CN1881093A - 光电导元件 - Google Patents
光电导元件 Download PDFInfo
- Publication number
- CN1881093A CN1881093A CNA2006100936765A CN200610093676A CN1881093A CN 1881093 A CN1881093 A CN 1881093A CN A2006100936765 A CNA2006100936765 A CN A2006100936765A CN 200610093676 A CN200610093676 A CN 200610093676A CN 1881093 A CN1881093 A CN 1881093A
- Authority
- CN
- China
- Prior art keywords
- layer
- image
- arylamine
- forming component
- electricity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000003384 imaging method Methods 0.000 claims abstract description 20
- 150000004982 aromatic amines Chemical class 0.000 claims abstract description 18
- 230000005540 biological transmission Effects 0.000 claims description 41
- 230000005611 electricity Effects 0.000 claims description 36
- 239000000203 mixture Chemical group 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 21
- 230000005525 hole transport Effects 0.000 claims description 19
- 239000003963 antioxidant agent Substances 0.000 claims description 16
- 230000003078 antioxidant effect Effects 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 13
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- 125000003118 aryl group Chemical group 0.000 claims description 9
- 150000001412 amines Chemical group 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 6
- 229910052736 halogen Inorganic materials 0.000 claims description 5
- 150000002367 halogens Chemical class 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 150000003512 tertiary amines Chemical class 0.000 claims 1
- 230000003647 oxidation Effects 0.000 abstract description 3
- 238000007254 oxidation reaction Methods 0.000 abstract description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 36
- 235000013824 polyphenols Nutrition 0.000 description 23
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 22
- 239000000463 material Substances 0.000 description 19
- 230000000903 blocking effect Effects 0.000 description 17
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 17
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 15
- 239000000047 product Substances 0.000 description 13
- 229920000515 polycarbonate Polymers 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- 235000006708 antioxidants Nutrition 0.000 description 11
- 229910052733 gallium Inorganic materials 0.000 description 11
- 150000002989 phenols Chemical class 0.000 description 11
- 239000000126 substance Substances 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 10
- 239000011230 binding agent Substances 0.000 description 10
- 125000004432 carbon atom Chemical group C* 0.000 description 10
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 9
- 239000000049 pigment Substances 0.000 description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- 239000004417 polycarbonate Substances 0.000 description 8
- 229920000728 polyester Polymers 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 230000004888 barrier function Effects 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 6
- 239000004411 aluminium Substances 0.000 description 6
- 150000001896 cresols Chemical class 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 229910044991 metal oxide Inorganic materials 0.000 description 6
- 150000004706 metal oxides Chemical class 0.000 description 6
- 108091008695 photoreceptors Proteins 0.000 description 6
- 230000000452 restraining effect Effects 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 5
- ZMXDDKWLCZADIW-UHFFFAOYSA-N Vilsmeier-Haack reagent Natural products CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- -1 phenolic aldehyde Chemical class 0.000 description 5
