CN201402366Y - Exposure machine - Google Patents
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- CN201402366Y CN201402366Y CN2009201522573U CN200920152257U CN201402366Y CN 201402366 Y CN201402366 Y CN 201402366Y CN 2009201522573 U CN2009201522573 U CN 2009201522573U CN 200920152257 U CN200920152257 U CN 200920152257U CN 201402366 Y CN201402366 Y CN 201402366Y
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Abstract
Description
技术领域 technical field
本实用新型有关一种曝光机,尤指一种较不会产生聚热现象,且相对可以降低设备体积及成本的曝光机结构。The utility model relates to an exposure machine, in particular to an exposure machine structure that does not generate heat accumulation and can relatively reduce equipment volume and cost.
背景技术 Background technique
按,一般印刷电路板或半导体芯片在进行曝光显影制程时,先在被加工物表面上涂上一层光阻,再藉由光源的照射将原稿上的电路布线图案映像至被加工物表面的光阻层上,以使光阻层的化学性质因光源的照射而产生变化,然后再利用去光阻剂来将被光源照射过的光阻或未经曝光的光阻自被加工物表面去除,以形成对应于原稿的线路布局。Press, when the general printed circuit board or semiconductor chip is exposed and developed, a layer of photoresist is first coated on the surface of the processed object, and then the circuit wiring pattern on the original is mapped to the surface of the processed object by the irradiation of the light source. On the photoresist layer, so that the chemical properties of the photoresist layer change due to the irradiation of the light source, and then use the photoresist remover to remove the photoresist irradiated by the light source or the unexposed photoresist from the surface of the processed object , to form a line layout corresponding to the original.
其中,用以执行曝光显影加工制程的曝光机基本结构如图1所示,主要在以机壳11构成一曝光室12,以及设有一可相对进出曝光室12的曝光平台13,而且至少在该曝光室12内部相对应于曝光平台13的上方或下方位置,设有一光源组14;请同时参照图2所示,该曝光平台13为一供放置被加工物20与原稿(图略)的透明平台,整体曝光平台13并藉由一组线性滑轨15进出曝光室12。Among them, the basic structure of the exposure machine used to perform the exposure and development process is shown in FIG. Corresponding to the position above or below the
该曝光平台13连同被加工物及原稿进入曝光室12至定位之后,一般必须在曝光室12内部停留一段时间(约3~5秒不等)使被加工物接受光源组14的曝光光源照射,待完成曝光之后再由曝光平台13将被加工物送出。After the
由于,一般习用曝光机多采用曝光平台13停滞在曝光室12内部的方式进行曝光作业,因此该光源组14并必须具有大量采用数组配置方式的灯泡141,方得以形成足以涵盖整个曝光平台13的平行光源;然而,在大量灯泡141同时运作下,将使机壳11内部产生严重的聚热现象,需另外用水冷系统散热,致使设备成本偏高。Because the general conventional exposure machines use the
另有一种习用曝光机透过复眼装置将灯泡的光线修正为所需的平行光及面积大小,其动作方式乃让光源灯泡透过椭圆镜将光线利用一组第一反射镜投向复眼装置使其光线均匀化,再利用一组第二反射镜将光线改变前进方向,最后利用一组凸透镜将光线修正为所需的平行光及面积大小,进而投射出所须的曝光光源,并藉以减少灯泡的数量。Another conventional exposure machine corrects the light of the light bulb to the required parallel light and area size through the compound eye device. Homogenize the light, then use a set of second reflectors to change the direction of the light, and finally use a set of convex lenses to correct the light to the required parallel light and area size, and then project the required exposure light source, thereby reducing the number of bulbs .
然而,如次此的设计将使整体曝光机的结构趋于复杂,且整体曝光机的体机亦相对更趋庞大;尤其,必须使用大瓦数的灯泡,一般大瓦数灯泡的寿命相当短,不但增加灯泡的更换频率,无形的中生产成本亦相对增加。However, such a design will make the structure of the overall exposure machine more complex, and the body of the overall exposure machine will be relatively larger; especially, it is necessary to use a bulb with a large wattage, and the life of a bulb with a large wattage is generally quite short. , not only increases the replacement frequency of bulbs, but also relatively increases the production cost invisibly.
实用新型内容Utility model content
有鉴于此,本实用新型所解决的技术问题即在提供一种较不会产生聚热现象,而且相对可以降低设备体积及成本的曝光机结构。In view of this, the technical problem to be solved by the utility model is to provide an exposure machine structure that is less prone to heat accumulation and can relatively reduce equipment volume and cost.
