CN102097409A - 半导体器件及其制造方法 - Google Patents
半导体器件及其制造方法 Download PDFInfo
- Publication number
- CN102097409A CN102097409A CN2010105369122A CN201010536912A CN102097409A CN 102097409 A CN102097409 A CN 102097409A CN 2010105369122 A CN2010105369122 A CN 2010105369122A CN 201010536912 A CN201010536912 A CN 201010536912A CN 102097409 A CN102097409 A CN 102097409A
- Authority
- CN
- China
- Prior art keywords
- bonding
- wiring
- lead
- bonding wire
- wire
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 187
- 238000004519 manufacturing process Methods 0.000 title claims description 69
- 238000000034 method Methods 0.000 title claims description 31
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052737 gold Inorganic materials 0.000 claims abstract description 5
- 239000010931 gold Substances 0.000 claims abstract description 5
- 229920005989 resin Polymers 0.000 claims description 82
- 239000011347 resin Substances 0.000 claims description 82
- 238000007789 sealing Methods 0.000 claims description 32
- 230000008878 coupling Effects 0.000 claims description 21
- 238000010168 coupling process Methods 0.000 claims description 21
- 238000005859 coupling reaction Methods 0.000 claims description 21
- 238000002347 injection Methods 0.000 claims description 17
- 239000007924 injection Substances 0.000 claims description 17
- 238000012544 monitoring process Methods 0.000 claims description 12
- 238000004364 calculation method Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 238000009826 distribution Methods 0.000 claims description 3
- 238000000465 moulding Methods 0.000 claims description 3
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 claims 2
- 238000001721 transfer moulding Methods 0.000 claims 2
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000003466 welding Methods 0.000 description 30
- 238000009434 installation Methods 0.000 description 9
- 238000005538 encapsulation Methods 0.000 description 8
- 238000012545 processing Methods 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 6
- 238000006073 displacement reaction Methods 0.000 description 4
- 238000004806 packaging method and process Methods 0.000 description 4
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000006071 cream Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 230000032258 transport Effects 0.000 description 2
- 241000218202 Coptis Species 0.000 description 1
- 235000002991 Coptis groenlandica Nutrition 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49517—Additional leads
- H01L23/4952—Additional leads the additional leads being a bump or a wire
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49503—Lead-frames or other flat leads characterised by the die pad
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49541—Geometry of the lead-frame
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49575—Assemblies of semiconductor devices on lead frames
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49579—Lead-frames or other flat leads characterised by the materials of the lead frames or layers thereon
- H01L23/49586—Insulating layers on lead frames
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04042—Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0555—Shape
- H01L2224/05552—Shape in top view
- H01L2224/05553—Shape in top view being rectangular
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0555—Shape
- H01L2224/05552—Shape in top view
- H01L2224/05554—Shape in top view being square
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0555—Shape
- H01L2224/05556—Shape in side view
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05599—Material
- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05638—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/05647—Copper [Cu] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/4501—Shape
- H01L2224/45012—Cross-sectional shape
- H01L2224/45015—Cross-sectional shape being circular
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45147—Copper (Cu) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48095—Kinked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48257—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a die pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
- H01L2224/48465—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/485—Material
- H01L2224/48505—Material at the bonding interface
- H01L2224/48599—Principal constituent of the connecting portion of the wire connector being Gold (Au)
