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HUP0101824A3 - Semiconductor process chamber electrode and method for making the same - Google Patents

Semiconductor process chamber electrode and method for making the same

Info

Publication number
HUP0101824A3
HUP0101824A3 HU0101824A HUP0101824A HUP0101824A3 HU P0101824 A3 HUP0101824 A3 HU P0101824A3 HU 0101824 A HU0101824 A HU 0101824A HU P0101824 A HUP0101824 A HU P0101824A HU P0101824 A3 HUP0101824 A3 HU P0101824A3
Authority
HU
Hungary
Prior art keywords
making
same
process chamber
semiconductor process
chamber electrode
Prior art date
Application number
HU0101824A
Other languages
English (en)
Original Assignee
Lam Res Corp Fremont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp Fremont filed Critical Lam Res Corp Fremont
Publication of HUP0101824A2 publication Critical patent/HUP0101824A2/hu
Publication of HUP0101824A3 publication Critical patent/HUP0101824A3/hu

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Plasma Technology (AREA)
HU0101824A 1998-06-19 1999-06-15 Semiconductor process chamber electrode and method for making the same HUP0101824A3 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/100,268 US6106663A (en) 1998-06-19 1998-06-19 Semiconductor process chamber electrode
PCT/US1999/013474 WO1999066533A1 (en) 1998-06-19 1999-06-15 Semiconductor process chamber electrode and method for making the same

Publications (2)

Publication Number Publication Date
HUP0101824A2 HUP0101824A2 (hu) 2001-10-28
HUP0101824A3 true HUP0101824A3 (en) 2001-11-28

Family

ID=22278908

Family Applications (1)

Application Number Title Priority Date Filing Date
HU0101824A HUP0101824A3 (en) 1998-06-19 1999-06-15 Semiconductor process chamber electrode and method for making the same

Country Status (15)

Country Link
US (2) US6106663A (hu)
EP (1) EP1090407B1 (hu)
JP (1) JP4565743B2 (hu)
KR (1) KR100557444B1 (hu)
CN (1) CN1258805C (hu)
AT (1) ATE460743T1 (hu)
AU (1) AU4568099A (hu)
DE (1) DE69942120D1 (hu)
HU (1) HUP0101824A3 (hu)
IL (1) IL140277A (hu)
MY (1) MY124608A (hu)
PL (1) PL195681B1 (hu)
RU (1) RU2212077C2 (hu)
TW (1) TW414971B (hu)
WO (1) WO1999066533A1 (hu)

