이크로 구조 컴포넌트 제조 방법.
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- 2004-12-27 KR KR1020067016193A patent/KR101115111B1/ko not_active IP Right Cessation
- 2004-12-27 CN CN200910266224A patent/CN101727021A/zh active Pending
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- 2004-12-27 WO PCT/EP2004/014727 patent/WO2005081067A1/en not_active Application Discontinuation
- 2004-12-27 JP JP2006552475A patent/JP2007522508A/ja active Pending
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US20080304033A1 (en) | 2008-12-11 |
EP1714192A1 (en) | 2006-10-25 |
KR20060129381A (ko) | 2006-12-15 |
US20110228246A1 (en) | 2011-09-22 |
WO2005081067A1 (en) | 2005-09-01 |
CN101727021A (zh) | 2010-06-09 |
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US20070165198A1 (en) | 2007-07-19 |
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