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JP7029267B2 - 感光性樹脂組成物及び樹脂膜付き基板の製造方法 - Google Patents

感光性樹脂組成物及び樹脂膜付き基板の製造方法 Download PDF

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Publication number
JP7029267B2
JP7029267B2 JP2017196326A JP2017196326A JP7029267B2 JP 7029267 B2 JP7029267 B2 JP 7029267B2 JP 2017196326 A JP2017196326 A JP 2017196326A JP 2017196326 A JP2017196326 A JP 2017196326A JP 7029267 B2 JP7029267 B2 JP 7029267B2
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resin composition
acid
photosensitive resin
substrate
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JP2019070720A (ja
Inventor
悠樹 小野
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Nippon Steel Chemical and Materials Co Ltd
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Nippon Steel Chemical and Materials Co Ltd
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Priority to JP2017196326A priority Critical patent/JP7029267B2/ja
Priority to CN202410789134.XA priority patent/CN118534725A/zh
Priority to CN201811122358.6A priority patent/CN109634056B/zh
Priority to TW111137496A priority patent/TWI877523B/zh
Priority to KR1020180116089A priority patent/KR102646464B1/ko
Priority to TW107134420A priority patent/TWI782104B/zh
Publication of JP2019070720A publication Critical patent/JP2019070720A/ja
Priority to JP2022023782A priority patent/JP7510449B2/ja
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Publication of JP7029267B2 publication Critical patent/JP7029267B2/ja
Priority to KR1020240031309A priority patent/KR20240032813A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Optical Filters (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2017196326A 2017-10-06 2017-10-06 感光性樹脂組成物及び樹脂膜付き基板の製造方法 Active JP7029267B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2017196326A JP7029267B2 (ja) 2017-10-06 2017-10-06 感光性樹脂組成物及び樹脂膜付き基板の製造方法
CN201811122358.6A CN109634056B (zh) 2017-10-06 2018-09-26 感光性树脂组合物及附带树脂膜的基板的制造方法
CN202410789134.XA CN118534725A (zh) 2017-10-06 2018-09-26 感光性树脂组合物及附带树脂膜的基板的制造方法
KR1020180116089A KR102646464B1 (ko) 2017-10-06 2018-09-28 감광성 수지 조성물 및 수지막이 형성된 기판의 제조 방법
TW111137496A TWI877523B (zh) 2017-10-06 2018-09-28 感光性樹脂組成物及附帶樹脂膜的基板的製造方法
TW107134420A TWI782104B (zh) 2017-10-06 2018-09-28 感光性樹脂組成物及附帶樹脂膜的基板的製造方法
JP2022023782A JP7510449B2 (ja) 2017-10-06 2022-02-18 感光性樹脂組成物及び樹脂膜付き基板の製造方法
KR1020240031309A KR20240032813A (ko) 2017-10-06 2024-03-05 감광성 수지 조성물 및 수지막이 형성된 기판의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017196326A JP7029267B2 (ja) 2017-10-06 2017-10-06 感光性樹脂組成物及び樹脂膜付き基板の製造方法

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JP2019070720A JP2019070720A (ja) 2019-05-09
JP7029267B2 true JP7029267B2 (ja) 2022-03-03

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JP2017196326A Active JP7029267B2 (ja) 2017-10-06 2017-10-06 感光性樹脂組成物及び樹脂膜付き基板の製造方法
JP2022023782A Active JP7510449B2 (ja) 2017-10-06 2022-02-18 感光性樹脂組成物及び樹脂膜付き基板の製造方法

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JP (2) JP7029267B2 (zh)
KR (2) KR102646464B1 (zh)
CN (2) CN109634056B (zh)
TW (1) TWI782104B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190106906A (ko) * 2019-08-29 2019-09-18 엘지전자 주식회사 툴 체인저 및 이를 포함하는 툴 체인지 시스템

