JP7594436B2 - Adhesive tape - Google Patents
Adhesive tape Download PDFInfo
- Publication number
- JP7594436B2 JP7594436B2 JP2020506838A JP2020506838A JP7594436B2 JP 7594436 B2 JP7594436 B2 JP 7594436B2 JP 2020506838 A JP2020506838 A JP 2020506838A JP 2020506838 A JP2020506838 A JP 2020506838A JP 7594436 B2 JP7594436 B2 JP 7594436B2
- Authority
- JP
- Japan
- Prior art keywords
- ultraviolet
- adhesive tape
- adhesive layer
- base film
- pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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- 239000002390 adhesive tape Substances 0.000 title claims description 95
- 239000012790 adhesive layer Substances 0.000 claims description 92
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 82
- 239000010410 layer Substances 0.000 claims description 61
- 125000000524 functional group Chemical group 0.000 claims description 43
- 239000000758 substrate Substances 0.000 claims description 35
- 229920001296 polysiloxane Polymers 0.000 claims description 32
- 239000000178 monomer Substances 0.000 claims description 31
- 229920000058 polyacrylate Polymers 0.000 claims description 27
- 239000003431 cross linking reagent Substances 0.000 claims description 24
- 150000002222 fluorine compounds Chemical class 0.000 claims description 23
- 229920000642 polymer Polymers 0.000 claims description 23
- 239000000945 filler Substances 0.000 claims description 22
- 238000004519 manufacturing process Methods 0.000 claims description 18
- 230000001678 irradiating effect Effects 0.000 claims description 14
- -1 alkyl acrylate ester Chemical class 0.000 claims description 12
- 239000011347 resin Substances 0.000 claims description 12
- 229920005989 resin Polymers 0.000 claims description 12
- 238000002834 transmittance Methods 0.000 claims description 12
- 238000003860 storage Methods 0.000 claims description 10
- 230000004580 weight loss Effects 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 238000004132 cross linking Methods 0.000 claims description 8
- 239000003505 polymerization initiator Substances 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 229920006122 polyamide resin Polymers 0.000 claims description 4
- 150000001408 amides Chemical class 0.000 claims description 3
- 150000003949 imides Chemical class 0.000 claims description 3
- 150000002576 ketones Chemical class 0.000 claims description 3
- 150000002170 ethers Chemical class 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 1
- 239000000853 adhesive Substances 0.000 description 76
- 230000001070 adhesive effect Effects 0.000 description 76
- 239000010408 film Substances 0.000 description 62
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 60
- 235000012431 wafers Nutrition 0.000 description 39
- 238000000034 method Methods 0.000 description 26
- 206010040844 Skin exfoliation Diseases 0.000 description 24
- 238000005259 measurement Methods 0.000 description 22
- 239000007789 gas Substances 0.000 description 21
- 239000003795 chemical substances by application Substances 0.000 description 20
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 16
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 16
- 239000004065 semiconductor Substances 0.000 description 16
- 229910052710 silicon Inorganic materials 0.000 description 16
- 239000010703 silicon Substances 0.000 description 16
- 238000010438 heat treatment Methods 0.000 description 13
- 239000011521 glass Substances 0.000 description 12
- 239000003504 photosensitizing agent Substances 0.000 description 10
- 238000006116 polymerization reaction Methods 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- 239000003999 initiator Substances 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000004677 Nylon Substances 0.000 description 6
- 239000000654 additive Substances 0.000 description 6
- 125000003700 epoxy group Chemical group 0.000 description 6
- 229920001778 nylon Polymers 0.000 description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- FYRCDEARNUVZRG-UHFFFAOYSA-N 1,1,5-trimethyl-3,3-bis(2-methylpentan-2-ylperoxy)cyclohexane Chemical compound CCCC(C)(C)OOC1(OOC(C)(C)CCC)CC(C)CC(C)(C)C1 FYRCDEARNUVZRG-UHFFFAOYSA-N 0.000 description 4
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 4
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 230000001186 cumulative effect Effects 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000012948 isocyanate Substances 0.000 description 4
- 150000002513 isocyanates Chemical class 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 238000010943 off-gassing Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000004080 punching Methods 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 3
- KJUGUADJHNHALS-UHFFFAOYSA-N 1H-tetrazole Chemical compound C=1N=NNN=1 KJUGUADJHNHALS-UHFFFAOYSA-N 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 3
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 125000004386 diacrylate group Chemical group 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000004014 plasticizer Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 238000005979 thermal decomposition reaction Methods 0.000 description 3
- 239000001993 wax Substances 0.000 description 3
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 2
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 2
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical class OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 2
- RTEZVHMDMFEURJ-UHFFFAOYSA-N 2-methylpentan-2-yl 2,2-dimethylpropaneperoxoate Chemical compound CCCC(C)(C)OOC(=O)C(C)(C)C RTEZVHMDMFEURJ-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 2
- RBQRWNWVPQDTJJ-UHFFFAOYSA-N methacryloyloxyethyl isocyanate Chemical compound CC(=C)C(=O)OCCN=C=O RBQRWNWVPQDTJJ-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000013464 silicone adhesive Substances 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- VLTYTTRXESKBKI-UHFFFAOYSA-N (2,4-dichlorophenyl)-phenylmethanone Chemical compound ClC1=CC(Cl)=CC=C1C(=O)C1=CC=CC=C1 VLTYTTRXESKBKI-UHFFFAOYSA-N 0.000 description 1
- ZAMZCSIXTWIEDY-UHFFFAOYSA-N (2-propylphenyl)methanol Chemical compound CCCC1=CC=CC=C1CO ZAMZCSIXTWIEDY-UHFFFAOYSA-N 0.000 description 1
- BWZAUXRKSMJLMH-UHFFFAOYSA-N 1,1-diethoxyethylbenzene Chemical compound CCOC(C)(OCC)C1=CC=CC=C1 BWZAUXRKSMJLMH-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- GJZFGDYLJLCGHT-UHFFFAOYSA-N 1,2-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(CC)C(CC)=CC=C3SC2=C1 GJZFGDYLJLCGHT-UHFFFAOYSA-N 0.000 description 1
- UYEDESPZQLZMCL-UHFFFAOYSA-N 1,2-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(C)C(C)=CC=C3SC2=C1 UYEDESPZQLZMCL-UHFFFAOYSA-N 0.000 description 1
- QWQFVUQPHUKAMY-UHFFFAOYSA-N 1,2-diphenyl-2-propoxyethanone Chemical compound C=1C=CC=CC=1C(OCCC)C(=O)C1=CC=CC=C1 QWQFVUQPHUKAMY-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- YNSNJGRCQCDRDM-UHFFFAOYSA-N 1-chlorothioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl YNSNJGRCQCDRDM-UHFFFAOYSA-N 0.000 description 1
- AXTGDCSMTYGJND-UHFFFAOYSA-N 1-dodecylazepan-2-one Chemical compound CCCCCCCCCCCCN1CCCCCC1=O AXTGDCSMTYGJND-UHFFFAOYSA-N 0.000 description 1
- DCYGAPKNVCQNOE-UHFFFAOYSA-N 2,2,2-triphenylacetic acid Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(C(=O)O)C1=CC=CC=C1 DCYGAPKNVCQNOE-UHFFFAOYSA-N 0.000 description 1
- GZBSIABKXVPBFY-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)CO GZBSIABKXVPBFY-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- QLIBJPGWWSHWBF-UHFFFAOYSA-N 2-aminoethyl methacrylate Chemical compound CC(=C)C(=O)OCCN QLIBJPGWWSHWBF-UHFFFAOYSA-N 0.000 description 1
- UGIJCMNGQCUTPI-UHFFFAOYSA-N 2-aminoethyl prop-2-enoate Chemical compound NCCOC(=O)C=C UGIJCMNGQCUTPI-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- WBJWXIQDBDZMAW-UHFFFAOYSA-N 2-hydroxynaphthalene-1-carbonyl chloride Chemical compound C1=CC=CC2=C(C(Cl)=O)C(O)=CC=C21 WBJWXIQDBDZMAW-UHFFFAOYSA-N 0.000 description 1
- YRNDGUSDBCARGC-UHFFFAOYSA-N 2-methoxyacetophenone Chemical compound COCC(=O)C1=CC=CC=C1 YRNDGUSDBCARGC-UHFFFAOYSA-N 0.000 description 1
- WLJVXDMOQOGPHL-PPJXEINESA-N 2-phenylacetic acid Chemical compound O[14C](=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-PPJXEINESA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- WVAKWHJKGCYTRA-UHFFFAOYSA-N 9,10-dipropylanthracene Chemical compound C1=CC=C2C(CCC)=C(C=CC=C3)C3=C(CCC)C2=C1 WVAKWHJKGCYTRA-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- QPJVMBTYPHYUOC-UHFFFAOYSA-N Methyl benzoate Natural products COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- 229920001646 UPILEX Polymers 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- INXWLSDYDXPENO-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(CO)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C INXWLSDYDXPENO-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- DBHQYYNDKZDVTN-UHFFFAOYSA-N [4-(4-methylphenyl)sulfanylphenyl]-phenylmethanone Chemical compound C1=CC(C)=CC=C1SC1=CC=C(C(=O)C=2C=CC=CC=2)C=C1 DBHQYYNDKZDVTN-UHFFFAOYSA-N 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 229920006243 acrylic copolymer Polymers 0.000 description 1
- PYHXGXCGESYPCW-UHFFFAOYSA-N alpha-phenylbenzeneacetic acid Natural products C=1C=CC=CC=1C(C(=O)O)C1=CC=CC=C1 PYHXGXCGESYPCW-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001454 anthracenes Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- IIQWTZQWBGDRQG-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate;isocyanic acid Chemical compound N=C=O.CCOC(=O)C(C)=C IIQWTZQWBGDRQG-UHFFFAOYSA-N 0.000 description 1
- VPASWAQPISSKJP-UHFFFAOYSA-N ethyl prop-2-enoate;isocyanic acid Chemical compound N=C=O.CCOC(=O)C=C VPASWAQPISSKJP-UHFFFAOYSA-N 0.000 description 1
- ZYMKZMDQUPCXRP-UHFFFAOYSA-N fluoro prop-2-enoate Chemical compound FOC(=O)C=C ZYMKZMDQUPCXRP-UHFFFAOYSA-N 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- 229920002601 oligoester Polymers 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 229920006111 poly(hexamethylene terephthalamide) Polymers 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001470 polyketone Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000000638 stimulation Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/16—Layered products comprising a layer of synthetic resin specially treated, e.g. irradiated
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2377/00—Characterised by the use of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/10—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
- C09J2301/12—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers
- C09J2301/124—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the arrangement of layers the adhesive layer being present on both sides of the carrier, e.g. double-sided adhesive tape
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Materials Engineering (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Dicing (AREA)
- Laminated Bodies (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Organic Insulating Materials (AREA)
Description
本発明は粘着テープに関する。 The present invention relates to an adhesive tape.
半導体チップの製造工程において、ウエハや半導体チップの加工時の取扱いを容易にし、破損を防止するために粘着テープが用いられている。例えば、高純度なシリコン単結晶等から切り出した厚膜ウエハを所定の厚さにまで研削して薄膜ウエハとする場合、厚膜ウエハに粘着テープを貼り合わせた後に研削が行われる。 In the manufacturing process of semiconductor chips, adhesive tape is used to facilitate the handling of wafers and semiconductor chips during processing and to prevent damage. For example, when a thick-film wafer cut from a high-purity silicon single crystal is ground to a specified thickness to produce a thin-film wafer, the thick-film wafer is ground after adhesive tape is attached to it.
このような粘着テープに用いられる接着剤組成物には、加工工程中にウエハや半導体チップ等の被着体を強固に固定できるだけの高い接着性とともに、工程終了後にはウエハや半導体チップ等の被着体を損傷することなく剥離できることが求められる(以下、「高接着易剥離」ともいう。)。
高接着易剥離を実現した接着剤組成物として、特許文献1には紫外線等の光を照射することにより硬化して粘着力が低下する光硬化型粘着剤を用いた粘着テープが開示されている。粘着剤として光硬化型粘着剤を用いることで、加工工程中には確実に被着体を固定できるとともに、紫外線等を照射することにより容易に剥離することができる。
The adhesive composition used in such pressure-sensitive adhesive tapes is required to have high enough adhesion to firmly fix adherends such as wafers and semiconductor chips during the processing step, and also to be able to peel the adherends such as wafers and semiconductor chips without damaging them after the processing step is completed (hereinafter, also referred to as "high adhesion and easy peeling").
As an adhesive composition that realizes high adhesion and easy peeling, Patent Document 1 discloses an adhesive tape using a photocurable adhesive that hardens and loses adhesive strength when irradiated with light such as ultraviolet light. By using a photocurable adhesive as the adhesive, the adherend can be reliably fixed during processing, and can be easily peeled off by irradiation with ultraviolet light or the like.
近年、半導体製品の薄化、小型化によって、ウエハ上に半導体チップを多数積層した半導体デバイスが製造されるようになってきている。このような多数の半導体チップが積層された半導体デバイスの製造では、粘着テープによりウエハや半導体チップを保護した状態で、熱圧着ボンディング工程によって半導体チップをウエハや半導体チップ上に固定している。
本発明者らは、熱圧着ボンディングでは260℃という従来の高温処理を超える高温がかかるため、従来の硬化型粘着剤を用いた粘着テープであっても高温処理の熱に耐えきれずに粘着テープの基材フィルムが収縮し、その収縮によって粘着剤層が引っ張られることで粘着テープが剥離してしまうことを見出した。また、熱圧着ボンディングでは高温に加えて圧力もかかることから、粘着剤の接着亢進が進行しやすく、糊残りが発生しやすくなっている。更に、熱圧着ボンディング工程が行われるウエハは、粘着テープの貼り付け面に凹凸の大きなバンプが形成されていることが多く、凹凸の奥の部分に粘着剤が噛みこんでしまうと、剥離の際に千切れて糊残りとなってしまう。
In recent years, as semiconductor products become thinner and smaller, semiconductor devices are being manufactured in which many semiconductor chips are stacked on a wafer. In manufacturing such semiconductor devices in which many semiconductor chips are stacked, the semiconductor chips are fixed onto the wafer or semiconductor chips by a thermocompression bonding process while the wafer or semiconductor chips are protected by adhesive tape.
The inventors have found that, since the thermocompression bonding process uses a high temperature of 260°C, which is higher than the conventional high temperature process, even an adhesive tape using a conventional curable adhesive cannot withstand the heat of the high temperature process, and the base film of the adhesive tape shrinks, and the adhesive layer is pulled by the shrinkage, causing the adhesive tape to peel off. In addition, since the thermocompression bonding process uses pressure in addition to high temperature, the adhesive adhesion is easily promoted, and adhesive residue is easily generated. Furthermore, the wafer on which the thermocompression bonding process is performed often has bumps with large irregularities formed on the adhesive tape attachment surface, and if the adhesive gets caught in the deep part of the irregularities, it will tear off during peeling, leaving adhesive residue.
