CN1611495A - 含有环氧基团和查耳酮基团的化合物及其制备方法以及含有该化合物的光致抗蚀剂 - Google Patents
含有环氧基团和查耳酮基团的化合物及其制备方法以及含有该化合物的光致抗蚀剂 Download PDFInfo
- Publication number
- CN1611495A CN1611495A CNA2004100447717A CN200410044771A CN1611495A CN 1611495 A CN1611495 A CN 1611495A CN A2004100447717 A CNA2004100447717 A CN A2004100447717A CN 200410044771 A CN200410044771 A CN 200410044771A CN 1611495 A CN1611495 A CN 1611495A
- Authority
- CN
- China
- Prior art keywords
- compound
- colored resist
- colored
- resist composition
- styryl ketone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 116
- 150000001875 compounds Chemical class 0.000 title claims abstract description 108
- DQFBYFPFKXHELB-VAWYXSNFSA-N trans-chalcone Chemical group C=1C=CC=CC=1C(=O)\C=C\C1=CC=CC=C1 DQFBYFPFKXHELB-VAWYXSNFSA-N 0.000 title claims abstract description 82
- 125000003700 epoxy group Chemical group 0.000 title claims abstract description 40
- 238000000034 method Methods 0.000 title claims description 48
- 229920002120 photoresistant polymer Polymers 0.000 title abstract description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 23
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 18
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 18
- 125000005843 halogen group Chemical group 0.000 claims abstract description 18
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims abstract description 18
- 239000003795 chemical substances by application Substances 0.000 claims description 98
- 238000006243 chemical reaction Methods 0.000 claims description 41
- 239000002585 base Substances 0.000 claims description 35
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 34
- 229910052760 oxygen Inorganic materials 0.000 claims description 34
- 239000001301 oxygen Substances 0.000 claims description 34
- -1 alkali metal salt Chemical class 0.000 claims description 29
- 239000003960 organic solvent Substances 0.000 claims description 29
- 239000000049 pigment Substances 0.000 claims description 28
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 22
- 239000004925 Acrylic resin Substances 0.000 claims description 18
- TXFPEBPIARQUIG-UHFFFAOYSA-N 4'-hydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C=C1 TXFPEBPIARQUIG-UHFFFAOYSA-N 0.000 claims description 16
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 15
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 15
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 13
- 239000011159 matrix material Substances 0.000 claims description 12
- 229910052783 alkali metal Inorganic materials 0.000 claims description 11
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 claims description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Natural products CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 9
- 229940073735 4-hydroxy acetophenone Drugs 0.000 claims description 8
- 235000010290 biphenyl Nutrition 0.000 claims description 7
- 239000004973 liquid crystal related substance Substances 0.000 claims description 7
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims description 6
- SSOONFBDIYMPEU-UHFFFAOYSA-N [3-hydroxy-2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propyl] prop-2-enoate Chemical group OCC(CO)(CO)COCC(CO)(CO)COC(=O)C=C SSOONFBDIYMPEU-UHFFFAOYSA-N 0.000 claims description 6
- AUONHKJOIZSQGR-UHFFFAOYSA-N oxophosphane Chemical compound P=O AUONHKJOIZSQGR-UHFFFAOYSA-N 0.000 claims description 6
- 238000002360 preparation method Methods 0.000 claims description 6
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims description 6