- H01L2224/486—Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/48638—Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/48647—Copper (Cu) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/485—Material
- H01L2224/48505—Material at the bonding interface
- H01L2224/48799—Principal constituent of the connecting portion of the wire connector being Copper (Cu)
- H01L2224/488—Principal constituent of the connecting portion of the wire connector being Copper (Cu) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/48838—Principal constituent of the connecting portion of the wire connector being Copper (Cu) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/48847—Copper (Cu) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/4901—Structure
- H01L2224/4903—Connectors having different sizes, e.g. different diameters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/4905—Shape
- H01L2224/49051—Connectors having different shapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4911—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
- H01L2224/49113—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting different bonding areas on the semiconductor or solid-state body to a common bonding area outside the body, e.g. converging wires
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
- H01L2224/49171—Fan-out arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
- H01L2224/49177—Combinations of different arrangements
- H01L2224/49179—Corner adaptations, i.e. disposition of the wire connectors at the corners of the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/78—Apparatus for connecting with wire connectors
- H01L2224/7825—Means for applying energy, e.g. heating means
- H01L2224/783—Means for applying energy, e.g. heating means by means of pressure
- H01L2224/78301—Capillary
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/8512—Aligning
- H01L2224/85148—Aligning involving movement of a part of the bonding apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/8512—Aligning
- H01L2224/85148—Aligning involving movement of a part of the bonding apparatus
- H01L2224/85169—Aligning involving movement of a part of the bonding apparatus being the upper part of the bonding apparatus, i.e. bonding head, e.g. capillary or wedge
- H01L2224/8518—Translational movements
- H01L2224/85181—Translational movements connecting first on the semiconductor or solid-state body, i.e. on-chip, regular stitch
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/8534—Bonding interfaces of the connector
- H01L2224/85345—Shape, e.g. interlocking features
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/922—Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
- H01L2224/9222—Sequential connecting processes
- H01L2224/92242—Sequential connecting processes the first connecting process involving a layer connector
- H01L2224/92247—Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/78—Apparatus for connecting with wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00011—Not relevant to the scope of the group, the symbol of which is combined with the symbol of this group
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01047—Silver [Ag]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/20—Parameters
- H01L2924/207—Diameter ranges
- H01L2924/20752—Diameter ranges larger or equal to 20 microns less than 30 microns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/20—Parameters
- H01L2924/207—Diameter ranges
- H01L2924/20753—Diameter ranges larger or equal to 30 microns less than 40 microns
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Wire Bonding (AREA)
Abstract
公开了一种允许减少成本的半导体器件。在半导体芯片的电极焊盘和对应内引线通过多个键合接线相互电耦合的半导体封装中,使感测接线(第二和第四键合接线)比其它键合接线(第一和第三键合接线)更细,这些其它键合接线耦合到与感测接线耦合到的内引线相同的内引线,由此减少金接线的成本以达到减少半导体封装的成本。
Description
相关申请的交叉引用
包括说明书、说明书附图和说明书摘要、提交于2009年11月5日的第2009-253999号日本专利申请的公开内容通过整体引用结合于此。
技术领域
本发明涉及一种半导体器件及其制造方法。具体而言,本发明涉及一种可有效地应用于减少其中多个接线电耦合到同一个引线的半导体器件的成本的技术。
背景技术
作为其中多个键合接线电耦合到同一个引线的半导体器件的示例,在公开号为2007-165368的日本待审专利(专利文献1)中公开了一种结构,其中半导体芯片的三个电极焊盘和一个内引线通过三个键合接线耦合在一起。
发明内容
作为功率型半导体器件的示例,已知一种安装在用于光盘的电机驱动器上的半导体器件。在针对增加电机旋转速度的速度倍增竞争的当前情形中,重要的是让半导体器件减少主轴电机的输出接通电阻。
可以通过加粗金接线以减少电阻值来满足这一要求。但是可优选的是为了减少成本而保持除了需要粗金线的部分之外的部分的直径为小。在讨论的半导体器件情况下至少电机驱动器中的功率晶体管部分需要粗金接线。其它控制部分无需使用金接线。
在这样的半导体器件中,为了电流分流而将多个金接线耦合到用于电源或者GND的引线,该引线承担大电流流动于其中。用于过电流保护的感测接线也耦合到引线,并且它与用于电源或者GND的金接线相邻设置。也就是说,多个金接线耦合到用于电源或者GND的同一个引线,这些金接线之一是感测接线。