本発明は、260℃に達する高温処理を伴う工程に用いた場合であっても被着体を保護し、かつ、糊残りなく剥離することができる粘着テープを提供することを目的とする。 The present invention aims to provide an adhesive tape that protects the adherend even when used in processes involving high-temperature treatment up to 260°C and can be peeled off without leaving any adhesive residue.
本発明は、基材フィルムと前記基材フィルムの片面に積層された紫外線硬化型粘着剤層とを有する粘着テープであって、前記粘着テープの前記基材フィルム側の表面に405nmの紫外線を3000mJ/cm2照射した後の前記紫外線硬化型粘着層のゲル分率が90%以上であり、前記粘着テープの前記基材フィルム側の表面に前記405nmの紫外線を3000mJ/cm2照射した後の粘着テープのX℃における引張弾性率をEt(X)としたとき、Et(270)の値が1.0×107Pa以上である、粘着テープである。
以下に本発明を詳述する。
The present invention is an adhesive tape having a base film and an ultraviolet-curable adhesive layer laminated on one side of the base film, wherein the ultraviolet-curable adhesive layer has a gel fraction of 90% or more after irradiating the surface of the base film side of the adhesive tape with 3000 mJ/ cm2 of 405 nm ultraviolet light, and the adhesive tape has a tensile modulus at X°C of Et(X) after irradiating the surface of the base film side of the adhesive tape with 3000 mJ/ cm2 of 405 nm ultraviolet light, and a value of Et(270) of 1.0 x 107 Pa or more.
The present invention will be described in detail below.
本発明の粘着テープは、上記基材フィルムの片面に積層された紫外線硬化型粘着剤層を有する。
粘着テープが紫外線硬化型粘着剤層を有することで、充分な粘着力で被着体に貼り付けて被着体を保護できるとともに、貼り付け後に紫外線硬化型粘着剤層を硬化させることによって、高温処理が行われる場合であっても被着体を保護することができる。また、保護が不要となった後は糊残りなく容易に粘着テープを剥離することができる。
The pressure-sensitive adhesive tape of the present invention has an ultraviolet-curable pressure-sensitive adhesive layer laminated on one side of the above-mentioned base film.
By having an ultraviolet-curable adhesive layer, the adhesive tape can be attached to an adherend with sufficient adhesive strength to protect the adherend, and by curing the ultraviolet-curable adhesive layer after attachment, the adherend can be protected even when a high-temperature treatment is performed. Furthermore, after protection is no longer required, the adhesive tape can be easily peeled off without leaving any adhesive residue.
本発明の粘着テープは、上記粘着テープの上記基材フィルム側の表面に405nmの紫外線を3000mJ/cm2照射した後の上記紫外線硬化型粘着層のゲル分率が90%以上である。
紫外線照射後の紫外線硬化型粘着剤層のゲル分率が90%以上であることで、高温下でも接着亢進が進行しにくくなることから、保護が不要となった後に糊残りなく粘着テープを剥離することができる。また、粘着テープの耐薬品性も向上させることができる。また、上記基材フィルム側の表面に紫外線を照射して紫外線硬化型粘着剤層を硬化させることができれば、粘着テープを被着体と貼り合わせた後に紫外線硬化型粘着剤層を硬化させることが可能になる。粘着テープの接着亢進の抑制性と耐薬品性をより向上させる観点から、紫外線照射後の上記紫外線硬化型粘着剤層のゲル分率は、93%以上であることが好ましく、95%以上であることがより好ましく、97%以上であることが更に好ましい。
なお、紫外線照射後の上記紫外線硬化型粘着剤層のゲル分率は、通常100%以下である。
なお、本発明の粘着テープが基材フィルムの他の面にも粘着剤層等の他の層が積層されている構造である場合、上記基材フィルム側とは、基材フィルムの紫外線硬化型粘着剤層が積層した面とは反対側の面のことを指す。
In the pressure-sensitive adhesive tape of the present invention, the ultraviolet-curable pressure-sensitive adhesive layer has a gel fraction of 90% or more after irradiating the surface of the pressure-sensitive adhesive tape on the base film side with 405 nm ultraviolet light at 3000 mJ/cm 2 .
By having the gel fraction of the ultraviolet-curable adhesive layer after ultraviolet irradiation be 90% or more, the adhesion enhancement is unlikely to proceed even at high temperatures, so that the adhesive tape can be peeled off without leaving any adhesive residue after protection is no longer necessary. In addition, the chemical resistance of the adhesive tape can also be improved. In addition, if the ultraviolet-curable adhesive layer can be cured by irradiating the surface on the substrate film side with ultraviolet rays, it becomes possible to cure the ultraviolet-curable adhesive layer after bonding the adhesive tape to the adherend. From the viewpoint of further improving the suppression of adhesion enhancement and the chemical resistance of the adhesive tape, the gel fraction of the ultraviolet-curable adhesive layer after ultraviolet irradiation is preferably 93% or more, more preferably 95% or more, and even more preferably 97% or more.
The gel fraction of the ultraviolet-curable pressure-sensitive adhesive layer after ultraviolet irradiation is usually 100% or less.
In addition, when the pressure-sensitive adhesive tape of the present invention has a structure in which other layers, such as a pressure-sensitive adhesive layer, are laminated on the other side of the base film, the above-mentioned base film side refers to the side of the base film opposite to the side on which the ultraviolet-curable pressure-sensitive adhesive layer is laminated.
本発明の粘着テープは、上記粘着テープの上記基材フィルム側の表面に上記405nmの紫外線を3000mJ/cm2照射した後の粘着テープのX℃における引張弾性率をEt(X)としたとき、Et(270)の値が1.0×107Pa以上である。
紫外線照射後の粘着テープが270℃において上記範囲の引張弾性率を有していることで、耐熱性に優れる粘着テープとすることができ、260℃に達する高温処理を行っても粘着テープが軟化、収縮しづらくなり、粘着テープの意図せぬ剥離を抑えることができる。上記Et(270)の好ましい下限は3.0×107Pa、より好ましい下限は5.0×107Pa、更に好ましい下限は1.0×108Paである。上記Et(270)の上限は特に限定されないが、粘着テープの取り扱い性の観点から1.0×109Paであることが好ましい。
なお、上記粘着テープの引張弾性率は、以下の方法で測定することができる。
405nmの紫外線を、積算強度が3000mJ/cm2となるように基材フィルム側の表面から紫外線硬化型粘着剤層に照射することにより、紫外線硬化型粘着剤層を硬化させる。次いで、長辺がテープ製造時の流れ方向と同一になるよう打抜き刃を用いて打抜くことで、5mm×35mmの試験片を作製する。得られた試験片を液体窒素に浸漬して-50℃まで冷却し、その後、粘弾性スペクトロメーター(DVA-200、アイティー計測制御社製、又はその同等品)を用いて、定速昇温引張モードの10℃/分、周波数10Hzの条件で300℃まで昇温し、引張弾性率を測定する。このときの温度X℃における引張弾性率(E’)の値を、Et(X)とする。すなわち、温度270℃における引張弾性率(E’)の値が、Et(270)となる。
In the pressure-sensitive adhesive tape of the present invention, when the tensile modulus of elasticity at X°C of the pressure-sensitive adhesive tape after irradiating the surface of the base film side of the pressure-sensitive adhesive tape with the 405 nm ultraviolet light at 3000 mJ/ cm2 is defined as Et(X), the value of Et(270) is 1.0 x 107 Pa or more.
When the adhesive tape after ultraviolet irradiation has a tensile modulus in the above range at 270° C., the adhesive tape can have excellent heat resistance, and the adhesive tape is less likely to soften or shrink even when subjected to high-temperature treatment reaching 260° C., and unintended peeling of the adhesive tape can be suppressed. The preferred lower limit of Et(270) is 3.0×10 7 Pa, more preferred lower limit is 5.0×10 7 Pa, and even more preferred lower limit is 1.0×10 8 Pa. The upper limit of Et(270) is not particularly limited, but is preferably 1.0×10 9 Pa from the viewpoint of the handleability of the adhesive tape.
The tensile modulus of the pressure-sensitive adhesive tape can be measured by the following method.
The ultraviolet-curable adhesive layer is cured by irradiating the ultraviolet-curable adhesive layer from the surface of the substrate film side with 405 nm ultraviolet light so that the cumulative intensity is 3000 mJ/cm 2. Next, a 5 mm x 35 mm test piece is prepared by punching using a punching blade so that the long side is the same as the flow direction during tape production. The obtained test piece is immersed in liquid nitrogen and cooled to -50 ° C., and then heated to 300 ° C. under the conditions of 10 ° C./min and 10 Hz frequency in a constant temperature rise tensile mode using a viscoelasticity spectrometer (DVA-200, manufactured by IT Measurement and Control Co., Ltd., or an equivalent product), and the tensile modulus is measured. The value of the tensile modulus (E') at a temperature of X ° C. at this time is Et (X). That is, the value of the tensile modulus (E') at a temperature of 270 ° C. is Et (270).
本発明の粘着テープは、Et(270)/Et(200)の値が0.1以上であることが好ましい。
紫外線照射後の粘着テープの270℃における引張弾性率と200℃における引張弾性率との差が小さいことで、より耐熱性に優れる粘着テープとすることができ、粘着テープの意図せぬ剥離をより抑えることができる。上記剥離をさらに抑制する観点から、上記Et(270)/Et(200)の値は0.2以上であることがより好ましく、0.3以上であることが更に好ましく、0.5以上であることが特に好ましい。上記Et(270)/Et(200)の値の上限は特に限定されず、1に近ければ近いほど良いものであるが、通常1以下であり、0.8未満であることが好ましい。
The pressure-sensitive adhesive tape of the present invention preferably has a value of Et(270)/Et(200) of 0.1 or more.
The difference between the tensile modulus of the adhesive tape at 270°C and the tensile modulus at 200°C after ultraviolet irradiation is small, so that the adhesive tape has better heat resistance and can be more suppressed from unintentionally peeling off. From the viewpoint of further suppressing the peeling, the value of Et(270)/Et(200) is more preferably 0.2 or more, even more preferably 0.3 or more, and particularly preferably 0.5 or more. The upper limit of the value of Et(270)/Et(200) is not particularly limited, and the closer to 1 the better, but it is usually 1 or less, and preferably less than 0.8.
本発明の粘着テープは、上記粘着テープの上記基材フィルム側の表面に上記405nmの紫外線を3000mJ/cm2照射した後、25℃から5℃/minの速度で280℃まで昇温し、昇温後10分間ホールドした際の重量減少率が5%以下であることが好ましい。
280℃の高温下における重量減少が少ない、つまり、高温で熱分解を起こしにくいことによって、熱分解によって生じるアウトガスの量が少なくなり、被着体と粘着テープの界面に集まったアウトガスが起点となって剥離することを抑止できる。高温下での剥離を抑制する観点から、上記重量減少率は、4%以下であることがより好ましく、3%以下であることが更に好ましく、通常、0%以上である。
なお、上記重量減少率は、以下の方法で測定することができる。
405nmの紫外線を、積算強度が3000mJ/cm2となるように基材フィルム側の表面から紫外線硬化型粘着剤層に照射することにより、紫外線硬化型粘着剤層を硬化させる。次いで、粘着テープをφ5mmの円状に打抜き測定サンプルを作製する。得られた測定サンプルの重量を測定し、示差熱熱重量同時測定装置(TG-DTA;STA7200、日立ハイテクサイエンス社製、又はその同等品)を用いて測定を行う。昇温速度は5℃/minとし、25℃から280℃まで昇温し、280℃の状態で10分間保持した後の測定サンプルの重量を測定する。加熱前後の重量から重量減少率を算出することができる。
The pressure-sensitive adhesive tape of the present invention preferably has a weight loss rate of 5% or less when the surface of the pressure-sensitive adhesive tape on the base film side is irradiated with 3,000 mJ/ cm2 of the 405 nm ultraviolet light, heated from 25°C to 280°C at a rate of 5°C/min, and held for 10 minutes after the temperature increase.
Since the weight loss at a high temperature of 280° C. is small, that is, since thermal decomposition at high temperatures is unlikely to occur, the amount of outgas generated by thermal decomposition is small, and peeling caused by outgas collected at the interface between the adherend and the pressure-sensitive adhesive tape can be prevented. From the viewpoint of preventing peeling at high temperatures, the weight loss rate is more preferably 4% or less, even more preferably 3% or less, and is usually 0% or more.
The weight loss rate can be measured by the following method.
The ultraviolet-curable adhesive layer is cured by irradiating the ultraviolet-curable adhesive layer from the surface of the substrate film side with 405 nm ultraviolet light so that the cumulative intensity is 3000 mJ/cm 2. Next, the adhesive tape is punched into a φ5 mm circular shape to prepare a measurement sample. The weight of the obtained measurement sample is measured, and the measurement is performed using a differential thermal thermogravimetric simultaneous measurement device (TG-DTA; STA7200, manufactured by Hitachi High-Tech Science Corporation, or an equivalent product). The temperature is increased at a rate of 5°C/min from 25°C to 280°C, and the weight of the measurement sample after being held at 280°C for 10 minutes is measured. The weight loss rate can be calculated from the weight before and after heating.
上記基材フィルムは、405nmの紫外線透過率が1%以上であることが好ましい。
基材フィルムの405nmの紫外線透過率が1%以上であることで、基材フィルム越しに紫外線硬化型粘着剤層を硬化させることができ、上記紫外線照射後の紫外線硬化型粘着層のゲル分率を調整しやすくなる。この結果、接着亢進による被着体への糊残りを抑制することができる。上記紫外線透過率は10%以上であることがより好ましく、50%以上であることが更に好ましく、70%以上であることが特に好ましい。上記紫外線透過率がこれらの下限以上であることで、光増感剤を用いずとも、紫外線硬化型粘着剤層を充分に硬化させることができる。上記紫外線透過率の上限は特に限定されず、高ければ高いほどよく、通常、100%以下である。
なお、紫外線透過率は、分光光度計(U-3900、日立製作所社製、又はその同等品)を用いて測定することができる。より具体的には、800~200nmの領域でスキャンスピード300nm/min、スリット間隔4nmで測定し、405nmにおける透過率を測定することができる。
The substrate film preferably has an ultraviolet ray transmittance of 1% or more at 405 nm.
By the substrate film having a 405 nm ultraviolet transmittance of 1% or more, the ultraviolet curable adhesive layer can be cured through the substrate film, and the gel fraction of the ultraviolet curable adhesive layer after the ultraviolet irradiation can be easily adjusted. As a result, the adhesive residue on the adherend due to enhanced adhesion can be suppressed. The ultraviolet transmittance is more preferably 10% or more, even more preferably 50% or more, and particularly preferably 70% or more. By the ultraviolet transmittance being equal to or greater than these lower limits, the ultraviolet curable adhesive layer can be sufficiently cured without using a photosensitizer. The upper limit of the ultraviolet transmittance is not particularly limited, and the higher the better, and is usually 100% or less.
The ultraviolet transmittance can be measured using a spectrophotometer (U-3900, manufactured by Hitachi, Ltd., or an equivalent product). More specifically, the transmittance at 405 nm can be measured by measuring in the range of 800 to 200 nm at a scan speed of 300 nm/min and a slit interval of 4 nm.