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Publication number Priority date Publication date Assignee Title
JP7619265B2 (ja) 2019-08-07 2025-01-22 日産化学株式会社 樹脂組成物
JP7628510B2 (ja) * 2020-01-30 2025-02-10 株式会社ダイセル 成形体ならびにその前駆体、製造方法および用途
JP7525295B2 (ja) 2020-04-30 2024-07-30 サカタインクス株式会社 ブラックマトリックス用顔料分散組成物、ブラックマトリックス用レジスト組成物、及び、ブラックマトリックス
KR20230007429A (ko) * 2020-05-19 2023-01-12 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 중합성 불포화기 함유 알칼리 가용성 수지 및 그 제조 방법, 및 감광성 수지 조성물 및 그 경화물
JPWO2022019309A1 (zh) * 2020-07-21 2022-01-27
JPWO2022030045A1 (zh) * 2020-08-04 2022-02-10
CN115145114A (zh) 2021-03-31 2022-10-04 日铁化学材料株式会社 遮光膜用感光性树脂组合物以及使用其的遮光膜、彩色滤光片及显示装置
KR20230099670A (ko) 2021-12-27 2023-07-04 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 감광성 수지 조성물 및 그것을 사용한 경화막, 컬러 필터 및 표시 장치
KR20230099669A (ko) 2021-12-27 2023-07-04 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 레지스트 조성물, 그것을 사용한 경화물 및 매트릭스 패턴, 착색 분산액, 및 레지스트 조성물의 제조 방법
KR20230103406A (ko) * 2021-12-31 2023-07-07 주식회사 동진쎄미켐 감광성 수지 조성물, 표시장치 및 패턴 형성 방법
JP2024145891A (ja) 2023-03-31 2024-10-15 日鉄ケミカル＆マテリアル株式会社 感光性樹脂組成物、感光性樹脂組成物を硬化してなる硬化膜、硬化膜付き基板及び硬化膜付き基板の製造方法

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JP2011070108A (ja) 2009-09-28 2011-04-07 Tamura Seisakusho Co Ltd 感光性樹脂組成物、プリント配線板用のソルダーレジスト組成物およびプリント配線板
JP2014106458A (ja) 2012-11-29 2014-06-09 Hitachi Chemical Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
JP2016065942A (ja) 2014-09-24 2016-04-28 太陽インキ製造株式会社 硬化性組成物、ドライフィルム、硬化物、プリント配線板およびプリント配線板の製造方法
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JP2017138344A (ja) 2016-02-01 2017-08-10 東洋インキＳｃホールディングス株式会社 カラーフィルタ用感光性着色組成物、カラーフィルタ、及びカラーフィルタの製造方法

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JP6758070B2 (ja) 2016-03-31 2020-09-23 日鉄ケミカル＆マテリアル株式会社 遮光膜用感光性樹脂組成物、これを硬化させた遮光膜を備えたディスプレイ用基板、及びディスプレイ用基板の製造方法
JP6542285B2 (ja) * 2017-03-30 2019-07-10 株式会社タムラ製作所 感光性樹脂組成物およびプリント配線基板
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Publication number Priority date Publication date Assignee Title
JP2011070108A (ja) 2009-09-28 2011-04-07 Tamura Seisakusho Co Ltd 感光性樹脂組成物、プリント配線板用のソルダーレジスト組成物およびプリント配線板
JP2014106458A (ja) 2012-11-29 2014-06-09 Hitachi Chemical Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
JP2016065942A (ja) 2014-09-24 2016-04-28 太陽インキ製造株式会社 硬化性組成物、ドライフィルム、硬化物、プリント配線板およびプリント配線板の製造方法
WO2017057143A1 (ja) 2015-09-30 2017-04-06 東レ株式会社 ネガ型着色感光性樹脂組成物、硬化膜、素子および表示装置
JP2017138344A (ja) 2016-02-01 2017-08-10 東洋インキＳｃホールディングス株式会社 カラーフィルタ用感光性着色組成物、カラーフィルタ、及びカラーフィルタの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190106906A (ko) * 2019-08-29 2019-09-18 엘지전자 주식회사 툴 체인저 및 이를 포함하는 툴 체인지 시스템

Also Published As

Publication number Publication date
TW202302682A (zh) 2023-01-16
TW201915040A (zh) 2019-04-16
KR20240032813A (ko) 2024-03-12
KR20190039858A (ko) 2019-04-16
CN118534725A (zh) 2024-08-23
JP7510449B2 (ja) 2024-07-03
JP2022063336A (ja) 2022-04-21
KR102646464B1 (ko) 2024-03-11
JP2019070720A (ja) 2019-05-09
CN109634056B (zh) 2024-07-09
CN109634056A (zh) 2019-04-16
TWI782104B (zh) 2022-11-01

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