[go: up one dir, main page]

CN201402366Y - Exposure machine - Google Patents

Exposure machine Download PDF

Info

Publication number
CN201402366Y
CN201402366Y CN2009201522573U CN200920152257U CN201402366Y CN 201402366 Y CN201402366 Y CN 201402366Y CN 2009201522573 U CN2009201522573 U CN 2009201522573U CN 200920152257 U CN200920152257 U CN 200920152257U CN 201402366 Y CN201402366 Y CN 201402366Y
Authority
CN
China
Prior art keywords
exposure
light
light source
platform
source group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2009201522573U
Other languages
Chinese (zh)
Inventor
吕金水
钟政学
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yihui Technology Co ltd
Original Assignee
Yihui Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yihui Technology Co ltd filed Critical Yihui Technology Co ltd
Priority to CN2009201522573U priority Critical patent/CN201402366Y/en
Application granted granted Critical
Publication of CN201402366Y publication Critical patent/CN201402366Y/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The exposure machine of the utility model is mainly provided with a light outlet cover outside the exposure light source group, the light outlet cover is provided with a strip-shaped light transmission groove at the position which is relatively towards the moving stroke of the exposure platform, and a movable light screen is arranged to control whether the light transmission groove is opened or not, so that the strip-shaped light source which is irradiated towards the moving stroke of the exposure platform is generated under the state that the light transmission groove is opened; the exposure platform is matched to receive the irradiation of the strip light source in a mode of relative displacement with the light-emitting cover at a preset speed, so that the processed object on the exposure platform is exposed and developed.

Description

曝光机 Exposure machine

技术领域 technical field

本实用新型有关一种曝光机,尤指一种较不会产生聚热现象,且相对可以降低设备体积及成本的曝光机结构。The utility model relates to an exposure machine, in particular to an exposure machine structure that does not generate heat accumulation and can relatively reduce equipment volume and cost.

背景技术 Background technique

按,一般印刷电路板或半导体芯片在进行曝光显影制程时,先在被加工物表面上涂上一层光阻,再藉由光源的照射将原稿上的电路布线图案映像至被加工物表面的光阻层上,以使光阻层的化学性质因光源的照射而产生变化,然后再利用去光阻剂来将被光源照射过的光阻或未经曝光的光阻自被加工物表面去除,以形成对应于原稿的线路布局。Press, when the general printed circuit board or semiconductor chip is exposed and developed, a layer of photoresist is first coated on the surface of the processed object, and then the circuit wiring pattern on the original is mapped to the surface of the processed object by the irradiation of the light source. On the photoresist layer, so that the chemical properties of the photoresist layer change due to the irradiation of the light source, and then use the photoresist remover to remove the photoresist irradiated by the light source or the unexposed photoresist from the surface of the processed object , to form a line layout corresponding to the original.

其中,用以执行曝光显影加工制程的曝光机基本结构如图1所示,主要在以机壳11构成一曝光室12,以及设有一可相对进出曝光室12的曝光平台13,而且至少在该曝光室12内部相对应于曝光平台13的上方或下方位置,设有一光源组14;请同时参照图2所示,该曝光平台13为一供放置被加工物20与原稿(图略)的透明平台,整体曝光平台13并藉由一组线性滑轨15进出曝光室12。Among them, the basic structure of the exposure machine used to perform the exposure and development process is shown in FIG. Corresponding to the position above or below the exposure platform 13 inside the exposure chamber 12, a light source group 14 is provided; please refer to FIG. Platform, the overall exposure platform 13 enters and exits the exposure chamber 12 through a set of linear slide rails 15 .

该曝光平台13连同被加工物及原稿进入曝光室12至定位之后,一般必须在曝光室12内部停留一段时间(约3~5秒不等)使被加工物接受光源组14的曝光光源照射,待完成曝光之后再由曝光平台13将被加工物送出。After the exposure platform 13 enters the exposure chamber 12 together with the workpiece and the original to be positioned, it generally must stay in the exposure chamber 12 for a period of time (about 3 to 5 seconds) to allow the workpiece to be irradiated by the exposure light source of the light source group 14. After the exposure is completed, the object to be processed is sent out by the exposure platform 13 .