- 239000006185 dispersion Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000001047 purple dye Substances 0.000 claims description 4
- 238000000935 solvent evaporation Methods 0.000 claims description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 4
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 3
- 238000000059 patterning Methods 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 2
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 claims description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims description 2
- 239000000908 ammonium hydroxide Substances 0.000 claims description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 2
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 claims description 2
- 239000001045 blue dye Substances 0.000 claims 1
- 239000001046 green dye Substances 0.000 claims 1
- 239000001044 red dye Substances 0.000 claims 1
- 239000001043 yellow dye Substances 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 229920001187 thermosetting polymer Polymers 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 36
- 239000002356 single layer Substances 0.000 description 18
- 239000011541 reaction mixture Substances 0.000 description 13
- 238000002474 experimental method Methods 0.000 description 12
- 230000008569 process Effects 0.000 description 12
- 238000002329 infrared spectrum Methods 0.000 description 11
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 10
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 241001237961 Amanita rubescens Species 0.000 description 8
- 238000001723 curing Methods 0.000 description 8
- 238000000635 electron micrograph Methods 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 7
- 230000007246 mechanism Effects 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 238000009998 heat setting Methods 0.000 description 5
- 150000003254 radicals Chemical class 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
- QPFYXYFORQJZEC-FOCLMDBBSA-N Phenazopyridine Chemical compound NC1=NC(N)=CC=C1\N=N\C1=CC=CC=C1 QPFYXYFORQJZEC-FOCLMDBBSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 229940070891 pyridium Drugs 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- 150000004881 2H-pyrans Chemical class 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- 230000003321 amplification Effects 0.000 description 2
- 239000001055 blue pigment Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000003760 hair shine Effects 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- CCGKOQOJPYTBIH-UHFFFAOYSA-N ketene group Chemical group C=C=O CCGKOQOJPYTBIH-UHFFFAOYSA-N 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 150000003527 tetrahydropyrans Chemical class 0.000 description 2
- QZZJTWAHFMBFSX-UHFFFAOYSA-N 2,4-bis(trichloromethyl)-1,3,5-triazine Chemical class ClC(Cl)(Cl)C1=NC=NC(C(Cl)(Cl)Cl)=N1 QZZJTWAHFMBFSX-UHFFFAOYSA-N 0.000 description 1
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 1
- 241000694440 Colpidium aqueous Species 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 150000002561 ketenes Chemical class 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229940067265 pigment yellow 138 Drugs 0.000 description 1
- 239000003495 polar organic solvent Substances 0.000 description 1
- 229920005596 polymer binder Polymers 0.000 description 1
