JP4148900B2 - 増幅反応におけるシリカ物質の使用 - Google Patents
増幅反応におけるシリカ物質の使用 Download PDFInfo
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- JP4148900B2 JP4148900B2 JP2003558203A JP2003558203A JP4148900B2 JP 4148900 B2 JP4148900 B2 JP 4148900B2 JP 2003558203 A JP2003558203 A JP 2003558203A JP 2003558203 A JP2003558203 A JP 2003558203A JP 4148900 B2 JP4148900 B2 JP 4148900B2
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Description
発明の分野
本発明は、磁気ガラス粒子などの、非改質シリカ表面を有する物質を用いた核酸の単離、続いて行う非改質シリカ表面を有する物質の存在下での標的核酸の増幅のための方法に関する。該方法は、好ましくは自動化プロセスとして、好ましくは高生産性形式で行われる。該方法は、好ましくは診断において使用される。
多くの生物学的物質、特に核酸は、その天然環境からの単離という点において、特別な課題を提示する。それらは、一方では、しばしば非常に低濃度で存在し、他方において、しばしば、例えば細胞溶解後の多くの他の固形溶解物質の存在下で見出される。これは、特に、特定の被検体、例えば核酸または特定の被検体の性質の検出を可能にしたり、診断および研究開発での生物学的解析の分野において重要な役割を果たす生物学的特異的アッセイにおける単離または測定を困難にする。
本発明は、必要な操作工程を減らす一方、反応効率および検出感度の改善を提供する、試料調製後、核酸増幅を行なう方法を提供する。本発明の方法では、試料調製は、試料中に含まれる核酸を捕捉するための、好ましくは磁気ガラス粒子からなる非改質ガラス表面を用いて行ない、得られたガラス- 核酸複合体を増幅反応試薬と直接合わせ、増幅条件に供する。本発明の重要な局面は、増幅をガラス粒子の存在下で行なうことである。
用語「非改質」は、さらなる化学的修飾がないこと、すなわち、他の化学基が共有結合または非共有結合により結合されていないことを意味するものとする。用語「非改質シリカ表面」は、核酸結合のための媒介物質として機能する他の化学基が共有結合または非共有結合により結合されていないことを意味するものとし、この場合、核酸は媒介物質に結合するが、シリカ表面自体には結合しない。したがって、核酸は、例えば高塩濃度の存在下で、水素結合および他の原子間力により直接「非改質シリカ表面」に結合することができる。改質表面の一例は、配列特異的な様式で核酸分子に結合するオリゴヌクレオチドが結合したシリカ表面である。改質シリカ表面の別の例は、ビオチン化DNA 分子に結合するストレプトアビジンでコートされたシリカ表面である。
(a) ゾル中で磁気物体を懸濁する工程、
(b) ゾルを加水分解して、ゲルで磁気物体を覆う工程、
(c) ゲルで覆われた磁気物体を二ノズル噴霧乾燥機において噴霧乾燥する工程、および
(d) 噴霧乾燥粉体を焼結して、磁気物体を覆うゲルからガラスを形成する工程、
を含む。
からなるCERAC により製造される; CERAC: P.O. Box 1178, Milwaukee, Wisconsin 53201-1178 USA; Article-No. I-2012)。磁気物体がゲルで覆われた後、このスラリーを二液ノズルを介して噴霧することにより粉体が作製される。適切な噴霧乾燥システムは、Nubilosa Molekularzerstaeubung, Ladisch GmbH & Co. KG, Konstanz, Germanyにより製造され、例えば''Labor-Zerstaeubungstrockner (Typ LTK)'' またはBuechi AG, Uster, Switzerland 、例えばMini Spray Dryer (Type B-191) である。磁性コア対ガラス殻の直径比率が1 対10未満、好ましくは1:10〜1:1000であるために、取り込まれる磁性コアまたはその不活性キャリアの幾何学および数は、粒子の形状および大きさを決定しないが、製造条件、特に噴霧乾燥期間の条件がそれらを決定する。換言すれば、噴霧乾燥手順の間の圧力の選択、入口温度、出口温度および流速は、サイズ分布、ガラス小滴の形状を決定する自由度であり、それによりMGP を改変する。したがって、噴霧乾燥システムのノズルが加熱される。入口温度は、120 ℃〜500 ℃、好ましくは170 ℃〜230 ℃または150 ℃〜230 ℃、最も好ましくは150 ℃〜200 ℃または190 ℃〜210 ℃あるいは200 ℃または200 ℃よりわずかに低い。出口温度は、ゾルの沸点、それにより溶媒に依存し、溶媒の沸点を超えるか、等しいか、またはわずかに下、すなわち10℃未満でありうる。エタノールが溶媒として使用される場合、それは50℃〜300 ℃、好ましくは70℃〜150 ℃、最も好ましくは80℃〜110 ℃である。最適温度は、90℃〜100 ℃である。ノズル圧力は、3barより大きく、好ましくは4 〜6barに調節される。当業者は、正確なパラメーターが、使用される噴霧乾燥システムに依存するという事実を認識するであろう。しかしながら、当業者は、本発明の教示を任意の他の噴霧乾燥システムに移動し、本発明の開示を考慮に入れることによりパラメーターを見出しうる。Masters: Spray Drying Handbook, Fifth Edition, John Wiley & Sons (1991) New Yorkに記載の式は、どのパラメーターが別の設定に対して選択されなければならないのかを見出すための方法を当業者に導きうる。好ましくは、当業者は、彼の噴霧乾燥システムのマニュアルについて質問するか、 または噴霧乾燥システム製造業者の技術サービスと連絡を取るであろう。
実施例1
Taqman(登録商標)PCR における磁気ガラス粒子(MGP) の影響
この実施例は、増幅効率における磁気ガラス粒子(MGP) の効果を測定するために行った実験を記載する。以下に記載のように、Taqman(登録商標)PCR プロトコルを用いて増幅を行なった。
N i =N o ×(1+E)i
式中、N i =i 番目のサイクルの完了時の標的分子の数、N o =反応の開始時の標的分子の数、およびE = 増幅効率(0=<E =<1)。増幅のこの幾何学的増殖段階の間、特定の閾値(CT ) に達するのに必要なサイクルの数は、(1+E)の対数に反比例する。したがって、C T 値は、反応間の比較を可能にする反応効率の指標を表わす。より少ないサイクルで反応が閾値に達したことを意味するC T 値における減少は、全体的な感度における増加を示す。
以下に示した反応成分を用いて反応を行った。各試験を3 倍アッセイで行った。
試験1:25.75 μl Mastermix 成分R1
24.25 μl Mastermix 成分R2
50μl HCV 標準物質( ポリA 溶液で希釈)
24.25 μl MasterMix 成分B
50μl HCV 標準物質( ポリA 溶液で希釈)
6mg 磁気ガラス粒子(''Cerac'' MGP、上記)
(Cy5-) CGG TGT ACT CAC CG(FAM) TTC CGC AGA CCA CTA TG
(Cy5-) TGG ACT CAG TCC T(HEX)T GGT CAT CTC ACC TTC T
CGA TCA TCT CAG AAC ATT CTT AGC GTT TTG TTC TTG
TGT ATG ATC G
以下の温度プロフィールを使用して増幅を行った:
反応前インキュベーション 45℃, 10分
初期変性 94℃, 30秒
逆転写 58℃, 30分
5 サイクル 95℃, 20秒; 59℃, 50秒
55サイクル 91℃, 15秒, 52℃, 50秒
反応の結果を、図1 および2 に提供する。各反応でのC T 値を示す。C T 値を比較すると、反応において、磁気ガラス粒子の存在下で行った反応は、磁気ガラス粒子無しで行った比較反応より早く閾値に達することが明らかである。これらの結果は、磁気ガラス粒子の存在下で増幅を行うことにより、反応効率において驚くべき増加が得られたことを説明する。
Claims (12)
- a)非改質シリカ表面を有する磁気ガラス粒子を含んでなる物質を、標的核酸を含有する生物学的試料に添加し、該標的核酸を該物質に結合させる工程、
b)該試料から該物質を分離する工程、および
c)該物質の存在下で該標的核酸を増幅する工程、ここで該増幅工程がTaqman(登録商標)PCRを利用したリアルタイムPCRを用いて行われる
を含み、ここで、該磁気ガラス粒子がゾルゲル法により製造される、
標的核酸を含有する生物学的試料からの該標的核酸の精製および増幅のための方法。 - (a) 非改質シリカ表面を有する磁気ガラス粒子を含んでなる物質を試料に添加する工程、
(b) 該試料から該物質を分離する工程、
(c) 該物質から標的核酸を溶出する工程、および
(d) 該物質の存在下で該標的核酸を増幅する工程、ここで該増幅工程がTaqman(登録商標)PCRを利用したリアルタイムPCRを用いて行われる
を含み、ここで、該磁気ガラス粒子がゾルゲル法により製造される、
試料中の標的核酸の増幅方法。 - 前記標的核酸がRNA またはDNA である請求項1記載の方法。
- 前記非改質シリカ表面を有する磁気ガラス粒子を含んでなる物質が、標的核酸の増幅中および増幅された標的核酸の検出中に存在する、請求項1記載の方法。
- 前記増幅された標的核酸が、前記増幅中に検出される、請求項4記載の方法。
- 前記物質が、非改質ガラス表面を有するガラスビーズを含んでなる、請求項1記載の方法。
- 前記ゾルゲル法が、
(a) ゾル中に磁気物体を懸濁する工程、
(b) ゾルを加水分解して該磁気物体をゲルで被覆する工程、
(c) ゲルで被覆された磁気物体を二ノズル噴霧乾燥機で噴霧乾燥する工程、および
(d) 噴霧乾燥粉体を焼結してゲル被覆磁気物体由来のガラスを形成する工程
を含む、請求項1記載の方法。 - 二ノズル噴霧乾燥機の供給口温度が120 ℃〜500 ℃の間であり、排出口温度がゾルの沸点に従って選択され、噴霧圧が4〜6バールの間である、請求項7記載の方法。
- 3mg/ml(重量/ 体積)の磁気ガラス粒子のイソプロパノール懸濁液の沈降半減期が6分より長い、請求項8記載の方法。
- 磁気ガラス粒子が0.5 μm 〜5μm の間の平均直径を有する請求項8記載の方法。
- 非改質ガラス表面を有する磁気ガラス粒子が、5〜500nm の間の直径を有する磁気物体を含む、請求項8記載の方法。
- 非改質ガラス表面を有する磁気ガラス粒子が、23nmの平均直径を有する磁気物体を含む、請求項8記載の方法。
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TWI694146B (zh) * | 2016-02-02 | 2020-05-21 | 日商美之賀美蒂股份有限公司 | 前處理方法及用於其之核酸萃取套組 |
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CN111961709A (zh) * | 2020-01-21 | 2020-11-20 | 上海酷乐生物科技有限公司 | 一种用于口腔拭子直接荧光pcr扩增的试剂和试剂盒 |
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- 2003-01-04 DK DK03729220T patent/DK1466018T3/da active
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- 2003-01-04 EP EP03729220.8A patent/EP1466018B2/en not_active Expired - Lifetime
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- 2003-01-04 AU AU2003235767A patent/AU2003235767A1/en not_active Abandoned
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AU2003235767A1 (en) | 2003-07-24 |
WO2003057910A3 (en) | 2004-03-25 |
ATE374837T1 (de) | 2007-10-15 |
US20040014070A1 (en) | 2004-01-22 |
DE60316660D1 (de) | 2007-11-15 |
WO2003057910A2 (en) | 2003-07-17 |
ES2294287T5 (es) | 2015-10-27 |
ES2294287T3 (es) | 2008-04-01 |
DE60316660T3 (de) | 2016-01-28 |
EP1466018B2 (en) | 2015-08-12 |
DE60316660T2 (de) | 2008-07-24 |
DK1466018T3 (da) | 2008-02-04 |
EP1466018B1 (en) | 2007-10-03 |
US8026068B2 (en) | 2011-09-27 |
JP2005514036A (ja) | 2005-05-19 |
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