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JPS6247027A - Liquid crystal display element - Google Patents

Liquid crystal display element

Info

Publication number
JPS6247027A
JPS6247027A JP18710385A JP18710385A JPS6247027A JP S6247027 A JPS6247027 A JP S6247027A JP 18710385 A JP18710385 A JP 18710385A JP 18710385 A JP18710385 A JP 18710385A JP S6247027 A JPS6247027 A JP S6247027A
Authority
JP
Japan
Prior art keywords
electrode
liquid crystal
film
crystal display
display element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18710385A
Other languages
Japanese (ja)
Inventor
Yoshizo Tashiro
田代 美三
Nobuhiko Sasaki
順彦 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP18710385A priority Critical patent/JPS6247027A/en
Publication of JPS6247027A publication Critical patent/JPS6247027A/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)

Abstract

PURPOSE:To prevent the elusion of an alkaline ion to the liquid crystal and to make an electrode pattern a poor appearance by providing an electrode substrate in which an insulating coating lying between a glass substrate and an electrode film is composed of a mixed film of SiO2-ZrO2-In2O3 to the title element. CONSTITUTION:The electrode film 13 is formed on the glass substrate 11 having an insulating coating 12 thereon followed by spattering it. And then, the electrode substrate 15 is prepared by patterning the prescribed electrode film and then by coating it with a polyimide film followed by rubbing it, thereby forming an orientation film 14. The two sheets of the prescribed electrode substrates 15 are sticked with each other through a sealing material 16 so as to have a cell gap of 10mum. The liquid crystal such as a nematic liquid crystal 17 is enclosed within the prescribed cell gap. The polarizing plates 18, 19 are sticked on an outer sides of each electrode substrates 15 respectively to form a twisted nematic type liquid crystal display element. The prescribed insulating coating is composed of 45wt% SiO2, 37wt% ZnO2 and 18wt% In2O3 on the basis of the oxide concentration. Thus, the electrode pattern becomes to the poor appearance in a nondriving of the title element and the title element having an improved visibility is obtd.

Description

【発明の詳細な説明】 「産業上の利用分野」 本発明は、液晶表示素子に関し、特に、電極基板のガラ
ス基板と電極膜との間に形成される絶縁被膜に関する。
DETAILED DESCRIPTION OF THE INVENTION "Industrial Application Field" The present invention relates to a liquid crystal display element, and particularly to an insulating coating formed between a glass substrate and an electrode film of an electrode substrate.

「従来の技術」 第1図に示すように、液晶表示素子は、ガラス基板ll
上に一様に形成された絶縁液It!112と、この絶縁
被膜12上に表示パターンに応じた形状に形成された電
極膜13と、L面が平坦面となるように電極膜13と絶
縁被膜12とを被覆する配向膜14とからなる一対のT
L−基板15を備えている。これらの電極基板15.1
5は、シール材16を介して所定ギャップとなるように
貼り合わされ、内部に液晶17が封入されている。なお
、ツイストネマティック型の液晶表示素子などにおいて
は、電極基板15.15の外側に偏光板18.19が貼
り付けられている。
"Prior Art" As shown in Fig. 1, a liquid crystal display element has a glass substrate
Insulating liquid It! uniformly formed on top! 112, an electrode film 13 formed on the insulating film 12 in a shape according to the display pattern, and an alignment film 14 that covers the electrode film 13 and the insulating film 12 so that the L plane becomes a flat surface. a pair of T's
An L-board 15 is provided. These electrode substrates 15.1
5 are bonded together with a sealing material 16 interposed therebetween to form a predetermined gap, and a liquid crystal 17 is sealed inside. In addition, in a twisted nematic type liquid crystal display element, a polarizing plate 18.19 is attached to the outside of the electrode substrate 15.15.