由于,一般习用曝光机多采用曝光平台13停滞在曝光室12内部的方式进行曝光作业,因此该光源组14并必须具有大量采用数组配置方式的灯泡141,方得以形成足以涵盖整个曝光平台13的平行光源;然而,在大量灯泡141同时运作下,将使机壳11内部产生严重的聚热现象,需另外用水冷系统散热,致使设备成本偏高。Because the general conventional exposure machines use the exposure platform 13 stagnant in the exposure chamber 12 to carry out the exposure operation, so the light source group 14 must have a large number of light bulbs 141 arranged in an array, so as to form enough to cover the entire exposure platform 13 Parallel light source; however, under the simultaneous operation of a large number of bulbs 141, serious heat accumulation will occur inside the casing 11, requiring an additional water-cooling system to dissipate heat, resulting in high equipment costs.

另有一种习用曝光机透过复眼装置将灯泡的光线修正为所需的平行光及面积大小,其动作方式乃让光源灯泡透过椭圆镜将光线利用一组第一反射镜投向复眼装置使其光线均匀化,再利用一组第二反射镜将光线改变前进方向,最后利用一组凸透镜将光线修正为所需的平行光及面积大小,进而投射出所须的曝光光源,并藉以减少灯泡的数量。Another conventional exposure machine corrects the light of the light bulb to the required parallel light and area size through the compound eye device. Homogenize the light, then use a set of second reflectors to change the direction of the light, and finally use a set of convex lenses to correct the light to the required parallel light and area size, and then project the required exposure light source, thereby reducing the number of bulbs .

然而,如次此的设计将使整体曝光机的结构趋于复杂,且整体曝光机的体机亦相对更趋庞大;尤其,必须使用大瓦数的灯泡,一般大瓦数灯泡的寿命相当短,不但增加灯泡的更换频率,无形的中生产成本亦相对增加。However, such a design will make the structure of the overall exposure machine more complex, and the body of the overall exposure machine will be relatively larger; especially, it is necessary to use a bulb with a large wattage, and the life of a bulb with a large wattage is generally quite short. , not only increases the replacement frequency of bulbs, but also relatively increases the production cost invisibly.

实用新型内容Utility model content

有鉴于此,本实用新型所解决的技术问题即在提供一种较不会产生聚热现象,而且相对可以降低设备体积及成本的曝光机结构。In view of this, the technical problem to be solved by the utility model is to provide an exposure machine structure that is less prone to heat accumulation and can relatively reduce equipment volume and cost.

为达上揭目的,本实用新型的曝光机在一机台上设有至少一曝光平台,以及设有一输送机组用以带动该至少一曝光平台相对进出机台的曝光室,该曝光室内部至少在相对应于该曝光平台的移动行程上方或下方位置设有一曝光光源组,在该曝光光源组外部有一出光罩;另外,设有一组控制电路供设定、整合该输送机组与该曝光光源组以及该出光罩的运作。In order to achieve the purpose of exposing, the exposure machine of the present invention is provided with at least one exposure platform on a machine platform, and is provided with a conveying unit for driving the at least one exposure platform relatively into and out of the exposure room of the machine platform. An exposure light source group is provided at a position above or below the moving stroke corresponding to the exposure platform, and a mask is provided outside the exposure light source group; in addition, a set of control circuits is provided for setting and integrating the conveyor unit and the exposure light source group and the operation of the mask.

其中,该出光罩在其相对朝向该曝光平台移动行程的部位设有一长条状的透光槽,另设有一活动遮光板控制该透光槽开启与否,待曝光光源组的光源(本实施例为灯泡)启动时,其光源可透过该出光罩的透光槽向外照射,使产生朝向曝光平台移动行程照射的条状光源;再配合输送机组带动该曝光平台以预定速度与该出光罩相对位移的方式接受条状光源的照射,进而使该曝光平台上的被加工物完成曝光显影。Wherein, the light outlet cover is provided with a strip-shaped light-transmitting groove at its position relatively toward the moving stroke of the exposure platform, and is also provided with a movable light-shielding plate to control whether the light-transmitting groove is opened or not, and the light source of the light source group to be exposed (in this embodiment) For example, when the light bulb is started, its light source can shine outwards through the light-transmitting groove of the light-emitting cover, so that a strip-shaped light source is produced towards the moving stroke of the exposure platform; The cover is relatively displaced to receive the irradiation of the strip light source, and then the processed object on the exposure platform is exposed and developed.

