KR100926437B1 - Evaporation material supply apparatus and substrate processing apparatus having the same - Google Patents

Abstract

The present invention relates to a deposition material supply apparatus and a substrate processing apparatus having the same, which can be supplied to a substrate by vaporizing the organic material in a desired amount at the same time the organic material is filled in a large capacity and stored without alteration, in particular the deposition material according to the present invention The supply apparatus includes a crucible having a vaporization space in which a raw material is vaporized in an adjacent point of a portion of which one side is opened and opened, and a storage space in which the raw material is filled in communication with the vaporization space; A heating unit provided outside the vaporization space formed in the crucible to supply heat for vaporizing the raw material; A cooling unit provided outside the storage space formed in the crucible to prevent thermal deterioration of raw materials stored in the storage space; An injection amount measuring sensor for measuring an injection amount of a raw material; The raw material filled in the crucible is continuously or periodically transferred from the storage space to the vaporization space, and the feed rate of the raw material is controlled by controlling the feed rate of the raw material according to the injection amount of the raw material measured by the injection amount measuring sensor. It includes a unit.

Description

Deposition material supply apparatus and equipment for treating substrate having the same

The present invention relates to a deposition material supply apparatus and a substrate processing apparatus having the same, and more particularly, a deposition material supply capable of supplying an organic material to a substrate by vaporizing the organic material in a desired amount while storing the organic material in a large capacity and without altering it. An apparatus and a substrate processing apparatus having the same.

Unlike liquid crystal displays, organic light emitting devices (OLEDs) emit light by themselves and thus require no backlight, and thus consume less power. In addition, since the viewing angle is wide and the response speed is high, the display device using the same may implement an excellent image without problems of the viewing angle and afterimage.

The organic material used in the organic thin film deposition process for manufacturing the organic light emitting device does not require high vapor pressure, unlike the inorganic material, it is easy to decompose and denature at high temperatures. Due to the characteristics of such a material, a conventional organic thin film is charged onto a tungsten crucible, and the crucible is heated to vaporize the organic material and deposited on the substrate. However, since the amount of deposition material that can be stored in the crucible is limited, the deposition material must be frequently refilled, and the organic thin film deposition apparatus must be stopped every time. Therefore, a method of increasing the filling amount of the deposition material has been proposed in order to prolong the downtime of the apparatus, but a problem arises in that the deposition material is deteriorated by the heating means of more heat required to heat the increased crucible to sublimate the deposition material. It became.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and is provided with a deposition material supply apparatus capable of filling organic materials with a large capacity to extend downtime of the deposition apparatus and at the same time preventing the filled organic materials from being deteriorated. One substrate processing apparatus is provided.

In addition, the present invention provides a deposition material supply apparatus and a substrate processing apparatus having the same, which can prevent the non-uniform diffusion of the organic material gas by vaporizing the filled organic material at an appropriate speed in a desired amount.

In the vapor deposition material supply apparatus according to the present invention, a vaporization space in which a raw material is vaporized is formed in an adjacent point of a portion at which one side is opened, and a crucible is formed in communication with the vaporization space to form a storage space in which the raw material is filled. ; A heating unit provided outside the vaporization space formed in the crucible to supply heat for vaporizing the raw material; A cooling unit provided outside the storage space formed in the crucible to prevent thermal deterioration of raw materials stored in the storage space; A connection pipe having one side connected to the vaporization space side of the crucible to form a flow path through which the vaporized raw material flows; An injector connected to the other side of the connecting pipe and sprayed with vaporized raw material; A fastening member connected to one side of the connection pipe and coupled to the crucible; An injection amount measuring sensor for measuring an injection amount of the raw material injected from the injector; The raw material filled in the crucible is continuously or periodically transferred from the storage space to the vaporization space, and the feed rate of the raw material is controlled by controlling the feed rate of the raw material according to the injection amount of the raw material measured by the injection amount measuring sensor. A unit; The crucible, the transfer unit and the injector integrally support, and installed on the rail provided in the direction in which the injector is directed to include a support moving along the rail.

At this time, the cooling unit is characterized in that the cooling jacket formed around the outer peripheral surface of the crucible formed with a cooling flow path for cooling water flow.

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In addition, the diameter of the connector is characterized in that 20 ~ 200mm.