上記基材フィルムは、X℃における引張弾性率をEf(X)としたとき、Ef(270)の値が5.0×107Pa以上であることが好ましい。
上記基材フィルムの270℃における引張弾性率が上記範囲であることで、より耐熱性に優れた粘着テープとすることができ、高温処理中の基材フィルムの熱収縮や軟化による剥離を抑えることができる。上記Ef(270)のより好ましい下限は1.0×108Pa、更に好ましい下限は5.0×108Pa、特に好ましい下限は1.0×109Paである。上記Ef(270)の上限は特に限定されないが、粘着テープの取り扱い性の観点から1.0×1010Paであることが好ましい。
なお、上記基材フィルムの引張弾性率は、上記粘着テープの引張弾性率と同様の方法で測定することができる。
When the tensile modulus of elasticity of the above-mentioned base film at X° C. is defined as Ef(X), the value of Ef(270) is preferably 5.0×10 7 Pa or more.
When the tensile modulus of elasticity at 270° C. of the base film is within the above range, the adhesive tape can have better heat resistance, and peeling due to thermal shrinkage or softening of the base film during high-temperature treatment can be suppressed. A more preferable lower limit of the Ef(270) is 1.0×10 8 Pa, an even more preferable lower limit is 5.0×10 8 Pa, and a particularly preferable lower limit is 1.0×10 9 Pa. The upper limit of the Ef(270) is not particularly limited, but is preferably 1.0×10 10 Pa from the viewpoint of handling of the adhesive tape.
The tensile modulus of elasticity of the base film can be measured in the same manner as that of the pressure-sensitive adhesive tape.
上記基材フィルムは、得られる粘着テープが上記範囲の引張弾性率及びゲル分率を満たせば特に限定されないが、耐熱性と強度に優れることから、上記基材フィルムは、アミド、イミド、エーテル及びケトンからなる群から選択される少なくとも1種を繰り返し単位の主鎖骨格中に有する樹脂を含有することが好ましい。
上記アミド、イミド、エーテル及びケトンからなる群から選択される少なくとも1種を繰り返し結合単位の主鎖骨格中に有する樹脂としては、例えば、ポリアミド、ポリイミド、ポリエーテル、ポリケトン等が挙げられる。なかでも、耐熱性と強度により優れることから、上記基材フィルムはポリアミド樹脂を含有することが好ましく、更に紫外線透過性にも優れることから、炭素数が4以上12以下の長鎖アルキル基又は芳香族を繰り返し単位の主鎖骨格中に有するポリアミド樹脂を含有することがより好ましい。
上記炭素数が4以上12以下の長鎖アルキル基又は芳香族を繰り返し単位の主鎖骨格中に有するポリアミド樹脂としては、例えば、ナイロン9T、ナイロン6T等が挙げられる。
The base film is not particularly limited as long as the resulting pressure-sensitive adhesive tape satisfies the above-mentioned ranges of tensile modulus and gel fraction. However, in order to obtain excellent heat resistance and strength, it is preferable that the base film contains a resin having at least one selected from the group consisting of amides, imides, ethers and ketones in the main chain skeleton of the repeating units.
Examples of the resin having at least one selected from the group consisting of amide, imide, ether and ketone in the main chain skeleton of the repeating bond unit include polyamide, polyimide, polyether, polyketone, etc. Among them, the base film preferably contains a polyamide resin because of its superior heat resistance and strength, and more preferably contains a polyamide resin having a long-chain alkyl group or aromatic group having 4 to 12 carbon atoms in the main chain skeleton of the repeating unit because of its superior ultraviolet transmittance.
Examples of the polyamide resin having a long-chain alkyl group or an aromatic group having 4 to 12 carbon atoms in the main chain skeleton of the repeating unit include nylon 9T and nylon 6T.
上記基材フィルムの厚さは特に限定されないが、好ましい下限が25μm、より好ましい下限が50μm、好ましい上限が250μm、より好ましい上限が125μmである。上記基材フィルムがこの範囲であることで取り扱い性に優れる粘着テープとすることができる。The thickness of the base film is not particularly limited, but the preferred lower limit is 25 μm, the more preferred lower limit is 50 μm, the preferred upper limit is 250 μm, and the more preferred upper limit is 125 μm. By having the base film in this range, an adhesive tape with excellent handleability can be obtained.
上記紫外線硬化型粘着剤層を構成する粘着剤は、紫外線硬化型であれば特に限定されないが、例えば、重合性ポリマーを主成分とし、重合開始剤として紫外線重合開始剤を含有する紫外線硬化型粘着剤が挙げられる。上記重合性ポリマーとしては、例えば、(メタ)アクリルポリマー、ウレタンアクリレートポリマー等が挙げられる。なかでも、上記ゲル分率と上記Et(270)を満たしやすいことから、(メタ)アクリルポリマーであることが好ましく、分子内にラジカル重合性の不飽和結合を有する(メタ)アクリル酸アルキルエステル系の重合性ポリマーであることがより好ましい。
上記(メタ)アクリル酸アルキルエステル系の重合性ポリマーは、例えば、分子内に官能基を持った(メタ)アクリル系ポリマーをあらかじめ合成し、分子内に上記の官能基と反応する官能基とラジカル重合性の不飽和結合とを有する化合物とを反応させることにより得ることができる。なお、以下「分子内に官能基を持った(メタ)アクリル系ポリマー」のことを「官能基含有(メタ)アクリル系ポリマー」といい、「分子内に上記の官能基と反応する官能基とラジカル重合性の不飽和結合とを有する化合物」のことを「官能基含有不飽和化合物」という。
The adhesive constituting the ultraviolet curing adhesive layer is not particularly limited as long as it is ultraviolet curing type, but for example, an ultraviolet curing adhesive containing a polymerizable polymer as a main component and an ultraviolet polymerization initiator as a polymerization initiator can be mentioned. The polymerizable polymer can be, for example, a (meth)acrylic polymer, a urethane acrylate polymer, etc. Among them, since it is easy to satisfy the above gel fraction and the above Et (270), it is preferable to use a (meth)acrylic polymer, and more preferably a polymerizable polymer of a (meth)acrylic acid alkyl ester type having a radical polymerizable unsaturated bond in the molecule.
The above-mentioned (meth)acrylic acid alkyl ester-based polymerizable polymer can be obtained, for example, by synthesizing a (meth)acrylic polymer having a functional group in the molecule in advance, and reacting it with a compound having a functional group reactive with the above-mentioned functional group and a radically polymerizable unsaturated bond in the molecule. Hereinafter, the "(meth)acrylic polymer having a functional group in the molecule" is referred to as the "functional group-containing (meth)acrylic polymer", and the "compound having a functional group reactive with the above-mentioned functional group and a radically polymerizable unsaturated bond in the molecule" is referred to as the "functional group-containing unsaturated compound".
上記官能基含有(メタ)アクリル系ポリマーは、アルキル基の炭素数が通常2~18の範囲にあるアクリル酸アルキルエステル及び/又はメタクリル酸アルキルエステルを主モノマーとし、これと官能基含有モノマーと、更に必要に応じてこれらと共重合可能な他の改質用モノマーとを常法により共重合させることにより得られるものである。上記官能基含有(メタ)アクリル系ポリマーの重量平均分子量は通常20万~200万程度である。なお、本明細書において重量平均分子量は通常、GPC法によって決定することができ、例えば、40℃において溶出液としてTHF、カラムとしてHSPgel HR MB-M 6.0×150mm(Waters社製)を用いて、ポリスチレン標準により決定することができる。The functional group-containing (meth)acrylic polymer is obtained by copolymerizing an alkyl acrylate ester and/or an alkyl methacrylate ester, the alkyl group of which usually has 2 to 18 carbon atoms, with a functional group-containing monomer and, if necessary, with other modifying monomers that can be copolymerized with the functional group-containing monomer, by a conventional method. The weight average molecular weight of the functional group-containing (meth)acrylic polymer is usually about 200,000 to 2,000,000. In this specification, the weight average molecular weight can usually be determined by the GPC method, and can be determined, for example, at 40°C using THF as an eluent and HSPgel HR MB-M 6.0 x 150 mm (manufactured by Waters) as a column, using polystyrene standards.
上記官能基含有モノマーとしては、例えば、カルボキシ基含有モノマーや、ヒドロキシル基含有モノマーや、エポキシ基含有モノマーや、イソシアネート基含有モノマーや、アミノ基含有モノマー等が挙げられる。上記カルボキシ基含有モノマーとしては、アクリル酸、メタクリル酸等が挙げられる。上記ヒドロキシル基含有モノマーとしては、アクリル酸ヒドロキシエチル、メタクリル酸ヒドロキシエチル等が挙げられる。上記エポキシ基含有モノマーとしては、アクリル酸グリシジル、メタクリル酸グリシジル等が挙げられる。上記イソシアネート基含有モノマーとしては、アクリル酸イソシアネートエチル、メタクリル酸イソシアネートエチル等が挙げられる。上記アミノ基含有モノマーとしては、アクリル酸アミノエチル、メタクリル酸アミノエチル等が挙げられる。 Examples of the functional group-containing monomer include carboxy group-containing monomers, hydroxyl group-containing monomers, epoxy group-containing monomers, isocyanate group-containing monomers, and amino group-containing monomers. Examples of the carboxy group-containing monomers include acrylic acid and methacrylic acid. Examples of the hydroxyl group-containing monomers include hydroxyethyl acrylate and hydroxyethyl methacrylate. Examples of the epoxy group-containing monomers include glycidyl acrylate and glycidyl methacrylate. Examples of the isocyanate group-containing monomers include isocyanate ethyl acrylate and isocyanate ethyl methacrylate. Examples of the amino group-containing monomers include aminoethyl acrylate and aminoethyl methacrylate.
上記共重合可能な他の改質用モノマーとしては、例えば、酢酸ビニル、アクリロニトリル、スチレン等の一般の(メタ)アクリル系ポリマーに用いられている各種のモノマーが挙げられる。 Other copolymerizable modifying monomers include various monomers used in general (meth)acrylic polymers, such as vinyl acetate, acrylonitrile, and styrene.
上記官能基含有(メタ)アクリル系ポリマーに反応させる官能基含有不飽和化合物としては、上記官能基含有(メタ)アクリル系ポリマーの官能基に応じて上述した官能基含有モノマーと同様のものを使用できる。例えば、上記官能基含有(メタ)アクリル系ポリマーの官能基がカルボキシ基の場合はエポキシ基含有モノマーやイソシアネート基含有モノマーが用いられる。同官能基がヒドロキシル基の場合はイソシアネート基含有モノマーが用いられる。同官能基がエポキシ基の場合はカルボキシ基含有モノマーやアクリルアミド等のアミド基含有モノマーが用いられる。同官能基がアミノ基の場合はエポキシ基含有モノマーが用いられる。As the functional group-containing unsaturated compound to be reacted with the functional group-containing (meth)acrylic polymer, the same as the functional group-containing monomer described above can be used depending on the functional group of the functional group-containing (meth)acrylic polymer. For example, when the functional group of the functional group-containing (meth)acrylic polymer is a carboxy group, an epoxy group-containing monomer or an isocyanate group-containing monomer is used. When the functional group is a hydroxyl group, an isocyanate group-containing monomer is used. When the functional group is an epoxy group, a carboxy group-containing monomer or an amide group-containing monomer such as acrylamide is used. When the functional group is an amino group, an epoxy group-containing monomer is used.
上記紫外線重合開始剤は、例えば、200~410nmの波長の紫外線を照射することにより活性化されるものが挙げられる。このような紫外線重合開始剤としては、例えば、アセトフェノン誘導体化合物や、ベンゾインエーテル系化合物、ケタール誘導体化合物、フォスフィンオキシド誘導体化合物、ビス(η5-シクロペンタジエニル)チタノセン誘導体化合物、ベンゾフェノン、ミヒラーケトン、クロロチオキサントン、トデシルチオキサントン、ジメチルチオキサントン、ジエチルチオキサントン、α-ヒドロキシシクロヘキシルフェニルケトン、2-ヒドロキシメチルフェニルプロパン等が挙げられる。上記アセトフェノン誘導体化合物としては、メトキシアセトフェノン等が挙げられる。上記ベンゾインエーテル系化合物としては、ベンゾインプロピルエーテル、ベンゾインイソブチルエーテル等が挙げられる。上記ケタール誘導体化合物としては、ベンジルジメチルケタール、アセトフェノンジエチルケタール等が挙げられる。これらの紫外線重合開始剤は、単独で用いられてもよく、2種以上が併用されてもよい。 The ultraviolet polymerization initiator may be activated by irradiation with ultraviolet light having a wavelength of 200 to 410 nm. Examples of such ultraviolet polymerization initiators include acetophenone derivative compounds, benzoin ether compounds, ketal derivative compounds, phosphine oxide derivative compounds, bis(η5-cyclopentadienyl)titanocene derivative compounds, benzophenone, Michler's ketone, chlorothioxanthone, todecylthioxanthone, dimethylthioxanthone, diethylthioxanthone, α-hydroxycyclohexylphenyl ketone, 2-hydroxymethylphenylpropane, and the like. Examples of the acetophenone derivative compounds include methoxyacetophenone, and the like. Examples of the benzoin ether compounds include benzoin propyl ether and benzoin isobutyl ether, and the like. Examples of the ketal derivative compounds include benzyl dimethyl ketal and acetophenone diethyl ketal, and the like. These ultraviolet polymerization initiators may be used alone or in combination of two or more.
上記紫外線硬化型粘着剤層は、ラジカル重合性の多官能オリゴマー又はモノマーを含有することが好ましい。上記紫外線硬化型粘着剤層がラジカル重合性の多官能オリゴマー又はモノマーを含有することにより、紫外線硬化性が向上する。
上記多官能オリゴマー又はモノマーは、重量平均分子量が1万以下であるものが好ましく、より好ましくは紫外線の照射による紫外線硬化型粘着剤層の三次元網状化が効率よくなされるように、その重量平均分子量が5000以下でかつ分子内のラジカル重合性の不飽和結合の数が2~20個のものである。上記重量平均分子量は、例えばGPC測定法を用いて決定することができる。
The ultraviolet-curable pressure-sensitive adhesive layer preferably contains a radically polymerizable polyfunctional oligomer or monomer. When the ultraviolet-curable pressure-sensitive adhesive layer contains a radically polymerizable polyfunctional oligomer or monomer, ultraviolet curability is improved.
The polyfunctional oligomer or monomer preferably has a weight average molecular weight of 10,000 or less, and more preferably has a weight average molecular weight of 5,000 or less and has 2 to 20 radically polymerizable unsaturated bonds in the molecule, so that the ultraviolet-curable pressure-sensitive adhesive layer is efficiently three-dimensionally reticulated by irradiation with ultraviolet light. The weight average molecular weight can be determined, for example, by using a GPC measurement method.