具体而言,本实用新型的曝光机具有下列功效:Specifically, the exposure machine of the present invention has the following effects:

1.用以产生曝光效果的光源为条状光源,而非涵盖整个曝光平台的大面积光源,故可大幅减少曝光光源组的灯泡数量,相对缩减整体曝光机的体积,以及相对降低设备成本。1. The light source used to produce the exposure effect is a strip light source rather than a large-area light source covering the entire exposure platform, so the number of light bulbs in the exposure light source group can be greatly reduced, the volume of the overall exposure machine can be relatively reduced, and the equipment cost can be relatively reduced.

2.该控制电路可在曝光平台接受条状光源照射时,再行调升曝光光源组的功率,故可相对降低曝光室的聚热现象。2. The control circuit can increase the power of the exposure light source group when the exposure platform is irradiated by the strip light source, so that the heat accumulation phenomenon in the exposure room can be relatively reduced.

3.整体曝光机尤适合采用连续循环输送的方式,让曝光平台依序通过曝光室,然而可藉以提升曝光显影制程的加工产能。3. The overall exposure machine is especially suitable to adopt the method of continuous circulation conveying, so that the exposure platforms pass through the exposure room in sequence, but it can be used to increase the processing capacity of the exposure and development process.

附图说明 Description of drawings

图1为一习用曝光机的结构剖视图;Fig. 1 is a structural sectional view of a conventional exposure machine;

图2为一习用曝光机的曝光平台外观立体图;2 is a perspective view of the appearance of an exposure platform of a conventional exposure machine;

图3为本实用新型的曝光机外观立体图;Fig. 3 is a three-dimensional view of the appearance of the exposure machine of the present invention;

图4为本实用新型曝光机的曝光室内部结构立体图;4 is a three-dimensional view of the internal structure of the exposure chamber of the exposure machine of the present invention;

图5为本实用新型中设于该曝光平台移动行程上方位置的曝光光源组外观结构图;Fig. 5 is an appearance structure diagram of the exposure light source group located above the moving stroke of the exposure platform in the utility model;

图6为本实用新型中设于该曝光平台移动行程上方位置的曝光光源组放大示意图;Fig. 6 is an enlarged schematic diagram of the exposure light source set located above the moving stroke of the exposure platform in the present invention;

图7为本实用新型中设于该曝光平台移动行程下方位置的曝光光源组及出光罩的外观结构图;Fig. 7 is an appearance structure diagram of the exposure light source group and the light output mask arranged at the position below the moving stroke of the exposure platform in the utility model;

图8为本实用新型中设于该曝光平台移动行程下方位置的曝光光源组及出光罩的放大示意图;Fig. 8 is an enlarged schematic diagram of the exposure light source group and the light output mask arranged at the position below the moving stroke of the exposure platform in the present invention;

图9为本实用新型中设于该曝光平台移动行程下方位置的出光罩结构分解图;Fig. 9 is an exploded view of the structure of the light emitting mask located at the position below the moving stroke of the exposure platform in the present invention;

图10为本实用新型中设于该曝光平台移动行程上方位置的曝光光源组及出光罩的外观结构图;Fig. 10 is an appearance structure diagram of the exposure light source group and the light emitting mask located above the moving stroke of the exposure platform in the utility model;

图11为本实用新型中设于该曝光平台移动行程上方位置的曝光光源组结构俯视图;Fig. 11 is a top view of the structure of the exposure light source group located above the moving stroke of the exposure platform in the present invention;

图12为本实用新型中灯壳的外观结构图;Fig. 12 is the appearance structural diagram of the lamp housing in the utility model;

图13为本实用新型中曝光平台到达接近透光槽槽的预定行程的动作示意图;Fig. 13 is a schematic diagram of the action of the exposure platform reaching the predetermined stroke close to the light-transmitting groove in the utility model;

图14为本实用新型中曝光平台到达完成曝光显影的预定行程的动作示意图。FIG. 14 is a schematic diagram of the action of the exposure platform reaching the predetermined stroke for completing the exposure and development in the present invention.