And, the inner wall of the vaporization space formed in the crucible is characterized in that the metal sheet is provided.

The transfer unit is provided in the inside of the crucible to push the raw material to transfer; A rod having one side connected to the head and the other side provided outside the crucible and integrally moved with the head; And a driving unit connected to the other side of the rod to move the rod and to control the feed speed of the head according to the injection amount of the raw material measured by the injection amount measurement sensor.

At this time, the drive unit is characterized in that the motor or hydraulic cylinder.

And, the heating unit is characterized in that the core heater or lamp heater.

The substrate processing apparatus according to the present invention includes a chamber in which a reaction space is formed, an organic raw material supply part for supplying a raw material vaporized in the reaction space, and a substrate holder for supporting a substrate, wherein the organic raw material supply part has one side. A crucible having a vaporization space in which the raw material is vaporized in an adjacent point of the opened and opened portion, and a storage space in which the raw material is filled in communication with the vaporization space; A heating unit provided outside the vaporization space formed in the crucible to supply heat for vaporizing the raw material; A cooling unit provided outside the storage space formed in the crucible to prevent thermal deterioration of raw materials stored in the storage space; A connection pipe having one side connected to the vaporization space side of the crucible to form a flow path through which the vaporized raw material flows; An injector connected to the other side of the connecting pipe and sprayed with vaporized raw material; A fastening member connected to one side of the connection pipe and coupled to the crucible; An injection amount measuring sensor for measuring an injection amount of the raw material injected from the injector; The raw material filled in the crucible is continuously or periodically transferred from the storage space to the vaporization space, and the feed rate of the raw material is controlled by controlling the feed rate of the raw material according to the injection amount of the raw material measured by the injection amount measuring sensor. A unit; And a support part integrally supporting the crucible, the transfer unit, and the injector, and installed on a rail provided in a direction in which the injector is directed and moved along the rail.

In this case, the chamber is divided into a plurality of reaction spaces, and a plurality of organic raw material supply units are provided in the chamber so as to be disposed in the plurality of reaction spaces, respectively, and the substrate holder is positioned to face each of the organic raw material supply units. Characterized in that the transfer.

According to the present invention, since a cooling unit is provided in the storage space in which organic materials are filled and stored to prevent deterioration of organic materials due to heat, a large amount of organic materials can be filled and used in the deposition material supply apparatus to operate the apparatus. There is an effect that can extend the stop period. Accordingly, the process efficiency of organic thin film deposition can be improved.

In addition, the amount of organic material is vaporized by controlling the heating unit that transfers the filled organic material to the heating space at a desired conveying speed and heats the heating space, so that organic material is deposited by preventing uneven diffusion of gas. There is an effect that can improve the quality of the organic thin film.

Hereinafter, with reference to the accompanying drawings will be described an embodiment of the present invention in more detail.

However, the present invention is not limited to the embodiments disclosed below, but will be implemented in various forms, and only the embodiments are intended to complete the disclosure of the present invention, and to those skilled in the art to fully understand the scope of the invention. It is provided to inform you.

1 is a schematic configuration diagram showing a system in which a substrate processing apparatus according to the present invention is used, and FIG. 2 is a schematic cross-sectional view showing a substrate processing apparatus according to the present invention.

As shown in the figure, the substrate processing system describes an inline method that can rapidly process a large amount of substrate 10 as an example. Such a substrate processing system may include a loading unit 1000 in which a substrate 10 to be processed is loaded, an unloading unit 5000 in which a substrate 10 in which a process is completed and positioned apart from the loading unit 1000 is finished. And a plurality of substrate processing units 3000a to 3000c disposed inline between the loading unit 1000 and the unloading unit 700 to process the substrate 10. In addition, the processing preparation unit 2000 is disposed at the front end of the plurality of substrate processing units 3000a to 3000c and mounted on the substrate holder 200 to align the substrate 10 loaded with the substrate processing units 3000a to 3000c, and the substrate. And an unloading preparation unit 4000 which separates the substrate 10 from the substrate holder 200 in order to carry out the processed substrate 10 disposed at the ends of the processing units 3000a to 3000c to the unloading unit 5000. do.

The loading unit 1000 is disposed at one end of the substrate processing system and is a space in which the plurality of substrates 10 on which the organic thin film is to be deposited is waiting. A substrate cassette on which the plurality of substrates 10 is mounted is disposed and taken out from the cassette. A buffer stage is installed where the substrate 10 is waiting for the deposition process.

