CN113031309B - Subtract resin lens that near-infrared laser was prevented to reflection - Google Patents
Subtract resin lens that near-infrared laser was prevented to reflection Download PDFInfo
- Publication number
- CN113031309B CN113031309B CN202110346400.8A CN202110346400A CN113031309B CN 113031309 B CN113031309 B CN 113031309B CN 202110346400 A CN202110346400 A CN 202110346400A CN 113031309 B CN113031309 B CN 113031309B
- Authority
- CN
- China
- Prior art keywords
- layer
- resin lens
- infrared
- composite oxide
- boron composite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011347 resin Substances 0.000 title claims abstract description 205
- 229920005989 resin Polymers 0.000 title claims abstract description 205
- 239000000463 material Substances 0.000 claims abstract description 70
- 229910010413 TiO 2 Inorganic materials 0.000 claims abstract description 55
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 239000002131 composite material Substances 0.000 claims description 124
- CFOAUMXQOCBWNJ-UHFFFAOYSA-N [B].[Si] Chemical compound [B].[Si] CFOAUMXQOCBWNJ-UHFFFAOYSA-N 0.000 claims description 121
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 26
- 238000002834 transmittance Methods 0.000 claims description 15
- 238000002310 reflectometry Methods 0.000 claims description 5
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 3
- 230000004224 protection Effects 0.000 claims description 3
- 229910003437 indium oxide Inorganic materials 0.000 claims description 2
- 239000010410 layer Substances 0.000 claims 47
- 230000003667 anti-reflective effect Effects 0.000 claims 2
- 239000011247 coating layer Substances 0.000 claims 2
- 229920001296 polysiloxane Polymers 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 abstract description 7
- 239000011521 glass Substances 0.000 abstract description 3
- 230000007613 environmental effect Effects 0.000 abstract description 2
- WECBSQZGFPFDBC-UHFFFAOYSA-N [Si].[B]=O Chemical compound [Si].[B]=O WECBSQZGFPFDBC-UHFFFAOYSA-N 0.000 abstract 1
- 239000004020 conductor Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 67
- 239000010408 film Substances 0.000 description 50
- 238000001771 vacuum deposition Methods 0.000 description 28
- 239000011248 coating agent Substances 0.000 description 16
- 238000000576 coating method Methods 0.000 description 16
- 238000000151 deposition Methods 0.000 description 16
- 238000010894 electron beam technology Methods 0.000 description 15
- 230000003287 optical effect Effects 0.000 description 15
- 150000002500 ions Chemical class 0.000 description 12
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 11
- 230000000694 effects Effects 0.000 description 11
- 229910052731 fluorine Inorganic materials 0.000 description 11
- 239000011737 fluorine Substances 0.000 description 11
- 238000004891 communication Methods 0.000 description 10
- 238000001035 drying Methods 0.000 description 10
- 230000002265 prevention Effects 0.000 description 10
- 238000002360 preparation method Methods 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 6
- 238000007654 immersion Methods 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 229910052796 boron Inorganic materials 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 239000012788 optical film Substances 0.000 description 4
- 239000005871 repellent Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- RJSRQTFBFAJJIL-UHFFFAOYSA-N niobium titanium Chemical compound [Ti].[Nb] RJSRQTFBFAJJIL-UHFFFAOYSA-N 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 230000000007 visual effect Effects 0.000 description 3
- 238000005286 illumination Methods 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 101001101476 Bacillus subtilis (strain 168) 50S ribosomal protein L21 Proteins 0.000 description 1
- 230000006750 UV protection Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 210000004087 cornea Anatomy 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 210000000887 face Anatomy 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/10—Filters, e.g. for facilitating adaptation of the eyes to the dark; Sunglasses
- G02C7/107—Interference colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
- G02B1/116—Multilayers including electrically conducting layers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Abstract
The invention provides an antireflection anti-near-red paintAn external laser resin lens, comprising: the anti-reflection near-infrared laser film comprises a resin lens substrate, a hardening layer and an anti-reflection near-infrared laser film layer; the substrate, the hardening layer and the antireflection near-infrared-proof laser layer are sequentially arranged, the hardening layer is positioned on the surface of the resin lens substrate, and the antireflection layer is positioned on the surface of the hardening layer; and the antireflection near-infrared-proof laser layer is mainly made of high-refractive-index material TiO 2 The layers and the low-refractive index material layer are formed by alternately arranging special low-stress silicon boron oxide film layers and transparent conductive material ITO layers. The invention realizes deeper cut-off (transmission is about 10% or lower) of laser of a plurality of main near infrared bands, simultaneously improves the temperature resistance and the environmental resistance of the resin lens for preparing the glasses, and has good application and market prospect.
Description
Technical Field
The invention relates to the technical field of resin lens preparation, in particular to a resin lens for antireflection and near-infrared laser prevention.
Background
In recent years, the demand of optical resin lenses in the domestic and foreign eyeglass markets is increasing, and resin lenses have the advantages of light weight, good dyeing property, easy processing and the like compared with glass lenses, and medium and high refractive index optical resin lenses are favored by users with the unique advantages of high light transmittance, ultraviolet resistance, ultrathin property and the like.
In the lens industry, high refractive index is generally used when the refractive index of the lens is 1.60 or more, medium refractive index is generally used when the refractive index is 1.56 or less, and low refractive index is generally used when the refractive index is 1.56 or less. There are many factors affecting the refractive index of the lens, and due to the structural difference of the lens material itself, the absorption rate of the lens material to light in different bands of visible light is different, so the light transmittance and reflectivity of the lens itself are affected. In order to meet the requirement of optical performance of resin lenses, a film is generally coated on the surface of the resin lenses to reduce the reflection of light and enhance the transmission of light, i.e. an optical antireflection film.
The infrared ray is not sensitive to the light of human eyes, is mainly absorbed by the cornea and has potential damage to the human eyes. Near-infrared laser is used as a common laser light source in life and work, and mainly comprises the following components: 808nm light used for optical communication pump light, 830-940 nm near infrared semiconductor laser used for remote controller, iris recognition and face recognition, YAL (yttrium aluminum garnet) laser with pulse laser of 1053nm and YAG (yttrium aluminum garnet) laser of 1064nm commonly used in industry, and excitation light near 1310nm of O wave band and 1520-1625 nm of C + L wave band used for optical communication. The widely applied lasers require the optical film layer to have the characteristics of antireflection and infrared laser prevention, and the antireflection and near-infrared laser prevention optical film layer has higher requirements on antireflection and infrared prevention than the common antireflection and infrared prevention optical film layer and is thicker. The optical film is mainly made of inorganic materials, but the temperature resistance and the environmental resistance are poor due to high stress of a finished lens due to the difference of physicochemical properties of a high-molecular resin lens substrate and an inorganic material film layer, and particularly, the film layer for antireflection and near-infrared laser prevention is thick, so that the influence is particularly obvious; in addition, the poor temperature resistance of the lens material limits the better use effect of the lens material. Therefore, the problem to be solved in the art is to provide a resin lens with temperature resistance, which can reflect light and prevent near-infrared laser.
