JPH10334813A - Plasma display device - Google Patents
Plasma display deviceInfo
- Publication number
- JPH10334813A JPH10334813A JP9155777A JP15577797A JPH10334813A JP H10334813 A JPH10334813 A JP H10334813A JP 9155777 A JP9155777 A JP 9155777A JP 15577797 A JP15577797 A JP 15577797A JP H10334813 A JPH10334813 A JP H10334813A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- silver
- plasma display
- display device
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 claims abstract description 69
- 239000000758 substrate Substances 0.000 claims abstract description 49
- 229910052709 silver Inorganic materials 0.000 claims abstract description 22
- 239000004332 silver Substances 0.000 claims abstract description 22
- 229910052751 metal Inorganic materials 0.000 claims abstract description 15
- 239000002184 metal Substances 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 claims abstract description 6
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract description 21
- 150000002500 ions Chemical class 0.000 abstract description 5
- 239000007772 electrode material Substances 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 4
- 238000004040 coloring Methods 0.000 abstract description 3
- 238000007650 screen-printing Methods 0.000 abstract description 3
- 229910017344 Fe2 O3 Inorganic materials 0.000 abstract 2
- 239000010408 film Substances 0.000 description 6
- 229910010413 TiO 2 Inorganic materials 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 238000006124 Pilkington process Methods 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000006060 molten glass Substances 0.000 description 2
- 229910052754 neon Inorganic materials 0.000 description 2
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000005394 sealing glass Substances 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000004031 devitrification Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000007500 overflow downdraw method Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000007372 rollout process Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Gas-Filled Discharge Tubes (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、プラズマディスプレイ
装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma display device.
【０００２】[0002]
【従来の技術】一般にプラズマディスプレイ装置を製造
する場合、まず前面ガラス基板と背面ガラス基板を準備
し、これらのガラス基板上に金属ペーストや絶縁ペース
トを塗布・焼成することによって、金属膜、ＩＴＯ膜、
ネサ膜からなる電極、誘電体層、隔壁、蛍光体等を形成
する。次いで前面ガラス基板と背面ガラス基板を低融点
封着ガラスでシールし、内部にキセノンと主放電ガスの
ネオンとの混合ガスを封入し気密封止する方法が採られ
る。2. Description of the Related Art Generally, when manufacturing a plasma display device, a front glass substrate and a rear glass substrate are first prepared, and a metal paste or an insulating paste is applied and baked on these glass substrates to form a metal film and an ITO film. ,
An electrode made of a Nesa film, a dielectric layer, a partition, a phosphor, and the like are formed. Then, the front glass substrate and the rear glass substrate are sealed with a low-melting sealing glass, and a gas mixture of xenon and neon of a main discharge gas is sealed therein to hermetically seal.
【０００３】通常、金属電極の材料としては、クロム、
アルミニウム、ニッケルが用いられるが、これらの金属
からなる膜を形成するには、蒸着やスパッタのような高
価な成膜法が必要となるため、最近では、安価なスクリ
ーン印刷法で成膜できる銀（Ａｇ）電極を用いることが
試みられている。[0003] Usually, chromium,
Aluminum and nickel are used. However, forming a film made of these metals requires an expensive film forming method such as vapor deposition or sputtering. Attempts have been made to use (Ag) electrodes.
【０００４】[0004]
【発明が解決しようとする課題】ところでプラズマディ
スプレイ装置に用いられるガラス基板は、主に建築窓用
ソーダライムガラスや高歪点ガラスから形成されてい
る。The glass substrate used for the plasma display device is mainly made of soda lime glass for architectural windows or high strain point glass.
【０００５】高歪点ガラスは、ソーダライムガラスに比
べて、歪点が高いため、その表面に電極や絶縁ペースト
を焼き付ける際に生じる熱収縮が小さく、精度良くパタ
ーン合わせが行えるという利点を有しており、これまで
に各種の材質が提案されている。Since high strain point glass has a higher strain point than soda lime glass, it has the advantage that heat shrinkage that occurs when an electrode or an insulating paste is baked on its surface is small and pattern matching can be performed with high accuracy. Various materials have been proposed so far.
