KR100971442B1 - 광 데이터 저장매체의 제조방법, 광 데이터 저장매체와,상기 방법을 수행하기 위한 장치 - Google Patents
광 데이터 저장매체의 제조방법, 광 데이터 저장매체와,상기 방법을 수행하기 위한 장치 Download PDFInfo
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Abstract
Description
Claims (15)
- 적어도 1개의 기판(11)과, 이 기판(11) 상에 적층되고 투명 스페이서층과 투명 커버층(12) 중에서 적어도 1개의 층을 포함하는 복수의 층을 구비하고, 이 적어도 1개의 층은, 회전하는 기판(11) 위에 액체를 도포하고, 이 액체를 내부 반경 ri와 외부 반경 ro 사이에서 균일한 층으로 퍼지게 하기 위해 이 기판(11)을 더 회전시키며, 이 액체층(12)을 UV 방사선에의 노광에 의해 고화시켜 형성되는, 광 데이터 저장매체의 제조방법에 있어서,회전하는 기판 상에 액체를 도포한 후에,ri에 위치한 액체층(12)의 온도 상승이 값 δTri를 갖는 한편,r1와 r0 사이의 액체층(12)의 온도 상승이 점차 증가하며,ro에 위치한 액체층(12)의 온도 상승이 값 δTro>δTri를 갖도록, 액체층(12)을 가열수단(14)에 의해 가열하는 것을 특징으로 하는 광 데이터 저장매체의 제조방법.
- 제 1항에 있어서,ri와 ro 사이의 온도 상승은, δTro 및 δTri가 제로값이 될 때 발생되는 반경방향의 두께 프로파일의 형상과 유사한 형상을 갖는 반경방향의 온도 프로파일을 갖는 것 을 특징으로 하는 광 데이터 저장매체의 제조방법.
- 제 1항 또는 제 2항에 있어서,상기 가열수단은, 기판(11) 상의 ri보다 큰 반경을 갖는 영역에 IR 방사빔을 조사하여, 액체층(12)에 원하는 반경방향의 온도 프로파일을 일으키는 적외선 가열장치(14)를 구비한 것을 특징으로 하는 광 데이터 저장매체의 제조방법.
- 제 1항 또는 제 2항에 있어서,상기 가열수단은, 회전 중에 기판이 장착되며 액체층(12)에 원하는 반경방향의 온도 프로파일을 일으키는 가열된 표면을 갖는 가열된 척을 구비한 것을 특징으로 하는 광 데이터 저장매체의 제조방법.
- 제 1항 또는 제 2항에 있어서,상기 가열수단은, 노즐에서 분사되어 액체층(12)에 원하는 반경방향의 온도 프로파일을 일으키는 가열된 가스의 지향성 흐름을 포함하는 것을 특징으로 하는 광 데이터 저장매체의 제조방법.
- 제 1항 또는 제 2항에 있어서,기판(11)의 수 mm 폭의 외주부 구역을 마스크(16)로 차폐하여, 이 구역에 있는 액체층의 UV 방사빔에의 노광을 방지하는 것을 특징으로 하는 광 데이터 저장매체의 제조방법.
- 제 6항에 있어서,노광된 부분에 있는 액체층(12)의 노광 후에, 기판(11)으로부터 외주부 구역에 있는 노광되지 않은 액체(12b)를 제거할 수 있는 회전 주파수로 기판(11)을 회전시키는 것을 특징으로 하는 광 데이터 저장매체의 제조방법.
- 제 1항 또는 제 2항에 있어서,산소를 포함하는 분위기와, 액체층(12)의 수 ㎛의 상단부를 산소저해를 사용하여 고화되지 않을 상태로 유지하는 노광 강도에서, 노광이 발생하는 것을 특징으로 하는 광 데이터 저장매체의 제조방법.
- 청구항 8에 기재된 방법을 사용하여 제조되는 광 데이터 저장매체에 있어서,스탬퍼가 액체층(22)의 고화되지 않은 상단부 내부로 가압되고,그후, 방사빔에의 노광에 의해 상기 상단부가 고화되며,완전히 고화된 액체층(22)의 상단부에서 스탬퍼(23)를 분리하고,상기 광 데이터 저장매체를 완성하기 위해 추가적인 층들이 형성되는 과정을 추가로 포함하는 것을 특징으로 하는 광 데이터 저장매체.
- 제 9항에 있어서,상기 스탬퍼(23)는 UV 방사빔에 투명하며, 투명 스탬퍼(23)를 통해 조사된 UV 방사빔에 의해 상기 상단부가 고화되는 것을 특징으로 하는 광 데이터 저장매체.
