JPH04357895A - Manufacture of ceramic wiring board - Google Patents
Manufacture of ceramic wiring boardInfo
- Publication number
- JPH04357895A JPH04357895A JP13250891A JP13250891A JPH04357895A JP H04357895 A JPH04357895 A JP H04357895A JP 13250891 A JP13250891 A JP 13250891A JP 13250891 A JP13250891 A JP 13250891A JP H04357895 A JPH04357895 A JP H04357895A
- Authority
- JP
- Japan
- Prior art keywords
- wiring board
- plating
- copper
- ceramic wiring
- conductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 239000004020 conductor Substances 0.000 claims abstract description 27
- 229910052802 copper Inorganic materials 0.000 claims abstract description 27
- 239000010949 copper Substances 0.000 claims abstract description 27
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910052796 boron Inorganic materials 0.000 claims abstract description 21
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 238000000034 method Methods 0.000 claims abstract description 13
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 9
- 238000007639 printing Methods 0.000 claims abstract description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 20
- 238000010304 firing Methods 0.000 claims description 11
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- 239000010970 precious metal Substances 0.000 claims 1
- 238000007747 plating Methods 0.000 abstract description 34
- 229910000510 noble metal Inorganic materials 0.000 abstract description 10
- 238000005530 etching Methods 0.000 abstract description 3
- 238000000151 deposition Methods 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 16
- 229910052751 metal Inorganic materials 0.000 description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 229910052707 ruthenium Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- -1 etc. Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Landscapes
- Manufacturing Of Printed Wiring (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、セラミック配線板の製
造法に関し、特に表面層に銅パターン及び抵抗体を形成
する配線板の製造法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a ceramic wiring board, and more particularly to a method of manufacturing a wiring board in which a copper pattern and a resistor are formed on the surface layer.
【0002】0002
【従来の技術】近年電子回路の高密度化の要求に応じ、
軽薄短小でかつ高信頼性のセラミック配線板が実用に供
されている。従来の抵抗付セラミック配線板は、印刷法
により銀、銀−パラジウム等のペーストを用いた貴金属
の導体回路及びルテニウム、カーボン等のペーストによ
る抵抗体を形成した後大気中で焼成されて製造される。
この製造法は厚膜方式のセラミック配線板として一般に
知られている。[Prior Art] In response to the recent demand for higher density electronic circuits,
Ceramic wiring boards that are light, thin, short, and highly reliable are in practical use. Conventional ceramic wiring boards with resistors are manufactured by forming noble metal conductor circuits using silver, silver-palladium, etc. pastes and resistors using ruthenium, carbon, etc. pastes using a printing method, and then firing them in the atmosphere. . This manufacturing method is generally known as a thick film type ceramic wiring board.
【0003】0003
【発明が解決しようとする課題】上記したセラミック配
線板を製造する場合、金、銀、白金等の貴金属層やニッ
ケル及び銅を用いた金属層の配線は、一般的に安価な印
刷方式による回路形成が主流である。しかし、この方法
では微細回路の形成が困難であると同時に貴金属層やニ
ッケル及び銅金属層のペースト材には、導体回路の接着
力を向上させるためにガラス成分が含まれており、導通
抵抗値が高くなり信頼性が低くなる等の欠点がある。ま
た、この厚膜回路には通常大気中で焼成されるルテニウ
ム系抵抗体が搭載される。しかしながらニッケル及び銅
金属系のペーストを用いた配線板やニッケルめっき及び
銅めっきによって得られた導体回路は、抵抗体の焼結に
おいて大気中で行うと回路が酸化し消失するため、現状
では抵抗変化率の高いカーボン系の抵抗体のみが使用可
能であり、信頼性が劣る等の問題がある。[Problems to be Solved by the Invention] When manufacturing the above-mentioned ceramic wiring board, wiring of noble metal layers such as gold, silver, platinum, etc., and metal layers using nickel and copper is generally performed using an inexpensive printing method. Formation is the mainstream. However, with this method, it is difficult to form fine circuits, and at the same time, the paste material for the noble metal layer, nickel, and copper metal layer contains a glass component to improve the adhesive strength of the conductor circuit, and the conduction resistance value There are disadvantages such as a high value and low reliability. Furthermore, this thick film circuit is equipped with a ruthenium-based resistor that is normally fired in the atmosphere. However, wiring boards using nickel and copper metal pastes and conductor circuits obtained by nickel plating and copper plating do not change resistance at present because the circuits oxidize and disappear when sintering resistors in the atmosphere. Only carbon-based resistors with high carbon resistance can be used, and there are problems such as poor reliability.