【０００６】例えば特開平３−４０９３３号公報には、
重量％表示で、ＳｉＯ2 ５５〜６５％、Ａｌ2 Ｏ3
５〜１５％、ＣａＯ ３〜１２％、ＭｇＯ＋ＣａＯ＋Ｓ
ｒ０＋ＢａＯ １７〜２５％、Ｌｉ2 Ｏ＋Ｎａ2 Ｏ＋Ｋ
2 Ｏ ６〜１２％、ＺｒＯ2０．５〜６％、ＳＯ3 ＋Ａ
ｓ2 Ｏ3 ＋Ｓｂ2 Ｏ3 ０〜０．５％、ＳｎＯ2 ＋Ｔｉ
Ｏ2 ０〜３％、Ｌａ2 Ｏ3 ０〜５％からなるプラズ
マディスプレイ用ガラス基板が開示されており、また特
開平８−２９０９３８号公報には、重量％で、ＳｉＯ2
５０〜６５％、Ａｌ2 Ｏ3 ２〜１５％、ＭｇＯ ０
〜４％、ＣａＯ ０〜２．９％、ＳｒＯ ２〜１３％、
ＢａＯ ２〜１３％、ＭｇＯ＋ＣａＯ＋ＳｒＯ＋ＢａＯ
１７〜２７％、Ｌｉ2 Ｏ ０〜１％、Ｎａ2 Ｏ ２〜
１０％、Ｋ2 Ｏ ２〜１３％、Ｌｉ2 Ｏ＋Ｎａ2 Ｏ＋Ｋ
2 Ｏ ７〜１５％、ＺｒＯ2１〜１９％、ＴｉＯ2 ０
〜５％、Ｓｂ2 Ｏ3 ０〜１％、Ａｓ2 Ｏ3 ０〜１％
からなるプラズマディスプレイ用ガラス基板が開示され
ている。For example, JP-A-3-40933 discloses that
55 to 65% of SiO 2 , Al 2 O 3
5-15%, CaO 3-12%, MgO + CaO + S
r0 + BaO 17~25%, Li 2 O + Na 2 O + K
2 O 6-12%, ZrO 2 0.5-6%, SO 3 + A
s 2 O 3 + Sb 2 O 3 0~0.5%, SnO 2 + Ti
A glass substrate for a plasma display comprising 0 to 3% of O 2 and 0 to 5% of La 2 O 3 is disclosed, and JP-A-8-290938 discloses SiO 2 in weight%.
50-65%, Al 2 O 3 2-15%, MgO 0
-4%, CaO 0-2.9%, SrO 2-13%,
BaO 2-13%, MgO + CaO + SrO + BaO
17~27%, Li 2 O 0~1% , Na 2 O 2~
10%, K 2 O 2 to 13%, Li 2 O + Na 2 O + K
2 O 7~15%, ZrO 2 1~19 %, TiO 2 0
~5%, Sb 2 O 3 0~1 %, As 2 O 3 0~1%
A glass substrate for a plasma display comprising:
【０００７】しかしながら上記のようなガラス基板上
に、銀電極を形成すると、銀がガラス基板表面で反応
し、発色を引き起こすことがあった。この発色は、電極
部のみならず、その周辺部にも現れやすく、このような
銀電極やその周辺基板の発色が前面ガラス基板に現れる
と、表示性能（透明性、色バランス）が損なわれるため
好ましくない。However, when a silver electrode is formed on a glass substrate as described above, silver sometimes reacts on the surface of the glass substrate to cause color development. This color tends to appear not only in the electrode part but also in the peripheral part thereof. If such color development of the silver electrode and its peripheral substrate appears on the front glass substrate, display performance (transparency, color balance) is impaired. Not preferred.
【０００８】本発明は、上記事情に鑑みなされたもので
あり、電極材料として銀を用いても、前面ガラス基板が
発色し難いプラズマディスプレイ装置を提供することを
目的とするものである。The present invention has been made in view of the above circumstances, and it is an object of the present invention to provide a plasma display device in which a front glass substrate does not easily develop color even when silver is used as an electrode material.