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JP3257512B2 (ja) * 1998-06-26 2002-02-18 松下電器産業株式会社 高周波結合器、プラズマ処理装置及び方法
JP2000290777A (ja) * 1999-04-07 2000-10-17 Tokyo Electron Ltd ガス処理装置、バッフル部材、及びガス処理方法
US6415736B1 (en) * 1999-06-30 2002-07-09 Lam Research Corporation Gas distribution apparatus for semiconductor processing
US6399499B1 (en) * 1999-09-14 2002-06-04 Jeong Gey Lee Method for fabricating an electrode of a plasma chamber
US7141757B2 (en) * 2000-03-17 2006-11-28 Applied Materials, Inc. Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent
US8617351B2 (en) 2002-07-09 2013-12-31 Applied Materials, Inc. Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction
US6894245B2 (en) * 2000-03-17 2005-05-17 Applied Materials, Inc. Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
US7220937B2 (en) * 2000-03-17 2007-05-22 Applied Materials, Inc. Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination
US8048806B2 (en) 2000-03-17 2011-11-01 Applied Materials, Inc. Methods to avoid unstable plasma states during a process transition
US7196283B2 (en) 2000-03-17 2007-03-27 Applied Materials, Inc. Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface
US20020197402A1 (en) * 2000-12-06 2002-12-26 Chiang Tony P. System for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)
AU2002352262A1 (en) * 2001-06-29 2003-03-03 Tokyo Electron Limited Directed gas injection apparatus for semiconductor processing
US6984288B2 (en) * 2001-08-08 2006-01-10 Lam Research Corporation Plasma processor in plasma confinement region within a vacuum chamber
US6586886B1 (en) * 2001-12-19 2003-07-01 Applied Materials, Inc. Gas distribution plate electrode for a plasma reactor
US20040060514A1 (en) * 2002-01-25 2004-04-01 Applied Materials, Inc. A Delaware Corporation Gas distribution showerhead
US7217336B2 (en) * 2002-06-20 2007-05-15 Tokyo Electron Limited Directed gas injection apparatus for semiconductor processing
US6841943B2 (en) * 2002-06-27 2005-01-11 Lam Research Corp. Plasma processor with electrode simultaneously responsive to plural frequencies
TWI283899B (en) * 2002-07-09 2007-07-11 Applied Materials Inc Capacitively coupled plasma reactor with magnetic plasma control
US7141483B2 (en) * 2002-09-19 2006-11-28 Applied Materials, Inc. Nitrous oxide anneal of TEOS/ozone CVD for improved gapfill
US7456116B2 (en) 2002-09-19 2008-11-25 Applied Materials, Inc. Gap-fill depositions in the formation of silicon containing dielectric materials
US7431967B2 (en) * 2002-09-19 2008-10-07 Applied Materials, Inc. Limited thermal budget formation of PMD layers
US7901952B2 (en) * 2003-05-16 2011-03-08 Applied Materials, Inc. Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parameters
US7470626B2 (en) * 2003-05-16 2008-12-30 Applied Materials, Inc. Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
US7452824B2 (en) * 2003-05-16 2008-11-18 Applied Materials, Inc. Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters
US7795153B2 (en) * 2003-05-16 2010-09-14 Applied Materials, Inc. Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of selected chamber parameters
US7247218B2 (en) * 2003-05-16 2007-07-24 Applied Materials, Inc. Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias power
US7910013B2 (en) 2003-05-16 2011-03-22 Applied Materials, Inc. Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
KR20050013734A (ko) * 2003-07-29 2005-02-05 삼성전자주식회사 플라즈마 식각장치
US20050103267A1 (en) * 2003-11-14 2005-05-19 Hur Gwang H. Flat panel display manufacturing apparatus
JP4707959B2 (ja) * 2004-02-20 2011-06-22 日本エー・エス・エム株式会社 シャワープレート、プラズマ処理装置及びプラズマ処理方法
US20050223986A1 (en) * 2004-04-12 2005-10-13 Choi Soo Y Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition
US7642171B2 (en) * 2004-08-04 2010-01-05 Applied Materials, Inc. Multi-step anneal of thin films for film densification and improved gap-fill
CN100414671C (zh) * 2004-10-14 2008-08-27 宋国隆 一种晶片精准蚀刻的方法
US7480974B2 (en) * 2005-02-15 2009-01-27 Lam Research Corporation Methods of making gas distribution members for plasma processing apparatuses
US7359177B2 (en) 2005-05-10 2008-04-15 Applied Materials, Inc. Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output
US7928366B2 (en) 2006-10-06 2011-04-19 Lam Research Corporation Methods of and apparatus for accessing a process chamber using a dual zone gas injector with improved optical access
US7486878B2 (en) * 2006-09-29 2009-02-03 Lam Research Corporation Offset correction methods and arrangement for positioning and inspecting substrates
US8137463B2 (en) * 2007-12-19 2012-03-20 Applied Materials, Inc. Dual zone gas injection nozzle
TWI556309B (zh) * 2009-06-19 2016-11-01 半導體能源研究所股份有限公司 電漿處理裝置，形成膜的方法，和薄膜電晶體的製造方法
KR20110021654A (ko) * 2009-08-25 2011-03-04 가부시키가이샤 한도오따이 에네루기 켄큐쇼 미결정 반도체막의 제조방법, 및 반도체장치의 제조방법
US20110120375A1 (en) * 2009-11-23 2011-05-26 Jusung Engineering Co., Ltd. Apparatus for processing substrate
KR101612741B1 (ko) * 2010-03-08 2016-04-18 주성엔지니어링(주) 가스분배수단 및 이를 포함한 기판처리장치
US10658161B2 (en) * 2010-10-15 2020-05-19 Applied Materials, Inc. Method and apparatus for reducing particle defects in plasma etch chambers
US20120258555A1 (en) * 2011-04-11 2012-10-11 Lam Research Corporation Multi-Frequency Hollow Cathode and Systems Implementing the Same
US9941100B2 (en) * 2011-12-16 2018-04-10 Taiwan Semiconductor Manufacturing Company, Ltd. Adjustable nozzle for plasma deposition and a method of controlling the adjustable nozzle
US9018108B2 (en) 2013-01-25 2015-04-28 Applied Materials, Inc. Low shrinkage dielectric films
US9790596B1 (en) * 2013-01-30 2017-10-17 Kyocera Corporation Gas nozzle and plasma device employing same
US10465288B2 (en) * 2014-08-15 2019-11-05 Applied Materials, Inc. Nozzle for uniform plasma processing
JP6305314B2 (ja) * 2014-10-29 2018-04-04 東京エレクトロン株式会社 成膜装置およびシャワーヘッド
US10358721B2 (en) * 2015-10-22 2019-07-23 Asm Ip Holding B.V. Semiconductor manufacturing system including deposition apparatus
KR102553629B1 (ko) * 2016-06-17 2023-07-11 삼성전자주식회사 플라즈마 처리 장치

