CN100337340C - 有机el元件的制造方法及装置 - Google Patents
有机el元件的制造方法及装置 Download PDFInfo
- Publication number
- CN100337340C CN100337340C CNB018210910A CN01821091A CN100337340C CN 100337340 C CN100337340 C CN 100337340C CN B018210910 A CNB018210910 A CN B018210910A CN 01821091 A CN01821091 A CN 01821091A CN 100337340 C CN100337340 C CN 100337340C
- Authority
- CN
- China
- Prior art keywords
- organic
- vapor deposition
- thin film
- substrate
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/321—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3]
- H10K85/324—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3] comprising aluminium, e.g. Alq3
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (5)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP390428/2000 | 2000-12-22 | ||
JP2000390428A JP2002190389A (ja) | 2000-12-22 | 2000-12-22 | 有機el素子の製造方法及び装置 |
JP390428/00 | 2000-12-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1483300A CN1483300A (zh) | 2004-03-17 |
CN100337340C true CN100337340C (zh) | 2007-09-12 |
Family
ID=18856799
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB018210910A Expired - Fee Related CN100337340C (zh) | 2000-12-22 | 2001-12-20 | 有机el元件的制造方法及装置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2002190389A (zh) |
KR (1) | KR100788152B1 (zh) |
CN (1) | CN100337340C (zh) |
TW (1) | TW546394B (zh) |
WO (1) | WO2002052903A1 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005149924A (ja) * | 2003-11-17 | 2005-06-09 | Toray Ind Inc | 蒸着装置および蒸着材料の回収・再利用方法並びに有機電界発光装置の製造方法。 |
CN103270186B (zh) | 2010-12-23 | 2015-01-14 | 夏普株式会社 | 成膜材料的回收方法 |
WO2012090774A1 (ja) | 2010-12-27 | 2012-07-05 | シャープ株式会社 | 蒸着装置および回収装置 |
WO2012090772A1 (ja) * | 2010-12-27 | 2012-07-05 | シャープ株式会社 | 蒸着装置、削具および蒸着材料の回収方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08111285A (ja) * | 1994-10-07 | 1996-04-30 | Tdk Corp | 有機エレクトロルミネセンス素子の製造方法及びその装置 |
JPH10168559A (ja) * | 1996-12-06 | 1998-06-23 | Ulvac Japan Ltd | 有機薄膜形成装置及び有機材料の再利用方法 |
CN1188516A (zh) * | 1996-04-01 | 1998-07-22 | 东丽株式会社 | 带薄膜基板的制造方法和制造装置 |
JPH10195641A (ja) * | 1997-01-09 | 1998-07-28 | Ulvac Japan Ltd | 有機薄膜形成装置 |
CN1212114A (zh) * | 1996-11-25 | 1999-03-24 | 精工爱普生株式会社 | 有机电致发光元件及其制造方法和有机电致发光显示装置 |
JPH11229123A (ja) * | 1998-02-12 | 1999-08-24 | Casio Comput Co Ltd | 蒸着装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6208075B1 (en) * | 1998-11-05 | 2001-03-27 | Eastman Kodak Company | Conductive fluorocarbon polymer and method of making same |
JP3742567B2 (ja) * | 2000-06-22 | 2006-02-08 | 松下電工株式会社 | 真空蒸着装置及び真空蒸着方法 |
JP2002203682A (ja) * | 2000-10-26 | 2002-07-19 | Semiconductor Energy Lab Co Ltd | 発光装置及びその作製方法 |
-
2000
- 2000-12-22 JP JP2000390428A patent/JP2002190389A/ja active Pending
-
2001
- 2001-12-19 TW TW090131529A patent/TW546394B/zh not_active IP Right Cessation
- 2001-12-20 KR KR1020037007313A patent/KR100788152B1/ko not_active IP Right Cessation
- 2001-12-20 WO PCT/JP2001/011192 patent/WO2002052903A1/ja active Application Filing