Disclosure of Invention
In order to protect eyes from radiation of various infrared bands, particularly near-infrared laser, the invention aims to provide the anti-reflection near-infrared laser-proof resin lens and the preparation method thereof, so that the near-infrared laser bands are effectively prevented, the reflectivity of the resin lens is reduced, and the high temperature resistance and the durability of the resin lens are improved by reducing stress.
The technical scheme of the invention is realized by the following modes:
the invention provides a resin lens for antireflection and near-infrared laser prevention, which comprises: the resin lens comprises a resin lens substrate, a hardening layer and an anti-reflection near-infrared-proof laser film layer; the resin lens substrate, the hardening layer and the antireflection near-infrared-proof laser film layer are sequentially arranged, the hardening layer is positioned on the surface of the resin lens substrate, and the antireflection near-infrared-proof laser film layer is positioned on the surface of the hardening layer;
furthermore, the resin lens for preventing near-infrared laser through antireflection further comprises a waterproof layer, and the waterproof layer is located on the surface of the near-infrared laser film layer through antireflection.
Further, the material of the hard layer is organic silicon; preferably, the organosilicon at least contains Ti element;
furthermore, the antireflection near-infrared-proof laser film layer comprises a silicon-boron composite oxide layer and TiO 2 A layer and a tin-doped indium oxide (ITO) layer; preferably, the silicon-boron composite oxide material is made of SiO 2 And B 2 O 3 Composition of, and wherein SiO 2 The silicon-boron composite oxide material accounts for 70 to 95 percent of the molar fraction of the silicon-boron composite oxide material;
furthermore, the antireflection near-infrared-proof laser film layer comprises seven silicon-boron composite oxide layers, three ITO layers and three TiO layers 2 A layer; or further, the antireflection near-infrared-proof laser film layer comprises seven silicon-boron composite oxide layers, two ITO layers and four TiO layers 2 A layer;
furthermore, the antireflection near-infrared laser-proof film layer comprises thirteen layers, and specifically comprises the following film layers arranged in sequence: a first silicon boron composite oxide layer, a second ITO layer, a third silicon boron composite oxide layer, a fourth TiO layer 2 Layer, fifth silicon boron composite oxide layer, sixth TiO layer 2 Layer, seventh silicon boron composite oxide layer, eighth TiO layer 2 The ninth layer, the tenth layer and the ninth layer are ITO layers or TiO layers 2 The first layer is a silicon boron composite oxide layer, the eleventh layer is a silicon boron composite oxide layer, the twelfth layer is an ITO layer, and the thirteenth layer is a silicon boron composite oxide layer;
further, the thickness of the hardening layer is 1-5 μm;
further, the total thickness of the antireflection near-infrared-proof laser film layer is 800-1800 nm;
further, the total thickness of the ITO layer of the antireflection near-infrared-resistant laser film layer is 100-300 nm;
further, the thickness of the waterproof layer is 4-20 nm;
further, the average reflectivity of the resin lens is less than or equal to 2.5 percent;
further, the double-sided average transmittance of the resin lens in a near infrared band of 805 nm-1080 nm is less than or equal to 12 percent;
furthermore, the average transmittance of the resin lens on the double surfaces is less than or equal to 12% in a near infrared light communication O wave band of 1260-1360 nm;
furthermore, the average transmittance of the resin lens on the double surfaces of 1520-1625 nm of near infrared light communication C + L wave band is less than or equal to 8%;
furthermore, the thickness of each layer of the antireflection near-infrared-proof laser film layer is as follows:
the thickness of the first layer of silicon-boron composite oxide layer is 0-180 nm, preferably 5-30 nm;
the thickness of the second layer of ITO layer is 8-60 nm, preferably 15-40 nm;
the thickness of the third layer of silicon-boron composite oxide layer is 6-60 nm, preferably 7-45 nm;
the fourth layer of TiO 2 The thickness of the layer is 50-160 nm, preferably 60-140 nm;
the thickness of the fifth layer of silicon-boron composite oxide layer is 80-250 n, and preferably 120-200 nm;
the sixth layer of TiO 2 The thickness of the layer is 60-200 nm, preferably 85-140 nm;
the thickness of the seventh layer of the silicon-boron composite oxide layer is 80-250 nm, preferably 120-200 nm;
the eighth layer of TiO 2 The thickness of the layer is 60-200 nm, preferably 85-140 nm;
the thickness of the ninth layer of the silicon-boron composite oxide layer is 80-250 nm, preferably 120-200 nm;
the thickness of the tenth ITO layer is 60-210 nm, preferably 80-150 nm; or the tenth layer of TiO 2 The thickness of the layer is 60-200 nm, preferably 85-140 nm;
the thickness of the eleventh layer of the silicon-boron composite oxide layer is 80-250 nm, and preferably 120-200 nm;
the thickness of the twelfth ITO layer is 60-210 nm, preferably 80-150 nm;
the thickness of the silicon-boron composite oxide layer on the thirteenth layer is 50-160 nm, and preferably 60-120 nm.
Advantageous effects
Adopt and subtract near-infrared laser rete can have effectively to prevent near-infrared laser and possess good optical effect and high temperature resistance:
(1) aiming at the near infrared laser with the wave band of 805-1080 nm, controlling the transmissivity to be about 10% by utilizing a multilayer film interference cut-off method; by using TiO 2 A film layer of material to achieve this optical effect: due to TiO 2 The refractive index of the light source is high, so that the laser cut-off effect for protecting the wave band is better, and the light source canThe reflectivity of the visible light wave band is low;
(2) for infrared laser of an optical communication O wave band, the transmissivity is controlled to be about 10% by utilizing the near infrared absorption effect of ITO; for infrared laser of an optical communication C + L waveband, the ITO near infrared absorption effect is utilized, and the transmissivity is controlled to be in a range of 4-7%;
the film layer is prepared from the ITO material with a specific thickness to obtain a good infrared light cut-off effect, the ITO material has a high extinction coefficient in an infrared band, generates an effect similar to a metal film, can effectively cut off the infrared band (more than 1200 nm), has a remarkable absorption protection effect on an O band and a C + L band of optical communication, and protects human eyes from radiation of near-infrared laser; the electric conductivity of the ITO is utilized, and the ITO has protection to microwave and electric field; and is limited to a certain thickness to ensure the transmission of the visible light region of the resin lens.
