GB999230A - Improvements in bright acid copper electroplating solutions - Google Patents
Improvements in bright acid copper electroplating solutionsInfo
- Publication number
- GB999230A GB999230A GB625264A GB625264A GB999230A GB 999230 A GB999230 A GB 999230A GB 625264 A GB625264 A GB 625264A GB 625264 A GB625264 A GB 625264A GB 999230 A GB999230 A GB 999230A
- Authority
- GB
- United Kingdom
- Prior art keywords
- copper
- compounds
- acid copper
- copper electroplating
- propane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D309/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings
- C07D309/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members
- C07D309/08—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D309/14—Nitrogen atoms not forming part of a nitro radical
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
Abstract
Copper plating baths are improved by adding compounds of general formula- <FORM:0999230/C6-C7/1> where X is O or S, R is hydrogen or propane-W-sulphonic acid, and R1 is an alkyl, aryl or other radical. The compounds are N-tetrahydropyranyl-2-substituted amides of carboxylic or thiocarboxylic acids. Examples of the amide or thioamide radical are acetamide, nicotinamide, acetylurea, thiourea, thiobutyramide, phenylthiourea, and nitrothiourea. These compounds may also have a propane-W-sulphonic acid group attached to R. The preferred copper baths are copper sulphate and free H2SO4, or copper fluoborate and fluoboric acid.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB625264A GB999230A (en) | 1964-02-14 | 1964-02-14 | Improvements in bright acid copper electroplating solutions |
US344838A US3287236A (en) | 1964-02-14 | 1964-02-14 | Electrodeposition of copper and solutions therefor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB625264A GB999230A (en) | 1964-02-14 | 1964-02-14 | Improvements in bright acid copper electroplating solutions |
Publications (1)
Publication Number | Publication Date |
---|---|
GB999230A true GB999230A (en) | 1965-07-21 |
Family
ID=9811159
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB625264A Expired GB999230A (en) | 1964-02-14 | 1964-02-14 | Improvements in bright acid copper electroplating solutions |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB999230A (en) |
-
1964
- 1964-02-14 GB GB625264A patent/GB999230A/en not_active Expired
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