【图号说明】【Description of figure number】

11机壳        12曝光室11 Housing 12 Exposure chamber

13曝光平台    14光源组13 exposure platform 14 light source groups

141灯泡       15线性滑轨141 bulbs 15 linear slides

20被加工物    30机台20 processed objects 30 machines

31机壳           311散热排风口31 Chassis 311 Cooling vent

312循环入风口    32曝光室312 circulation air inlet 32 exposure chamber

33滤网           40曝光平台33 filters 40 exposure platforms

50输送机组       51线性滑轨50 conveyor unit 51 linear slide rail

52皮带           53马达52 belt 53 motor

60曝光光源组     61灯泡60 exposure light source groups 61 bulbs

611灯壳          62反射镜611 lamp housing 62 reflector

63散热风扇       70出光罩63 Cooling fan 70 Light outlet cover

71透光槽         72遮光板71 Light-transmitting groove 72 Shading plate

73动力           80控制电路73 power 80 control circuit

81触控屏幕       82感应开关81 touch screen 82 induction switch

具体实施方式 Detailed ways

本实用新型的特点,可参阅本案图式及实施例的详细说明而获得清楚地了解。The features of the utility model can be clearly understood by referring to the detailed description of the drawings and the embodiments.

如图3及图4所示,本实用新型的曝光机包括有:一机台30、至少一曝光平台40、一输送机组50、至少一曝光光源组60、至少一出光罩70,以及一控制电路80;其中:As shown in Figures 3 and 4, the exposure machine of the present invention includes: a machine platform 30, at least one exposure platform 40, a conveyor unit 50, at least one exposure light source group 60, at least one photomask 70, and a control Circuit 80; wherein:

该机台30具有一由机壳31所包围构成的曝光室32,该机壳31在相对于该曝光室32的外围设有散热排风口311及至少一循环入风口312,并且在该至少一循环入风口312处设有滤网33,以防止灰尘、异物进入曝光室32。The machine 30 has an exposure chamber 32 surrounded by a casing 31. The casing 31 is provided with a heat dissipation air outlet 311 and at least one circulating air inlet 312 on the periphery of the exposure chamber 32, and at least A filter screen 33 is provided at the air circulation inlet 312 to prevent dust and foreign matter from entering the exposure chamber 32 .

该至少一曝光平台40,为供固定被加工物及原稿的透明平台;该输送机组50用以带动该至少一曝光平台40相对进出该机台30的曝光室32,其具有一组横向延伸配置于该机台30的曝光室32内、外区域的线性滑轨51供承载该曝光平台40,设有一皮带52供与该曝光平台40连接,以及设有一马达53用以带动该皮带52运转,并在该线性滑轨51的导引下,带动该曝光平台40相对进出该机台30的曝光室32。The at least one exposure platform 40 is a transparent platform for fixing workpieces and originals; the conveying unit 50 is used to drive the at least one exposure platform 40 to relatively enter and exit the exposure chamber 32 of the machine 30, which has a set of laterally extending configurations The linear slide rails 51 in the exposure chamber 32 of the machine 30 and the outer area are used to carry the exposure platform 40, a belt 52 is provided for connecting with the exposure platform 40, and a motor 53 is provided to drive the belt 52 to run, and Under the guidance of the linear sliding rail 51 , the exposure platform 40 is driven to enter and exit the exposure chamber 32 of the machine 30 .

该至少一曝光光源组60设在该曝光室32内部相对于该曝光平台40的移动行程上方或下方位置,如图5至图8所示,每一组曝光光源组60具有若干光源(本实施例为灯泡)61用以产生曝光光源;在本实施例中,整体曝光机在该曝光平台40的移动行程上方与下方位置皆设有一曝光光源组60,同时对该曝光平台40上、下两面的被加工物进行曝光显影。The at least one exposure light source group 60 is arranged at the position above or below the movement stroke of the exposure platform 40 inside the exposure chamber 32. As shown in FIGS. For example, a light bulb) 61 is used to generate the exposure light source; in this embodiment, the overall exposure machine is provided with an exposure light source group 60 above and below the moving stroke of the exposure platform 40, and the upper and lower sides of the exposure platform 40 are exposed simultaneously. The processed object is exposed and developed.

