CN108602839A - 制备有机氨基硅烷的方法;由有机氨基硅烷制备甲硅烷基胺的方法 - Google Patents
制备有机氨基硅烷的方法;由有机氨基硅烷制备甲硅烷基胺的方法 Download PDFInfo
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- CN108602839A CN108602839A CN201680080575.6A CN201680080575A CN108602839A CN 108602839 A CN108602839 A CN 108602839A CN 201680080575 A CN201680080575 A CN 201680080575A CN 108602839 A CN108602839 A CN 108602839A
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- organoaminosilane
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- independently
- hydrocarbon group
- compound
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- 238000000034 method Methods 0.000 title claims abstract description 76
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 title claims abstract description 45
- 150000001875 compounds Chemical class 0.000 claims abstract description 66
- 239000003054 catalyst Substances 0.000 claims abstract description 43
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 39
- 239000011777 magnesium Substances 0.000 claims abstract description 35
- 150000003335 secondary amines Chemical class 0.000 claims abstract description 34
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 30
- 238000002156 mixing Methods 0.000 claims abstract description 30
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000006227 byproduct Substances 0.000 claims abstract description 28
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 18
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 17
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 17
- 229910052796 boron Inorganic materials 0.000 claims abstract description 17
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims abstract description 14
- 239000000047 product Substances 0.000 claims abstract description 13
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- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 38
- VOSJXMPCFODQAR-UHFFFAOYSA-N trisilylamine group Chemical group [SiH3]N([SiH3])[SiH3] VOSJXMPCFODQAR-UHFFFAOYSA-N 0.000 claims description 27
- 150000003141 primary amines Chemical class 0.000 claims description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims description 20
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- OBAJXDYVZBHCGT-UHFFFAOYSA-N tris(pentafluorophenyl)borane Chemical group FC1=C(F)C(F)=C(F)C(F)=C1B(C=1C(=C(F)C(F)=C(F)C=1F)F)C1=C(F)C(F)=C(F)C(F)=C1F OBAJXDYVZBHCGT-UHFFFAOYSA-N 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 2
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- OLRJXMHANKMLTD-UHFFFAOYSA-N silyl Chemical compound [SiH3] OLRJXMHANKMLTD-UHFFFAOYSA-N 0.000 claims 1
- -1 secondary amine amine Chemical class 0.000 abstract description 23
- 229910000077 silane Inorganic materials 0.000 abstract description 3
- 238000006243 chemical reaction Methods 0.000 description 26
- 229910052736 halogen Inorganic materials 0.000 description 21
- 150000002367 halogens Chemical class 0.000 description 21
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- 101000868814 Homo sapiens Coiled-coil domain-containing protein 85B Proteins 0.000 description 9
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- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 description 9
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- 239000012280 lithium aluminium hydride Substances 0.000 description 8
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- 230000015572 biosynthetic process Effects 0.000 description 7
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- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 6
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- 125000000962 organic group Chemical group 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- 238000005481 NMR spectroscopy Methods 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
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- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052729 chemical element Inorganic materials 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000004817 gas chromatography Methods 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- OJGMBLNIHDZDGS-UHFFFAOYSA-N N-Ethylaniline Chemical compound CCNC1=CC=CC=C1 OJGMBLNIHDZDGS-UHFFFAOYSA-N 0.000 description 2
- QCOGKXLOEWLIDC-UHFFFAOYSA-N N-methylbutylamine Chemical compound CCCCNC QCOGKXLOEWLIDC-UHFFFAOYSA-N 0.000 description 2
- LJBCHBWJUUTTJN-UHFFFAOYSA-N N-propylsilylaniline Chemical compound C1(=CC=CC=C1)N[SiH2]CCC LJBCHBWJUUTTJN-UHFFFAOYSA-N 0.000 description 2
- MTRDDAMZXLHELN-UHFFFAOYSA-N N-silylbutan-2-amine Chemical compound C(C)(CC)N[SiH3] MTRDDAMZXLHELN-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 101150007604 TRIM44 gene Proteins 0.000 description 2