【0004】本発明は、上記した欠点のないセラミック
配線板の製造法を提供することを目的とするものである
。The object of the present invention is to provide a method for manufacturing a ceramic wiring board that does not have the above-mentioned drawbacks.
【0005】[0005]
【課題を解決するための手段】本発明は、セラミック基
板に硼素を含むニッケルめっきを施した後、銅めっき次
いでエッチングをして複数の導体回路を形成し、その後
該導体回路に前記硼素を含むニッケルめっき次いで貴金
属のめっきを施し、更に導体回路間に抵抗体を印刷によ
り配した後、大気中で焼成するセラミック配線板の製造
法に関する。[Means for Solving the Problems] The present invention involves plating a ceramic substrate with nickel containing boron, followed by copper plating and etching to form a plurality of conductor circuits, and then forming a plurality of conductor circuits containing the boron. The present invention relates to a method for manufacturing a ceramic wiring board, which involves nickel plating, then noble metal plating, and printing a resistor between conductor circuits, followed by firing in the atmosphere.
【0006】本発明は、導体回路を耐酸化性の優れた硼
素を含むニッケルめっき層及び貴金属のめっき層で被覆
し、大気中での焼成による酸化消失を防止しようとする
ものである。本発明においてセラミック基板はアルミナ
基板等の公知のものが用いられる。セラミック基板はア
ルカリ溶融等によりあらかじめ表面を粗化しておくこと
が好ましい。導体回路の形成、硼素を含むニッケルめっ
き、貴金属のめっき、抵抗体の印刷及び焼成は公知の方
法による。導体回路の銅被膜は抵抗を小さくするために
めっきにより形成する。導体回路のパターンは、微細回
路用のフォトリソ法を用いたアディティブ法で形成すれ
ば高密度配線が可能であり、パターン精度にも優れてい
るので好ましい。貴金属めっき層の種類は特に制限はな
い。抵抗体の種類も制限はない。焼成の温度は300〜
750℃が好ましい。[0006] The present invention aims to coat a conductor circuit with a nickel plating layer containing boron and a noble metal plating layer having excellent oxidation resistance to prevent oxidation loss due to firing in the atmosphere. In the present invention, a known ceramic substrate such as an alumina substrate is used as the ceramic substrate. It is preferable that the surface of the ceramic substrate be roughened in advance by alkali melting or the like. Formation of the conductor circuit, boron-containing nickel plating, noble metal plating, printing and firing of the resistor are performed by known methods. The copper coating of the conductor circuit is formed by plating to reduce resistance. It is preferable that the pattern of the conductor circuit is formed by an additive method using a photolithography method for fine circuits, since this enables high-density wiring and has excellent pattern accuracy. There are no particular restrictions on the type of noble metal plating layer. There are no restrictions on the type of resistor. The firing temperature is 300~
750°C is preferred.
【0007】本発明の順序を図1により説明する。セラ
ミック基板1の表面を粗化した後、その全面にめっきに
よりNi−硼素被膜2を形成し、更にめっきにより銅被
膜3を形成する。続いて銅被膜3の表面にフォトリソ層
を設けエッチングして導体回路を形成する。この後再度
めっきによりNi−硼素被膜4更にその上に貴金属めっ
き層5を形成し、次いで導体回路間に印刷法により抵抗
体6を形成し、最後にこれを大気中で焼成してセラミッ
ク配線板を得るものである。The sequence of the present invention will be explained with reference to FIG. After the surface of the ceramic substrate 1 is roughened, a Ni-boron film 2 is formed on the entire surface by plating, and a copper film 3 is further formed by plating. Subsequently, a photolithographic layer is provided on the surface of the copper film 3 and etched to form a conductive circuit. Thereafter, a Ni-boron coating 4 is formed again by plating, and a noble metal plating layer 5 is formed thereon, and then a resistor 6 is formed between the conductor circuits by a printing method, and finally, this is fired in the atmosphere to form a ceramic wiring board. This is what you get.
【0008】[0008]
【実施例】以下本発明の実施例を説明する。[Examples] Examples of the present invention will be described below.