(3) The high temperature resistance of the product is improved: the invention adopts the silicon boron composite oxide layer, thereby effectively avoiding SiO 2 The long column-shaped result is easy to form to cause high stress of the film layer, the glass state structure of the film layer is maintained, the high temperature resistance of the film layer is improved, and the film layer can resist 70 ℃;
(4) the mismatching effect of the film layer and the substrate is reduced, and the product has durability.
The resin lens product prepared by the invention has good visual effect while protecting human eyes from near-infrared laser radiation: especially in optical communication assembly and applications.
Drawings
Fig. 1 is a schematic view of each layer of a high temperature resistant resin lens with an anti-reflection near-infrared-proof laser film layer prepared in example 1 of the present invention; the lens comprises a resin lens substrate 1, a hardening layer 2, an antireflection anti-near-infrared laser film layer 3 and a waterproof layer 4; wherein, subtract and subtract near-infrared laser rete 3 includes: 3-1 parts of silicon boron composite oxide layer, 3-2 parts of ITO layer, 3-3 parts of silicon boron composite oxide layer and TiO 2 3-4 layers, 3-5 silicon boron composite oxide layers and TiO 2 3-6 layers, 3-7 silicon boron composite oxide layers and TiO 2 3-8 parts of layer, 3-9 parts of silicon boron composite oxide layer, 3-10 parts of ITO layer, 3-11 parts of silicon boron composite oxide layer, 3-12 parts of ITO layer and 3-13 parts of silicon boron composite oxide layer
Fig. 2 is a schematic view of each layer of a high temperature resistant resin lens with an anti-reflection near-infrared-proof laser film layer prepared in example 3 of the present invention; the lens comprises a resin lens substrate 1, a hardening layer 2, an antireflection near-infrared-proof laser film layer 3 and a waterproof layer 4; wherein, subtract and subtract near-infrared laser rete 3 includes: 3-1 parts of silicon boron composite oxide layer, 3-2 parts of ITO layer, 3-3 parts of silicon boron composite oxide layer and TiO 2 3-4 layers, 3-5 silicon boron composite oxide layers and TiO 2 3-6 layers, 3-7 silicon boron composite oxide layers and TiO 2 3-8 parts of layer, 3-9 parts of silicon boron composite oxide layer and TiO 2 3-10 layers, 3-11 layers of silicon boron composite oxide, 3-12 layers of ITO, and 3-13 layers of silicon boron composite oxide
Detailed Description
In one specific embodiment, the silicon boron composite oxide is developed and produced by the company Summit photoelectric technology, Inc., of Yokow, Changzhou city, and is made of SiO 2 And B 2 O 3 Composition of, wherein SiO 2 The mole fraction of (A) is 75-95%, and the specific types are shown in examples and comparative examples.
In one embodiment, a resin lens with a refractive index of 1.60 is selected as a substrate, for example, the lens substrate preparation monomer is MR-8 from Mitsui chemical corporation of Japan, hereinafter referred to as "MR-8";
in a specific embodiment, type Z117 of Ito optical industry corporation (hereinafter referred to as "Z117") is selected as a hardening liquid, and the hardening liquid is selected to prepare the lens of the invention, so that the compact bonding property between the film layers is greatly improved;
in a specific embodiment, the anti-reflection near-infrared laser film layer high-temperature resistant resin lens provided by the invention is prepared by the following method, and comprises the following steps:
s1 preparing a stiffening layer: forming a hardening layer on the surface of the resin lens substrate to obtain a resin lens containing the hardening layer;
s2, preparing an antireflection anti-near-infrared laser film layer: forming the antireflection anti-near-infrared laser film layer on the surface of the resin lens obtained in S1, that is, obtaining the resin lens containing the antireflection anti-near-infrared laser film layer, specifically including:
s21: forming a resin lens containing a first silicon boron composite oxide layer on the surface of the resin lens obtained in step S1;
s22: forming a resin lens comprising a second ITO-containing layer on the surface of the resin lens obtained in step S21;
s23: forming a resin lens containing a third silicon-boron-containing composite oxide layer on the surface of the resin lens obtained in step S22;
s24: forming a fourth layer containing TiO on the surface of the resin lens obtained in step S23 2 A resin lens of the layer;
s25: forming a resin lens containing a fifth silicon boron composite oxide layer on the surface of the resin lens obtained in step S24;
s26: forming a sixth layer of TiO on the surface of the resin lens obtained in step S25 2 A resin lens of the layer;
s27: forming a resin lens containing a seventh silicon boron composite oxide layer on the surface of the resin lens obtained in step S26;
s28: forming an eighth layer of TiO on the surface of the resin lens obtained in step S27 2 A resin lens of the layer;
s29: forming a resin lens containing a ninth silicon boron composite oxide layer on the surface of the resin lens obtained in step S28;
s210: forming a layer containing a tenth ITO layer or forming a layer containing a tenth TiO layer on the surface of the resin lens obtained in step S29 2 A resin lens of the layer;
s211: forming a resin lens containing an eleventh silicon boron composite oxide layer on the surface of the resin lens obtained in the step S210;
s212: forming a resin lens containing a twelfth ITO layer on the surface of the resin lens obtained in the step S211;
s213: forming a resin lens containing a thirteenth silicon boron composite oxide layer on the surface of the resin lens obtained in step S212;
s3 preparing a waterproof layer: a resin lens containing a water repellent layer is formed on the surface of the resin lens obtained in step S2.