The substrate processing units 3000a to 3000c are spaces between the loading unit 1000 and the unloading unit 5000 to deposit organic thin films, and include a chamber 400 in which at least one reaction space is defined. At least one organic material supply part 100 provided corresponding to the reaction space in the chamber 400 and a substrate holder 200 provided to be transported to face the organic material supply part 100 to support and transport the substrate 10. ). In addition, in the case where one substrate processing unit 3000a to 3000c is installed and one oil source supply unit 100 is installed, a separate transfer rail for transferring the substrate holder 200 is not required, but the substrate processing units 3000a to 3000c may be used. In the case where a plurality of organic material supply units 100 are installed, a plurality of) may be transported along the transfer rail 300 to face the substrate 10 to the organic raw material supply units 100. Of course, the transfer method of the substrate holder 200 is not limited to the transfer rail, various transfer methods that can be used by those skilled in the art may be applied.

The chamber 400 is partitioned so that a single or multiple reaction spaces are provided, and although not shown in the drawing, a gate through which the substrate 10 or the substrate holder 200 is introduced and drawn out is provided, and the chamber 400 is provided inside the chamber 400. To form a vacuum or exhaust line for exhausting the unreacted gas, etc. in the chamber 400 is formed.

The substrate holder 200 may be any type of holder as long as the substrate holder 200 can be transported while supporting the substrate 10 horizontally or vertically. In the present invention, a holder of a method of clamping the edge of the substrate 10 to be supported in a vertical state has been proposed. At this time, the substrate holder 200 is transported while being supported and guided by the transport rail 300 provided in the chamber 400.

In addition, an organic raw material supply unit 100 for supplying an organic raw material deposited on the substrate 10 is disposed at a point facing the substrate holder 200.

3 is a schematic cross-sectional view showing an apparatus for supplying a deposition material according to the present invention. As shown in the drawing, the organic material supply unit 100 includes a storage space 110a in which a raw material is filled and vaporization in which the raw material is vaporized. A crucible (110) formed by communicating with the space (110b) in a straight line; A transfer unit 120 for continuously or periodically transferring the raw material filled in the crucible 110 from the storage space 110a to the vaporization space 110b; A heating unit (130) provided outside the vaporization space (110b) formed in the crucible (110) for supplying heat to vaporize the raw material to the vaporization space (110b); A cooling unit (140) provided outside the storage space (110a) formed in the crucible (110) to prevent thermal deterioration of raw materials stored in the storage space (110a); A connection pipe 150 having one side connected to the vaporization space 110b side of the crucible 110 to form a flow path through which the vaporized raw material flows; It is connected to the other side of the connecting pipe 150 includes an injector 160 is injected the vaporized raw material.

The present invention provides an apparatus for manufacturing an organic light emitting device (OLED), and it is preferable that, for example, an organic material is used as the raw material presented in the present invention.

Crucible 110 is formed in a cylindrical pipe shape that one side is opened. At this time, the inside of the crucible 110 is formed with a storage space (110a) is filled with a raw material on the lower side, the vaporization space (110b) is formed on the upper side is vaporized. The storage space 110a and the vaporization space 110b are not spaces partitioned by a predetermined partitioning means, but spaces classified according to the state of the raw material. Therefore, the space in which the raw material exists in the solid or liquid state is defined as a storage space 110a, and the space in which the solid or liquid raw material is vaporized by heat is defined as the vaporization space 110b. Although not shown in the crucible 110, a vacuum line may be connected to maintain the inside of the crucible 110 in an environment of ultra-vacuum pressure during the deposition process.

Transfer unit 120 is a means for gradually transferring the raw material filled in the storage space (110a) of the crucible 110 to the vaporization space (110b), which is provided inside the crucible 110 to push the raw material The head 121 to be transferred, one side is connected to the head 121, the other side is provided to the outside of the crucible 110, the rod 122 is moved integrally with the head 121, and the rod ( It is connected to the other side of the 122 includes a drive unit for moving the rod (122).

