CN115616797B - A clear background color blue light and infrared protection resin lens and preparation method thereof - Google Patents
A clear background color blue light and infrared protection resin lens and preparation method thereof Download PDFInfo
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- CN115616797B CN115616797B CN202211343744.4A CN202211343744A CN115616797B CN 115616797 B CN115616797 B CN 115616797B CN 202211343744 A CN202211343744 A CN 202211343744A CN 115616797 B CN115616797 B CN 115616797B
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- resin lens
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- composite oxide
- infrared
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- 229920005989 resin Polymers 0.000 title claims abstract description 249
- 239000011347 resin Substances 0.000 title claims abstract description 249
- 238000002360 preparation method Methods 0.000 title claims abstract description 26
- 230000004224 protection Effects 0.000 title description 3
- 239000002131 composite material Substances 0.000 claims abstract description 181
- 239000000463 material Substances 0.000 claims abstract description 86
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 claims abstract description 84
- 238000000034 method Methods 0.000 claims abstract description 82
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims abstract description 80
- RJSRQTFBFAJJIL-UHFFFAOYSA-N niobium titanium Chemical compound [Ti].[Nb] RJSRQTFBFAJJIL-UHFFFAOYSA-N 0.000 claims abstract description 74
- 239000000758 substrate Substances 0.000 claims abstract description 56
- 238000007747 plating Methods 0.000 claims abstract description 9
- 150000002500 ions Chemical class 0.000 claims description 72
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 69
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 46
- 238000000151 deposition Methods 0.000 claims description 46
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 38
- 238000010894 electron beam technology Methods 0.000 claims description 34
- 238000010438 heat treatment Methods 0.000 claims description 34
- 239000011248 coating agent Substances 0.000 claims description 29
- 238000000576 coating method Methods 0.000 claims description 29
- 238000001035 drying Methods 0.000 claims description 24
- 239000010955 niobium Substances 0.000 claims description 21
- 238000001771 vacuum deposition Methods 0.000 claims description 20
- 235000012239 silicon dioxide Nutrition 0.000 claims description 19
- 239000000377 silicon dioxide Substances 0.000 claims description 19
- 229910052757 nitrogen Inorganic materials 0.000 claims description 13
- 239000007788 liquid Substances 0.000 claims description 10
- 230000000903 blocking effect Effects 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 claims description 7
- 238000001704 evaporation Methods 0.000 claims description 7
- 229910003437 indium oxide Inorganic materials 0.000 claims description 6
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 6
- 239000007787 solid Substances 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 2
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 239000011737 fluorine Substances 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 4
- 239000007864 aqueous solution Substances 0.000 claims 1
- 239000000243 solution Substances 0.000 claims 1
- 230000000007 visual effect Effects 0.000 abstract description 9
- 239000011358 absorbing material Substances 0.000 abstract 1
- 230000007613 environmental effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 90
- 230000000052 comparative effect Effects 0.000 description 29
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 22
- 239000007789 gas Substances 0.000 description 21
- 238000012360 testing method Methods 0.000 description 16
- 230000002265 prevention Effects 0.000 description 14
- 238000007654 immersion Methods 0.000 description 12
- 238000002834 transmittance Methods 0.000 description 12
- 230000000694 effects Effects 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 11
- 230000003287 optical effect Effects 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 10
- 229910052593 corundum Inorganic materials 0.000 description 10
- 229910001845 yogo sapphire Inorganic materials 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 9
- 239000007888 film coating Substances 0.000 description 7
- 238000009501 film coating Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 238000010998 test method Methods 0.000 description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 4
- 238000005336 cracking Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 230000031700 light absorption Effects 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 238000004383 yellowing Methods 0.000 description 3
- 229910052681 coesite Inorganic materials 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000012788 optical film Substances 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000002952 polymeric resin Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 240000001949 Taraxacum officinale Species 0.000 description 1
- 235000005187 Taraxacum officinale ssp. officinale Nutrition 0.000 description 1
- 230000006750 UV protection Effects 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 210000004087 cornea Anatomy 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- -1 perfluoro Chemical group 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 229910001432 tin ion Inorganic materials 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
- G02B1/041—Lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- G02B5/282—Interference filters designed for the infrared light reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The invention provides a blue light-proof infrared-proof high-temperature-resistant resin lens with clear background color and a preparation method thereof, comprising a resin lens substrate, a hardening layer, an infrared-proof film layer with clear background color and a waterproof layer; the substrate, the hardening layer and the bottom color anti-infrared film layer are sequentially arranged, the hardening layer is positioned on the surface of the resin lens substrate, the bottom color anti-infrared film layer is positioned on the surface of the hardening layer, and the bottom color anti-infrared film layer is composed of a high-refractive-index material titanium-niobium composite oxide, a low-refractive-index material silicon-aluminum composite oxide and an absorbing material titanium nitride. According to the invention, through adjusting the structure of the anti-infrared film layer with clear background color and a special titanium nitride plating process, the anti-infrared lens with good visual effect is obtained while the anti-reflection and anti-blue light are met, the high temperature resistance and the environmental resistance of the resin lens are greatly improved, and the anti-infrared lens has good market application prospect.
Description
Technical Field
The invention relates to the technical field of resin lens preparation, in particular to a blue light-proof infrared-proof high-temperature-resistant resin lens with clear background and a preparation method thereof.
Background
In recent years, the demand of optical resin lenses on the domestic and foreign eyeglass market is increasing, and compared with glass lenses, resin lenses have the advantages of light weight, good dyeing property, easy processing and the like, and medium-high refractive index optical resin lenses are favored by users by the special advantages of high light transmittance, ultraviolet resistance, ultra-thin and the like.
In order to meet the requirements of the optical performance of the resin lens, a film is generally coated on the surface of the resin lens to reduce the reflection of light and enhance the transmission of light, namely the optical antireflection film. Near infrared is not photosensitive to human eyes, is mainly absorbed by cornea, and has potential injury to human eyes. This requires anti-reflection and anti-infrared features on the optical film, which is much thicker than the typical conventional film. In addition, because the main materials of the optical film are inorganic materials and the polymer resin lens substrate is an organic material, the stress of the coated lens is higher due to the difference of physical and chemical properties of the main materials and the polymer resin lens substrate, and further the poor temperature resistance and durability are caused, particularly, the film layer with the bottom color cleaning and infrared prevention functions is generally thicker, and the stress influence on the coated lens is particularly remarkable, so that the normal use of the coated lens is influenced. Therefore, how to provide a resin lens with low reflection, infrared resistance, high temperature resistance and durability is a problem to be solved in the field.
Blue light prevention can effectively protect the requirements of consumers in the electronic use environment. The novel blue light prevention national standard also distinguishes between harmful blue light and beneficial blue light. Blue light protection typically results in a more yellow lens, not enough magnesium light. In order to meet the new requirements of consumers in new electronic environments, there is a need to provide blue-light-proof resin lenses with clear bottom colors.
Therefore, there is a need to provide new resin lens products that combine the anti-reflection, anti-blue, anti-infrared, etc. properties with the protective requirements and aesthetic requirements of clear base.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention aims to provide the blue light-proof infrared-proof high-temperature-resistant resin lens with clear background color and the preparation method thereof, which effectively meet the anti-reflection requirement, realize good infrared-proof effect, improve the high-temperature resistance and durability of the resin lens by reducing stress, and meet the national blue light-proof standard and the clear background color visual effect by plating special materials through special processes.
The invention is realized by the following technical scheme:
The invention provides a resin lens with clear background, blue light resistance, infrared resistance and high temperature resistance, which comprises a resin lens substrate, a hardening layer and a clear background infrared resistance layer, wherein the resin lens substrate, the hardening layer and the clear background infrared resistance layer are sequentially arranged, the hardening layer is positioned on the surface of the resin lens substrate, and the clear background infrared resistance layer is positioned on the surface of the hardening layer;
the UV cutoff wavelength of the resin lens substrate is 405-407 nm;
further, the resin lens with the bottom color removed and the infrared resistance and the high temperature resistance also comprises a waterproof layer, wherein the waterproof layer is positioned on the surface of the bottom color removed and the infrared resistance layer;
further, the hardening layer is made of organic silicon, and preferably, the organic silicon at least contains Ti element;
Further, the clear bottom color anti-infrared film layer comprises a silicon aluminum composite oxide layer, a titanium niobium composite oxide layer, a TiN-doped indium oxide (ITO) layer and a titanium nitride (TiN) layer, and further comprises three silicon aluminum composite oxide layers, three titanium niobium composite oxide layers, a TiN-doped indium oxide (ITO) layer, a silicon dioxide layer and a titanium nitride (TiN);
Further, the silicon-aluminum composite oxide layer is composed of a SiO 2 and Al 2O3 composite material, wherein SiO 2 accounts for 70% -95% of the molar fraction of the composite material, and further preferably, siO 2 accounts for 92% of the molar fraction of the composite material;
further, the titanium-niobium composite oxide layer is composed of a TiO 2 and Nb 2O5 composite material, wherein TiO 2 accounts for 10% -90% of the mole fraction of the composite material, and preferably, tiO 2 accounts for 80% of the mole fraction of the composite material;
further, the purity of TiN in the titanium nitride layer is more than 99.9 percent;
further, the thickness of the hardening layer is 1-5 mu m;
Further, the thickness of the clear bottom anti-infrared film layer is 290-950 nm;
further, the thickness of the waterproof layer is 4-20 nm;
Furthermore, the average reflectivity of the blue light-proof infrared-proof resin high-temperature-resistant lens with the clear background color is less than or equal to 1.5 percent;
Further, the near infrared blocking rate of the blue light-proof infrared-proof resin high-temperature-resistant lens with clear background is more than 55%;
Further, the yellow index of the blue light-proof infrared-proof resin high-temperature-resistant lens with the clear background color is less than or equal to 4.5%;
The invention provides a preparation method of the blue light-proof infrared-proof resin high-temperature-resistant lens with clear background color, which comprises the following steps:
S1, preparing a hardening layer, namely forming the hardening layer on the surface of a resin lens substrate to obtain a resin lens containing the hardening layer;
S2, preparing a clear-background-color infrared-proof film layer, namely forming the clear-background-color infrared-proof film layer on the surface of the resin lens obtained in S1, namely obtaining the resin lens containing the clear-background-color infrared-proof film layer, and specifically comprising the following steps:
s21, respectively forming a resin lens containing a first silicon-aluminum composite oxide layer and a second titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S1;
s22, forming a third resin lens containing a titanium nitride layer on the surface of the resin lens obtained in the step S21;
S23, forming a fourth resin lens containing a SiO 2 layer on the surface of the resin lens obtained in the step S22;
S24, forming a resin lens with a fifth titanium niobium composite oxide layer, a sixth silicon aluminum composite oxide layer and a seventh titanium niobium composite oxide layer on the surface of the resin lens obtained in the step S23;
s25, forming a resin lens containing an eighth ITO-containing layer on the surface of the resin lens obtained in the step S24;
S26, forming a ninth resin lens containing a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S25;
And S3, preparing a waterproof layer, namely forming the waterproof layer on the surface of the resin lens obtained in the step S2.