Further, the step S1 includes: immersing a resin lens substrate cleaned by ultrasonic waves into a hardening liquid aqueous solution with the mass percentage of 20-30%, immersing at the temperature of 10-20 ℃ for 4-10 seconds, then pulling out the solution at the speed of 1-3.0 mm/s, drying at the temperature of 60-90 ℃ for 2-4 hours, then taking out the substrate, conveying the substrate into an oven, drying and curing at the temperature of 100-140 ℃ for 120-200 min, and thus obtaining the resin lens containing a hardening layer;
further, the step S2 includes: in a vacuum coating machine, a vacuum coating process is adopted, solid film layer materials are evaporated and then are subjected to gas phase transmission, a film is deposited on the surface of the resin lens obtained in the step S1, and an antireflection near-infrared-resistant laser film layer is formed, and the method specifically comprises the following steps:
s21: the surface of the resin lens obtained in S1 was maintained at a vacuum degree of not more than 3X 10 in the background -3 Pa, the temperature in the coating chamber is 50-70 ℃, and the high-energy electron beam is adopted to heat the silicon boron composite oxide under the condition of an ion source auxiliary process at the speed of
Depositing the evaporated silicon-boron composite oxide in a nano-scale molecular form to obtain a resin lens containing a first silicon-boron composite oxide layer;
s22: the surface of the resin lens obtained in S21 was maintained at a vacuum degree of not more than 3X 10 in the background -3 Pa, the temperature in the coating chamber is 50-70 ℃, and ITO is heated by adopting high-energy electron beams at the speed of 50-70 ℃ under the condition of an ion source auxiliary process
Depositing the evaporated ITO in a nanoscale molecular form to obtain a resin lens containing a second ITO layer;
s23: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S22, and repeating the process step S21 to form the resin lens containing the third silicon boron composite oxide layer;
s24: the surface of the resin lens obtained in S23 was maintained at a vacuum degree of not more than 3X 10 in the background -3 Pa, the temperature in the coating chamber is 50-70 ℃, and high-energy electricity is adopted under the condition of an ion source auxiliary processHeating TiO by beamlets 2 At a rate of
Evaporating the TiO 2 Depositing in the form of nano-scale molecules to obtain a film containing a fourth layer of TiO 2 A resin lens of the layer;
s25: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S24, and repeating the process step S21 to form the resin lens containing the fifth silicon-boron composite oxide layer;
s26: continuing to adopt the vacuum coating process on the surface of the resin lens obtained in the step S25, repeating the process step S24 and forming a layer containing the sixth layer of TiO 2 A resin lens of the layer;
s27: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S26, and repeating the process step S21 to form the resin lens containing the seventh silicon boron composite oxide layer;
s28: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S27, repeating the process step S24, and forming a layer containing the eighth layer of TiO 2 A resin lens of the layer;
s29: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S28, and repeating the process step S21 to form the resin lens containing the ninth silicon-boron composite oxide layer;
s210: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S29, and repeating the process step S22 to form the resin lens containing the tenth ITO layer; or continuously adopting the vacuum coating process on the surface of the resin lens obtained in the step S29, repeating the process step S24 and forming a tenth TiO layer 2 A resin lens of the layer;
s211: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S210, and repeating the process step S21 to form the resin lens containing the eleventh silicon boron composite oxide layer;
s212: continuing to adopt the vacuum coating process on the surface of the resin lens obtained in the step S211, repeating the process step S24 to form a layer containing twelfth layer of TiO 2 A resin lens of the layer;
s213: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S212, and repeating the process step S21 to form a resin lens containing a thirteenth silicon boron composite oxide layer;
s3: forming a water-repellent layer on the surface of the resin lens obtained in S2: continuously adopting the vacuum coating process on the surface of the lens obtained in S2, and keeping the vacuum degree at the background less than or equal to 3 multiplied by 10 -3 Pa, and the temperature in the coating chamber is 50-70 ℃, adopting high-energy electron beams to heat the material at the speed of
And depositing the evaporated fluorine-containing waterproof material on the surface of the resin lens obtained in S2 in a nano-scale molecular form to obtain the fluorine-containing waterproof material.
Example (A)
Example 1
The utility model provides a subtract reflection and prevent near-infrared laser resin lens, arranges in proper order and includes: a resin lens substrate 1 (MR-8); hardening layer 2 (Z117)/2.6-3 μm; the antireflection layer 3 includes: silicon boron composite oxide layer 3-1 (wherein SiO) 2 And B 2 O 3 The mol percentage is as follows: 92% SiO 2 、8％B 2 O 3 (ii) a Developed and produced by Suxiu Miss photoelectric technology corporation, with the model number of BL08)/24.2nm, ITO layer 3-2/27.51nm, silicon-boron composite oxide layer 3-3/9.18nm (the same as 3-1), TiO 2 Layer 3-4/73.78nm, silicon boron composite oxide layer 3-5/176.56nm (same material as 3-1), TiO 2 Layer 3-6/107.6nm, silicon boron composite oxide layer 3-7/162.18nm (same material as 3-1), TiO 2 3-8/95.87nm of layer, 3-9/150.64nm of silicon boron composite oxide layer (the same material as 3-1), 3-10/105nm of ITO layer, 3-11/138.42nm of silicon boron composite oxide layer (the same material as 3-1), 3-12/95.18nm of ITO layer and 3-13/76.96nm of silicon boron composite oxide layer (the same material as 3-1); the waterproof layer 4 adopts perfluorotributylamine (C) 12 F 27 N)/10 nm; the preparation method of the resin lens comprises the following steps:
s1: manufacturing a hardening layer: immersing the resin lens substrate cleaned by ultrasonic waves into 27 mass percent hardening liquid aqueous solution with the model number of Z117, wherein the immersion temperature is 15 ℃, and after 5 seconds of immersion, the solution is pulled out at the speed of 2.0 mm/s; drying at 80 deg.C for 3 hr, taking out the substrate, drying at 120 deg.C for 150min, and curing to obtain resin lens containing hard layer;