上記多官能オリゴマー又はモノマーは、例えば、トリメチロールプロパントリアクリレート、テトラメチロールメタンテトラアクリレート、ペンタエリスリトールトリアクリレート、ペンタエリスリトールテトラアクリレート、ジペンタエリスリトールモノヒドロキシペンタアクリレート、ジペンタエリスリトールヘキサアクリレート又は上記同様のメタクリレート類等が挙げられる。その他、1,4-ブチレングリコールジアクリレート、1,6-ヘキサンジオールジアクリレート、ポリエチレングリコールジアクリレート、市販のオリゴエステルアクリレート、上記同様のメタクリレート類等が挙げられる。これらの多官能オリゴマー又はモノマーは、単独で用いられてもよく、2種以上が併用されてもよい。 Examples of the polyfunctional oligomer or monomer include trimethylolpropane triacrylate, tetramethylolmethane tetraacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol monohydroxypentaacrylate, dipentaerythritol hexaacrylate, and the same methacrylates as those mentioned above. Other examples include 1,4-butylene glycol diacrylate, 1,6-hexanediol diacrylate, polyethylene glycol diacrylate, commercially available oligoester acrylates, and the same methacrylates as those mentioned above. These polyfunctional oligomers or monomers may be used alone or in combination of two or more.
上記紫外線硬化型粘着剤層は、紫外線硬化型粘着剤の凝集力を高める目的で架橋剤を含有していてもよい。
上記架橋剤としては、例えば、イソシアネート系架橋剤、エポキシ系架橋剤、アジリジン系架橋剤、金属キレート系架橋剤等が挙げられる。なかでも、より紫外線硬化型粘着剤の凝集力が高まることからイソシアネート系架橋剤が好ましい。
The ultraviolet-curable pressure-sensitive adhesive layer may contain a crosslinking agent for the purpose of increasing the cohesive strength of the ultraviolet-curable pressure-sensitive adhesive.
Examples of the crosslinking agent include isocyanate-based crosslinking agents, epoxy-based crosslinking agents, aziridine-based crosslinking agents, metal chelate-based crosslinking agents, etc. Among these, isocyanate-based crosslinking agents are preferred because they further increase the cohesive strength of the ultraviolet-curable pressure-sensitive adhesive.
上記架橋剤は、上記粘着剤層中に0.1~20重量%含有されていることが好ましい。
架橋剤が上記範囲で含有されていることで、紫外線硬化型粘着剤を適度に架橋して、高い粘着力を維持しながら紫外線硬化型粘着剤の凝集力をより高めることができる。高い粘着力を維持しながら紫外線硬化型粘着剤の凝集力をさらに高める観点から、上記架橋剤の含有量のより好ましい下限は0.5重量%、更に好ましい下限は1.0重量%、より好ましい上限は15重量%、更に好ましい上限は10重量%である。
The crosslinking agent is preferably contained in the pressure-sensitive adhesive layer in an amount of 0.1 to 20% by weight.
By containing the crosslinking agent in the above range, the ultraviolet-curable adhesive can be crosslinked appropriately, and the cohesive strength of the ultraviolet-curable adhesive can be further increased while maintaining a high adhesive strength. From the viewpoint of further increasing the cohesive strength of the ultraviolet-curable adhesive while maintaining a high adhesive strength, the more preferred lower limit of the content of the crosslinking agent is 0.5% by weight, the even more preferred lower limit is 1.0% by weight, the more preferred upper limit is 15% by weight, and the even more preferred upper limit is 10% by weight.
上記紫外線硬化型粘着剤層は、シリコーン又はフッ素化合物を含有することが好ましい。
上記紫外線硬化型粘着剤層がシリコーン又はフッ素化合物を含有することで、紫外線硬化型粘着剤層と被着体との界面にシリコーン又はフッ素化合物がブリードアウトするため、処理終了後に粘着テープを容易かつ糊残りなく剥離することができる。上記シリコーン又はフッ素化合物としては、例えば、シリコーンジアクリレート、フルオロアルキル基を有する高分子(例えば、フルオロアクリレートに由来する構成単位を有する(メタ)アクリル系共重合体)等が挙げられる。
The ultraviolet-curable pressure-sensitive adhesive layer preferably contains a silicone or a fluorine compound.
By containing a silicone or a fluorine compound in the ultraviolet-curable adhesive layer, the silicone or the fluorine compound bleeds out at the interface between the ultraviolet-curable adhesive layer and the adherend, so that the adhesive tape can be easily peeled off without leaving any adhesive residue after the treatment is completed. Examples of the silicone or the fluorine compound include silicone diacrylate, polymers having a fluoroalkyl group (e.g., (meth)acrylic copolymers having a structural unit derived from a fluoroacrylate), and the like.
上記シリコーン又はフッ素化合物は、上記重合性ポリマーと架橋可能な官能基を有することが好ましい。
上記シリコーン又はフッ素化合物が上記重合性ポリマーと架橋可能な官能基を有することで、架橋剤又は紫外線照射によりシリコーン又はフッ素化合物が重合性ポリマーと化学反応して重合性ポリマーと結合することができる。これにより、被着体にシリコーン又はフッ素化合物が付着することによる汚染が抑制される。
上記重合性ポリマーと架橋可能な官能基としては、上記重合性ポリマーに含まれる官能基によって適宜選択されるが、例えば、カルボキシ基、ラジカル重合性の不飽和結合、水酸基、アミド基、イソシアネート基、エポキシ基等が挙げられる。なかでも、ラジカル重合性の不飽和結合が好ましい。上記シリコーン又はフッ素化合物が上記重合性ポリマーと架橋可能な官能基としてラジカル重合性の不飽和結合を有することで、紫外線照射によりシリコーン又はフッ素化合物が重合性ポリマーと化学反応して重合性ポリマー中に取り込まれることから、被着体にシリコーン又はフッ素化合物が付着することによる汚染がより抑制される。
上記シリコーン又はフッ素化合物における架橋可能な官能価は、例えば2~6価、好ましくは2~4価、より好ましくは2価である。
The silicone or fluorine compound preferably has a functional group capable of crosslinking with the polymerizable polymer.
Since the silicone or fluorine compound has a functional group capable of crosslinking with the polymerizable polymer, the silicone or fluorine compound can chemically react with the polymerizable polymer by the application of a crosslinking agent or exposure to ultraviolet light to bond with the polymerizable polymer, thereby preventing contamination of the adherend caused by the silicone or fluorine compound adhering thereto.
The functional group capable of crosslinking with the polymerizable polymer is appropriately selected according to the functional group contained in the polymerizable polymer, and examples thereof include a carboxyl group, a radically polymerizable unsaturated bond, a hydroxyl group, an amide group, an isocyanate group, and an epoxy group. Of these, a radically polymerizable unsaturated bond is preferred. By the silicone or fluorine compound having a radically polymerizable unsaturated bond as a functional group capable of crosslinking with the polymerizable polymer, the silicone or fluorine compound is chemically reacted with the polymerizable polymer by ultraviolet irradiation and is incorporated into the polymerizable polymer, so that contamination caused by the silicone or fluorine compound adhering to the adherend is further suppressed.
The crosslinkable functionality of the silicone or fluorine compound is, for example, 2 to 6, preferably 2 to 4, and more preferably 2.
上記重合性ポリマーと架橋可能な官能基としては、上記重合性ポリマーに含まれる官能基によって適宜決定されるが、例えば、重合性ポリマーが、分子内にラジカル重合性の不飽和結合を有する(メタ)アクリル酸アルキルエステル系である場合には、不飽和結合と架橋可能な官能基を選択することが好ましい。
上記不飽和結合と架橋可能な官能基は、不飽和二重結合を有する官能基であり、具体的には例えば、ビニル基、(メタ)アクリル基、アリル基、マレイミド基等を含有するシリコーン又はフッ素化合物等を選択する。
The functional group capable of crosslinking with the polymerizable polymer is appropriately determined depending on the functional group contained in the polymerizable polymer. For example, when the polymerizable polymer is a (meth)acrylic acid alkyl ester type having a radically polymerizable unsaturated bond in the molecule, it is preferable to select a functional group capable of crosslinking with the unsaturated bond.
The functional group capable of crosslinking with the unsaturated bond is a functional group having an unsaturated double bond, and specifically, for example, a silicone or fluorine compound containing a vinyl group, a (meth)acrylic group, an allyl group, a maleimide group, or the like is selected.
上記紫外線硬化型粘着剤層中における上記シリコーン又はフッ素化合物の含有量は、好ましい下限が2重量%、より好ましい下限が5重量%、更に好ましい下限が10重量%、好ましい上限が40重量%、より好ましい上限が35重量%、更に好ましい上限が30重量%である。
上記シリコーン又はフッ素化合物の含有量が上記範囲であることで、粘着テープから発生するアウトガス量を低減することができ、より耐熱性と糊残り防止性能に優れた粘着テープとすることができる。
The content of the silicone or fluorine compound in the ultraviolet-curable pressure-sensitive adhesive layer is preferably 2% by weight at the lower limit, more preferably 5% by weight at the lower limit, and even more preferably 10% by weight at the lower limit, and preferably 40% by weight at the upper limit, more preferably 35% by weight at the upper limit, and even more preferably 30% by weight at the upper limit.
By ensuring that the content of the silicone or fluorine compound is within the above range, the amount of outgassing generated from the pressure-sensitive adhesive tape can be reduced, making it possible to provide a pressure-sensitive adhesive tape with even better heat resistance and adhesive transfer prevention performance.
上記紫外線硬化型粘着剤層は、ウレタンアクリレートを含有することが好ましい。
上記紫外線硬化型粘着剤層がウレタンアクリレートを含有することで、粘着テープの柔軟性が向上し、得られる粘着テープを千切れにくくすることができる。
The ultraviolet-curable pressure-sensitive adhesive layer preferably contains urethane acrylate.
When the ultraviolet-curable pressure-sensitive adhesive layer contains urethane acrylate, the flexibility of the pressure-sensitive adhesive tape is improved, and the obtained pressure-sensitive adhesive tape can be made less likely to tear.
上記紫外線硬化型粘着剤層中における上記ウレタンアクリレートの含有量は、好ましい上限が20重量%、より好ましい上限が15重量%、更に好ましい上限が10重量%である。上記ウレタンアクリレートの含有量が上記範囲であることで、より耐熱性と糊残り抑制性能に優れた粘着テープとすることができる。上記ウレタンアクリレートの含有量の下限は特に限定されないが、粘着テープをより千切れにくくして糊残りを抑える観点から1重量%であることが好ましい。The content of the urethane acrylate in the ultraviolet-curable adhesive layer is preferably 20% by weight, more preferably 15% by weight, and even more preferably 10% by weight. By having the content of the urethane acrylate in the above range, an adhesive tape having better heat resistance and adhesive residue suppression performance can be obtained. The lower limit of the content of the urethane acrylate is not particularly limited, but it is preferably 1% by weight from the viewpoint of making the adhesive tape less likely to tear and suppressing adhesive residue.
上記紫外線硬化型粘着剤層中における上記シリコーン又はフッ素化合物と、上記ウレタンアクリレートとの合計含有量は50重量%以下であることが好ましい。
上記シリコーン又はフッ素化合物と、上記ウレタンアクリレートとの合計含有量が上記範囲であることで、これらの成分の熱分解によって発生するアウトガスの量を抑えられることから、耐熱性を向上させながらもアウトガスによる意図せぬ剥離を抑えることができる。上記剥離をさらに抑制する観点から、上記シリコーン又はフッ素化合物と、上記ウレタンアクリレートとの合計含有量のより好ましい上限は40重量%、更に好ましい上限は25重量%である。
The total content of the silicone or fluorine compound and the urethane acrylate in the ultraviolet-curable pressure-sensitive adhesive layer is preferably 50% by weight or less.
By setting the total content of the silicone or fluorine compound and the urethane acrylate within the above range, the amount of outgassing generated by the thermal decomposition of these components can be suppressed, and therefore unintended peeling due to outgassing can be suppressed while improving heat resistance. From the viewpoint of further suppressing the peeling, the upper limit of the total content of the silicone or fluorine compound and the urethane acrylate is more preferably 40% by weight, and even more preferably 25% by weight.
上記紫外線硬化型粘着剤層は、フィラーを含有することが好ましい。
上記紫外線硬化型粘着剤層がフィラーを含有することで弾性率が向上することから粘着テープの耐熱性を向上させることができる。上記フィラーの材料としては例えば、シリカ、アルミナ、カーボンブラック、カルシウム、ホウ素、マグネシウム、ジルコニア等が挙げられる。なかでもより耐熱性が向上することからシリカであることが好ましい。
The ultraviolet-curable pressure-sensitive adhesive layer preferably contains a filler.
The ultraviolet-curable adhesive layer contains a filler, which improves the elastic modulus and thereby improves the heat resistance of the adhesive tape. Examples of the filler include silica, alumina, carbon black, calcium, boron, magnesium, zirconia, etc. Among these, silica is preferred because it further improves the heat resistance.
上記フィラーの平均粒子径は特に限定されないが、好ましい下限が0.06μm、より好ましい下限が0.07μm、好ましい上限が2μm、より好ましい上限が1μmである。フィラーの平均粒子径が上記範囲であることで、紫外線硬化型粘着剤に対する分散性をより向上させることができる。The average particle size of the filler is not particularly limited, but a preferred lower limit is 0.06 μm, a more preferred lower limit is 0.07 μm, a preferred upper limit is 2 μm, and a more preferred upper limit is 1 μm. By having the average particle size of the filler within the above range, the dispersibility in the ultraviolet-curable adhesive can be further improved.
上記紫外線硬化型粘着剤層中における上記フィラーの含有量は、好ましい下限が1重量%、より好ましい下限が3重量%、好ましい上限が18重量%、より好ましい上限が12重量%である。
上記フィラーの含有量が上記範囲であることで、より耐熱性に優れた粘着テープとすることができる。
The content of the filler in the ultraviolet-curable pressure-sensitive adhesive layer is preferably 1% by weight at the lower limit, more preferably 3% by weight at the lower limit, and preferably 18% by weight at the upper limit, more preferably 12% by weight at the upper limit.
When the content of the filler is within the above range, a pressure-sensitive adhesive tape having superior heat resistance can be obtained.
上記紫外線硬化型粘着剤層は、刺激によって気体を発生させる気体発生剤を含有することが好ましい。
上記紫外線硬化型粘着剤層が気体発生剤を含有することによって、工程終了後に刺激を与えて気体を発生させることで、被着体と粘着テープとの間に気体による隙間が生じることから、より容易に粘着テープを剥離することができる。
上記気体発生剤は特に限定されないが、高温処理工程に用いることができることから光によって気体を発生させる気体発生剤であることが好ましい。なかでも、加熱を伴う処理に対する耐性に優れることから、フェニル酢酸、ジフェニル酢酸、トリフェニル酢酸等のカルボン酸化合物又はその塩や、1H-テトラゾール、5-フェニル-1H-テトラゾール、5,5-アゾビス-1H-テトラゾール等のテトラゾール化合物又はその塩等が好適である。このような気体発生剤は、紫外線等の光を照射することにより気体を発生する一方、260℃程度の高温下でも分解しない高い耐熱性を有する。
The ultraviolet-curable pressure-sensitive adhesive layer preferably contains a gas generating agent that generates gas in response to a stimulus.