该至少一出光罩70设在该至少一曝光光源组60外部,如图9所示,其在相对朝向该曝光平台移动行程的部位设有一长条状的透光槽71,另设有一活动遮光板72控制该透光槽71开启与否;该活动遮光板72与该出光罩70之间连接有至少一动力缸73,由该至少一动力缸73带动该活动遮光板72与该出光罩相对位移,进而控制该透光槽71关闭或开启。The at least one light outlet cover 70 is arranged outside the at least one exposure light source group 60. As shown in FIG. The plate 72 controls whether the light transmission groove 71 is opened or not; at least one power cylinder 73 is connected between the movable light shield 72 and the light outlet cover 70, and the movable light shield 72 is driven by the at least one power cylinder 73 to be opposite to the light outlet cover Displacement, and then control the light-transmitting groove 71 to close or open.

如图7所示,该控制电路80供设定、整合该输送机组50、该至少一曝光光源组60以及该活动遮光板72的运作,其具有一设在机台10上的触控屏幕81供设定相关动作参数,以及在该机台10相对于该曝光平台40的移动行程处设有至少一感应开关82用以感测该曝光平台40的相对位置。As shown in FIG. 7 , the control circuit 80 is used for setting and integrating the operation of the conveying unit 50 , the at least one exposure light source group 60 and the movable light shield 72 , and it has a touch screen 81 arranged on the machine platform 10 For setting relevant action parameters, and at least one sensor switch 82 is provided at the moving distance of the machine 10 relative to the exposure platform 40 to sense the relative position of the exposure platform 40 .

请同时配合参照图10及图11所示,上揭曝光光源组60的各灯泡61呈沿着出光罩70的透光槽71直线排列,并且设有一组反光镜62用以将灯泡61的光线投向该出光罩70的透光槽71;又,各灯泡以特定角度(约2°)夹角朝向光线照射方向偏摆的方式配置,使各灯泡61的光源得以完全接续,各灯泡61的灯壳611内部建构有PI镀膜以增加其反射率(如图12所示),以及在相对于各灯泡61的配设位置设有一散热风扇63,以增加曝光光源组60的废热排放效率。Please refer to Fig. 10 and Fig. 11 at the same time, the bulbs 61 of the exposure light source group 60 are arranged in a straight line along the light-transmitting groove 71 of the light-emitting cover 70, and a set of reflectors 62 are provided to reflect the light from the bulbs 61. Throw to the light-transmitting groove 71 of this light-emitting cover 70; Again, each bulb is configured in a way that a specific angle (about 2°) included angle is tilted towards the light irradiation direction, so that the light source of each bulb 61 can be completely connected, and the light of each bulb 61 Inside the housing 611 is a PI coating to increase its reflectivity (as shown in FIG. 12 ), and a cooling fan 63 is provided at a position relative to each bulb 61 to increase the waste heat discharge efficiency of the exposure light source group 60 .

如图13所示,本实用新型的曝光机在该曝光平台40尚未进入曝光室的前将原稿及被加工物固定在该曝光平台40上,并且经由触控屏幕81设定曝光光源60的输出功率以及该输送机组50的运转速度之后即可开始运作。As shown in Figure 13, the exposure machine of the present invention fixes the original and the workpiece on the exposure platform 40 before the exposure platform 40 enters the exposure chamber, and sets the output of the exposure light source 60 through the touch screen 81. The power and the operating speed of the conveyor unit 50 can then be started.

在曝光机开始运作时,首先开启曝光光源组60的灯泡,并启动该输送机组50带动曝光平台40朝向曝光室方向移动,当曝光平台40进入曝光室并且到达接近该透光槽71槽的预定行程时,会先行启动该控制电路80的感应开关82(如图8所示),由该控制电路80操控该活动遮光板动作,使该出光罩70的透光槽71开启,同时调升该曝光光源组60的输出功率。When the exposure machine starts to operate, first turn on the light bulb of the exposure light source group 60, and start the conveyor unit 50 to drive the exposure platform 40 to move towards the exposure room. During the stroke, the inductive switch 82 (as shown in Figure 8 ) of the control circuit 80 will be activated first, and the control circuit 80 will control the action of the movable visor, so that the light-transmitting groove 71 of the light-emitting cover 70 is opened, and the The output power of the exposure light source group 60.