s2: preparing an antireflection near-infrared-proof laser film layer: in a vacuum coating machine, a vacuum coating process is adopted, solid film layer materials are evaporated and then are subjected to gas phase transmission, a thin film is deposited on the surface of the resin lens obtained in the step S1, and an antireflection near-infrared laser prevention layer is formed, and the method specifically comprises the following steps:
s21: the surface of the resin lens obtained in S1 was maintained at a vacuum degree of not more than 3X 10 in the background -3 Pa, the temperature in the coating chamber is 60 ℃, an ion source auxiliary process is adopted, and high-energy electron beams are adopted to heat the silicon-boron composite oxide at the speed of
Depositing the evaporated silicon-boron composite oxide in a nano-scale molecular form to obtain a resin lens containing a first silicon-boron composite oxide layer;
s22: the surface of the resin lens obtained in S21 was maintained at a vacuum degree of not more than 3X 10 in the background -3 Pa, the temperature in the coating chamber is 60 ℃, and the titanium-niobium composite oxide is heated by high-energy electron beams at the speed of 60 ℃ under the condition of an ion source auxiliary process
Depositing the evaporated ITO in a nanoscale molecular form to obtain a resin lens containing a second ITO layer;
s23: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S22, and repeating the process step S21 to obtain the resin lens containing the third silicon-boron composite oxide layer;
s24: the surface of the resin lens obtained in S23 was maintained at a vacuum degree of not more than 3X 10 in the background -3 Pa, the temperature in the coating chamber is 60 ℃, and high-energy electron beams are adopted to heat TiO under the condition of an ion source auxiliary process 2 At a rate of
Evaporating TiO 2 Depositing in the form of nano-scale molecules to obtain a film containing a fourth layer of TiO 2 A resin lens of the layer;
s25: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S24, and repeating the process step S21 to obtain the resin lens containing the fifth silicon boron composite oxide layer;
s26: repeating the process of S24 on the surface of the resin lens obtained in S25 to obtain a lens containing a sixth layer of TiO 2 A resin lens of the layer;
s27: repeating the process steps of S21 on the surface of the resin lens obtained in S26 to obtain a resin lens containing a seventh silicon boron composite oxide layer;
s28: repeating the process of S24 on the surface of the resin lens obtained in S27 to obtain a lens containing an eighth layer of TiO 2 A resin lens of the layer;
s29: repeating the process step of S21 on the surface of the resin lens obtained in S28 to obtain a resin lens containing a ninth silicon boron composite oxide layer;
s210: repeating the process steps of S22 on the surface of the resin lens obtained in S29 to obtain a resin lens containing a tenth ITO layer;
s211: repeating the process step of S21 on the surface of the resin lens obtained in S210 to obtain a resin lens containing an eleventh silicon boron composite oxide layer;
s212: repeating the process of S24 on the surface of the resin lens obtained in S211 to obtain a lens containing a twelfth layer of TiO 2 A resin lens of the layer;
s213: repeating the process step of S21 on the surface of the resin lens obtained in step S212 to obtain a resin lens containing a thirteenth silicon boron composite oxide layer;
s3 preparing a waterproof layer: forming a water-repellent layer on the surface of the resin lens obtained in S2: the surface of the lens obtained in the step S213 is continuously coated by a vacuum coating process, and the vacuum degree of the background is less than or equal to 3 multiplied by 10 -3 Pa, and the temperature in the coating chamber is 60 ℃, adopting high-energy electron beams to heat the material at the speed of
And (3) depositing the evaporated fluorine-containing waterproof material on the surface of the resin lens obtained in S213 in a nano-scale molecular form to obtain the fluorine-containing waterproof material.
Example 2
The utility model provides a subtract reflection and prevent near-infrared laser resin lens, arranges in proper order and includes: a resin lens substrate 1 (MR-8); hardening layer 2 (Z117)/2.6-3 μm; the antireflection layer 3 includes: silicon boron composite oxide layer 3-1 (wherein SiO) 2 And B 2 O 3 The mol percentage is as follows: 80% SiO 2 、20％B 2 O 3 (ii) a The material model is BL20)/24.2nm, ITO layer 3-2/27.51nm, silicon-boron composite oxide layer 3-3/9.18nm (the same material as 3-1), TiO, and is produced by Yoshichi photoelectric technology corporation of Changzhou city 2 Layer 3-4/73.78nm, silicon boron composite oxide layer 3-5/176.56nm (same material as 3-1), TiO 2 Layer 3-6/107.6nm, silicon boron composite oxide layer 3-7/162.18nm (same material as 3-1), TiO 2 Layer 3-8/95.87 nm; the silicon boron composite oxide layer is 3-9/150.64nm (the same material is 3-1), the ITO layer is 3-10/105nm, the silicon boron composite oxide layer is 3-11/138.42nm (the same material is 3-1), the ITO layer is 3-12/95.18nm, and the silicon boron composite oxide layer is 3-13/76.96nm (the same material is 3-1); the waterproof layer 4 is made of fluorine-containing waterproof material (such as perfluorotributylamine (C) 12 F 27 N))/10 nm; the preparation method of the resin lens is the same as that of example 1.
Example 3
The utility model provides a subtract reflection and prevent near-infrared laser resin lens, arranges in proper order and includes: a resin lens substrate 1 (MR-8); hardening layer 2 (Z117)/2.6-3 μm; the antireflection layer 3 includes: silicon boron composite oxide layer 3-1 (wherein SiO) 2 And B 2 O 3 The mol percentage is as follows: 92% SiO 2 、8％B 2 O 3 (ii) a Developed and produced by the Pythagorean photoelectric technology corporation of Changzhou city with the model number of BL08)/24.2nm, ITO layer 3-2/33.56nm, silicon-boron composite oxide layer 3-3/7.82nm (the same material as 3-1), TiO 2 Layer 3-4/63.68nm, silicon boron composite oxide layer 3-5/162.29nm (same material as 3-1), TiO 2 Layer 3-6/98.07nm, silicon boron composite oxide layer 3-7/145.87nm (same material as 3-1), TiO 2 Layer 3-8/102.7 nm; the silicon boron composite oxide layer is 3-9/164.78nm (the same material is 3-1) and TiO 2 Layers 3-10/115.2nm, 3-11/170.82nm of silicon boron composite oxide layer (the same material is 3-1), 3-12/133.04nm of ITO layer and 3-13/83.8nm of silicon boron composite oxide layer (the same material is 3-1); the waterproof layer 4 is made of fluorine-containing waterproof material (such as perfluorotributylamine (C) 12 F 27 N))/10 nm; the preparation method of the resin lens is the same as that of example 1.