従来の液晶表示素子において、ガラス基板!lと電極n
々13との間に介在する絶縁被膜12は、真空蒸着法ま
たは化学スプレー法を用いて、主として二酸化シリコン
(S i 02 ) 、二酸化チタン(Ti02)など
で形成されていた。
In conventional liquid crystal display elements, glass substrate! l and electrode n
The insulating film 12 interposed between the metal parts 13 is mainly formed of silicon dioxide (S i 02 ), titanium dioxide (Ti 02 ), etc. using a vacuum evaporation method or a chemical spray method.

「発明が解決しようとする問題点」 絶縁被膜12の形成に際して、真空蒸着法は、優れた特
性の絶縁被膜が得られるが、量産性の点で問題があった
"Problems to be Solved by the Invention" When forming the insulating coating 12, the vacuum evaporation method can provide an insulating coating with excellent characteristics, but there is a problem in terms of mass production.

また、化学スプレー法は、得られた絶縁被膜の特性が劣
ると共に、材料の無駄が生じやすいという問題点があっ
た。
Further, the chemical spray method has problems in that the properties of the resulting insulating film are poor and materials are likely to be wasted.

一方、スクリーン印刷法を使用することも考えられるが
、量産性の点で問題がある。
On the other hand, it is also possible to use a screen printing method, but there is a problem in terms of mass production.

上記の各種方法に比べて、浸漬法は、数多くの電極基板
を同時に処理できると共に材料の無駄が生ぜず、量産に
適しているという特徴がある。
Compared to the various methods described above, the immersion method is characterized in that it can process a large number of electrode substrates at the same time, does not waste materials, and is suitable for mass production.

しかし、浸漬法によってSiO2のみで絶縁被膜12を
形成すると、その屈折率がインジウム−スズ(In−9
n)酸化物からなる電極膜13の屈折率より小ざくなる
ため、液晶表示素子の非駆動時に電極パターンが目立つ
という問題点があった。
However, when the insulating film 12 is formed using only SiO2 by the immersion method, the refractive index of the indium-tin (In-9
n) Since the refractive index is smaller than that of the electrode film 13 made of oxide, there is a problem that the electrode pattern stands out when the liquid crystal display element is not driven.

また、絶縁被膜12の屈折率を上げるために、TiO2
を2層に重ねることも行なわれているが、工程が増えて
コスト高になるという問題点があった。
Furthermore, in order to increase the refractive index of the insulating coating 12, TiO2
It has also been attempted to layer two layers, but this has the problem of increasing the number of steps and increasing costs.

さらに、絶縁被膜12としてTiO7を単層だけ設ける
と、ガラス基板11から液晶17へのナトリウムイオン
(Na” )等のアルカリイオンの溶出が生じ。
Further, if only a single layer of TiO7 is provided as the insulating film 12, alkaline ions such as sodium ions (Na'') are eluted from the glass substrate 11 to the liquid crystal 17.

信頼性テストにおいて表示パターンのにじみが生じると
いう問題点があった。
There was a problem in which the display pattern blurred during reliability tests.

本発明の目的は、1−記従来技術の問題点を解消するた
めに、アルカリイオンの液晶への溶出を防1にすると」
(に、絶縁被膜の屈折率を電極膜のそれに近づけること
により電極パターンを見えにくくし、よって信頼性およ
び表示品位を向−卜させるようにした液晶表示素f−を
提供することにある。
An object of the present invention is to prevent the elution of alkali ions into liquid crystals in order to solve the problems of the prior art described in 1-1.
Another object of the present invention is to provide a liquid crystal display element f- in which the refractive index of the insulating film is made close to that of the electrode film, thereby making the electrode pattern less visible, thereby improving reliability and display quality.

「問題点を解決するための手段」 本発明の液晶表示素子は、ガラス基板と電極膜との間に
介在する絶縁被膜をSiO2− ZrO,、−1r+7
03の混合膜で形成した電極基板を備えていることを特
徴とする。
"Means for Solving the Problems" The liquid crystal display element of the present invention has an insulating film interposed between the glass substrate and the electrode film made of SiO2-ZrO, -1r+7
The present invention is characterized in that it includes an electrode substrate formed of a mixed film of No. 03.