Any means may be used as long as the driving unit is a means for moving the rod 122 up and down, such as a motor 123 or a hydraulic cylinder. In the present invention, the motor 123 is used as a preferred embodiment. In other words, the motor 123 driven by the power source, the ball screw 124 rotated in conjunction with the rotation of the motor 123, and up and down by the rotation of the ball screw 124 on the ball screw 124 The lifting body 125 is moved, and the support body 126 is fixed to the lifting body 125 and the other side to support the rod 122 so as to move integrally with the lifting body 125. When the ball screw 124 is rotated by the rotation of the motor 123 and the lifting body 125 moves up and down, the support body 126 is integrally moved with the lifting body 125 and the rod 122 is moved up and down. Move to. Accordingly, the head 121 provided on the top of the rod 122 transfers the raw material from the storage space 110a of the crucible 110 to the vaporization space 110b.

The heating unit 130 is a means for supplying thermal energy for heating and vaporizing a raw material transferred from the storage space 110a of the crucible 110 to the vaporization space 110b. The heating unit 130 may supply thermal energy for vaporizing the raw material. If possible, any means may be used. For example, a core heater or a lamp heater may be used. In this embodiment, a core heater was used. The heating unit 130 is formed by winding a resistance heating wire on the outer circumferential surface of the portion where the vaporization space is formed in the outer circumferential surface of the crucible 110. The resistance heating wire 131 used at this time is made of Ta, W, Mo metal or alloy wires thereof.

In addition, in order to facilitate heating of the raw material by the heating unit 130, a metal sheet 111 having high thermal conductivity is provided on an inner wall of a portion of the inner wall of the crucible 110 where the vaporization space 110b is formed. Can be. At this time, the metal sheet 111 is preferably formed in a donut or pipe shape.

The cooling unit 140 is a means for preventing the raw material filled in the storage space 110a of the crucible 110 from being deteriorated by the heat of the heating unit 130. The cooling unit 140 stores the storage space 110a in which the raw material is stored. As long as it can cool, any means may be used. For example, in this example a cooling jacket was used. The cooling unit 140 is provided to surround the outer circumferential surface of the portion in which the storage space 110a is formed among the outer circumferential surfaces of the crucible 110, preferably a portion adjacent to the position where the heating unit 130 is installed. The cooling unit 140 is formed by surrounding a cooling passage 141 through which cooling water flows on the outer circumferential surface of the portion of the outer circumferential surface of the crucible 110 where the storage space 110a is formed.

And the upper part of the crucible 110 is connected to the connecting pipe 150 for flowing the source gas vaporized by the heating unit 130 to the injector 160.

The connector 150 may be bent into a predetermined shape so as to be connected to the injector 160. In addition, a heating line 151 is provided at the outer circumferential portion of the connection pipe 150 to prevent the vaporized source gas from phase-changing back into a liquid or a solid.

At this time, the diameter and length of the connecting pipe 150 has a great influence on the modification of the raw material. In other words, the modification of the raw material is caused by the high temperature and pressure in the crucible 110. Therefore, in order to prevent denaturation of the raw material, the temperature and pressure in the crucible 110 must be kept low. In addition, since the vaporization temperature of the raw material is greatly affected by the degree of vacuum, and as the degree of vacuum decreases, the vaporization temperature also tends to be lowered, so keeping the vacuum degree low in the crucible 110 is more efficient in preventing the modification of the raw material.

The degree of vacuum in the crucible 110 can be interpreted as a concept of conductance, and the conductance is greatly influenced by the length and diameter of the pipe. Equation 1 below calculates conductance.

[Equation 1]

C = 3.81 (T / M) ^1/2 D ³ /(L+1.33D)

D: diameter of pipe L: length of pipe

T: temperature M: molecular weight of the raw material

As can be seen in [Equation 1], the conductance tends to improve as the length of the pipe is shorter and the diameter is larger. Therefore, in order to reduce the degree of vacuum in the crucible 110 in the present embodiment, it is preferable to shorten the length of the connection pipe 150 as much as possible and to increase the diameter of the connection pipe 150. In particular, since the diameter of the connection pipe 150 largely influences the conductance value rather than the length of the connection pipe 150, in this embodiment, the organic material and the crucible 110 used as raw materials are considered in consideration of the temperature of the connection pipe ( 150) was made to be 20 ~ 200mm in diameter. The reason is that if the diameter of the connector 150 is 20 mm or less, the conductance is too low to prevent the raw material from being deteriorated. If the diameter of the connector 150 is 200 mm or more, the compatibility with other devices is limited. Because there is. In particular, the diameter of the connector 150 is preferably implemented to 70mm in consideration of the deterioration prevention efficiency of the raw material and compatibility with other devices.