Comparative example 1
The utility model provides a subtract and subtract near-infrared laser resin lens is prevented, arranges in proper order and includes: a resin lens substrate 1 (MR-8); hardening layer 2 (Z117)/2.6-3 μm; the antireflection layer 3 includes: SiO 2 2 Layer 3-1/24.2nm, ITO layer 3-2/27.51nm, SiO 2 Layer 3-3/9.18nm, TiO 2 Layer 3-4/73.78nm, SiO 2 Layer 3-5/176.56nm, TiO 2 Layer 3-6/107.6nm, SiO 2 Layer 3-7/162.18nm, TiO 2 Layer 3-8/95.87 nm; SiO 2 2 Layer 3-9/150.64nm, ITO layer 3-10/105nm, and SiO 2 Layer 3-11/138.42nm, ITO layer 3-12/95.18nm, SiO 2 Layer 3-13/76.96 nm; the waterproof layer 4 is made of fluorine-containing waterproof material (such as perfluorotributylamine (C) 12 F 27 N))/10 nm; the preparation method of the resin lens comprises the following steps:
s1: manufacturing a hardening layer: immersing the resin lens substrate cleaned by ultrasonic waves into 27 mass percent hardening liquid aqueous solution with the model number of Z117, wherein the immersion temperature is 15 ℃, and after 5 seconds of immersion, the solution is pulled out at the speed of 2.0 mm/s; drying at 80 ℃ for 3 hours, taking out the substrate, and conveying the substrate into a drying oven for drying and curing, wherein the drying and curing temperature is 120 ℃, and the curing time is 150min, so that the resin lens containing the hardened layer is obtained;
s2, preparing an antireflection infrared film layer: in a vacuum coating machine, a vacuum coating process is adopted, solid film layer materials are evaporated and then are subjected to gas phase transmission, a film is deposited on the surface of the resin lens obtained in the step S1, and an antireflection infrared layer is formed, and the method specifically comprises the following steps:
s21: the surface of the resin lens obtained in S1 was maintained at a vacuum degree of not more than 3X 10 in the background -3 Pa, and the temperature in the coating chamber is 60 ℃, and high-energy electron beams are adopted to heat SiO 2 At a rate of
The evaporated SiO 2 Depositing in the form of nano-scale molecules to obtain a first SiO layer 2 A resin lens of the layer;
s22: the surface of the resin lens obtained in S21 was maintained at a vacuum degree of not more than 3X 10 in the background -3 Pa, the temperature in the coating chamber is 60 ℃, and the titanium-niobium composite oxide is heated by adopting high-energy electron beams at the speed of 60 ℃ under the condition of an ion source auxiliary process
Depositing the evaporated ITO in a nanoscale molecular form to obtain a resin lens containing a second ITO layer;
s23: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S22, repeating the process step S21, and obtaining a third layer SiO 2 A resin lens of the layer;
s24: the surface of the resin lens obtained in S23 was maintained at a vacuum degree of not more than 3X 10 in the background -3 Pa, the temperature in the coating chamber is 60 ℃, and high-energy electron beams are adopted to heat TiO under the condition of an ion source auxiliary process 2 At a rate of
Evaporating the TiO 2 Depositing in the form of nano-scale molecules to obtain a film containing a fourth layer of TiO 2 A resin lens of the layer;
s25: repeating the steps S23 and S24 for 2 times alternately on the surface of the resin lens obtained in S24 to form two SiO layers 2 And TiO 2 Including obtaining the fifth layer of SiO 2 Layer, sixth layer TiO 2 Layer, seventh layer SiO 2 Layer, eighth layer TiO 2 A layer;
s26: continuing to adopt the vacuum coating process on the surface of the resin lens obtained in the step S25, and repeating the process step S21 to obtain the resin lens containing the ninth SiO layer 2 A resin lens of the layer;
s27: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S26, and repeating the process step S22 to obtain the resin lens containing the tenth ITO layer;
s28: repeating the steps S26 and S27 on the surface of the resin lens obtained in S27 to obtain a lens containing the eleventh layer of SiO 2 A resin lens with a twelfth ITO layer;
s29: continuing to adopt the vacuum coating process on the surface of the resin lens obtained in the step S28, repeating the process step S21 to obtain the resin lens containing the thirteenth SiO layer 2 And (5) resin lenses of the layers are obtained.
Comparative example 2
The utility model provides a subtract reflection and prevent near-infrared laser resin lens, arranges in proper order and includes: a resin lens substrate 1 (MR-8); hardening layer 2 (Z117)/2.6-3 μm; the antireflection layer 3 includes: silicon boron composite oxide layer 3-1 (wherein SiO) 2 And B 2 O 3 The mol percentage is as follows: 92% SiO 2 、8％B 2 O 3 (ii) a The material model is BL08)/24.2nm TiO, developed and produced by Youth Yoghu photoelectric technology corporation 2 Layer 3-2/12.38nm, silicon boron composite oxide layer 3-3/24.44nm (same material as 3-1), TiO 2 Layer 3-4/121.68nm, silicon boron composite oxide layer 3-5/163.99nm (same material as 3-1), TiO 2 Layer 3-6/108.56nm, silicon boron composite oxide layer 3-7/153.34nm (same material as 3-1), TiO 2 Layers 3-8/72.09 m; the silicon boron composite oxide layer is 3-9/165.22nm (the same material is 3-1), TiO 2 Layer 3-10/106.35nm, silicon boron composite oxide layer 3-11/183.28nm (same material as 3-1), TiO 2 Layer 3-12/242.39nm, ITO layer 3-13/80nm, silicon boron composite oxide layer 3-14/77.83nm (the material is the same as 3-1); the waterproof layer 4 is made of fluorine-containing waterproof material (such as perfluorotributylamine (C) 12 F 27 N))/10 nm; the preparation method of the resin lens comprises the following steps:
s1: manufacturing a hardening layer: immersing the resin lens substrate cleaned by ultrasonic waves into 27 mass percent hardening liquid aqueous solution with the model number of Z117, wherein the immersion temperature is 15 ℃, and after 5 seconds of immersion, the solution is pulled out at the speed of 2.0 mm/s; drying at 80 deg.C for 3 hr, taking out the substrate, drying at 120 deg.C for 150min, and curing to obtain resin lens containing hard layer;
s2, preparing an antireflection anti-near-infrared laser film layer: in a vacuum coating machine, a vacuum coating process is adopted, solid film layer materials are evaporated and then are subjected to gas phase transmission, a thin film is deposited on the surface of the resin lens obtained in the step S1, and an antireflection near-infrared laser prevention layer is formed, and the method specifically comprises the following steps:
s21: the surface of the resin lens obtained in S1 was maintained at a vacuum degree of not more than 3X 10 in the background -3 Pa, the temperature in the coating chamber is 60 ℃, an ion source auxiliary process is adopted, and high-energy electron beams are adopted to heat the silicon-boron composite oxide at the speed of
Depositing the evaporated silicon-boron composite oxide in a nano-scale molecular form to obtain a resin lens containing a first silicon-boron composite oxide layer;
s22: the surface of the resin lens obtained in S21 is maintained at a vacuum degree of background of 3 × 10 or less -3 Pa, the temperature in the coating chamber is 60 ℃, and high-energy electron beams are adopted to heat TiO under the condition of an ion source auxiliary process 2 At a rate of
Evaporating the TiO 2 Depositing in the form of nanoscale molecules to obtain a second layer containing TiO 2 A resin lens of the layer;
s23: repeating the steps S21 and S22 on the surface of the resin lens obtained in S22 for 5 times alternately, and sequentially forming a third silicon-boron-containing composite oxide layer and a fourth TiO layer 2 Layer, fifth layer of silicon boron composite oxide layer, sixth layer of TiO 2 Layer, seventh silicon boron composite oxide layer, eighth TiO layer 2 Layer, ninth layer of silicon boron composite oxide layer, tenth layer of TiO 2 A first silicon boron composite oxide layer, a twelfth TiO layer 2 A resin lens of the layer;
s24: the surface of the resin lens obtained in S23 is maintained at a vacuum degree of background of 3 × 10 or less -3 Pa, the temperature in the coating chamber is 60 ℃, and the titanium-niobium composite oxide is heated by high-energy electron beams at the speed of 60 ℃ under the condition of an ion source auxiliary process
Depositing the evaporated ITO in a nano-scale molecular form to obtain a resin lens containing a thirteenth ITO layer;
s25: the surface of the resin lens obtained in S24 was maintained at a vacuum degree of not more than 3X 10 in the background -3 Pa, the temperature in the coating chamber is 60 ℃, an ion source auxiliary process is adopted, and high-energy electron beams are adopted to heat the silicon-boron composite oxide at the speed of
Depositing the evaporated silicon-boron composite oxide in a nano-scale molecular form to obtain a resin lens containing a fourteenth silicon-boron-containing composite oxide layer;
s3 preparing a waterproof layer: forming a water-repellent layer on the surface of the resin lens obtained in S2: the surface of the lens obtained in the step S213 is continuously coated by a vacuum coating process, and the vacuum degree of the background is less than or equal to 3 multiplied by 10 -3 Pa, and the temperature in the coating chamber is 60 ℃, adopting high-energy electron beams to heat the material at the speed of
And (3) depositing the evaporated fluorine-containing waterproof material on the surface of the resin lens obtained in S213 in a nano-scale molecular form to obtain the fluorine-containing waterproof material.