- 2001-12-20 CN CNB018210910A patent/CN100337340C/zh not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08111285A (ja) * | 1994-10-07 | 1996-04-30 | Tdk Corp | 有機エレクトロルミネセンス素子の製造方法及びその装置 |
CN1188516A (zh) * | 1996-04-01 | 1998-07-22 | 东丽株式会社 | 带薄膜基板的制造方法和制造装置 |
CN1212114A (zh) * | 1996-11-25 | 1999-03-24 | 精工爱普生株式会社 | 有机电致发光元件及其制造方法和有机电致发光显示装置 |
JPH10168559A (ja) * | 1996-12-06 | 1998-06-23 | Ulvac Japan Ltd | 有機薄膜形成装置及び有機材料の再利用方法 |
JPH10195641A (ja) * | 1997-01-09 | 1998-07-28 | Ulvac Japan Ltd | 有機薄膜形成装置 |
JPH11229123A (ja) * | 1998-02-12 | 1999-08-24 | Casio Comput Co Ltd | 蒸着装置 |
Also Published As
Publication number | Publication date |
---|---|
WO2002052903A1 (en) | 2002-07-04 |
KR20030072553A (ko) | 2003-09-15 |
JP2002190389A (ja) | 2002-07-05 |
KR100788152B1 (ko) | 2007-12-21 |
TW546394B (en) | 2003-08-11 |
CN1483300A (zh) | 2004-03-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4556282B2 (ja) | 有機el素子およびその製造方法 | |
JP3868280B2 (ja) | 有機電界発光素子の製造装置 | |
CN1723741A (zh) | 发光装置、制造装置、成膜方法及清洁方法 | |
JP4739684B2 (ja) | ポリマー支持体上に2つのバリア層の配置を形成するための方法 | |
JP2012162806A (ja) | クリーニング方法 | |
CN1950541A (zh) | 通过蒸发金属和金属合金进行真空淀积的方法和设备 | |
US20100043710A1 (en) | Inner plate and crucible assembly for deposition having the same | |
JP7364432B2 (ja) | 成膜装置、成膜方法、及び電子デバイス製造方法 | |
CN100337340C (zh) | 有机el元件的制造方法及装置 | |
CN101467493A (zh) | 发光元件和发光元件的制造方法 | |
US20050238816A1 (en) | Method and apparatus of depositing low temperature inorganic films on plastic substrates | |
CN1737187A (zh) | 用于保护制品的方法及相关组合物 | |
Ding et al. | Preferential orientation of titanium carbide films deposited by a filtered cathodic vacuum arc technique | |
US7993459B2 (en) | Delivering particulate material to a vaporization zone | |
JPH11222667A (ja) | 蒸着源用るつぼ、及び蒸着装置 | |
JP4533964B1 (ja) | 発光装置の再生産方法および発光装置の再生産装置 | |
CN104630725A (zh) | 一种TiN/Ti/Si/Ti多层耐磨耐蚀薄膜材料及其制备方法 | |
KR100658731B1 (ko) | 증발원 및 이를 구비하는 유기물 증착장치 | |
CN110527950B (zh) | 一种防粘材料 | |
JPH0922782A (ja) | 有機el素子およびその製造方法 | |
CN1549351A (zh) | 有机发光二极管蒸镀机台 | |
KR100282024B1 (ko) | 스퍼터링에 의한 유기전기발광소자의 제조방법 | |
EP1121476B1 (en) | Electron beam physical vapor deposition apparatus | |
KR20060095242A (ko) | 증발원, 증착장치 및 박막 형성 방법 | |
CN117845216A (zh) | 一种覆有SiC涂层的石墨坩埚及其制备方法和应用 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
REG | Reference to a national code |
Ref country code: HK Ref legal event code: DE Ref document number: 1062254 Country of ref document: HK |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
REG | Reference to a national code |
Ref country code: HK Ref legal event code: WD Ref document number: 1062254 Country of ref document: HK |
|
C56 | Change in the name or address of the patentee |
Owner name: NIPPON STEEL + SUMITOMO METAL CORPORATION Free format text: FORMER NAME: NIPPON SEEL CHEMICAL CO., LTD. |
|
CP01 | Change in the name or title of a patent holder |
Address after: Tokyo, Japan Patentee after: Nippon Steel Chemical Co. Address before: Tokyo, Japan Patentee before: Nippon Seel Chemical Co., Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070912 Termination date: 20151220 |
|
EXPY | Termination of patent right or utility model |