Since the ultraviolet-curable adhesive layer contains a gas generating agent, a gas generating agent can be generated by applying a stimulus after the process is completed, which creates a gap between the adherend and the adhesive tape due to the gas, making it easier to peel off the adhesive tape.
The gas generating agent is not particularly limited, but is preferably a gas generating agent that generates gas by light, since it can be used in a high-temperature treatment process. Among them, carboxylic acid compounds such as phenylacetic acid, diphenylacetic acid, and triphenylacetic acid, and salts thereof, and tetrazole compounds such as 1H-tetrazole, 5-phenyl-1H-tetrazole, and 5,5-azobis-1H-tetrazole, and salts thereof are preferred, since they have excellent resistance to treatment involving heating. Such gas generating agents generate gas by irradiation with light such as ultraviolet light, while having high heat resistance such that they do not decompose even at high temperatures of about 260°C.
上記紫外線硬化型粘着剤層は、光増感剤を含有してもよい。上記光増感剤を含有することで、上記基材フィルムの405nmの紫外線透過率が低い場合であっても、紫外線硬化型粘着剤層を充分に硬化させることができる。また、上記光増感剤は、上記気体発生剤への光による刺激を増幅する効果を有することから、より少ない光の照射により気体を放出させることができる。また、より広い波長領域の光により気体を放出させることができる。
上記光増感剤としては、例えば2,4-ジエチルチオキサントン等のチオキサントン系化合物や、ジブチルアントラセン、ジプロピルアントラセン等のアントラセン系化合物等が挙げられる。また、2,2-ジメトキシ-1,2-ジフェニルエタン-1-オン、ベンゾフェノン、2,4-ジクロロベンゾフェノン、o-ベンゾイル安息香酸メチル、4,4’-ビス(ジメチルアミノ)ベンゾフェノン、4-ベンゾイル-4’メチルジフェニルサルファイド等も挙げられる。これらの光増感剤は、単独で用いられてもよいし、2種以上が組み合わせて用いられてもよい。なお、上記光増感剤は高温下で熱分解してアウトガスを発生させ、紫外線硬化型粘着剤層を発泡させるため、大量に用いると糊残りや意図せぬ剥離の原因となってしまうことがある。そのため、上記光増感剤はできる限り用いる量を少なくすることが好ましい。
The ultraviolet curable adhesive layer may contain a photosensitizer. By containing the photosensitizer, the ultraviolet curable adhesive layer can be sufficiently cured even when the substrate film has a low ultraviolet transmittance at 405 nm. In addition, the photosensitizer has an effect of amplifying the stimulation of the gas generating agent by light, so that the gas can be released by irradiation with less light. In addition, the gas can be released by light in a wider wavelength range.
Examples of the photosensitizer include thioxanthone compounds such as 2,4-diethylthioxanthone, and anthracene compounds such as dibutylanthracene and dipropylanthracene. Other examples include 2,2-dimethoxy-1,2-diphenylethan-1-one, benzophenone, 2,4-dichlorobenzophenone, o-benzoyl methyl benzoate, 4,4'-bis(dimethylamino)benzophenone, and 4-benzoyl-4'methyldiphenyl sulfide. These photosensitizers may be used alone or in combination of two or more. The photosensitizers are thermally decomposed at high temperatures to generate outgassing and foam the ultraviolet-curable adhesive layer, so that using a large amount of them may cause adhesive residue or unintended peeling. Therefore, it is preferable to use as little of the photosensitizer as possible.
上記紫外線硬化型粘着剤層は、可塑剤、樹脂、界面活性剤、ワックス等の公知の添加剤を含有してもよい。これらの添加剤は単独で用いられてもよく、複数を組み合わせて用いてもよい。The ultraviolet-curable adhesive layer may contain known additives such as plasticizers, resins, surfactants, waxes, etc. These additives may be used alone or in combination.
上記紫外線硬化型粘着剤層の紫外線照射前の貯蔵弾性率G’は特に限定されないが、23℃における貯蔵弾性率G’が5.0×103Pa以上、1.0×105Pa以下であることが好ましい。紫外線照射前の紫外線硬化型粘着剤層の23℃における貯蔵弾性率G’が上記範囲であることで、充分な粘着力で被着体を保護することができる。紫外線照射前の紫外線硬化型粘着剤層の23℃における貯蔵弾性率G’は、紫外線硬化型粘着剤層を構成する粘着剤の種類、フィラーの種類及び量等によって調節することができる。
上記紫外線硬化型粘着剤層の23℃における紫外線照射前の貯蔵弾性率G’は、粘弾性スペクトロメーター(例えば、DVA-200、アイティー計測制御社製)を用いて、定速昇温せん断モード、昇温速度10℃/分、周波数10Hzの条件で貯蔵弾性率を測定することで求めることができる。
The storage modulus G' of the ultraviolet-curable pressure-sensitive adhesive layer before ultraviolet irradiation is not particularly limited, but the storage modulus G' at 23° C. is preferably 5.0×10 3 Pa or more and 1.0×10 5 Pa or less. When the storage modulus G' of the ultraviolet-curable pressure-sensitive adhesive layer at 23° C. before ultraviolet irradiation is within the above range, the adherend can be protected with sufficient adhesive strength. The storage modulus G' of the ultraviolet-curable pressure-sensitive adhesive layer at 23° C. before ultraviolet irradiation can be adjusted by the type of pressure-sensitive adhesive constituting the ultraviolet-curable pressure-sensitive adhesive layer, the type and amount of filler, etc.
The storage modulus G' of the above ultraviolet-curable pressure-sensitive adhesive layer before ultraviolet irradiation at 23°C can be determined by measuring the storage modulus using a viscoelasticity spectrometer (e.g., DVA-200, manufactured by IT Measurement & Control Co., Ltd.) under conditions of a constant temperature rise shear mode, a temperature rise rate of 10°C/min, and a frequency of 10 Hz.
上記紫外線硬化型粘着剤層の厚さは特に限定されないが、下限が5μm、上限が100μmであることが好ましい。上記紫外線硬化型粘着剤層の厚みが上記範囲であると充分な粘着力で被着体を保護することができ、更に剥離時の糊残りを抑制することもできる。粘着力を更に向上させると共に剥離時の糊残りを更に抑制する観点から、上記紫外線硬化型粘着剤層の厚さのより好ましい下限は10μm、より好ましい上限は60μmである。 The thickness of the ultraviolet-curable adhesive layer is not particularly limited, but it is preferable that the lower limit is 5 μm and the upper limit is 100 μm. When the thickness of the ultraviolet-curable adhesive layer is within the above range, the adherend can be protected with sufficient adhesive strength, and adhesive residue upon peeling can also be suppressed. From the viewpoint of further improving adhesive strength and further suppressing adhesive residue upon peeling, a more preferable lower limit of the thickness of the ultraviolet-curable adhesive layer is 10 μm, and a more preferable upper limit is 60 μm.
本発明の粘着テープは、上記基材フィルムの上記紫外線硬化型粘着剤層が積層している面とは反対側の面に粘着剤層を有することが好ましい。
本発明の粘着テープが基材フィルムの片面に紫外線硬化型粘着剤層を有し、もう片方の面に粘着剤層を有した両面粘着テープであることで、両面粘着テープを介してガラス等の支持体と被着体とを接着できることから、支持体を用いた半導体デバイスの製造工程を行うことができる。
The pressure-sensitive adhesive tape of the present invention preferably has a pressure-sensitive adhesive layer on the surface of the base film opposite to the surface on which the ultraviolet-curable pressure-sensitive adhesive layer is laminated.
Since the adhesive tape of the present invention is a double-sided adhesive tape having an ultraviolet-curable adhesive layer on one side of a base film and an adhesive layer on the other side, a support such as glass and an adherend can be adhered via the double-sided adhesive tape, making it possible to carry out a manufacturing process for a semiconductor device using the support.
上記粘着剤層を構成する粘着剤は特に限定されず、例えば、アクリル系粘着剤、シリコーン系粘着剤、ウレタン系粘着剤等が挙げられる。なかでも、耐熱性に優れることからアクリル系又はシリコーン系粘着剤が好ましい。
また、上記粘着剤層を構成する粘着剤として、上述したような紫外線硬化型粘着剤を用いることもできる。上記紫外線硬化型粘着剤を用いることによって、充分な粘着力で支持体を保持することができ、支持体が透明支持体である場合は貼り付け後に上記紫外線硬化型粘着剤からなる粘着剤層を硬化させることによって、高温処理が行われる場合であっても支持体を保持することができる。また、支持体が不要となった後は容易に支持体を除去することができる。
The adhesive constituting the adhesive layer is not particularly limited, and examples thereof include acrylic adhesives, silicone adhesives, urethane adhesives, etc. Among these, acrylic and silicone adhesives are preferred because of their excellent heat resistance.
In addition, the adhesive constituting the adhesive layer may be an ultraviolet-curable adhesive as described above. By using the ultraviolet-curable adhesive, the support can be held with sufficient adhesive strength, and when the support is a transparent support, the support can be held even when a high-temperature treatment is performed by curing the adhesive layer made of the ultraviolet-curable adhesive after pasting. In addition, the support can be easily removed after it is no longer needed.
上記粘着剤層は、刺激によって気体を発生させる気体発生剤を含有することが好ましい。
上記粘着剤層が気体発生剤を含有することによって、工程終了後に刺激を与えて気体を発生させることで、容易に支持体と粘着テープとを剥離することができる。
上記気体発生剤は上記紫外線硬化型粘着剤層の気体発生剤と同様のものを用いることができる。
The pressure-sensitive adhesive layer preferably contains a gas generating agent that generates gas in response to a stimulus.
By including a gas generating agent in the pressure-sensitive adhesive layer, the support and the pressure-sensitive adhesive tape can be easily peeled off by applying a stimulus to generate gas after the end of the process.
The gas generating agent may be the same as the gas generating agent for the ultraviolet-curable pressure-sensitive adhesive layer.
上記粘着剤層の厚さは特に限定されないが、下限が5μm、上限が30μmであることが好ましい。上記粘着剤層の厚みが上記範囲であると充分な粘着力で支持体と接着することができる。支持体との接着力をさらに高める観点から、上記粘着剤層の厚さのより好ましい下限は10μm、より好ましい上限は20μmである。 The thickness of the adhesive layer is not particularly limited, but it is preferable that the lower limit is 5 μm and the upper limit is 30 μm. When the thickness of the adhesive layer is within the above range, it can be adhered to the support with sufficient adhesive strength. From the viewpoint of further increasing the adhesive strength to the support, a more preferable lower limit of the thickness of the adhesive layer is 10 μm and a more preferable upper limit is 20 μm.
上記粘着剤層は、光増感剤、可塑剤、樹脂、界面活性剤、ワックス、微粒子充填剤等の公知の添加剤を含有してもよい。これらの添加剤は単独で用いられてもよく、複数を組み合わせて用いてもよい。The pressure-sensitive adhesive layer may contain known additives such as photosensitizers, plasticizers, resins, surfactants, waxes, and particulate fillers. These additives may be used alone or in combination.
本発明の粘着テープは上記基材フィルムと上記紫外線硬化型粘着剤層との間にアンカー層を有していてもよい。
上記基材フィルムと上記紫外線硬化型粘着剤層との間にアンカー層を有すると、紫外線硬化型粘着剤層にシリコーン又はフッ素化合物が含まれる場合に、シリコーン又はフッ素化合物が基材フィルム側にブリードアウトして紫外線硬化型粘着剤層が基材フィルムから剥離してしまうことを抑止できる。
The pressure-sensitive adhesive tape of the present invention may have an anchor layer between the base film and the ultraviolet-curable pressure-sensitive adhesive layer.
When an anchor layer is provided between the substrate film and the ultraviolet-curable pressure-sensitive adhesive layer, if the ultraviolet-curable pressure-sensitive adhesive layer contains a silicone or a fluorine compound, the silicone or the fluorine compound can be prevented from bleeding out onto the substrate film side, causing the ultraviolet-curable pressure-sensitive adhesive layer to peel off from the substrate film.
上記アンカー層としては、例えば、アクリル系粘着剤、ウレタン系粘着剤等が挙げられる。なかでも、アンカー性能に優れることからアクリル系粘着剤が好ましい。 Examples of the anchor layer include acrylic adhesives, urethane adhesives, etc. Among these, acrylic adhesives are preferred because of their excellent anchor performance.
上記アンカー層は、必要に応じて、無機充填剤、熱安定剤、酸化防止剤、帯電防止剤、可塑剤、樹脂、界面活性剤、ワックス等の公知の添加剤を含有してもよい。これらの添加剤は単独で用いられてもよく、複数を組み合わせて用いてもよい。 The anchor layer may contain known additives such as inorganic fillers, heat stabilizers, antioxidants, antistatic agents, plasticizers, resins, surfactants, waxes, etc., as necessary. These additives may be used alone or in combination.
上記アンカー層の厚みは特に限定されないが、好ましい下限は1μm、好ましい上限は30μmである。上記アンカー層の厚みがこの範囲内であると、上記紫外線硬化型粘着剤層と基材フィルムとのアンカー力をより向上させることができる。上記紫外線硬化型粘着剤層と基材フィルムとのアンカー力を更に向上させる観点から、上記アンカー層の厚みのより好ましい下限は3μm、より好ましい上限は10μmである。 The thickness of the anchor layer is not particularly limited, but a preferred lower limit is 1 μm and a preferred upper limit is 30 μm. When the thickness of the anchor layer is within this range, the anchor strength between the ultraviolet-curable adhesive layer and the base film can be further improved. From the viewpoint of further improving the anchor strength between the ultraviolet-curable adhesive layer and the base film, a more preferred lower limit of the thickness of the anchor layer is 3 μm and a more preferred upper limit is 10 μm.
本発明の粘着テープを製造する方法は特に限定されず、従来公知の方法を用いることができる。例えば、離型処理を施したフィルム上に上記紫外線硬化型粘着剤成分の溶液を塗工、乾燥させて紫外線硬化型粘着剤層を形成し、基材フィルムと貼り合わせることで製造することができる。また、本発明の粘着テープが上記粘着剤層を有する場合は、上記粘着剤層を構成する粘着剤の溶液を用いて、上記紫外線硬化型粘着剤層と同様の方法で粘着剤層を形成し、基材フィルムの上記紫外線硬化型粘着剤層が貼り合された面とは反対側の面に貼り合わせることで製造することができる。The method for producing the adhesive tape of the present invention is not particularly limited, and a conventionally known method can be used. For example, the adhesive tape can be produced by applying a solution of the ultraviolet-curable adhesive component to a film that has been subjected to a release treatment, drying the solution to form an ultraviolet-curable adhesive layer, and laminating the layer to a substrate film. In addition, when the adhesive tape of the present invention has the adhesive layer, the adhesive layer can be produced by forming the adhesive layer using a solution of the adhesive constituting the adhesive layer in the same manner as the ultraviolet-curable adhesive layer, and laminating the layer to the surface of the substrate film opposite to the surface to which the ultraviolet-curable adhesive layer is laminated.