Comparative example 3
The utility model provides a subtract reflection and prevent near-infrared laser resin lens, arranges in proper order and includes: a resin lens substrate 1 (MR-8); hardening layer 2 (Z117)/2.6-3 μm; the antireflection layer 3 includes: silicon boron composite oxide layer 3-1 (wherein SiO) 2 And B 2 O 3 The mol percentage is as follows: 50% SiO 2 、50％B 2 O 3 (ii) a The material model is BL50)/24.2nm, ITO layer 3-2/27.51nm, silicon-boron composite oxide layer 3-3/9.18nm (the same material as 3-1), TiO, and is produced by Yoshichi photoelectric technology corporation of Changzhou city 2 Layer 3-4/73.78nm, silicon boron composite oxide layer 3-5/176.56nm (same material as 3-1), TiO 2 Layer 3-6/107.6nm, silicon boron composite oxide layer 3-7/162.18nm (same material as 3-1), TiO 2 Layer 3-8/95.87 nm; the silicon boron composite oxide layer is 3-9/150.64nm (same material as 3-1), the ITO layer is 3-10/105nm, and the silicon boron composite oxide layer is 3-11/138.42nm (same material as 3-1)3-1) the same, 3-12/95.18nm of ITO layer and 3-13/76.96nm of silicon boron composite oxide layer (the same material as 3-1); the waterproof layer 4 is made of fluorine-containing waterproof material (such as perfluorotributylamine (C) 12 F 27 N))/10 nm; the preparation method of the resin lens is the same as that of example 1.
Second, Experimental example
1. Average transmittance and near-infrared laser light-shielding effect of examples 1 to 3 and comparative examples 1 to 3 were measured
The average visible light reflectivity and transmittance and the transmittance of several main near-infrared laser bands of the lenses prepared in examples 1 to 3 and comparative examples 1 to 3 are measured; the measurement results are recorded in tables 1 and 2.
TABLE 1
TABLE 2
Average reflectance of visible light: refers to the single-sided visual average reflectance under illumination by C light (a light source of color temperature 6774K defined in CIE);
the visible light average transmittance refers to the total visual average transmittance of the lens (double faces) under illumination of C light (a light source with a color temperature of 6774K defined in CIE);
transmittance at 805 to 1080 nm: the average passing rate of the lens at the arithmetic mean passing rate of 805-1080 nm after the double-sided plating is finished.
1260-1360 nm transmittance: the lens has arithmetic mean passing rate of 1260-1360 nm of optical communication O wave band after double-sided plating.
1520-1625 nm transmittance: the lens has an arithmetic mean passing rate of 1520-1580 nm in an optical communication C + L wave band after double-sided plating.
It can be seen that comparative example 2, in which the thickness of ITO is thin, cannot achieve a good infrared laser prevention effect.
2. High temperature resistance and durability test
2.1 temperature resistance experiment:
after the sample was completed, the temperature resistance of the sample was tested after one week of storage. The test method for temperature resistance is as per item 5.8 in the national resin lens temperature resistance standard (GB 10810.4-2012): pass the baking test at 55 ℃ for 30 minutes. And (4) performing a test by adding 5 ℃ baking for 30 minutes each time in the same way until the lens has a film crack or orange peel failure phenomenon, and recording the qualified highest temperature. The results are reported in table 2 below.
2.2 high temperature high humidity test
The reference resin lens is debugged according to the high temperature and high humidity resistance test: storing the lens for 24 hours at 70 ℃ and 95% humidity, and checking whether the prepared lens has obvious failure phenomena such as film cracking or orange peel and the like; 3 resin lenses placed in different positions for each high temperature and high humidity test. The results are reported in table 3 below.
TABLE 3
It can be seen that under otherwise unchanged conditions, the low refractive index material is made of SiO 2 The high-temperature resistance, high-temperature adhesive force and durability of the silicon-boron composite oxide which is mainly the silicon-boron composite oxide are better than those of other conventional materials; the two materials and the proper process and design thereof are adopted to ensure the high temperature resistance and the durability of the antireflection anti-near infrared laser product. Comparative example 3 was analyzed because B 2 O 3 The proportion is too high, so that the film layer can not form a stable grid structure, and the temperature resistance and high-temperature and high-humidity resistance are reduced.