Advantageous effects
1. The invention adopts a specific UV405 resin lens substrate to enable the lens to approach the blue light prevention standard and keep the yellow index low;
2. The invention adopts a specific film layer to enable the lens to have the effects of infrared prevention, blue light prevention and clear bottom color, and specifically comprises (1) adopting a titanium-niobium composite oxide material to prepare the film layer to have the infrared prevention effect, improving the temperature resistance and durability of the product, improving the repeatability and mass productivity of the product, and obviously improving the temperature resistance and durability of the lens, wherein a.TiO 2 doped with Nb 2O5 with a certain molar ratio can effectively avoid the characteristic of easy crystallization of the TiO 2 film layer, and can also effectively avoid the defect of easy cracking of the compact Nb 2O5 film layer on the resin lens, ensure that the film layer is in an amorphous state under the condition of low ion source energy of resin glasses film plating, prevent the film layer from cracking due to crystallization, thereby improving the high temperature resistance and high humidity resistance of the film layer and the lens, and further improving the durability of the product; in addition, when the low-reflection titanium-niobium composite oxide film is prepared, as the film material is doped with TiO 2 and Nb 2O5, the sensitivity of TiO 2 to the flow of O 2 in an IAD auxiliary process is reduced, the process difficulty is reduced, and the repeatability and mass productivity of the product are effectively improved: the film layer material adopts a TiO 2 and Nb 2O5 composite material, the optical refractive index is close to that of TiO 2, the refractive index is higher than that of materials such as Nb 2O5, the infrared-proof cut-off effect is better, the reflectivity of the antireflection film is lower, the cut-off is deeper than that of other conventional infrared-producing lenses, and the light transmittance of the resin lens is improved, so that the lens prepared by the invention has good visual effect while protecting eyes and reducing near infrared radiation;
(2) The TiN layer prepared by adopting the specific process has the advantages of supplementing and meeting the blue light prevention standard, enhancing infrared blocking, reducing yellow index to increase the clear bottom color effect, ensuring that the film layer absorbs 2% of a single face of a 415-445 nm wave band which is important for the blue light prevention standard, ensuring that a lens meets the blue light prevention standard, protecting eyes from being damaged by blue light, and ensuring that the yellow light is absorbed about 0.6% higher than the blue light, thereby effectively reducing the yellow index, ensuring that the lens is clear and white, and improving the infrared blocking rate by more than 3% when absorbing near infrared, and reducing the damage of infrared to the eyes;
(3) The silicon-aluminum composite oxide layer and the SiO2 layer are combined to be used, so that high stress of the film layer caused by the fact that SiO2 is easy to form a long column shape is effectively avoided, the glassy structure of the film layer is maintained, and the high temperature resistance of the film layer is improved.
Drawings
FIG. 1 is a schematic diagram of each layer of a clear primer anti-infrared resin lens prepared in examples 1-4 of the invention, a resin lens substrate 1, a hardening layer 2, a clear primer anti-infrared film layer 3 and a waterproof layer 4, wherein the clear primer anti-infrared film layer 3 comprises a silicon aluminum composite oxide layer 3-1, a titanium niobium composite oxide layer 3-2, a titanium nitride layer 3-3 plated by a special process, a silicon dioxide layer 3-4, a titanium niobium composite oxide layer 3-5, a titanium niobium composite oxide layer 3-6, a titanium niobium composite oxide layer 3-7, an ITO layer 3-8 and a silicon aluminum composite oxide layer 3-9
Detailed Description
In a specific embodiment, the clear bottom color infrared-proof film layer comprises three silicon aluminum composite oxide layers, three titanium niobium composite oxide layers, one titanium nitride layer, one silicon dioxide layer and one tin-doped indium oxide (ITO) layer, wherein in the clear bottom color infrared-proof film layer, the layers are sequentially (1) silicon aluminum composite oxide layers, (2) titanium niobium composite oxide layers, (3) titanium nitride layers, (4) silicon dioxide layers, (5) titanium niobium composite oxide layers, (6) silicon aluminum composite oxide layers, (7) titanium niobium composite oxide layers, (8) tin-doped indium oxide (ITO) layers and (9) silicon aluminum composite oxide layers, and the first silicon aluminum composite oxide layer is positioned on the surface of the hardening layer;
further, in a specific embodiment, the thickness of each layer of the clear bottom infrared-proof film layer is:
the thickness of the first silicon-aluminum composite oxide layer is 0-180 nm, preferably 5-30 nm;
The thickness of the second titanium-niobium composite oxide layer is 10-40 nm, preferably 10-20 nm;
The thickness of the third titanium nitride layer is 0.5-2 nm, preferably 0.7-1.2 nm;
the thickness of the fourth silicon dioxide layer is 20-60 nm, preferably 30-50 nm;
The thickness of the fifth titanium-niobium composite oxide layer is 80-150 nm, preferably 100-120 nm;
the thickness of the sixth silicon-aluminum composite oxide layer is 90-250 nm, preferably 140-200 nm;
The thickness of the seventh titanium-niobium composite oxide layer is 80-150 nm, preferably 90-110 nm;
The thickness of the eighth ITO layer is 2-10 nm, preferably 5nm;
The thickness of the ninth silicon-aluminum composite oxide layer is 60-130 nm, preferably 65-90 nm;
In a specific embodiment, the step S1 of preparing the hardening layer comprises the steps of immersing a resin lens substrate cleaned by ultrasonic waves into a hardening liquid water solution with the mass percentage of 25-30%, wherein the immersing temperature is 10-20 ℃, extracting the solution at the speed of 1.0-3.0 mm/S after immersing for 4-8 seconds, drying the solution at the temperature of 70-90 ℃ for 2-5 hours, taking out the substrate, and conveying the substrate into a drying box for drying and curing at the curing temperature of 100-150 ℃ for 120-180 minutes to obtain the resin lens containing the hardening layer;
In a specific embodiment, the process for preparing the clear-primer infrared-proof film layer in step S2 includes:
In a vacuum coating machine, adopting a vacuum coating process, evaporating a silicon aluminum composite oxide layer, a titanium niobium composite oxide, titanium nitride, silicon dioxide and an ITO solid film layer material, then carrying out gas phase transmission, and depositing a film on the surface of the resin lens obtained in the step S1 to form a clear-background color infrared-proof film layer, wherein the method specifically comprises the following steps of:
S21, forming a first silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S1, and heating the silicon-aluminum composite oxide by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 50-70 ℃ and an ion source auxiliary process is adopted, so that the speed is equal to Depositing the evaporated silicon-aluminum composite oxide in a nanoscale molecular form to obtain a resin lens containing a first silicon-aluminum composite oxide layer;
S22, forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S21, heating the titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S21 by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 50-70 ℃ and an ion source auxiliary process is adopted, and the speed is equal to Depositing the evaporated titanium-niobium composite oxide in a nanoscale molecular form to obtain a resin lens containing a second titanium-niobium composite oxide layer;
S23, forming a titanium nitride layer on the surface of the resin lens obtained in the step S22, wherein the method specifically comprises the following steps:
S231, vacuumizing until the background vacuum degree is less than or equal to 8 multiplied by 10 -4 Pa, and bombarding for 50-80 seconds by using an ion source Hall source, wherein the ion source bombarding parameters are that the anode voltage is 90-140V, the anode current is 2.5-5A, the auxiliary gas is Ar, the flow is 5-20 sccm, and preferably, the ion source Hall source bombarding time is 60 seconds, the ion source bombarding parameters are that the anode voltage is 110V, the anode current is 3A, the auxiliary gas is Ar, and the flow is 10sccm;
s232, depositing under the auxiliary process of an ion source, heating TiN by adopting a high-energy electron beam at a speed The method comprises the steps of depositing the evaporated TiN in a nanoscale molecular form, wherein the auxiliary parameters of an ion source are that anode voltage is 90-140V, anode current is 2.5-5A, auxiliary gas is Ar and N 2, ar flow is 5-15 sccm, N 2 flow is 3-15 sccm, and preferably, the ion source is used for assisting at a speedDepositing the evaporated TiN in a nanoscale molecular form, wherein the auxiliary parameters of the ion source are that the anode voltage is 110V, the anode current is 3A, the auxiliary gas is Ar and N 2, the Ar flow is 10sccm, and the N 2 flow is 5sccm;
S233, bombarding the surface of the TiN film layer for 20-40 seconds by using an ion source Hall source, wherein the bombarding parameters are that anode voltage is 90-140V, anode current is 2.5-5A, auxiliary gas is Ar and N 2, ar flow is 5-15 sccm, N 2 flow is 3-15 sccm, preferably, the bombarding time is 30 seconds, the bombarding parameters are that anode voltage is 110V, anode current is 3A, auxiliary gas is Ar and N 2, ar flow is 10sccm, and N 2 flow is 5sccm;