【0009】実施例1
純度96%、厚さ1.0mmのアルミナ基板を350℃
のアルカリ溶融塩中に5分間浸漬してアルミナ基板の表
面全体を均一に粗化し、さらに10重量%硫酸溶液で中
和後水洗した。その後パラジウム付与として活性液(ワ
ールドメタル社製、商品名AT−80)に浸漬処理し、
次いで無電解Ni−B液(ワールドメタル社製、商品名
ニボロンM2)によりNi−硼素被膜を2μmの厚さに
形成したのち水洗した。このNi−硼素めっき被膜の上
に無電解銅めっき液(日立化成工業KK製、商品名L−
59)でめっきを行い、厚さ20μmの銅めっき層を形
成した。めっき後感光性レジストフィルム(日立化成工
業KK製、商品名フォティクPHT−862AF−25
)を銅めっき層の全体に貼付し、更にその上面に得られ
る導体回路と同形状に透明な部分を形成したネガフィル
ムを貼付し、紫外線により露光を行い、炭酸ソーダ溶液
で現像した。その後、塩化銅によりエッチング処理し、
不必要な銅めっき層及びNi−硼素めっき層を除去した
。次いで水酸化ナトリウムの5%溶液で感光性レジスト
フィルムを剥離した。その後これらの導体回路に先に使
用した無電解Ni−B液で2μmの無電解Ni−硼素め
っき被膜、次いで金めっき液で金めっき被膜2μmを施
し、水洗及び乾燥した。これにより耐酸化性のNi−硼
素被膜により全面を被覆された銅導体回路を形成した配
線板を得た。次にこれらの配線板上にスクリーン印刷法
を用い導体回路間にルテニウム抵抗体(昭栄化学工業K
K製、商品名R−2000シリーズ、R−2310)を
印刷し、大気中550℃で10分間保持する焼成を行っ
て抵抗体を形成した。上記した製造法により得られるこ
れらのNi−硼素と銅と金との被覆からなる導体回路を
有するセラミック配線板は導通抵抗の上昇や銅回路の酸
化消失もなく大気中で焼成温度550℃においても使用
可能であることが認められた。Example 1 An alumina substrate with a purity of 96% and a thickness of 1.0 mm was heated at 350°C.
The entire surface of the alumina substrate was uniformly roughened by immersing it in an alkali molten salt for 5 minutes, and then neutralized with a 10% by weight sulfuric acid solution and washed with water. After that, it was immersed in an active solution (manufactured by World Metal Co., Ltd., trade name AT-80) to impart palladium.
Next, a Ni-boron film was formed to a thickness of 2 μm using an electroless Ni-B solution (manufactured by World Metal Co., Ltd., trade name Niboron M2), and then washed with water. On this Ni-boron plating film, electroless copper plating solution (manufactured by Hitachi Chemical KK, trade name: L-
59) to form a copper plating layer with a thickness of 20 μm. Photosensitive resist film after plating (manufactured by Hitachi Chemical KK, trade name Photik PHT-862AF-25
) was attached to the entire copper plating layer, and then a negative film with a transparent part formed in the same shape as the conductor circuit to be obtained was attached to the upper surface, exposed to ultraviolet light, and developed with a sodium carbonate solution. After that, it was etched with copper chloride,
The unnecessary copper plating layer and Ni-boron plating layer were removed. The photosensitive resist film was then stripped with a 5% sodium hydroxide solution. Thereafter, these conductor circuits were coated with a 2 μm electroless Ni-boron plating film using the electroless Ni-B solution used previously, and then a 2 μm gold plating film using the gold plating solution, washed with water, and dried. As a result, a wiring board having a copper conductor circuit whose entire surface was covered with an oxidation-resistant Ni-boron film was obtained. Next, ruthenium resistors (Shoei Kagaku Kogyo K.
(manufactured by K. K., trade name: R-2000 series, R-2310) was printed and fired at 550° C. for 10 minutes in the atmosphere to form a resistor. Ceramic wiring boards having conductor circuits made of Ni-boron, copper, and gold coatings obtained by the above-mentioned manufacturing method can be fired at 550°C in the atmosphere without increasing conduction resistance or oxidizing the copper circuits. It was confirmed that it can be used.
【0010】実施例2
実施例1と同様にアルミナ基板を粗化し無電解Ni−硼
素めっき被膜を2μm形成後、電気銅めっき(日本エレ
クトロプレイティングエンジニヤーズ製、商品名キュー
バスEF)により銅被膜20μmを施し、実施例1と同
様にフォトリソ及びエッチング処理を行い、この上に各
2μmのNi−硼素めっき及び金めっき被膜を施して導
体回路を有する配線板を得た。更にこれらの導体パター
ン間に印刷法により抵抗体(住友金属鉱山KK製、商品
名R−Hシリーズ、R−131)を形成し650℃、1
0分間の大気中焼成を行った。得られたセラミック配線
板は、実施例1と同様に650℃においてもなんら問題
はみとめられなかった。Example 2 After roughening an alumina substrate and forming an electroless Ni-boron plating film of 2 μm in the same manner as in Example 1, a copper film was formed by electrolytic copper plating (manufactured by Nippon Electroplating Engineers, trade name Qubus EF). A thickness of 20 μm was applied, photolithography and etching were performed in the same manner as in Example 1, and a Ni-boron plating film and a gold plating film of 2 μm each were applied thereon to obtain a wiring board having a conductive circuit. Furthermore, a resistor (manufactured by Sumitomo Metal Mining KK, product name R-H series, R-131) was formed between these conductor patterns by a printing method, and heated at 650°C for 1
Firing was performed in the air for 0 minutes. As in Example 1, no problems were observed in the obtained ceramic wiring board even at 650°C.