- 125000002015 acyclic group Chemical group 0.000 description 2
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- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
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- LROURFNSIOZMEN-UHFFFAOYSA-N magnesium;dioctylazanide Chemical compound [Mg+2].CCCCCCCC[N-]CCCCCCCC.CCCCCCCC[N-]CCCCCCCC LROURFNSIOZMEN-UHFFFAOYSA-N 0.000 description 2
- DQZLQYHGCKLKGU-UHFFFAOYSA-N magnesium;propane Chemical compound [Mg+2].C[CH-]C.C[CH-]C DQZLQYHGCKLKGU-UHFFFAOYSA-N 0.000 description 2
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- XIVWOLAEALPAOJ-UHFFFAOYSA-N magnesium di(icosyl)azanide Chemical compound C(CCCCCCCCCCCCCCCCCCC)N(CCCCCCCCCCCCCCCCCCCC)[Mg]N(CCCCCCCCCCCCCCCCCCCC)CCCCCCCCCCCCCCCCCCCC XIVWOLAEALPAOJ-UHFFFAOYSA-N 0.000 description 1
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- 125000001190 organyl group Chemical group 0.000 description 1
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- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- 125000003538 pentan-3-yl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940100684 pentylamine Drugs 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
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- 239000004814 polyurethane Substances 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
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- BHRZNVHARXXAHW-UHFFFAOYSA-N sec-butylamine Chemical compound CCC(C)N BHRZNVHARXXAHW-UHFFFAOYSA-N 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- LALRXNPLTWZJIJ-UHFFFAOYSA-N triethylborane Chemical compound CCB(CC)CC LALRXNPLTWZJIJ-UHFFFAOYSA-N 0.000 description 1
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- MXSVLWZRHLXFKH-UHFFFAOYSA-N triphenylborane Chemical compound C1=CC=CC=C1B(C=1C=CC=CC=1)C1=CC=CC=C1 MXSVLWZRHLXFKH-UHFFFAOYSA-N 0.000 description 1
- QFKMMXYLAPZKIB-UHFFFAOYSA-N undecan-1-amine Chemical compound CCCCCCCCCCCN QFKMMXYLAPZKIB-UHFFFAOYSA-N 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
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Abstract
Description
缩写 | 词语 |
g | 克 |
Me | 甲基 |
wt | 重量 |
% | 百分比 |
mol | 摩尔 |
hr | 小时 |
℃ | 摄氏度 |
μm | 微米 |
mm | 毫米 |
NA | 不适用 |
mL | 毫升 |
固含量 | (干燥样品的重量/初始样品的重量)×100如下所述确定 |
cm | 厘米 |
kPa | 千帕斯卡 |
kPag | 压力(以千帕斯卡表压计) |
DIPAC | 二异丙基氨基氯硅烷 |
DIPA | 二异丙基胺 |
DIPB | 二异丙基苯 |
TSA | 三甲硅烷基胺 |
DSA | 二甲硅烷基胺 |
TCS | 三氯硅烷 |
DiPB | 1,3-二异丙基苯 |
Claims (24)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201562269286P | 2015-12-18 | 2015-12-18 | |
US62/269286 | 2015-12-18 | ||
PCT/US2016/067152 WO2017106632A1 (en) | 2015-12-18 | 2016-12-16 | Method for making an organoaminosilane; a method for making a silylamine from the organoaminosilane |
Publications (2)
Publication Number | Publication Date |
---|---|
CN108602839A true CN108602839A (zh) | 2018-09-28 |
CN108602839B CN108602839B (zh) | 2021-06-29 |
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ID=57714710
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Application Number | Title | Priority Date | Filing Date |
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CN201680070868.6A Active CN108431012B (zh) | 2015-12-18 | 2016-12-16 | 三(乙硅烷基)胺 |
CN201680080583.0A Active CN108602840B (zh) | 2015-12-18 | 2016-12-16 | 高纯度三甲硅烷基胺、制备方法和用途 |
CN201680080575.6A Active CN108602839B (zh) | 2015-12-18 | 2016-12-16 | 制备有机氨基硅烷的方法;由有机氨基硅烷制备甲硅烷基胺的方法 |
CN201680072355.9A Active CN108431013B (zh) | 2015-12-18 | 2016-12-16 | 二硅烷基胺和聚硅烷基胺的合成 |
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CN201680070868.6A Active CN108431012B (zh) | 2015-12-18 | 2016-12-16 | 三(乙硅烷基)胺 |
CN201680080583.0A Active CN108602840B (zh) | 2015-12-18 | 2016-12-16 | 高纯度三甲硅烷基胺、制备方法和用途 |
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CN201680072355.9A Active CN108431013B (zh) | 2015-12-18 | 2016-12-16 | 二硅烷基胺和聚硅烷基胺的合成 |
Country Status (7)
Country | Link |
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US (4) | US11040989B2 (zh) |
EP (3) | EP3390410B1 (zh) |
JP (4) | JP6917995B2 (zh) |
KR (4) | KR102752515B1 (zh) |
CN (4) | CN108431012B (zh) |
TW (4) | TWI752929B (zh) |
WO (4) | WO2017106587A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108431013A (zh) * | 2015-12-18 | 2018-08-21 | 美国陶氏有机硅公司 | 二硅烷基胺和聚硅烷基胺的合成 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI784022B (zh) * | 2017-07-31 | 2022-11-21 | 中國大陸商南大光電半導體材料有限公司 | 1,1,1-參(二甲胺基)二矽烷及其製備方法 |
JP7023445B2 (ja) * | 2017-10-07 | 2022-02-22 | 株式会社Flosfia | 成膜方法 |
JP7391296B2 (ja) * | 2017-10-07 | 2023-12-05 | 株式会社Flosfia | 成膜方法 |
KR20210015823A (ko) * | 2018-05-23 | 2021-02-10 | 다우 실리콘즈 코포레이션 | 유기아미노실란의 제조 방법 |
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