【０００９】[0009]
【課題を解決するための手段】本発明者等は、上記目的
を達成すべく、種々の実験を繰り返した結果、従来のプ
ラズマディスプレイ用前面ガラス基板の表面に銀電極を
形成すると発色するのは、ガラスにＦｅ2 Ｏ3 が存在す
ることに起因していることを見いだした。To achieve the above object, the present inventors have repeated various experiments, and as a result, when a silver electrode is formed on the surface of a conventional front glass substrate for a plasma display, a color develops. Have been found to be due to the presence of Fe 2 O 3 in the glass.
【００１０】つまり従来のガラス基板には、原料からＦ
ｅ2 Ｏ3 が混入し、Ｆｅ2+イオンが一定量以上存在する
ことが多いため、Ｆｅ2+＋Ａｇ+ →Ｆｅ3+＋Ａｇ0 （金
属Ａｇ）の還元反応が促進され、金属Ａｇのコロイドを
多く形成し、褐色の発色を生じさせるという知見に基づ
き、本発明を提案するに至った。In other words, the conventional glass substrate requires F
Since e 2 O 3 is mixed and Fe 2+ ions are often present in a certain amount or more, the reduction reaction of Fe 2+ + Ag + → Fe 3+ + Ag 0 (metal Ag) is promoted, and metal Ag colloid is formed. The present invention has been proposed based on the finding that a large amount is formed and brown color is generated.
【００１１】すなわち本発明のプラズマディスプレイ装
置は、一定の間隔を保持して対向する前面ガラス基板と
背面ガラス基板との間に、金属電極を備えてなるプラズ
マディスプレイ装置において、前面ガラス基板のＦｅ2
Ｏ3 量が２０００ｐｐｍ未満であり、金属電極が銀から
形成されてなることを特徴とする。[0011] That is the plasma display device of the present invention, between the front glass substrate and a rear glass substrate opposite to maintain a constant interval, in the plasma display device including the metal electrode, the front glass substrate Fe 2
The amount of O 3 is less than 2000 ppm, and the metal electrode is formed of silver.
【００１２】さらに本発明は、前面ガラス基板が、重量
百分率で、ＳｉＯ2 ５０〜６５％、Ａｌ2 Ｏ3 １〜
１５％、ＭｇＯ＋ＣａＯ＋ＳｒＯ＋ＢａＯ １０〜２７
％、Ｌｉ2 Ｏ＋Ｎａ2 Ｏ＋Ｋ2 Ｏ ７〜１５％、ＺｒＯ
2 ０〜９％、ＴｉＯ2 ０〜５％の組成を有すること
を特徴とする。Further, according to the present invention, when the front glass substrate is composed of 50 to 65% of SiO 2 and Al 2 O 31
15%, MgO + CaO + SrO + BaO 10-27
%, Li 2 O + Na 2 O + K 2 O 7~15%, ZrO
2 0-9%, and having a composition of TiO 2 0 to 5%.
【００１３】[0013]
【作用】本発明のプラズマディスプレイ装置に用いられ
る前面ガラス基板は、Ｆｅ2 Ｏ3 の含有量が２０００ｐ
ｐｍ未満であるため、Ｆｅ2+イオンの量が少なく、後工
程で表面に銀電極が形成され、この銀電極から拡散して
きたＡｇ+ イオンがガラス中に拡散しても、還元される
量が少ないため、発色を抑制することができる。The front glass substrate used in the plasma display device of the present invention has an Fe 2 O 3 content of 2000 p.
pm, the amount of Fe 2+ ions is small, and a silver electrode is formed on the surface in a later step. Even if Ag + ions diffused from the silver electrode diffuse into the glass, the amount reduced is small. Since the amount is small, color development can be suppressed.
【００１４】従って金属電極の構成材料として、還元さ
れコロイド化しやすい銀を使用することができ、安価な
スクリーン印刷で電極を形成することが可能となる。Therefore, silver that is reduced and easily formed into a colloid can be used as a constituent material of the metal electrode, and the electrode can be formed by inexpensive screen printing.