本発明の粘着テープの用途は特に限定されないが、高温かつ圧力が加わるような過酷な環境で用いた場合であっても被着体を保護して糊残りなく剥離が可能であることから、電子部品の製造においてウエハや半導体チップ等を保護するための保護テープとして特に好適に用いることができる。
このような電子部品を製造する方法として、例えば、次のような電子部品の製造方法が挙げられる。即ち、本発明の粘着テープを、紫外線硬化型粘着剤層から基板に貼り付ける基板貼付工程と、紫外線を照射して上記紫外線硬化型粘着剤層を硬化させる硬化工程と、上記基板を260℃以上の高温で処理する熱処理工程と、上記基板を本発明の粘着テープから剥離する剥離工程とをこの順で含む、方法である。
また、本発明の一実施態様である、上記基材フィルムの上記紫外線硬化型粘着剤層が積層している面とは反対側の面に粘着剤層を有する粘着テープを用いた、次のような電子部品の製造方法も挙げられる。即ち、粘着テープを、紫外線硬化型粘着剤層から基板に貼り付ける基板貼付工程と、上記粘着剤層上に支持体を貼り付ける支持体貼付工程と、紫外線を照射して上記紫外線硬化型粘着剤層を硬化させる硬化工程と、上記基板を260℃以上の高温で処理する熱処理工程と、上記基板を粘着テープから剥離する剥離工程とをこの順で含む、方法である。また、粘着テープを、紫外線硬化型粘着剤層から基板に貼り付ける基板貼付工程と、紫外線を照射して上記紫外線硬化型粘着剤層を硬化させる硬化工程と、上記粘着剤層上に支持体を貼り付ける支持体貼付工程と、上記基板を260℃以上の高温で処理する熱処理工程と、上記基板を粘着テープから剥離する剥離工程とをこの順で含む、方法である。
The uses of the adhesive tape of the present invention are not particularly limited, but since the adhesive tape can protect the adherend and be peeled off without leaving any adhesive residue even when used in harsh environments such as high temperatures and pressure, it can be particularly suitably used as a protective tape for protecting wafers, semiconductor chips, etc. in the manufacture of electronic components.
An example of a method for producing such an electronic component is the following method, which includes, in this order, a substrate attachment step of attaching the pressure-sensitive adhesive tape of the present invention to a substrate via an ultraviolet-curable pressure-sensitive adhesive layer, a curing step of curing the ultraviolet-curable pressure-sensitive adhesive layer by irradiating ultraviolet light, a heat treatment step of treating the substrate at a high temperature of 260° C. or higher, and a peeling step of peeling the substrate from the pressure-sensitive adhesive tape of the present invention.
Also, as an embodiment of the present invention, there is a method for producing an electronic component using an adhesive tape having an adhesive layer on the surface opposite to the surface on which the ultraviolet-curable adhesive layer of the base film is laminated, as follows. That is, the method includes, in this order, a substrate attachment step of attaching the adhesive tape to the substrate from the ultraviolet-curable adhesive layer, a support attachment step of attaching a support onto the adhesive layer, a curing step of curing the ultraviolet-curable adhesive layer by irradiating ultraviolet light, a heat treatment step of treating the substrate at a high temperature of 260° C. or higher, and a peeling step of peeling the substrate from the adhesive tape. Also, the method includes, in this order, a substrate attachment step of attaching the adhesive tape to the substrate from the ultraviolet-curable adhesive layer, a curing step of curing the ultraviolet-curable adhesive layer by irradiating ultraviolet light, a support attachment step of attaching a support onto the adhesive layer, a heat treatment step of treating the substrate at a high temperature of 260° C. or higher, and a peeling step of peeling the substrate from the adhesive tape.
上記基板は特に限定されず、例えば、シリコンウエハ、半導体ウエハ、半導体チップ等が挙げられる。
上記支持体は特に限定されず、例えば、ガラス、ポリイミドフィルム、ガラスエポキシ基板等が挙げられる。
上記260℃以上の高温で処理する熱処理工程の温度上限は特に限定されず、例えば400℃、好ましくは300℃である。
上記260℃以上の高温で処理する熱処理工程は特に限定されず、例えば、基板製造工程、チップマウント工程、熱圧着ボンディング工程、リフロー工程等が挙げられる。より具体的には、例えば、粘着テープが数十秒~1分間ほど260℃以上に加熱される熱圧着ボンディング工程又はリフロー工程等が挙げられる。
The substrate is not particularly limited, and examples thereof include a silicon wafer, a semiconductor wafer, and a semiconductor chip.
The support is not particularly limited, and examples thereof include glass, a polyimide film, and a glass epoxy substrate.
The upper limit of the temperature in the heat treatment step at a high temperature of 260°C or higher is not particularly limited, and is, for example, 400°C, and preferably 300°C.
The heat treatment process at a high temperature of 260° C. or higher is not particularly limited, and examples thereof include a substrate manufacturing process, a chip mounting process, a thermocompression bonding process, a reflow process, etc. More specifically, examples thereof include a thermocompression bonding process or a reflow process in which an adhesive tape is heated to 260° C. or higher for several tens of seconds to about one minute.
本発明によれば、260℃に達する高温処理を伴う工程に用いた場合であっても被着体を保護し、かつ、糊残りなく剥離することができる粘着テープを提供することができる。 According to the present invention, it is possible to provide an adhesive tape that protects the adherend even when used in processes involving high-temperature treatment up to 260°C and can be peeled off without leaving any adhesive residue.
以下に実施例を挙げて本発明の態様を更に詳しく説明するが、本発明はこれら実施例のみに限定されるものではない。 The following examples further illustrate aspects of the present invention, but the present invention is not limited to these examples.
(実施例1)
(紫外線硬化型粘着剤Aの製造)
温度計、攪拌機、冷却管を備えた反応器を用意し、この反応器内に、(メタ)アクリル酸アルキルエステルとして2-エチルヘキシルアクリレート94重量部、官能基含有モノマーとしてメタクリル酸ヒドロキシエチル6重量部、ラウリルメルカプタン0.01重量部と、酢酸エチル80重量部を加えた後、反応器を加熱して還流を開始した。続いて、上記反応器内に、重合開始剤として1,1-ビス(t-ヘキシルパーオキシ)-3,3,5-トリメチルシクロヘキサン0.01重量部を添加し、還流下で重合を開始させた。次に、重合開始から1時間後及び2時間後にも、1,1-ビス(t-ヘキシルパーオキシ)-3,3,5-トリメチルシクロヘキサンを0.01重量部ずつ添加し、更に、重合開始から4時間後にt-ヘキシルパーオキシピバレートを0.05重量部添加して重合反応を継続させた。そして、重合開始から8時間後に、固形分55重量%、重量平均分子量60万の官能基含有(メタ)アクリル系ポリマーの酢酸エチル溶液を得た。
得られた官能基含有(メタ)アクリル系ポリマーを含む酢酸エチル溶液の樹脂固形分100重量部に対して、官能基含有不飽和化合物として2-イソシアナトエチルメタクリレート3.5重量部を加えて反応させて重合性ポリマー(アクリルポリマー)Aを得た。その後、得られたアクリルポリマーAの酢酸エチル溶液の樹脂固形分100重量部に対して、離型剤(シリコーン)20重量部、フィラー3重量部、ウレタンアクリレート10重量部、架橋剤0.2重量部、光重合開始剤1重量部、を混合し、紫外線硬化型粘着剤Aの酢酸エチル溶液を得た。なお、離型剤(シリコーン)、フィラー、ウレタンアクリレート、架橋剤、光重合開始剤は以下のものを用いた。
離型剤(シリコーン):シリコーンジアクリレート、EBECRYL 350、ダイセル・オルネクス社製、重量平均分子量1000
フィラー:シリカフィラー、レオロシール MT-10、トクヤマ社製
ウレタンアクリレート:UN-5500、根上工業社製
架橋剤:イソシアネート系架橋剤、コロネートL、日本ウレタン工業社製
光重合開始剤:エサキュアワン、日本シイベルヘグナー社製
Example 1
(Production of UV-curable adhesive A)
A reactor equipped with a thermometer, a stirrer, and a cooling tube was prepared, and 94 parts by weight of 2-ethylhexyl acrylate as an alkyl (meth)acrylate ester, 6 parts by weight of hydroxyethyl methacrylate as a functional group-containing monomer, 0.01 parts by weight of lauryl mercaptan, and 80 parts by weight of ethyl acetate were added to the reactor, and the reactor was heated to start reflux. Subsequently, 0.01 parts by weight of 1,1-bis(t-hexylperoxy)-3,3,5-trimethylcyclohexane was added as a polymerization initiator to start polymerization under reflux. Next, 0.01 parts by weight of 1,1-bis(t-hexylperoxy)-3,3,5-trimethylcyclohexane was added one hour and two hours after the start of polymerization, and further 0.05 parts by weight of t-hexylperoxypivalate was added four hours after the start of polymerization to continue the polymerization reaction. Then, 8 hours after the start of polymerization, an ethyl acetate solution of a functional group-containing (meth)acrylic polymer having a solid content of 55% by weight and a weight average molecular weight of 600,000 was obtained.
To 100 parts by weight of the resin solids of the obtained ethyl acetate solution containing the functional group-containing (meth)acrylic polymer, 3.5 parts by weight of 2-isocyanatoethyl methacrylate was added as a functional group-containing unsaturated compound and reacted to obtain a polymerizable polymer (acrylic polymer) A. Then, to 100 parts by weight of the resin solids of the obtained ethyl acetate solution of the acrylic polymer A, 20 parts by weight of a release agent (silicone), 3 parts by weight of a filler, 10 parts by weight of a urethane acrylate, 0.2 parts by weight of a crosslinking agent, and 1 part by weight of a photopolymerization initiator were mixed to obtain an ethyl acetate solution of an ultraviolet-curable pressure-sensitive adhesive A. The release agent (silicone), filler, urethane acrylate, crosslinking agent, and photopolymerization initiator used were as follows.
Release agent (silicone): silicone diacrylate, EBECRYL 350, manufactured by Daicel Allnex Co., Ltd., weight average molecular weight 1000
Filler: Silica filler, Leoloseal MT-10, manufactured by Tokuyama Corporation Urethane acrylate: UN-5500, manufactured by Negami Chemical Industries Co., Ltd. Crosslinking agent: Isocyanate-based crosslinking agent, Coronate L, manufactured by Nippon Urethane Industry Co., Ltd. Photopolymerization initiator: Esacure One, manufactured by Nippon SiberHegner Co., Ltd.
(粘着剤層用粘着剤Aの製造)
紫外線硬化型粘着剤Aの製造で得られたアクリルポリマーAの酢酸エチル溶液の樹脂固形分100重量部に対して、離型剤(シリコーン)10重量部、フィラー12重量部、ウレタンアクリレート20重量部、架橋剤1.2重量部、光重合開始剤1重量部、気体発生剤10重量部、を混合し、粘着剤層用粘着剤Aの酢酸エチル溶液を得た。なお、離型剤(シリコーン)、フィラー、ウレタンアクリレート、架橋剤及び光重合開始剤は紫外線硬化型粘着剤の製造と同じものを用いた。気体発生剤は下記式(A)で表されるビステトラゾール化合物の塩を用いた。
(Preparation of Pressure-Sensitive Adhesive A for Pressure-Sensitive Adhesive Layer)
100 parts by weight of the resin solid content of the ethyl acetate solution of the acrylic polymer A obtained in the production of the ultraviolet curing adhesive A was mixed with 10 parts by weight of the release agent (silicone), 12 parts by weight of the filler, 20 parts by weight of the urethane acrylate, 1.2 parts by weight of the crosslinking agent, 1 part by weight of the photopolymerization initiator, and 10 parts by weight of the gas generating agent to obtain an ethyl acetate solution of the adhesive A for the adhesive layer. The release agent (silicone), the filler, the urethane acrylate, the crosslinking agent, and the photopolymerization initiator were the same as those used in the production of the ultraviolet curing adhesive. The gas generating agent was a salt of a bistetrazole compound represented by the following formula (A).
(アンカー層用粘着剤の製造)
アクリルポリマーの酢酸エチル溶液の樹脂固形分100重量部に対して、フィラー12重量部、架橋剤5重量部、を混合し、アンカー層用粘着剤の酢酸エチル溶液を得た。なお、アクリルポリマー、フィラー、架橋剤は以下のものを用いた。
アクリルポリマー:SKダイン 1604N、綜研化学社製
フィラー:シリカフィラー、レオロシール MT-10、トクヤマ社製
架橋剤:イソシアネート系架橋剤、コロネートL、日本ウレタン工業社製
(Production of adhesive for anchor layer)
100 parts by weight of the resin solid content of the ethyl acetate solution of the acrylic polymer was mixed with 12 parts by weight of the filler and 5 parts by weight of the crosslinking agent to obtain an ethyl acetate solution of the adhesive for the anchor layer. The following acrylic polymer, filler, and crosslinking agent were used.
Acrylic polymer: SK Dyne 1604N, manufactured by Soken Chemical Industries, Ltd. Filler: Silica filler, Leoloseal MT-10, manufactured by Tokuyama Corporation Crosslinking agent: Isocyanate-based crosslinking agent, Coronate L, manufactured by Nippon Urethane Industry Co., Ltd.
(粘着テープの製造)
厚み50μmの離型処理が施されたポリエチレンテレフタレート(PET)フィルムの離型処理面上に、得られた紫外線硬化型粘着剤Aの酢酸エチル溶液を、乾燥後に粘着剤層の厚みが130μmとなるように塗工した後、100℃で10分間乾燥させて紫外線硬化型粘着剤層を形成した。
一方、別の厚み50μmの離型処理が施されたPETフィルムの離型処理面上に、得られた粘着剤層用粘着剤Aの酢酸エチル溶液を、乾燥後に粘着剤層の厚みが20μmとなるように塗工した後、110℃で5分間乾燥させて粘着剤層を形成した。
さらに別の厚み50μmの離型処理が施されたPETフィルムの離型処理面上に、得られたアンカー層用粘着剤の酢酸エチル溶液を、乾燥後に粘着剤層の厚みが10μmとなるように塗工した後、110℃で5分間乾燥させてアンカー層を形成した。
次いで、両面にコロナ処理が施された厚さ25μmのナイロン9T(ユニアミド、ユニチカ社製)からなるフィルム(ナイロン9Tフィルム)を基材フィルムとして用意し、ナイロン9Tフィルムの片面に作製したアンカー層をラミネートし、PETフィルムを剥離して基材フィルム上にアンカー層を形成した。その後、ナイロン9Tフィルムのアンカー層を形成した面上に得られた紫外線硬化型粘着剤層を貼り合わせ、ナイロン9Tフィルムのアンカー層を形成した面とは反対側の面上に得られた粘着剤層を貼り合わせて、紫外線硬化型粘着剤層/アンカー層/基材フィルム/粘着剤層の構造を有する粘着テープを得た。
(Manufacturing of adhesive tapes)
The obtained ethyl acetate solution of ultraviolet-curable adhesive A was coated on a release-treated surface of a 50 μm-thick polyethylene terephthalate (PET) film that had been subjected to a release treatment so that the adhesive layer would have a thickness of 130 μm after drying, and then dried at 100° C. for 10 minutes to form an ultraviolet-curable adhesive layer.