「作用」 本発明による液晶表示素子においては、5iQ2−Zr
02111203の混合膜からなる絶縁被膜がガラス基
板から液晶へのNa+等のアルカリイオンの溶出を防(
1−すると共に、絶縁被膜の屈折率が電極膜のそれに近
づき、電極パターンを見えに<〈シて液晶表示素子の視
認性を高める。
"Function" In the liquid crystal display element according to the present invention, 5iQ2-Zr
The insulating coating consisting of a mixed film of 02111203 prevents the elution of alkali ions such as Na+ from the glass substrate to the liquid crystal (
At the same time, the refractive index of the insulating film approaches that of the electrode film, making the electrode pattern visible and improving the visibility of the liquid crystal display element.

「発明の実施例」 本発明の液晶表示素子の一実施例においては、SiO□
−ZrO□−In203の混合膜からなる絶縁被膜を浸
漬法により形成する。すなわち、有機溶剤に可溶なケイ
素(S i)の有機金属化合物、ジルコニウム(Zr)
の有機金属化合物およびインジウム(In)の有機金属
化合物を有機溶剤に溶解させて相互に反応させると共に
、溶液の安定化のためにキレート生成物を添加して、生
成された反応生成物を均一に含有する溶液とし、この溶
液にガラス基板を浸漬塗ll1l、た後、焼成して5i
Oz  ZrO2rn20:+の混合膜からなる絶縁被
膜を形成する。
"Embodiment of the Invention" In one embodiment of the liquid crystal display element of the present invention, SiO□
An insulating film made of a mixed film of -ZrO□-In203 is formed by a dipping method. That is, an organometallic compound of silicon (Si) soluble in organic solvents, zirconium (Zr)
An organometallic compound of indium (In) and an organometallic compound of indium (In) are dissolved in an organic solvent and reacted with each other, and a chelate product is added to stabilize the solution to uniformly distribute the generated reaction products. A glass substrate was immersed in this solution, and then baked to give a 5i
An insulating film made of a mixed film of OzZrO2rn20:+ is formed.

上記Siの有機金属化合物としては、テトラメトキシシ
ラン(SiCOCIIs >a ) 、テトラエトキシ
シラン、ビニルトリス (2−メトキシエトキシ)シラ
ン、珪酸エチル縮合体等の有機シラン化合物が好ましく
使用できる。
As the organometallic compound of Si, organic silane compounds such as tetramethoxysilane (SiCOCIIs>a), tetraethoxysilane, vinyltris(2-methoxyethoxy)silane, and ethyl silicate condensate can be preferably used.

また、上記Zrの有機金属化合物としては、テトラエト
キシジルコニウム、テトライソプロポキシジルコニウム
(Zr (OC3H7)4 ) 、テトラアセチルアセ
トナートジルコニウム等が好ましく使用できる。
Further, as the organometallic compound of Zr, tetraethoxyzirconium, tetraisopropoxyzirconium (Zr (OC3H7)4 ), tetraacetylacetonatozirconium, etc. can be preferably used.

さらに、上記Inの有機金属化合物としては、トリエト
キシインジウム、トリイソプロポキシインジム、トリス
アセチルアセトナートインジウム、トリnブトキシイン
ジウム(In(OCntlJ*) 、トリエチルアセチ
ルアセテートインジウム (In(FAA)う)等が好ましく使用できる。
Further, as the organometallic compound of In, triethoxyindium, triisopropoxyindium, trisacetylacetonateindium, tri-butoxyindium (In(OCntlJ*), triethylacetylacetylacetateindium (In(FAA)), etc. can be preferably used.