为达上揭目的,本实用新型的曝光机在一机台上设有至少一曝光平台,以及设有一输送机组用以带动该至少一曝光平台相对进出机台的曝光室,该曝光室内部至少在相对应于该曝光平台的移动行程上方或下方位置设有一曝光光源组,在该曝光光源组外部有一出光罩;另外,设有一组控制电路供设定、整合该输送机组与该曝光光源组以及该出光罩的运作。In order to achieve the purpose of exposing, the exposure machine of the present invention is provided with at least one exposure platform on a machine platform, and is provided with a conveying unit for driving the at least one exposure platform relatively into and out of the exposure room of the machine platform. An exposure light source group is provided at a position above or below the moving stroke corresponding to the exposure platform, and a mask is provided outside the exposure light source group; in addition, a set of control circuits is provided for setting and integrating the conveyor unit and the exposure light source group and the operation of the mask.
其中,该出光罩在其相对朝向该曝光平台移动行程的部位设有一长条状的透光槽,另设有一活动遮光板控制该透光槽开启与否,待曝光光源组的光源(本实施例为灯泡)启动时,其光源可透过该出光罩的透光槽向外照射,使产生朝向曝光平台移动行程照射的条状光源;再配合输送机组带动该曝光平台以预定速度与该出光罩相对位移的方式接受条状光源的照射,进而使该曝光平台上的被加工物完成曝光显影。Wherein, the light outlet cover is provided with a strip-shaped light-transmitting groove at its position relatively toward the moving stroke of the exposure platform, and is also provided with a movable light-shielding plate to control whether the light-transmitting groove is opened or not, and the light source of the light source group to be exposed (in this embodiment) For example, when the light bulb is started, its light source can shine outwards through the light-transmitting groove of the light-emitting cover, so that a strip-shaped light source is produced towards the moving stroke of the exposure platform; The cover is relatively displaced to receive the irradiation of the strip light source, and then the processed object on the exposure platform is exposed and developed.
具体而言,本实用新型的曝光机具有下列功效:Specifically, the exposure machine of the present invention has the following effects:
1.用以产生曝光效果的光源为条状光源,而非涵盖整个曝光平台的大面积光源,故可大幅减少曝光光源组的灯泡数量,相对缩减整体曝光机的体积,以及相对降低设备成本。1. The light source used to produce the exposure effect is a strip light source rather than a large-area light source covering the entire exposure platform, so the number of light bulbs in the exposure light source group can be greatly reduced, the volume of the overall exposure machine can be relatively reduced, and the equipment cost can be relatively reduced.
2.该控制电路可在曝光平台接受条状光源照射时,再行调升曝光光源组的功率,故可相对降低曝光室的聚热现象。2. The control circuit can increase the power of the exposure light source group when the exposure platform is irradiated by the strip light source, so that the heat accumulation phenomenon in the exposure room can be relatively reduced.
3.整体曝光机尤适合采用连续循环输送的方式,让曝光平台依序通过曝光室,然而可藉以提升曝光显影制程的加工产能。3. The overall exposure machine is especially suitable to adopt the method of continuous circulation conveying, so that the exposure platforms pass through the exposure room in sequence, but it can be used to increase the processing capacity of the exposure and development process.
附图说明 Description of drawings
图1为一习用曝光机的结构剖视图;Fig. 1 is a structural sectional view of a conventional exposure machine;
图2为一习用曝光机的曝光平台外观立体图;2 is a perspective view of the appearance of an exposure platform of a conventional exposure machine;
图3为本实用新型的曝光机外观立体图;Fig. 3 is a three-dimensional view of the appearance of the exposure machine of the present invention;
图4为本实用新型曝光机的曝光室内部结构立体图;4 is a three-dimensional view of the internal structure of the exposure chamber of the exposure machine of the present invention;
图5为本实用新型中设于该曝光平台移动行程上方位置的曝光光源组外观结构图;Fig. 5 is an appearance structure diagram of the exposure light source group located above the moving stroke of the exposure platform in the utility model;
图6为本实用新型中设于该曝光平台移动行程上方位置的曝光光源组放大示意图;Fig. 6 is an enlarged schematic diagram of the exposure light source set located above the moving stroke of the exposure platform in the present invention;
图7为本实用新型中设于该曝光平台移动行程下方位置的曝光光源组及出光罩的外观结构图;Fig. 7 is an appearance structure diagram of the exposure light source group and the light output mask arranged at the position below the moving stroke of the exposure platform in the utility model;
图8为本实用新型中设于该曝光平台移动行程下方位置的曝光光源组及出光罩的放大示意图;Fig. 8 is an enlarged schematic diagram of the exposure light source group and the light output mask arranged at the position below the moving stroke of the exposure platform in the present invention;
图9为本实用新型中设于该曝光平台移动行程下方位置的出光罩结构分解图;Fig. 9 is an exploded view of the structure of the light emitting mask located at the position below the moving stroke of the exposure platform in the present invention;
图10为本实用新型中设于该曝光平台移动行程上方位置的曝光光源组及出光罩的外观结构图;Fig. 10 is an appearance structure diagram of the exposure light source group and the light emitting mask located above the moving stroke of the exposure platform in the utility model;
图11为本实用新型中设于该曝光平台移动行程上方位置的曝光光源组结构俯视图;Fig. 11 is a top view of the structure of the exposure light source group located above the moving stroke of the exposure platform in the present invention;
图12为本实用新型中灯壳的外观结构图;Fig. 12 is the appearance structural diagram of the lamp housing in the utility model;
图13为本实用新型中曝光平台到达接近透光槽槽的预定行程的动作示意图;Fig. 13 is a schematic diagram of the action of the exposure platform reaching the predetermined stroke close to the light-transmitting groove in the utility model;
图14为本实用新型中曝光平台到达完成曝光显影的预定行程的动作示意图。FIG. 14 is a schematic diagram of the action of the exposure platform reaching the predetermined stroke for completing the exposure and development in the present invention.