此时,该曝光光源组60的光源即可透过该出光罩70的透光槽71向外照射,使产生朝向曝光平台40移动行程照射的条状光源;再配合输送机组50带动该曝光平台40以预定速度与该出光罩70相对位移的方式接受该条状光源的照射,进而使该曝光平台40上的被加工物完成曝光显影。At this time, the light source of the exposure light source group 60 can pass through the light-transmitting groove 71 of the light outlet cover 70 to irradiate outwards, so as to generate a strip light source moving toward the exposure platform 40; and then cooperate with the conveyor unit 50 to drive the exposure platform 40 is irradiated by the strip-shaped light source in a manner of relative displacement with the light emitting mask 70 at a predetermined speed, and then the processed object on the exposure platform 40 is exposed and developed.

如图14所示,待该曝光平台40相对移动至完成曝光显影的预定行程即令该该控制电路80的感应开关82(如图8所示)关闭,由该控制电路80操控该活动遮光板72动作,将该出光罩70的透光槽关闭,同时调降该曝光光源组60的输出功率。As shown in FIG. 14 , when the exposure platform 40 is relatively moved to the predetermined stroke of completion of exposure and development, the sensor switch 82 (as shown in FIG. 8 ) of the control circuit 80 is turned off, and the movable light shielding plate 72 is controlled by the control circuit 80. Action, close the light transmission groove of the light exit cover 70, and lower the output power of the exposure light source group 60 at the same time.

由于本实用新型的曝光机用以产生曝光效果的光源为条状光源,而非涵盖整个曝光平台的大面积光源,故可大幅减少曝光光源组60的灯泡数量,相对缩减整体曝光机的体积,以及相对降低设备成本;再者,该控制电路80可在曝光平台40接受条状光源照射时,再行调升该曝光光源组60的输出功率,故可相对降低曝光室的聚热现象。Since the light source used by the exposure machine of the present invention to produce the exposure effect is a strip light source rather than a large-area light source covering the entire exposure platform, the number of light bulbs in the exposure light source group 60 can be greatly reduced, and the volume of the overall exposure machine can be relatively reduced. And the equipment cost is relatively reduced; moreover, the control circuit 80 can increase the output power of the exposure light source group 60 when the exposure platform 40 is irradiated by the strip light source, so that the heat accumulation phenomenon in the exposure chamber can be relatively reduced.

附带一提的是,由于本实用新型的曝光机在进行曝光显影时,该曝光平台以预定的速度持续朝向深入曝光室的方向移动,因此整体曝光机尤适合采用连续循环输送的方式,让曝光平台依序通过曝光室,而可藉以提升曝光显影制程的加工产能。Incidentally, when the exposure machine of the present invention is performing exposure and development, the exposure platform continues to move toward the direction of the exposure room at a predetermined speed, so the overall exposure machine is particularly suitable for continuous circulation transportation, allowing exposure The platforms pass through the exposure chamber sequentially, so that the processing capacity of the exposure and development process can be improved.

综上所述,本实用新型提供一较佳可行的曝光机,爰依法提呈新型专利的申请;本实用新型的技术内容及技术特点巳揭示如上,然而熟悉本项技术的人士仍可能基于本实用新型的揭示而作各种不背离本案实用新型精神的替换及修饰。因此,本实用新型的保护范围应不限于实施例所揭示者,而应包括各种不背离本实用新型的替换及修饰,并为以下的申请专利范围所涵盖。In summary, the utility model provides a better and feasible exposure machine, and the application for a new patent is submitted according to law; the technical content and technical characteristics of the utility model have been disclosed as above, but those who are familiar with this technology may still Various replacements and modifications are made without departing from the spirit of the utility model for the disclosure of the utility model. Therefore, the protection scope of the present utility model should not be limited to those disclosed in the embodiments, but should include various replacements and modifications that do not deviate from the present utility model, and are covered by the scope of the following patent applications.