Claims (7)
1. The utility model provides a subtract resin lens of reflection near-infrared laser of preventing which characterized in that includes: the resin lens comprises a resin lens substrate, a hardening layer and an anti-reflection near-infrared-proof laser film layer; the resin lens comprises a resin lens substrate, a hardening layer, an antireflection near-infrared-resistant laser film layer and a waterproof layer, wherein the resin lens substrate, the hardening layer and the antireflection near-infrared-resistant laser film layer are sequentially arranged, the hardening layer is positioned on the surface of the resin lens substrate, the antireflection near-infrared-resistant laser film layer is positioned on the surface of the hardening layer, and the waterproof layer is positioned on the surface of the antireflection near-infrared-resistant laser film layer;
the antireflection near-infrared-proof laser film layer comprises a silicon-boron composite oxide layer and TiO 2 A layer and a tin-doped indium oxide layer; the silicon-boron composite oxide material is made of SiO 2 And B 2 O 3 Composition of, and wherein SiO 2 The silicon-boron composite oxide material accounts for 70 to 95 percent of the molar fraction of the silicon-boron composite oxide material;
and the antireflection near-infrared-proof laser film layer comprises thirteen layers, and specifically comprises the following film layers which are arranged in sequence: a first silicon boron composite oxide layer, a second ITO layer, a third silicon boron composite oxide layer, a fourth TiO layer 2 Layer, fifth layer of silicon boron composite oxide layer, sixth layer of TiO 2 Layer, seventh silicon boron composite oxide layer, eighth TiO layer 2 The ninth layer is a silicon boron composite oxide layer, and the tenth layer is an ITO layer or TiO layer 2 The first layer is a silicon boron composite oxide layer, the eleventh layer is a silicon boron composite oxide layer, the twelfth layer is an ITO layer, and the thirteenth layer is a silicon boron composite oxide layer;
the total thickness of the antireflection near-infrared-proof laser film layer is 800-1800 nm;
and the total thickness of the ITO layer of the antireflection near-infrared-proof laser film layer is 100-300 nm.
2. The anti-reflective resin lens for protection against near infrared laser according to claim 1, wherein the material of the hard coating layer is silicone.
3. The anti-reflective resin lens for shielding near infrared laser according to claim 2, wherein the silicone contains at least Ti element.
4. The anti-reflection resin lens for preventing near infrared laser according to claim 1, wherein the thickness of the hard coating layer is 1 to 5 μm.
5. The antireflection resin lens for preventing near-infrared laser according to claim 1, wherein the thickness of the waterproof layer is 4 to 20 nm.
6. The anti-reflection near-infrared laser-proof resin lens according to any one of claims 1 to 5, wherein the average reflectivity of the resin lens is less than or equal to 2%.
7. The antireflection resin lens for preventing near-infrared laser according to any one of claims 1 to 5, wherein the resin lens has a double-sided average transmittance of not more than 12% in a near-infrared wavelength range of 805nm to 1080nm, 1200 to 1400nm and a double-sided average transmittance of not more than 8% in a near-infrared wavelength range of 1520 nm to 1625 nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110346400.8A CN113031309B (en) | 2021-03-31 | 2021-03-31 | Subtract resin lens that near-infrared laser was prevented to reflection |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110346400.8A CN113031309B (en) | 2021-03-31 | 2021-03-31 | Subtract resin lens that near-infrared laser was prevented to reflection |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113031309A CN113031309A (en) | 2021-06-25 |
| CN113031309B true CN113031309B (en) | 2022-09-06 |
Family
ID=76453428
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110346400.8A Active CN113031309B (en) | 2021-03-31 | 2021-03-31 | Subtract resin lens that near-infrared laser was prevented to reflection |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113031309B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112811937B (en) * | 2020-12-30 | 2022-07-08 | 哈尔滨工业大学 | Preparation method of high-reflection anti-laser film layer on surface of silicon nitride ceramic substrate |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103226212B (en) * | 2013-04-11 | 2016-05-04 | 红安华州光电科技有限公司 | The one shadow nesa coating that disappears |
| CN205982692U (en) * | 2016-01-08 | 2017-02-22 | 河源市璐悦自动化设备有限公司 | Blue mirror rete structure of car back vision |
| CN109734331A (en) * | 2019-03-13 | 2019-05-10 | 浙江旗滨节能玻璃有限公司 | A kind of single-piece anti-reflection low-emissivity glass and preparation method thereof |
| CN112415639A (en) * | 2020-11-27 | 2021-02-26 | 江苏万新光学有限公司 | Low-reflection infrared-proof high-temperature-resistant resin lens and preparation method thereof |
-
2021
- 2021-03-31 CN CN202110346400.8A patent/CN113031309B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN113031309A (en) | 2021-06-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2589992B1 (en) | Optical product and plastic eyeglass lens | |
| US7144598B2 (en) | Rapid, thermally cured, back side mar resistant and antireflective coating for ophthalmic lenses | |
| US5173368A (en) | Solution-applied antireflective coatings | |
| US5104692A (en) | Two-layer antireflective coating applied in solution | |
| WO2022213763A1 (en) | Anti-blue-light resin lens having ultra-low reflection and clear base color, and preparation method therefor | |
| CN112415639A (en) | Low-reflection infrared-proof high-temperature-resistant resin lens and preparation method thereof | |
| CN115616797B (en) | A clear background color blue light and infrared protection resin lens and preparation method thereof | |
| JP2003522092A (en) | Anti-reflective UV blocking multilayer coating with cerium oxide film | |
| CN115598860B (en) | A weakly absorbing, low-reflective, clear-background-color, blue-light-proof resin lens and a preparation method thereof | |
| CN102466834B (en) | Infrared light blocking multilayer film structure | |
| CN215895150U (en) | Ultra-low reflective clear ground color blue light-proof resin lens | |
| JPS6232441B2 (en) | ||
| CN113031309B (en) | Subtract resin lens that near-infrared laser was prevented to reflection | |
| CN114879380A (en) | Light orange super-clear background-color blue-light-proof resin lens and preparation method thereof | |
| CN113109896B (en) | Anti-reflection wide-infrared-prevention high-temperature-resistant resin lens and preparation method thereof | |
| CN207164279U (en) | A kind of uvioresistant antireflection film layer | |
| KR20090080644A (en) | Hard Coating Solution for Plastic Lens and Manufacturing Method Thereof | |
| CN216817106U (en) | Lens with high near-infrared reflection antireflection film design | |
| CN113031308B (en) | Preparation method of antireflection near-infrared-proof laser resin lens | |
| WO2024138917A1 (en) | Weak-absorption, day/night-low-reflectance, clear-ground-color, anti-blue-light resin lens and preparation method therefor | |
| KR101681964B1 (en) | Preparation method of ophthalmic lens with low reflection coating by wet process and ophthalmic lens using it | |
| CN217787531U (en) | Blue light resin lens is prevented to super clear base colour of light orange | |
| JP2016224192A (en) | Optical component | |
| WO2024138918A1 (en) | Weak-absorption, low-reflection, clear-base-color and anti-blue-light resin lens and preparation method therefor | |
| CN220271693U (en) | Low blue light resin lens that prevents of low reverse clear bottom of day night of weak absorption |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |