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JP5808221B2 - テトラアルキルアンモニウム塩溶液の製造方法 - Google Patents

テトラアルキルアンモニウム塩溶液の製造方法 Download PDF

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Publication number
JP5808221B2
JP5808221B2 JP2011237128A JP2011237128A JP5808221B2 JP 5808221 B2 JP5808221 B2 JP 5808221B2 JP 2011237128 A JP2011237128 A JP 2011237128A JP 2011237128 A JP2011237128 A JP 2011237128A JP 5808221 B2 JP5808221 B2 JP 5808221B2
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JP
Japan
Prior art keywords
tetraalkylammonium
ions
exchange resin
cation exchange
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2011237128A
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English (en)
Japanese (ja)
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JP2013095673A (ja
Inventor
渡邉 淳
淳 渡邉
直幸 梅津
直幸 梅津
喜文 山下
喜文 山下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuyama Corp
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Priority to JP2011237128A priority Critical patent/JP5808221B2/ja
Priority to CN201280038087.0A priority patent/CN103732573B/zh
Priority to KR1020147005045A priority patent/KR101987409B1/ko
Priority to TW101139636A priority patent/TWI549753B/zh
Priority to PCT/JP2012/077779 priority patent/WO2013062100A1/ja
Publication of JP2013095673A publication Critical patent/JP2013095673A/ja
Application granted granted Critical
Publication of JP5808221B2 publication Critical patent/JP5808221B2/ja
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J39/00Cation exchange; Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
    • B01J39/04Processes using organic exchangers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J49/00Regeneration or reactivation of ion-exchangers; Apparatus therefor
    • B01J49/05Regeneration or reactivation of ion-exchangers; Apparatus therefor of fixed beds
    • B01J49/06Regeneration or reactivation of ion-exchangers; Apparatus therefor of fixed beds containing cationic exchangers
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/42Treatment of water, waste water, or sewage by ion-exchange
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C209/00Preparation of compounds containing amino groups bound to a carbon skeleton
    • C07C209/82Purification; Separation; Stabilisation; Use of additives
    • C07C209/84Purification
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/42Treatment of water, waste water, or sewage by ion-exchange
    • C02F2001/425Treatment of water, waste water, or sewage by ion-exchange using cation exchangers
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00Nature of the contaminant
    • C02F2101/30Organic compounds
    • C02F2101/38Organic compounds containing nitrogen
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/40Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture or use of photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/322Aqueous alkaline compositions
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • G03F7/422Stripping or agents therefor using liquids only
    • G03F7/425Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2011237128A 2011-10-28 2011-10-28 テトラアルキルアンモニウム塩溶液の製造方法 Active JP5808221B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2011237128A JP5808221B2 (ja) 2011-10-28 2011-10-28 テトラアルキルアンモニウム塩溶液の製造方法
CN201280038087.0A CN103732573B (zh) 2011-10-28 2012-10-26 四烷基铵盐溶液的制造方法
KR1020147005045A KR101987409B1 (ko) 2011-10-28 2012-10-26 테트라알킬암모늄염 용액의 제조 방법
TW101139636A TWI549753B (zh) 2011-10-28 2012-10-26 Tetraalkylammonium salt solution
PCT/JP2012/077779 WO2013062100A1 (ja) 2011-10-28 2012-10-26 テトラアルキルアンモニウム塩溶液の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011237128A JP5808221B2 (ja) 2011-10-28 2011-10-28 テトラアルキルアンモニウム塩溶液の製造方法

Publications (2)

Publication Number Publication Date
JP2013095673A JP2013095673A (ja) 2013-05-20
JP5808221B2 true JP5808221B2 (ja) 2015-11-10

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011237128A Active JP5808221B2 (ja) 2011-10-28 2011-10-28 テトラアルキルアンモニウム塩溶液の製造方法

Country Status (5)

Country Link
JP (1) JP5808221B2 (zh)
KR (1) KR101987409B1 (zh)
CN (1) CN103732573B (zh)
TW (1) TWI549753B (zh)
WO (1) WO2013062100A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108623052A (zh) * 2017-03-22 2018-10-09 三福化工股份有限公司 显影废液的二次废液中四甲基氢氧化铵的回收方法
CN112752746B (zh) * 2018-09-28 2023-07-28 株式会社德山 氢氧化季铵的有机溶剂溶液的制造方法
CN112999694A (zh) * 2021-03-24 2021-06-22 沧州信联化工有限公司 一种四甲基氢氧化铵加工用原料精制装置及其使用方法
CN114920658B (zh) * 2022-06-28 2024-05-03 大连理工大学盘锦产业技术研究院 一种离子交换树脂纯化氢氧化胆碱的方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3109525B2 (ja) 1990-12-27 2000-11-20 クロリンエンジニアズ株式会社 水酸化テトラアルキルアンモニムの再生方法
JP3110513B2 (ja) 1991-10-16 2000-11-20 クロリンエンジニアズ株式会社 水酸化テトラアルキルアンモニムの再生方法
DE69307659T2 (de) * 1992-11-10 1997-09-04 Tama Chemicals Co Ltd Methode zur Behandlung von organischem quaternärem Ammonium-hydroxyd enthaltendem Abwasser
JP2688009B2 (ja) 1992-11-26 1997-12-08 多摩化学工業株式会社 廃液から水酸化有機第四アンモニウムを回収する方法
JP3216998B2 (ja) 1996-08-12 2001-10-09 昭和電工株式会社 現像廃液からの水酸化テトラアルキルアンモニウムの精製回収方法
US5968338A (en) 1998-01-20 1999-10-19 Sachem, Inc. Process for recovering onium hydroxides from solutions containing onium compounds
US6508940B1 (en) * 2000-10-20 2003-01-21 Sachem, Inc. Process for recovering onium hydroxides from solutions containing onium compounds
JP2003340449A (ja) * 2002-05-27 2003-12-02 Babcock Hitachi Kk テトラアルキルアンモニウムヒドロキシド含有廃水の処理方法
JP2004066102A (ja) 2002-08-06 2004-03-04 Babcock Hitachi Kk 廃液処理方法及び装置
JP4385407B2 (ja) * 2007-04-05 2009-12-16 オルガノ株式会社 テトラアルキルアンモニウムイオン含有液の処理方法
JP5483958B2 (ja) * 2009-06-03 2014-05-07 株式会社トクヤマ 水酸化テトラアルキルアンモニウムの製造方法
JP2011125770A (ja) * 2009-12-15 2011-06-30 Tokuyama Corp 処理廃液の再利用方法
JP5887279B2 (ja) * 2010-12-28 2016-03-16 株式会社トクヤマ テトラアルキルアンモニウム塩の製造方法、及びそれを原料とした水酸化テトラアルキルアンモニウムの製造方法

Also Published As

Publication number Publication date
TWI549753B (zh) 2016-09-21
CN103732573B (zh) 2016-05-18
JP2013095673A (ja) 2013-05-20
CN103732573A (zh) 2014-04-16
TW201323089A (zh) 2013-06-16
WO2013062100A1 (ja) 2013-05-02
KR101987409B1 (ko) 2019-06-10
KR20140079762A (ko) 2014-06-27

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