S24, heating SiO 2 on the surface of the resin lens obtained in S23 by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 50-70 ℃ and an ion source auxiliary process is adopted, and the speed is equal to Depositing the evaporated SiO 2 in a nanoscale molecular form to obtain a resin lens containing a SiO 2 layer, wherein the auxiliary parameters of an ion source are that the anode voltage is 90-140V, the anode current is 2.5-5A, the auxiliary gas is Ar, the flow is 5-20 sccm, and preferably, the ion source is used for assisting the resin lens at a speedDepositing the evaporated SiO 2 in a nanoscale molecular form, wherein the ion source bombardment auxiliary parameter is that the anode voltage is 110V, the anode current is 3A, the auxiliary gas is Ar, and the flow is 10sccm;
s25, repeating the step S22, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S24;
s26, repeating the step S21, and forming a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S25;
s27, repeating the step S22, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S26;
s28, heating ITO (indium tin oxide) by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 50-70 ℃ and an ion source auxiliary process is adopted on the surface of the resin lens obtained in the S27, and the speed is equal to Depositing the evaporated ITO in a nanoscale molecular form to obtain a resin lens containing an ITO layer;
S29, continuously adopting a vacuum coating process on the surface of the resin lens obtained in the S28, repeating the process steps of the S21, and forming a layer of resin lens containing the silicon-aluminum composite oxide layer;
in the steps S21, S22 and S25-S29, the ion source auxiliary deposition process parameters are that the ion source is a Hall source, the anode voltage is 90-140V, the anode current is 2.5-5A, the auxiliary gas is O 2, the flow is 10-30 sccm, and preferably, the ion source auxiliary deposition process parameters are that the ion source is a Hall source, the anode voltage is 110V, the anode current is 3A, the auxiliary gas is O 2, and the flow is 15sccm;
in a specific embodiment, the step S3 of forming the waterproof layer on the surface of the resin lens obtained in the step S2 comprises the following steps of continuously adopting a vacuum coating process on the surface of the lens obtained in the step S29, adopting a high-energy electron beam heating material under the conditions that the background vacuum degree is less than or equal to 3X 10 - 3 Pa and the temperature in a coating cabin is 50-70 ℃, and heating the material at a speed of Depositing the evaporated fluorine-containing waterproof material (preferably a waterproof material containing perfluoro (C 12F27 N)) in a nanoscale molecular form to obtain a resin lens containing a waterproof layer;
In a specific embodiment, the titanium nitride material has a molecular formula of TiN and a purity of 99.9%, is prepared by sintering titanium nitride powder by a conventional process, and is specifically entrusted to development and production by the company Heuzhou prospective phototech Co., ltd;
In a specific embodiment, the silicon-aluminum composite oxide layer is made of SiO 2 and Al 2O3 composite materials, and the SiO 2 accounts for 70% -95% of the mole fraction of the composite materials, and the specific model is referred to examples and comparative examples;
in a specific embodiment, the titanium-niobium composite oxide is prepared and produced by the company Hese, hechi electro-optical technologies, inc., and consists of TiO 2 and Nb 2O5, wherein the mole fraction of TiO 2 is 10% -90%, and the specific model is shown in examples and comparative examples;
The resin lens substrate selected by the invention is prepared by adjusting the content of UV powder of a conventional lens in the field so that the UV cut-off wavelength is 405-407 nm, and the definition of the UV cut-off wavelength refers to 5.4.2.4.4 of optical resin lens standard QB/T2506-2017;
For example, in one embodiment, a resin lens substrate having a UV cutoff wavelength of 405 to 407nm, which is designated MR-8 (refractive index 1.60) or MR-7 (refractive index 1.67) and having a UV cutoff wavelength of 405 to 407nm, hereinafter referred to as "MR-8-UV405" or "MR-7-UV405", is purchased, or in one embodiment, a resin lens substrate having a refractive index of 1.56 and a UV cutoff wavelength of 405 to 407nm, which is developed and produced by Jiangsu-family New materials, inc., and having a UV cutoff wavelength of 405 to 407nm, is purchased, and a specific method for producing the resin lens substrate is described in the patent CN201410245692.6 of the customer optical company.
The invention can select conventional hardening liquid, for example, in a specific embodiment, the model Z117 or Z118 (hereinafter referred to as Z117 or Z118) of the Earthwang optical industry Co, or the model VH56 (hereinafter referred to as VH 56) of the Dunn optical (common) company in a specific embodiment, the hardening liquid is selected for coating, so that the dense connectivity between film layers is greatly improved.
Example (one)
Example 1
A clear-background infrared-proof resin lens sequentially comprises a resin lens substrate 1 (MR-8-UV 405); hardening layer 2 (Z117)/2.6-3 μm; the clear bottom color anti-infrared film layer comprises a silicon aluminum composite oxide layer 3-1 (wherein the mol percent of SiO 2 and Al 2O3 is 92 percent of SiO 2：8％Al2O3, the material model is SA 56)/26 nm, a titanium niobium composite oxide layer 3-2 (wherein the mol percent of TiO 2 and Nb 2O5 is 80 percent of TiO 2：20％Nb2O5, the material model is PTN 28)/12.48 nm, a titanium nitride layer 3-3 (molecular formula TiN, purity is over 99.9 percent, sintered by the OGmbH), a silicon dioxide layer 3-4/34.5nm (molecular formula SiO 2, purity is 99.99 percent, sintered by the OGmbH), a titanium niobium composite oxide layer 3-5 (material is 3-2)/114.5 nm, a silicon aluminum composite oxide layer 3-101.66/160.6 nm is 3-6 nm, and an ITO composite oxide layer 3-3.6 nm is 3-7 nm, and a waterproof layer (material is 3-3.6 nm);
The preparation method of the resin lens comprises the following steps:
S1, manufacturing a hardening layer, namely immersing a resin lens substrate cleaned by ultrasonic waves into a hardening liquid water solution with the mass percentage of 27% and the model of Z117, wherein the immersion temperature is 15 ℃, extracting the solution at the speed of 2.0mm/S after 5 seconds of immersion, drying at 80 ℃ for 3 hours, taking out the substrate, and conveying the substrate into a drying box for drying and curing at 120 ℃ for 150 minutes to obtain the resin lens containing the hardening layer;
S2, preparing a clear-background color infrared-proof film layer, namely, evaporating a solid film layer material in a vacuum coating machine by adopting a vacuum coating process, and then carrying out gas phase transmission, and depositing a film on the surface of the resin lens obtained in the S1 step to form the clear-background color infrared-proof film layer, wherein the method specifically comprises the following steps of:
S21, forming a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S1. Under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 50-70 ℃ and an ion source auxiliary process is adopted, the silicon-aluminum composite oxide is heated by adopting a high-energy electron beam at the rate of Depositing the evaporated silicon-aluminum composite oxide in a nanoscale molecular form to obtain a resin lens containing a first silicon-aluminum composite oxide layer;
And S22, forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S21. Heating the titanium-niobium composite oxide by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 50-70 ℃ and an ion source auxiliary process is adopted on the surface of the resin lens obtained in the S21, and the speed is equal to Depositing the evaporated titanium-niobium composite oxide in a nanoscale molecular form to obtain a resin lens containing a second titanium-niobium composite oxide layer;
S23, forming a titanium nitride layer on the surface of the resin lens obtained in the step S22, wherein the method specifically comprises the following steps of S231, vacuumizing until the background vacuum degree is less than or equal to 8 multiplied by 10 -4 Pa, bombarding for 60 seconds by using an ion source Hall source, wherein the ion source bombarding parameters are that the anode voltage is 110V, the anode current is 3A, the auxiliary gas is Ar, the flow is 10sccm, S232, depositing under an ion source auxiliary process, heating TiN by adopting a high-energy electron beam, and the speed is high The method comprises the steps of depositing the evaporated TiN in a nanoscale molecular form, wherein auxiliary parameters of an ion source are that anode voltage is 110V, anode current is 3A, auxiliary gas is Ar and N 2, ar flow is 10sccm, N 2 flow is 5sccm, S233 is that the surface of a TiN film layer is bombarded by an ion source Hall source continuously for 30 seconds, the bombarding parameters are that the anode voltage is 110V, the anode current is 3A, the auxiliary gas is Ar and N 2, ar flow is 10sccm, and N 2 flow is 5sccm.
S24, heating SiO 2 on the surface of the resin lens obtained in S23 by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 50-70 ℃ and an ion source auxiliary process is adopted, and the speed is equal toAnd depositing the evaporated SiO 2 in a nanoscale molecular form to obtain the resin lens containing the SiO 2 layer, wherein the auxiliary parameters of the ion source are that the anode voltage is 110V, the anode current is 3A, the auxiliary gas is Ar, and the flow is 10sccm.