【图号说明】【Description of figure number】
11机壳 12曝光室11
13曝光平台 14光源组13
141灯泡 15线性滑轨141
20被加工物 30机台20 processed
31机壳 311散热排风口31
312循环入风口 32曝光室312
33滤网 40曝光平台33
50输送机组 51线性滑轨50
52皮带 53马达52
60曝光光源组 61灯泡60 exposure
611灯壳 62反射镜611 lamp housing 62 reflector
63散热风扇 70出光罩63
71透光槽 72遮光板71 Light-transmitting
73动力 80控制电路73
81触控屏幕 82感应开关81
具体实施方式 Detailed ways
本实用新型的特点,可参阅本案图式及实施例的详细说明而获得清楚地了解。The features of the utility model can be clearly understood by referring to the detailed description of the drawings and the embodiments.
如图3及图4所示,本实用新型的曝光机包括有:一机台30、至少一曝光平台40、一输送机组50、至少一曝光光源组60、至少一出光罩70,以及一控制电路80;其中:As shown in Figures 3 and 4, the exposure machine of the present invention includes: a
该机台30具有一由机壳31所包围构成的曝光室32,该机壳31在相对于该曝光室32的外围设有散热排风口311及至少一循环入风口312,并且在该至少一循环入风口312处设有滤网33,以防止灰尘、异物进入曝光室32。The
该至少一曝光平台40,为供固定被加工物及原稿的透明平台;该输送机组50用以带动该至少一曝光平台40相对进出该机台30的曝光室32,其具有一组横向延伸配置于该机台30的曝光室32内、外区域的线性滑轨51供承载该曝光平台40,设有一皮带52供与该曝光平台40连接,以及设有一马达53用以带动该皮带52运转,并在该线性滑轨51的导引下,带动该曝光平台40相对进出该机台30的曝光室32。The at least one
该至少一曝光光源组60设在该曝光室32内部相对于该曝光平台40的移动行程上方或下方位置,如图5至图8所示,每一组曝光光源组60具有若干光源(本实施例为灯泡)61用以产生曝光光源;在本实施例中,整体曝光机在该曝光平台40的移动行程上方与下方位置皆设有一曝光光源组60,同时对该曝光平台40上、下两面的被加工物进行曝光显影。The at least one exposure
该至少一出光罩70设在该至少一曝光光源组60外部,如图9所示,其在相对朝向该曝光平台移动行程的部位设有一长条状的透光槽71,另设有一活动遮光板72控制该透光槽71开启与否;该活动遮光板72与该出光罩70之间连接有至少一动力缸73,由该至少一动力缸73带动该活动遮光板72与该出光罩相对位移,进而控制该透光槽71关闭或开启。The at least one
如图7所示,该控制电路80供设定、整合该输送机组50、该至少一曝光光源组60以及该活动遮光板72的运作,其具有一设在机台10上的触控屏幕81供设定相关动作参数,以及在该机台10相对于该曝光平台40的移动行程处设有至少一感应开关82用以感测该曝光平台40的相对位置。As shown in FIG. 7 , the
请同时配合参照图10及图11所示,上揭曝光光源组60的各灯泡61呈沿着出光罩70的透光槽71直线排列,并且设有一组反光镜62用以将灯泡61的光线投向该出光罩70的透光槽71;又,各灯泡以特定角度(约2°)夹角朝向光线照射方向偏摆的方式配置,使各灯泡61的光源得以完全接续,各灯泡61的灯壳611内部建构有PI镀膜以增加其反射率(如图12所示),以及在相对于各灯泡61的配设位置设有一散热风扇63,以增加曝光光源组60的废热排放效率。Please refer to Fig. 10 and Fig. 11 at the same time, the
如图13所示,本实用新型的曝光机在该曝光平台40尚未进入曝光室的前将原稿及被加工物固定在该曝光平台40上,并且经由触控屏幕81设定曝光光源60的输出功率以及该输送机组50的运转速度之后即可开始运作。As shown in Figure 13, the exposure machine of the present invention fixes the original and the workpiece on the
在曝光机开始运作时,首先开启曝光光源组60的灯泡,并启动该输送机组50带动曝光平台40朝向曝光室方向移动,当曝光平台40进入曝光室并且到达接近该透光槽71槽的预定行程时,会先行启动该控制电路80的感应开关82(如图8所示),由该控制电路80操控该活动遮光板动作,使该出光罩70的透光槽71开启,同时调升该曝光光源组60的输出功率。When the exposure machine starts to operate, first turn on the light bulb of the exposure
此时,该曝光光源组60的光源即可透过该出光罩70的透光槽71向外照射,使产生朝向曝光平台40移动行程照射的条状光源;再配合输送机组50带动该曝光平台40以预定速度与该出光罩70相对位移的方式接受该条状光源的照射,进而使该曝光平台40上的被加工物完成曝光显影。At this time, the light source of the exposure
如图14所示,待该曝光平台40相对移动至完成曝光显影的预定行程即令该该控制电路80的感应开关82(如图8所示)关闭,由该控制电路80操控该活动遮光板72动作,将该出光罩70的透光槽关闭,同时调降该曝光光源组60的输出功率。As shown in FIG. 14 , when the
由于本实用新型的曝光机用以产生曝光效果的光源为条状光源,而非涵盖整个曝光平台的大面积光源,故可大幅减少曝光光源组60的灯泡数量,相对缩减整体曝光机的体积,以及相对降低设备成本;再者,该控制电路80可在曝光平台40接受条状光源照射时,再行调升该曝光光源组60的输出功率,故可相对降低曝光室的聚热现象。Since the light source used by the exposure machine of the present invention to produce the exposure effect is a strip light source rather than a large-area light source covering the entire exposure platform, the number of light bulbs in the exposure