On the other hand, the obtained ethyl acetate solution of adhesive A for the adhesive layer was coated on a release-treated surface of another PET film having a thickness of 50 μm so that the adhesive layer would have a thickness of 20 μm after drying, and then dried at 110° C. for 5 minutes to form an adhesive layer.
Furthermore, the obtained ethyl acetate solution of the adhesive for the anchor layer was coated on the release-treated surface of another PET film having a thickness of 50 μm so that the adhesive layer would have a thickness of 10 μm after drying, and then dried at 110° C. for 5 minutes to form an anchor layer.
Next, a film (nylon 9T film) made of nylon 9T (Uniamide, manufactured by Unitika Ltd.) having a thickness of 25 μm and having been subjected to corona treatment on both sides was prepared as a base film, the anchor layer prepared was laminated on one side of the nylon 9T film, and the PET film was peeled off to form an anchor layer on the base film. Thereafter, the obtained ultraviolet-curable adhesive layer was bonded to the surface of the nylon 9T film on which the anchor layer was formed, and the obtained adhesive layer was bonded to the surface of the nylon 9T film opposite to the surface on which the anchor layer was formed, to obtain an adhesive tape having a structure of ultraviolet-curable adhesive layer/anchor layer/base film/adhesive layer.
(基材フィルムの紫外線透過率の測定)
分光光度計(U-3900、日立製作所社製)を用いて基材フィルムの405nmにおける紫外線の透過率を測定した。
(Measurement of UV transmittance of substrate film)
The transmittance of the substrate film to ultraviolet light at 405 nm was measured using a spectrophotometer (U-3900, manufactured by Hitachi, Ltd.).
(Ef(270)の測定)
基材フィルムを5×35mmの寸法に、長辺が基材フィルム製造時の流れ方向と同一となるように打抜き刃を用いて打抜くことで、測定サンプルを得た。得られた測定サンプルを液体窒素に浸漬して-50℃まで冷却し、その後、粘弾性スペクトロメーター(DVA-200、アイティー計測制御社製)を用いて、定速昇温引張モード、昇温速度10℃/分、周波数10Hzの条件で引張弾性率の測定を行い、基材フィルムの270℃における引張弾性率を測定した。
(Measurement of Ef(270))
The substrate film was punched out with a punch blade into a size of 5×35 mm with the long side aligned with the flow direction during the production of the substrate film, to obtain a measurement sample. The obtained measurement sample was immersed in liquid nitrogen to cool to −50° C., and then the tensile modulus of the substrate film at 270° C. was measured using a viscoelasticity spectrometer (DVA-200, manufactured by IT Measurement & Control Co., Ltd.) under the conditions of a constant temperature rise tensile mode, a temperature rise rate of 10° C./min, and a frequency of 10 Hz.
(紫外線照射前の貯蔵弾性率G’の測定)
紫外線硬化型粘着層について、粘弾性スペクトロメーター(DVA-200、アイティー計測制御社製)を用いて、定速昇温せん断モード、昇温速度10℃/分、周波数10Hzの条件で貯蔵弾性率の測定を行い、紫外線照射前の紫外線硬化型粘着剤層の23℃における貯蔵弾性率G’を求めた。
(Measurement of storage modulus G' before UV irradiation)
The storage modulus of the ultraviolet-curable adhesive layer was measured using a viscoelasticity spectrometer (DVA-200, manufactured by IT Measurement & Control Co., Ltd.) under conditions of a constant temperature rise shear mode, a temperature rise rate of 10°C/min, and a frequency of 10 Hz, and the storage modulus G' of the ultraviolet-curable adhesive layer at 23°C before ultraviolet irradiation was determined.
(紫外線照射後のゲル分率の測定)
高圧水銀紫外線照射機を用いて、405nmの紫外線を得られた粘着テープの基材フィルム側から粘着テープ表面への積算強度が3000mJ/cm2となるよう照射して、紫外線硬化型粘着剤層を架橋、硬化させた。次いで、硬化後の紫外線硬化型粘着剤層のみを0.1gこそぎ取って酢酸エチル50ml中に浸漬し、振とう機で温度23度、120rpmの条件で24時間振とうした(以下、こそぎ取った紫外線硬化型粘着剤層のことを粘着剤組成物という)。振とう後、金属メッシュ(目開き#200メッシュ)を用いて、酢酸エチルと酢酸エチルを吸収し膨潤した粘着剤組成物を分離した。分離後の粘着剤組成物を110℃の条件下で1時間乾燥させた。乾燥後の金属メッシュを含む粘着剤組成物の重量を測定し、下記式を用いて紫外線照射後のゲル分率を算出した。
ゲル分率(%)=100×(W1-W2)/W0
(W0:初期粘着剤組成物重量、W1:乾燥後の金属メッシュを含む粘着剤組成物重量、W2:金属メッシュの初期重量)
(Measurement of gel fraction after ultraviolet irradiation)
Using a high-pressure mercury ultraviolet irradiator, ultraviolet rays of 405 nm were irradiated from the substrate film side of the obtained adhesive tape to the adhesive tape surface so that the cumulative intensity was 3000 mJ/cm 2 , and the ultraviolet-curable adhesive layer was crosslinked and cured. Next, 0.1 g of only the cured ultraviolet-curable adhesive layer was scraped off and immersed in 50 ml of ethyl acetate, and shaken for 24 hours with a shaker at a temperature of 23 degrees and 120 rpm (hereinafter, the scraped ultraviolet-curable adhesive layer is referred to as the adhesive composition). After shaking, ethyl acetate and the adhesive composition that absorbed and swelled with ethyl acetate were separated using a metal mesh (opening #200 mesh). The adhesive composition after separation was dried under conditions of 110 ° C for 1 hour. The weight of the adhesive composition including the dried metal mesh was measured, and the gel fraction after ultraviolet irradiation was calculated using the following formula.
Gel fraction (%)=100×(W 1 −W 2 )/W 0
(W 0 : initial weight of the adhesive composition, W 1 : weight of the adhesive composition including the metal mesh after drying, W 2 : initial weight of the metal mesh)
(Et(270)の測定)
高圧水銀紫外線照射機を用いて、405nmの紫外線を得られた粘着テープの基材フィルム側から粘着テープ表面への積算強度が3000mJ/cm2となるよう照射して、紫外線硬化型粘着剤層を架橋、硬化させた。次いで、長辺が粘着テープ製造時の流れ方向と同一となるように打抜き刃を用いて打抜くことで、5mm×35mmの試験片を作製した。得られた試験片を液体窒素に浸漬して-50℃まで冷却し、その後、粘弾性スペクトロメーター(DVA-200、アイティー計測制御社製)を用いて、定速昇温引張モード、昇温速度10℃/分、周波数10Hzの条件で300℃まで昇温し、引張弾性率を測定した。このときの温度X℃における引張弾性率(E’)の値を、Et(X)とした。すなわち、温度270℃における引張弾性率(E’)の値を、Et(270)とした。
(Measurement of Et(270))
Using a high-pressure mercury ultraviolet irradiator, ultraviolet rays of 405 nm were irradiated from the base film side of the obtained adhesive tape to the adhesive tape surface so that the cumulative intensity was 3000 mJ/cm 2 , and the ultraviolet-curable adhesive layer was crosslinked and cured. Next, a 5 mm x 35 mm test piece was prepared by punching using a punching blade so that the long side was the same as the flow direction during the production of the adhesive tape. The obtained test piece was immersed in liquid nitrogen and cooled to -50 ° C., and then heated to 300 ° C. using a viscoelasticity spectrometer (DVA-200, manufactured by IT Measurement and Control Co., Ltd.) under the conditions of a constant-rate heating tensile mode, a heating rate of 10 ° C./min, and a frequency of 10 Hz, and the tensile modulus was measured. The value of the tensile modulus (E') at a temperature of X ° C. at this time was taken as Et (X). That is, the value of the tensile modulus (E') at a temperature of 270 ° C. was taken as Et (270).
(Et(270)/Et(200)の算出)
得られた粘着テープについてEt(270)と同様の方法で、200℃における粘着テープの引張弾性率(Et(200))を測定した。得られたEt(270)及びEt(200)の結果からEt(270)/Et(200)を算出した。
(Calculation of Et(270)/Et(200))
The tensile modulus (Et(200)) of the obtained pressure-sensitive adhesive tape at 200° C. was measured in the same manner as for Et(270). From the obtained results of Et(270) and Et(200), Et(270)/Et(200) was calculated.
(重量減少率の測定)
高圧水銀紫外線照射機を用いて、405nmの紫外線を得られた粘着テープの基材フィルム側から粘着テープ表面への積算強度が3000mJ/cm2となるよう照射して、紫外線硬化型粘着剤層を架橋、硬化させた。次いで、粘着テープをφ5mmの円状に打抜き測定サンプルを得た。得られた測定サンプルの重量を測定し、示差熱熱重量同時測定装置(TG-DTA;STA7200、日立ハイテクサイエンス社製)を用いて昇温速度5℃/minで25℃から280℃まで昇温した後10分間ホールドした際の重量減少量を測定した。加熱前後の重量から重量減少率を算出した。
(Measurement of weight loss rate)
Using a high-pressure mercury ultraviolet irradiator, ultraviolet rays of 405 nm were irradiated from the substrate film side of the obtained adhesive tape to the adhesive tape surface so that the integrated intensity was 3000 mJ/cm 2 , and the ultraviolet-curable adhesive layer was crosslinked and cured. Next, the adhesive tape was punched into a circle of φ5 mm to obtain a measurement sample. The weight of the obtained measurement sample was measured, and the weight loss amount when the temperature was raised from 25 ° C. to 280 ° C. at a heating rate of 5 ° C./min and then held for 10 minutes was measured using a differential thermal thermogravimetric simultaneous measurement device (TG-DTA; STA7200, Hitachi High-Tech Science Corporation). The weight loss rate was calculated from the weight before and after heating.
(実施例2~10、比較例1~4)
基材フィルムの材料及び厚さ、紫外線硬化型粘着剤層の組成を表1のように変更した以外は実施例1と同様にして粘着テープを得て、各測定を行った。各材料の詳細を以下に示した。なお、実施例5では、以下に示す紫外線硬化型粘着剤Bを用いた。
(1)基材フィルムの材料
エクスピーク:芳香族ポリエーテルエーテルケトン、クラボウ社製
ユーピレックス:ビフェニルテトラカルボン酸二無水物とp-フェニレンジアミンの共重合体、宇部興産社製
トルセナ:特殊ポリエステル、クラボウ社製
カプトン:無水ピロメット酸とジアミノジフェニルエーテルの共重合体、東レ・デュポン社製
(Examples 2 to 10, Comparative Examples 1 to 4)
An adhesive tape was obtained and each measurement was carried out in the same manner as in Example 1, except that the material and thickness of the base film and the composition of the ultraviolet-curable adhesive layer were changed as shown in Table 1. Details of each material are shown below. In Example 5, ultraviolet-curable adhesive B shown below was used.
(1) Materials of the base film Expeak: aromatic polyether ether ketone, manufactured by Kurabo Industries, Ltd. Upilex: copolymer of biphenyltetracarboxylic dianhydride and p-phenylenediamine, manufactured by Ube Industries, Ltd. Torsena: special polyester, manufactured by Kurabo Industries, Ltd. Kapton: copolymer of pyromellitic anhydride and diaminodiphenyl ether, manufactured by DuPont Toray Co., Ltd.
(2)紫外線硬化型粘着剤B
(紫外線硬化型粘着剤Bの製造)
温度計、攪拌機、冷却管を備えた反応器を用意し、この反応器内に、(メタ)アクリル酸アルキルエステルとして2-エチルヘキシルアクリレート94重量部、官能基含有モノマーとしてメタクリル酸ヒドロキシエチル6重量部、ラウリルメルカプタン0.01重量部と、酢酸エチル80重量部を加えた後、反応器を加熱して還流を開始した。続いて、上記反応器内に、重合開始剤として1,1-ビス(t-ヘキシルパーオキシ)-3,3,5-トリメチルシクロヘキサン0.01重量部を添加し、還流下で重合を開始させた。次に、重合開始から1時間後及び2時間後にも、1,1-ビス(t-ヘキシルパーオキシ)-3,3,5-トリメチルシクロヘキサンを0.01重量部ずつ添加し、更に、重合開始から4時間後にt-ヘキシルパーオキシピバレートを0.05重量部添加して重合反応を継続させた。そして、重合開始から8時間後に、固形分55重量%、重量平均分子量60万の官能基含有(メタ)アクリル系ポリマーの酢酸エチル溶液を得た。
得られた官能基含有(メタ)アクリル系ポリマーを含む酢酸エチル溶液の樹脂固形分100重量部に対して、官能基含有不飽和化合物として2-イソシアナトエチルメタクリレート1.0重量部を加えて反応させて重合性ポリマー(アクリルポリマー)Bを得た。その後、得られたアクリルポリマーBの酢酸エチル溶液の樹脂固形分100重量部に対して、離型剤(シリコーン)20重量部、フィラー3重量部、ウレタンアクリレート10重量部、架橋剤0.2重量部、光重合開始剤1重量部、を混合し、紫外線硬化型粘着剤Bの酢酸エチル溶液を得た。なお、離型剤(シリコーン)、フィラー、ウレタンアクリレート、架橋剤、光重合開始剤は紫外線硬化型粘着剤Aと同種類のものを用いた。
(2) UV-curable adhesive B
(Production of UV-curable adhesive B)
A reactor equipped with a thermometer, a stirrer, and a cooling tube was prepared, and 94 parts by weight of 2-ethylhexyl acrylate as an alkyl (meth)acrylate ester, 6 parts by weight of hydroxyethyl methacrylate as a functional group-containing monomer, 0.01 parts by weight of lauryl mercaptan, and 80 parts by weight of ethyl acetate were added to the reactor, and the reactor was heated to start reflux. Subsequently, 0.01 parts by weight of 1,1-bis(t-hexylperoxy)-3,3,5-trimethylcyclohexane was added as a polymerization initiator to start polymerization under reflux. Next, 0.01 parts by weight of 1,1-bis(t-hexylperoxy)-3,3,5-trimethylcyclohexane was added one hour and two hours after the start of polymerization, and further 0.05 parts by weight of t-hexylperoxypivalate was added four hours after the start of polymerization to continue the polymerization reaction. Then, 8 hours after the start of polymerization, an ethyl acetate solution of a functional group-containing (meth)acrylic polymer having a solid content of 55% by weight and a weight average molecular weight of 600,000 was obtained.
