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GB1044308A - Electrodeposition of bright copper - Google Patents

Electrodeposition of bright copper

Info

Publication number
GB1044308A
GB1044308A GB1751564A GB1751564A GB1044308A GB 1044308 A GB1044308 A GB 1044308A GB 1751564 A GB1751564 A GB 1751564A GB 1751564 A GB1751564 A GB 1751564A GB 1044308 A GB1044308 A GB 1044308A
Authority
GB
United Kingdom
Prior art keywords
thio
urea
tetrahydropyranyl
sulphonic acid
primary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1751564A
Inventor
Karl-Wilhelm Sassenroth
Georg Jansen
Robert Brugger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Langbein Pfanhauser Werke AG
Original Assignee
Langbein Pfanhauser Werke AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Langbein Pfanhauser Werke AG filed Critical Langbein Pfanhauser Werke AG
Priority to GB1751564A priority Critical patent/GB1044308A/en
Priority to US366628A priority patent/US3322657A/en
Publication of GB1044308A publication Critical patent/GB1044308A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D309/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings
    • C07D309/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
    • C07D309/08—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D309/14—Nitrogen atoms not forming part of a nitro radical
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/02—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
    • C07D277/20—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D277/32—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D277/38—Nitrogen atoms
    • C07D277/42—Amino or imino radicals substituted by hydrocarbon or substituted hydrocarbon radicals
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/04—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
    • C07D307/18—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D307/22—Nitrogen atoms not forming part of a nitro radical
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

An aqueous copper plating electrolyte, comprising copper sulphate or fluoborate and sulphuric or fluoboric acid, contains an N-(tetrahydropyranyl -2) amide of a carboxylic or thiocarboxylic acid dissolved in the electrolyte as a primary brightening agent, and as a secondary brightening agent amines of the formula: <FORM:1044308/C6-C7/1> or ammonium ions of the formula: <FORM:1044308/C6-C7/2> where R1 is one of the cyclic radicals of tetrahydropyranyl, tetrahydrofuryl or thiazyl; R2 and R3 is H,alkyl,phenyl, 2-carboxyphenyl,4-hydroxyphenyl, 4-sulphophenyl,p-diphenyl,2-pyridyl,6,8-disulpho -2-naphthyl or the sulphonic acid radicals (CH2)n-SO3H,n being an integer from 0 to 4 and R4 is alkyl. N-propane-w-sulphonic acid may be substituted for H in the amide of the primary agent. Examples of the primary agent are any combination or: N-tetrahydropyranyl-2-(n-propane-w-sulphonic acid)-(thio) acetamide/propionamide/butyramide /benzamide/p-toluamide or -nicotinamide/ picolinamide/(thio) urea or N'-acetyl(thio)urea/carbethoxy (thio)urea/formyl(thio)urea/cyanothiourea/ carboxy(thio)urea/phenylsulphonyl(thio)-urea/nitro (thio)urea/allylthio-urea/phenylthiourea.
GB1751564A 1964-04-28 1964-04-28 Electrodeposition of bright copper Expired GB1044308A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB1751564A GB1044308A (en) 1964-04-28 1964-04-28 Electrodeposition of bright copper
US366628A US3322657A (en) 1964-04-28 1964-05-11 Electrodeposition of bright copper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1751564A GB1044308A (en) 1964-04-28 1964-04-28 Electrodeposition of bright copper

Publications (1)

Publication Number Publication Date
GB1044308A true GB1044308A (en) 1966-09-28

Family

ID=10096549

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1751564A Expired GB1044308A (en) 1964-04-28 1964-04-28 Electrodeposition of bright copper

Country Status (1)

Country Link
GB (1) GB1044308A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992013848A1 (en) * 1991-02-07 1992-08-20 Pfizer Inc. Lipoxygenase-inhibiting hydroxamic acid and n-hydroxyurea derivatives
CN115260121A (en) * 2022-08-04 2022-11-01 江苏梦得新材料科技有限公司 Electroplating intermediate and preparation method and application thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992013848A1 (en) * 1991-02-07 1992-08-20 Pfizer Inc. Lipoxygenase-inhibiting hydroxamic acid and n-hydroxyurea derivatives
CN115260121A (en) * 2022-08-04 2022-11-01 江苏梦得新材料科技有限公司 Electroplating intermediate and preparation method and application thereof
CN115260121B (en) * 2022-08-04 2024-03-22 江苏梦得新材料科技有限公司 Electroplating intermediate and preparation method and application thereof

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