感测接线对接线本身的电压降进行感测,因而如果它与相同引线中的另一金接线接触,则电压降的数量将改变,因此造成失去感测功能。因此为了防止出现接线短接,使用相同粗度的金接线作为耦合到相同引线的金接线,从而感测接线在树脂模制步骤中注入密封树脂时偏转与用于电源或者GND的金接线相同的程度。
因此,由于使用与用于电源或者GND的金接线相同粗度的金接线作为感测接线,所以存在成本增加的问题。
在专利文献1(公开号为2007-165368的日本待审专利)中描述的技术也涉及一种结构,其中多个键合接线电耦合到同一个内引线。然而键合接线有相同粗度,因此不可能减少有关半导体器件的成本。
已经鉴于上文提到的问题而实现本发明,并且本发明的目的在于提供一种能够减少半导体器件成本的技术。
本发明的另一目的在于提供一种能够提高半导体器件可靠性的技术。
本发明的又一目的在于提供一种能够在用于制造具有多个不同类型的接线的半导体器件的方法中按照受抑制的单品生产时间(tact)下降率获得接线键合条件的技术。
根据下文描述和附图,本发明的上述和其它目的以及新颖特征将变得清楚。
下文是对这里公开的发明之中的典型发明的简述。
根据本发明一个典型模式的一种半导体器件包括:半导体芯片,具有多个电极焊盘;多个引线,布置于半导体芯片周围;多个键合接线,用于将电极焊盘与引线相互电耦合;以及树脂密封体,用于密封半导体芯片、键合接线和引线的部分,引线包括用于向半导体芯片供应第一操作电势的第一功率引线,电极焊盘包括:第一电源电极焊盘,通过第一键合接线电耦合到第一功率引线;以及第一监视电极焊盘,通过第二键合接线电耦合到第一功率引线以监视第一功率引线的电势,并且第二键合接线比第一键合接线更细。
根据本发明另一典型模式的一种半导体器件包括以下步骤:提供引线框,该引线框具有芯片安装区域和布置于芯片安装区域周围的多个引线;将具有多个电极焊盘的半导体芯片安装于引线框的芯片安装区域之上;通过多个键合接线将引线与半导体芯片的电极焊盘相互电耦合;并且形成树脂密封体以密封半导体芯片、键合接线和引线的部分,键合接线包括:第一键合接线,在其一个端部耦合到电极焊盘之中的第一电极焊盘而在其相反端部耦合到引线之中的第一引线;以及第二键合接线,在其一个端部耦合到电极焊盘之中的第二电极焊盘而在其相反端部耦合到第一引线,并且比第一键合接线更细,并且迟于第一键合接线形成第二键合接线。
根据本发明又一典型模式的一种用于制造半导体器件的方法是一种用于制造通过键合不同类型的键合接线而组装的半导体器件的方法,该方法包括以下步骤:(a)提供引线框,该引线框具有芯片安装区域和布置于芯片安装区域周围的多个引线;(b)将半导体芯片安装于引线框的芯片安装区域之上;(c)通过不同类型的键合接线将半导体芯片的多个电极焊盘与引线相互电耦合,其中在步骤(c)中,使用键合条件计算手段来获得用于各类型的键合接线数目与用于各类型的接线键合器最佳数目的最佳比值,该键合条件计算手段用于计算用于各类型的键合接线数目的分布和用于各类型键合接线的接线键合器所需数目,并且在这样获得的条件之下进行接线键合。
下文是对这里公开的发明之中的典型发明所获得的效果的简述。
通过将粗度不同的键合接线耦合到同一个引线,有可能减少半导体器件的成本。
有可能减少出现耦合到同一个引线的粗度不同的键合接线的短路和变形并且由此提高半导体器件的可靠性。
附图说明
图1是穿过密封体地示出了根据本发明第一实施方式的半导体器件的结构性示例的部分平面图;
图2是示出了沿着图1中的线A-A取得的结构示例的部分横截面图;
图3是示出了图1所示半导体器件的特征部分的示意性结构示例的部分平面图;
图4是穿过密封体地示出了图1所示半导体器件的结构性示例的平面图;
图5是示出了图4所示部分B的结构性示例的放大部分平面图;
图6是示出了在图4所示半导体器件中并入的过电流保护电路示例的电路框图;
图7是示出了用于图1所示半导体器件的组装过程的示例的制造流程图;
图8是示出了在组装图1所示半导体器件时使用的引线框的结构性示例的部分平面图;
图9是示出了在组装图1所示半导体器件时在管芯键合之后的结构性示例的部分平面图;
图10是示出了在组装图1所示半导体器件时在接线键合步骤中的球键合方法的示例的部分横截面图;
图11是示出了在组装图1所示半导体器件时在第一接线键合之后的结构性示例的部分平面图;
图12是示出了在组装图1所示半导体器件时在第二接线键合之后的结构性示例的部分平面图;
图13是示出了在组装图1所示半导体器件时在树脂模制步骤中在树脂注入期间的树脂流向的示例的平面图;
图14是示出了在图13所示树脂注入期间在模制模型的腔内部中的结构性示例的部分横截面图;
图15是示出了在图13所示树脂注入期间在模制模型的树脂注入浇口与感测接线之间的位置关系的示例的部分平面图;
图16是示出了第一实施方式的半导体器件的第一变形的结构的部分横截面图;
图17是示出了第一实施方式的半导体器件的第二变形的结构的部分横截面图;
图18是示出了在第一实施方式的半导体器件的第三变形中在树脂模制步骤中在树脂注入期间的树脂流向的示例的平面图;
图19是示出了在组装根据本发明第二实施方式的半导体器件时在接线键合步骤中使用的接线键合器的结构性示例的前视图;
图20是示出了在组装第二实施方式的半导体器件时用于获得在接线键合步骤中使用的接线键合条件的参考单品生产时间中的各种时间的示例的测量值数据图;
图21是示出了在组装第二实施方式的半导体器件时用于获得在接线键合步骤中使用的接线键合条件的单品生产时间计算的示例的计算值数据图;并且
图22是示出了在组装第二实施方式的半导体器件时用于获得在接线键合步骤中使用的接线键合条件的考虑到单品生产时间下降率的单品生产时间计算示例的计算值数据图。
具体实施方式
在以下实施方式中,除了在具体需要时之外,在原则上将不重复对相同或者相似部分的说明。
在出于便利考虑而需要时,以下实施方式将各自以划分成多个章节或者实施方式的方式加以描述,但是除非另有提及,则它们并非互不相关而是具有一定关系使得一个实施方式是对另一实施方式的部分或者全部的变形或者详细或者补充说明。
在以下实施方式中,当提及要素数字(包括数目、数值、数量和范围)时,对提及的数字并未进行限制,而是除非另有提及并且除了基本上清楚对提及的数字进行限制的情况之外,在提及的数字以上和以下的数字也将起作用。
无需赘言,在以下实施方式中,除非另有提及并且除了认为它们基本上明显为必需,它们的组成要素(包括组成步骤)并非总是必需。
另外无需赘言,在以下实施方式中,“包括A”、“具有A”以及“包含A”在结合组成要素等加以描述时除了清楚地描述了仅限于提及的要素的情况之外,并未排除其它要素。类似地,将理解当在以下实施方式中提及组成要素的形状和位置关系时,除非另有提及并且除了否定答案基本上清楚的情况之外,也包括与这样的形状等基本上接近类似或者相似的形状等。这对于前述数值和范围也成立。
下文将参照附图描述本发明的实施方式。在用于图示附图的所有附图中,具有相同功能的构件由相同标号标识,并且将省略其重复说明。
(第一实施方式)
图1是穿过密封体地示出了根据本发明第一实施方式的半导体器件的结构性示例的部分平面图,图2是示出了在沿着图1中的线A-A取得的结构示例的部分横截面图,并且图3是示出了图1所示半导体器件的特征部分的示意性结构示例的部分平面图。另外,图4是穿过密封体地示出了图1所示半导体器件的结构性示例的平面图。图5是示出了图4所示部分B的结构性示例的放大部分平面图,并且图6是示出了在图4所示半导体器件中并入的过电流保护电路示例的电路框图。
这一第一实施方式的半导体器件是使用引线框来组装的树脂密封型半导体封装1,其中针对在半导体芯片与引线之间的电耦合进行接线键合。
假如对SOP(小轮廓封装)并未进行限制,这一第一实施方式的上述半导体器件例如是SOP。在这一第一实施方式中,作为半导体封装1的示例,将参照将在用于光盘的电机驱动器上安装的功率型半导体封装1。然而半导体封装1可以是在除了用于光盘的电机驱动器之外的功率型设备上安装的半导体器件或者可以是在除了功率设备之外的设备上安装的半导体器件。
至于用于光盘的电机,正在进行针对增加电机旋转速度的激烈速度倍增竞争。关于用于将半导体芯片3的电极焊盘3c与内引线2a相互电耦合的接线,有时有如下情况,其中承担大电流的流量并且采用一种将多个接线耦合到同一个内引线2a的技术使得电流以分流方式流动。也在这一第一实施方式的半导体封装1中在承担大电流的流量时采用一种将多个键合接线耦合到用于电源或者GND的引线的技术。在这一情况下,用于过电流保护的感测接线也耦合到与多个键合接线耦合的引线部分。这一感测接线与用于电源或者GND的键合接线相邻设置。也就是说,多个键合接线耦合到用于电源或者GND的同一个引线,并且它们之一是感测接线,该感测接线具有感测接线本身的电压降的功能。
接着参照图1至图6,将关于根据这一第一实施方式的半导体封装1的结构给出描述。半导体封装1包括:半导体芯片3,具有主表面3a和形成于主表面3a上的多个电极焊盘3c;多个内引线(引线)2a,布置于半导体芯片3周围;多个键合接线6,用于将电极焊盘3c与内引线2a相互电耦合;树脂密封体5,用于密封半导体芯片3、键合接线6和引线的部分(内引线2a);以及多个外引线2b,与内引线2a集成地形成并且从树脂密封体5向外突出。
如图1和图2中所示,半导体芯片3通过管芯键合材料4安装到作为芯片安装区域的管芯焊盘2c上。在这一情况下,半导体芯片3面向上方地安装到管芯焊盘2c上,从而它的主表面3a面向上方。因此,半导体芯片3的背表面3b和管芯焊盘2c通过管芯键合材料4耦合在一起。管芯键合材料4例如是包含银填充物的膏树脂。半导体芯片3在其内部中形成有半导体集成电路,并且多个电极焊盘3c并排形成于主表面3a的周界边缘部分。
管芯焊盘2c如同半导体芯片3一般为四边形并且嵌入于树脂密封体5的内部中。另外如图1中所示,管芯焊盘2c由与管芯焊盘的两个相对侧的中心部分集成的悬置引线2g支撑。也就是说,在这一第一实施方式的半导体封装1中,管芯焊盘2c由彼此相对设置的两个悬置引线2g支撑。
如图1中所示,各悬置引线2g在管芯焊盘2c与树脂密封体5的外周界部分之间的位置分叉,这两个分支引线部分终结于密封体5的外周界部分。
由于图1中所示这一第一实施方式的半导体封装1设定为SOP,所以多个外引线2b从位于树脂密封体5的纵向方向上的两个相对侧突出。具体而言,在由一个和另一个悬置引线2g以及管芯焊盘2c分割的各相对两侧区域中,多个内引线2a径向地布置于半导体芯片3和管芯焊盘2c周围。