【００１５】尚、ガラス基板の成形法としては、フロー
ト法、ロールアウト法、フュージョン法等が知られてい
るが、溶融金属錫の上に溶融ガラスを浮かべて板状に成
形するフロート法によって製造された板ガラスは、Ｆｅ
2+の割合が増加しやすいため、特にガラス中のＦｅ2 Ｏ
3 量を低減させることによる発色抑制効果が特に大き
い。As a method of forming a glass substrate, a float method, a roll-out method, a fusion method, and the like are known. However, the glass substrate is manufactured by a float method in which molten glass is floated on molten metal tin and formed into a plate shape. Sheet glass is Fe
Since the proportion of 2+ is liable to increase, Fe 2 O
(3 ) The effect of suppressing color development by reducing the amount is particularly large.
【００１６】次に本発明における前面ガラス基板の組成
範囲を上記のように限定した理由を説明する。Next, the reason why the composition range of the front glass substrate in the present invention is limited as described above will be described.
【００１７】ＳｉＯ2 はガラスのネットワークフォーマ
ーであり、その含有率は５０〜６５％が好ましい。５０
％より少ないと、ガラスの歪点が低下し、ガラス基板を
熱処理する際の熱収縮が大きくなり、パターンの位置ず
れが発生するため好ましくない。一方、６５％より多い
と、熱膨張係数が小さくなり、絶縁ペーストやシーリン
グフリットのそれと整合しなくなるため反りが発生しや
すくなる。SiO 2 is a glass network former, and its content is preferably 50 to 65%. 50
%, It is not preferable because the strain point of the glass decreases, the heat shrinkage during the heat treatment of the glass substrate increases, and the displacement of the pattern occurs. On the other hand, if it is more than 65%, the coefficient of thermal expansion becomes small, and it becomes inconsistent with that of the insulating paste or the sealing frit, so that warpage is likely to occur.
【００１８】Ａｌ2 Ｏ3 は、ガラスの歪点を高める成分
であり、その含有率は１〜１５％が好ましい。１％より
少ないと、上記効果が得られず、一方、１５％より多い
と、熱膨張係数が小さくなりすぎる。Al 2 O 3 is a component for increasing the strain point of glass, and its content is preferably 1 to 15%. If it is less than 1%, the above effect cannot be obtained, while if it is more than 15%, the coefficient of thermal expansion becomes too small.
【００１９】ＭｇＯ、ＣａＯ、ＳｒＯ、ＢａＯは、ガラ
スを溶融しやすくすると共に熱膨張係数を調整する作用
を有し、その含有率は１０〜２７％である。１０％より
少ないと、歪点が低くなりすぎ、一方、２７％より多い
と、ガラスが失透しやすく、成形が困難になる。MgO, CaO, SrO, and BaO have the effect of facilitating melting of glass and adjusting the coefficient of thermal expansion, and the content is 10 to 27%. If it is less than 10%, the strain point is too low, while if it is more than 27%, the glass is liable to devitrify, making molding difficult.
【００２０】Ｌｉ2 Ｏ、Ｎａ2 Ｏ及びＫ2 Ｏは、いずれ
も熱膨張係数を調整するための成分である。これらの成
分の合量が７％より少ないと、熱膨張係数が小さくなり
すぎ、一方、１５％より多いと、歪点が低くなりすぎる
と共に体積抵抗率が低くなりすぎるため好ましくない。
すなわちこの種のガラスの体積抵抗率が低くなると、ガ
ラス中のアルカリ成分が薄膜電極と反応し、電極材料の
電気抵抗率が変化しやすくなるためである。Li 2 O, Na 2 O and K 2 O are all components for adjusting the coefficient of thermal expansion. If the total amount of these components is less than 7%, the coefficient of thermal expansion becomes too small, while if it is more than 15%, the strain point becomes too low and the volume resistivity becomes too low, which is not preferable.
That is, when the volume resistivity of this type of glass decreases, the alkali component in the glass reacts with the thin film electrode, and the electrical resistivity of the electrode material tends to change.
