WO2024093105A1 - Weak-absorption low-reflectance clear anti-blue-light resin lens and preparation method therefor - Google Patents

Abstract

A weak-absorption low-reflectance clear anti-blue-light resin lens and a preparation method therefor. The weak-absorption low-reflectance clear anti-blue-light resin lens comprises a resin lens substrate (1), a hardened layer (2), and a weak-absorption low-reflectance clear anti-blue-light film layer (3); the resin lens substrate (1), the hardened layer (2), and the weak-absorption low-reflectance clear anti-blue-light film layer (3) are sequentially arranged; the hardened layer (2) is located on the surface of the resin lens substrate (1); the weak-absorption low-reflectance clear anti-blue-light film layer (3) is located on the surface of the hardened layer (2); and the weak-absorption low-reflectance clear anti-blue-light film layer (3) comprises a silicon-aluminum composite oxide layer (3-1, 3-6, 3-9), a titanium-niobium composite oxide layer (3-2, 3-5, 3-7), a tantalum nitride layer (3-3), a silicon dioxide layer (3-4), and a tin-doped indium oxide layer (3-8). By the adjustment of the structure of an ultra-low-reflectance clear anti-blue-light film layer, a special tantalum nitride material and a proper process, an ultra-low-reflectance lens having a clear visual effect is obtained, and high-temperature resistance and environmental resistance of the resin lens are greatly improved, so that the lens has good market application prospects.

Description

A weakly absorbing, low-reflective, clear-background-color, blue-light-proof resin lens and a preparation method thereof Technical Field

The present invention relates to the technical field of resin lens preparation, and in particular to a weakly absorbing, low-reflective, clear-background-color, blue-light-proof resin lens and a preparation method thereof.

Background technique

In recent years, the demand for optical resin lenses in the domestic and international eyewear markets has been growing. Compared with glass lenses, resin lenses have the advantages of light weight, good dyeing performance, and easy processing. Medium and high refractive index optical resin lenses are more favored by users for their unique advantages such as high light transmittance, UV protection, and ultra-thinness. Generally, a film is coated on the surface of the resin lens to reduce light reflection and enhance light transmission, which is an optical anti-reflection film.

Blue light is divided into harmful blue light and beneficial blue light. Modern people's daily life is inseparable from various electronic products, and the chances of exposure to blue light have increased dramatically. Mobile phone screens, LED lights, and computer screens will produce a large amount of blue light, which will cause harm to people's eyes and skin, stimulate brown pigments, cause yellow spots and freckles on the skin, deepen the degree of myopia, cause visual fatigue, and also be detrimental to normal sleep. Stronger blue light with a shorter wavelength has potential harm to the human body, while blue light with a longer wavelength can make the lens more beautiful, improve the clarity of the lens, and increase people's excitement at work. The new national standard for anti-blue light also distinguishes between harmful blue light and beneficial blue light.

The main market demands for resin lenses are: ① meet the blue light protection standards to protect people's visual health; ② low reflectivity to reduce interference and improve aesthetic clarity; ③ clear background color, clear and white, making the face and eyes whiter and more beautiful. In order to meet the new requirements of consumers in the new electronic environment and the needs of the market, we urgently need to provide a resin lens with weak absorption, low reflection, clear background color, blue light protection, high temperature resistance and durability.

Summary of the invention

In order to meet new consumer demands, the present invention aims to provide a low-absorption, ultra-low-reflection, clear background, blue-light-proof, and high-temperature-resistant resin lens and a preparation method thereof, which can achieve ultra-low reflection while meeting the blue-light-proof standards, and improve the high-temperature resistance and durability of the resin lens by reducing stress.

The present invention is achieved through the following technical solutions:

The first aspect of the present invention provides a weak absorption, low reflection, clear background color, blue light-proof resin lens, comprising: a resin lens substrate, a hardened layer, and a low absorption, clear background color, blue light-proof film layer; wherein the resin lens substrate, the hardened layer, and the weak absorption, low reflection, clear background color, blue light-proof film layer are arranged in sequence, the hardened layer is located on the surface of the resin lens substrate, and the weak absorption, low reflection, clear background color, blue light-proof film layer is located on the surface of the hardened layer;

Furthermore, the weakly absorbing, low-reflecting, clear-background-color, blue-light-proof resin lens further comprises a waterproof layer, and the waterproof layer is located on the surface of the weakly absorbing, low-reflecting, clear-background-color, blue-light-proof film layer;

Furthermore, the UV cutoff wavelength of the resin lens substrate is 405-407 nm;

Furthermore, the material of the hardened layer is mainly composed of silicone;

Further, the weak absorption, low reflection, clear background, blue light protection film layer comprises a silicon-aluminum composite oxide layer, a titanium-niobium composite oxide layer, a tantalum nitride (i.e., TaN) layer, a silicon dioxide (SiO ₂ ) layer, and a tin-doped indium oxide (i.e., ITO) layer; further, the weak absorption, low reflection, clear background, blue light protection film layer comprises three layers of silicon-aluminum composite oxide layers, three layers of titanium-niobium composite oxide layers, a TaN layer, a SiO ₂ layer, and an ITO layer;

Further, the silicon-aluminum composite oxide layer is composed of a composite material of SiO ₂ and Al ₂ O ₃ , wherein the molar fraction of SiO ₂ in the composite material is 70% to 95%; further preferably, wherein the molar fraction of SiO ₂ in the composite material is 92%;

Further, the titanium-niobium composite oxide layer is composed of a composite material of TiO ₂ and Nb ₂ O ₅ , wherein TiO ₂ accounts for 10% to 90% of the molar fraction of the composite material; preferably, wherein TiO ₂ accounts for 80% of the molar fraction of the composite material;

Furthermore, the purity of TaN in the tantalum nitride layer is greater than 99.9%;

Furthermore, the thickness of the hardened layer is 1 to 5 μm;

Furthermore, the thickness of the weakly absorbing, low-reflective, bottom-color blue-light-proof film layer is 200 to 600 nm;

Furthermore, the thickness of the waterproof layer is 4 to 20 nm;

Furthermore, the average reflectivity of the weakly absorbing, low-reflective, clear-background-color blue-light-proof resin lens is ≤0.3%;

Furthermore, the peak reflectivity of the weakly absorbing, low-reflective, clear-background-color blue-light-proof resin lens in the visible light band of 400 to 700 nm is ≤2.2%;

Furthermore, the reflected light color coordinate H value of the weakly absorbing, low-reflective, clear-background-color anti-blue-light resin lens is 270 to 295, and the C value is 12 to 25;

Furthermore, the yellow index of the weakly absorbing, low-reflective, clear-base-color blue-light-proof resin lens is ≤3.5%;

The second aspect of the present invention provides a method for preparing the above-mentioned weakly absorbing, low-reflective, clear-background-color blue-light-proof resin lens, comprising the following steps:

S1: preparing a hard layer: forming a hard layer on the surface of a resin lens substrate, that is, obtaining a resin lens containing a hard layer;

S2: preparing a weak absorption, low reflection, clear background, blue light-proof film layer: forming the weak absorption, low reflection, clear background, blue light-proof film layer on the surface of the resin lens obtained in S1, that is, obtaining a resin lens containing a weak absorption, low reflection, clear background, blue light-proof film layer, specifically comprising:

S21: forming a resin lens having a first silicon-aluminum composite oxide layer and a second titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S1;

S22: forming a third layer of resin lens containing tantalum nitride layer on the surface of the resin lens obtained in step S21;

S23: forming a fourth _SiO2- containing resin lens on the surface of the resin lens obtained in step S22;

S24: Forming a fifth layer of titanium-niobium composite oxide on the surface of the resin lens obtained in step S23 A resin lens having a material layer, a sixth silicon-aluminum composite oxide layer, and a seventh titanium-niobium composite oxide layer;

S25: forming an eighth ITO-containing resin lens on the surface of the resin lens obtained in step S24;

S26: forming a ninth layer of a resin lens containing a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in step S25;

S3: preparing a waterproof layer: forming a waterproof layer on the surface of the resin lens obtained in step S2.

Beneficial Effects

1. The present invention adopts a specific resin substrate and a film structure to effectively block harmful blue light and transmit beneficial blue light; at the same time, the yellow index of the product is ≤3%, which has a good visual effect;

2. The TaN layer prepared by a specific process can supplement the anti-blue light standards and reduce the yellow index to increase the clear background effect. The film layer produces 1.6% absorption on a single side in the 415-445nm band, which is important for the anti-blue light standards, ensuring that the lens meets the anti-blue light standards and protects the human eye from blue light damage; the absorption of yellow light is about 0.5% higher than that of blue light, thereby effectively reducing the yellow index and ensuring that the lens is clear and white.