由于半导体封装1是大功率消耗的功率型,所以将管芯焊盘2c设置于电源(或者GND)电势以便稳定电源(或者GND)。就这一点而言,四个内引线2a由与管芯焊盘2c相同的材料形成并且与管芯焊盘集成和连续。这些四个内引线2a还分别耦合到外引线2a并且作为外部端子向树脂密封体5的外界突出。
例如在将管芯焊盘2c设置于电源电势的情况下,半导体芯片3的用于电源的电极焊盘3c和四个内引线2a(功率引线)通过用于电源的多个键合接线(这样的接线键合也称为下键合)电耦合在一起。因而,与管芯焊盘2c集成地耦合的四个内引线2a以及外引线2b也承担电源电势并且作为功率引线从树脂密封体5暴露于外。
因而管芯焊盘2c承担广域电源电势,因此使得有可能达到电源的稳定(在管芯焊盘2c处于GND电势的情况下有可能达到GND的稳定)。
内引线2a、外引线2b、管芯焊盘2c和悬置引线2g各自例如由薄板构件如薄铜合金板形成。树脂密封体5例如由热固环氧树脂形成,并且它根据如后文将描述的传递模制方法(该方法使用图14中所示具有树脂注入浇口8d的模制模型8)通过树脂模制来形成。
在这一第一实施方式的半导体封装1的一些内引线2a中,如图1和图3中所示,多个键合接线6键合到同一个内引线2a。键合接线6(在半导体封装1中的所有键合接线6,包括第一键合接线6a、第二键合接线6b、第三键合接线6c、第四键合接线6d和第五键合接线6e、6f)例如是金接线。
如图4和图5中所示,例如三个键合接线6电耦合到集成地耦合到管芯焊盘2c的四个内引线2a中的各内引线,并且例如两个键合接线6电耦合到各电对应内引线2a(在电源-GND关系上对应)。
图5示出了在半导体封装1中将管芯焊盘2c设置于GND电势(接地电势)的情况下的接线状态细节。
因此,作为集成地耦合到管芯焊盘2c的四个内引线2a的用于GND的引线(第一功率引线)2d电耦合到半导体芯片3的电极焊盘(用于电源的第一电极焊盘)3d。
另一方面,在与管芯焊盘2c分离的个别内引线2a之中。功率引线(第二功率引线)2e电耦合到半导体芯片3的用于电源的电极焊盘(用于电源的第二电极焊盘)。
用于GND的引线2d用于向半导体芯片3供应作为第一操作电势的GND电势(接地电势)。用于GND的引线2d各自通过第一键合接线6a电耦合到半导体芯片3的用于GND的电极焊盘3d。在半导体芯片3的电极焊盘3c中提供与用于GND的电极焊盘3d相邻的用于GND监视的电极焊盘(用于监视的第一电极焊盘)3f以监视用于GND的引线2d的电势。用于GND监视的电极焊盘3f和用于GND的引线2d通过比第一键合接线6a更细的第二键合接线6b电耦合在一起。细的第二键合接线6b是监视用于GND的引线2d的电势的感测接线A。具体而言,感测接线A监视在用于GND的引线2d与用于GND监视的电极焊盘3f之间的电压降。
在图5所示示例中,半导体芯片3的三个电极焊盘3c(3d,3f)和用于GND的一个引线2d通过三个键合接线6(两个第一键合接线6a和一个第二键合接线6b)电耦合在一起。也就是说,两个粗的第一键合接线6a和一个细的第二键合接线6b(感测接线A)电耦合到用于GND的同一个引线2d。
各个粗的第一键合接线6a的直径例如约为30μm左右,而细的第二键合接线6b的直径例如约为23μm。
另一方面,用于电源的引线2e用于向半导体芯片3供应电源电势,该电源电势是比第一操作电势(接地电势)更高的第二操作电势。用于电源的引线2e各自通过第三键合接线6c电耦合到半导体芯片3的用于电源的电极焊盘3e。在半导体芯片3的电极焊盘3c中提供与用于电源的电极焊盘3e相邻的用于电源监视的电极焊盘(用于监视的第二电极焊盘)3g以监视用于电源的引线2e的电势。用于电源监视的电极焊盘3g和用于电源的引线2e通过比第三键合接线6c更细的第四键合接线6d电耦合在一起。细的第四键合接线6d是监视用于电源的引线2e的电势的感测接线B。具体而言,感测接线B监视在用于电源的引线2e与用于电源监视的电极焊盘3g之间的电压降。
在图5所示示例中,半导体芯片3的两个电极焊盘3c(3e,3g)和用于电源的一个引线2e通过两个键合接线6(一个第三键合接线6c和一个第四键合接线6d)电耦合在一起。也就是说,一个粗的第三键合接线6c和一个细的第四键合接线6d(感测接线B)电耦合到用于电源的同一个引线2e。
如在先前情况下一样,粗的第三键合接线6c的直径假如约为30μm,而细的第四键合接线6d的直径约为23μm。
在半导体芯片3的电极焊盘3c中提供均用于输出的第一输出信号焊盘3h和第二输出信号焊盘3i,并且用于GND的第一输出信号焊盘3h通过第五键合接线6e电耦合到用于GND的第一输出引线2f。另一方面,用于电源的第二输出信号3i通过第五键合接线6f电耦合到用于电源的第二输出引线2h。第五键合接线6e、6f如同第二键合接线6b和第四键合接线6d一样为直径约为23μm的细接线。
在半导体封装1中有如同第一和第二输出引线2f、2h一样的、各自与仅一个金接线电耦合的大量内引线2a。在这一情况下,分别与各自耦合到仅一个金接线的内引线2a耦合的键合接线6是直径约为23μm的细金接线。也就是说,在图3中所示这一第一实施方式的半导体封装1中,在耦合到同一个内引线2a的两个或者三个键合接线6之中,一个或者两个键合接线是各自直径约为30μm的粗金接线。
也就是说,如图5中所示,耦合到同一个内引线2a的两个键合接线6之一或者耦合到同一个内引线2a的三个键合接线6中的两个键合接线是用于GND或者用于电源的直径约为30μm的粗金接线。包括感测接线A和B的所有其它接线是直径约为23μm的细金接线。因此在与两个或者三个金接线耦合的同一个内引线2a的情况下,用于GND或者用于电源的粗金接线和细的感测金接线混合地耦合到该内引线。
现在关于图6中所示过电流保护电路提供下文描述,该电路并入于半导体芯片3中。
过电流保护电路包括用于输出电流以驱动作为负载的外部设备的输出电路3j和作为用于控制电流的控制电路的输出控制电路3k。
输出电路3j按照分别从用于GND的电极焊盘(用于电源第一的电极焊盘)3d和用于电源的电极焊盘(用于电源的第二电极焊盘)3e供应的接地电势(第一操作电势)和电源电势(第二操作电势)操作。
输出控制电路3k根据分别从用于GND监视的电极焊盘3f和用于电源监视的电极焊盘3g提供的预定信号来控制输出电路3j的输出。
在过电流保护电路中,用于GND的电极焊盘3d和用于GND监视的电极焊盘3f电耦合到第一比较器3p,并且用于通过两个粗的第一键合接线6a电耦合到用于GND的引线2d的用于GND的电极焊盘3d电耦合到输出电路3j中的第一输出晶体管3m。另外,用于GND监视的电极焊盘3f通过细的第二键合接线(感测接线A)6b电耦合到用于GND的引线2d。
根据这一构造,作为感测接线A的第二键合接线6b监视在粗的第一键合接线6a中流动的电流,并且当第一比较器3p检测到过电流时,关断第一输出晶体管3m。也就是说,通过输出控制电路3k向第一输出晶体管3m反馈第一比较器3p检测到的结果(以接通或者关断第一输出晶体管3m)。在第一比较器3p中监视转换的电压值,因为不可能直接监视电流值。
另一方面,用于电源的电极焊盘3e和用于电源监视的电极焊盘3g电耦合到第二比较器3q,并且通过一个粗的第三键合接线6c耦合到用于电源的引线2e的用于电源的电极焊盘3e电耦合到输出电路3j中的第二输出晶体管3n。用于电源监视的电极焊盘3g通过细的第四键合接线(感测接线B)6d电耦合到用于电源的引线2e。
根据这一构造,作为感测接线B的第四键合接线6d监视在粗的第三键合接线6c中流动的电流,并且当第二比较器3q检测到过电流时,关断第二输出晶体管3n。也就是说,通过输出控制电路3k向第二输出晶体管3n反馈第二比较器3q检测到的结果(以接通或者关断第二输出晶体管3n)。同样,在第二比较器3q中监视转换的电压值,因为不可能直接监视电流值。
在半导体芯片3的电极焊盘3c中包括如图5中所示的第一和第二输出信号焊盘3h、3i,这两个输出信号焊盘均是作为输出电路3j的输出端子来使用的输出信号焊盘。用于GND的第一输出信号焊盘3h通过第五键合接线6e电耦合到用于GND的第一输出引线2f,而用于电源的第二输出信号焊盘3i通过第五键合接线6f电耦合到用于电源的第二输出引线2h。
当检测到用于GND的第一键合接线6a中或者用于电源的第三键合接线6c中的过电流时,有可能通过立即操作保护电路来停止输出。
因此,在这一第一实施方式的半导体封装1中,通过使感测接线A和B(第二和第四键合接线6a、6d)比耦合到同一个内引线2a的其它键合接线6(第一和第三键合接线6a、6c)更细,有可能减少金接线的成本并且由此达到减少半导体封装1的成本。
在这一第一实施方式的半导体封装1中使用了用作键合接线6的金接线,从而使键合接线6的变细对减少半导体封装1的成本很有效。
接着,下文将参照图7的制造流程图描述用于制造根据这一第一实施方式的半导体封装1的方法。
图7是示出了用于图1中所示半导体器件的组装流程示例的制造流程图,图8是示出了在组装图1中所示半导体器件时使用的引线框的结构性示例的部分平面图,并且图9是示出了在组装图1中所示半导体器件时在管芯键合之后的结构性示例的部分平面图。图10是示出了在组装图1中所示半导体器件时在接线键合步骤中的球键合方法示例的部分截面图,图11是示出了在组装图1中所示半导体器件时在第一接线键合之后的结构性示例的部分平面图,并且图12是在组装图1中所示半导体器件之后在第二接线键合之后的结构性示例的部分平面图。另外,图13是示出了在组装图1中所示半导体器件时在树脂模制步骤中在树脂注入期间的树脂流向示例的平面图,图14是在图13中所示树脂注入期间在模制模型的腔内部中的结构性示例的部分截面图,并且图15是示出了在图13中所示树脂注入期间在模制模型的树脂注入浇口与感测接线之间的位置关系的示例的部分平面图。
首先在图7中所示步骤S1中提供引线框。在这一步骤中提供图8中所示的引线框2,该引线框2具有作为芯片安装区域的管芯焊盘2c和布置于管芯焊盘2c周围的多个内引线2a。引线框2是例如由铜合金形成的薄板构件。
管芯焊盘2c具有矩形形状并且由居中于其相对的短侧的悬置引线2g支撑并且也由在各相对的长侧的两个位置的内引线2a支撑。也就是说,作为与管芯焊盘2c集成地耦合的内引线2a,管芯焊盘2c具有四个这样的内引线2a。
