KR100389061B1 - 전해 동박 제조용 전해액 및 이를 이용한 전해 동박 제조방법 - Google Patents
전해 동박 제조용 전해액 및 이를 이용한 전해 동박 제조방법 Download PDFInfo
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- KR100389061B1 KR100389061B1 KR10-2003-0020166A KR20030020166A KR100389061B1 KR 100389061 B1 KR100389061 B1 KR 100389061B1 KR 20030020166 A KR20030020166 A KR 20030020166A KR 100389061 B1 KR100389061 B1 KR 100389061B1
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- South Korea
- Prior art keywords
- copper foil
- electrolytic copper
- electrolyte
- thioxomethyl
- dialkylamino
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 105
- 239000011889 copper foil Substances 0.000 title claims abstract description 97
- 238000000034 method Methods 0.000 title claims description 39
- 230000008569 process Effects 0.000 title description 26
- -1 disulfur compound Chemical class 0.000 claims abstract description 37
- 239000008151 electrolyte solution Substances 0.000 claims abstract description 24
- 150000001875 compounds Chemical class 0.000 claims abstract description 23
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 21
- 239000011593 sulfur Substances 0.000 claims abstract description 21
- 239000004094 surface-active agent Substances 0.000 claims abstract description 20
- 229920001515 polyalkylene glycol Polymers 0.000 claims abstract description 13
- 108010010803 Gelatin Proteins 0.000 claims abstract description 12
- 239000002253 acid Substances 0.000 claims abstract description 12
- 229920000159 gelatin Polymers 0.000 claims abstract description 12
- 235000019322 gelatine Nutrition 0.000 claims abstract description 12
- 235000011852 gelatine desserts Nutrition 0.000 claims abstract description 12
- 150000003839 salts Chemical class 0.000 claims abstract description 12
- 239000008273 gelatin Substances 0.000 claims abstract description 11
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 7
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims abstract description 4
- 238000004519 manufacturing process Methods 0.000 claims description 22
- 239000003792 electrolyte Substances 0.000 claims description 21
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 18
- LMPMFQXUJXPWSL-UHFFFAOYSA-N 3-(3-sulfopropyldisulfanyl)propane-1-sulfonic acid Chemical compound OS(=O)(=O)CCCSSCCCS(O)(=O)=O LMPMFQXUJXPWSL-UHFFFAOYSA-N 0.000 claims description 8
- 239000000654 additive Substances 0.000 claims description 7
- 150000003585 thioureas Chemical class 0.000 claims description 7
- 239000000460 chlorine Substances 0.000 claims description 6
- 230000000996 additive effect Effects 0.000 claims description 5
- 229910052801 chlorine Inorganic materials 0.000 claims description 5
- DKVNPHBNOWQYFE-UHFFFAOYSA-N carbamodithioic acid Chemical group NC(S)=S DKVNPHBNOWQYFE-UHFFFAOYSA-N 0.000 claims description 3
- 229910000365 copper sulfate Inorganic materials 0.000 claims description 3
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims description 3
- 150000007513 acids Chemical class 0.000 claims description 2
- MAHNFPMIPQKPPI-UHFFFAOYSA-N disulfur Chemical class S=S MAHNFPMIPQKPPI-UHFFFAOYSA-N 0.000 claims description 2
- WIYCQLLGDNXIBA-UHFFFAOYSA-L disodium;3-(3-sulfonatopropyldisulfanyl)propane-1-sulfonate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)CCCSSCCCS([O-])(=O)=O WIYCQLLGDNXIBA-UHFFFAOYSA-L 0.000 claims 2
- 230000005611 electricity Effects 0.000 claims 1
- 238000005498 polishing Methods 0.000 abstract description 2
- 230000000052 comparative effect Effects 0.000 description 18
- 239000002202 Polyethylene glycol Substances 0.000 description 16
- 229920001223 polyethylene glycol Polymers 0.000 description 16
- 239000000758 substrate Substances 0.000 description 13
- 230000003746 surface roughness Effects 0.000 description 13
- 229920001451 polypropylene glycol Polymers 0.000 description 10
- 238000004381 surface treatment Methods 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- 238000009792 diffusion process Methods 0.000 description 8
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 7