To 100 parts by weight of the resin solids of the obtained ethyl acetate solution containing the functional group-containing (meth)acrylic polymer, 1.0 part by weight of 2-isocyanatoethyl methacrylate was added as a functional group-containing unsaturated compound and reacted to obtain a polymerizable polymer (acrylic polymer) B. Thereafter, to 100 parts by weight of the resin solids of the obtained ethyl acetate solution of the acrylic polymer B, 20 parts by weight of a release agent (silicone), 3 parts by weight of a filler, 10 parts by weight of a urethane acrylate, 0.2 parts by weight of a crosslinking agent, and 1 part by weight of a photopolymerization initiator were mixed to obtain an ethyl acetate solution of an ultraviolet-curing pressure-sensitive adhesive B. The release agent (silicone), filler, urethane acrylate, crosslinking agent, and photopolymerization initiator were the same types as those of the ultraviolet-curing pressure-sensitive adhesive A.
(3)その他
光増感剤:KAYACURE DETX-S、日本化薬社製
(3) Other photosensitizers: KAYACURE DETX-S, manufactured by Nippon Kayaku Co., Ltd.
<評価>
実施例及び比較例で得た粘着テープについて、以下の方法により評価を行った。結果を表1に示した。
<Evaluation>
The pressure-sensitive adhesive tapes obtained in the Examples and Comparative Examples were evaluated by the following methods. The results are shown in Table 1.
(耐熱性の評価)
直径20cmの円形に切断した粘着テープの紫外線硬化型粘着剤層側を、直径20cm、厚さ約750μmのシリコンウエハに貼り付けた。次いで、粘着テープの粘着剤層側を、直径20cm、厚さ0.6mmのガラスウエハ(Tempax、SCHOTT社製)に貼り付けた。貼付後、フィルターにより365nm以下の波長をカットした状態で、ガラスウエハ面側から405nmの波長の紫外光を紫外線硬化型粘着剤層への積算強度が3000mJ/cm2となるように照射し、紫外線硬化型粘着剤層及び粘着剤層を架橋、硬化させた。得られたシリコンウエハ/粘着テープ/ガラスウエハの積層体を280℃に設定されたホットプレート(NINOS ND-3H、AZONE社製)の上にシリコンウエハ側を下にして載せ、粘着テープの剥離が発生するまでの時間を測定した。
(Evaluation of heat resistance)
The ultraviolet-curable adhesive layer side of the adhesive tape cut into a circle with a diameter of 20 cm was attached to a silicon wafer with a diameter of 20 cm and a thickness of about 750 μm. Next, the adhesive layer side of the adhesive tape was attached to a glass wafer (Tempax, manufactured by SCHOTT) with a diameter of 20 cm and a thickness of 0.6 mm. After attachment, ultraviolet light with a wavelength of 405 nm was irradiated from the glass wafer side with an integrated intensity of 3000 mJ/cm 2 to the ultraviolet-curable adhesive layer, with wavelengths of 365 nm or less cut by a filter, to crosslink and cure the ultraviolet-curable adhesive layer and the adhesive layer. The obtained silicon wafer/adhesive tape/glass wafer laminate was placed on a hot plate (NINOS ND-3H, manufactured by AZONE) set at 280 ° C. with the silicon wafer side facing down, and the time until peeling of the adhesive tape occurred was measured.
(剥離性の評価)
粘着テープの紫外線硬化型粘着剤層側と直径20cm、厚さ約750μmのシリコンウエハとを貼り合わせ、更に、粘着剤層側を直径20cm、厚さ0.6mmのガラスウエハに貼り付けて積層体を得た。次いで、高圧水銀紫外線照射機を用いて、405nmの紫外線を粘着テープの粘着テープ表面への照射強度が100mW/cm2となるよう照度を調節して、ガラスウエハ側から30秒間照射して、紫外線硬化型粘着剤層及び粘着剤層を架橋、硬化させた。その後、積層体を280℃に設定されたホットプレートの上にシリコンウエハ側を下にして載せ10分間の熱処理を行い放冷した。
放冷後、粘着テープをシリコンウエハから剥離した。剥離の際に粘着テープを容易に剥離できた場合を「○」、剥離できなかった場合を「×」として剥離性を評価した。なお、粘着テープが10分以内で剥離した場合、剥離した段階で熱処理を止め、放冷した後の剥離性を評価した。
(Evaluation of peelability)
The ultraviolet-curing adhesive layer side of the adhesive tape was bonded to a silicon wafer having a diameter of 20 cm and a thickness of about 750 μm, and the adhesive layer side was bonded to a glass wafer having a diameter of 20 cm and a thickness of 0.6 mm to obtain a laminate. Next, using a high-pressure mercury ultraviolet irradiator, ultraviolet rays of 405 nm were irradiated from the glass wafer side for 30 seconds with the illuminance adjusted so that the irradiation intensity of the adhesive tape surface of the adhesive tape was 100 mW/cm 2 , and the ultraviolet-curing adhesive layer and the adhesive layer were crosslinked and cured. Then, the laminate was placed on a hot plate set at 280 ° C. with the silicon wafer side facing down, and heat-treated for 10 minutes and allowed to cool.
After cooling, the adhesive tape was peeled off from the silicon wafer. The peelability was evaluated as "○" when the adhesive tape could be easily peeled off, and "×" when it could not be peeled off. If the adhesive tape peeled off within 10 minutes, the heat treatment was stopped at the peeling stage, and the peelability was evaluated after cooling.
(糊残りの評価)
剥離性の評価において粘着テープ剥離後のシリコンウエハを光学顕微鏡にて観察し、糊残りした面積がシリコンウエハ全体の5%未満であった場合を「◎」、5%以上20%未満であった場合を「○」、20%以上50%未満であった場合を「△」、50%以上であった場合を「×」として糊残りを評価した。
(Evaluation of adhesive residue)
In the evaluation of releasability, the silicon wafer after peeling off the adhesive tape was observed under an optical microscope, and the adhesive residue was evaluated as follows: if the area of adhesive residue was less than 5% of the entire silicon wafer, it was marked as "◎", if it was 5% or more but less than 20%, it was marked as "◯", if it was 20% or more but less than 50%, it was marked as "△", and if it was 50% or more, it was marked as "X".
(熱圧着時の剥離性の評価)
直径20cmの円形に切断した粘着テープの紫外線硬化型粘着剤層側を、直径20cm、厚さ50μmのバンプ付シリコンウエハ(バンプ径φ=20μm、バンプ間距離30μm、バンプ高さ45μm)のバンプが形成された面に貼り付けた。次いで、粘着テープの粘着剤層側を、直径20cm、厚さ0.6mmのガラスウエハ(Tempax、SCHOTT社製)に貼り付けた。貼付後、フィルターにより365nm以下の波長をカットした状態で、ガラスウエハ面側から405nmの波長の紫外光を紫外線硬化型粘着剤層への積算強度が3000mJ/cm2となるように照射し、紫外線硬化型粘着剤層及び粘着剤層を架橋、硬化させた。得られたシリコンウエハ/粘着テープ/ガラスウエハの積層体を200℃に設定されたオーブンにてガラスウエハ側を下にして1時間静置し、加熱処理をした。
加熱処理後、常温に戻った積層体のシリコンウエハ上に、フリップチップボンダー(FC6000、芝浦メカトロニクス社製)を用い、厚さ50μmの単結晶シリコン薄ウエハチップを積層した。具体的には、80℃に設定されたSUSステージ上に、シリコンウエハ面が上になるように積層体を吸着させ、単結晶シリコン薄ウエハチップ(9.8mm×9.8mm、厚さ50μm、表面粗さ0.1μm未満、厚さ25μmの接合フィルム付き)を、ヘッドサイズ10mm×10mmのセラミックツールを用いて積層した。積層時のヘッドの温度は280℃とし、圧力は300N、積層時間は90秒とした。
単結晶シリコン薄ウエハチップの積層後、粘着テープをシリコンウエハから剥離した。剥離の際に粘着テープを容易に剥離できた場合を「○」、剥離できなかった場合を「×」として熱圧着時の剥離性を評価した。
(Evaluation of peelability during thermocompression bonding)
The ultraviolet-curable adhesive layer side of the adhesive tape cut into a circle with a diameter of 20 cm was attached to the bump-formed surface of a bumped silicon wafer with a diameter of 20 cm and a thickness of 50 μm (bump diameter φ=20 μm, distance between bumps 30 μm, bump height 45 μm). Next, the adhesive layer side of the adhesive tape was attached to a glass wafer (Tempax, manufactured by SCHOTT) with a diameter of 20 cm and a thickness of 0.6 mm. After attachment, ultraviolet light with a wavelength of 405 nm was irradiated from the glass wafer side so that the integrated intensity of the ultraviolet-curable adhesive layer was 3000 mJ/cm 2 with wavelengths of 365 nm or less cut by a filter, and the ultraviolet-curable adhesive layer and the adhesive layer were crosslinked and cured. The obtained silicon wafer/adhesive tape/glass wafer laminate was left standing with the glass wafer side facing down in an oven set at 200 ° C. for 1 hour, and heat-treated.
After the heat treatment, a single crystal silicon thin wafer chip having a thickness of 50 μm was laminated on the silicon wafer of the laminate that had returned to room temperature using a flip chip bonder (FC6000, manufactured by Shibaura Mechatronics Co., Ltd.). Specifically, the laminate was adsorbed on a SUS stage set at 80° C. with the silicon wafer surface facing up, and a single crystal silicon thin wafer chip (9.8 mm×9.8 mm, thickness 50 μm, surface roughness less than 0.1 μm, with a bonding film having a thickness of 25 μm) was laminated using a ceramic tool with a head size of 10 mm×10 mm. The head temperature during lamination was 280° C., the pressure was 300 N, and the lamination time was 90 seconds.
After laminating the single crystal silicon thin wafer chip, the adhesive tape was peeled off from the silicon wafer. The peelability during thermocompression bonding was evaluated as "○" if the adhesive tape could be easily peeled off and "×" if it could not be peeled off.
(熱圧着時の糊残りの評価)
熱圧着時の剥離性の評価において粘着テープ剥離後のシリコンウエハを光学顕微鏡にて観察した。500μm四方の範囲に存在するバンプのうち糊残りしているバンプが5%以下であった場合を「◎」、5%より多く20%以下であった場合を「〇」、20%より多く50%以下であった場合を「△」、50%より多かった場合を「×」として熱圧着時の糊残りを評価した。
(Evaluation of adhesive residue during thermocompression bonding)
In the evaluation of the peelability during thermocompression bonding, the silicon wafer after peeling off the adhesive tape was observed under an optical microscope. The adhesive residue during thermocompression bonding was evaluated as follows: if 5% or less of the bumps in a 500 μm square area had adhesive residue, it was marked as "◎", if more than 5% but not more than 20%, it was marked as "◯", if more than 20% but not more than 50%, it was marked as "△", and if more than 50%, it was marked as "×".
本発明によれば、260℃に達する高温処理を伴う工程に用いた場合であっても被着体を保護し、かつ、糊残りなく剥離することができる粘着テープを提供することができる。 According to the present invention, it is possible to provide an adhesive tape that protects the adherend even when used in processes involving high-temperature treatment up to 260°C and can be peeled off without leaving any adhesive residue.
Claims (12)
前記紫外線硬化型粘着剤層は、シリコーン又はフッ素化合物を含有し、
前記紫外線硬化型粘着剤層は、紫外線照射前の23℃における貯蔵弾性率G’が5.0×10 3 Pa以上、1.0×10 5 Pa以下であり、
前記粘着テープの前記基材フィルム側の表面に405nmの紫外線を3000mJ/cm2照射した後の前記紫外線硬化型粘着剤層のゲル分率が90%以上であり、
前記粘着テープの前記基材フィルム側の表面に前記405nmの紫外線を3000mJ/cm2照射した後の粘着テープのX℃における引張弾性率をEt(X)としたとき、Et(270)の値が1.0×107Pa以上、1.0×109Pa以下である、粘着テープ。 An adhesive tape having a base film and an ultraviolet-curable adhesive layer laminated on one side of the base film,
The ultraviolet-curable pressure-sensitive adhesive layer contains a silicone or a fluorine compound,
The ultraviolet-curable pressure-sensitive adhesive layer has a storage modulus G' of 5.0 x 10 3 Pa or more and 1.0 x 10 5 Pa or less at 23°C before ultraviolet irradiation ;
the gel fraction of the ultraviolet-curable pressure-sensitive adhesive layer after irradiating a surface of the pressure-sensitive adhesive tape on the base film side with 405 nm ultraviolet light at 3000 mJ/ cm2 is 90% or more;
When the tensile modulus of the adhesive tape at X°C after irradiating the surface of the adhesive tape on the base film side with the 405 nm ultraviolet light at 3000 mJ/ cm2 is defined as Et(X), the value of Et(270) is 1.0 x 107 Pa or more and 1.0 x 109 Pa or less.
前記紫外線硬化型粘着剤層は、重合性ポリマーと、架橋剤と、シリコーン又はフッ素化合物とを含有し、
前記重合性ポリマーは、(メタ)アクリルポリマーであり、
前記(メタ)アクリルポリマーは、アルキル基の炭素数が2~18の範囲にあるアクリル酸アルキルエステルに由来する構成単位と、官能基含有モノマーに由来する構成単位とを含み、
前記粘着テープの前記基材フィルム側の表面に405nmの紫外線を3000mJ/cm2照射した後の前記紫外線硬化型粘着剤層のゲル分率が90%以上であり、
前記粘着テープの前記基材フィルム側の表面に前記405nmの紫外線を3000mJ/cm2照射した後の粘着テープのX℃における引張弾性率をEt(X)としたとき、Et(270)の値が1.0×107Pa以上、1.0×109Pa以下である、粘着テープ。 An adhesive tape having a base film and an ultraviolet-curable adhesive layer laminated on one side of the base film,
The ultraviolet-curable pressure-sensitive adhesive layer contains a polymerizable polymer, a crosslinking agent, and a silicone or fluorine compound ,
the polymerizable polymer is a (meth)acrylic polymer,
The (meth)acrylic polymer contains a structural unit derived from an alkyl acrylate ester having an alkyl group having 2 to 18 carbon atoms, and a structural unit derived from a functional group-containing monomer,
the gel fraction of the ultraviolet-curable pressure-sensitive adhesive layer after irradiating a surface of the pressure-sensitive adhesive tape on the base film side with 405 nm ultraviolet light at 3000 mJ/ cm2 is 90% or more;
When the tensile modulus of the adhesive tape at X°C after irradiating the surface of the adhesive tape on the base film side with the 405 nm ultraviolet light at 3000 mJ/ cm2 is defined as Et(X), the value of Et(270) is 1.0 x 107 Pa or more and 1.0 x 109 Pa or less.
前記シリコーン又はフッ素化合物は、前記重合性ポリマーと架橋可能な官能基を有し、
前記(メタ)アクリルポリマーは、分子内にラジカル重合性の不飽和結合を有する(メタ)アクリル酸アルキルエステル系の重合性ポリマーである、請求項2記載の粘着テープ。 The ultraviolet-curable pressure-sensitive adhesive layer further contains a polymerization initiator,
the silicone or fluorine compound has a functional group capable of crosslinking with the polymerizable polymer,
3. The pressure-sensitive adhesive tape according to claim 2, wherein the (meth)acrylic polymer is a polymerizable polymer of an alkyl (meth)acrylate type having a radically polymerizable unsaturated bond in the molecule.
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