JP3154492U - Exposure equipment - Google Patents

Abstract

An exposure apparatus is provided that performs an exposure operation on a specific area of an exposure platform, is less likely to cause a thermal phenomenon, and further reduces equipment volume and cost. In the exposure apparatus, a first linear guide is installed mainly on two opposite sides of the exposure platform, and a second linear guide is installed between the two first linear guides. A light source unit 50 is installed on the second linear guide to emit an exposure light source that irradiates the exposure platform, and a first drive unit 61 is installed to position the second linear guide along the first linear guide. The second drive unit 62 is moved to move the position of the light source unit 50 along the second linear guide 42, the exposure light source is applied to the exposure platform depositing area, and the workpiece on the exposure platform is exposed. Develop. [Selection] Figure 3

Description

  The present invention relates to an exposure apparatus, and more particularly, to an exposure apparatus structure that performs an exposure operation on a specific area of an exposure platform and is less likely to cause a thermal phenomenon, and further reduces equipment volume and cost.

When a general printed circuit board or semiconductor wafer is subjected to an exposure and development process, first, a layer of photoresist is applied to the surface of the workpiece, and then a light source is irradiated to display the original circuit layout diagram on the surface of the workpiece. Projected onto the layer, the chemistry of the photoresist layer changes upon illumination of the light source. Thereafter, the photoresist irradiated with the light source with the photoresist remover or the unexposed photoresist is removed from the surface of the workpiece to correspond to the original circuit layout.

Among them, the basic structure of the exposure apparatus for performing the exposure development process is as shown in FIG. 1. The exposure chamber 12 mainly composed of the housing 11, the exposure platform 13 to be sent to the exposure chamber 12, and the exposure chamber 12. At least one light source unit 14 is provided in the interior of the exposure platform 13 so as to be opposed to the upper or lower position. Further, as shown in FIG. 2, the exposure platform 13 is a transparent platform on which the workpiece 20 and the original (not shown) are placed, and the entire exposure platform 13 is advanced to the exposure chamber 12 by a set of linear guides 15.

The exposure platform 13 moves to a fixed position of the exposure chamber 12 along with the workpiece and the original, and then generally stays within the exposure chamber 12 for a certain period of time (not uniform for about 3 to 5 seconds). The exposure light source unit 14 is irradiated with the exposure light source, and after completion of the exposure, the workpiece is sent out from the exposure platform 13.

Many commonly known exposure apparatuses employ an exposure operation in which the exposure platform 13 stays inside the exposure chamber 12. For this reason, a large amount of row arrangement type bulbs 141 are installed in the light source unit 14, the parallel light sources of the entire exposure platform 13 are covered, and the mass bulbs 141 are used at the same time. Cause a phenomenon. Therefore, since the heat dissipation of a cooling system must be installed elsewhere, the cost increases.

Another known exposure apparatus is a compound eye apparatus that corrects the size of the parallel light and the area required for the light beam of the bulb. The operating method is to pass the light beam through the light source bulb with an elliptical mirror, uniform the light beam toward the compound eye device with a set of first reflectors, and then change the light beam in the forward direction with a set of second reflectors. Finally, a set of convex lenses is used to correct the light beam to the required parallel light and the size of the area, and the necessary exposure light source is projected to reduce the number of light bulbs.

Such a design not only makes the structure of the entire exposure apparatus complicated, but also makes the volume of the entire exposure apparatus relatively large. Further, similarly, a method is employed in which the exposure light source is covered with respect to the workpiece and the exposure development is performed on the entire exposure platform.

    The problem to be solved is that in the actual exposure development process, the exposure area of all the workpieces does not correspond to all the exposure platforms, so it is not necessary to irradiate a part of the entire exposure platform with the exposure light source. . Therefore, an excessively unnecessary processing cost is required.

  In the present invention, first linear guides are mainly installed on two opposite sides of the exposure platform, and at least one second linear guide is installed between the two first linear guides. On the at least one second linear guide, a light source unit is installed to emit an exposure light source that irradiates the exposure platform, and a first drive unit is installed to position the second linear guide along the first linear guide. Move the second drive unit, move the light source unit along the second linear guide, place the exposure light source on the exposure area of the exposure platform, and perform exposure development on the workpiece on the exposure platform This is the main feature.

The exposure apparatus of the present invention has the following advantages.
1. The light source that produces the exposure effect may be a single light source and does not cover the large area of the entire exposure platform, so the number of light bulbs in the light source unit is greatly reduced, the volume of the entire exposure apparatus is relatively reduced, and the equipment Reduce costs.
2. When the exposure light source reaches the depositing process, the control circuit to be used lowers the thermal phenomenon of the exposure apparatus as a whole in order to increase the efficiency of the light source unit.
3. The exposure apparatus as a whole adjusts the stroke setting of the entire light source unit in accordance with the standard variation of the workpiece, thereby greatly improving the applicability and practicality of the exposure apparatus.
4. Since the light source unit passes only through the area of the exposure platform where exposure light source irradiation is necessary, unnecessary processing costs are not wasted.