- 229910001431 copper ion Inorganic materials 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000010936 titanium Substances 0.000 description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 238000004070 electrodeposition Methods 0.000 description 6
- 159000000000 sodium salts Chemical class 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 150000002148 esters Chemical class 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000002318 adhesion promoter Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical class [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 3
- PDQAZBWRQCGBEV-UHFFFAOYSA-N Ethylenethiourea Chemical compound S=C1NCCN1 PDQAZBWRQCGBEV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- JHWIEAWILPSRMU-UHFFFAOYSA-N 2-methyl-3-pyrimidin-4-ylpropanoic acid Chemical compound OC(=O)C(C)CC1=CC=NC=N1 JHWIEAWILPSRMU-UHFFFAOYSA-N 0.000 description 2
- 239000002000 Electrolyte additive Substances 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910000978 Pb alloy Inorganic materials 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 229910000457 iridium oxide Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- IHCCLXNEEPMSIO-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 IHCCLXNEEPMSIO-UHFFFAOYSA-N 0.000 description 1
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- KXZJHVJKXJLBKO-UHFFFAOYSA-N chembl1408157 Chemical compound N=1C2=CC=CC=C2C(C(=O)O)=CC=1C1=CC=C(O)C=C1 KXZJHVJKXJLBKO-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- LEKPFOXEZRZPGW-UHFFFAOYSA-N copper;dicyanide Chemical compound [Cu+2].N#[C-].N#[C-] LEKPFOXEZRZPGW-UHFFFAOYSA-N 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- MZGNSEAPZQGJRB-UHFFFAOYSA-N dimethyldithiocarbamic acid Chemical compound CN(C)C(S)=S MZGNSEAPZQGJRB-UHFFFAOYSA-N 0.000 description 1
- ALKZAGKDWUSJED-UHFFFAOYSA-N dinuclear copper ion Chemical compound [Cu].[Cu] ALKZAGKDWUSJED-UHFFFAOYSA-N 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- VJPLIHZPOJDHLB-UHFFFAOYSA-N lead titanium Chemical compound [Ti].[Pb] VJPLIHZPOJDHLB-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000006259 organic additive Substances 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000011272 standard treatment Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- GTLDTDOJJJZVBW-UHFFFAOYSA-N zinc cyanide Chemical compound [Zn+2].N#[C-].N#[C-] GTLDTDOJJJZVBW-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
- C25D7/0635—In radial cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cell Electrode Carriers And Collectors (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electrolytic Production Of Metals (AREA)
Abstract
Description
첨가제 | 액 조성 | |||||||||
SPS(mg/L) | DPS(mg/L) | IM(mg/L) | PEG(mg/L) | PPG(mg/L) | 저분자젤라틴(mg/L) | TU(mg/L) | Cl-(mg/L) | 구리(g/L:이온) | 황산(g/L) | |
실시예1 | - | 6 | - | 1 | - | - | - | 25 | 80 | 90 |
실시예2 | 1 | - | - | 30 | - | - | - | |||
실시예3 | - | 30 | - | 30 | - | - | - | |||
실시예4 | 5 | - | - | 1 | - | - | - | |||
실시예5 | - | 3 | - | - | 800 | 5 | - | |||
실시예6 | 5 | - | 0.5 | 25 | - | - | - | |||
실시예7 | 3 | 5 | - | 30 | 30 | - | - | |||
비교예1 | - | - | - | - | - | 2 | - | |||
비교예2 | - | - | - | - | - | 2 | 1 | |||
비교예3 | 50 | - | - | 30 | - | - | - | |||
비교예4 | - | 3 | - | - | 1500 | - | - |
거친면표면 조도 | 드럼면표면 조도 | 인장 강도(상온) | 연신율(상온) | 인장 강도(180 ℃) | 연신율(180 ℃) | |
(Rz:㎛) | (Rz:㎛) | (kgf/㎟) | (%) | (kgf/㎟) | (%) | |
실시예 1 | 1.52 | 1.68 | 33.2 | 8.9 | 22.5 | 7.6 |
실시예 2 | 1.83 | 1.76 | 29.5 | 9.6 | 20.9 | 8.0 |
실시예 3 | 1.42 | 1.84 | 33.4 | 12.9 | 22.2 | 14.4 |
실시예 4 | 1.88 | 1.91 | 30.4 | 12.9 | 20.6 | 10.6 |
실시예 5 | 1.81 | 1.79 | 31.4 | 4.1 | 18.4 | 3.1 |
실시예 6 | 0.50 | 1.75 | 33.2 | 11.4 | 23.6 | 6.0 |
실시예 7 | 1.14 | 1.55 | 32.0 | 8.8 | 20.6 | 4.2 |
비교예 1 | 3.53 | 1.81 | 37.1 | 5.6 | 22.8 | 2.2 |
비교예 2 | 1.9 | 1.85 | 49.0 | 1.5 | 22.0 | 1.9 |
비교예 3 | 2.23 | 1.88 | 34.2 | 1.9 | 22.2 | 3.5 |
비교예 4 | 2.38 | 1.79 | 13.9 | 0.23 | 16.9 | 1.2 |
Claims (10)
- 전기분해에 의하여 전해 동박을 제조할 때 사용되는 황산 및 황산동 중에서 선택된 적어도 어느 하나를 함유하는 전해액에 있어서, 상기 전해액 1 리터를 기준으로,다이설퍼 화합물, 디알킬아미노-티옥소메틸-티오알칸술폰산 및 디알킬아미노-티옥소메틸-티오알칸술폰염 중에서 선택된 적어도 하나의 유황 함유 화합물 0.5 내지 40 mg;폴리 알킬렌 글리콜 계열의 계면활성제 및 저분자 젤라틴으로 이루어진 군에서 선택되는 적어도 한 종류 이상의 유기 화합물 1 내지 1000 mg; 및염소이온 0.1 내지 80 mg 이 첨가된 것을 특징으로 하는 전해 동박 제조용 전해액.