随后进行图7中的步骤S2的管芯键合。在这一步骤中,如图9中所示,半导体芯片3安装到引线框2的管芯焊盘2c上,该半导体芯片3具有图2所示的主表面3a和在主表面3a的周界边缘部分的多个电极焊盘3c。在这一情况下,半导体芯片3通过管芯键合材料4(例如包含银填充物的膏树脂)正面向上地安装到管芯焊盘2c上。
随后进行图7中所示步骤S3的接线键合。如图10中所示通过球键合方法来进行接线键合,该方法在作为键合工具的毛细管7的顶端形成球状电极6g并且在这一状态中进行球键合。根据球键合方法,半导体芯片3的多个电极焊盘3c和对应于电极焊盘3c的多个引线(内引线2a)通过多个键合接线6电耦合在一起。例如,键合接线6是金接线。
首先进行图7中的步骤S3-1的第一接线键合。在这一步骤中,作为第一接线键合,粗的第一键合接线6a和第三键合接线6c首先接受如图11中所示的接线键合。在第一接线键合结束之后,作为步骤S302的第二接线键合,比第一键合接线6a更细的第二接线键合(感测接线A)6b、第四键合接线(感测接线B)6d和第五键合接线6e、6f接受如图12中所示的接线键合。
在第一接线键合中,如图3中所示,各第一键合接线6a的一个端部6h电耦合到电极焊盘3c之中的用于GND的电极焊盘(第一电极焊盘、用于电源的第一电极焊盘)3d,而其相对端部6i电耦合到内引线2a之中的用于GND的引线(第一引线、第一功率引线)(2d)。各第一键合接线6a的一个端部6h是位于图10中所示球状电极6a这一侧上的部分。另一方面,相对端部6i是位于与球状电极6g相对的一侧上的部分。也就是说,各第一键合接线6a的一个端部6h在与半导体芯片3的相关联电极焊盘3c耦合的一侧上,而相对端部6i在耦合到相关联内引线2a的一侧上。同样对于第三键合接线6c进行如同第一键合接线6a的接线键合。
在第一接线键合结束之后,从有关的接线键合装置取出(处置)和运送引线框2并且交付至另一接线键合装置。然后在另一接线键合装置上进行第二接线键合。
在第二接线键合中,如图3中所示,比第一键合接线6a更细的第二键合接线(感测接线A)6b的一个端部6j电耦合到电极焊盘3c之中的用于GND监视的电极焊盘(第二电极焊盘、用于监视的第一电极焊盘)3f,而第二键合接线6b的相对端部6k电耦合到用于GND的引线(第一引线、第一功率引线)2d。如同第一键合接线6a,第二键合接线6b的一个端部6j也是位于球状电极6g这一侧上的部分,并且相对端部6k是位于与球状电极6g相对的一侧上的部分。也就是说,如同第一键合接线6a,第二键合接线6b的一个端部6j也在与半导体芯片3的电极焊盘3c耦合的一侧上,并且相对端部6k在耦合到内引线2a的一侧上。同样对于第四键合接线6d进行如同第二键合接线6b的接线键合。
在对第二键合接线6b进行接线键合时,如图3中所示,第二键合接线6b的相对端部6k在比第一键合接线6a的相对端部6i更远离半导体芯片3的位置上电耦合到用于GND的引线2d。
也就是说,当将多个键合接线6耦合到同一个内引线2a时,将稍后接受接线键合(在第二接线键合步骤中)的键合接线6的接合位置(耦合到引线的位置)设置在如下位置,该位置相对于首先耦合(在第一接线键合步骤)的键合接线6的接合位置而言与内引线的顶端隔开(更远)。
例如在如图3中首先将粗的第一键合接线6a接线键合(在第一接线键合步骤中)、随后将细的第二键合接线6b键合(在第二接线键合步骤中)到同一个内引线2a的情况下,将第二键合接线6b的接合位置设置在如下位置,该位置相对于第一键合接线6a的接合位置而言与内引线的顶端隔开(更远离内引线顶端的位置或者相对于内引线顶端的向外位置)。
以这一方式可以防止或者减少首先通过接线键合而形成(在第一接线键合步骤中)的第一键合接线6a的如下移位或者变形,该移位或者变形的出现归因于在稍后进行(在第二接线步骤中)第二键合接线6a的接线键合时第一键合接线6a干扰毛细管7的操作。
具体而言,在这一第一实施方式的半导体封装1的情况下,如图5中所示,在用于GND的引线(第一功率引线)2d中的耦合到细的第二键合接线6b(感测接线A)的位置与在用于GND的引线2d中的耦合到粗的第一键合接线6a的位置(接合位置)相较而言远离半导体芯片3的外周界部分(从该外周界部分更向外)。
另外,在用于电源的引线(第二功率引线)2e中的耦合到细的第四键合接线6d(感测接线B)的位置(接合位置)与在用于电源的引线2e中的耦合到粗的第三键合接线6c的位置(接合位置)相较而言远离用于电源的引线2e的芯片侧顶端(从该芯片侧顶端更向外)。
通过这样做,有可能减少或者防止稍后接受接线键合(在第二接线键合步骤中)的细的第二键合接线6b或者第四键合接线6d的移位或者变形。
在如同组装这一第一实施方式的半导体封装1的、对半导体器件的内部中的具有不同粗度的键合接线6进行接线键合的情况下,通过首先对粗的键合接线6(第一和第三键合接线6a、6c)进行接线键合、随后对细的键合接线6(第二和第四键合接线6b、6d)进行接线键合,有可能使键合接线6的变形难以出现。
具体而言,当键合接线6的粗度改变时,所用接线键合装置也改变,因而操作者在从一个接线键合装置改变成另一接线键合装置时进行对引线框2的运送和处置。因而,在初始接线键合装置中已经接受接线键合(在第一接线键合步骤中)的键合接线6更可能变形,因为为了在接线键合之后将引线框2移向第二接线键合步骤而进行了对引线框2的运送和处置。
因此,通过首先耦合粗的键合接线6(在第一接线键合步骤中)、之后耦合细的键合接线6(在第二接线键合步骤中),有可能使所有键合接线6的变形难以出现。
因此根据组装这一第一实施方式的半导体封装1的方式,有可能通过减少耦合到同一个内引线2a的粗度不同的键合接线6的变形来提高半导体封装1的可靠性。
在接线键合结束之后进行图7中所示步骤S4的树脂模制。在这一步骤中,通过树脂模制来用树脂密封半导体芯片3、键合接线6和引线的部分(内引线2a)以形成图2中所示树脂密封体5。
在树脂模制步骤中,首先如图14中所示,将已经接受接线键合的作为工件的引线框2放置于模制模型8的由上模具8a和下模具8b形成的腔8c内,并且在这一状态中向腔8c中充入密封树脂9。
如图15中所示,在比粗的第一键合接线6a的位置更为远离模制模型8的树脂注入浇口8d的细的第二键合接线6b的位置处进行密封树脂9的注入。也就是说,就全部耦合到同一个内引线2a的粗的第一键合接线6a和细的第二键合接线6b而言,在比第一键合接线6a更远离树脂注入浇口8d的第二键合接线6b的位置处注入密封树脂9。
因而在树脂注入期间,细的第二键合接线6b在从耦合到同一个内引线2a的第一键合接线6a偏离的方向上偏转。也就是说,由于在树脂注入时密封树脂9的阻力,细的键合接线6比粗的键合接线6更易于偏转,从而通过将细的键合接线6(第二键合接线6b)设置于远离树脂注入浇口8d的一侧上,有可能减少由于接线偏转而导致的电短路的出现。
图13示出了在半导体封装1的模制步骤中在树脂注入期间的树脂偏转方向。就全部耦合到同一个内引线2a的各组细的第二键合接线6b和粗的第一键合接线6a而言,细的第二键合接线6b相对于粗的第一键合接线6a而言设置于相关联的树脂偏转方向9a的前进方向这一侧上。因而在树脂注入期间,细的第二键合接线6b由于密封树脂9的偏转阻力而在偏离粗的第一键合接线6a的方向上偏转,从而有可能减少在树脂注入时的接线偏转而引起的电短路的发生。
因此,由于可以减少在组装半导体封装1时出现键合接线6的电短路,所以有可能提高半导体封装1的可靠性。
在图13中,在封装体的一侧上接近居中地提供树脂注入浇口8d,并且示出了在从封装体一侧的中心部分附近注入密封树脂9时的树脂流向9a。
在密封树脂9的注入结束之后,固化密封树脂9以形成树脂密封体5。
在树脂模制结束之后,进行图7中所示的步骤5中的切割和成形。在这一步骤中,在形成有树脂密封体5的引线框2中,在相应端部切割并且以希望的形状形成外引线2b以完成半导体封装1的组装。
现在关于第一实施方式的一种变形提供以下描述。
图16是示出了第一实施方式的半导体器件的第一变形的结构的部分截面图,图17是示出了第一实施方式的半导体器件的第二变形的结构的部分截面图,并且图18是示出了根据第一实施方式的半导体器件的第三变形在树脂模制步骤中的树脂流向示例的平面图。
图16中所示第一变形为如下结构,其中在与管芯焊盘2c的芯片装配安装侧相对的一侧上的表面(背表面)从树脂密封体5的较下表面暴露,由此有可能增强半导体封装1的散热性质。因此,当从并入于半导体封装1中的半导体芯片3生成的热量大时,有可能进一步提高半导体封装1的可靠性。
接着根据图17中所示第二变形,相对于全部耦合到同一个内引线2a的粗的第一键合接线6a和细的第二键合接线(感测接线A)而言,使第二键合接线6b的回路高度大于各第一键合接线6a的回路高度。
也就是说,将细键合接线6b的回路高度设置成大于各粗键合接线6的回路高度。通过这样做,在树脂模制步骤中可以使回路高度更大的键合接线6比回路高度小的键合接线6更易于相抵于树脂流动而偏转。因而,细的第二键合接线(感测接线A)6b在偏离粗的第一键合接线6a的方向上偏转,因此有可能减少在树脂注入时由于接线偏转而引起的电短路。
因此,使回路高度在细键合接线6与粗键合接线6之间不同,但是这对于图5中所示细的第四键合接线(感测接线B)6d和粗的第三键合接线6c也成立。通过使第四键合接线6d的回路高度大于第三键合接线6c的回路高度,有可能减少在树脂注入时由于接线偏转而引起的电短路。
接着,图18中所示第三变形示出了在半导体器件是QFP(四边扁平封装)10的情况下在树脂模制步骤中的树脂流向9a。由于是QFP 10,用于树脂注入的树脂注入浇口8d设置于封装体的对角线上。也在这一情况下,在均耦合到同一个内引线2a的细的第二键合接线6b和粗的第一键合接线6a中,相较于粗的第一键合接线6a而言,细的第二键合接线6b定位于相关联树脂流向9a的前进方向上。通过这样做,在树脂注入时,细的第二键合接线6b由于密封树脂9的流动阻力而在偏离粗的第一键合接线6a的方向上偏转,从而有可能减少在树脂注入时由于接线偏转而引起的电短路。
(第二实施方式)
图19是示出了在组装根据本发明第二实施方式的半导体器件时在接线键合步骤中使用的接线键合器的结构性示例的前视图,并且图20是示出了在组装第二实施方式的半导体器件时用于获得在接线键合步骤中使用的接线键合条件的参考单品生产时间中的各种时间的示例的测量值数据图。另外,图21是示出了在组装第二实施方式的半导体器件时用于获得在接线键合步骤中使用的接线键合条件的单品生产时间计算的示例的计算值数据图,并且图22是示出了在组装第二实施方式的半导体器件时用于获得在接线键合步骤中使用的接线键合条件的考虑到单品生产时间下降率的单品生产时间计算的示例的计算值数据图。