S25, repeating the step S22, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S24;
s26, repeating the step S21, and forming a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S25;
s27, repeating the step S22, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S26;
s28, heating ITO (indium tin oxide) by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 50-70 ℃ and an ion source auxiliary process is adopted on the surface of the resin lens obtained in the S27, and the speed is equal to Depositing the evaporated ITO in a nanoscale molecular form to obtain a resin lens containing an ITO layer;
S29, continuously adopting a vacuum coating process on the surface of the resin lens obtained in the S28, repeating the process steps of the S21, and forming a layer of resin lens containing the silicon-aluminum composite oxide layer;
S3, preparing a waterproof layer, namely forming the waterproof layer on the surface of the resin lens obtained in the S29, continuously adopting a vacuum coating process on the surface of the lens obtained in the S29, adopting a high-energy electron beam heating material under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa and the temperature in a coating cabin is 60 ℃, and adopting the speed as And (3) depositing the evaporated waterproof material containing C 12F27 N on the surface of the resin lens obtained in the step (S24) in a nano molecular form.
Example 2
A clear-color anti-infrared resin lens sequentially comprises a resin lens substrate 1 (SK 1.56-UV 405), a hardening layer 2 (VH 56)/1-2.6 mu m, a clear-color anti-infrared film layer comprising a silicon aluminum composite oxide layer 3-1 (wherein SiO 2 and Al 2O3 are in molar percentage: 92% SiO 2：8％Al2O3, a silicon dioxide layer 3-4/35.26nm (molecular formula 2, 99.99% and 3.99% by weight) which is prepared and produced by OGY, SOS 56)/26 nm, a titanium niobium composite oxide layer 3-2 (wherein the molar percentage of TiO 2 and Nb 2O5 is 80% TiO 2：20％Nb2O5, the material model is PTN 28)/11.8 nm, a titanium nitride layer 3-3 (molecular formula TiN, purity 99.9% is above, sintered by GY, SOS 3-4/35.26nm (molecular formula 2, purity 99.99% by OS) which is sintered by GY 3.0 nm, and a titanium oxide layer 3-3.5 nm (3.9 nm) which is sintered by OS 3/3-3.8 nm, 3-5 nm and a titanium-3 (3.9 nm) which is a sintered composite material of the same type as that of the silicon aluminum composite oxide layer 3-3 (3.8) and a titanium-3-6 nm (3.7 nm).
The preparation method of the resin lens comprises the following steps:
s1, manufacturing a hardening layer, namely immersing a resin lens substrate cleaned by ultrasonic waves into a hardening liquid water solution with the mass percentage content of 30% and the model of VH56, wherein the immersion temperature is 15 ℃, extracting the solution at the speed of 2.0mm/S after 5 seconds of immersion, drying at 80 ℃ for 3 hours, taking out the substrate, and conveying the substrate into a drying box for drying and curing at the curing temperature of 120 ℃ for 150 minutes to obtain the resin lens containing the hardening layer;
The rest of the procedure is the same as in example 1.
Example 3
A clear-background infrared-proof resin lens sequentially comprises a resin lens substrate 1 (MR-7-UV 405); the hardening layer 2 (Z118)/1-2.6 mu m, the clear bottom color anti-infrared film layer comprises a silicon aluminum composite oxide layer 3-1 (wherein SiO 2 and Al 2O3 mol percent are 92% SiO 2：8％Al2O3, the silicon dioxide layer 3-4/34.1nm (the molecular formula SiO 2, the purity 99.99% is sintered by film coating material Co., ltd.), a titanium niobium composite oxide layer 3-2 (wherein the mol percent of TiO 2 and Nb 2O5 is 80% TiO 2：20％Nb2O5, the silicon aluminum composite oxide layer 3-5 (3-2) is developed and produced by the silicon aluminum composite oxide Co., ltd., the material model is PTN 28)/14.34 nm, a titanium nitride layer 3-3 (molecular formula TiN, the purity is more than 99.9%, the silicon dioxide layer is sintered by the silicon carbide Co., ltd.)/1.0 nm), a titanium niobium composite oxide layer 3-5 (3-2)/3.34.5 (3 nm is sintered by film coating material Co., ltd.) in Dandelion the city, the silicon aluminum composite oxide layer 3-6 nm (3-3 nm is 3-5) is the same as the silicon aluminum composite oxide layer 3-3, the silicon aluminum composite oxide layer 3-3 (3.9 nm) is the silicon aluminum composite oxide layer 3-3 (3.9% or more than 3.9% and the silicon aluminum composite oxide layer (3.9% is sintered by the silicon aluminum composite oxide layer).
The preparation method of the resin lens comprises the following steps:
S1, manufacturing a hardening layer, namely immersing a resin lens substrate cleaned by ultrasonic waves into a hardening liquid water solution with the mass percentage of 27% and the model of Z118, wherein the immersion temperature is 15 ℃, extracting the solution at the speed of 2.0mm/S after 5 seconds of immersion, drying at 80 ℃ for 3 hours, taking out the substrate, and conveying the substrate into a drying box for drying and curing at 120 ℃ for 150 minutes to obtain the resin lens containing the hardening layer;
The rest of the procedure is the same as in example 1.
Example 4
A clear-background anti-infrared resin lens sequentially comprises a resin lens substrate 1 (MR-8-UV 405), a hardening layer 2 (Z117)/2.6-3 mu m, a clear-background anti-infrared film layer comprising a silicon-aluminum composite oxide layer 3-1 (wherein the mol percent of SiO 2 and Al 2O3 is 92% SiO 2：8％Al2O3, the material model is SA 56)/26 nm, a titanium-niobium composite oxide layer 3-2 (wherein the mol percent of TiO 2 and Nb 2O5 is 80% TiO 2：20％Nb2O5, the material model is PTN 28)/12.48 nm, a titanium nitride layer 3-3 (molecular formula TiN, purity 99.9% or more, the film is sintered by the film-forming company of 3-6 nm, 3-5 nm (SiO 2, 99.99% and 3 nm) of the film-forming company of 3-6 nm, and a titanium-3-5 nm (3.5 nm-3-5 nm-3) of the same type ITO composite oxide material is sintered by the film-forming company of 3-6 nm (3-3/3.5 nm of 3-6 nm);
the preparation method is the same as in example 1.
(II) comparative example
Comparative example 1
A clear-background infrared-proof resin lens sequentially comprises a resin lens substrate 1 (MR-8-UV 405), a hardening layer 2 (Z117)/2.6-3 mu m, and a light green infrared-proof film layer comprising a SiO 2 layer 3-1/24.6nm, a ZrO 2 layer 3-2/8.42nm, a SiO 2 layer 3-3/51.42nm, a ZrO 2 layer 3-4/118.72nm, a SiO 2 layer 3-5/160.59nm, a ZrO 2 layer 3-6/80.64nm, an ITO layer 3-7/5nm, a SiO 2 layer 3-8/66.3nm, and a waterproof layer 4 (waterproof material containing C 12F27 N/10 nm);
the preparation method comprises the following steps:
S1, manufacturing a hardening layer, namely immersing a resin lens substrate cleaned by ultrasonic waves into a hardening liquid water solution with the mass percentage of 27% and the model of Z117, wherein the immersion temperature is 15 ℃, extracting the solution at the speed of 2.0mm/S after 5 seconds of immersion, drying at 80 ℃ for 3 hours, taking out the substrate, and conveying the substrate into a drying box for drying and curing at 120 ℃ for 150 minutes to obtain the resin lens containing the hardening layer;
S2, preparing a clear-background color infrared-proof film layer, namely, evaporating a solid film layer material in a vacuum coating machine by adopting a vacuum coating process, and then carrying out gas phase transmission, and depositing a film on the surface of the resin lens obtained in the S1 step to form the clear-background color infrared-proof film layer, wherein the method specifically comprises the following steps of:
s21, comprising the following steps:
S211, heating SiO 2 on the surface of the resin lens obtained in the S1 by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 60 ℃ and no ion source auxiliary process is adopted, and the speed is equal to Depositing the evaporated SiO 2 in a nanoscale molecular form to obtain a resin lens containing a first SiO 2 layer;
S212, heating ZrO 2 on the surface of the resin lens obtained in S211 by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 60 ℃ and no ion source auxiliary process is adopted, and the speed is equal to Depositing the evaporated ZrO 2 in a nanoscale molecular form to obtain a resin lens containing a second layer ZrO 2 layer;
S213, repeating the steps S211 and S212, and alternately forming a third SiO 2 layer, a fourth ZrO 2 layer, a fifth SiO 2 layer and a sixth ZrO 2 layer respectively, namely forming a resin lens comprising the third SiO 2 layer, the fourth ZrO 2 layer, the fifth SiO 2 layer and the sixth ZrO 2 layer;
S22, heating ITO (indium tin oxide) by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 60 ℃ and an ion source auxiliary process is adopted on the surface of the resin lens obtained in S21, and the speed is equal to Depositing the evaporated ITO in a nanoscale molecular form to obtain a resin lens containing a seventh ITO layer;
S23, continuously adopting a vacuum coating process on the surface of the resin lens obtained in the S22, repeating the process steps of the S211, and forming a resin lens containing an eighth SiO 2 layer;
S3, preparing a waterproof layer, namely forming the waterproof layer on the surface of the resin lens obtained in the S23, continuously adopting a vacuum coating process on the surface of the lens obtained in the S2, adopting a high-energy electron beam heating material under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa and the temperature in a coating cabin is 60 ℃, and adopting the speed as And (3) depositing the evaporated waterproof material containing C 12F27 N on the surface of the resin lens obtained in the step (S24) in a nano molecular form.