3. Obtain ultra-low reflection effect: The film layer material adopts niobium-titanium composite oxide material, which makes the anti-reflection bandwidth wider and the reflectivity lower, and effectively controls the peak reflectivity and peak reflectivity of the average band of visible light, significantly improving the light transmittance of the resin lens and obtaining an ultra-low reflection effect;

4. Significantly improve the high temperature resistance and durability of the lens: First, the use of niobium-titanium composite oxide material can effectively avoid the easy crystallization of _TiO2 film, and can also effectively avoid the defect of dense _Nb2O5 film on resin lenses. Under the condition of low _ion source energy for coating resin glasses, the film is kept in an amorphous state to prevent the film from cracking due to crystallization, thereby improving the high temperature and high humidity resistance of the film and lens, and further improving the durability of the product; secondly, the silicon-aluminum composite oxide material layer effectively avoids the easy formation of long columns of _SiO2 , resulting in high stress in the film, maintains the glassy structure of the film, and improves the high temperature resistance of the film;

6. Improve product repeatability and mass production: The use of niobium-titanium composite oxide materials to prepare the film layer effectively reduces the sensitivity of _TiO2 to the _O2 flow rate in the IAD-assisted process, reduces the process difficulty and effectively improves the repeatability and mass production of the product.

BRIEF DESCRIPTION OF THE DRAWINGS

Figure 1 is a schematic diagram of the layers of a weakly absorbing, low-reflection, clear background, blue-light-proof resin lens prepared in Examples 1 to 3 of the present invention; a resin lens substrate 1, a hardened layer 2, an ultra-low-reflection clear background film layer 3, and a waterproof layer 4; wherein the ultra-low-reflection clear background film layer 3 includes: a silicon-aluminum composite oxide layer 3-1, a titanium-niobium composite oxide layer 3-2, a tantalum nitride layer 3-3, a silicon dioxide layer 3-4, a titanium-niobium composite oxide layer 3-5, a silicon-aluminum composite oxide layer 3-6, a titanium-niobium composite oxide layer 3-7, an ITO layer 3-8, and a silicon-aluminum composite oxide layer 3-9

Detailed ways

In a specific embodiment, the weak absorption low reflection background anti-blue light film layer includes three silicon aluminum composite oxide layers, three titanium niobium composite oxide layers, a tantalum nitride (TaN) layer, a silicon dioxide ( _SiO2 ) layer and a tin-doped indium oxide (i.e., ITO) layer, wherein the layers in the ultra-low reflection background anti-blue light film layer are: (1) silicon aluminum composite oxide layer, (2) titanium niobium composite oxide layer, (3) TaN layer, (4) _SiO2 layer, (5) titanium niobium composite oxide layer, (6) silicon aluminum composite oxide layer, (7) titanium niobium composite oxide layer, (8) ITO layer, (9) silicon aluminum composite oxide layer; and the first silicon aluminum composite oxide layer is located on the surface of the hardened layer;

Furthermore, in a specific embodiment, the thickness of each layer of the weakly absorbing, low-reflective, clear background anti-blue light film layer is:

The thickness of the first silicon-aluminum composite oxide layer is 0 to 180 nm, preferably 5 to 30 nm;

The thickness of the second titanium-niobium composite oxide layer is 10 to 40 nm, preferably 10 to 25 nm;

The thickness of the third TaN layer is 0.4-1.5 nm, preferably 0.5-0.6 nm;

The thickness of the fourth _SiO2 layer is 20 to 60 nm, preferably 25 to 40 nm;

The thickness of the fifth titanium-niobium composite oxide layer is 30 to 80 nm, preferably 40 to 60 nm;

The thickness of the sixth silicon-aluminum composite oxide layer is 10 to 50 nm, preferably 10 to 20 nm;

The thickness of the seventh titanium-niobium composite oxide layer is 25 to 75 nm, preferably 30 to 45 nm;

The thickness of the eighth ITO layer is 2 to 10 nm, preferably 4 to 5 nm;

The thickness of the ninth silicon-aluminum composite oxide layer is 60 to 130 nm, preferably 70 to 95 nm;

In a specific embodiment, the step of preparing the hardened layer in S1 comprises: immersing the ultrasonically cleaned resin lens substrate into a 25-30% by weight hardening solution aqueous solution at a dipping temperature of 10-20° C., dipping for 4-8 seconds and then pulling out the solution at a speed of 1.0-3.0 mm/s, and then drying it at 70-90° C. for 2-5 hours, then taking out the substrate and sending it to a drying oven for drying and curing, the curing temperature is 100-150° C., and the curing time is 120-180 min, so as to obtain a resin lens containing a hardened layer;

In a specific embodiment, the process of preparing the weak absorption, low reflection, clear background color anti-blue light film layer in step S2 comprises:

In a vacuum coating machine, a vacuum coating process is used to evaporate silicon-aluminum composite oxide layer, titanium-niobium composite oxide, tantalum nitride, silicon dioxide and ITO solid film layer materials, and then they are transferred through the gas phase to form a thin film on the surface of the resin lens obtained in step S1, thereby forming a weak absorption and low reflection clear background color film layer, which specifically includes the following steps:

S21: forming a first layer of silicon-aluminum composite oxide on the surface of the resin lens obtained in step S1, heating the silicon-aluminum composite oxide with a high-energy electron beam at a rate of 1000 Å under the conditions of a background vacuum of ≤3×10 ^-3 Pa, a temperature in the coating chamber of 50-70°C, and an ion source-assisted process. Depositing the evaporated silicon-aluminum composite oxide in the form of nano-scale molecules to obtain a resin lens containing a first silicon-aluminum composite oxide layer;

S22: forming ^a titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S21, heating the titanium-niobium composite oxide on the surface of the resin lens obtained in step S21 by using a high-energy electron beam at a rate of depositing the evaporated titanium-niobium composite oxide in the form of nano-scale molecules to obtain a resin lens containing a second titanium-niobium composite oxide layer;

S23: forming a tantalum nitride layer on the surface of the resin lens obtained in step S22, specifically comprising:

S231: First evacuate to a background vacuum of ≤8×10 ^-4 Pa, then bombard with an ion source Hall source for 50 to 80 seconds, the ion source bombardment parameters are: anode voltage: 90 to 140 V, anode current: 2.5 to 5 A, auxiliary gas is Ar, and the flow rate is 5 to 20 sccm; preferably, the ion source Hall source bombardment time is 60 seconds, and the ion source bombardment parameters are: anode voltage: 110 V, anode current: 3 A, auxiliary gas is Ar, and the flow rate is 10 sccm;

S232: Deposition in an ion source assisted process, using a high energy electron beam to heat TaN at a rate The evaporated TaN is deposited in the form of nano-scale molecules. The auxiliary parameters of the ion source are: anode voltage: 90-140V, anode current: 2.5-5A, auxiliary gas is Ar and _N2 , Ar flow rate is 5-15sccm, _N2 flow rate is: 3-15sccm; preferably, under the assistance of the ion source, at a rate The evaporated TaN is deposited in the form of nano-scale molecules, and the auxiliary parameters of the ion source are: anode voltage: 110V, anode current: 3A, auxiliary gas is Ar and _N2 , Ar flow rate is 10sccm, _N2 flow rate is: 5sccm;

S233: continue bombarding the surface of the TaN film layer with the ion source Hall source for 20 to 40 seconds, the bombardment parameters are: anode voltage: 90 to 140 V, anode current: 2.5 to 5 A, auxiliary gases are Ar and N ₂ , Ar flow rate is 5 to 15 sccm, N ₂ flow rate is 3 to 15 sccm; preferably, the bombardment time is 30 seconds, the bombardment parameters are: anode voltage: 110 V, anode current: 3 A, auxiliary gases are Ar and N ₂ , Ar flow rate is 10 sccm, N ₂ flow rate is 5 sccm;

S24: The surface of the resin lens obtained in S23 is heated by a high-energy electron beam at a rate of 10000 t/ _cm2 , with a background vacuum of ≤3×10 ^-3 Pa, a temperature in the coating chamber of 50-70°C, and an ion source assisted process. The evaporated _SiO2 is deposited in the form of nano-scale molecules to obtain a resin lens containing a _SiO2 layer; the ion source auxiliary parameters are: anode voltage: 90-140V, anode current: 2.5-5A, auxiliary gas is Ar, and the flow rate is 5-20sccm; preferably, the ion source is assisted at a rate of The evaporated SiO ₂ was deposited in the form of nanoscale molecules, and the ion source auxiliary parameters were: anode voltage: 110 V, anode current: 3 A, auxiliary gas was Ar, and the flow rate was 10 sccm;

S25: repeating step S22 to form a titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S24;

S26: repeat step S21 to form a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in step S25;

S27: Repeat step S22 to form a titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S26;

S28: The surface of the resin lens obtained in S27 is at a background vacuum of ≤3×10 ^-3 Pa and the coating chamber Under the conditions of 50-70℃ and ion source assisted process, high energy electron beam is used to heat ITO at a rate of Depositing the evaporated ITO in the form of nano-scale molecules to obtain a resin lens containing an ITO layer;

S29: continuing to use the vacuum coating process on the surface of the resin lens obtained in S28, repeating the process steps of S21, and forming another layer of the resin lens containing the silicon-aluminum composite oxide layer;