【００２１】ＺｒＯ2 は、ガラスの化学的耐久性を向上
させる成分であるが、９％より多いと、熱膨張係数が小
さくなりすぎると共に、ガラスの溶融時に失透物が生成
しやすく成形が困難となる。ZrO 2 is a component for improving the chemical durability of glass, but if it is more than 9%, the coefficient of thermal expansion becomes too small, and devitrified matters are easily formed when the glass is melted, making molding difficult. Becomes
【００２２】ＴｉＯ2 は、ガラスの紫外線による着色を
防止する成分であり、その含有量は０〜５％である。プ
ラズマディスプレイ装置の場合、放電時に紫外線が発生
するが、前面ガラス基板が紫外線によって着色すると、
長期間に亘って使用している間に徐々に表示画面が見づ
らくなるため、ＴｉＯ2 を添加することが望ましい。し
かしながらＴｉＯ2 が５％より多いと、ガラスが失透し
やすく、成形が困難となる。TiO 2 is a component for preventing coloring of glass by ultraviolet rays, and its content is 0 to 5%. In the case of a plasma display device, ultraviolet rays are generated at the time of discharge, but when the front glass substrate is colored by the ultraviolet rays,
It is desirable to add TiO 2 because the display screen gradually becomes difficult to see during use for a long period of time. However, if the content of TiO 2 is more than 5%, the glass tends to be devitrified, and molding is difficult.
【００２３】また本発明においては、上記の成分以外に
も、熱膨張係数を調整するためにＬｉ2 Ｏを、また消泡
剤としてＣｌ2 、ＳＯ3 等の成分を、ガラス特性を損な
わない範囲で含有させることもできる。In the present invention, in addition to the above components, Li 2 O for adjusting the coefficient of thermal expansion, and components such as Cl 2 and SO 3 as defoaming agents are used in a range not impairing the glass properties. Can also be contained.
【００２４】本発明のプラズマディスプレイ装置にあっ
ては、前面ガラス基板ほどでもないが、背面ガラス基板
にも発色が現れる可能性があるため、背面ガラス基板に
ついても、前面ガラス基板と同様のガラスを使用するこ
とが望ましい。In the plasma display device of the present invention, although the color may appear on the rear glass substrate, though not as much as the front glass substrate, the same glass as the front glass substrate may be used for the rear glass substrate. It is desirable to use.
【００２５】[0025]
【実施例】以下、本発明のプラズマディスプレイ装置を
実施例に基づいて詳細に説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a plasma display device according to the present invention will be described in detail based on embodiments.
【００２６】表１は、本発明の装置に用いるガラス基板
（試料Ｎｏ．１〜４）と、比較例のガラス基板（試料Ｎ
ｏ．５、６）の組成（ｗｔ％）と特性を示すものであ
る。尚、Ｆｅ2 Ｏ3 は、微量のためｐｐｍで表記した。Table 1 shows the glass substrates (Sample Nos. 1 to 4) used in the apparatus of the present invention and the glass substrates of Comparative Examples (Sample N).
o. 5 and 6) showing the composition (wt%) and characteristics. Note that Fe 2 O 3 is expressed in ppm because it is a trace amount.
【００２７】[0027]
【表１】 [Table 1]
【００２８】表１のガラス基板は、表中のガラス組成と
なるように原料を調合し、これを白金坩堝に入れた後、
電気炉中で１４５０〜１５５０℃の温度で４時間溶融
し、この溶融ガラスをカーボン板上に流し出して板状に
成形し、これを両面研磨して３ｍｍ厚の板状に加工し、
得られた板ガラスを２００ｍｍ角の大きさに切断加工す
ることによって得た。For the glass substrates shown in Table 1, raw materials were prepared so as to have the glass compositions shown in the table, and the raw materials were placed in a platinum crucible.
Melted at a temperature of 1450-1550 ° C. for 4 hours in an electric furnace, poured out the molten glass onto a carbon plate, formed into a plate shape, polished on both sides and processed into a 3 mm thick plate shape,
It was obtained by cutting the obtained plate glass into a size of 200 mm square.
【００２９】実施例であるＮｏ．１〜４の各ガラス基板
は、歪点が５７２℃以上であるため熱収縮が少なく、液
相温度が１０５０℃以下であるため失透し難く、熱膨張
係数が８１〜８９×１０-7／℃であるため絶縁ペースト
やシーリングフリットのそれと整合するものであった。
またこれらは体積抵抗率が１１．４以上と高く、しかも
表面に銀電極を形成し、加熱しても、発色は認められな
かった。In Example No. Each of the glass substrates 1 to 4 has a low heat shrinkage because the strain point is 572 ° C. or higher, and is hardly devitrified because the liquidus temperature is 1050 ° C. or lower, and has a thermal expansion coefficient of 81 to 89 × 10 −7 /. Since the temperature was in ° C, it matched that of the insulating paste and the sealing frit.
In addition, these materials had a high volume resistivity of 11.4 or more, and no color was observed even when a silver electrode was formed on the surface and heated.
【００３０】それに対し、比較例であるＮｏ．５、６の
ガラス基板は、歪点、液相温度、熱膨張係数及び体積抵
抗率については、実施例とほぼ同等であったが、表面に
銀電極を形成し、加熱すると、Ｎｏ．５は、極僅かに発
色し、Ｎｏ．６の試料は、強く発色した。On the other hand, the comparative example No. The glass substrates of Nos. 5 and 6 had almost the same strain point, liquidus temperature, coefficient of thermal expansion, and volume resistivity as those of the examples. No. 5 developed a very slight color, and No. 5 The sample No. 6 developed a strong color.
【００３１】尚、表中の歪点は、ＡＳＴＭ Ｃ３３６−
７１の方法に基づいて測定し、液相温度は、白金ボート
に２９７〜５００μｍの粒径を有するガラス粉末を入
れ、温度勾配炉に４８時間保持した後の失透観察によっ
て求めたものである。The strain points in the table are based on ASTM C336-
The liquidus temperature was measured based on the method of No. 71, and the liquidus temperature was determined by putting glass powder having a particle size of 297 to 500 μm in a platinum boat and observing devitrification after holding the glass powder in a temperature gradient furnace for 48 hours.
【００３２】また熱膨張係数は、ディラトメーターによ
って３０〜３８０℃における平均熱膨張係数を測定した
ものであり、体積抵抗率は、ＡＳＴＭ Ｃ６５７−７８
に基づいて１５０℃における値を測定したものである。The coefficient of thermal expansion is obtained by measuring the average coefficient of thermal expansion at 30 to 380 ° C. using a dilatometer, and the volume resistivity is determined by ASTM C657-78.
The value at 150 ° C. was measured based on.
【００３３】さらに発色度合いは、各ガラス基板の片面
上にスクリーン印刷で銀ペーストを印刷し、６００℃で
１時間熱処理することによって電極膜を形成した後、そ
の膜形成面を目視で観察することによって発色度合いを
調べたものである。Further, the degree of color development is determined by printing a silver paste on one side of each glass substrate by screen printing, and heat-treating at 600 ° C. for 1 hour to form an electrode film, and then visually observe the film-formed surface. The degree of color development was determined by the following method.
【００３４】次に所定の大きさに切断した試料Ｎｏ．１
のガラス基板の２枚準備し、これらのガラス基板上に、
銀ペーストや絶縁ペーストを塗布・焼成することによっ
て銀電極、誘電体層、隔壁、蛍光体等を形成した。次い
でこれらのガラス基板を低融点封着ガラスでシールし、
内部にキセノンと主放電ガスのネオンとの混合ガスを封
入し気密封止することによってプラズマディスプレイ装
置を作製した。Next, the sample No. cut into a predetermined size was used. 1
Prepare two glass substrates of the above, on these glass substrates,
A silver electrode, a dielectric layer, a partition, a phosphor, and the like were formed by applying and baking a silver paste or an insulating paste. Next, these glass substrates are sealed with a low melting point sealing glass,
A mixed gas of xenon and neon of the main discharge gas was sealed therein and hermetically sealed to produce a plasma display device.
【００３５】こうして作製されたプラズマディスプレイ
装置を作動させたところ、透明性と色バランスに優れた
画像が得られた。When the plasma display device thus manufactured was operated, an image having excellent transparency and color balance was obtained.