Comparative example 2
A blue anti-reflection infrared-proof resin lens sequentially comprises a resin lens substrate 1 (MR-8-UV 405), a hardening layer 2 (Z117)/2.6-3 mu m, an anti-reflection layer comprising a silicon aluminum composite oxide layer 3-1 (wherein SiO 2 and Al 2O3 have a molar percentage of 92% SiO 2：8％Al2O3; entrusted to development and production of the same-state photoelectric technology Co., ltd.), a titanium niobium composite oxide layer 3-2 (wherein TiO 2 and Nb 2O5 have a molar percentage of 80% TiO 2：20％Nb2O5; entrusted to development and production of the same-state photoelectric technology Co., ltd.) and a material model of PTN 28)/15.45 nm, a silicon aluminum composite oxide layer 3-3/31.42nm (material and 3-1), a titanium niobium composite oxide layer 3-4 (material and 3-2)/98.9 nm, a composite oxide layer 3-5/171.92nm (material and 3-1), a titanium niobium composite oxide layer 3-6-3 nm (material and 3-6 nm) and an ITO composite oxide layer 3-3/31.42nm (material and 3-5 nm and 5/62 nm) and a waterproof layer (material and 3-8 nm) (material and 3-5/5 nm);
The preparation method of the resin lens comprises the following steps:
S1, manufacturing a hardening layer, namely immersing a resin lens substrate cleaned by ultrasonic waves into a hardening liquid water solution with the mass percentage of 27% and the model of Z117, wherein the immersion temperature is 15 ℃, extracting the solution at the speed of 2.0mm/S after 5 seconds of immersion, drying at 80 ℃ for 3 hours, taking out the substrate, and conveying the substrate into a drying box for drying and curing at 120 ℃ for 150 minutes to obtain the resin lens containing the hardening layer;
S2, preparing an anti-reflection anti-infrared layer, namely evaporating a solid film material in a vacuum film plating machine by adopting a vacuum film plating process, and then carrying out gas phase transmission, and depositing the surface of the resin lens obtained in the S1 step into a film to form the anti-reflection anti-infrared layer, wherein the method specifically comprises the following steps:
s21, comprising the following steps:
S211, heating the silicon-aluminum composite oxide by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 60 ℃ and an ion source auxiliary process is adopted on the surface of the resin lens obtained in the S1, wherein the speed is equal to Depositing the evaporated silicon-aluminum composite oxide in a nanoscale molecular form to obtain a resin lens containing a first silicon-aluminum composite oxide layer;
S212, heating the Ti-Nb composite oxide by adopting high-energy electron beams under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 60 ℃ and an ion source auxiliary process is adopted on the surface of the resin lens obtained in S211, and the speed is equal to Depositing the evaporated titanium-niobium composite oxide in a nanoscale molecular form to obtain a resin lens containing a second titanium-niobium composite oxide layer;
S213, repeating the steps S211 and S212 to alternately form a third silicon aluminum composite oxide layer, a fourth titanium niobium composite oxide layer, a fifth silicon aluminum composite oxide layer and a sixth titanium niobium composite oxide layer respectively, namely forming a resin lens comprising the third silicon aluminum composite oxide layer, the fourth titanium niobium composite oxide layer, the fifth silicon aluminum composite oxide layer and the sixth titanium niobium composite oxide layer;
S22, heating ITO (indium tin oxide) by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 60 ℃ and an ion source auxiliary process is adopted on the surface of the resin lens obtained in S21, and the speed is equal to Depositing the evaporated ITO in a nanoscale molecular form to obtain a resin lens containing a seventh ITO layer;
s23, continuously adopting a vacuum coating process on the surface of the resin lens obtained in the S22, repeating the process steps of the S211, and forming a resin lens containing an eighth silicon-aluminum composite oxide layer;
S3, preparing a waterproof layer, namely forming the waterproof layer on the surface of the resin lens obtained in the S23, continuously adopting a vacuum coating process on the surface of the lens obtained in the S2, adopting a high-energy electron beam heating material under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa and the temperature in a coating cabin is 60 ℃, and adopting the speed as And (3) depositing the evaporated waterproof material containing C 12F27 N on the surface of the resin lens obtained in the step (S24) in a nano molecular form.
Comparative example 3
A clear-background anti-infrared resin lens sequentially comprises a resin lens substrate 1 (MR-8-UV 405), a hardening layer 2 (Z117)/2.6-3 mu m, an anti-reflection layer comprising a silicon aluminum composite oxide layer 3-1 (wherein the mol percent of SiO 2 and Al 2O3 is 92% SiO 2：8％Al2O3; the material model is SA 56)/26 nm, a titanium niobium composite oxide layer 3-2 (wherein the mol percent of TiO 2 and Nb 2O5 is 80% TiO 2：20％Nb2O5; the material model is PTN 28)/13.48 nm, the silicon aluminum composite oxide layer 3-3/34.5nm (material is 3-1), the titanium niobium composite oxide layer 3-4 (material is 3-2)/114.5 nm, the titanium niobium composite oxide layer 3-5/160.4nm (material is 3-1), the titanium niobium composite oxide layer 3-6 (material is 3-6 nm) is 3-6 nm, the silicon aluminum composite oxide layer is 3-3/4 nm (material is 3-4 nm), the material is 3-4 nm and the waterproof layer is 3-3/4 nm (material is 3-4 nm);
the preparation process and method are the same as comparative example 2.
Comparative example 4
A clear-background infrared-proof resin lens sequentially comprises a resin lens substrate 1 (MR-8-UV 405), a hardening layer 2 (Z117)/2.6-3 mu m, an anti-reflection layer comprising a SiO 2 layer 3-1/26.6nm, a TiO 2 layer 3-2/13.35nm, a SiO 2 layer 3-3/34.8nm, a TiO 2 layer 3-4/113.81nm, a SiO 2 layer 3-5/161.65nm, a TiO 2 layer 3-6/101.11nm, an ITO layer 3-7/5nm, a SiO 2 layer 3-8/73.6nm and a waterproof layer 4 (adopting a waterproof material containing C 12F27 N/10 nm), wherein the preparation method comprises the following steps:
S1, manufacturing a hardening layer, namely immersing a resin lens substrate cleaned by ultrasonic waves into a hardening liquid water solution with the mass percentage of 27% and the model of Z117, wherein the immersion temperature is 15 ℃, extracting the solution at the speed of 2.0mm/S after 5 seconds of immersion, drying at 80 ℃ for 3 hours, taking out the substrate, and conveying the substrate into a drying box for drying and curing at 120 ℃ for 150 minutes to obtain the resin lens containing the hardening layer;
S2, preparing a clear-background color infrared-proof film layer, namely, evaporating a solid film layer material in a vacuum coating machine by adopting a vacuum coating process, and then carrying out gas phase transmission, and depositing a film on the surface of the resin lens obtained in the S1 step to form the clear-background color infrared-proof film layer, wherein the method specifically comprises the following steps of:
s21, comprising the following steps:
S211, heating SiO 2 on the surface of the resin lens obtained in the S1 by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 60 ℃ and an ion source auxiliary process is adopted, wherein the speed is equal to Depositing the evaporated SiO 2 in a nanoscale molecular form to obtain a resin lens containing a first SiO 2 layer;
S212, heating TiO 2 on the surface of the resin lens obtained in S211 by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 60 ℃ and an ion source auxiliary process is adopted, and the speed is equal to Depositing the evaporated TiO 2 in a nanoscale molecular form to obtain a resin lens containing a second layer TiO 2 layer;
S213, repeating the steps S211 and S212, and alternately forming a third SiO 2 layer, a fourth TiO 2 layer, a fifth SiO 2 layer and a sixth TiO 2 layer respectively, namely forming a resin lens comprising the third SiO 2 layer, the fourth TiO 2 layer, the fifth SiO 2 layer and the sixth TiO 2 layer;
S22, heating ITO (indium tin oxide) by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 60 ℃ and an ion source auxiliary process is adopted on the surface of the resin lens obtained in S21, and the speed is equal to Depositing the evaporated ITO in a nanoscale molecular form to obtain a resin lens containing a seventh ITO layer;
S23, continuously adopting a vacuum coating process on the surface of the resin lens obtained in the S22, repeating the process steps of the S211, and forming a resin lens containing an eighth SiO 2 layer;
S3, preparing a waterproof layer, namely forming the waterproof layer on the surface of the resin lens obtained in the S23, continuously adopting a vacuum coating process on the surface of the lens obtained in the S2, adopting a high-energy electron beam heating material under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa and the temperature in a coating cabin is 60 ℃, and adopting the speed as And (3) depositing the evaporated waterproof material containing C 12F27 N on the surface of the resin lens obtained in the step (S24) in a nano molecular form.
Comparative example 5
A clear-base anti-infrared resin lens sequentially comprises a resin lens substrate 1 (MR-8-UV 405), a hardening layer 2 (Z117)/2.6-3 mu m, a clear-base anti-infrared film layer 3 comprising a silicon-aluminum composite oxide layer 3-1 (wherein the mol ratio of SiO 2 to Al 2O3 is 92% SiO 2：8％Al2O3, the material model is SA 56)/26 nm, a titanium-niobium composite oxide layer 3-2 (wherein the mol ratio of TiO 2 to Nb 2O5 is 80% TiO 2：20％Nb2O5, the material model is PTN 28)/12.48 nm, the mol ratio of SiO to Cr is 1:1, the film coating material is composed of SiO 2 and Al 2O3 by the company of DANCO) and 1.2nm, the silicon dioxide layer 3-4/34.5nm (molecular formula 2, the purity of DANCO is 99.99% and the film coating material is composed of DANCO) and 3-3.5 nm (wherein the mol ratio of TiO 2 and Nb 2O5 is 80% TiO 2：20％Nb2O5, the material model is PTN 28)/12.48 nm, the SiO-Cr absorbing layer 3-3 (SiO: cr mol ratio is 1:1, the film coating material is composed of DANCO) and the film coating material is composed of 3-3.2 nm, the titanium-4/34.5 nm (SiO 2 and the film coating material is composed of DANCO 3-3.3/6 nm and 3-3.3.3/3.7 nm);
the preparation method was the same as in example 1, except that 3-3 SiO-Cr absorbing layers were used.