- QHPQWRBYOIRBIT-UHFFFAOYSA-N 4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C=C1 QHPQWRBYOIRBIT-UHFFFAOYSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 239000004425 Makrolon Substances 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 230000005494 condensation Effects 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 4
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 4
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 4
- 125000005259 triarylamine group Chemical group 0.000 description 4
- ZPEAXUUOTZDLNC-UHFFFAOYSA-N 2,3-dimethyl-n,n-diphenylaniline Chemical class CC1=CC=CC(N(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1C ZPEAXUUOTZDLNC-UHFFFAOYSA-N 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000005041 Mylar™ Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 3
- 239000003377 acid catalyst Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229920002635 polyurethane Polymers 0.000 description 3
- 239000004814 polyurethane Substances 0.000 description 3
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 3
- 229910052711 selenium Inorganic materials 0.000 description 3
- 239000011669 selenium Substances 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 2
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical class C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
- 102100028175 Abasic site processing protein HMCES Human genes 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 101001006387 Homo sapiens Abasic site processing protein HMCES Proteins 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 229910001370 Se alloy Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- ZFVMWEVVKGLCIJ-UHFFFAOYSA-N bisphenol AF Chemical compound C1=CC(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C=C1 ZFVMWEVVKGLCIJ-UHFFFAOYSA-N 0.000 description 2
- 229940106691 bisphenol a Drugs 0.000 description 2
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 230000008030 elimination Effects 0.000 description 2
- 238000003379 elimination reaction Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Chemical class CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 238000005755 formation reaction Methods 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000007373 indentation Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 125000000654 isopropylidene group Chemical group C(C)(C)=* 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- SJHHDDDGXWOYOE-UHFFFAOYSA-N oxytitamium phthalocyanine Chemical compound [Ti+2]=O.C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 SJHHDDDGXWOYOE-UHFFFAOYSA-N 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920002239 polyacrylonitrile Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 229920000137 polyphosphoric acid Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 229920002717 polyvinylpyridine Polymers 0.000 description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 description 2
- 235000011152 sodium sulphate Nutrition 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000004809 thin layer chromatography Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- PFTAWBLQPZVEMU-DZGCQCFKSA-N (+)-catechin Chemical compound C1([C@H]2OC3=CC(O)=CC(O)=C3C[C@@H]2O)=CC=C(O)C(O)=C1 PFTAWBLQPZVEMU-DZGCQCFKSA-N 0.000 description 1
- MIZLGWKEZAPEFJ-UHFFFAOYSA-N 1,1,2-trifluoroethene Chemical group FC=C(F)F MIZLGWKEZAPEFJ-UHFFFAOYSA-N 0.000 description 1
- JEFSTMHERNSDBC-UHFFFAOYSA-N 1,2-dimethylcyclohexa-2,4-dien-1-ol Chemical compound CC1=CC=CCC1(C)O JEFSTMHERNSDBC-UHFFFAOYSA-N 0.000 description 1