【0011】比較例1
実施例と同様にアルミナ基板を粗化した。ついでこれら
の基板表面にパラジウムを付与するためのキャタリスト
処理(日立化成工業KK製、商品名HS−101B)を
施し、実施例1と同様に無電解めっきにより20μmの
銅めっき層を得た。次いで実施例1と同様にフォトリソ
法を用いたアディティブ法によりアルミナ基板の表面に
銅金属からなる導体回路を有する配線板を得た。その後
実施例1と同様に抵抗体印刷、次いで大気中焼成を行っ
てセラミック配線板を得た。しかしながら、この銅めっ
き層からなる導体回路は550℃の大気中焼成において
酸化により消失した。Comparative Example 1 An alumina substrate was roughened in the same manner as in the example. Catalyst treatment (manufactured by Hitachi Chemical Co., Ltd., trade name HS-101B) for imparting palladium was then applied to the surfaces of these substrates, and a 20 μm copper plating layer was obtained by electroless plating in the same manner as in Example 1. Next, as in Example 1, a wiring board having a conductive circuit made of copper metal on the surface of an alumina substrate was obtained by an additive method using photolithography. Thereafter, resistor printing was performed in the same manner as in Example 1, followed by firing in the atmosphere to obtain a ceramic wiring board. However, the conductor circuit made of this copper plating layer disappeared due to oxidation during firing in the atmosphere at 550°C.
【0012】0012
【発明の効果】本発明によれば、銅の導体回路をNi−
硼素及び貴金属の層で被覆したので、焼成の際の導体回
路の酸化消失を防止でき、従来不可能であった大気中焼
成が可能になる。また銅の被膜がめっき法で形成される
ために、銅の純度が高く導体回路の抵抗を低くでき、加
えて微細回路の形成が可能になる利点がある。Effects of the Invention According to the present invention, a copper conductor circuit can be made of Ni-
Since it is coated with a layer of boron and a noble metal, it is possible to prevent the conductive circuit from being lost due to oxidation during firing, and it becomes possible to perform firing in the air, which was previously impossible. Furthermore, since the copper film is formed by plating, the purity of the copper is high and the resistance of the conductor circuit can be lowered, and in addition, there is an advantage that fine circuits can be formed.
【図1】本発明の製造法の順序を示す図である。FIG. 1 is a diagram showing the order of the manufacturing method of the present invention.
1 セラミック基板
2 Ni−硼素被膜
3 銅被膜
4 Ni−硼素被膜1 Ceramic substrate
2 Ni-Boron coating 3 Copper coating
4 Ni-boron coating
Claims (1)
めっきを施した後、銅めっき次いでエッチングをして複
数の導体回路を形成し、その後該導体回路に前記硼素を
含むニッケルめっき次いで貴金属のめっきを施し、更に
導体回路間に抵抗体を印刷により配した後、大気中で焼
成することを特徴とするセラミック配線板の製造法。1. A ceramic substrate is plated with nickel containing boron, then copper plated and then etched to form a plurality of conductor circuits, and then the conductor circuits are plated with nickel containing boron and then with a precious metal. A method for manufacturing a ceramic wiring board, further comprising disposing a resistor between the conductor circuits by printing, and then firing in the atmosphere.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13250891A JPH04357895A (en) | 1991-06-04 | 1991-06-04 | Manufacture of ceramic wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13250891A JPH04357895A (en) | 1991-06-04 | 1991-06-04 | Manufacture of ceramic wiring board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04357895A true JPH04357895A (en) | 1992-12-10 |
Family
ID=15082995
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13250891A Pending JPH04357895A (en) | 1991-06-04 | 1991-06-04 | Manufacture of ceramic wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04357895A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005083735A3 (en) * | 2004-02-27 | 2005-10-20 | E2V Tech Uk Ltd | Electron beam tubes |
-
1991
- 1991-06-04 JP JP13250891A patent/JPH04357895A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005083735A3 (en) * | 2004-02-27 | 2005-10-20 | E2V Tech Uk Ltd | Electron beam tubes |
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