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DE69127314D1 - Diamant-Halbleiteranordnung - Google Patents

Diamant-Halbleiteranordnung

Info

Publication number
DE69127314D1
DE69127314D1 DE69127314T DE69127314T DE69127314D1 DE 69127314 D1 DE69127314 D1 DE 69127314D1 DE 69127314 T DE69127314 T DE 69127314T DE 69127314 T DE69127314 T DE 69127314T DE 69127314 D1 DE69127314 D1 DE 69127314D1
Authority
DE
Germany
Prior art keywords
semiconductor device
diamond semiconductor
diamond
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69127314T
Other languages
English (en)
Other versions
DE69127314T2 (de
Inventor
Hiromu C O Itami Works Shiomi
Yoshiki C O Itami Nishibayashi
Naoji C O Itami Works Fujimori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Application granted granted Critical
Publication of DE69127314D1 publication Critical patent/DE69127314D1/de
Publication of DE69127314T2 publication Critical patent/DE69127314T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00—Diodes
    • H10D8/60—Schottky-barrier diodes 
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02373—Group 14 semiconducting materials
    • H01L21/02376—Carbon, e.g. diamond-like carbon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02373—Group 14 semiconducting materials
    • H01L21/02381—Silicon, silicon germanium, germanium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/02433—Crystal orientation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02436—Intermediate layers between substrates and deposited layers
    • H01L21/02439—Materials
    • H01L21/02441—Group 14 semiconducting materials
    • H01L21/02444—Carbon, e.g. diamond-like carbon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02527—Carbon, e.g. diamond-like carbon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/0257—Doping during depositing
    • H01L21/02573—Conductivity type
    • H01L21/02579—P-type
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/80—FETs having rectifying junction gate electrodes
    • H10D30/87—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
    • H10D62/8303—Diamond
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00—Diodes
    • H10D8/01—Manufacture or treatment
    • H10D8/051—Manufacture or treatment of Schottky diodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Bipolar Transistors (AREA)
DE69127314T 1990-05-17 1991-05-10 Diamant-Halbleiteranordnung Expired - Fee Related DE69127314T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2128563A JP2961812B2 (ja) 1990-05-17 1990-05-17 半導体装置

Publications (2)

Publication Number Publication Date
DE69127314D1 true DE69127314D1 (de) 1997-09-25
DE69127314T2 DE69127314T2 (de) 1997-12-18

Family

ID=14987859

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69127314T Expired - Fee Related DE69127314T2 (de) 1990-05-17 1991-05-10 Diamant-Halbleiteranordnung

Country Status (4)

Country Link
US (1) US5252840A (de)
EP (1) EP0457508B1 (de)
JP (1) JP2961812B2 (de)
DE (1) DE69127314T2 (de)