これらの有機金属化合物を溶解させる有機溶剤としては
、メチルエチルケトン(MEK) 、酢酸エチル、エタ
ノール、メタノール等が好ましく使用できる。
As the organic solvent for dissolving these organometallic compounds, methyl ethyl ketone (MEK), ethyl acetate, ethanol, methanol, etc. can be preferably used.

また、溶剤の安定化剤としては、アセチルアセトン、ト
リエタノールアミン等が好ましく使用できる。
Furthermore, as the stabilizer for the solvent, acetylacetone, triethanolamine, etc. can be preferably used.

これらを混合して作成された溶液を浸漬液として使用し
、これにガラス基板を浸漬して塗布した後に、400〜
500℃程度の温度で焼成すると、5iQ2− Zr0
2In203の混合膜からなる絶縁被膜が形成される。
A solution created by mixing these is used as an immersion liquid, and after dipping a glass substrate in this and applying it,
When fired at a temperature of about 500℃, 5iQ2-Zr0
An insulating film made of a mixed film of 2In203 is formed.

浸漬液中に含有されるSi、 Zr、 Inのt−1浸
漬液の粘度、ガラス基板の浸漬液中からの引きトげ速度
等を調整することにより、膜厚が5000Å以下程度の
絶縁被膜を自由に形成することができる。
By adjusting the viscosity of the t-1 immersion liquid containing Si, Zr, and In contained in the immersion liquid, the pulling speed of the glass substrate from the immersion liquid, etc., an insulating coating with a film thickness of about 5000 Å or less can be formed. Can be formed freely.

なお、こうして形成された絶縁被膜の各成分の含有量は
、SiO2: 20〜50重量%、ZrO2:25〜4
5重に%、In2O3 : 10〜20重量%となるよ
うにすることが好ましい。S+02が20重量%未満で
は成膜性が悪くなるという問題が生じ、5iQ2が50
重量%を超えると電極パターンが見えやすくなるという
問題が生じる。また、ZrO2が25重陽%未満では屈
折率が低くなるという問題が生じ、ZrO2が45重量
%を超えるとクラックが入りやすくなるという問題が生
しる。さらに、In2O3が10重量%未満では電極パ
ターンににじみが発生しやすくなり信頼性が悪いという
問題が生じ、111203が20重量%を超えると絶縁
性が悪くなるという問題が生じる。
The content of each component in the insulating film thus formed was as follows: SiO2: 20-50% by weight, ZrO2: 25-4% by weight.
It is preferable that the amount of In2O3 be 10 to 20% by weight. If S+02 is less than 20% by weight, there will be a problem that the film forming property will deteriorate, and if 5iQ2 is less than 20% by weight,
If it exceeds % by weight, a problem arises in that the electrode pattern becomes easily visible. Further, if the ZrO2 content is less than 25% by weight, a problem arises in that the refractive index becomes low, and if the ZrO2 content exceeds 45% by weight, a problem arises in that cracks are likely to occur. Furthermore, if In2O3 is less than 10% by weight, the electrode pattern tends to bleed, resulting in poor reliability, while if 111203 exceeds 20% by weight, the insulation properties may be poor.

実施例ニ トリエチルアセチルアセテートインジウムと、テトラブ
トキシジルコニウムと、珪酸エチルの縮合体(S +y
lO’n−4(OC2Its )271+1.n # 
5)と(7)&it計28.4重?−%に、有機溶剤と
してメチルエチルケトン71.1千j1:%と、さらに
粘性剤としてニトロセルローズ0.5屯+、t%とを添
加して浸漬液を作成した。
Example Nitriethyl acetylacetate A condensate of indium, tetrabutoxyzirconium, and ethyl silicate (S +y
lO'n-4(OC2Its)271+1. n #
5) and (7) & it total 28.4 times? An immersion liquid was prepared by adding 71.1 thousand j1:% of methyl ethyl ketone as an organic solvent and 0.5 tons+, t% of nitrocellulose as a viscosity agent.