- 제 1항에 있어서,디알킬아미노-티옥소메틸-티오알칸술폰산 또는 그 염이 디치오카바믹산 또는 그 염인 것을 특징으로 하는 전해 동박 제조용 전해액.
- 제 1항에 있어서,상기 전해액 첨가물이 질소 함유 화합물인 티오요소 유도체 0.1 내지 8 mg/L을 더 포함하는 것을 특징으로 하는 전해 동박 제조용 전해액.
- 제 1항에 있어서,상기 다이설퍼 화합물이 SPS(비스-(3-설포프로필)-다이설파이드 다이소듐 솔트(Bis-(3-sulfopropyl)-disulfide, disodium salt)인 것을 특징으로 하는 전해 동박 제조용 전해액.
- 제 1항에 있어서,상기 유기 화합물이 폴리 알킬렌 글리콜 계열의 계면활성제인 것을 특징으로 하는 전해 동박 제조용 전해액.
- 삭제
- 전해 동박의 제조방법에 있어서,A) 전해액 1 리터를 기준으로, 다이설퍼 화합물, 디알킬아미노-티옥소메틸-티오알칸술폰산 및 디알킬아미노-티옥소메틸-티오알칸술폰염 중에서 선택된 적어도 하나의 유황 함유 화합물 0.5 내지 40 mg와 폴리 알킬렌 글리콜 계열의 계면활성제 및 저분자 젤라틴으로 이루어진 군에서 선택되는 적어도 한 종류 이상의 유기 화합물 1 내지 1000 mg 및 염소이온 0.1 내지 80 mg 이 첨가되는 전해액을 준비하는 단계; 및B) 상기 전해액에 양극과 음극을 함침시킨 후 전기를 흘려 줌으로써 음극에 전해 동박을 생성하는 단계를 포함하는 것을 특징으로 전해 동박의 제조 방법.
- 제 7항에 있어서,상기 디알킬아미노-티옥소메틸-티오알칸술폰산이 디치오카바믹산이고, 상기 디알킬아미노-티옥소메틸-티오알칸술폰염이 디치오카바믹염인 것을 특징으로 하는 전해 동박의 제조 방법.
- 제 7항에 있어서,상기 전해액에 질소 함유 화합물인 티오요소 유도체 0.1 내지 8 mg/L이 더 포함되는 것을 특징으로 하는 전해 동박의 제조 방법.
- 제 7항에 있어서,상기 다이설퍼 화합물이 SPS(비스-(3-설포프로필)-다이설파이드 다이소듐 솔트(Bis-(3-sulfopropyl)-disulfide, disodium salt)인 것을 특징으로 하는 전해 동박의 제조 방법.
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KR102405236B1 (ko) | 2022-05-11 | 2022-06-07 | 고려아연 주식회사 | 전해 동박의 제조방법 |
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-
2003
- 2003-03-31 KR KR10-2003-0020166A patent/KR100389061B1/ko not_active Expired - Fee Related
- 2003-07-29 TW TW092120619A patent/TWI245082B/zh not_active IP Right Cessation
- 2003-08-08 JP JP2003206688A patent/JP2004162172A/ja active Pending
- 2003-09-03 CN CNB031565093A patent/CN1263899C/zh not_active Expired - Fee Related
- 2003-11-12 CA CA002448892A patent/CA2448892A1/en not_active Abandoned
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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KR102405236B1 (ko) | 2022-05-11 | 2022-06-07 | 고려아연 주식회사 | 전해 동박의 제조방법 |
WO2023219264A1 (ko) | 2022-05-11 | 2023-11-16 | 고려아연 주식회사 | 전해 동박의 제조방법 |
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JP2004162172A (ja) | 2004-06-10 |
TWI245082B (en) | 2005-12-11 |
US20040104117A1 (en) | 2004-06-03 |
CN1500915A (zh) | 2004-06-02 |
CA2448892A1 (en) | 2004-05-14 |
TW200407465A (en) | 2004-05-16 |
CN1263899C (zh) | 2006-07-12 |
KR20030036415A (ko) | 2003-05-09 |
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LAPS | Lapse due to unpaid annual fee | ||
PC1903 | Unpaid annual fee |