In addition, one side of the connecting pipe 150 is connected to the fastening member 170, the fastening member 170 is a screw thread is formed is screwed to the upper end of the crucible 110. At this time, the storage space (110a), the vaporization space (110b) of the crucible 110, the interior of the fastening member 170 and the interior of the connection pipe 150 is in communication. Thus, as the fastening member 170 and the crucible 110 are screwed, the fastening member 170 and the crucible 110 can be easily coupled and separated. Accordingly, when the raw material is filled, the fastening member 170 may be separated from the fastening crucible 110, and then the raw material may be easily filled in the storage space of the crucible 110.

In addition, the injector 160 is connected to the other side of the connection pipe 150.

The injector 160 has a flow passage communicating with the connecting pipe 150 therein, and a gas injection hole 161 is formed at the end thereof to inject the vaporized raw material. At this time, the injector 160 is formed in a linear manner so that the gas injection holes 161 are arranged in a straight line to face the substrate 10. In addition, a heating line 162 is also provided on the outer circumferential portion of the injector 160 to prevent the vaporized raw material from phase-changing back into a liquid or a solid.

The injector 160 affects the degree of vacuum of the crucible 110 as it communicates with the connector 150. Therefore, for the same reason as to limit the diameter of the connector 150, it may be preferable to manufacture the diameter of the injector 160 to 20 ~ 200mm, preferably the diameter of the injector 160 to correspond to the connector 150 It is desirable to implement 70mm. In addition, the diameter of the gas injection hole 161 of the injector 160 is preferably formed larger than 8mm.

The crucible 110, the transfer unit 120, and the injector 160 are integrally supported by the support 180 to be installed in the chamber 400. In addition, the support unit 180 is installed on the rail 185 provided to allow the injector 160 to be transferred in the direction of the substrate 10 in order to adjust the distance between the injector 160 and the substrate 10. .

The support unit 180 includes a moving body 181 moving along the rail 185 and the moving body 181 to support the crucible 110 and the transfer unit 120 integrally. And a support plate 183 for supporting the injector 160. Of course, the shape of the moving body 181, the support frame 182 and the support plate 183 is not limited, the shape capable of integrally supporting the crucible 110, the transfer unit 120 and the injector 160. And structure may be sufficient. In addition, the moving body 181 may be configured by any means as long as it can be moved on the rail 183. For example, the driving method by the ball screw, the driving method by the LM guide may be applied.

In front of the injector 160, an injection amount measuring sensor 184 measuring the injection amount of the vaporized raw material injected from the injector 160 is installed. Thus, the amount of raw material to be vaporized is controlled by controlling the heating temperature of the heating unit 130 and the moving speed of the head 121 of the transfer unit 120 according to the injection amount of the raw material measured by the injection amount measuring sensor 184. do.

In addition, the shutter 190 selectively restricts the flow of the raw material injected from the injector 160 in front of the injector 160, preferably between the space where the injector 160 and the substrate holder 200 are located. Is installed. The shutter 190 is manufactured in a shape having a surface that can block the front of the gas injection hole 161 formed in the injector 160, and is operated by a rotation method or a slide method. In the present exemplary embodiment, the shutter 190 is rotated by the driving of the motor 191 to selectively open or close the front of the injector 160. Of course, the shape and manner of operation of the shutter 190 is not limited to the embodiments shown, as long as it can selectively limit the flow of the raw material injected from the injector 160 to the substrate 10.

In addition, as shown in FIG. 1, the unloading unit 5000 is disposed at the other end of the substrate processing system and is a space in which the plurality of substrates 10 on which the organic thin film is deposited is waiting to be taken out to the outside. The plurality of substrates 10 installed and completed with the deposition process are mounted on the substrate cassette again and transported to the outside.

An operating state of the substrate processing system to which the deposition material supply apparatus and the substrate processing apparatus according to the present invention configured as described above are applied will be described.

4A and 4B are cross-sectional views illustrating usage states of the deposition material supply apparatus according to the present invention.