Claims (10)

1、一种曝光机,其特征在于,包括有:1. An exposure machine, characterized in that it comprises: 一机台,具有一由机壳所包围构成的曝光室;A machine with an exposure chamber surrounded by a casing; 至少一曝光平台,为供固定被加工物及原稿的透明平台;At least one exposure platform, which is a transparent platform for fixing the processed object and original manuscript; 一输送机组,用以带动该至少一曝光平台相对进出该机台的曝光室;a conveying unit for driving the at least one exposure platform relatively into and out of the exposure chamber of the machine; 至少一曝光光源组,设在该曝光室内部相对于该曝光平台的移动行程上方或下方位置,每一组曝光光源组具有若干光源用以产生曝光光源;At least one exposure light source group is located inside the exposure chamber at a position above or below the exposure platform relative to the moving stroke, and each exposure light source group has several light sources for generating exposure light sources; 至少一出光罩,设在该至少一曝光光源组外部,其在相对朝向该曝光平台移动行程的部位设有一长条状的透光槽,另设有一活动遮光板控制该透光槽开启与否;At least one light outlet mask is arranged outside the at least one exposure light source group, and it is provided with a strip-shaped light-transmitting groove at a position relatively toward the moving stroke of the exposure platform, and a movable light-shielding plate is provided to control whether the light-transmitting groove is opened or not ; 一控制电路,供设定、整合该输送机组、该至少一曝光光源组以及该活动遮光板的运作;以及,a control circuit for setting and integrating the operation of the conveyor unit, the at least one exposure light source group and the movable light shield; and, 该曝光光源组的灯泡启动时,其光源可透过该出光罩的透光槽向外照射,使产生朝向该曝光平台移动行程照射的条状光源;再配合该输送机组带动该曝光平台以预定速度与该出光罩相对位移的方式接受该条状光源的照射,使该曝光平台上的被加工物完成曝光显影。When the light bulbs of the exposure light source group are activated, the light source can irradiate outwards through the light-transmitting groove of the light outlet cover, so as to produce a strip-shaped light source moving toward the exposure platform; and then cooperate with the conveyor unit to drive the exposure platform to predetermined The speed and the relative displacement of the light-emitting mask are irradiated by the strip light source, so that the processed object on the exposure platform is exposed and developed. 2、如权利要求1所述的曝光机,其特征在于,在该曝光平台的移动行程上方与下方位置皆设有一曝光光源组。2 . The exposure machine according to claim 1 , wherein an exposure light source group is provided at positions above and below the moving stroke of the exposure platform. 3、如权利要求1所述的曝光机,其特征在于,该机壳在相对于该瀑光室的外围设有散热排风口及至少一循环入风口,并且在该至少一循环入风口处设有滤网。3. The exposure machine according to claim 1, characterized in that, the casing is provided with a heat dissipation air outlet and at least one circulation air inlet on the periphery of the waterfall chamber, and at the at least one circulation air inlet With filter. 4、如权利要求1所述的曝光机,其特征在于,该输送机组具有一组横向延伸配置于该机台的曝光室内、外区域的线性滑轨供承载该曝光平台,设有一皮带供与该曝光平台连接,以及设有一用以带动该皮带运转的马达。4. The exposure machine according to claim 1, characterized in that, the conveyor unit has a set of linear slide rails extending laterally in the exposure room and outside area of the machine for carrying the exposure platform, and a belt is provided for the exposure platform. The exposure platform is connected, and a motor for driving the belt is provided. 5、如权利要求1所述的曝光机,其特征在于,该活动遮光板与该出光罩之间连接有至少一用于带动该活动遮光板与该出光罩相对位移,进而控制该透光槽关闭或开启的动力缸。5. The exposure machine according to claim 1, characterized in that at least one device is connected between the movable light shield and the light outlet cover to drive the relative displacement of the movable light shield and the light outlet mask, and then control the light transmission groove. Power cylinder closed or open. 6、如权利要求1所述的曝光机,其特征在于,该控制电路具有一设在机台上的供设定相关动作参数的触控屏幕,以及在该机台相对于该曝光平台的移动行程处设有至少一用以感测该曝光平台相对位置的感应开关。6. The exposure machine according to claim 1, wherein the control circuit has a touch screen provided on the machine table for setting relevant action parameters, and the movement of the machine table relative to the exposure platform At least one inductive switch for sensing the relative position of the exposure platform is arranged at the stroke. 7、如权利要求1所述的曝光机,其特征在于,该至少一曝光光源组的各灯泡呈沿着该出光罩的透光槽直线排列,并且设有一组用以将灯泡的光线投向该出光罩透光槽的反光镜。7. The exposure machine according to claim 1, wherein the light bulbs of the at least one exposure light source group are arranged in a straight line along the light-transmitting groove of the light exit cover, and a group is provided for projecting light from the light bulbs to the The reflector of the light-transmitting groove of the light exit cover. 8、如权利要求7所述的曝光机,其特征在于,该至少一曝光光源组的各灯泡朝向光线照射方向偏摆的方式配置。8. The exposure machine according to claim 7, characterized in that, the light bulbs of the at least one exposure light source group are arranged in a manner of oscillating toward the light irradiation direction. 9、如权利要求7所述的曝光机,其特征在于,该至少一曝光光源组的各灯泡以2°夹角朝向光线照射方向偏摆的方式配置。9. The exposure machine according to claim 7, wherein the light bulbs of the at least one exposure light source group are arranged in a manner of swaying toward the light irradiation direction at an included angle of 2°. 10、如权利要求1所述的曝光机,其特征在于,该光源灯泡或LED光源。10. The exposure machine according to claim 1, characterized in that the light source is a light bulb or an LED light source.
CN2009201522573U 2009-04-29 2009-04-29 Exposure machine Expired - Fee Related CN201402366Y (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2009201522573U CN201402366Y (en) 2009-04-29 2009-04-29 Exposure machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2009201522573U CN201402366Y (en) 2009-04-29 2009-04-29 Exposure machine