这一第二实施方式涉及在组装如同第一实施方式中所述半导体封装1的具有多个不同种类的接线(在第一实施方式中为粗度不同的两种接线)(下文也称为“多接线”)的半导体器件时的接线键合步骤。
例如,在作为多接线封装的图案设计(在封装中的接线选择以及对粗和细接线的选择)中考虑到将制造的多接线半导体器件的类型,但是当使用多接线类型作为接线键合器组的流水线时,在组装时的单品生产时间与单个接线类型相比必然恶化。
鉴于这一点,根据这一第二实施方式,在进行多接线半导体器件的接线键合时,获得用于抑制单品生产时间下降率的单品生产时间计算公式(键合条件计算手段),并且在这样使用单品生产时间计算公式而获得的接线键合条件之下进行接线键合。
图19示出了在这一第二实施方式中使用的接线键合器(接线键合装置)11。接线键合器11包括键合头11a,具有键合工具,例如图10中所示毛细管7;主运送轨11c,用于接收和递送已经接受管芯键合的作为工件的引线框2(见图8);以及馈送器11b,在装置内引导引线框2。
在这一第二实施方式中,将参照如下情况作为示例给出描述,其中如在第一实施方式中描述的半导体封装1中的粗接线(第一键合接线6a)和细接线(第二键合接线6b)接受接线键合。
图20示出了用于发现与多接线封装对应的计算公式(键合条件计算手段)的参考值(使用单个类型来测量处理时间)。在图20中,馈送时间是从在馈送器11b内接收引线框2时直至进行运送至键合点的时间,识别时间是在键合之前用于位置纠正的时间,并且键合时间是接线键合的处理时间。
图21示出了通过利用这一第二实施方式中获得的计算公式并且按照第一组(粗接线组)中的接线数目和第二组(细接线组)中的接线数目(这些数目指定为不考虑单品生产时间下降率的当前数目)而已经获得的单品生产时间和单品生产时间下降率计算值的结果。另外,图22示出了已经获得的接线键合器以及第一组接线和第二组接线的最佳数目的结果。
在图20中,a代表接线键合时间(秒),b代表一个框的加热等待时间(秒),c代表一个框的馈送时间(秒),d代表在一个框中处理的识别时间(秒),N代表一个周期中处理的框数目(60个框作为接线键合器数目的最小公倍数),并且T代表一个周期中的框数目(60个框),时间a至d均为测量值。
在图21和图22中,A代表第一组(粗接线组)中的接线数目,B代表第二组中的接线数目(细接线组),X代表第一组(粗接线组)中的接线键合器数目,Y代表第二组(细接线组)的接线键合器数目,C代表一个框中的芯片数目,T1代表基于这时获得的单品生产时间计算公式的单品生产时间(秒),并且D代表通过在参考单品生产时间T与单品生产时间T1之间的比较而获得的单品生产时间下降率(%)。
在多接线中,一条流水线中的接线键合器总数为X+Y。当接线键合器数目之比等于接线数目之比时获得一种平衡良好的偏转方式(一种抑制单品生产时间下降率的偏转方式)。
也就是说,存在A/B=X/Y(A、B、X、Y为整数)这一关系(第一计算公式)。
按照接线键合器数目与第一组(粗的接线组)和第二组(细的接线组)中的接线数目的某些比值,在第一或者第二组中出现键合结束等待时间,因此通用单品生产时间计算公式不恰当。出于这一原因,这里使用第二组中的接线键合器数目来获得单品生产时间计算公式。
下文将描述这一第二实施方式中获得的单品生产时间计算公式和单品生产时间下降率。
首先,如果第一组接线处理时间假设为t1,则t1=b+c+d+(a×A×C),而如果第二组接线处理时间假设为t2,则t2=b+c+d+(a×B×C)。
与单品生产时间计算公式有关,单品生产时间基本上取决于第一或者第二组中的较长接线处理时间,从而当第二组接线键合器的数目为三或者四时,单品生产时间变为取决于第二组接线处理时间的T1=t2×(N/Y)(第二计算公式)。
当第二组接线键合器的数目为五时,T=t1×N(第三计算公式),这取决于第一组接线处理时间。
如果根据参考单品生产时间T和按照上述单品生产时间计算公式获得的单品生产时间来确定单品生产时间下降率,则按照以下计算公式计算它:D=100-(T/T1)×100(%)(第四计算公式)。
图21示出了已经使用第二、第三和第四计算公式来确定单品生产时间和单品生产时间下降率的具体示例,并且图22示出了已经使用第一、第二、第三和第四计算公式来确定单品生产时间和单品生产时间下降率的具体示例。
在图21中,在假设一个周期的框数目为60并且按照当前指定的第一组接线数目和第二组接线数目(第一组:16件,第二组:47件)而不考虑抑制下降率时,基于第一组接线键合器的数目和第二组接线键合器的数目来确定单品生产时间T1(秒)和单品生产时间下降率D(%)。
在这一单品生产时间的情况下,出现键合等待时间而未获得平衡良好的偏转,因此造成单品生产时间下降率恶化。
为了解决这一问题,如图22中所示,使用前述第一计算公式来确定用于第一组和第二组中的接线键合器数目的接线数目,并且使用这样确定的接线数目来进行单品生产时间计算以确定单品生产时间下降率。
从图21和图22可见可以通过组合A和B以便逼近A/B=X/Y来保持单品生产时间下降率为低。
根据这一第二实施方式,在组装多接线封装时,可以通过仅输入第一组中的接线(粗接线)数目和第二组中的接线(细接线)数目来自动计算单品生产时间和单品生产时间下降率。另外,可以按照用于多个接线键合器11的计算公式来确定单品生产时间。
另外,通过根据单品生产时间计算公式来计算单品生产时间,有可能获得粗接线组中的接线数目与细接线组中的接线数目的最佳比值。
另外,通过利用单品生产时间计算公式来计算单品生产时间,有可能获得接线键合器11的最佳数目。
以这一方式,有可能在接线键合时抑制单品生产时间下降率。
也就是说,在组装具有直径不同(多个粗度)的键合接线6的半导体封装1时,有可能获得单品生产时间下降率受抑制的接线键合条件。
具体而言,在组装具有粗度不同的接线的半导体器件时,可以使用如下单品生产时间计算公式(键合条件计算手段)来获得用于各类型(粗度)的键合接线6的数目与用于各类型(粗度)的接线键合器11的最佳数目的最佳比值,该单品生产时间计算公式用于根据键合接线6的粗度(类型)来计算键合接线数目的分布并且用于根据键合接线6的粗度(类型)来计算接线键合器11的所需数目。
另外,通过在按照上述单品生产时间计算公式的获得的条件之下进行接线键合,可以在将直径(粗度)不同的多个键合接线6耦合到多个内引线2a之中的同一个内引线2a时完成接线键合而又保持单品生产时间下降率为低。
虽然上文已经通过本发明的实施方式描述本发明,但是无需赘言本发明并不限于上述实施方式并且可以在并不脱离本发明主旨的范围内进行各种改变。
例如虽然第一和第二实施方式中所用键合接线(第一至第五键合接线)6是金接线,但是它们可以是铜接线。
铜接线比金接线更硬,因而在如在组装第一实施方式的半导体封装1时在粗接线与细接线之间单独地进行两次接线键合(在两个步骤中)的情况下,有可能减少由于在后一个键合步骤中的键合振动对第一步骤中耦合的接线的不良影响而引起出现接线位移或者位置偏离。
另外由于铜接线成本低于金接线,所以有可能达到进一步减少半导体封装1的成本。
另外虽然在上述实施方式中已经参照SOP型半导体器件作为示例,但是半导体器件并不限于SOP类型。本发明也适用于其它半导体器件,例如SOJ(小轮廓J引线封装)、QFP和QFN(四边扁平无引线封装),只要它们是使用引线框2而组装的类型并且其中不同类型(粗度)的多个接线被接线键合到同一个内引线2a。
本发明适合于其中粗度不同的接线电耦合到同一个引线的电子器件。
Claims (24)
1.一种半导体器件,包括:
半导体芯片,具有多个电极焊盘;
多个引线,布置于所述半导体芯片周围;
多个键合接线,用于将所述电极焊盘与所述引线相互电耦合;以及
树脂密封体,用于密封所述半导体芯片、所述键合接线和所述引线的部分,
其中所述引线包括用于向所述半导体芯片供应第一操作电势的第一功率引线,
其中所述电极焊盘包括:第一电源电极焊盘,通过第一键合接线电耦合到所述第一功率引线;以及第一监视电极焊盘,通过第二键合接线电耦合到所述功率引线以监视所述第一功率引线的电势,并且
其中所述第二键合接线比所述第一键合接线更细。
2.根据权利要求1所述的半导体器件,其中所述第一键合接线和第二键合接线是金接线。
3.根据权利要求1所述的半导体器件,其中所述第一键合接线和第二键合接线是铜接线。
4.根据权利要求1所述的半导体器件,
其中所述引线包括用于向所述半导体芯片供应高于所述第一操作电势的第二操作电势的第二功率引线,
其中所述电极焊盘包括:第二电源电极焊盘,通过第三键合接线电耦合到所述第二功率引线;以及第二监视电极焊盘,通过第四键合接线电耦合到所述第二功率引线以监视所述第二功率引线的电势,并且
其中所述第四键合接线比所述第三键合接线更细。
5.根据权利要求4所述的半导体器件,其中所述第一操作电势是接地电势而所述第二操作电势是电源电势。
6.根据权利要求4所述的半导体器件,
其中所述半导体芯片包括:输出电路,用于输出电流以驱动作为负载的外部设备;以及控制电路,用于控制从所述输出电路输出的电流,
其中所述电极焊盘包括作为所述输出电路的输出端子来使用的输出信号焊盘,并且
其中用从所述第一电源电极焊盘和第二电源电极焊盘供应的所述第一电势和第二电势操作所述输出电路。
7.根据权利要求6所述的半导体器件,其中所述控制电路根据从所述第一监视电极焊盘和第二监视电极焊盘提供的预定信号来控制所述输出电路的输出。
8.根据权利要求7所述的半导体器件,其中所述引线包括通过第五键合接线电耦合到所述输出信号焊盘的输出引线。
9.根据权利要求1所述的半导体器件,其中所述半导体芯片安装于由与所述引线相同材料形成的芯片安装区域之上,并且所述第一功率引线与所述芯片安装区域连续和集成地形成。
10.根据权利要求1所述的半导体器件,
其中通过使用具有树脂注入浇口的模制模型的传递模制方法来形成所述树脂密封体,并且
其中所述第二键合接线设置较之于所述第一键合接线的位置而言更远离所述树脂注入浇口的位置。
11.根据权利要求1所述的半导体器件,其中所述第一功率引线耦合到所述第二键合接线的位置较之于所述第一功率引线耦合到所述第一键合接线的位置而言远离所述第一功率引线的芯片侧顶端或者远离半导体芯片的外周界部分。