The SiO-Cr absorbing layer is prepared by forming a SiO-Cr layer on the surface of the resin lens obtained in the step S22. Firstly, vacuumizing until the background vacuum degree is less than or equal to 1.2 multiplied by 10 -4 Pa. Then depositing under the auxiliary process of an ion source Hall source, heating SiO-Cr by adopting a high-energy electron beam at a speedAnd depositing the evaporated SiO-Cr in a nano molecular form to obtain the resin lens containing the SiO-Cr layer. The auxiliary parameter of the ion source is that the anode voltage is 110V, the anode current is 3A, and the Ar flow is 12sccm.
Comparative example 6
A clear-base anti-infrared resin lens sequentially comprises a resin lens substrate 1 (MR-8-UV 405), a hardening layer 2 (Z117)/2.6-3 mu m, a clear-base anti-infrared film layer 3, a silicon-aluminum composite oxide layer 3-1 (wherein the mol percent of SiO 2 and Al 2O3 is 92% SiO 2：8％Al2O3, the material model is SA 56)/26 nm, a titanium-niobium composite oxide layer 3-2 (wherein the mol percent of TiO 2 and Nb 2O5 is 80% TiO 2：20％Nb2O5, the material model is PTN 28)/12.48 nm, a titanium nitride layer 3-3 (molecular formula TiN, the purity is over 99.9%, the silicon dioxide layer 3-4/34.5nm (molecular formula 2, the purity is 99.99% and the purity is up to 3.96 nm) by the company, and the titanium oxide layer 3-3.5 nm (3-6 nm) is a sintered material of the same type as that of the silicon-aluminum composite oxide layer 3-3) (3-6 nm, the same as the film layer 3-3.5 nm is a sintered material of the titanium-3-6 nm (3.3-3 nm, the same as the film layer 3-3/3.5 nm);
the preparation method was the same as in example 1, except that 3 to 3 layers of titanium nitride were used.
The preparation process of the titanium nitride comprises the step of forming a titanium nitride layer on the surface of the resin lens obtained in the step S22. Firstly, vacuumizing until the background vacuum degree is less than or equal to 8 multiplied by 10 -4 Pa. And bombarding for 60 seconds by using an ion source Hall source, wherein the ion source bombarding parameters are that the anode voltage is 110V, the anode current is 3A, the auxiliary gas is Ar, and the flow is 10sccm. Then depositing under the auxiliary process of an ion source Hall source, heating TiN by adopting a high-energy electron beam at a speedThe evaporated TiN is deposited in the form of nano-scale molecules to obtain the resin lens containing the TiN layer. The auxiliary parameters of the ion source are that the anode voltage is 110V, the anode current is 3A, the Ar flow is 12sccm, and no nitrogen flow exists. And (3) obtaining the resin lens containing the TiN layer, and continuously bombarding the TiN surface for 30 seconds by using an ion source, wherein the ion source parameters are the same as the ion source auxiliary parameters of the TiN layer.
Comparative example 7
A clear-base anti-infrared resin lens sequentially comprises a resin lens substrate 1 (MR-8-UV 405), a hardening layer 2 (Z117)/2.6-3 mu m, a clear-base anti-infrared film layer 3, a silicon-aluminum composite oxide layer 3-1 (wherein the mol percent of SiO 2 and Al 2O3 is 92% SiO 2：8％Al2O3, the material model is SA 56)/26 nm, a titanium-niobium composite oxide layer 3-2 (wherein the mol percent of TiO 2 and Nb 2O5 is 80% TiO 2：20％Nb2O5, the material model is PTN 28)/12.48 nm, a titanium nitride layer 3-3 (molecular formula TiN, the purity is over 99.9%, the silicon dioxide layer 3-4/34.5nm (molecular formula 2, the purity is 99.99% and the purity is up to 3.96 nm) by the company, and the titanium oxide layer 3-3.5 nm (3-6 nm) is a sintered material of the same type as that of the silicon-aluminum composite oxide layer 3-3) (3-6 nm, the same as the film layer 3-3.5 nm is a sintered material of the titanium-3-6 nm (3.3-3 nm, the same as the film layer 3-3/3.5 nm);
the preparation method was the same as in example 1, except that 3 to 3 layers of titanium nitride were used. The preparation process of the titanium nitride comprises the step S23 of forming a titanium nitride layer on the surface of the resin lens obtained in the step S22. Firstly, vacuumizing until the background vacuum degree is less than or equal to 8 multiplied by 10 - 4 Pa. No ion source hall source pre-bombard. Directly depositing under the auxiliary process of an ion source Hall source, heating TiN by adopting a high-energy electron beam at a speed The evaporated TiN is deposited in the form of nano-scale molecules to obtain the resin lens containing the TiN layer. The auxiliary parameters of the ion source are that the anode voltage is 110V, the anode current is 3A, the Ar flow is 10sccm, and the nitrogen flow is 5sccm. Obtaining a resin lens containing a TiN layer, and continuously bombarding the TiN surface for 30 seconds by using an ion source, wherein the ion source parameters are the same as the auxiliary parameters of the ion source of the layer
Comparative example 8
A clear-base anti-infrared resin lens sequentially comprises a resin lens substrate 1 (MR-8-UV 405), a hardening layer 2 (Z117)/2.6-3 mu m, a clear-base anti-infrared film layer 3, a silicon-aluminum composite oxide layer 3-1 (wherein the mol percent of SiO 2 and Al 2O3 is 92% SiO 2：8％Al2O3, the material model is SA 56)/26 nm, a titanium-niobium composite oxide layer 3-2 (wherein the mol percent of TiO 2 and Nb 2O5 is 80% TiO 2：20％Nb2O5, the material model is PTN 28)/12.48 nm, a titanium nitride layer 3-3 (molecular formula TiN, the purity is over 99.9%, the silicon dioxide layer 3-4/34.5nm (molecular formula 2, the purity is 99.99% and the purity is up to 3.96 nm) by the company, and the titanium oxide layer 3-3.5 nm (3-6 nm) is a sintered material of the same type as that of the silicon-aluminum composite oxide layer 3-3) (3-6 nm, the same as the film layer 3-3.5 nm is a sintered material of the titanium-3-6 nm (3.3-3 nm, the same as the film layer 3-3/3.5 nm);
the preparation method was the same as in example 1, except that 3 to 3 layers of titanium nitride were used.
The preparation process of the titanium nitride is S23, wherein a titanium nitride layer is formed on the surface of the resin lens obtained in the step S22. Vacuum is firstly pumped until the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa (the vacuum is not specially controlled). And bombarding for 60 seconds by using an ion source Hall source, wherein the ion source bombarding parameters are that the anode voltage is 110V, the anode current is 3A, the auxiliary gas is Ar, and the flow is 10sccm. Then depositing under the auxiliary process of an ion source Hall source, heating TiN by adopting a high-energy electron beam at a speedThe evaporated TiN is deposited in the form of nano-scale molecules to obtain the resin lens containing the TiN layer. The auxiliary parameters of the ion source are that the anode voltage is 110V, the anode current is 3A, the Ar flow is 10sccm, and the nitrogen flow is 5sccm. And (3) obtaining the resin lens containing the TiN layer, and continuously bombarding the TiN surface for 30 seconds by using an ion source, wherein the ion source parameters are the same as the ion source auxiliary parameters of the TiN layer.
2. Experimental example
The main examples and comparative examples are shown below with a 9-layer IR-proof film structure containing TiN or SiO-Cr and no 8-layer IR-proof film system.
TABLE 1 comparison of examples and comparative examples materials
1. Determination of average reflectance, transmittance, yellowness index and anti-IR Effect of lenses
1.1 Measurement of average reflectance, transmittance and anti-IR Effect of examples 1 to 4 and comparative examples 1 to 8
The lenses obtained in examples 1 to 4 and comparative examples 1 to 8 were measured for average reflectance (average reflectance: visual average reflectance under illumination of C light (light source of color temperature 6774K defined in CIE), average transmittance (average transmittance: visual average transmittance under illumination of C light (light source of color temperature 6774K defined in CIE), transmittance of the same film system by double-sided plating, and yellow index (yellow index of lens calculated with reference to QB-T-2506-2001 after double-sided plating), and near infrared transmittance (near infrared average transmittance: near infrared transmittance of lens calculated with reference to QB-T-2506-2017 after double-sided plating), and the measurement results are shown in Table 2 below:
TABLE 2 reflectivity, infrared barrier and yellow index comparison
| Film color | Containing TiN | Single-sided visible light reflectance | Average transmittance of visible light | Near infrared average blocking rate | Yellow index | |
| Example 1 | Green colour | Is that | 1.23% | 90.5% | 59.3% | 3.6% |
| Example 2 | Green colour | Is that | 1.21% | 90.8% | 58.9% | 3.7% |
| Example 3 | Green colour | Is that | 1.29% | 90.2% | 59.4% | 3.8% |
| Example 4 | Green colour | Is that | 1.26% | 91.8% | 58.5% | 4.1% |
| Comparative example 1 | Green colour | Whether or not | 1.26% | 95.1% | 38.4% | 5.2% |
| Comparative example 2 | Blue color | Whether or not | 0.73% | 95.7% | 52.1% | 13.4% |
| Comparative example 3 | Green colour | Whether or not | 1.21% | 95.3% | 56.4% | 4.8% |
| Comparative example 4 | Green colour | Whether or not | 1.20% | 95.4% | 56.9% | 5.0% |
| Comparative example 5 | Green colour | Whether or not | 1.27% | 92.9% | 57.1% | 5.4% |
| Comparative example 6 | Green colour | Is that | 1.26% | 93.1% | 57.4% | 5.4% |
| Comparative example 7 | Green colour | Is that | 1.29% | 89.2% | 59.5% | 5.0% |
| Comparative example 8 | Green colour | Is that | 1.25% | 92.6% | 57.9% | 5.1% |
As can be seen from comparative examples 2 and 3, the anti-infrared process infrared blocking rate of the green film is higher and the yellow index is lower. The infrared blocking rate is further improved and the yellow index is further reduced by adopting a TiN layer with a special process. The visual effect of the lens is clearer.