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JPH04302172A (ja) * 1991-03-29 1992-10-26 Kobe Steel Ltd ダイヤモンドショットキーダイオード
US5371382A (en) * 1992-04-27 1994-12-06 Kobe Steel Usa, Inc. Amorphous silicon rectifying contact on diamond and method for making same
US5285084A (en) * 1992-09-02 1994-02-08 Kobe Steel Usa Diamond schottky diodes and gas sensors fabricated therefrom
US5362975A (en) * 1992-09-02 1994-11-08 Kobe Steel Usa Diamond-based chemical sensors
US5382812A (en) * 1993-04-14 1995-01-17 Kobe Development Corporation Diamond and II-VI heterojunction semiconductor light emitting device
DE4322650A1 (de) * 1993-07-07 1995-01-12 Siemens Ag Temperatursensor mit einem p-n-Übergang
JP4071833B2 (ja) * 1993-09-10 2008-04-02 住友電気工業株式会社 ダイヤモンド半導体デバイス
JP3563093B2 (ja) * 1993-09-24 2004-09-08 住友電気工業株式会社 半導体装置
JPH07161455A (ja) * 1993-12-09 1995-06-23 Sumitomo Electric Ind Ltd ダイヤモンドヒ−タ
US5536953A (en) * 1994-03-08 1996-07-16 Kobe Steel Usa Wide bandgap semiconductor device including lightly doped active region
JPH07283434A (ja) * 1994-04-07 1995-10-27 Kobe Steel Ltd ダイヤモンド発光素子
DE4415601C2 (de) * 1994-05-04 1997-12-18 Daimler Benz Ag Komposit-Struktur für elektronische Bauteile und Verfahren zu deren Herstellung
DE4415600A1 (de) * 1994-05-04 1995-11-30 Daimler Benz Ag Elektronisches Bauteil mit einer Halbleiter-Komposit-Struktur
EP0697726B1 (de) * 1994-08-03 2003-02-26 Sumitomo Electric Industries, Ltd. Kühlkörper aus synthetischer Diamantschicht
DE4427715C1 (de) * 1994-08-05 1996-02-08 Daimler Benz Ag Komposit-Struktur mit auf einer Diamantschicht und/oder einer diamantähnlichen Schicht angeordneter Halbleiterschicht sowie ein Verfahren zu deren Herstellung
JP3436278B2 (ja) * 1994-09-16 2003-08-11 住友電気工業株式会社 電界効果トランジスタ
US5592053A (en) * 1994-12-06 1997-01-07 Kobe Steel Usa, Inc. Diamond target electron beam device
DE19514546C2 (de) * 1995-04-20 2000-11-09 Daimler Chrysler Ag Elektronisches Bauteil mit einer Komposit-Struktur
DE19738512A1 (de) * 1997-09-03 1999-02-18 Daimler Benz Ag Diamantschicht eines mikroelektronischen Bauteils und Verfahren zu deren Herstellung
US6858080B2 (en) * 1998-05-15 2005-02-22 Apollo Diamond, Inc. Tunable CVD diamond structures
US6582513B1 (en) * 1998-05-15 2003-06-24 Apollo Diamond, Inc. System and method for producing synthetic diamond
KR20060122868A (ko) * 2003-11-25 2006-11-30 스미토모덴키고교가부시키가이샤 다이아몬드 ｎ형 반도체, 그의 제조 방법, 반도체 소자 및전자 방출 소자
DE102004006544B3 (de) * 2004-02-10 2005-09-08 Infineon Technologies Ag Verfahren zur Abscheidung eines leitfähigen Kohlenstoffmaterials auf einem Halbleiter zur Ausbildung eines Schottky-Kontaktes und Halbleiterkontaktvorrichtung
WO2005080645A2 (en) * 2004-02-13 2005-09-01 Apollo Diamond, Inc. Diamond structure separation
EP1779101A1 (de) * 2004-07-27 2007-05-02 Element Six Limited Diamantenelektroden
KR100636349B1 (ko) * 2004-09-24 2006-10-19 엘지전자 주식회사 마이크로렌즈 배열 시트 및 그 제작방법
US20060163584A1 (en) * 2005-01-26 2006-07-27 Robert Linares Boron-doped diamond semiconductor
DE102005028216A1 (de) 2005-06-17 2006-12-28 Siemens Ag Vorrichtung und Verfahren für die Computertomographie
JP4858948B2 (ja) * 2006-01-17 2012-01-18 独立行政法人産業技術総合研究所 不純物傾斜型ダイヤモンド薄膜及びその製造方法並びに該不純物傾斜型ダイヤモンド薄膜を用いたダイオード又はトランジスタ
US8030637B2 (en) 2006-08-25 2011-10-04 Qimonda Ag Memory element using reversible switching between SP2 and SP3 hybridized carbon
US20080102278A1 (en) 2006-10-27 2008-05-01 Franz Kreupl Carbon filament memory and method for fabrication
US7915603B2 (en) 2006-10-27 2011-03-29 Qimonda Ag Modifiable gate stack memory element
US20090050899A1 (en) * 2007-08-23 2009-02-26 National Institute of Advanced Industrial Scinece and Technology High-output diamond semiconductor element
JP2009059798A (ja) * 2007-08-30 2009-03-19 Sumitomo Electric Ind Ltd ダイヤモンド電子素子の製造方法
US7768016B2 (en) 2008-02-11 2010-08-03 Qimonda Ag Carbon diode array for resistivity changing memories
JP2009200343A (ja) * 2008-02-22 2009-09-03 Sumitomo Electric Ind Ltd ダイヤモンド電子素子
US7888171B2 (en) * 2008-12-22 2011-02-15 Raytheon Company Fabricating a gallium nitride layer with diamond layers
US7989261B2 (en) * 2008-12-22 2011-08-02 Raytheon Company Fabricating a gallium nitride device with a diamond layer
US7892881B2 (en) * 2009-02-23 2011-02-22 Raytheon Company Fabricating a device with a diamond layer
JP6444718B2 (ja) * 2014-12-15 2018-12-26 株式会社東芝 半導体装置
DE102021123907A1 (de) 2021-09-15 2023-03-16 Universität Siegen, Körperschaft des öffentlichen Rechts LED und Herstellungsverfahren dafür

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57121288A (en) * 1981-01-20 1982-07-28 Sanyo Electric Co Ltd Hall element
JPS58141572A (ja) * 1982-02-18 1983-08-22 Seiko Epson Corp 半導体装置
JPS59208821A (ja) * 1983-05-13 1984-11-27 Sumitomo Electric Ind Ltd 気相合成によるダイヤモンド半導体およびその製造方法
JPS59213126A (ja) * 1983-05-19 1984-12-03 Sumitomo Electric Ind Ltd ダイヤモンド半導体素子の製造法
JP2614868B2 (ja) * 1987-09-09 1997-05-28 導電性無機化合物技術研究組合 電界効果トランジスタの製造法
US4929986A (en) * 1987-09-25 1990-05-29 The United States Of America As Represented By The Secretary Of The Navy High power diamond traveling wave amplifier
US5006914A (en) * 1988-12-02 1991-04-09 Advanced Technology Materials, Inc. Single crystal semiconductor substrate articles and semiconductor devices comprising same
JPH02260470A (ja) * 1989-03-30 1990-10-23 Sumitomo Electric Ind Ltd 発光素子
JP2730271B2 (ja) * 1990-03-07 1998-03-25 住友電気工業株式会社 半導体装置
JP2813023B2 (ja) * 1990-03-13 1998-10-22 株式会社神戸製鋼所 Ｍｉｓ型ダイヤモンド電界効果トランジスタ

Also Published As

Publication number Publication date
EP0457508A3 (en) 1992-03-25
JP2961812B2 (ja) 1999-10-12
JPH0422172A (ja) 1992-01-27
DE69127314T2 (de) 1997-12-18
EP0457508A2 (de) 1991-11-21
US5252840A (en) 1993-10-12
EP0457508B1 (de) 1997-08-20

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: SUMITOMO ELECTRIC INDUSTRIES, LTD., OSAKA, JP

8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: WESER & KOLLEGEN, 81245 MUENCHEN

8328 Change in the person/name/address of the agent

Representative=s name: MEISSNER, BOLTE & PARTNER GBR, 80538 MUENCHEN

8339 Ceased/non-payment of the annual fee