12.根据权利要求11所述的半导体器件,其中所述第二键合接线的回路高度大于所述第一键合接线的回路高度。
13.根据权利要求4所述的半导体器件,其中所述第二功率引线耦合到所述第四键合接线的位置远离所述第二功率引线的芯片侧顶端或者远离所述半导体芯片的外周界部分。
14.根据权利要求13所述的半导体器件,其中所述第四键合接线的回路高度大于所述第三键合接线的回路高度。
15.一种用于制造半导体器件的方法,包括以下步骤:
提供引线框,所述引线框具有芯片安装区域和布置于所述芯片安装区域周围的多个引线;
将具有多个电极焊盘的半导体芯片安装于所述引线框的所述芯片安装区域之上;
通过多个键合接线将所述引线与所述半导体芯片的所述电极焊盘相互电耦合;并且
形成树脂密封体以密封所述半导体芯片、所述键合接线和所述引线的部分,
其中所述键合接线包括:第一键合接线,在其一个端部耦合到所述电极焊盘之中的第一电极焊盘而在其相反端部耦合到所述引线之中的第一引线;以及第二键合接线,在其一个端部耦合到所述电极焊盘之中的第二电极焊盘而在其相反端部耦合到所述第一引线并且比所述第一键合接线更细,并且
其中迟于所述第一键合接线形成所述第二键合接线。
16.根据权利要求15所述的方法,
其中通过在毛细管的顶端形成球状电极的球键合方法来形成包括所述第一键合接线和第二键合接线的所述键合接线,
其中所述第一键合接线和第二键合接线的相对端部是位于与所述球状电极相对的一侧上的部分,并且
其中所述第二键合接线的相对端部在较之于所述第一键合接线的相对端部而言更远离所述半导体芯片的位置耦合到所述第一引线。
17.根据权利要求16所述的方法,其中所述第一键合接线和第二键合接线是金接线。
18.根据权利要求16所述的方法,其中所述第一键合接线和第二键合接线是铜接线。
19.根据权利要求15所述的方法,
其中通过使用具有树脂注入浇口的模制模型的传递模制方法来形成所述树脂密封体,并且
其中所述第二键合接线设置于较之于所述第一键合接线的位置而言更远离所述树脂注入浇口的位置。
20.根据权利要求19所述的方法,其中所述第一引线是用于向所述半导体芯片供应操作电势的功率引线,所述第一电极焊盘是用于电源的电极焊盘,并且所述第二电极焊盘是用于监视所述功率引线的电势的用于监视的电极焊盘。
21.一种用于制造通过键合不同类型的键合接线而组装的半导体器件的方法,包括以下步骤:
(a)提供引线框,所述引线框具有芯片安装区域和布置于芯片安装区域周围的多个引线;
(b)将半导体芯片安装于所述引线框的所述芯片安装区域之上;并且
(c)通过所述不同类型的键合接线将所述半导体芯片的多个电极焊盘与所述引线相互电耦合;
其中在所述步骤(c)中,使用键合条件计算手段来获得用于各类型的键合接线数目与用于各类型的接线键合器最佳数目的最佳比值,所述键合条件计算手段用于计算用于各类型键合接线的键合接线数目的分布和用于各类型键合接线的接线键合器所需数目,并且在这样获得的条件之下进行接线键合。
22.根据权利要求21所述的方法,其中所述键合条件计算手段是用于获得接线键合时的单品生产时间的单品生产时间计算公式。
23.根据权利要求22所述的方法,其中所述不同类型的键合接线是不同直径的键合接线。
24.根据权利要求23所述的方法,其中所述不同直径的键合接线在通过所述单品生产时间计算公式而导出的所述条件之下接线键合到所述引线中的同一个引线。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510100814.7A CN105047571A (zh) | 2009-11-05 | 2010-11-04 | 半导体器件及其制造方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009253999A JP5448727B2 (ja) | 2009-11-05 | 2009-11-05 | 半導体装置及びその製造方法 |
JP2009-253999 | 2009-11-05 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510100814.7A Division CN105047571A (zh) | 2009-11-05 | 2010-11-04 | 半导体器件及其制造方法 |
CN201510101284.8A Division CN104681524A (zh) | 2009-11-05 | 2010-11-04 | 半导体器件及其制造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102097409A true CN102097409A (zh) | 2011-06-15 |
CN102097409B CN102097409B (zh) | 2015-03-25 |
Family
ID=43924514
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201010536912.2A Active CN102097409B (zh) | 2009-11-05 | 2010-11-04 | 半导体器件及其制造方法 |
CN201510101284.8A Pending CN104681524A (zh) | 2009-11-05 | 2010-11-04 | 半导体器件及其制造方法 |
CN201510100814.7A Pending CN105047571A (zh) | 2009-11-05 | 2010-11-04 | 半导体器件及其制造方法 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510101284.8A Pending CN104681524A (zh) | 2009-11-05 | 2010-11-04 | 半导体器件及其制造方法 |
CN201510100814.7A Pending CN105047571A (zh) | 2009-11-05 | 2010-11-04 | 半导体器件及其制造方法 |
Country Status (4)
Country | Link |
---|---|
US (4) | US8384229B2 (zh) |
JP (1) | JP5448727B2 (zh) |
CN (3) | CN102097409B (zh) |
HK (1) | HK1208097A1 (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102522377A (zh) * | 2011-12-27 | 2012-06-27 | 上海艾为电子技术有限公司 | Qfn封装结构 |
CN102543928A (zh) * | 2011-12-27 | 2012-07-04 | 上海艾为电子技术有限公司 | Qfn封装结构 |
CN103219374A (zh) * | 2012-01-24 | 2013-07-24 | 富士通株式会社 | 半导体器件及电源器件 |
CN107564838A (zh) * | 2016-06-30 | 2018-01-09 | 库利克和索夫工业公司 | 为导线环路生成导线环路轮廓的方法以及检查相邻的导线环路之间的足够间隙的方法 |
CN108242408A (zh) * | 2016-12-27 | 2018-07-03 | 瑞萨电子株式会社 | 制造半导体装置的方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012120568A1 (ja) * | 2011-03-09 | 2012-09-13 | パナソニック株式会社 | 半導体装置 |
JP6416291B2 (ja) * | 2015-01-22 | 2018-11-07 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11121683A (ja) * | 1997-10-08 | 1999-04-30 | Nissan Motor Co Ltd | 半導体集積回路 |
CN1638111A (zh) * | 2003-12-25 | 2005-07-13 | 株式会社瑞萨科技 | 半导体元件的制造方法 |
CN1854960A (zh) * | 2005-04-26 | 2006-11-01 | 夏普株式会社 | 调节器 |
US20080135995A1 (en) * | 2006-12-08 | 2008-06-12 | Wu Hu Li | Electronic component |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6351441A (ja) | 1986-08-21 | 1988-03-04 | Daikin Ind Ltd | フツ素ゴム加硫用組成物 |
JPS6351441U (zh) * | 1986-09-20 | 1988-04-07 | ||
JPH04107940A (ja) * | 1990-08-29 | 1992-04-09 | Hitachi Ltd | 半導体装置及びその構成部品 |
JPH08236564A (ja) * | 1995-02-28 | 1996-09-13 | Nec Kyushu Ltd | 半導体装置 |
FR2764115B1 (fr) * | 1997-06-02 | 2001-06-08 | Sgs Thomson Microelectronics | Dispositif semiconducteur et procede de connexion des fils internes de masse d'un tel dispositif |
US7030469B2 (en) * | 2003-09-25 | 2006-04-18 | Freescale Semiconductor, Inc. | Method of forming a semiconductor package and structure thereof |
JP4570868B2 (ja) * | 2003-12-26 | 2010-10-27 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