附带一提的是,由于本实用新型的曝光机在进行曝光显影时,该曝光平台以预定的速度持续朝向深入曝光室的方向移动,因此整体曝光机尤适合采用连续循环输送的方式,让曝光平台依序通过曝光室,而可藉以提升曝光显影制程的加工产能。Incidentally, when the exposure machine of the present invention is performing exposure and development, the exposure platform continues to move toward the direction of the exposure room at a predetermined speed, so the overall exposure machine is particularly suitable for continuous circulation transportation, allowing exposure The platforms pass through the exposure chamber sequentially, so that the processing capacity of the exposure and development process can be improved.
综上所述,本实用新型提供一较佳可行的曝光机,爰依法提呈新型专利的申请;本实用新型的技术内容及技术特点巳揭示如上,然而熟悉本项技术的人士仍可能基于本实用新型的揭示而作各种不背离本案实用新型精神的替换及修饰。因此,本实用新型的保护范围应不限于实施例所揭示者,而应包括各种不背离本实用新型的替换及修饰,并为以下的申请专利范围所涵盖。In summary, the utility model provides a better and feasible exposure machine, and the application for a new patent is submitted according to law; the technical content and technical characteristics of the utility model have been disclosed as above, but those who are familiar with this technology may still Various replacements and modifications are made without departing from the spirit of the utility model for the disclosure of the utility model. Therefore, the protection scope of the present utility model should not be limited to those disclosed in the embodiments, but should include various replacements and modifications that do not deviate from the present utility model, and are covered by the scope of the following patent applications.
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Cited By (3)
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CN101876784B (en) * | 2009-04-29 | 2012-05-16 | 翊晖科技股份有限公司 | Exposure machine and exposure method thereof |
CN103513518A (en) * | 2013-09-11 | 2014-01-15 | 浙江欧视达科技有限公司 | Ultraviolet LED exposure machine optical exposure illumination system and ultraviolet LED exposure machine |
CN113805436A (en) * | 2021-06-11 | 2021-12-17 | 赣州中盛隆电子有限公司 | A metamaterial-based exposure machine |
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Publication number | Priority date | Publication date | Assignee | Title |
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CN101876784B (en) * | 2009-04-29 | 2012-05-16 | 翊晖科技股份有限公司 | Exposure machine and exposure method thereof |
CN103513518A (en) * | 2013-09-11 | 2014-01-15 | 浙江欧视达科技有限公司 | Ultraviolet LED exposure machine optical exposure illumination system and ultraviolet LED exposure machine |
CN103513518B (en) * | 2013-09-11 | 2015-12-16 | 浙江欧视达科技有限公司 | ultraviolet LED exposure machine optical exposure illumination system and ultraviolet LED exposure machine |
CN113805436A (en) * | 2021-06-11 | 2021-12-17 | 赣州中盛隆电子有限公司 | A metamaterial-based exposure machine |
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