【００３６】[0036]
【発明の効果】以上のように本発明のプラズマディスプ
レイ装置は、前面ガラス基板に含まれるＦｅ2 Ｏ3 量が
少ないため、電極材料として銀を用いながらも、銀によ
る発色が生じ難く、優れた表示性能（透明性・色バラン
ス）を有している。As described above, the plasma display device of the present invention is excellent in that color formation due to silver hardly occurs even though silver is used as an electrode material because the amount of Fe 2 O 3 contained in the front glass substrate is small. Has display performance (transparency and color balance).
Claims (2)
ス基板と背面ガラス基板との間に、金属電極を備えてな
るプラズマディスプレイ装置において、前面ガラス基板
に含まれるＦｅ2 Ｏ3 量が２０００ｐｐｍ未満であり、
金属電極が銀から形成されてなることを特徴とするプラ
ズマディスプレイ装置。1. A plasma display device comprising a metal electrode between a front glass substrate and a rear glass substrate opposed to each other with a predetermined distance therebetween, wherein the amount of Fe 2 O 3 contained in the front glass substrate is 2000 ppm. Less than,
A plasma display device, wherein the metal electrode is formed from silver.
Ｏ2 ５０〜６５％、Ａｌ2 Ｏ3 １〜１５％、ＭｇＯ
＋ＣａＯ＋ＳｒＯ＋ＢａＯ １０〜２７％、Ｌｉ2 Ｏ＋
Ｎａ2 Ｏ＋Ｋ2 Ｏ ７〜１５％、ＺｒＯ2 ０〜９％、
ＴｉＯ2 ０〜５％の組成を有することを特徴とする請
求項１記載のプラズマディスプレイ装置。2. The method according to claim 1, wherein the front glass substrate has a weight percentage of Si.
O 2 50~65%, Al 2 O 3 1~15%, MgO
+ CaO + SrO + BaO 10 to 27%, Li 2 O +
Na 2 O + K 2 O 7~15 %, ZrO 2 0~9%,
2. The plasma display device according to claim 1, wherein said TiO2 has a composition of 0 to 5%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9155777A JPH10334813A (en) | 1997-05-28 | 1997-05-28 | Plasma display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9155777A JPH10334813A (en) | 1997-05-28 | 1997-05-28 | Plasma display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH10334813A true JPH10334813A (en) | 1998-12-18 |
Family
ID=15613188
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9155777A Pending JPH10334813A (en) | 1997-05-28 | 1997-05-28 | Plasma display device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10334813A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6413892B1 (en) * | 1997-06-20 | 2002-07-02 | Nippon Sheet Glass Co., Ltd. | Glass substrate for magnetic recording media |
| WO2010073799A1 (en) | 2008-12-25 | 2010-07-01 | 旭硝子株式会社 | Glass substrate and process for producing same |
| JP2011011951A (en) * | 2009-07-03 | 2011-01-20 | Asahi Glass Co Ltd | Glass substrate for flat panel display, method for producing the same, and display panel using the same |
| US8071494B2 (en) | 2006-11-10 | 2011-12-06 | Asahi Glass Company, Limited | Glass substrate for flat panel display, process for producing the same, and display panel employing the same |
| WO2011158366A1 (en) * | 2010-06-17 | 2011-12-22 | 旭硝子株式会社 | Glass substrate and manufacturing method thereof |
-
1997
- 1997-05-28 JP JP9155777A patent/JPH10334813A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6413892B1 (en) * | 1997-06-20 | 2002-07-02 | Nippon Sheet Glass Co., Ltd. | Glass substrate for magnetic recording media |
| US8071494B2 (en) | 2006-11-10 | 2011-12-06 | Asahi Glass Company, Limited | Glass substrate for flat panel display, process for producing the same, and display panel employing the same |
| WO2010073799A1 (en) | 2008-12-25 | 2010-07-01 | 旭硝子株式会社 | Glass substrate and process for producing same |
| US8324124B2 (en) | 2008-12-25 | 2012-12-04 | Asahi Glass Company, Limited | Glass substrate and its production process |
| JP2011011951A (en) * | 2009-07-03 | 2011-01-20 | Asahi Glass Co Ltd | Glass substrate for flat panel display, method for producing the same, and display panel using the same |
| WO2011158366A1 (en) * | 2010-06-17 | 2011-12-22 | 旭硝子株式会社 | Glass substrate and manufacturing method thereof |
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