JP4489485B2 (ja) * | 2004-03-31 | 2010-06-23 | 株式会社ルネサステクノロジ | 半導体装置 |
JP4230439B2 (ja) * | 2004-09-22 | 2009-02-25 | 三菱電機株式会社 | 半導体応用装置 |
CN1755929B (zh) * | 2004-09-28 | 2010-08-18 | 飞思卡尔半导体(中国)有限公司 | 形成半导体封装及其结构的方法 |
US7791182B2 (en) * | 2005-09-27 | 2010-09-07 | Infineon Technologies Ag | Semiconductor component having maximized bonding areas of electrically conductive members connected to semiconductor device and connected to leadframe and method of producing |
JP2007165368A (ja) | 2005-12-09 | 2007-06-28 | Denso Corp | ワイヤ検査システム |
JP5405785B2 (ja) * | 2008-09-19 | 2014-02-05 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
-
2009
- 2009-11-05 JP JP2009253999A patent/JP5448727B2/ja active Active
-
2010
- 2010-10-27 US US12/913,332 patent/US8384229B2/en active Active
- 2010-11-04 CN CN201010536912.2A patent/CN102097409B/zh active Active
- 2010-11-04 CN CN201510101284.8A patent/CN104681524A/zh active Pending
- 2010-11-04 CN CN201510100814.7A patent/CN105047571A/zh active Pending
-
2013
- 2013-02-25 US US13/776,215 patent/US8846455B2/en active Active
-
2014
- 2014-08-25 US US14/467,930 patent/US9040358B2/en active Active
-
2015
- 2015-05-04 US US14/703,596 patent/US20150235926A1/en not_active Abandoned
- 2015-09-02 HK HK15108606.2A patent/HK1208097A1/zh unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11121683A (ja) * | 1997-10-08 | 1999-04-30 | Nissan Motor Co Ltd | 半導体集積回路 |
CN1638111A (zh) * | 2003-12-25 | 2005-07-13 | 株式会社瑞萨科技 | 半导体元件的制造方法 |
CN1854960A (zh) * | 2005-04-26 | 2006-11-01 | 夏普株式会社 | 调节器 |
US20080135995A1 (en) * | 2006-12-08 | 2008-06-12 | Wu Hu Li | Electronic component |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102522377A (zh) * | 2011-12-27 | 2012-06-27 | 上海艾为电子技术有限公司 | Qfn封装结构 |
CN102543928A (zh) * | 2011-12-27 | 2012-07-04 | 上海艾为电子技术有限公司 | Qfn封装结构 |
CN103219374A (zh) * | 2012-01-24 | 2013-07-24 | 富士通株式会社 | 半导体器件及电源器件 |
CN107564838A (zh) * | 2016-06-30 | 2018-01-09 | 库利克和索夫工业公司 | 为导线环路生成导线环路轮廓的方法以及检查相邻的导线环路之间的足够间隙的方法 |
CN108242408A (zh) * | 2016-12-27 | 2018-07-03 | 瑞萨电子株式会社 | 制造半导体装置的方法 |
CN108242408B (zh) * | 2016-12-27 | 2023-07-18 | 瑞萨电子株式会社 | 制造半导体装置的方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2011100828A (ja) | 2011-05-19 |
US20150235926A1 (en) | 2015-08-20 |
US20140363926A1 (en) | 2014-12-11 |
US9040358B2 (en) | 2015-05-26 |
US8846455B2 (en) | 2014-09-30 |
HK1208097A1 (zh) | 2016-02-19 |
JP5448727B2 (ja) | 2014-03-19 |
US20130171776A1 (en) | 2013-07-04 |
CN102097409B (zh) | 2015-03-25 |
US8384229B2 (en) | 2013-02-26 |
CN105047571A (zh) | 2015-11-11 |
US20110101544A1 (en) | 2011-05-05 |
CN104681524A (zh) | 2015-06-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN102097409A (zh) | 半导体器件及其制造方法 | |
US8828805B2 (en) | Manufacturing method of semiconductor device | |
US11557722B2 (en) | Hall-effect sensor package with added current path | |
US20140179063A1 (en) | Resin sealing type semiconductor device and method of manufacturing the same, and lead frame | |
KR20180077047A (ko) | 반도체 장치 | |
TW200741924A (en) | Method for making QFN package with power and ground rings | |
US20100193920A1 (en) | Semiconductor device, leadframe and method of encapsulating | |
TWI256091B (en) | A semiconductor package having stacked chip package and a method | |
JP6178555B2 (ja) | 半導体装置の製造方法および半導体装置 | |
JP2014203879A (ja) | 半導体装置の製造方法および半導体装置 | |
JP2010186831A (ja) | 半導体装置 | |
US8299587B2 (en) | Lead frame package structure for side-by-side disposed chips | |
US9000570B2 (en) | Semiconductor device with corner tie bars | |
JP5123966B2 (ja) | 半導体装置 | |
US11862540B2 (en) | Mold flow balancing for a matrix leadframe | |
CN116096214A (zh) | 具有钝化磁集中器的半导体装置 | |
JP5062086B2 (ja) | 半導体装置 | |
US20140312474A1 (en) | Semiconductor package with wire bonding | |
US20080038872A1 (en) | Method of manufacturing semiconductor device | |
US20240258211A1 (en) | Semiconductor device package with isolation | |
CN100477198C (zh) | 芯片封装结构及其制造方法 | |
JPS6233343Y2 (zh) | ||
JPH0669401A (ja) | 半導体素子用リードフレーム | |
KR20010069063A (ko) | 접착성 댐-바를 갖는 리드프레임 | |
KR20040011776A (ko) | 본딩 와이어 손상 방지형 반도체 칩 패키지 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP02 | Change in the address of a patent holder | ||
CP02 | Change in the address of a patent holder |
Address after: Tokyo, Japan, Japan Patentee after: Renesas Electronics Corporation Address before: Kanagawa Patentee before: Renesas Electronics Corporation |