- PCNMALATRPXTKX-UHFFFAOYSA-N 1,4-dimethylcyclohexa-2,4-dien-1-ol Chemical compound CC1=CCC(C)(O)C=C1 PCNMALATRPXTKX-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- ICKWICRCANNIBI-UHFFFAOYSA-N 2,4-di-tert-butylphenol Chemical class CC(C)(C)C1=CC=C(O)C(C(C)(C)C)=C1 ICKWICRCANNIBI-UHFFFAOYSA-N 0.000 description 1
- KUFFULVDNCHOFZ-UHFFFAOYSA-N 2,4-xylenol Chemical compound CC1=CC=C(O)C(C)=C1 KUFFULVDNCHOFZ-UHFFFAOYSA-N 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- WFNXYMSIAASORV-UHFFFAOYSA-N 2-[1-(2-hydroxyphenyl)cyclohexyl]phenol Chemical compound OC1=CC=CC=C1C1(C=2C(=CC=CC=2)O)CCCCC1 WFNXYMSIAASORV-UHFFFAOYSA-N 0.000 description 1
- PEHXKUVLLWGBJS-UHFFFAOYSA-N 2-[1-(2-hydroxyphenyl)ethyl]phenol Chemical compound C=1C=CC=C(O)C=1C(C)C1=CC=CC=C1O PEHXKUVLLWGBJS-UHFFFAOYSA-N 0.000 description 1
- PQUJCDXKEIHDCF-UHFFFAOYSA-N 6,8-dimethyl-4-oxochromene-2-carboxylic acid Chemical compound O1C(C(O)=O)=CC(=O)C2=CC(C)=CC(C)=C21 PQUJCDXKEIHDCF-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical group COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical class CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 1
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 1
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 1
- 240000002853 Nelumbo nucifera Species 0.000 description 1
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000005864 Sulphur Substances 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000005189 alkyl hydroxy group Chemical group 0.000 description 1
- 229920005603 alternating copolymer Polymers 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- ADRVNXBAWSRFAJ-UHFFFAOYSA-N catechin Natural products OC1Cc2cc(O)cc(O)c2OC1c3ccc(O)c(O)c3 ADRVNXBAWSRFAJ-UHFFFAOYSA-N 0.000 description 1
- 235000005487 catechin Nutrition 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229950001002 cianidanol Drugs 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 125000002243 cyclohexanonyl group Chemical group *C1(*)C(=O)C(*)(*)C(*)(*)C(*)(*)C1(*)* 0.000 description 1
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexyloxide Natural products O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000012217 deletion Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 229940113088 dimethylacetamide Drugs 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 235000018927 edible plant Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000003818 flash chromatography Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000005842 heteroatom Chemical class 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 230000033444 hydroxylation Effects 0.000 description 1
- 238000005805 hydroxylation reaction Methods 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- 150000002576 ketones Chemical group 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- YRZZLAGRKZIJJI-UHFFFAOYSA-N oxyvanadium phthalocyanine Chemical compound [V+2]=O.C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 YRZZLAGRKZIJJI-UHFFFAOYSA-N 0.000 description 1
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920003050 poly-cycloolefin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 125000006684 polyhaloalkyl group Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 239000013558 reference substance Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000002390 rotary evaporation Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- RNWHGQJWIACOKP-UHFFFAOYSA-N zinc;oxygen(2-) Chemical compound [O-2].[Zn+2] RNWHGQJWIACOKP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C215/00—Compounds containing amino and hydroxy groups bound to the same carbon skeleton