First, as shown in FIG. 4A, the crucible 110 of the deposition material supply device is separated from the fastening member 170, and then a raw material, that is, an organic material, to be deposited on the substrate 10 in the storage space 110a therein. To fill. Then, the crucible 110 is coupled to the fastening member 170. If a plurality of organic thin films are sequentially stacked, a plurality of substrate processing units 3000a to 3000c are formed to correspond to the organic thin films, and the organic raw material supply unit 100 is installed in each of the substrate processing units 3000a to 3000c. The organic material to be deposited is filled in the crucible 110. At this time, the storage space 110a of the crucible 110 is filled with an organic material in a sufficient amount to continuously or periodically perform the organic thin film deposition process. The organic material filled in the storage space 110a may be stored for a long time without being deteriorated by the cooling of the cooling unit 140. In addition, the crucible 110 and the injector 160 move the fixed body 181 to set the distance between the substrate 10 and the injector 160 to be processed.

When the organic raw material supply unit 100 is prepared as described above, the substrate 10 prepared in the loading unit 1000 is loaded on the processing preparation unit 2000 to mount and align the substrate 10 to the substrate holder 200. The substrate 10 thus prepared is introduced into each of the substrate processing units 3000a to 3000c according to the transfer of the substrate holder 200 and then transferred to the position facing the organic raw material supply unit 100 installed on the substrate processing units 3000a to 3000c. .

If the substrate 10 is transferred and disposed in front of the organic raw material supply unit 100, preferably in front of the injector 160, the transfer unit 120 of the organic raw material supply unit 100 is operated as shown in FIG. 4B. The organic material filled in the storage space 110a of the crucible 110 is transferred to the vaporization space 110b. In other words, as the motor 123 is operated and rotated, the ball screw 124 is rotated, and the lifting body 125 is moved up and down. Then, the support body 126 is integrally moved with the lifting body 125 to move the rod 122 up and down. Accordingly, the head 121 provided at the top of the rod 122 moves the raw material into the crucible 110. It is to transfer from the storage space (110a) to the vaporization space (110b). Then, the organic material is vaporized by heating of the heating unit 130 installed around the vaporization space 110b. At this time, the amount of the organic material vaporized is determined by the heating temperature control of the heating unit 130 and the feed rate control of the head 121 of the transfer unit 120. In addition, the organic material stored in the storage space 110a without reaching the vaporization space 110b is prevented from being altered by cooling of the cooling unit installed around the storage space 110a.

The organic material vaporized by the desired amount in the vaporization space (110b) is injected to the outside of the injector 160 through the gas injection hole 161 formed in the injector 160 via the fastening member 170 and the connection pipe 150. Then, the shutter 190 is operated to open the shutter 190 to smoothly spray the organic material. The injected organic material is deposited on the substrate 10 to form an organic thin film on the substrate 10. At this time, the amount of organic material injected from the injector 160 is measured through the injection amount measuring sensor 184 disposed in front of the injector 160, and the measured value is calculated to calculate the heating temperature and the transfer unit of the heating unit 130 ( The feed speed of the head 121 of 120 is controlled.

If the transfer of the substrate 10 is a continuous process, the shutter 190 installed in front of the injector 160 is always kept open, and the transfer of the substrate 10 is discontinuous, that is, periodically. If so, it is preferable to operate so that the state of the shutter 190 is selectively opened or closed.

When the deposition of a single layer or multiple layers of organic thin films is completed while passing through as many substrate processing units 3000a to 3000c as desired, the substrate 10 is transferred to the unloading preparation unit 4000 and separated from the substrate holder 200. . The separated board | substrate 10 is carried out to the unloading part 5000, and the number of board | substrates which were carried out are mounted in a cassette, and are conveyed to the exterior of a substrate processing system.

In the present invention, the substrate processing system has been described using an inline method capable of quickly processing a large amount of substrates as an example, but is not limited thereto. The substrate processing system may be applied to various types of processing systems capable of depositing organic thin films. In addition, although the description has been made with an example in which the organic thin film is deposited after the substrate and the injector are disposed in the vertical direction, the substrate holder and the organic material supply unit may be installed in the horizontal direction so that the substrate and the injector are disposed in parallel with the ground. will be. Accordingly, the invention has been described with reference to the accompanying drawings and the preferred embodiments described above, but the invention is not limited thereto, but is defined by the claims that follow. Accordingly, the present invention can be variously modified and modified without departing from the technical spirit of the claims to be described later by those skilled in the art.