この溶液を浸漬液として用い、同液にガラス基板を浸漬
してから、ガラス基板を毎分EiOcmの引き[−げ速
度で引き旧f、400〜500℃の温度範囲で30〜6
0分間焼成した。この結果、ガラス基板上に■り厚が約
1000人の絶縁被膜が形成された。
Using this solution as an immersion liquid, a glass substrate was immersed in the same liquid, and then the glass substrate was pulled at a rate of EiOcm per minute of 30 to 6
Baked for 0 minutes. As a result, an insulating film with a thickness of about 1000 mm was formed on the glass substrate.

なお、この絶縁被膜は、酸化物濃度として。Note that this insulating film has an oxide concentration.

SiQ、 : 45重量%、ZrO2: 37重量%、
In2O3:1B 型針%有するものであった・ 第1図に示すように、絶縁被膜12が形成されたガラス
基板11hに、スパッタリングによりtai膜。
SiQ: 45% by weight, ZrO2: 37% by weight,
As shown in FIG. 1, a tai film was formed on the glass substrate 11h on which the insulating film 12 was formed by sputtering.

13を形成し、パターニングする。さらに、ポリイミド
膜をコートしてラビングすることにより配向膜14を形
成する。こうして電極基板15を得ることができる。
13 is formed and patterned. Furthermore, an alignment film 14 is formed by coating a polyimide film and rubbing it. In this way, the electrode substrate 15 can be obtained.

次に、2枚の電極基板15をシール材16を介してセル
キャップがIOJLmとなるように貼り自わせ、内部に
例えばネマティック液晶17を封入し、各電極基板15
の外側に偏光板18.19を貼り付けることにより、ツ
イストネマティック型の液晶表示素子を作成することが
できる。
Next, the two electrode substrates 15 are pasted together through the sealing material 16 so that the cell cap becomes IOJLm, and for example, a nematic liquid crystal 17 is sealed inside, and each electrode substrate 15 is
By attaching polarizing plates 18 and 19 to the outside of the substrate, a twisted nematic type liquid crystal display element can be created.

このようにして作成された液晶表示素子は、5iQ7−
 ZrO7−1n203の混合膜からなる絶縁被膜を有
するので、Zrの含有量に応じて絶縁被膜の屈折率を1
.6〜1.75の範囲で調整可能である。このため、屈
折率1.52のSiO□単層の絶縁被膜を用いた場合に
比べると、非駆動時に電極パターンが見えることが少な
くなり、液晶表示素子としての視認性が向上する。
The liquid crystal display element created in this way was 5iQ7-
Since it has an insulating coating made of a mixed film of ZrO7-1n203, the refractive index of the insulating coating can be adjusted to 1 depending on the Zr content.
.. It can be adjusted within the range of 6 to 1.75. Therefore, compared to the case where a single-layer SiO□ insulating film with a refractive index of 1.52 is used, the electrode pattern is less visible when not driven, and visibility as a liquid crystal display element is improved.

また、この液晶表示素子においては、アルカリイオンが
溶出してきたどうかの判定の基準となる駆動時の表示パ
ターンのくずれ、いわゆるにじみ現象が起こりにくい。
Furthermore, in this liquid crystal display element, distortion of the display pattern during driving, which is a criterion for determining whether or not alkali ions have eluted, is less likely to occur, so-called bleeding phenomenon.

例えば80℃、90%の耐湿加速試験下において、にじ
み現象の発生時間は、SiO2単層の絶縁被膜を用いた
場合に比べて、約30%長くなる。したがって、長寿命
の液晶表示素子をSJ mすることができる。
For example, under an accelerated humidity test of 80° C. and 90%, the time required for the bleeding phenomenon to occur is approximately 30% longer than when a single SiO2 insulating film is used. Therefore, it is possible to provide a long-life liquid crystal display element with SJm.