In steps S21, S22, S25 to S29, the ion source assisted deposition process parameters are: the ion source is a Hall source, the anode voltage is 90 to 140 V, the anode current is 2.5 to 5 A, the auxiliary gas is O ₂ , and the flow rate is 10 to 30 sccm; preferably, the ion source assisted deposition process parameters are: the ion source is a Hall source, the anode voltage is 110 V, the anode current is 3 A, the auxiliary gas is O ₂ , and the flow rate is 15 sccm;

In a specific embodiment, the step S3: forming a waterproof layer on the surface of the resin lens obtained in step S2 comprises the following steps: continuing to use a vacuum coating process on the surface of the lens obtained in step S29, using a high-energy electron beam to heat the material at a rate of 1000 ℃ under the conditions that the background vacuum degree is ≤3×10 ^-3 Pa and the temperature in the coating chamber is 50-70°C. Depositing the evaporated fluorine-containing waterproof material (preferably a waterproof material containing perfluoroalkane (C ₁₂ F ₂₇ N)) in the form of nano-scale molecules to obtain a resin lens containing a waterproof layer;

In a specific embodiment, the tantalum nitride material has a molecular formula of TaN and a purity of 99.9%, and is made by sintering tantalum nitride powder using a conventional process, and is specifically commissioned to Changzhou Zhanchi Optoelectronics Technology Co., Ltd. for development and production;

In a specific embodiment, the silicon-aluminum composite oxide is developed and produced by Changzhou Zhanchi Optoelectronics Technology Co., Ltd. The silicon-aluminum composite oxide layer is composed of a composite material of SiO ₂ and Al ₂ O ₃ , and the molar fraction of SiO ₂ in the composite material is 70% to 95%. For specific models, please refer to the embodiments and comparative examples;

In a specific embodiment, the titanium-niobium composite oxide is developed and produced by Changzhou Zhanchi Optoelectronics Technology Co., Ltd. The titanium- _niobium composite oxide is composed of _TiO2 and _Nb2O5 . The molar fraction of _TiO2 is 10% to 90%, and the specific type is shown in the examples and comparative examples;

The resin lens substrate selected in the present invention is a conventional lens in the art, and the content of the UV powder is adjusted so that the UV cut-off wavelength is 405-407 nm. The definition of the UV cut-off wavelength refers to 5.4.2.4.4 of the optical resin lens standard QB/T 2506-2017;

For example, in a specific embodiment, a resin lens substrate with model MR-8 (refractive index 1.60) or MR-7 (refractive index 1.67) and a UV cutoff wavelength of 405 to 407 nm is purchased from Mitsui Chemicals, Inc. of Japan, hereinafter referred to as "MR-8-UV405" or "MR-7-UV405"; or in a specific embodiment, a resin lens substrate with a refractive index of 1.56 and a UV cutoff wavelength of 405 to 407 nm developed and produced by Jiangsu Shike New Materials Co., Ltd. is purchased, hereinafter referred to as "SK1.56-UV405". For the specific preparation method of the resin lens substrate, refer to the patent of Shike Optics Co., Ltd.: CN201410245692.6.

The present invention can select a conventional hardening liquid. For example, in a specific embodiment, the hardening liquid of model Z117 or Z118 (hereinafter referred to as "Z117" or "Z118") of Ito Optical Industry Co., Ltd. is selected; or in a specific embodiment, the hardening liquid of model VH56 (hereinafter referred to as "VH56") of Dun Optics (Changshu) Co., Ltd. is selected. The above-mentioned hardening liquid is selected to prepare the lens of the present invention, which greatly improves the dense connection between the film layers.

(I) Embodiment

Example 1

A weak absorption low reflection clear background anti-blue light resin lens, which comprises, in order: a resin lens substrate 1 (MR-8-UV405); a hardening layer 2 (Z117)/2.6-3μm; an ultra-low reflection clear background film layer 3 comprising: a silicon aluminum composite oxide layer 3-1 (wherein the molar percentage _{of SiO2} and _Al2O3 is: 92% _SiO2 : 8% _Al2O3 ; commissioned Changzhou Zhanchi Optoelectronics Technology Co., Ltd. to develop and produce, the material model is SA56)/24nm, a titanium _niobium composite oxide layer 3-2 (wherein the molar percentage of _TiO2 and _Nb2O5 is: 80% _TiO2 : ₂₀ % _Nb2O5 ; commissioned Changzhou Zhanchi Optoelectronics Technology Co., Ltd. to develop and produce, the material model is PTN28)/17.42nm, a tantalum nitride layer 3-3 (molecular formula TaN, purity 99.9% or _more , sintered by Changzhou Zhanchi Optoelectronics Technology Co., Ltd.)/0.6nm, silicon dioxide layer 3-4/32.1nm (molecular formula SiO ₂ , purity 99.99%, sintered by Danyang Keda Coating Materials Co., Ltd.), titanium niobium composite oxide layer 3-5 (material is the same as 3-2)/48.9nm, silicon aluminum composite oxide layer 3-6/12.1nm (material is the same as 3-1); titanium niobium composite oxide layer 3-7 (material is the same as 3-2)/34.95nm; ITO layer 3-8/5nm; silicon aluminum composite oxide layer 3-9/91.1nm (material is the same as 3-1); waterproof layer 4 (using waterproof material containing C ₁₂ F ₂₇ N/10nm);

The method for preparing the resin lens comprises the following steps:

S1: Making a hard layer: immerse the resin lens substrate cleaned by ultrasonic wave into a 27% by weight hardening liquid aqueous solution of model Z117 at a dipping temperature of 15°C, and pull out the solution at a speed of 2.0 mm/s after dipping for 5 seconds; after drying at 80°C for 3 hours, take out the substrate and send it to a drying oven for drying and curing at a curing temperature of 120°C for 150 minutes, thereby obtaining a resin lens with a hardening layer;

S2: Preparation of weak absorption, low reflection, clear background, blue light-proof film layer: In a vacuum coating machine, using a vacuum coating process, the solid film layer material is evaporated and then transferred through the gas phase, and deposited into a thin film on the surface of the resin lens obtained in step S1 to form a weak absorption, low reflection, clear background, blue light-proof film layer, specifically comprising the following steps:

S21: forming a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in step S1. Under the conditions of a background vacuum of ≤3×10 ^-3 Pa, a temperature in the coating chamber of 50-70°C, and an ion source-assisted process, a high-energy electron beam is used to heat the silicon-aluminum composite oxide at a rate of Depositing the evaporated silicon-aluminum composite oxide in the form of nano-scale molecules to obtain a resin lens containing a first silicon-aluminum composite oxide layer;

S22: Forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S21. On the surface of the resin lens obtained in step S21, under the conditions of background vacuum ≤ 3×10 ^-3 Pa, temperature in the coating chamber of 50-70°C, and ion source assisted process, a high-energy electron beam is used to heat the titanium-niobium composite oxide at a rate of depositing the evaporated titanium-niobium composite oxide in the form of nano-scale molecules to obtain a resin lens containing a second titanium-niobium composite oxide layer;

S23: forming a tantalum nitride layer on the surface of the resin lens obtained in step S22, specifically comprising the following steps: S231: first evacuating to a background vacuum degree of ≤8×10 ^-4 Pa, and then bombarding the lens with an ion source and a Hall source for 60 seconds, the ion source bombardment parameters are: anode voltage: 110V, anode current: 3A, auxiliary gas is Ar, flow rate is 10sccm; S232: deposition under ion source assisted process, using high energy electron beam to heat TaN at a rate The evaporated TaN is deposited in the form of nano-scale molecules, and the auxiliary parameters of the ion source are: anode voltage: 110V, anode current: 3A, auxiliary gases are Ar and _N2 , Ar flow rate is 10sccm, _N2 flow rate is: 5sccm; S233: continue to bombard the surface of the TaN film layer with the ion source Hall source for 30 seconds, and the bombardment parameters are: anode voltage: 110V, anode current: 3A, auxiliary gases are Ar and _N2 , Ar flow rate is 10sccm, _N2 flow rate is: 5sccm.

S24: The surface of the resin lens obtained in S23 is heated by a high-energy electron beam at a rate of 10000 t/ _cm2 , with a background vacuum of ≤3×10 ^-3 Pa, a temperature in the coating chamber of 50-70°C, and an ion source assisted process. The evaporated SiO ₂ is deposited in the form of nano-scale molecules to obtain a resin lens containing a SiO ₂ layer; the auxiliary parameters of the ion source are: anode voltage: 110V, anode current: 3A, auxiliary gas is Ar, and the flow rate is 10sccm.