- C07C215/74—Compounds containing amino and hydroxy groups bound to the same carbon skeleton having hydroxy groups and amino groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0528—Macromolecular bonding materials
- G03G5/0532—Macromolecular bonding materials obtained by reactions only involving carbon-to-carbon unsatured bonds
- G03G5/0542—Polyvinylalcohol, polyallylalcohol; Derivatives thereof, e.g. polyvinylesters, polyvinylethers, polyvinylamines
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0528—Macromolecular bonding materials
- G03G5/0557—Macromolecular bonding materials obtained otherwise than by reactions only involving carbon-to-carbon unsatured bonds
- G03G5/056—Polyesters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0528—Macromolecular bonding materials
- G03G5/0557—Macromolecular bonding materials obtained otherwise than by reactions only involving carbon-to-carbon unsatured bonds
- G03G5/0564—Polycarbonates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0601—Acyclic or carbocyclic compounds
- G03G5/0612—Acyclic or carbocyclic compounds containing nitrogen
- G03G5/0614—Amines
- G03G5/06142—Amines arylamine
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0601—Acyclic or carbocyclic compounds
- G03G5/0612—Acyclic or carbocyclic compounds containing nitrogen
- G03G5/0614—Amines
- G03G5/06142—Amines arylamine
- G03G5/06144—Amines arylamine diamine
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0601—Acyclic or carbocyclic compounds
- G03G5/0612—Acyclic or carbocyclic compounds containing nitrogen
- G03G5/0614—Amines
- G03G5/06142—Amines arylamine
- G03G5/06144—Amines arylamine diamine
- G03G5/061443—Amines arylamine diamine benzidine
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/06—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being organic
- G03G5/0601—Acyclic or carbocyclic compounds
- G03G5/0618—Acyclic or carbocyclic compounds containing oxygen and nitrogen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/10—Bases for charge-receiving or other layers
- G03G5/102—Bases for charge-receiving or other layers consisting of or comprising metals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/142—Inert intermediate layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Emergency Medicine (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
包含光生层和输电层的光电导成像元件,其中输电层由包含最小化氧化的部分的芳基胺构成。
Description
技术领域
本公开内容总体上涉及成像元件,并且更具体地,本公开内容涉及由输电层构成的单层和多层光电导成像元件,该输电层包含输电组分或化合物,特别是包括诸如芳基胺和抗氧剂官能团两种传输的空穴传输组分,以因此能够实现输电层的输电和抗氧剂特性两者。
背景技术
本公开内容总体上涉及成像元件,并且更具体地,本公开内容涉及由输电层构成的单层和多层光电导成像元件,该输电层包含输电组分或化合物,特别是包括诸如芳基胺和抗氧剂官能团两种传输的空穴传输组分,以因此能够实现输电层的输电和抗氧剂特性两者。电荷,且更特别地,空穴传输层可以由叔芳基胺和酚组分构成的分子构成,并且该分子可以例如由双(羟基烷基)-三芳基胺和苯酚在酸催化剂存在下的缩合制备,并且其中产生的分子耐图像删除和也被保护免受氧化。空穴传输分子的氧化可引起侧电荷迁移,例如来自差的耐电晕放电性,并且另外当这种层经受热量时组分如抗氧剂可从输电层逸出。可以将在此说明的抗氧剂采用有效的合适数量,如不有害地影响成像元件电特性的那些数量加入输电层。最小化抗氧剂在例如加热期间逸出和高残余电势的缺点,并且在许多情况下避免采用本公开内容的元件。
本公开内容的元件也可包含由在酚醛树脂/酚醛树脂共混物或酚醛树脂/酚类化合物共混物中分散的例如金属氧化物如二氧化钛构成的空穴阻挡层,如底涂层(UCL)。更具体地,与支撑衬底接触的空穴阻挡层可位于支撑衬底和光生层之间,它由例如美国专利5,482,811的光生颜料,特别是V型羟基镓酞菁,和通常无金属酞菁、金属酞菁、苝、钛氧基酞菁、硒、硒合金、偶氮颜料、squaraines等构成。本公开内容的成像元件在实施方案中显示在此说明的许多优点和优异的循环/环境稳定性;和在延长的时间内基本没有不利变化的性能;低且优异的V低,它是在某些曝光之后成像元件的表面电势。当光生层位于空穴传输层和在衬底上沉积的空穴阻挡层之间时,光响应或光电导成像元件可以带负电。
成像,特别是静电复印成像和印刷,包括数字印刷的工艺也包括在本公开内容内。更具体地,本公开内容的层状光电导成像元件可以选择用于许多不同的已知成像和印刷工艺,该工艺包括例如电子照相成像工艺,特别是静电复印成像和印刷工艺,其中采用适当电荷极性的调色剂组合物使带电的潜像可见。成像元件在实施方案中对例如约500-约900纳米,和特别地约650-约850纳米的波长敏感,因此二极管激光器可以选择作为光源。此外,本公开内容的成像元件用于彩色静电复印应用,特别是高速彩色复印和印刷工艺。
在美国专利6,015,645中说明的是由支撑衬底、空穴阻挡层、任选的粘合层、光生层和输电层构成的光电导成像元件,并且其中阻挡层由例如聚卤代烷基苯乙烯构成。
在美国专利6,255,027,6,177,219和6,156,468中说明的是例如包括分散在基料中的多个光散射粒子的空穴阻挡层的感光体,例如参考美国专利6,156,468的实施例I,其中说明了在购自OxyChemCompany的VARCUM的具体线性酚醛基料中分散的二氧化钛的空穴阻挡层。