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US4637853A (en) * 1985-07-29 1987-01-20 International Business Machines Corporation Hollow cathode enhanced plasma for high rate reactive ion etching and deposition
JPS62299031A (ja) * 1986-06-18 1987-12-26 Nec Corp 平行平板型エツチング装置の電極構造
JPS634617A (ja) * 1986-06-24 1988-01-09 Mitsubishi Electric Corp 洗浄方法
US4854263B1 (en) * 1987-08-14 1997-06-17 Applied Materials Inc Inlet manifold and methods for increasing gas dissociation and for PECVD of dielectric films
US5074456A (en) * 1990-09-18 1991-12-24 Lam Research Corporation Composite electrode for plasma processes
JPH04316325A (ja) * 1991-04-15 1992-11-06 Mitsubishi Electric Corp プラズマ処理装置
KR100276093B1 (ko) * 1992-10-19 2000-12-15 히가시 데쓰로 플라스마 에칭방법
US5534751A (en) * 1995-07-10 1996-07-09 Lam Research Corporation Plasma etching apparatus utilizing plasma confinement
EP0821395A3 (en) * 1996-07-19 1998-03-25 Tokyo Electron Limited Plasma processing apparatus
US5849641A (en) * 1997-03-19 1998-12-15 Lam Research Corporation Methods and apparatus for etching a conductive layer to improve yield

Also Published As

Publication number Publication date
KR20010071535A (ko) 2001-07-28
HUP0101824A2 (hu) 2001-10-28
IL140277A (en) 2004-06-20
IL140277A0 (en) 2002-02-10
CN1323444A (zh) 2001-11-21
MY124608A (en) 2006-06-30
TW414971B (en) 2000-12-11
US20040173159A1 (en) 2004-09-09
EP1090407B1 (en) 2010-03-10
PL345159A1 (en) 2001-12-03
CN1258805C (zh) 2006-06-07
EP1090407A1 (en) 2001-04-11
PL195681B1 (pl) 2007-10-31
JP2002518842A (ja) 2002-06-25
JP4565743B2 (ja) 2010-10-20
KR100557444B1 (ko) 2006-03-17
ATE460743T1 (de) 2010-03-15
RU2212077C2 (ru) 2003-09-10
WO1999066533A1 (en) 1999-12-23
AU4568099A (en) 2000-01-05
US6106663A (en) 2000-08-22
DE69942120D1 (de) 2010-04-22
WO1999066533A9 (en) 2001-05-31

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