1 is a schematic configuration diagram showing a system in which a substrate processing apparatus according to the present invention is used,

2 is a schematic cross-sectional view showing a substrate processing apparatus according to the present invention,

3 is a schematic cross-sectional view showing a deposition material supply apparatus according to the present invention,

4A and 4B are cross-sectional views illustrating usage states of the deposition material supply apparatus according to the present invention.

<Explanation of symbols for the main parts of the drawings>

100: organic raw material supply unit 110: crucible

120: transfer unit 130: heating unit

140: cooling unit 150: connector

160: injector 170: fastening member

180: support

Claims (14)

A crucible having a vaporization space in which a raw material is vaporized in an adjacent point of a portion of which one side is opened and opened, and a storage space in which the raw material is filled in communication with the vaporization space; A heating unit provided outside the vaporization space formed in the crucible to supply heat for vaporizing the raw material; A cooling unit provided outside the storage space formed in the crucible to prevent thermal deterioration of raw materials stored in the storage space; A connection pipe having one side connected to the vaporization space side of the crucible to form a flow path through which the vaporized raw material flows; An injector connected to the other side of the connecting pipe and sprayed with vaporized raw material; A fastening member connected to one side of the connection pipe and coupled to the crucible; An injection amount measuring sensor for measuring an injection amount of the raw material injected from the injector; The raw material filled in the crucible is continuously or periodically transferred from the storage space to the vaporization space, and the feed rate of the raw material is controlled by controlling the feed rate of the raw material according to the injection amount of the raw material measured by the injection amount measuring sensor. A unit; And a support part integrally supporting the crucible, the transfer unit, and the injector, and installed on a rail provided in a direction in which the injector is directed and moving along the rail. The method according to claim 1, The cooling unit is a deposition material supply apparatus, characterized in that the cooling jacket formed with a cooling flow path for cooling water flows surrounding the outer peripheral surface of the crucible. delete delete delete delete delete The method according to claim 1, Deposition material supply apparatus characterized in that the diameter of the connector is 20 ~ 200mm. The method according to claim 1, The vapor deposition material supply apparatus, characterized in that the inner wall of the vaporization space formed in the crucible is provided with a metal sheet. The method of claim 1, wherein the transfer unit A head provided in the crucible to push and transfer raw materials; A rod having one side connected to the head and the other side provided outside the crucible and integrally moved with the head; And a driving unit connected to the other side of the rod to move the rod and to control a transfer speed of the head according to the injection amount of the raw material measured by the injection amount measurement sensor. The method according to claim 10, And the drive unit is a motor or a hydraulic cylinder. The method according to claim 1, And the heating unit is a core heater or a lamp heater. A chamber in which a reaction space is formed, an organic raw material supply unit for supplying a raw material vaporized in the reaction space, and a substrate holder for supporting a substrate; The organic raw material supply unit, A crucible having a vaporization space in which a raw material is vaporized in an adjacent point of a portion of which one side is opened and opened, and a storage space in which the raw material is filled in communication with the vaporization space; A heating unit provided outside the vaporization space formed in the crucible to supply heat for vaporizing the raw material; A cooling unit provided outside the storage space formed in the crucible to prevent thermal deterioration of raw materials stored in the storage space; A connection pipe having one side connected to the vaporization space side of the crucible to form a flow path through which the vaporized raw material flows; An injector connected to the other side of the connecting pipe and sprayed with vaporized raw material; A fastening member connected to one side of the connection pipe and coupled to the crucible; An injection amount measuring sensor for measuring an injection amount of the raw material injected from the injector; The raw material filled in the crucible is continuously or periodically transferred from the storage space to the vaporization space, and the feed rate of the raw material is controlled by controlling the feed rate of the raw material according to the injection amount of the raw material measured by the injection amount measuring sensor. A unit; And a support part integrally supporting the crucible, the transfer unit, and the injector, and installed on a rail provided in a direction in which the injector is directed and moving along the rail. The method according to claim 13, The chamber is divided into a plurality of reaction space, The organic raw material supply unit is provided in the chamber so that a plurality of organic raw material supply unit is provided in each of the plurality of reaction space, And the substrate holder is transported so as to face each of the organic raw material supply units.

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