- 239000002491 polymer binding agent Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000003847 radiation curing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- MDDUHVRJJAFRAU-YZNNVMRBSA-N tert-butyl-[(1r,3s,5z)-3-[tert-butyl(dimethyl)silyl]oxy-5-(2-diphenylphosphorylethylidene)-4-methylidenecyclohexyl]oxy-dimethylsilane Chemical compound C1[C@@H](O[Si](C)(C)C(C)(C)C)C[C@H](O[Si](C)(C)C(C)(C)C)C(=C)\C1=C/CP(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 MDDUHVRJJAFRAU-YZNNVMRBSA-N 0.000 description 1
- 238000001149 thermolysis Methods 0.000 description 1
- 238000004809 thin layer chromatography Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
- C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
- C07D303/20—Ethers with hydroxy compounds containing no oxirane rings
- C07D303/24—Ethers with hydroxy compounds containing no oxirane rings with polyhydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D407/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00
- C07D407/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having oxygen atoms as the only ring hetero atoms, not provided for by group C07D405/00 containing three or more hetero rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
- C08G59/245—Di-epoxy compounds carbocyclic aromatic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Epoxy Resins (AREA)
- Electroluminescent Light Sources (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Compounds (AREA)
Abstract
Description
彩色抗蚀剂图案 | x | y | Y |
红彩色抗蚀剂单层图案 | 0.6464 | 0.3420 | 21.90 |
绿彩色抗蚀剂单层图案 | 0.3012 | 0.5720 | 61.81 |
蓝彩色抗蚀剂单层图案 | 0.1380 | 0.1280 | 16.37 |
红彩色抗蚀剂多层图案 | 0.6397 | 0.3426 | 23.03 |
绿彩色抗蚀剂多层图案 | 0.3006 | 0.5699 | 61.90 |
蓝彩色抗蚀剂多层图案 | 0.1383 | 0.1302 | 16.63 |
彩色抗蚀剂图案 | x | y | Y |
红彩色抗蚀剂单层图案 | 0.6357 | 0.3424 | 23.73 |
绿彩色抗蚀剂单层图案 | 0.3104 | 0.5562 | 66.75 |
蓝彩色抗蚀剂单层图案 | 0.1437 | 0.1459 | 20.34 |
红彩色抗蚀剂多层图案 | 0.6345 | 0.3423 | 23.54 |
绿彩色抗蚀剂多层图案 | 0.2862 | 0.5677 | 57.45 |
蓝彩色抗蚀剂多层图案 | 0.1394 | 0.1298 | 16.66 |
Claims (35)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR75086/03 | 2003-10-27 | ||
KR1020030075086A KR101002935B1 (ko) | 2003-10-27 | 2003-10-27 | 에폭시기 및 찰콘기를 가지는 화합물, 이의 제조 방법 및이를 포함하는 포토레지스트 조성물 |
KR75086/2003 | 2003-10-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1611495A true CN1611495A (zh) | 2005-05-04 |
CN1611495B CN1611495B (zh) | 2010-12-08 |
Family
ID=34511104
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2004100447717A Expired - Fee Related CN1611495B (zh) | 2003-10-27 | 2004-05-18 | 含有环氧基团和查耳酮基团的化合物及其制备方法以及含有该化合物的光致抗蚀剂 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7067233B2 (zh) |
JP (1) | JP4723845B2 (zh) |
KR (1) | KR101002935B1 (zh) |
CN (1) | CN1611495B (zh) |
TW (1) | TW200514777A (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102741315A (zh) * | 2010-01-29 | 2012-10-17 | 日本化药株式会社 | 酚化合物、环氧树脂、环氧树脂组合物、预浸料及它们的固化物 |
CN104142532A (zh) * | 2014-05-30 | 2014-11-12 | 友达光电股份有限公司 | 彩色滤光片 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7358012B2 (en) | 2004-01-06 | 2008-04-15 | Sion Power Corporation | Electrolytes for lithium sulfur cells |
US10297827B2 (en) * | 2004-01-06 | 2019-05-21 | Sion Power Corporation | Electrochemical cell, components thereof, and methods of making and using same |
JP2013537699A (ja) | 2010-08-24 | 2013-10-03 | ビーエイエスエフ・ソシエタス・エウロパエア | 電気化学セルでの使用のための電解質材料 |
US8735002B2 (en) | 2011-09-07 | 2014-05-27 | Sion Power Corporation | Lithium sulfur electrochemical cell including insoluble nitrogen-containing compound |
US9577289B2 (en) | 2012-12-17 | 2017-02-21 | Sion Power Corporation | Lithium-ion electrochemical cell, components thereof, and methods of making and using same |