- 제 1항 또는 제 2항에 기재된 방법을 수행하는데 사용되는 장치에 있어서,기판(11)과, 이 기판(11) 상에 적층된 복수의 층을 수납하는 수단과,기판(11)을 회전시키는 수단과,회전하는 기판(11) 위에 액체를 도포하고, 이 액체를 내부 반경 ri와 외부 반경 ro 사이에서 균일한 층으로 퍼지게 하기 위해 이 기판(11)을 더 회전시켜, 투명 스페이서층과 투명 커버층(12) 중에서 적어도 한 개를 형성하는 수단과,회전하는 기판(12) 상에 액체를 도포한 후에,ri에 위치한 액체층(12)의 온도 상승이 값 δTri를 갖는 한편,r1와 r0 사이의 액체층(12)의 온도 상승이 점차 증가하며,ro에 위치한 액체층(12)의 온도 상승이 값 δTro>δTri를 갖도록, 액체층을 가열하는 수단(14)과,가열단계의 직후에 UV 방사빔에의 노광에 의해 액체층(12)을 고화시키는 수단을 구비한 것을 특징으로 하는 장치.
- 제 11항에 있어서,상기 가열수단은, 기판(11) 상의 ri보다 큰 반경을 갖는 영역에 IR 방사빔을 조사하여 액체층(12)에 원하는 반경방향의 온도 프로파일을 일으키는 적외선 가열장치(14)를 구비한 것을 특징으로 하는 장치.
- 제 11항에 있어서,상기 가열수단이, 기판이 회전 중에 그 위에 장착되며, 액체층(12)에 원하는 반경방향의 온도 프로파일을 일으키는 가열된 표면을 갖는 가열된 척을 구비한 것을 특징으로 하는 장치.
- 제 11항에 있어서,상기 가열수단은, 노즐에서 분사되어 액체층(12)에 원하는 반경방향의 온도 프로파일을 일으키는 가열된 가스의 지향성 흐름을 포함하는 것을 특징으로 하는 장치.
- 제 11항에 있어서,기판(11)의 수 mm 폭의 외주부 구역을 차폐하여, 이 구역에 있는 액체층(12)의 UV 방사빔에의 노광을 방지하는 마스크(16)를 갖는 것을 특징으로 하는 장치.
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US (2) | US7897206B2 (ko) |
EP (1) | EP1588362B1 (ko) |
JP (1) | JP2006513516A (ko) |
KR (1) | KR100971442B1 (ko) |
CN (1) | CN100358032C (ko) |
AT (1) | ATE377825T1 (ko) |
AU (1) | AU2003274611A1 (ko) |
DE (1) | DE60317370T2 (ko) |
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DE60307271T2 (de) * | 2002-05-21 | 2007-10-18 | Koninklijke Philips Electronics N.V. | Herstellungsverfahren eines optischen speichermediums und ein solches medium |
CN101027138B (zh) * | 2004-06-03 | 2010-08-25 | 芝浦机械电子装置股份有限公司 | 树脂层形成方法及树脂层形成装置、盘及盘的制造方法 |
CN101018616B (zh) * | 2004-09-14 | 2010-04-21 | 欧利生电气株式会社 | 树脂膜的形成方法及装置 |
JP2006155726A (ja) * | 2004-11-29 | 2006-06-15 | Tohoku Pioneer Corp | 光ディスクの製造方法および製造装置 |
FR2891477B1 (fr) * | 2005-10-04 | 2008-02-15 | Essilor Int | Procede de coloration d'une lentille par centrifugation ("spin-coating") et lentille coloree obtenue par ce procede |
US20070105400A1 (en) * | 2005-11-08 | 2007-05-10 | Unaxis Balzers Ag | Method and apparatus for control of layer thicknesses |
JP4529895B2 (ja) * | 2005-12-22 | 2010-08-25 | ソニー株式会社 | 光ディスクの製造方法 |
DE102006061585B4 (de) * | 2006-08-23 | 2013-11-28 | Singulus Technologies Ag | Verfahren und Vorrichtung zur Rotationsbeschichtung von Substraten |
JP5262117B2 (ja) * | 2007-04-11 | 2013-08-14 | 株式会社リコー | スピンコート装置及びその温度制御方法、並びに光ディスク製造装置及び光ディスク製造方法 |
DE102007021249A1 (de) * | 2007-05-07 | 2008-11-20 | Singulus Technologies Ag | Sauerstoff-Inhibierung eines härtbaren Materials beim Strukturieren von Substraten |
EP2328149A1 (en) * | 2009-11-26 | 2011-06-01 | Pheenix Alpha AB | Method and arrangement to create a surface layer on a disc. |
US20140273498A1 (en) * | 2013-03-15 | 2014-09-18 | Dainippon Screen Mfg. Co., Ltd. | Substrate processing apparatus and substrate processing method |
EP2995438A1 (en) * | 2014-09-10 | 2016-03-16 | Airbus Operations GmbH | A method of monitoring the process of coating a workpiece surface |