Publications (1)

Publication Number Publication Date
CN201402366Y true CN201402366Y (en) 2010-02-10

Family

ID=41662164

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2009201522573U Expired - Fee Related CN201402366Y (en) 2009-04-29 2009-04-29 Exposure machine

Country Status (1)

Country Link
CN (1) CN201402366Y (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101876784B (en) * 2009-04-29 2012-05-16 翊晖科技股份有限公司 Exposure machine and exposure method thereof
CN103513518A (en) * 2013-09-11 2014-01-15 浙江欧视达科技有限公司 Ultraviolet LED exposure machine optical exposure illumination system and ultraviolet LED exposure machine
CN113805436A (en) * 2021-06-11 2021-12-17 赣州中盛隆电子有限公司 A metamaterial-based exposure machine

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101876784B (en) * 2009-04-29 2012-05-16 翊晖科技股份有限公司 Exposure machine and exposure method thereof
CN103513518A (en) * 2013-09-11 2014-01-15 浙江欧视达科技有限公司 Ultraviolet LED exposure machine optical exposure illumination system and ultraviolet LED exposure machine
CN103513518B (en) * 2013-09-11 2015-12-16 浙江欧视达科技有限公司 ultraviolet LED exposure machine optical exposure illumination system and ultraviolet LED exposure machine
CN113805436A (en) * 2021-06-11 2021-12-17 赣州中盛隆电子有限公司 A metamaterial-based exposure machine

Similar Documents

Publication Publication Date Title
JP3152230U (en) Exposure equipment
CN1841204A (en) External exposure device
CN201402366Y (en) Exposure machine
CN1948826A (en) Ultraviolet illuminating apparatus
KR20150066898A (en) Curing system that use UV-LED module
KR20180016730A (en) Display Screen Photocuring Equipment and Display Screen Photocuring Method
KR101350924B1 (en) Sealant Curing Device
KR20130128620A (en) Vision inspection apparatus comprising light emitting angle adjustable light part
CN102591157A (en) Exposure method and exposure apparatus
CN101876784B (en) Exposure machine and exposure method thereof
TWI408511B (en) Exposure machine and its exposure method
CN101937173A (en) Exposure method of exposure machine
CN201765435U (en) Exposure machine light source device
CN206848690U (en) A kind of high uniformity LED parallel exposing machine light-source systems
TW200532255A (en) Light irradiating apparatus
TWM363761U (en) Exposure machine
CN112808549A (en) Optical processing equipment
TWI421649B (en) Exposure machine light source device and its exposure method
CN107505815A (en) A kind of edge exposure device and edge exposure method
TWI529500B (en) Scanning UV-LED exposure device
KR20120068804A (en) Sealant curing apparatus
JP3154492U (en) Exposure equipment
CN204595428U (en) LED parallel exposing machine
TW201341979A (en) Exposure method
TW202001431A (en) Exposure device

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20100210

Termination date: 20120429