S25: repeating step S22 to form a titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S24;

S26: repeat step S21 to form a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in step S25;

S27: Repeat step S22 to form a titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S26;

S28: The surface of the resin lens obtained in S27 is heated by a high-energy electron beam at a rate of 1000 Å to 1000 Å under the conditions that the background vacuum is ≤3×10 ^-3 Pa, the temperature in the coating chamber is 50-70°C, and an ion source is used to assist the process. Depositing the evaporated ITO in the form of nano-scale molecules to obtain a resin lens containing an ITO layer;

S29: continuing to use the vacuum coating process on the surface of the resin lens obtained in S28, repeating the process steps of S21, and forming another layer of the resin lens containing the silicon-aluminum composite oxide layer;

S3: preparing a waterproof layer: forming a waterproof layer on the surface of the resin lens obtained in step S29: continuing to use a vacuum coating process on the surface of the lens obtained in step S29, using a high-energy electron beam to heat the material at a rate of 1000 ℃ under the conditions that the background vacuum degree is ≤3×10 ^-3 Pa and the temperature in the coating chamber is 60°C. Will evaporate The waterproof material containing C ₁₂ F ₂₇ N is deposited on the surface of the resin lens obtained in S24 in the form of nano-scale molecules.

Example 2

A weak absorption low reflection clear background color anti-blue light resin lens, which comprises in sequence: a resin lens substrate 1 (SK1.56-UV405); a hardening layer 2 (VH56)/1-2.6μm; an ultra-low reflection clear background color film layer 3 comprising: a silicon aluminum composite oxide layer 3-1 (wherein the molar percentage of _SiO2 and _Al2O3 is: 92% _{SiO2 :} 8% _Al2O3 ; commissioned by Changzhou Zhanchi Optoelectronics Technology Co., _Ltd. to develop and produce, the material model is SA56)/24nm, a titanium _niobium composite oxide layer 3-2 (wherein the molar percentage of _TiO2 and _Nb2O5 is: 80% _TiO2 : 20 _{% Nb2O5} ; Entrusted to Changzhou Zhanchi Optoelectronics Technology Co., Ltd. for development and production, the material model is PTN28)/16.3nm, tantalum nitride layer 3-3 (molecular formula TaN, purity above 99.9%, sintered by Changzhou Zhanchi Optoelectronics Technology Co., Ltd.)/0.6nm, silicon dioxide layer 3-4/33.28nm (molecular formula SiO ₂ , purity 99.99%, sintered by Danyang Keda Coating Materials Co., Ltd.), titanium niobium composite oxide layer 3-5 (material is the same as 3-2)/48.14nm, silicon aluminum composite oxide layer 3-6/12.1nm (material is the same as 3-1); titanium niobium composite oxide layer 3-7 (material is the same as 3-2)/35.07nm; ITO layer 3-8/5nm; silicon aluminum composite oxide layer 3-9/91.0nm (material is the same as 3-1); waterproof layer 4 (using waterproof material containing C ₁₂ F ₂₇ N/10nm).

The method for preparing the resin lens comprises the following steps:

S1: Making a hard layer: immerse the resin lens substrate cleaned by ultrasonic wave into a 30% by weight hardening liquid aqueous solution of model VH56 at a dipping temperature of 15°C, and pull out the solution at a speed of 2.0 mm/s after dipping for 5 seconds; after drying at 80°C for 3 hours, take out the substrate and send it to a drying oven for drying and curing at a curing temperature of 120°C and a curing time of 150 minutes, thereby obtaining a resin lens with a hardening layer;

The remaining steps are the same as in Example 1.

Example 3

A weakly absorbing, low-reflective, clear-background-color, blue-light-proof resin lens, comprising: a resin lens substrate 1 (MR-7-UV405); hardening layer 2 (Z118)/1～2.6μm; ultra-low reflection background film layer 3 includes: silicon aluminum composite oxide layer 3-1 (wherein the molar percentage of SiO ₂ and Al ₂ O ₃ is: 92% SiO ₂ : 8% Al ₂ O ₃ ; commissioned by Changzhou Zhanchi Optoelectronics Technology Co., Ltd. to develop and produce, the material model is SA56)/24nm, titanium niobium composite oxide layer 3-2 (wherein the molar percentage of TiO ₂ and Nb ₂ O ₅ is: 80% TiO ₂ : 20% Nb ₂ O ₅ ; commissioned by Changzhou Zhanchi Optoelectronics Technology Co., Ltd. to develop and produce, the material model is PTN28)/19.44nm, tantalum nitride layer 3-3 (molecular formula TaN, purity above 99.9%, sintered by Changzhou Zhanchi Optoelectronics Technology Co., Ltd.)/0.6nm, silicon dioxide layer 3-4/30.3nm (molecular formula SiO ₂ , purity 99.99%, sintered by Danyang Keda Coating Materials Co., Ltd.), titanium-niobium composite oxide layer 3-5 (same material as 3-2)/50.08nm, silicon-aluminum composite oxide layer 3-6/12.1nm (same material as 3-1); titanium-niobium composite oxide layer 3-7 (same material as 3-2)/34.72nm; ITO layer 3-8/5nm; silicon-aluminum composite oxide layer 3-9/ _91.25nm (same material as 3-1); waterproof layer 4 (using waterproof material containing _C12F27N /10nm).

The method for preparing the resin lens comprises the following steps:

S1: Making a hard layer: immerse the resin lens substrate cleaned by ultrasonic wave into a 27% by weight hardening liquid aqueous solution of model Z118 at a dipping temperature of 15°C, and pull out the solution at a speed of 2.0 mm/s after dipping for 5 seconds; after drying at 80°C for 3 hours, take out the substrate and send it to a drying oven for drying and curing at a curing temperature of 120°C for 150 minutes, thereby obtaining a resin lens with a hardening layer;

The remaining steps are the same as in Example 1.

(II) Comparative Example

Comparative Example 1

A low-reflection clear base color blue light-proof resin lens, which comprises, in order: a resin lens substrate 1 (MR-8-UV405); a hardening layer 2 (Z117)/2.6-3 μm; an anti-reflection layer 3 comprising: a silicon-aluminum composite oxide layer 3-1 (wherein the molar percentage of SiO ₂ and Al ₂ O ₃ is: 92% SiO ₂ : 8% Al ₂ O ₃ ; commissioned by Changzhou Zhanchi Optoelectronics Technology Co., Ltd. to develop and produce, the material model is SA56)/24.6nm, a titanium-niobium composite oxide layer 3-2 (wherein the molar percentage of TiO ₂ and Nb ₂ O ₅ is: 80% TiO ₂ : 20% Nb ₂ O ₅ ; commissioned Changzhou Zhanchi Optoelectronics Technology Co., Ltd. to develop and produce, the material model is PTN28)/18.8nm, silicon-aluminum composite oxide layer 3-3/31.34nm (material is the same as 3-1), titanium-niobium composite oxide layer 3-4 (material is the same as 3-2)/51.32nm, silicon-aluminum composite oxide layer 3-5/10.41nm (material is the same as 3-1), titanium-niobium composite oxide layer 3-6 (material is the same as 3-2)/34.38nm, ITO layer 3-7/5nm; silicon-aluminum composite oxide layer 3-8/92.63nm (material is the same as 3-1); waterproof layer 4 (using waterproof material containing C ₁₂ F ₂₇ N/10nm);

The method for preparing the resin lens comprises the following steps:

S1: Making a hard layer: immerse the resin lens substrate cleaned by ultrasonic wave into a 27% by weight hardening liquid aqueous solution of model Z117 at a dipping temperature of 15°C, and pull out the solution at a speed of 2.0 mm/s after dipping for 5 seconds; after drying at 80°C for 3 hours, take out the substrate and send it to a drying oven for drying and curing at a curing temperature of 120°C for 150 minutes, thereby obtaining a resin lens with a hardening layer;

S2: preparing a low-reflection, clear background, and blue-light-proof film layer: in a vacuum coating machine, using a vacuum coating process, evaporating the solid film layer material and then transferring it through the gas phase, and depositing it into a thin film on the surface of the resin lens obtained in step S1, to form a low-reflection, clear background, and blue-light-proof film layer, specifically comprising the following steps:

S21: comprising the following steps:

S211: On the surface of the resin lens obtained in S1, under the conditions of background vacuum ≤3×10 ^-3 Pa, temperature in the coating chamber of 60°C, and ion source assisted process, high energy electron beam is used to heat the silicon aluminum composite oxide at a rate of Depositing the evaporated silicon-aluminum composite oxide in the form of nano-scale molecules to obtain a resin lens containing a first silicon-aluminum composite oxide layer;

S212: The surface of the resin lens obtained in S211 is heated by a high-energy electron beam at a rate of 1000 Å under the conditions of a background vacuum of ≤3×10 ^-3 Pa, a temperature in the coating chamber of 60°C, and an ion source-assisted process. Depositing the evaporated titanium-niobium composite oxide in the form of nano-scale molecules to obtain a resin lens containing a second titanium-niobium composite oxide layer;

S213: Repeat steps S211 and S212 to alternately form a third silicon-aluminum composite oxide layer, a fourth titanium-niobium composite oxide layer, a fifth silicon-aluminum composite oxide layer, and a sixth titanium-niobium composite oxide layer, that is, to form a third silicon-aluminum composite oxide layer, a fourth titanium-niobium composite oxide layer, A resin lens having a fifth silicon-aluminum composite oxide layer and a sixth titanium-niobium composite oxide layer;

S22: On the surface of the resin lens obtained in S21, under the conditions of background vacuum ≤3×10 ^-3 Pa, temperature in the coating chamber of 60°C, and ion source assisted process, high energy electron beam is used to heat ITO at a rate of Depositing the evaporated ITO in the form of nano-scale molecules to obtain a resin lens containing a seventh ITO layer;

S23: continuing to use the vacuum coating process on the surface of the resin lens obtained in S22, repeating the process steps of S211, and then forming a resin lens containing an eighth silicon-aluminum composite oxide layer;

S3: preparing a waterproof layer: forming a waterproof layer on the surface of the resin lens obtained in S23: continuing to use the vacuum coating process on the surface of the lens obtained in step S2, using a high-energy electron beam to heat the material at a rate of 1000 ℃ under the conditions that the background vacuum degree is ≤3×10 ^-3 Pa and the temperature in the coating chamber is 60°C. The evaporated waterproof material containing C ₁₂ F ₂₇ N is deposited in the form of nano-scale molecules on the surface of the resin lens obtained in S24 to obtain the lens.

Comparative Example 2

A low-reflection clear base color blue light-proof resin lens, which comprises, in order: a resin lens substrate 1 (MR-8-UV405); a hardened layer 2 (Z117)/2.6-3 μm; a low-reflection clear base color blue light-proof layer 3 comprising: a _SiO2 layer 3-1/25.6 nm, a _ZrO2 layer _3-2 /21.9 nm, a _SiO2 layer 3-3/41.55 nm, a ZrO2 layer 3-4/49.18 nm, a _SiO2 layer 3-5/10.11 nm, a _ZrO2 layer 3-6/55.73 nm, an ITO layer 3-7/5 nm; a _SiO2 layer 3-8/89.26 nm; a waterproof layer 4 (adopting a waterproof material containing _C12F27N /10 _nm );

The preparation method comprises the following steps:

S1: Making a hard layer: immerse the resin lens substrate cleaned by ultrasonic wave into a 27% by weight hardening liquid aqueous solution of model Z117 at a dipping temperature of 15°C, and pull out the solution at a speed of 2.0 mm/s after dipping for 5 seconds; after drying at 80°C for 3 hours, take out the substrate and send it to a drying oven for drying and curing at a curing temperature of 120°C for 150 minutes, thereby obtaining a resin lens with a hardening layer;

S2 Preparation of low-reflection clear base color anti-blue light film layer: In the vacuum coating machine, the solid film material is evaporated and then transferred through the gas phase, and then deposited on the surface of the resin lens obtained in step S1. The film is formed into a low-reflective background color anti-blue light film layer, which specifically includes the following steps:

S21: comprising the following steps:

S211: The surface of the resin lens obtained in S1 is heated by high-energy electron beam at a rate of 10000 t/ _cm2 , with a background vacuum of ≤3×10 ^-3 Pa, a temperature of 60°C in the coating chamber, and no ion source auxiliary process. The evaporated SiO ₂ is deposited in the form of nano-scale molecules to obtain a resin lens containing a first SiO ₂ layer;

S212: The surface of the resin lens obtained in S211 is heated by high-energy electron beam at a rate of ₁₀₀₀ Å to 2000 Å under the conditions of background vacuum ≤ 3×10 ^-3 Pa, temperature in the coating chamber of 60°C, and no ion source auxiliary process. The evaporated ZrO ₂ is deposited in the form of nano-scale molecules to obtain a resin lens containing a second ZrO ₂ layer;

S213: repeating steps S211 and S212 twice, respectively alternately forming a third SiO ₂ layer, a fourth ZrO ₂ layer, a fifth SiO ₂ layer and a sixth ZrO ₂ layer, that is, forming a resin lens including a third SiO ₂ layer, a fourth ZrO ₂ layer, a fifth SiO ₂ layer and a sixth ZrO ₂ layer;

S22: On the surface of the resin lens obtained in S21, under the conditions of background vacuum ≤3×10 ^-3 Pa, temperature in the coating chamber of 60°C, and ion source assisted process, high energy electron beam is used to heat ITO at a rate of Depositing the evaporated ITO in the form of nano-scale molecules to obtain a resin lens containing a seventh ITO layer;

S23: continuing to use the vacuum coating process on the surface of the resin lens obtained in S22, repeating the process steps of S211, and then forming a resin lens containing an eighth _SiO2 layer;

S3: preparing a waterproof layer: forming a waterproof layer on the surface of the resin lens obtained in S23: continuing to use the vacuum coating process on the surface of the lens obtained in step S2, using a high-energy electron beam to heat the material at a rate of 1000 ℃ under the conditions that the background vacuum degree is ≤3×10 ^-3 Pa and the temperature in the coating chamber is 60°C. The evaporated waterproof material is deposited in the form of nano-scale molecules on the surface of the resin lens obtained in S23.

Comparative Example 3

A low-reflection base color anti-blue light resin lens, which comprises in order: a resin lens substrate 1 (MR-8-UV405); a hardening layer 2 (Z117)/2.6-3μm; a low-reflection base color film layer 3 comprising: a silicon-aluminum composite Oxide layer 3-1 (wherein the molar percentage of SiO ₂ and Al ₂ O ₃ is: 92% SiO ₂ : 8% Al ₂ O ₃ ; commissioned by Changzhou Zhanchi Optoelectronics Technology Co., Ltd. to develop and produce, material model is SA56)/24.1nm, titanium-niobium composite oxide layer 3-2 (wherein the molar percentage of TiO ₂ and Nb ₂ O ₅ is: 80% TiO ₂ : 20% Nb ₂ O ₅ ; Entrusted to Changzhou Zhanchi Optoelectronics Technology Co., Ltd. for development and production, the material model is PTN28)/18.05nm, silicon-aluminum composite oxide layer 3-3/31.64nm (material is the same as 3-1), titanium-niobium composite oxide layer 3-4 (material is the same as 3-2)/48.9nm, silicon-aluminum composite oxide layer 3-5/12.1nm (material is the same as 3-1), titanium-niobium composite oxide layer 3-6 (material is the same as 3-2)/34.95nm, ITO layer 3-7/5nm; silicon-aluminum composite oxide layer 3-8/91.1nm (material is the same as 3-1); waterproof layer 4 (using waterproof material containing _C12F27N / _10nm ); that is, the structure and reflection spectrum are close to those of Example 1, but does not include the TaN absorption layer.

The preparation method is the same as that of Comparative Example 1

Comparative Example 4

A weak absorption, low reflection, clear background, blue light-proof resin lens, which comprises, in order: a resin lens substrate 1 (MR-8-UV405); a hardening layer 2 (Z117)/2.6-3 μm; a weak absorption, low reflection, clear background film layer 3 comprising: a silicon-aluminum composite oxide layer 3-1 (wherein the molar percentage of SiO ₂ and Al ₂ O ₃ is: 92% SiO ₂ : 8% Al ₂ O ₃ ; commissioned by Changzhou Zhanchi Optoelectronics Technology Co., Ltd. to develop and produce, the material model is SA56)/24 nm, a titanium-niobium composite oxide layer 3-2 (wherein the molar percentage of TiO ₂ and Nb ₂ O ₅ is: 80% TiO ₂ : 20% Nb ₂ O ₅ ; Entrusted to Changzhou Zhanchi Optoelectronics Technology Co., Ltd. to develop and produce, the material model is PTN28)/17.42nm, silicon chromium absorption layer 3-3 (SiO:Cr molar ratio is 1:1, sintered by Danyang Keda Coating Materials Co., Ltd.)/1.2nm, silicon dioxide layer 3-4/32.1nm (molecular formula SiO ₂ , purity 99.99%, sintered by Danyang Keda Coating Materials Co., Ltd.), titanium niobium composite oxide layer 3-5 (material is the same as 3-2)/48.9nm, silicon aluminum composite oxide layer 3-101.66/12.1nm (material is the same as 3-1); titanium niobium composite oxide layer 3-7 (material is the same as 3-2)/34.95nm; ITO layer 3-8/5nm; silicon aluminum composite oxide layer 3-9/91.1nm (material is the same as 3-1); waterproof layer 4 (using waterproof material containing C ₁₂ F ₂₇ N/10nm);

The preparation method thereof is the same as that of Example 1 except for the 3-3 SiO-Cr absorption layer. The preparation process of the SiO-Cr absorption layer is as follows: a SiO-Cr layer is formed on the surface of the resin lens obtained in step S22. First, the vacuum is evacuated to a background vacuum degree of ≤1.2×10 ^-4 Pa. Then, the SiO-Cr is deposited under the ion source Hall source assisted process, and a high-energy electron beam is used to heat the SiO-Cr at a rate of The evaporated SiO-Cr is deposited in the form of nano-scale molecules to obtain a resin lens containing a SiO-Cr layer. The auxiliary parameters of the ion source here are: anode voltage: 110V, anode current: 3A, and Ar flow rate of 12sccm.

Comparative Example 5

A weak absorption, low reflection, clear background, blue light-proof resin lens, which comprises, in order: a resin lens substrate 1 (MR-8-UV405); a hardening layer 2 (Z117)/2.6-3 μm; a weak absorption, low reflection, clear background film layer 3 comprising: a silicon-aluminum composite oxide layer 3-1 (wherein the molar percentage of SiO ₂ and Al ₂ O ₃ is: 92% SiO ₂ : 8% Al ₂ O ₃ ; commissioned by Changzhou Zhanchi Optoelectronics Technology Co., Ltd. to develop and produce, the material model is SA56)/24 nm, a titanium-niobium composite oxide layer 3-2 (wherein the molar percentage of TiO ₂ and Nb ₂ O ₅ is: 80% TiO ₂ : 20% Nb ₂ O ₅ ; Entrusted to Changzhou Zhanchi Optoelectronics Technology Co., Ltd. to develop and produce, the material model is PTN28)/17.42nm, tantalum nitride layer 3-3 (molecular formula TaN, purity above 99.9%, sintered by Changzhou Zhanchi Optoelectronics Technology Co., Ltd.)/0.6nm, silicon dioxide layer 3-4/32.1nm (molecular formula SiO ₂ , purity 99.99%, sintered by Danyang Keda Coating Materials Co., Ltd.), titanium niobium composite oxide layer 3-5 (material is the same as 3-2)/48.9nm, silicon aluminum composite oxide layer 3-101.66/12.1nm (material is the same as 3-1); titanium niobium composite oxide layer 3-7 (material is the same as 3-2)/34.95nm; ITO layer 3-8/5nm; silicon aluminum composite oxide layer 3-9/91.1nm (material is the same as 3-1); waterproof layer 4 (using waterproof material containing C ₁₂ F ₂₇ N/10nm);

The preparation method thereof is the same as that of Example 1 except for the 3-3 layers of tantalum nitride.

The preparation process of tantalum nitride is as follows: a tantalum nitride layer is formed on the surface of the resin lens obtained in step S22. First, evacuate to a background vacuum of ≤8×10 ^-4 Pa. Then bombard with an ion source Hall source for 60 seconds. The ion source bombardment parameters are: anode voltage: 110V, anode current: 3A, auxiliary gas is Ar, and the flow rate is 10sccm. Then, deposit under the ion source Hall source assisted process, use a high-energy electron beam to heat TaN at a rate The evaporated TaN is deposited in the form of nano-scale molecules to obtain a resin lens containing a TaN layer. The auxiliary parameters of the ion source here are: anode voltage: 110V, anode current: 3A, Ar flow rate: 12 sccm, no nitrogen flow. The resin lens containing the TaN layer was obtained, and the TaN surface was bombarded with the ion source for 30 seconds, and the ion source parameters were the same as the auxiliary parameters of the ion source of this layer.

Comparative Example 6

A weak absorption, low reflection, clear background, blue light-proof resin lens, which comprises, in order: a resin lens substrate 1 (MR-8-UV405); a hardening layer 2 (Z117)/2.6-3 μm; a weak absorption, low reflection, clear background film layer 3 comprising: a silicon-aluminum composite oxide layer 3-1 (wherein the molar percentage of SiO ₂ and Al ₂ O ₃ is: 92% SiO ₂ : 8% Al ₂ O ₃ ; commissioned by Changzhou Zhanchi Optoelectronics Technology Co., Ltd. to develop and produce, the material model is SA56)/24 nm, a titanium-niobium composite oxide layer 3-2 (wherein the molar percentage of TiO ₂ and Nb ₂ O ₅ is: 80% TiO ₂ : 20% Nb ₂ O ₅ ; Entrusted to Changzhou Zhanchi Optoelectronics Technology Co., Ltd. to develop and produce, the material model is PTN28)/17.42nm, tantalum nitride layer 3-3 (molecular formula TaN, purity above 99.9%, sintered by Changzhou Zhanchi Optoelectronics Technology Co., Ltd.)/0.6nm, silicon dioxide layer 3-4/32.1nm (molecular formula SiO ₂ , purity 99.99%, sintered by Danyang Keda Coating Materials Co., Ltd.), titanium niobium composite oxide layer 3-5 (material is the same as 3-2)/48.9nm, silicon aluminum composite oxide layer 3-101.66/12.1nm (material is the same as 3-1); titanium niobium composite oxide layer 3-7 (material is the same as 3-2)/34.95nm; ITO layer 3-8/5nm; silicon aluminum composite oxide layer 3-9/91.1nm (material is the same as 3-1); waterproof layer 4 (using waterproof material containing C ₁₂ F ₂₇ N/10nm);

The preparation method thereof is the same as that of Example 1 except for the 3-3 layers of tantalum nitride.

The preparation process of tantalum nitride is as follows: S23: forming a tantalum nitride layer on the surface of the resin lens obtained in step S22. First, evacuate to a background vacuum of ≤8×10 ^-4 Pa. No ion source Hall source pre-bombardment. Directly deposit under the ion source Hall source assisted process, use high energy electron beam to heat TaN, at a rate The evaporated TaN is deposited in the form of nano-scale molecules to obtain a resin lens containing a TaN layer. The ion source auxiliary parameters here are: anode voltage: 110V, anode current: 3A, Ar flow rate: 10sccm, nitrogen flow rate: 5sccm. After obtaining a resin lens containing a TaN layer, continue to bombard the TaN surface with an ion source for 30 seconds. The ion source parameters are the same as the ion source auxiliary parameters of this layer.

Comparative Example 7

A weak absorption, low reflection, clear background, blue light-proof resin lens, which comprises, in order: a resin lens substrate 1 (MR-8-UV405); a hardening layer 2 (Z117)/2.6-3 μm; a weak absorption, low reflection, clear background film layer 3 comprising: a silicon-aluminum composite oxide layer 3-1 (wherein the molar percentage of SiO ₂ and Al ₂ O ₃ is: 92% SiO ₂ : 8% Al ₂ O ₃ ; commissioned by Changzhou Zhanchi Optoelectronics Technology Co., Ltd. to develop and produce, the material model is SA56)/24 nm, a titanium-niobium composite oxide layer 3-2 (wherein the molar percentage of TiO ₂ and Nb ₂ O ₅ is: 80% TiO ₂ : 20% Nb ₂ O ₅ ; Entrusted to Changzhou Zhanchi Optoelectronics Technology Co., Ltd. to develop and produce, the material model is PTN28)/17.42nm, tantalum nitride layer 3-3 (molecular formula TaN, purity above 99.9%, sintered by Changzhou Zhanchi Optoelectronics Technology Co., Ltd.)/0.6nm, silicon dioxide layer 3-4/32.1nm (molecular formula SiO ₂ , purity 99.99%, sintered by Danyang Keda Coating Materials Co., Ltd.), titanium niobium composite oxide layer 3-5 (material is the same as 3-2)/48.9nm, silicon aluminum composite oxide layer 3-101.66/12.1nm (material is the same as 3-1); titanium niobium composite oxide layer 3-7 (material is the same as 3-2)/34.95nm; ITO layer 3-8/5nm; silicon aluminum composite oxide layer 3-9/91.1nm (material is the same as 3-1); waterproof layer 4 (using waterproof material containing C ₁₂ F ₂₇ N/10nm);

The preparation method thereof is the same as that of Example 1 except for the 3-3 layers of tantalum nitride.

The preparation process of tantalum nitride is S23: forming a tantalum nitride layer on the surface of the resin lens obtained in step S22. First, evacuate to a background vacuum of ≤3×10 ^-3 Pa (the vacuum is not specifically controlled). Then bombard with an ion source Hall source for 60 seconds. The ion source bombardment parameters are: anode voltage: 110V, anode current: 3A, auxiliary gas is Ar, and the flow rate is 10sccm. Then, deposit under the ion source Hall source assisted process, use a high-energy electron beam to heat TaN at a rate of The evaporated TaN is deposited in the form of nano-scale molecules to obtain a resin lens containing a TaN layer. Here, the ion source auxiliary parameters are: anode voltage: 110V, anode current: 3A, Ar flow rate: 10sccm, nitrogen flow rate: 5sccm. After obtaining a resin lens containing a TaN layer, continue to bombard the TaN surface with an ion source for 30 seconds, and its ion source parameters are the same as the ion source auxiliary parameters of this layer.

2. Experimental Examples

1. The list of materials for the main embodiments and comparative examples is as follows: the anti-reflection film structure containing TaN or SiO-Cr is a 9-layer anti-reflection film system, and the anti-reflection film system without TaN or SiO-Cr is an 8-layer anti-reflection film system.

Table 1

2. Determine the optical effects of the lens, such as peak reflectivity, average reflectivity, blue light protection and yellow index

(1) Determination of the average reflectivity and peak reflectivity, blue light protection national standard and yellowness index of Examples 1 to 3 and Comparative Examples 1 to 7

For the lenses prepared in Examples 1 to 3 and Comparative Examples 1 to 7, their average reflectivity (average reflectivity: refers to the visual average reflectivity under illumination of C light (a light source with a color temperature of 6774K defined in CIE), here refers to the reflectivity of a single surface) and visible light peak reflectivity (refers to the highest reflectivity of a single surface at 400 to 700 nm) were measured, and the measurement results are recorded in Table 2 below.