1.2 Determination of blue light prevention Effect of lenses
With reference to national standard GB/T38120-2019, it is checked whether the lens meets the standard.
TABLE 3 comparison of blue light protection index and yellow index
1.3 Effect of comparative TiN Process on blue light prevention Standard and yellow index
The single-sided transflective was tested, and the absorption was converted to the following:
TABLE 4 influence of TiN Process on blue light and yellow index prevention
The common process adopts SiO-Cr as an absorption layer, and can effectively meet the requirement of blue light prevention. But its yellow-green light absorption is lower, resulting in an increase in yellow index. Most weak absorbent materials are of this nature.
The preparation process of the TiN film layer is strictly controlled, and the preparation of the film layer is facilitated to achieve the expected technical effect.
(1) When the TiN is not strictly controlled in vacuum, the film layer is oxidized, so that the absorption of the film layer is reduced, the absorption of yellow green light and infrared light is reduced more quickly, the yellow index is increased, the visual yellowing of the lens is not clear, and (2) when the TiN is not assisted by an ion source, the film layer is loose, the nitrogen content is reduced in the evaporation process, and the oxidation is supplemented when other layers are plated. Thus, the tendency of oxidization appears, the absorption of the film layer is reduced, the absorption of yellow green light and infrared light is reduced more quickly, the yellow index is increased, the visual yellowing of the lens is not clear, and (3) when the TiN ion source is assisted, the film layer is not metallized (insufficient nitriding) without being assisted by nitrogen, and the absorption is increased sharply. The absorption of blue light increases much faster than yellow-green light and infrared, resulting in an increase in yellow index and visual yellowing of the lens with bluish grey. The TiN layer prepared by adopting the specific process can effectively increase the near infrared blocking absorption, control the blue light absorption and increase the yellow light absorption, thereby reducing the yellow index and leading the lens to be clearer and more beautiful.
2. High temperature resistance, durability and high temperature adhesion test
2.1 Temperature resistance experiment:
After the samples (examples 1 to 4 and comparative examples 1 to 8) were completed, the samples were tested for temperature resistance after one week of storage. The test method of the temperature resistance is to pass a baking test at 55 ℃ for 30 minutes with reference to the 5.8 th clause of the national resin lens temperature resistance standard (GB 10810.4-2012). And (5) baking at 5 ℃ for 30 minutes each time by the same method after the test until the lens has the phenomena of film cracking, orange peel and other failure, and recording the qualified highest temperature. The results are recorded in table 5 below.
2.2 High temperature adhesion experiments:
The adhesion test refers to the film adhesion test of the 5.9 th strip in national standard GB 10810.4-2012. The high-temperature film adhesive force test refers to the test method of the No. 5.9 of national standard GB 10810.4-2012 by the Xinwann company, the boiling condition is changed to 90+/-2 ℃ for 60 minutes, and other test methods are the same. The adhesion and high temperature adhesion test results show that the level A indicates that the film is not removed or the film removing area is smaller than 5%, the level B indicates that the film removing area is between 5% and 15%, and the level C (unqualified) indicates that the film removing area is obviously larger than 15%. To verify the product adhesion distribution, high temperature adhesion tests were performed from 5 different positions in the coating chamber.
The test results of examples 1 to 4 and comparative examples 1 to 8 are recorded in the following table 5.
2.3 High temperature high humidity test
The photovoltaic industry and the optical communication industry use high temperature and high humidity to evaluate the durability of products. The high-temperature and high-humidity resistance test debugging of the resin lens is defined as that the resin lens is stored for 12 hours under 85 ℃ and 85% humidity according to the test method of the photovoltaic industry test standard (GB/T18911-2002, IEC61646:1996, item 10.13) and the optical communication industry (Ballcore Test, GR-1221-Core, item 6.2.5), whether the prepared lens has obvious failure phenomena such as film cracks or orange peel or not is checked, and 3 resin lenses at different positions are put into each high-temperature and high-humidity test. The test results of examples 1 to 4 and comparative examples 1 to 8 are recorded in the following table 5.
TABLE 5 results of high temperature resistance, durability and high temperature adhesion test
Therefore, under the condition that other conditions are unchanged, the high-refractive-index material of the lens is better than other conventional materials in high-temperature resistance, high-temperature adhesion and durability due to the adoption of the titanium-niobium composite oxide, the low-refractive-index material is better than other conventional materials in high-temperature resistance, high-temperature adhesion and durability due to the adoption of the silicon-aluminum composite oxide, and the film system and the proper process thereof are prepared by adopting the two specific proportioning materials so as to ensure the high-temperature resistance and durability of the clear-background color infrared-proof product.
Claims (15)
1. The resin lens is characterized by comprising a resin lens substrate, a hardening layer and a clear-background-color infrared-resistant film layer, wherein the resin lens substrate, the hardening layer and the clear-background-color infrared-resistant film layer are sequentially arranged, the hardening layer is positioned on the surface of the resin lens substrate, and the clear-background-color infrared-resistant film layer is positioned on the surface of the hardening layer;
The clear-background anti-infrared film layer comprises three silicon-aluminum composite oxide layers, three titanium-niobium composite oxide layers, a titanium nitride layer, a silicon dioxide layer and a tin-doped indium oxide layer, namely an ITO layer, wherein in the clear-background anti-infrared film layer, the layers are sequentially (1) the silicon-aluminum composite oxide layer, (2) the titanium-niobium composite oxide layer, (3) the titanium nitride layer, (4) the silicon dioxide layer, (5) the titanium-niobium composite oxide layer, (6) the silicon-aluminum composite oxide layer, (7) the titanium-niobium composite oxide layer, (8) the tin-doped indium oxide layer, namely the ITO layer and (9) the silicon-aluminum composite oxide layer, and the first silicon-aluminum composite oxide layer is positioned on the surface of the hardening layer;
the preparation method of the blue light-proof infrared-proof high-temperature-resistant resin lens comprises the following steps:
S1, preparing a hardening layer, namely forming the hardening layer on the surface of a resin lens substrate to obtain a resin lens containing the hardening layer, wherein the step of preparing the hardening layer comprises the steps of immersing the resin lens substrate cleaned by ultrasonic waves into a hardening liquid aqueous solution with the mass percent of 25-30%, immersing at the temperature of 10-20 ℃, extracting the solution at the speed of 1.0-3.0 mm/S after immersing for 4-8 seconds, drying at the temperature of 70-90 ℃ for 2-5 hours, taking out the substrate, drying and curing in a drying box at the curing temperature of 100-150 ℃ for 120-180 minutes to obtain the resin lens containing the hardening layer;
S2, preparing a clear-background color infrared-proof film layer, namely forming the clear-background color infrared-proof film layer on the surface of the resin lens obtained in the step S1, namely obtaining the resin lens containing the clear-background color infrared-proof film layer, wherein the method specifically comprises the steps of evaporating a silicon-aluminum composite oxide layer, a titanium-niobium composite oxide, titanium nitride, silicon dioxide and ITO solid film layer material in a vacuum film plating machine and then carrying out gas phase transmission, and depositing the film on the surface of the resin lens obtained in the step S1 to form the clear-background color infrared-proof film layer, and specifically comprises the following steps:
S21, forming a first silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S1, heating the silicon-aluminum composite oxide by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 50-70 ℃ and an ion source auxiliary process is adopted, and depositing the evaporated silicon-aluminum composite oxide in a nanoscale molecular form at the speed of 5-7A/S to obtain the resin lens containing the first silicon-aluminum composite oxide layer;
S22, forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S21, heating the titanium-niobium composite oxide by adopting a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 50-70 ℃ and an ion source auxiliary process is carried out, and depositing the evaporated titanium-niobium composite oxide in a nanoscale molecular form at the speed of 2-4A/S to obtain a resin lens containing a second layer of titanium-niobium composite oxide layer;
S23, forming a titanium nitride layer on the surface of the resin lens obtained in the step S22, wherein the method specifically comprises the following steps:
S231, vacuumizing until the background vacuum degree is less than or equal to 8 multiplied by 10 -4 Pa, and bombarding for 50-80 seconds by using an ion source Hall source, wherein the ion source bombarding parameters are that the anode voltage is 90-140V, the anode current is 2.5-5A, the auxiliary gas is Ar, and the flow is 5-20 sccm;
S232, depositing under an ion source auxiliary process, heating TiN by adopting a high-energy electron beam, and depositing the evaporated TiN in a nanoscale molecular form at a rate of 0.8-1.5A/S, wherein the ion source auxiliary parameters are that the anode voltage is 90-140V, the anode current is 2.5-5A, the auxiliary gas is Ar and N 2, the Ar flow is 5-15 sccm, and the N 2 flow is 3-15 sccm;
S233, bombarding the surface of the TiN film layer for 20-40 seconds by using an ion source Hall source, wherein the bombarding parameters are that the anode voltage is 90-140V, the anode current is 2.5-5A, the auxiliary gas is Ar and N 2, the Ar flow is 5-15 sccm, and the N 2 flow is 3-15 sccm;
S24, heating SiO 2 by using a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 50-70 ℃ and an ion source auxiliary process is adopted on the surface of the resin lens obtained in S23, and depositing the evaporated SiO 2 in a nano-scale molecular form at the speed of 5-20A/S to obtain the resin lens containing the SiO 2 layer;
s25, repeating the step S22, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S24;
s26, repeating the step S21, and forming a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S25;
s27, repeating the step S22, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S26;
s28, heating ITO by using a high-energy electron beam under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa, the temperature in a coating cabin is 50-70 ℃ and an ion source auxiliary process is adopted on the surface of the resin lens obtained in the S27, and depositing the evaporated ITO in a nano-level molecular form at the speed of 1-3A/S to obtain the resin lens containing an ITO layer;
S29, continuously adopting a vacuum coating process on the surface of the resin lens obtained in the S28, repeating the process steps of the S21, and forming a layer of resin lens containing the silicon-aluminum composite oxide layer;
And S3, preparing a waterproof layer on the surface of the resin lens obtained in the step S2, wherein the waterproof layer is formed on the surface of the resin lens obtained in the step S29, and the method comprises the following steps of continuously adopting a vacuum coating process, adopting a high-energy electron beam heating material under the conditions that the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Pa and the temperature in a coating cabin is 50-70 ℃, and depositing the evaporated fluorine-containing waterproof material in a nanoscale molecular form at the speed of 5-8A/S to obtain the resin lens containing the waterproof layer.