「発明の効果」 以」−説明したように、本発明によれば、ZrおよびI
nの成分によりHa” ’Jのアルカリイオンの溶出防
止性能を向上させることができるという効果が得られる
"Effects of the Invention" - As explained above, according to the present invention, Zr and I
The effect of improving the elution prevention performance of alkali ions of Ha'''J can be obtained by the component n.

また、Zrの含有量に応じて絶縁被膜の屈折率を変化さ
せることができるので、絶縁被膜の屈折率を電J41膜
のそれに近づけることにより非駆動時に電極パターンを
見えにくくすることができるという効果が得られる。
In addition, since the refractive index of the insulating film can be changed depending on the Zr content, by bringing the refractive index of the insulating film closer to that of the electric J41 film, the electrode pattern can be made less visible when not driven. is obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は液晶表示素子の一般的な構成を示す断面図であ
る。 図中、 11はガラス基板、12は絶縁被膜、13は電
極11!2.14は配向膜、15は電8i基板、17は
液晶である。
FIG. 1 is a sectional view showing the general structure of a liquid crystal display element. In the figure, 11 is a glass substrate, 12 is an insulating coating, 13 is an electrode 11!2.14 is an alignment film, 15 is an electrode 8i substrate, and 17 is a liquid crystal.

Claims (2)

【特許請求の範囲】[Claims] (1)ガラス基板と電極膜との間に介在する絶縁被膜が
SiO_2−ZrO_2−In_2O_3の混合膜で形
成された電極基板を備えていることを特徴とする液晶表
示素子。
(1) A liquid crystal display element comprising an electrode substrate in which the insulating film interposed between the glass substrate and the electrode film is formed of a mixed film of SiO_2-ZrO_2-In_2O_3.
(2)特許請求の範囲第1項において、前記絶縁被膜は
、SiO_2:20〜50重量%、ZrO_2:25〜
45重量%、In_2O_3:10〜20重量%の混合
膜で形成されている液晶表示素子。
(2) In claim 1, the insulating coating includes SiO_2: 20 to 50% by weight and ZrO_2: 25 to 50% by weight.
A liquid crystal display element formed of a mixed film of 45% by weight and In_2O_3: 10 to 20% by weight.
JP18710385A 1985-08-26 1985-08-26 Liquid crystal display element Pending JPS6247027A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18710385A JPS6247027A (en) 1985-08-26 1985-08-26 Liquid crystal display element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18710385A JPS6247027A (en) 1985-08-26 1985-08-26 Liquid crystal display element

Publications (1)

Publication Number Publication Date
JPS6247027A true JPS6247027A (en) 1987-02-28

Family

ID=16200156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18710385A Pending JPS6247027A (en) 1985-08-26 1985-08-26 Liquid crystal display element

Country Status (1)

Country Link
JP (1) JPS6247027A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5805254A (en) * 1995-10-12 1998-09-08 Canon Kabushiki Kaisha Liquid crystal device and process for production thereof having plural insulating layers

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5240354A (en) * 1975-09-26 1977-03-29 Nippon Kogaku Kk <Nikon> Display unit in which electrooptical fluid is filled
JPS5662224A (en) * 1979-10-25 1981-05-28 Seiko Epson Corp Construction of display panel
JPS56116015A (en) * 1980-02-20 1981-09-11 Seiko Epson Corp Manufacture of liquid crystal panel

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5240354A (en) * 1975-09-26 1977-03-29 Nippon Kogaku Kk <Nikon> Display unit in which electrooptical fluid is filled
JPS5662224A (en) * 1979-10-25 1981-05-28 Seiko Epson Corp Construction of display panel
JPS56116015A (en) * 1980-02-20 1981-09-11 Seiko Epson Corp Manufacture of liquid crystal panel

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5805254A (en) * 1995-10-12 1998-09-08 Canon Kabushiki Kaisha Liquid crystal device and process for production thereof having plural insulating layers

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