CN111842056B (zh) * | 2020-07-29 | 2021-12-10 | 中科同帜半导体(江苏)有限公司 | 一种电子元器件生产用滚动涂胶装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1173691A (ja) | 1997-08-29 | 1999-03-16 | Sony Corp | 光ディスク製造方法及びその方法により製造された光ディスク |
JP2002184047A (ja) | 2000-12-12 | 2002-06-28 | Pioneer Electronic Corp | 成膜装置および成膜方法 |
JP2002184048A (ja) | 2000-12-12 | 2002-06-28 | Pioneer Electronic Corp | 成膜装置および成膜方法 |
JP2003233936A (ja) | 2002-02-07 | 2003-08-22 | Pioneer Electronic Corp | 光ディスクの製造方法及びその製造装置 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59232339A (ja) * | 1983-06-16 | 1984-12-27 | Toshiba Corp | フオトレジスト膜形成方法 |
JP2516573B2 (ja) * | 1987-10-22 | 1996-07-24 | 日本コロムビア株式会社 | 塗布装置 |
JPH01173691A (ja) | 1987-12-28 | 1989-07-10 | Matsushita Electric Ind Co Ltd | プリント配線基板のスクリーン印刷方法 |
JPH01262968A (ja) * | 1988-04-14 | 1989-10-19 | Daicel Chem Ind Ltd | スピンコータ |
JP2001176125A (ja) | 1988-11-08 | 2001-06-29 | Pioneer Electronic Corp | 光学式情報記録担体 |
US5580607A (en) * | 1991-07-26 | 1996-12-03 | Tokyo Electron Limited | Coating apparatus and method |
US6042712A (en) * | 1995-05-26 | 2000-03-28 | Formfactor, Inc. | Apparatus for controlling plating over a face of a substrate |
JPH09167382A (ja) | 1995-12-14 | 1997-06-24 | Tosoh Corp | 貼り合わせディスク及びその製造方法 |
US5916368A (en) * | 1997-02-27 | 1999-06-29 | The Fairchild Corporation | Method and apparatus for temperature controlled spin-coating systems |
EP1047055A1 (en) | 1999-04-22 | 2000-10-25 | 3M Innovative Properties Company | Optical storage medium |
US6695922B2 (en) * | 1999-12-15 | 2004-02-24 | Tokyo Electron Limited | Film forming unit |
JP4258096B2 (ja) * | 2000-04-25 | 2009-04-30 | ソニー株式会社 | 光記録媒体の製造装置及び製造方法 |
EP1215670A3 (en) * | 2000-12-12 | 2003-05-28 | Pioneer Corporation | Film forming apparatus and film forming method |
JP2002279707A (ja) | 2001-03-22 | 2002-09-27 | Toshiba Corp | 片面2層ディスクの作製方法、該2層ディスク及び記録再生装置 |
CN100553794C (zh) * | 2002-12-05 | 2009-10-28 | 辛古勒斯技术股份公司 | 用于层厚度控制的方法及设备 |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1173691A (ja) | 1997-08-29 | 1999-03-16 | Sony Corp | 光ディスク製造方法及びその方法により製造された光ディスク |
JP2002184047A (ja) | 2000-12-12 | 2002-06-28 | Pioneer Electronic Corp | 成膜装置および成膜方法 |
JP2002184048A (ja) | 2000-12-12 | 2002-06-28 | Pioneer Electronic Corp | 成膜装置および成膜方法 |
JP2003233936A (ja) | 2002-02-07 | 2003-08-22 | Pioneer Electronic Corp | 光ディスクの製造方法及びその製造装置 |
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CN100358032C (zh) | 2007-12-26 |
DE60317370T2 (de) | 2008-08-21 |
WO2004064055A1 (en) | 2004-07-29 |
US7897206B2 (en) | 2011-03-01 |
TWI344643B (en) | 2011-07-01 |
TW200421292A (en) | 2004-10-16 |
EP1588362B1 (en) | 2007-11-07 |
US20110097532A1 (en) | 2011-04-28 |
KR20050097941A (ko) | 2005-10-10 |
DE60317370D1 (de) | 2007-12-20 |
US20060059501A1 (en) | 2006-03-16 |
AU2003274611A1 (en) | 2004-08-10 |
ATE377825T1 (de) | 2007-11-15 |
JP2006513516A (ja) | 2006-04-20 |
CN1739152A (zh) | 2006-02-22 |
EP1588362A1 (en) | 2005-10-26 |
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