JP6344967B2 (ja) * | 2014-05-08 | 2018-06-20 | 東洋インキScホールディングス株式会社 | 感光性着色組成物、明度調整層、カラーフィルタ、およびカラー表示装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1447016C3 (de) * | 1963-10-25 | 1973-11-15 | Kalle Ag, 6202 Wiesbaden-Biebrich | Vorsensibilisierte Druckplatte |
US3410824A (en) * | 1965-03-19 | 1968-11-12 | Ralph B. Atkinson | Light sensitive resin from a dihydroxy chalcone and an epoxy prepolymer |
DE2256961A1 (de) * | 1972-11-21 | 1974-05-22 | Herbert Prof Dr Phil Koelbel | Duroplastisch haertbare mischung |
JPS6157610A (ja) | 1984-08-28 | 1986-03-24 | Japan Synthetic Rubber Co Ltd | 感光性共重合体およびその製造方法 |
JPH09100339A (ja) * | 1994-09-08 | 1997-04-15 | Sumitomo Chem Co Ltd | エポキシ樹脂組成物および樹脂封止型半導体装置 |
JP2002356619A (ja) * | 2001-05-29 | 2002-12-13 | Nippon Paint Co Ltd | 熱硬化性複合誘電体フィルム及びその製造方法 |
-
2003
- 2003-10-27 KR KR1020030075086A patent/KR101002935B1/ko not_active IP Right Cessation
-
2004
- 2004-03-24 US US10/807,861 patent/US7067233B2/en not_active Expired - Fee Related
- 2004-05-10 TW TW093113086A patent/TW200514777A/zh unknown
- 2004-05-18 CN CN2004100447717A patent/CN1611495B/zh not_active Expired - Fee Related
- 2004-10-27 JP JP2004311754A patent/JP4723845B2/ja not_active Expired - Lifetime
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102741315A (zh) * | 2010-01-29 | 2012-10-17 | 日本化药株式会社 | 酚化合物、环氧树脂、环氧树脂组合物、预浸料及它们的固化物 |
CN103980103A (zh) * | 2010-01-29 | 2014-08-13 | 日本化药株式会社 | 酚化合物、环氧树脂、环氧树脂组合物、预浸料及它们的固化物 |
CN102741315B (zh) * | 2010-01-29 | 2014-12-03 | 日本化药株式会社 | 酚化合物、环氧树脂、环氧树脂组合物、预浸料及它们的固化物 |
CN103980103B (zh) * | 2010-01-29 | 2017-04-12 | 日本化药株式会社 | 酚化合物、环氧树脂、环氧树脂组合物、预浸料及它们的固化物 |
CN104142532A (zh) * | 2014-05-30 | 2014-11-12 | 友达光电股份有限公司 | 彩色滤光片 |
Also Published As
Publication number | Publication date |
---|---|
US7067233B2 (en) | 2006-06-27 |
JP4723845B2 (ja) | 2011-07-13 |
KR20050039985A (ko) | 2005-05-03 |
JP2005133096A (ja) | 2005-05-26 |
US20050089793A1 (en) | 2005-04-28 |
TW200514777A (en) | 2005-05-01 |
CN1611495B (zh) | 2010-12-08 |
KR101002935B1 (ko) | 2010-12-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1285926C (zh) | 滤色片 | |
CN1079547C (zh) | 光敏树脂组合物 | |
CN1934497A (zh) | 负型感放射线性树脂组合物 | |
CN1234047C (zh) | 化学增幅光阻剂组成物 | |
CN1702553A (zh) | 感光性组合物 | |
CN1928716A (zh) | 感光性组合物 | |
CN1945429A (zh) | 感光性树脂组合物及层压体 | |
CN1833204A (zh) | 感光树脂组合物及用其制备的电子元件和显示装置 | |
CN100337160C (zh) | 感光性组合物以及滤色器 | |
CN1928715A (zh) | 感光性组合物 | |
CN1611495A (zh) | 含有环氧基团和查耳酮基团的化合物及其制备方法以及含有该化合物的光致抗蚀剂 | |
CN1282901C (zh) | 放射线敏感性组合物、黑色矩阵、颜色滤光片以及彩色液晶显示装置 | |
CN1727320A (zh) | 反应型二苯甲酮光引发剂及其制备方法 | |
CN104011595B (zh) | 用于彩色滤光片的光敏树脂组合物及使用其的彩色滤光片 | |
CN1221625C (zh) | 选择性吸光材料、含该材料的涂料组合物,和使用该涂料组合物制造的用于彩色显示器的滤光器 | |
CN1975471A (zh) | 黑色组合物及其制造方法 | |
CN1087442C (zh) | 能量射线硬化型树脂组合物及其制法 | |
CN1247550C (zh) | 含功能化烷基硫代基团的三嗪基化合物和光聚合引发剂 | |
CN1118629A (zh) | 着色感光性树脂组合物 | |
CN1856737A (zh) | 液态光敏成像阻焊剂组合物及其光敏成像阻焊膜 | |
CN1573369A (zh) | 感光性黑色组合物、使用该组合物的黑底基板和滤色器 | |
KR102018236B1 (ko) | 신규한 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터 | |
CN1627188A (zh) | 含有无机粉体的树脂组合物、转印膜和等离子体显示屏的制造方法 | |
CN1845912A (zh) | 哌嗪类敏化剂 | |
CN1945430A (zh) | 感光性树脂组合物及层压体 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SAMSUNG DISPLAY CO., LTD. Free format text: FORMER OWNER: SAMSUNG ELECTRONICS CO., LTD. Effective date: 20121102 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20121102 Address after: Gyeonggi Do, South Korea Patentee after: Samsung Display Co., Ltd. Address before: Gyeonggi Do, South Korea Patentee before: Samsung Electronics Co., Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20101208 Termination date: 20170518 |