It is a structure sectional view of a well-known exposure apparatus. It is an exposure platform external appearance three-dimensional view of a well-known exposure apparatus. 1 is an external perspective view of an exposure apparatus according to a first embodiment of the present invention. 1 is a side structural view of an exposure apparatus according to a first embodiment of the present invention. It is an exposure apparatus operation | movement instruction | indication figure of 1st Example of this invention. It is exposure apparatus operation | movement instruction | indication of 2nd Example of this invention. It is an exposure apparatus structure instruction | indication figure of 2nd Example of this invention. It is a structure instruction | indication figure of the light source unit of this invention. It is a three-dimensional external view of the exposure apparatus of the third embodiment of the present invention. It is an exposure apparatus external appearance three-dimensional view of 4th Example of this invention. It is exposure apparatus operation | movement instruction | indication of 4th Example of this invention.

The main object of the present invention is to provide an exposure apparatus structure that performs an exposure operation on a specific area of the exposure platform, does not cause a thermal phenomenon, and reduces the equipment volume and cost.

In order to achieve the above-described object, the exposure apparatus of the present invention mainly includes a first linear guide on each of two opposite sides of the exposure platform, and at least one second linear guide is provided with two first linear guides. A light source unit is installed on the at least one second linear guide and used to emit an exposure light source that is emitted toward the exposure platform by the light source unit.

Further, the first drive unit is installed and the second linear guide is moved along the first linear guide, and the second drive unit is installed and moved along the second linear guide to which the light source unit belongs. By moving the position along the second linear guide to which the light source unit belongs, and moving the second linear guide along the first linear guide, the exposure light source reaches the exposure area of the exposure platform, and the object on the exposure platform is covered. Exposure and development is performed on the workpiece.

As shown in FIGS. 3 and 4, the exposure apparatus of the present invention includes an exposure platform 30, two first linear guides 41, at least one second linear guide 42, at least one light source unit 50, and at least one first light guide unit. A drive unit 61 and at least one second drive unit 62 are included. Of which

The exposure platform 30 carries a workpiece and an original. The two first linear guides 41 are installed in parallel on the two-phase side of the exposure platform 30. The at least one second linear guide 42 is installed horizontally between the two first linear guides 41. The at least one light source unit 50 is installed on the at least one second linear guide 42, and each light source unit 50 includes a single light source 51 (which may be a light bulb or a light emitting diode) and irradiates the exposure platform 30. Used as an exposure light source. The light source unit 50 may be at least one light source 51, and a plurality of light sources 51 may form an irradiation effect as shown in FIG.

The at least one first drive unit 61 is used to move the second linear guide 42 along the first linear guide 41. The at least one second drive unit 62 is used to move each light source unit 50 along the second linear guide 42 to which it belongs. As shown in FIG. 5, the entire exposure apparatus sets the moving stroke and moving speed of the at least one second linear guide 42 and the at least one light source unit 50 according to the control circuit to be used. If a plurality of light source units 50 are installed in the entire exposure apparatus, as shown in FIG. 7, the control circuit also has a gap distance a between the light source units 50 on each second linear guide 42 and each light source unit 50. The entire exposure apparatus is not limited to a work platform of a specific size by controlling the angle of the upper light source 51.

When the exposure apparatus of the present invention is used, the workpiece 20 and the original are fixed on the exposure platform 30 (or the workpiece and the original are transported to a fixed point on the exposure platform by other transport devices). Next, the light source unit 50 is moved to the second linear guide 42 and the second linear guide 42 is moved along the first linear guide 41 so that the exposure light source emitted by the light source unit 50 is surely exposed. Exposure to the work area 20 on the exposure platform 30 is further performed by exposure to the deposit area of the platform 30.

When the present invention shown in FIG. 6 is concretely implemented, a plurality of sets of second linear guides 42 and light source units 50 between the two first linear guides 41 and a plurality of sets of second linear guides individually. 42 and the 1st, 2nd drive units 61 and 62 which move the position of each light source unit 50 are installed. The time required for the exposure and development of the workpiece 20 is shortened by the division work of the plurality of sets of the second linear guide 42 and the light source unit 50, or the exposure and development are simultaneously performed on the plurality of workpieces.

Further, the entire exposure apparatus is provided with power failure switches 70 at both ends of at least one first linear guide 41 and both ends of each second linear guide 42, and each second linear guide 42 and each light source unit 50 exceed the safe range. Therefore, the related parts are prevented from colliding with the second linear guide 42 or the light source unit 50 and being broken.

FIG. 9 shows another embodiment of the present invention. Similarly, the exposure platform 30, two first linear guides 41, at least one second linear guide 42, at least one light source unit 50, at least one first. A drive unit 61 and at least one second drive unit 62 are installed. A third linear guide 43 is installed on the second linear guide 42, the at least one light source unit 50 is installed on the third linear guide 43, and the at least one light source unit 50 is moved by the first linear guide 41. It moves in the first direction (X direction), moves in the second direction (Y direction) by the second linear guide 42, and moves in the third direction (Z direction) by the third linear guide 43. Furthermore, the exposure platform 30 is in the form of a single plane as shown in the figure. As shown in FIG. 10, the exposure platform 30 is provided with a plurality of support portions 31 and air-permeable portions 32, and the support portion 31 is installed near the first linear guide 41 to install the workpiece 20. Used for

The translucent part 32 is installed between the two first linear guides 41, and the support parts 31 and the air permeable parts 32 are arranged in the vertical direction. When the workpiece 20 is installed and one of the workpieces 20 is processed and output, in the embodiment shown in FIG. The light source unit 50 is moved downward to the lower workpiece 20 by the third linear guide 43 to perform processing, and the processing efficiency is greatly improved.

Specifically, in the present invention, the light source that generates the exposure effect may be a single light source, and the light source is not spread over a large area of the entire exposure platform. The volume of the entire apparatus is reduced, and the equipment cost is relatively reduced. Furthermore, the control circuit to be used increases the efficiency of the light source unit when the exposure light source reaches a predetermined location, and thus reduces the thermal phenomenon of the entire exposure apparatus.

In particular, the entire exposure apparatus is changed according to the workpiece standard, and the stroke setting of the light source unit is adjusted in a timely manner, thereby greatly improving the applicability and practicality of the exposure apparatus. In addition, since the light source unit passes only in an area where the exposure light source of the exposure platform needs to be irradiated, it is not necessary to waste unnecessary processing costs.

As described above, the present invention provides an executable exposure apparatus and claims a utility model. The technical contents and technical features of the present invention are as described above. However, those skilled in the field may make substitutions and modifications that do not depart from the creative spirit of the present invention based on the presentation of the present invention. . Therefore, the scope of protection of the present invention is not limited to that shown in the examples, but includes various substitutions and modifications that do not depart from the present invention, and includes the following claims.

DESCRIPTION OF SYMBOLS 11 Housing | casing 12 Exposure chamber 13 Exposure platform 14 Light source unit 141 Light bulb 15 Linear guide 20 Work piece 30 Exposure platform 31 Support part 32 Air-permeable part 41 First linear guide 42 Second linear guide 43 Third linear guide 50 Light source unit 51 Light bulb 61 First drive unit 62 Second drive unit 70 Power failure switch

Claims (6)

In the exposure apparatus,
An exposure platform on which workpieces and originals are placed;
Two first linear guides arranged in parallel on each of two relative sides of the exposure platform;
At least one second linear guide horizontally installed between the two first linear guides;
At least one light source unit installed on the at least one second linear guide and irradiating an exposure light source toward the exposure platform;
At least one first drive unit that moves the second linear guide along the first linear guide;
Each light source unit includes at least one second drive unit that moves along a corresponding second linear guide;
An exposure apparatus, wherein a moving stroke and a moving speed of the at least one second linear guide and the at least one light source unit are set by a control circuit to be used.   In the exposure apparatus, a plurality of sets of second linear guides and light source units are installed between the two first linear guides, and a plurality of sets of second linear guides and light source units are individually moved in position. 2. An exposure apparatus according to claim 1, wherein first and second drive units are installed.   3. The exposure apparatus according to claim 1, wherein the exposure apparatus includes at least one first linear guide at both ends and a power failure switch at each second linear guide at both ends.   3. The exposure apparatus according to claim 1, wherein the exposure apparatus includes a plurality of light source units, and the control circuit controls a gap distance between the light source units on the second linear guides.   The second linear guide is provided with a third linear guide, the at least one light source unit is installed on the third linear guide, the at least one light source unit is moved in the X direction by the first linear guide, 3. An exposure apparatus according to claim 1, wherein the exposure apparatus moves in the Y direction by two linear guides and moves in the Z direction by a third linear guide.   The exposure platform is provided with a plurality of support portions and a transparent portion, the support portion is provided near a first linear guide used for installing a workpiece, and the light-transmitting portion is provided with two first transparent portions. 6. The exposure apparatus according to claim 5, wherein the exposure apparatus is installed between linear guides, the support portions and the air-permeable portions are arranged vertically, and a plurality of workpieces are respectively installed by the upper and lower support portions.