发明内容
本公开内容的特征是提供具有许多在此说明的优点,如最小的暗注射、优异的光诱导放电特性、循环和环境稳定性及来自电荷载流子暗注射的可接受电荷缺陷点水平的成像元件。
此外,在本公开内容的另一个特征中提供由如下物质构成的空穴阻挡层:二氧化钛、酚醛树脂/酚类化合物共混物或酚醛树脂/酚醛树脂共混物,该共混物由第一线性,或第一非线性酚醛树脂和第二酚醛树脂或酚类化合物构成,该第二酚醛树脂或酚类化合物包含至少约2,如约2,约2-约12,约2-约10,约3-约8,约4-约7个等酚基团,并且将该阻挡层施加到例如铝的转鼓上和在例如约135℃-约165℃的高温度下固化。
具体实施方式
在此说明的是由酚类化合物构成的阻挡层,该酚类化合物包含至少两个,和更具体地约2-约10,和仍然更具体地约4-约7个酚基团,如双酚S、A、E、F、M、P、Z、六氟双酚A、间苯二酚、对苯二酚、儿荼素、与包含酚基团的酚醛树脂共混的重均分子量为约500-约2,000的较低分子量酚醛树脂,并且其中得到约95-约98%,或在实施方案中至多100%的固化混合物。酚醛树脂包括含有苯酚和/或甲酚和/或对-叔丁基苯酚和/或双酚A的甲醛聚合物,如VARCUMTM29159和29112(OxyChem Co.),DURITETM P-97(Borden Chemical)和AROFENETM 986-Z1-50(Ashland Chemical)。
本公开内容的各方面涉及由支撑衬底、在其上的任选空穴阻挡层、光生层和输电层构成的光电导成像元件,并且其中输电层由具有三芳基胺和苯酚链段两者的新颖耐性分子构成;由支撑衬底、光生层和在此说明的空穴传输层构成的光电导成像元件,并且其中传输层可以由双(羟基甲基)-三芳基胺与苯酚在热存在下和在催化剂存在下缩合产生,并且其中获得的光电导元件具有优异的时间零电势,和以下说明的改进的耐删除性;光电导成像元件,其中光生层的厚度为约0.05-约10微米;光电导成像元件,其中电荷如空穴传输层的厚度为约10-约50微米;光电导成像元件,其中光生层由在树脂基料中以约5wt%-约95wt%的数量分散的光生颜料构成;光电导成像元件,其中在实施方案中光生树脂基料选自氯乙烯、醋酸乙烯酯和含羟基和/或酸的单体的共聚物,聚酯、聚乙烯醇缩丁醛、聚碳酸酯、聚苯乙烯-b-聚乙烯基吡啶、和聚乙烯醇缩甲醛及其混合物;由光生层和输电层构成的光电导成像元件,并且其中输电层由包含抗氧剂部分的芳基胺、如下通式的化合物构成:
其中Q表示空穴传输芳族叔胺部分,X表示二价基团,每个R是氢原子、烷基或芳基,和n表示基团的数目;由光生组分和输电物构成的光电导元件,该输电物由空穴传输分子和包含抗氧剂基团的叔芳基胺构成;光电导成像元件,其中芳基胺烷基是甲基,其中卤素是氯,和其中树脂基料选自聚碳酸酯和聚苯乙烯;光电导成像元件,其中芳基胺是N,N′-二苯基-N,N-双(3-甲基苯基)-1,1′-联苯基-4,4′-二胺;烷基羟基镓,和其中光生层由酞菁、羟基镓酞菁、或其混合物;和更具体地,V型羟基镓酞菁构成;其中空穴阻挡层由甲酚和苯酚构成;采用4,4′-(1-甲基亚乙基)双酚产生的甲醛聚合物;采用甲酚和苯酚形成的甲醛聚合物;和采用苯酚和对-叔丁基苯酚产生的甲醛聚合物;约4-约50wt%的酚类化合物;约1-约99wt%第一酚醛树脂和约99-约1wt%第二酚醛树脂,并且其中其总量是约100%;空穴阻挡层的厚度为约0.01-约30微米;空穴阻挡层由金属氧化物、两种酚醛树脂的共混物和掺杂剂构成;和空穴阻挡层,其中酚醛树脂由重均分子量为约500-约2,000的第一树脂和重均分子量为约2,500-约20,000的第二树脂构成,并且其中将阻挡层提供在铝转鼓上,随后在约135℃-约190℃的温度下热固化;用于本公开内容的成像元件的阻空穴或底涂层包含金属氧化物,如钛、铬、锌、锡等,酚类化合物和酚醛树脂的混合物或2种酚醛树脂和任选掺杂剂如SiO2的混合物。酚类化合物包含至少两个酚基团,如双酚A(4,4′-亚异丙基二苯酚),E(4,4′-亚乙基双酚),F(双(4-羟苯基)甲烷),M(4,4′-(1,3-亚苯基二亚异丙基)双酚),P(4,4′-(1,4-亚苯基二亚异丙基)双酚),S(4,4′-磺酰基二苯酚),和Z(4,4′-亚环己基双酚);六氟双酚A(4,4′-(六氟亚异丙基)二苯酚),间苯二酚,对苯二酚,儿茶素等。
空穴阻挡层由例如约20wt%-约80wt%,更具体地约55wt%-约65wt%金属氧化物,如TiO2,约20wt%-约70wt%,更具体地约25wt%-约50wt%酚醛树脂,约2wt%-约20wt%,更具体地约5wt%-约15wt%优选包含至少两个酚基团的酚类化合物,如双酚S,和约2wt%-约15wt%,更具体地约4wt%-约10wt%夹板抑制掺杂剂,如SiO2构成。空穴阻挡层涂料分散体可以例如制备如下。首先由球磨或动态磨(dynomilling)制备金属氧化物/酚醛树脂分散体,直到分散体中金属氧化物的中值粒度小于约10纳米,例如约5-约9。向以上分散体中加入酚类化合物和掺杂剂,随后混合。空穴阻挡层涂料分散体可以由浸涂或网涂施涂,并且层可以在涂覆之后热固化。获得的空穴阻挡层的厚度例如为约0.01微米-约30微米,和更具体地,约0.1微米-约8微米。酚醛树脂的例子包括含有苯酚、对叔丁基苯酚、甲酚的甲醛聚合物,如VARCUMTM 29159和29101(OxyChemCompany)和DURITETM 97(Borden Chemical),含有氨、甲酚和苯酚的甲醛聚合物,如VARCUMTM 29112(OxyChem Company),含有4,4′-(1-甲基亚乙基)双酚的甲醛聚合物,如VARCUMTM 29108和29116(OxyChem Company),含有甲酚和苯酚的甲醛聚合物,如VARCUMTM 29457(OxyChem Company),DURITETM SD-423A,SD-422A(Borden Chemical),或含有苯酚和对叔丁基苯酚的甲醛聚合物,如DURITETM ESD 556C(Border Chemical)。
参考如下通式说明输电组分和分子的例子,其中Q表示空穴传输芳族叔胺部分,X表示二价基团,每个R是氢原子或例如1-约25个碳原子的烷基或例如6-约36个碳原子的芳基,和n表示重复链段的数目,例如n可以是约1-约4的数目。
Q的例子是选自如下的芳基胺:
其中R1-R19独立地选自氢原子、例如1-约10个碳原子的烷基、例如1-约10个碳原子的环烷基、例如1-约7个碳原子的烷氧基,卤素原子及其混合物。
X的例子是例如1-约15,和更具体地4-约12个碳原子,任选地进一步包含杂原子的二价烃基,该杂原子选自例如氧、硫、硅、和氮。
输电抗氧剂组分的具体例子由如下通式表示:
在实施方案中,光电导成像元件可以采用如下顺序包括支撑衬底、粘合层、光生层和输电层,并且其中输电层是空穴传输层。电荷如空穴传输层可以由已知的方法产生,和更具体地由双过程涂覆方法产生。带有三芳基胺官能团和至少一个抗氧剂基团如酚基团的空穴传输分子通常在空穴传输层的第二过程中存在,而带有至少一个三芳基胺分子的空穴传输分子在第一过程中存在。在产生空穴传输层的第一过程中,选择如下通式的至少一种芳基胺分子:
其中X选自烷基和卤素。
选择用于本公开内容的成像元件的衬底层(该衬底可以是不透明或基本透明的)的说明性例子包括绝缘材料层,该绝缘材料包括无机或有机聚合物材料,如MYLAR市售聚合物,包含钛的MYLAR,具有半导表面层的有机或无机材料层,如氧化铟锡,或在其上布置的铝,或包括铝、铬、镍或黄铜等的导电材料。衬底可以是柔性、无缝或刚性的,并可具有许多不同的构造,例如板、圆筒形转鼓、卷轴、环状柔性带等。在一个实施方案中,衬底的形式为无缝柔性带。在一些状况下,可能需要在衬底的背面上进行涂覆,特别是当衬底是柔性有机聚合物材料时,例如以MAKROLON市售的聚碳酸酯材料。
衬底层的厚度依赖于包括经济考虑的许多因素,因此此层可以具有相当的厚度,例如超过3,000微米,或具有最小厚度,条件是对元件没有显著的不利影响。在实施方案中,此层的厚度为约75微米-约300微米。
光生层例如可以由羟基镓酞菁V型构成,在实施方案中由例如约60wt%V型和约40wt%树脂基料如聚氯乙烯醋酸乙烯酯共聚物如VMCH(Dow Chemical)构成。光生层可包含已知的光生颜料,如金属酞菁、无金属酞菁、烷基羟基镓酞菁、羟基镓酞菁、苝,特别是双(苯并咪唑并)苝、钛氧基酞菁等,和更具体地为氧钒基酞菁、V型羟基镓酞菁,和无机级分如硒、硒合金,和三角硒。光生颜料可以在相似于选择用于输电层的树脂基料的树脂基料中分散,或者不存在树脂基料。通常,光生层的厚度依赖于许多因素,该因素包括其它层的厚度和光生层中包含的光生材料的数量。因此,例如当光生组合物的存在数量为约30-约75体积%时,此层的厚度可以为例如约0.05微米-约10微米,和更具体地为约0.25微米-约2微米。此层的最大厚度在实施方案中主要依赖于下列因素,如感光性、电性能和机械考虑。光生层基料树脂以各种合适的数量,例如约1-约50wt%,和更具体地约1-约10wt%存在,可以选自许多已知的聚合物,如聚(乙烯醇缩丁醛)、聚(乙烯基咔唑)、聚酯、聚碳酸酯、聚(氯乙烯)、聚丙烯酸酯和甲基丙烯酸酯、氯乙烯和醋酸乙烯酯的共聚物、酚醛树脂、聚氨酯、聚(乙烯醇)、聚丙烯腈、聚苯乙烯等。需要选择基本不扰乱或不利地影响器件的其它先前涂覆层的涂料溶剂。可以选择用作光生层用涂料溶剂的溶剂的例子是酮、醇、芳烃、卤代脂族烃、醚、胺、酰胺、酯等。具体的例子是环己酮、丙酮、甲乙酮、甲醇、乙醇、丁醇、戊醇、甲苯、二甲苯、氯苯、四氯化碳、氯仿、二氯甲烷、三氟乙烯、四氢呋喃、二烷、乙醚、二甲基甲酰胺、二甲基乙酰胺、乙酸丁酯、乙酸乙酯、乙酸甲氧基乙酯等。
光生层的涂覆在本公开内容的实施方案中可以采用喷涂、浸涂或绕线棒涂方法完成,使得在例如约40℃-约150℃下干燥约15-约90分钟之后,光生层的最终干燥厚度是例如约0.01-约30微米,和更具体为约0.1-约15微米。
可以选择用于光生层的聚合物基料材料的说明性例子如在此所示,并包括在美国专利3,121,006中公开的那些聚合物。通常,用于光生层的聚合物基料的有效数量为光生层的约0-约95wt%,和优选约25-约60wt%。
作为通常与空穴阻挡层接触的任选的粘合层,可以选择各种已知的物质,该物质包括聚酯、聚酰胺、聚(乙烯醇缩丁醛)、聚(乙烯醇)、聚氨酯和聚丙烯腈。此层的厚度为例如约0.001微米-约1微米。任选地,此层可包含有效的合适数量,例如约1-约10wt%的导电和非导电粒子,如氧化锌、二氧化钛、氮化硅、炭黑等,以例如在本公开内容的实施方案中提供另外所需的电和光学性能。
用于传输层的基料材料的例子包括诸如在美国专利3,121,006中描述的那些组分。聚合物基料材料的具体例子包括聚碳酸酯、丙烯酸酯聚合物、乙烯基聚合物、纤维素聚合物、聚酯、聚硅氧烷、聚酰胺、聚氨酯、聚(环烯烃)和环氧类以及其嵌段、无规或交替共聚物。优选的电非活性基料由分子量为约20,000-约100,000的聚碳酸酯树脂构成,约50,000-约100,000的分子量Mw是特别优选的。通常,传输层包含约10-约75wt%输电材料,和更具体地,约35%-约50%此材料。
此外,在其方面公开了在此说明的通式的新颖组分和输电分子,并且该分子可以由双(羟基亚烷基)-三芳基胺和苯酚在酸催化剂存在下缩合制备。例如,将下列物质的混合物:二取代苯酚如2,6-二甲基苯酚、2,4-二甲基苯酚、2,6-二叔丁基苯酚、2,4-二叔丁基苯酚等,羟基化三芳基胺如4,4′-二羟基亚甲基三苯基胺,4,4′-二羟基亚甲基-4″-三苯基胺、4,4′-二羟基甲基-3″4″-二甲基-三苯基胺等,和例如占反应物总量约0.5-约5wt%,和更具体地,占反应物总量约1-约3wt%数量的酸催化剂如草酸、盐酸、多磷酸等,和例如占反应物总量约5-约20wt%,更具体地占反应物总量约8-约15%的任选的少量溶剂,如甲苯、二甲苯等搅拌和在氩气下在约50℃-约120℃下加热。此反应的进展随后为薄层色谱(TLC);反应在约1-约8小时内完成。由如下方式分离产物:采用有机溶剂如乙醚、甲苯、二氯甲烷等稀释产物,采用蒸馏水洗涤获得的溶液和然后通过硫酸钠干燥,随后除去过量溶剂和采用快速柱色谱收集产物。或者,获得的产物可以由从甲苯的重结晶精制。反应产物的收率是例如约33-约50%。获得的产物的结构可以由1H NMR确认。
参考如下反应式举例说明具体的反应序列:
其中取代基如在此所说明。
在实施方案中还公开了成像元件,其中所述输电物是另外包含聚合物基料的空穴传输物。
此外,在实施方案中公开了成像元件,其中所述聚合物基料作为单个组分在输电层混合物中存在。
在实施方案中还公开了以如下顺序由支撑衬底、粘合层、所述光生层和所述输电层构成的成像元件,并且其中输电层是空穴传输层。
此外,在实施方案中公开了成像元件,其中粘合层由Mw为约45,000-约75,000,和Mn为约30,000-约40,000的聚酯构成。
在实施方案中还公开了另外包含支撑衬底的成像元件,该支撑衬底由铝、铝化聚对苯二甲酸乙二醇酯或钛化聚对苯二甲酸乙二醇酯的导电金属衬底构成。
在实施方案中还公开了成像元件,其中所述光生层的厚度为约0.05-约10微米,并且其中所述传输层的厚度为约10-约50微米。
在实施方案中还公开了成像元件,其中光生层由在树脂基料中分散的光生颜料或多种光生颜料构成,并且其中所述颜料或多种颜料存在的数量为约5wt%-约95wt%,和其中树脂基料选自氯乙烯/醋酸乙烯酯共聚物、聚酯、聚乙烯醇缩丁醛、聚碳酸酯、聚苯乙烯-b-聚乙烯基吡啶和聚乙烯醇缩甲醛。
此外,在实施方案中公开了成像元件,其中所述输电层由芳基胺构成。
此外,在实施方案中公开了成像元件,其中所述输电物包含选自聚碳酸酯、聚酯、聚醚和聚砜的聚合物基料。
在实施方案中还公开了成像元件,其中光生层由金属酞菁、或无金属酞菁构成。
在实施方案中还公开了成像元件,其中光生层由钛氧基酞菁、苝或羟基镓酞菁构成。
在实施方案中还公开了成像元件,其中光生层由V型羟基镓酞菁构成。
在实施方案中还公开了如下通式的化合物:
其中Q表示空穴传输芳族叔胺部分,X表示二价基团,每个R是氢原子、烷基或芳基,和n表示基团的数目。
此外,在实施方案中公开了上式化合物,其中n是1-约4的数。
在实施方案中还公开了成像元件,其中烷基包含1-约6个碳原子。
在实施方案中还公开了成像元件,其中n是1-约5的数目。
在实施方案中还公开了成像元件,其中烷基包含1-约10个碳原子,环烷基包含1-约10个碳原子,和烷氧基包含1-约7个碳原子。
实施例I
制备4,4′-双(羟基亚甲基)-3″,4″-二甲基三苯基胺
3,4-二甲基三苯基胺由已知的Ulmann缩合工艺制备。
将3,4-二甲基-TPA(162克)、氯化锌(80.76克)、DMF(129.94克)和ISOPARL(222克)的混合物加入到3升RB(圆底)烧瓶中。在氩气下采用搅拌将氧氯化磷(272.62克)滴加入反应混合物。将反应混合物加热到120℃并保持此温度12小时。然后将约500克N,N′-二甲基甲酰胺加入获得的混合物。将反应混合物冷却到约50℃,并采用机械搅拌倾倒入2.5升水中。将获得的沉淀物通过过滤收集和采用水(2升)洗涤两次,然后在甲苯中采用约150克酸性粘土回流。在粘土处理之后,收集甲苯溶液和采用约100克硅胶在室温,约23℃-约25℃下搅拌1小时。在脱除甲苯之后,收集产物和在40℃下干燥1小时。双缩甲醛胺的收率是141.3克(71%)。
将由以上工艺获得的4,4′-双(缩甲醛-3″,4″-二甲基-三苯基胺)(139克)与700毫升乙醇在装备磁力搅拌器和氩气引入管的1升3-颈圆底烧瓶中混合。向获得的悬浮液中加入0.1克NaOH和15.96克NaBH4。反应在室温下(25℃)进行1小时。将获得的溶液倾入2.5升水中,并将获得的淡黄色固体通过过滤收集,然后采用2升水洗涤。在40°下干燥过夜18-20小时,以97.4%收率产生137克粗产物。在甲苯(600毫升)中的重结晶并在室温高真空下干燥得到132.8克产物(94.4%纯度)。产物4,4′-双(羟基亚甲基)-3″,4″-二甲基三苯基胺的结构由1H NMR光谱确认。
实施例II
制备三芳基胺-苯酚空穴传输分子:
将2,6-二甲基苯酚(2.6877克)、4,4′-二羟基亚甲基-3″,4″-二甲基-TPA(3.3343克)、多磷酸(20克)和二甲苯(10毫升)的混合物在100毫升平底烧瓶中在氩气下于120℃下加热。反应进行1小时。将获得的反应混合物倾入到300毫升水中并搅拌12小时。将产物通过由从甲苯(3×80毫升)中萃取收集。将甲苯层采用DIW(蒸馏水)洗涤两次,采用盐水洗涤一次,并通过硫酸钠干燥。由旋转蒸发除去过量甲苯。从剩余的液体结晶的产物重2.5克(46%)。以上产物的结构由1H NMR光谱确认。
实施例III
制备三芳基胺-苯酚空穴传输分子:
将2,4-二甲基苯酚(1.344克)、4,4′-二羟基甲基-3″,4″-二甲基-TPA(II)(1.667克,5mmole)、草酸(0.013克)和10毫升甲苯的混合物在100毫升平底烧瓶中在氩气下在100℃下加热。反应进行6小时。终止反应并将获得的混合物采用20毫升醚稀释。将醚溶液采用DIW洗涤两次直到达到PH 7。在蒸走过量溶剂之后,将产物采用1/4丙酮/己烷在快闪柱中洗脱。收集以上所需产物0.9克(33%)。产物的结构由1H NMR光谱确认。
实施例IV
标准感光体器件(对照):
在75微米厚钛化MYLAR衬底上由拉棒技术涂覆从水解的γ氨基丙基三乙氧基硅烷形成的厚度为0.005微米的阻挡层。通过采用1∶50体积比混合3-氨基丙基三乙氧基硅烷与乙醇制备阻挡层涂料组合物。允许涂料在室温下干燥5分钟,随后在110℃下在强制空气烘箱中固化10分钟。在阻挡层的顶部上涂覆0.05微米厚粘合层,该粘合层从DuPont 49K(49,000)聚酯在二氯甲烷中的2wt%溶液制备。然后将0.2微米厚光生层在粘合层的顶部上采用绕丝棒从羟基镓酞菁V型(22份)和氯乙烯/醋酸乙烯酯共聚物,VMCH Mn=27,000,约86wt%氯乙烯,约13wt%醋酸乙烯酯和约1wt%从Dow Chemical购得的马来酸(18份)在960份乙酸正丁酯中的分散体涂覆,随后在100℃下干燥10分钟。随后,将24μm厚输电层(CTL)在以上光生层的顶部上通过拉棒从N,N′-二苯基-N,N-双(3-甲基苯基)-1,1′-联苯基-4,4′-二胺(49.5份),1份从Aldrich Chemicals购得的2,6-二叔丁基-4-甲基苯酚(BHT)和从Bayer购得的聚碳酸酯MAKROLON(Mw=52,000)(49.5份)在667份二氯甲烷中的溶液涂覆。将CTL在115℃下干燥30分钟。
实施例V
在第二过程CTL中含有三芳基胺-苯酚空穴传输分子的感光体器件:
感光体器件根据实施例IV制备。由实施例II的三芳基胺-苯酚空穴传输分子(0.6份)和购自Bayer的聚碳酸酯MAKROLON(Mw=52,000)(0.9份)在8.5份二氯甲烷中的溶液在器件顶部上涂覆第二CTL。在115℃下干燥第二CTL 20分钟得到5μm厚CTL。对该器件进行电和图像质量的评价。
以上制备的光电导成像元件和其它相似元件的静电复印电性能可以由已知方法确定,该方法包括采用电晕放电源使其表面带静电荷直到由连接到静电计的电容耦合探针测量的表面电势达到约-800伏的初始值。在黑暗中静置0.5秒之后,带电的元件达到Vddp的表面电势,即暗显影电势。然后使每个元件曝光于来自滤光氙灯的光,由此诱导光放电,该光放电导致表面电势降低到Vbg值,即背景电势。光放电的百分比计算为100×(Vddp-Vbg)/Vddp。由在灯前放置的滤光器的类型确定曝光所需波长和能量。使用窄带程滤光器确定单色光感光性。成像元件的感光性通常按照以尔格/cm2计的曝光能量提供,记作E1/2,要求从Vddp到它初始值一半达到50%光放电。感光性越高,E1/2值越小。E7/8数值对应于要求达到从Vddp的7/8光放电的曝光能量。将器件最终曝光于适当光强度的消除灯并测量任何残余电势(V残余)。采用780+/-10纳米波长的单色光曝光和600-800纳米波长的消除光及200尔格.cm2的强度测试成像元件。
侧图像迁移(LCM)由如下过程测量。将手涂覆的器件切割成6″×1″条。清洁条的一端(使用溶剂)以暴露衬底上的金属导电层。现在应当测量此层的电导率以保证在清洁期间不除去金属。万用表用于测量经过暴露的金属层的电阻(~1KOhm)。制备完全运行的85毫米DC12感光体转鼓以暴露裸铝的纵向条(0.5″×12″)。使用导电铜带将手涂覆的器件安装到8毫米DC12感光体转鼓以将器件的暴露导电端粘合到转鼓上的暴露铝条,由此完成到接地的导电途径。一旦安装之后,使用标准万用表以电阻模式测量器件到转鼓的电导率。在器件和转鼓之间的电阻应当类似于手涂覆器件上导电涂层的电阻。一旦确认,电导率足够高使得使用刻痕带固定器件端。采用刻痕带覆盖所有暴露的导电表面。将转鼓放入DocuColor 12并印刷包含特殊模板(1比特、2比特、3比特、4比特、5比特)的线。调节机器设定值(器件偏压、激光器功率、栅偏压)以在手涂覆器件上得到合适的印刷物。如果1比特线几乎不显示,则保存设定值并且印刷物成为参考物(预曝光印刷物)。将转鼓除去并放入通风橱,其中将特别制备的电晕管外壳安装到转鼓上。外壳允许在器件上有接近的空气紧密密封,且线离器件仅几毫米。使500μa(微安培)电流通过线在1Hz交流频率下运行20分钟。然后除去外壳和将转鼓放回入打印机并制备另一个印刷物,该印刷物将显示是否发生任何LCM。在延长的时间间隔内制备几个印刷物以显示在器件上曝光区域的恢复。
下表总结这些器件的电性能。
器件 | Vddp(-V) | E1/2(尔格/cm)2 | 暗衰减(V在500ms) | Vr(V) | 图像质量 |
对照器件 | 814 | 1.24 | 20 | 15 | 差(在曝光之后5分钟) |
在第二过程CTL(5μm)中具有三芳基胺-苯酚的器件 | 812 | 1.32 | 17 | 29 | 良好(在曝光之后5分钟) |
Claims (10)
1.由光生层和输电层构成的光电导成像元件,其中输电层由包含抗氧剂部分的芳基胺构成。
3.根据权利要求2的成像元件,其中所述Q选自
其中R1-R19独立地选自氢原子、烷基、环烷基、烷氧基和卤素及任选的其混合物。
5.根据权利要求1的成像元件,其中所述输电物包含空穴传输物,该空穴传输物包含如下通式的芳基胺:
其中X选自烷基和卤素及其混合物。
7.一种成像方法,包括在权利要求1的成像元件上产生潜像,显影图像,和将显影的图像转印到合适的衬底。
8.如下通式的化合物:
其中Q表示空穴传输芳族叔胺部分,X表示二价基团,每个R是氢原子、烷基或芳基,和n表示基团的数目。
9.根据权利要求1的成像元件,其中所述芳基胺包含如下通式的抗氧剂:
10.一种由光生组分构成的光电导元件,其中输电物由空穴传输分子和包含抗氧剂基团的叔芳基胺构成。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/153663 | 2005-06-15 | ||
US11/153,663 US7378204B2 (en) | 2005-06-15 | 2005-06-15 | Photoconductive member |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1881093A true CN1881093A (zh) | 2006-12-20 |
CN100565356C CN100565356C (zh) | 2009-12-02 |
Family
ID=37519328
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2006100936765A Expired - Fee Related CN100565356C (zh) | 2005-06-15 | 2006-06-14 | 光电导元件 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7378204B2 (zh) |
JP (1) | JP2006350350A (zh) |
CN (1) | CN100565356C (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101515122B (zh) * | 2008-02-21 | 2012-05-30 | 夏普株式会社 | 电子照相感光体、电子照相感光体的底涂层用涂布液及其制造方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7538175B2 (en) * | 2005-10-13 | 2009-05-26 | Xerox Corporation | Phenolic hole transport polymers |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4265990A (en) | 1977-05-04 | 1981-05-05 | Xerox Corporation | Imaging system with a diamine charge transport material in a polycarbonate resin |