For the lenses prepared in Examples 1 to 3 and Comparative Examples 1 to 7, referring to the requirements for the blue light protective film in the new anti-blue light national standard QBT-38120-2019, the arithmetic mean transmittance of the main harmful blue light (415 to 445 nm) was determined, and the transmittance yellow index was determined (the national standard requires that the average transmittance of harmful blue light 415 to 445 nm is ≤80%, the average transmittance is >80%, and the yellow index is <5.0). The measurement results are recorded in Table 2 below.

Table 2

It can be seen that the film system with a low absorption layer can not only meet the blue light protection requirements, but also has an anti-reflection effect, especially the peak reflectivity, which is much lower than that of the film system without an absorption layer.

The tantalum nitride absorption layer can significantly reduce the yellow index while reducing the overall visible light transmittance.

(2) Comparison of the impact of TaN process on anti-blue light standards and yellow index

Test the transmission and reflection of a single surface and calculate the absorption results as follows:

Table 3. Effect of TaN process on anti-blue light index and yellow index

The general process uses SiO-Cr as the absorption layer, which can effectively meet the needs of blue light protection. However, its yellow-green light absorption is low, which will lead to an increase in the yellow index. Most weak absorption materials have this characteristic.

Strictly controlling the preparation process of the TaN film layer helps to achieve the expected technical effect of the film layer.

(1) When TaN is not strictly controlled in vacuum, it tends to oxidize, thereby reducing the absorption of the film layer, and the absorption of yellow-green light and infrared light decreases faster, the yellow index cannot be reduced, and the lens is not visually transparent; (2) When TaN is not assisted by an ion source, the film layer is loose and the nitrogen content will be reduced during the evaporation process. It will be further oxidized when other layers are plated. As a result, there is a tendency to oxidize, thereby reducing the absorption of the film layer, and the absorption of yellow-green light and infrared light decreases faster, resulting in a relative increase in the yellow index and the lens is not visually transparent; (3) When TaN is assisted by an ion source but not by nitrogen, it will lead to metallization of the film layer (insufficient nitridation) and a sharp increase in absorption. The absorption of blue light increases much faster than that of yellow-green light and infrared, resulting in a relative increase in the yellow index, and the lens is visually yellow and gray and not transparent. The specific process of the present invention is used to prepare the TaN layer, which can effectively increase the blocking absorption of near-infrared, control the absorption of blue light, and increase the yellow Light absorption reduces the yellow index and makes the lens clearer and more beautiful.

3. High temperature resistance, durability and high temperature adhesion test

(1) High temperature resistance test:

After the samples (Examples 1 to 3 and Comparative Examples 1 to 7) were completed, the heat resistance of the samples was tested after being stored for one week. The test method for high temperature resistance is based on Article 5.8 of the National Standard for Heat Resistance of Resin Lenses (GB 10810.4-2012): pass the baking test at 55°C for 30 minutes. After passing the test, the same method is used to increase the baking temperature by 5°C for 30 minutes each time until the lens shows failure phenomena such as film cracking or orange peel, and the highest qualified temperature is recorded. The results are recorded in Table 4 below.

(2) Durability test:

The photovoltaic industry and the optical communication industry use high temperature and high humidity to evaluate the durability of products. Referring to the test standards of the photovoltaic industry (GB/T 18911-2002, IEC61646:1996, Article 10.13) and the test methods of the optical communication industry (Ballcore Test, GR-1221-Core, Article 6.2.5), the high temperature and high humidity test and debugging of the resin lens is defined as: storage at 85°C and 85% humidity for 12 hours, and checking whether the prepared lens has obvious failure phenomena such as film cracks or orange peel; 3 resin lenses are placed in different positions for each high temperature and high humidity test. The test results of Examples 1 to 6 and Comparative Examples 1 to 9 are recorded in Table 4 below.

(3) High temperature adhesion test:

Adhesion test refers to the film adhesion test in accordance with Article 5.9 of the national standard GB10810.4-2012. High-temperature film adhesion test refers to Wanxin Company referring to Article 5.9 of the national standard GB10810.4-2012, changing the boiling conditions to 90±2℃ for 60 minutes, and other test methods are the same. Adhesion and high-temperature adhesion test results: Grade A refers to no film removal or the film removal area is less than 5%, Grade B refers to the film removal area between 5% and 15%, and Grade C (unqualified) refers to the film removal area significantly greater than 15%. In order to verify the product adhesion distribution, high-temperature adhesion tests were performed from 5 different positions in the coating room. The test results of Examples 1 to 3 and Comparative Examples 1 to 7 are recorded in Table 4 below.

Table 4

in conclusion:

(1) Ultra-low reflection effect: Examples 1 to 3 all have a relatively low average visible light reflectivity of 0.2 to 0.28%, and a relatively low peak reflectivity of 1.5 to 2.2%; whereas Comparative Example 1 cannot achieve the above technical effects, i.e., cannot achieve the ultra-low reflection effect.

(2) Examples 1 to 3 can effectively cut off harmful blue light, highly transmit beneficial blue light, and meet the national blue light protection standards while the yellow index is as low as 3% or less to achieve a clear lens effect; while the harmful blue light cutoff of comparative example 3 does not meet the national blue light protection standards, and the other comparative examples have a high yellow index and cannot achieve the excellent clear visual effect of the lens. In particular, the TaN absorption material under specific process conditions has a significant contribution to the blue light protection standards and yellow index.

(3) When other conditions remain unchanged, the high refractive index material of the lens made of titanium-niobium composite oxide has better high temperature resistance, high temperature adhesion and durability than other conventional materials; the low refractive index material made of silicon-aluminum composite oxide has better high temperature resistance, high temperature adhesion and durability than other conventional materials; we use these two specific ratios of materials to prepare the film system and its appropriate process to ensure the high temperature resistance and durability of the ultra-low reflection background anti-blue light products.

Claims (19)