2. The clear undertone blue-light-proof infrared-proof high temperature-resistant resin lens as claimed in claim 1, wherein the hardening layer is made of organic silicon.
3. The clear undertone blue-light-preventing infrared-preventing high-temperature-resistant resin lens according to claim 2, wherein the organic silicon contains at least Ti element.
4. The clear background blue-light-proof infrared-proof high-temperature-resistant resin lens according to any one of claims 1 to 3, wherein the silicon-aluminum composite oxide layer is composed of a SiO 2 and Al 2O3 composite material, and wherein SiO 2 accounts for 70% -95% of the composite material in mole fraction.
5. The clear undertone blue-and infrared-resistant high temperature resistant resin lens of claim 4, wherein the silicon aluminum composite oxide layer is composed of a SiO 2 and Al 2O3 composite material, wherein SiO 2 comprises 92% of the composite material mole fraction.
6. The clear undertone blue-light-proof infrared-proof high-temperature-resistant resin lens according to any one of claims 1 to 3, wherein the titanium-niobium composite oxide layer is composed of a TiO 2 and Nb 2O5 composite material, and TiO 2 accounts for 10% -90% of the mole fraction of the composite material.
7. The clear undertone blue-and infrared-resistant high temperature resistant resin lens of claim 6, wherein the titanium niobium composite oxide layer is comprised of a TiO 2 and Nb 2O5 composite, wherein TiO 2 comprises 80% of the composite mole fraction.
8. The clear background blue-light-proof infrared-proof high-temperature-resistant resin lens according to any one of claims 1 to 3, wherein the purity of TiN in the titanium nitride layer is more than 99.9wt%.
9. The clear-background blue-light-preventing infrared-preventing high-temperature-resistant resin lens according to claim 2 or 3, wherein the hardening layer has a thickness of 1-5 μm.
10. The clear background anti-blue anti-infrared high temperature resistant resin lens according to claim 1, wherein the thickness of the clear background anti-infrared film layer is 290-950 nm.
11. The resin lens with clear background, blue light resistance, infrared resistance and high temperature resistance according to claim 1, wherein the thickness of the waterproof layer is 4-20 nm.
12. The clear undertone blue-light-preventing infrared-preventing high temperature-resistant resin lens according to any one of claims 1 to 3, 5, 7 and 10 to 11, wherein the clear undertone blue-light-preventing infrared-preventing high temperature-resistant resin lens has an average reflectance of 1.5% or less.
13. The clear primer blue-light-resistant infrared-resistant high-temperature-resistant resin lens according to any one of claims 1-3, 5, 7 and 10-11, wherein the near infrared blocking rate of the clear primer blue-light-resistant infrared-resistant high-temperature-resistant resin lens is >55%.
14. The resin lens for preventing blue light and infrared high temperature according to any one of claims 1-3, 5, 7 and 10-11, wherein the yellow index of the resin lens for preventing blue light and infrared high temperature is less than or equal to 4.5%.
15. A method for preparing the clear-background blue-light-proof infrared-proof high-temperature-resistant resin lens according to any one of claims 1 to 14, which is characterized by comprising the following steps:
S1, preparing a hardening layer, namely forming the hardening layer on the surface of a resin lens substrate to obtain a resin lens containing the hardening layer;
S2, preparing a clear-background-color infrared-proof film layer, namely forming the clear-background-color infrared-proof film layer on the surface of the resin lens obtained in S1, namely obtaining the resin lens containing the clear-background-color infrared-proof film layer, and specifically comprising the following steps:
s21, respectively forming a resin lens containing a first silicon-aluminum composite oxide layer and a second titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S1;
s22, forming a third resin lens containing a titanium nitride layer on the surface of the resin lens obtained in the step S21;
S23, forming a fourth resin lens containing a SiO 2 layer on the surface of the resin lens obtained in the step S22;
S24, forming a resin lens with a fifth titanium niobium composite oxide layer, a sixth silicon aluminum composite oxide layer and a seventh titanium niobium composite oxide layer on the surface of the resin lens obtained in the step S23;
s25, forming a resin lens containing an eighth ITO-containing layer on the surface of the resin lens obtained in the step S24;
S26, forming a ninth resin lens containing a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S25;
And S3, preparing a waterproof layer, namely forming the waterproof layer on the surface of the resin lens obtained in the step S2.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202211343744.4A CN115616797B (en) | 2022-10-31 | 2022-10-31 | A clear background color blue light and infrared protection resin lens and preparation method thereof |
| PCT/CN2023/084292 WO2024093106A1 (en) | 2022-10-31 | 2023-04-17 | Clear-base-color, blue-light-blocking and anti-infrared resin lens and preparation method therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN202211343744.4A CN115616797B (en) | 2022-10-31 | 2022-10-31 | A clear background color blue light and infrared protection resin lens and preparation method thereof |
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| Publication Number | Publication Date |
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| CN115616797A CN115616797A (en) | 2023-01-17 |
| CN115616797B true CN115616797B (en) | 2024-11-29 |
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| CN202211343744.4A Active CN115616797B (en) | 2022-10-31 | 2022-10-31 | A clear background color blue light and infrared protection resin lens and preparation method thereof |
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| Country | Link |
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| WO (1) | WO2024093106A1 (en) |
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| CN115598860B (en) * | 2022-10-31 | 2024-11-29 | 江苏万新光学有限公司 | A weakly absorbing, low-reflective, clear-background-color, blue-light-proof resin lens and a preparation method thereof |
| CN115616797B (en) * | 2022-10-31 | 2024-11-29 | 江苏万新光学有限公司 | A clear background color blue light and infrared protection resin lens and preparation method thereof |
| CN116893527A (en) * | 2022-12-30 | 2023-10-17 | 江苏万新光学有限公司 | Low-absorption low-reflection bottom-color blue-light-resistant resin lens and preparation method thereof |
Citations (2)
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| CN101216611A (en) * | 2007-12-31 | 2008-07-09 | 曾琪 | Blue ray radiation preventing and achromatism spectacle lens, and method of producing the same |
| CN112415639A (en) * | 2020-11-27 | 2021-02-26 | 江苏万新光学有限公司 | Low-reflection infrared-proof high-temperature-resistant resin lens and preparation method thereof |
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| US6007901A (en) * | 1997-12-04 | 1999-12-28 | Cpfilms, Inc. | Heat reflecting fenestration products with color corrective and corrosion protective layers |
| JP5396074B2 (en) * | 2007-12-20 | 2014-01-22 | 株式会社クラレ | Resin sheet manufacturing method, optical film, and resin sheet manufacturing apparatus |
| WO2012050158A1 (en) * | 2010-10-14 | 2012-04-19 | 株式会社浜野メッキ | Near infrared ray cut-off eyeglasses, face protection tool, and near infrared ray cut-off filter |
| EP4103982A1 (en) * | 2020-02-14 | 2022-12-21 | Vitro Flat Glass LLC | Low sheet resistance coating |
| CN113009713A (en) * | 2021-04-07 | 2021-06-22 | 江苏万新光学有限公司 | Ultralow-reflection clear-background-color blue-light-proof resin lens and preparation method thereof |
| CN113880452B (en) * | 2021-09-29 | 2023-06-23 | 中建材科创新技术研究院(山东)有限公司 | Colored glass and preparation method and application thereof |
| CN114879380A (en) * | 2022-04-02 | 2022-08-09 | 江苏万新光学有限公司 | Light orange super-clear background-color blue-light-proof resin lens and preparation method thereof |
| CN115598860B (en) * | 2022-10-31 | 2024-11-29 | 江苏万新光学有限公司 | A weakly absorbing, low-reflective, clear-background-color, blue-light-proof resin lens and a preparation method thereof |
| CN115616797B (en) * | 2022-10-31 | 2024-11-29 | 江苏万新光学有限公司 | A clear background color blue light and infrared protection resin lens and preparation method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101216611A (en) * | 2007-12-31 | 2008-07-09 | 曾琪 | Blue ray radiation preventing and achromatism spectacle lens, and method of producing the same |
| CN112415639A (en) * | 2020-11-27 | 2021-02-26 | 江苏万新光学有限公司 | Low-reflection infrared-proof high-temperature-resistant resin lens and preparation method thereof |
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| CN115616797A (en) | 2023-01-17 |
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