US4921769A (en) | 1988-10-03 | 1990-05-01 | Xerox Corporation | Photoresponsive imaging members with polyurethane blocking layers |
US5473064A (en) | 1993-12-20 | 1995-12-05 | Xerox Corporation | Hydroxygallium phthalocyanine imaging members and processes |
US5521306A (en) * | 1994-04-26 | 1996-05-28 | Xerox Corporation | Processes for the preparation of hydroxygallium phthalocyanine |
US5482811A (en) | 1994-10-31 | 1996-01-09 | Xerox Corporation | Method of making hydroxygallium phthalocyanine type V photoconductive imaging members |
US5521043A (en) | 1995-05-05 | 1996-05-28 | Xerox Corporation | Hydroxygallium phthalocyanine pigments with block copolymer binders |
US6015645A (en) | 1998-05-29 | 2000-01-18 | Xerox Corporation | Photoconductive imaging members |
US6177219B1 (en) | 1999-10-12 | 2001-01-23 | Xerox Corporation | Blocking layer with needle shaped particles |
JP4000742B2 (ja) * | 2000-03-13 | 2007-10-31 | コニカミノルタホールディングス株式会社 | 電子写真感光体、画像形成方法、画像形成装置、及びプロセスカートリッジ |
US6156468A (en) | 2000-05-22 | 2000-12-05 | Xerox Corporation | Blocking layer with light scattering particles having rough surface |
US6255027B1 (en) | 2000-05-22 | 2001-07-03 | Xerox Corporation | Blocking layer with light scattering particles having coated core |
US6913862B2 (en) * | 2001-12-21 | 2005-07-05 | Canon Kabushiki Kaisha | Phenolic compound, novel resol resin, cured products thereof, electrophotographic photosensitive member containing them, and process cartridge and electrophotographic apparatus which have the electrophotographic photosensitive member |
US7037631B2 (en) | 2003-02-19 | 2006-05-02 | Xerox Corporation | Photoconductive imaging members |
US6967069B2 (en) * | 2003-04-09 | 2005-11-22 | Xerox Corporation | Photoconductive imaging members |
-
2005
- 2005-06-15 US US11/153,663 patent/US7378204B2/en not_active Expired - Fee Related
-
2006
- 2006-06-14 CN CNB2006100936765A patent/CN100565356C/zh not_active Expired - Fee Related
- 2006-06-14 JP JP2006164160A patent/JP2006350350A/ja not_active Withdrawn
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101515122B (zh) * | 2008-02-21 | 2012-05-30 | 夏普株式会社 | 电子照相感光体、电子照相感光体的底涂层用涂布液及其制造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2006350350A (ja) | 2006-12-28 |
US20060286472A1 (en) | 2006-12-21 |
CN100565356C (zh) | 2009-12-02 |
US7378204B2 (en) | 2008-05-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3882819T2 (de) | Arylamin enthaltende Polyhydroxyether-Harze. | |
JP3937836B2 (ja) | 電子写真感光体、該電子写真感光体を有するプロセスカートリッジ及び電子写真装置 | |
CN1749864A (zh) | 光电导成像元件 | |
JP2019211549A (ja) | 電子写真感光体、プロセスカートリッジ及び電子写真装置 | |
CN101000470A (zh) | 带有外涂层的感光体 | |
CN1949088B (zh) | 光电导元件 | |
JP2020134937A (ja) | 電子写真感光体、プロセスカートリッジおよび電子写真装置 | |
CN100476600C (zh) | 电子照相光电导体及其制造方法 | |
CN1351722A (zh) | 含有芴基-吖嗪染料衍生物作为电荷迁移添加剂的电子照相光电导体 | |
DE69608558T2 (de) | Haftungsverhindernde schicht für photoleitfähige elemente | |
CN1629736A (zh) | 用于感光体层的溶胶-凝胶法 | |
JP5549844B2 (ja) | 新規メチロール化合物とアルデヒド化合物、及び該メチロール化合物の製法 | |
CN1719341A (zh) | 成像元件 | |
CN1158576C (zh) | 有电荷产生粘结剂掺混物的光电导体 | |
CN100565356C (zh) | 光电导元件 | |
CN1862394A (zh) | 感光体 | |
CN1215573C (zh) | 电摄像感光件及其制备方法 | |
CN104035294B (zh) | 电子照相感光构件、电子照相设备、处理盒和稠合多环芳香族化合物 | |
CN1734356A (zh) | 聚碳酸酯和光电导成像元件 | |
JP2007164090A (ja) | 電子写真感光体および画像形成装置 | |
JP2014197173A (ja) | 電子写真感光体、電子写真装置、プロセスカートリッジ、および縮合多環芳香族化合物 | |
CN110352385A (zh) | 带正电电子照相感光体、电子照相盒及图像形成装置 | |
JP2003186214A (ja) | 電子写真感光体、該電子写真感光体を有するプロセスカートリッジ及び電子写真装置 | |
CN1632700A (zh) | 一种偶氮/酞菁复合单层有机光电导体及其制备方法 | |
JP2004020649A (ja) | 電子写真感光体及びその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20091202 Termination date: 20200614 |