A weakly absorbing, low-reflection, clear background color, anti-blue light resin lens, characterized in that it comprises: a resin lens substrate, a hardened layer, and a weakly absorbing, low-reflection, clear background color, anti-blue light film layer; wherein the resin lens substrate, the hardened layer, and the weakly absorbing, low-reflection, clear background color, anti-blue light film layer are arranged in sequence, the hardened layer is located on the surface of the resin lens substrate, and the weakly absorbing, low-reflection, clear background color, anti-blue light film layer is located on the surface of the hardened layer. The weakly-absorbent, low-reflective, clear-background-color anti-blue-light resin lens according to claim 1 is characterized in that the weakly-absorbent, low-reflective, clear-background-color anti-blue-light resin lens further comprises a waterproof layer, and the waterproof layer is located on the surface of the weakly-absorbent, low-reflective, clear-background-color anti-blue-light film layer. The weakly absorbing, low-reflective, clear-base-color, blue-light-blocking resin lens according to claim 1 is characterized in that the material of the hardened layer is silicone; further preferably, the silicone contains at least the element Ti. The weakly-absorbent, low-reflection, clear background, blue-light-proof resin lens according to claim 1 is characterized in that the weakly-absorbent, low-reflection, clear background, blue-light-proof film layer comprises a silicon-aluminum composite oxide layer, a titanium-niobium composite oxide layer, a tantalum nitride (i.e., TaN) layer, a silicon dioxide ( _SiO2 ) layer, and a tin-doped indium oxide (i.e., ITO) layer; further, the weakly-absorbent, low-reflection, clear background, blue-light-proof film layer comprises three layers of silicon-aluminum composite oxide layers, three layers of titanium-niobium composite oxide layers, a TaN layer, a _SiO2 layer, and an ITO layer. The weakly absorbing, low-reflective, clear-background-color, _blue -light-blocking resin lens according to claim 4 is characterized in that the silicon-aluminum composite oxide layer is composed of a composite material of _SiO2 and _Al2O3 , and the molar fraction of _SiO2 in the composite material is 70% to 95%; further preferably, _SiO2 accounts for 92% of the molar fraction of the composite material. The weakly absorbing, low-reflective, clear-background-color, blue-light-proof resin lens according to claim 4 is characterized in that the titanium- _niobium composite oxide layer is composed of a composite material of _TiO2 and _Nb2O5 , wherein _TiO2 accounts for 10% to 90% of the molar fraction of the composite material; preferably, _TiO2 accounts for 80% of the molar fraction of the composite material. The weakly absorbing, low-reflective, clear-base-color, blue-light-blocking resin lens according to claim 4 is characterized in that the purity of TaN in the tantalum nitride layers is greater than 99.9%. The weakly absorbing, low-reflective, clear-background-color, blue-light-proof resin lens according to claim 1 is characterized in that In the embodiment, the thickness of the hardened layer is 1 to 5 μm. The weakly-absorbent, low-reflective, clear-background-color, blue-light-proof resin lens according to claim 1 is characterized in that the thickness of the weakly-absorbent, low-reflective, clear-background-color, blue-light-proof film layer is 200 to 600 nm. The weakly absorbing, low-reflective, clear-base-color, blue-light-proof resin lens according to claim 1 is characterized in that the thickness of the waterproof layer is 4 to 20 nm. The weakly absorbing, low-reflective, clear-background-color, blue-light-proof resin lens according to claim 1, wherein the UV cutoff wavelength of the resin lens substrate is 405 to 407 nm. The weakly absorbing, low-reflective, clear-base-color, blue-light-proof resin lens according to any one of claims 1 to 11 is characterized in that the average reflectivity of the lens is ≤0.3%. The weakly absorbing, low-reflective, clear-base-color, blue-light-proof resin lens according to any one of claims 1 to 11 is characterized in that the peak reflectivity of the lens in the visible light band of 400 to 700 nm is ≤2.2%. According to any one of claims 1 to 11, the weakly absorbing, low-reflective, clear-background-color anti-blue-light resin lens is characterized in that the reflected light color coordinate H value of the weakly absorbing, low-reflective, clear-background-color anti-blue-light resin lens is 270 to 295, and the C value is 12 to 25. The weakly absorbing, low-reflective, clear-background-color, blue-light-blocking resin lens according to any one of claims 1 to 11, characterized in that the yellow index of the clear-background-color, blue-light-blocking resin lens is ≤3.5%. The method for preparing the weakly absorbing, low-reflective, clear-background-color blue-light-proof resin lens according to any one of claims 1 to 11 is characterized in that it comprises the following steps: S1: preparing a hard layer: forming a hard layer on the surface of a resin lens substrate, that is, obtaining a resin lens containing a hard layer; S2: preparing a weak absorption, low reflection, clear background, blue light-proof film layer: forming the weak absorption, low reflection, clear background, blue light-proof film layer on the surface of the resin lens obtained in S1, that is, obtaining a resin lens containing a weak absorption, low reflection, clear background, blue light-proof film layer, specifically comprising: S21: forming a resin lens having a first silicon-aluminum composite oxide layer and a second titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S1; S22: forming a third layer of resin lens containing tantalum nitride layer on the surface of the resin lens obtained in step S21; S23: forming a fourth _SiO2- containing resin lens on the surface of the resin lens obtained in step S22; S24: forming a fifth titanium-niobium composite oxide layer, a sixth silicon-aluminum composite oxide layer, and a seventh titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S23; S25: forming an eighth ITO-containing resin lens on the surface of the resin lens obtained in step S24; S26: forming a ninth layer of a resin lens containing a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in step S25; S3: preparing a waterproof layer: forming a waterproof layer on the surface of the resin lens obtained in step S2. According to the method for preparing a weakly absorbing, low-reflective, clear-background-color, blue-light-proof resin lens as described in claim 16, it is characterized in that the step of preparing a hardened layer in S1 comprises: immersing the resin lens substrate cleaned by ultrasonic wave into an aqueous solution of a hardening liquid having a mass percentage of 25 to 30%, the immersion temperature being 10 to 20°C, and after immersion for 4 to 8 seconds, pulling out the solution at a speed of 1.0 to 3.0 mm/s, and then drying it at 70 to 90°C for 2 to 5 hours, taking out the substrate and sending it to a drying oven for drying and curing, the curing temperature being 100 to 150°C, and the curing time being 120 to 180 min, to obtain a resin lens containing a hardened layer. The method for preparing a weakly absorbing, low-reflective, clear-background-color, blue-light-proof resin lens according to claim 16 is characterized in that, in a vacuum coating machine, a vacuum coating process is adopted to evaporate a silicon-aluminum composite oxide layer, a titanium-niobium composite oxide, a tantalum nitride, a silicon dioxide, and an ITO solid film layer material, and then the evaporated material is subjected to gas phase transmission, and a thin film is deposited on the surface of the resin lens obtained in step S1, specifically comprising the following steps: S21: forming a first layer of silicon-aluminum composite oxide on the surface of the resin lens obtained in step S1, heating the silicon-aluminum composite oxide with a high-energy electron beam at a rate of 1000 Å under the conditions of a background vacuum of ≤3×10 ^-3 Pa, a temperature in the coating chamber of 50-70°C, and an ion source-assisted process. Depositing the evaporated silicon-aluminum composite oxide in the form of nano-scale molecules to obtain a resin lens containing a first silicon-aluminum composite oxide layer; S22: forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S21; the surface of the resin lens obtained in step S21 is subjected to a background vacuum of ≤3×10 ^-3 Pa and a temperature in the coating chamber of Under the conditions of 50-70°C and ion source assisted process, the titanium-niobium composite oxide is heated by a high energy electron beam at a rate of depositing the evaporated titanium-niobium composite oxide in the form of nano-scale molecules to obtain a resin lens containing a second titanium-niobium composite oxide layer; S23: forming a tantalum nitride layer on the surface of the resin lens obtained in step S22, specifically comprising: S231: first evacuate to a background vacuum degree of ≤8×10 ^-4 Pa, then bombard with an ion source Hall source for 50 to 80 seconds, the ion source bombardment parameters are: anode voltage: 90 to 140 V, anode current: 2.5 to 5 A, auxiliary gas is Ar, and the flow rate is 5 to 20 sccm; preferably, the ion source Hall source bombardment time is 60 seconds, and the ion source bombardment parameters are: anode voltage: 110 V, anode current: 3 A, auxiliary gas is Ar, and the flow rate is 10 sccm; S232: Deposition in an ion source assisted process, using a high energy electron beam to heat TaN at a rate The evaporated TaN is deposited in the form of nano-scale molecules. The auxiliary parameters of the ion source are: anode voltage: 90-140V, anode current: 2.5-5A, auxiliary gas is Ar and _N2 , Ar flow rate is 5-15sccm, _N2 flow rate is: 3-15sccm; preferably, under the assistance of the ion source, at a rate The evaporated TaN is deposited in the form of nano-scale molecules, and the auxiliary parameters of the ion source are: anode voltage: 110V, anode current: 3A, auxiliary gas is Ar and _N2 , Ar flow rate is 10sccm, _N2 flow rate is: 5sccm; S233: continue bombarding the surface of the TaN film layer with the ion source Hall source for 20 to 40 seconds, the bombardment parameters are: anode voltage: 90 to 140 V, anode current: 2.5 to 5 A, auxiliary gases are Ar and N ₂ , Ar flow rate is 5 to 15 sccm, N ₂ flow rate is 3 to 15 sccm; preferably, the bombardment time is 30 seconds, the bombardment parameters are: anode voltage: 110 V, anode current: 3 A, auxiliary gases are Ar and N ₂ , Ar flow rate is 10 sccm, N ₂ flow rate is 5 sccm; S24: The surface of the resin lens obtained in S23 is heated by a high-energy electron beam at a rate of 10000 t/ _cm2 , with a background vacuum of ≤3×10 ^-3 Pa, a temperature in the coating chamber of 50-70°C, and an ion source assisted process. The evaporated _SiO2 is deposited in the form of nano-scale molecules to obtain a resin lens containing a _SiO2 layer; the ion source auxiliary parameters are: anode voltage: 90-140V, anode current: 2.5-5A, auxiliary gas is Ar, and the flow rate is 5-20sccm; preferably, the ion source is assisted at a rate of The evaporated _SiO2 is deposited in the form of nano-scale molecules, and the ion source bombardment auxiliary parameters are: anode charge Pressure: 110V, anode current: 3A, auxiliary gas: Ar, flow rate: 10sccm; S25: repeating step S22 to form a titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S24; S26: repeating step S21 to form a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in step S25; S27: repeat step S22 to form a titanium-niobium composite oxide layer on the surface of the resin lens obtained in step S26; S28: The surface of the resin lens obtained in S27 is heated by a high-energy electron beam at a rate of 1000 Å to 1000 Å under the conditions that the background vacuum is ≤3×10 ^-3 Pa, the temperature in the coating chamber is 50-70°C, and an ion source is used to assist the process. Depositing the evaporated ITO in the form of nano-scale molecules to obtain a resin lens containing an ITO layer; S29: On the surface of the resin lens obtained in S28, continue to use the vacuum coating process, repeat the process steps of S21, and then form a layer of resin lens containing a silicon-aluminum composite oxide layer. The method for preparing a weakly absorbing, low-reflective, clear-background-color, blue-light-proof resin lens according to claim 16 is characterized in that in the step S3, forming a waterproof layer on the surface of the resin lens obtained in step S2 comprises the following steps: continuing to use a vacuum coating process on the lens surface obtained in step S29, using a high-energy electron beam to heat the material at a rate of 1000 Å under the conditions that the background vacuum degree is ≤3×10 ^-3 Pa and the temperature in the coating chamber is 50 to 70°C. The evaporated fluorine-containing waterproof material is deposited in the form of nano-scale molecules to obtain a resin lens containing a waterproof layer.