CN219435152U - Low-reflection blue-light-resistant resin lens with low absorption and low back-light - Google Patents
Low-reflection blue-light-resistant resin lens with low absorption and low back-light Download PDFInfo
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- CN219435152U CN219435152U CN202223576934.9U CN202223576934U CN219435152U CN 219435152 U CN219435152 U CN 219435152U CN 202223576934 U CN202223576934 U CN 202223576934U CN 219435152 U CN219435152 U CN 219435152U
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- 239000011347 resin Substances 0.000 title claims abstract description 202
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- 238000010521 absorption reaction Methods 0.000 title claims abstract description 94
- 239000002131 composite material Substances 0.000 claims abstract description 133
- 239000000463 material Substances 0.000 claims abstract description 70
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 claims abstract description 65
- RJSRQTFBFAJJIL-UHFFFAOYSA-N niobium titanium Chemical compound [Ti].[Nb] RJSRQTFBFAJJIL-UHFFFAOYSA-N 0.000 claims abstract description 53
- 230000002265 prevention Effects 0.000 claims abstract description 52
- 239000000758 substrate Substances 0.000 claims abstract description 50
- DYRBFMPPJATHRF-UHFFFAOYSA-N chromium silicon Chemical compound [Si].[Cr] DYRBFMPPJATHRF-UHFFFAOYSA-N 0.000 claims abstract description 24
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- Surface Treatment Of Optical Elements (AREA)
- Eyeglasses (AREA)
Abstract
The utility model provides a high-hardness weak-absorption low-reflection blue-light-resistant resin lens with low background color, which is characterized by comprising the following components: a resin lens substrate, a hardening layer and a weak absorption low-reflection bottom color blue light prevention film layer; wherein, resin lens substrate, add hard layer and weak absorption low reflection clear primer prevent blue light rete and arrange in proper order, add hard layer and be located resin lens substrate surface, weak absorption low reflection clear primer prevents blue light rete and is located add hard layer surface, weak absorption low reflection clear primer prevents blue light rete includes silicon aluminum composite oxide layer, titanium niobium composite oxide layer, taN layer, silicon chromium absorbed layer, siO 2 A layer and an ITO layer. According to the utility model, by adjusting the blue light prevention film structure, the use and the process of specific materials, the ultra-low reflection lens with the visual clear effect is obtained, the high temperature resistance and the environmental resistance of the resin lens are greatly improved, and the ultra-low reflection lens has good market application prospect.
Description
Technical Field
The utility model relates to the technical field of resin lens preparation, in particular to a weak-absorption low-reflection bottom-color blue-light-proof resin lens.
Background
In recent years, the demand of optical resin lenses on the domestic and foreign eyeglass market is increasing, and compared with glass lenses, resin lenses have the advantages of light weight, good dyeing property, easy processing and the like, and medium-high refractive index optical resin lenses are favored by users by the special advantages of high light transmittance, ultraviolet resistance, ultra-thin and the like. The main points of demand for resin lenses in the market are: (1) meets the blue light prevention standard to protect the visual health of people; (2) low reflectivity reduces interference and improves aesthetic clarity; (3) clear the background color, clear and white, and appear whiter and more beautiful on the face and eyes. The surface of the resin lens is coated with a film to reduce light reflection and enhance light transmission, namely an optical antireflection film.
Blue light is divided into harmful blue light and beneficial blue light. The modern people cannot leave various electronic products in daily life, the opportunity of contacting blue light is increased sharply, a large amount of blue light is generated on a mobile phone screen, an LED lamp and a computer screen, so that eyes and skin of people are harmed, brown pigment is excited, skin generates macula and freckle, eye myopia degree is deepened, visual fatigue is generated, and normal sleep is not facilitated. The blue light with stronger wavelength and shorter wavelength has potential injury to human body, and the blue light with longer wavelength can make the lens more beautiful, improve the clear feeling of the lens and improve the excitability of people's work. The novel blue light prevention national standard also distinguishes between harmful blue light and beneficial blue light. In order to meet new requirements of consumers in new electronic environments, a weak-absorption low-reflection low-definition bottom-color blue-light-proof resin lens and a preparation method thereof are needed.
Disclosure of Invention
In order to meet new consumption demands, the utility model aims to provide the weak-absorption low-reflection bottom-color blue-light-proof resin lens and the preparation method thereof, which realize ultralow reflection and meet the blue-light-proof standard at the same time, and improve the high temperature resistance and durability of the resin lens by reducing stress.
The utility model is realized by the following technical scheme:
a first aspect of the present utility model provides a weak absorption low-back clear undertone blue-light-preventing resin lens comprising: a resin lens substrate, a hardening layer and a weak absorption low-reflection bottom color blue light prevention film layer; the resin lens comprises a resin lens substrate, a hardening layer and a weak absorption low-reflection clear background color blue light prevention film layer, wherein the resin lens substrate, the hardening layer and the weak absorption low-reflection clear background color blue light prevention film layer are sequentially arranged, the hardening layer is positioned on the surface of the resin lens substrate, and the weak absorption low-reflection clear background color blue light prevention film layer is positioned on the surface of the hardening layer;
further, the weak absorption low-reflection clear background color blue light prevention resin lens further comprises a waterproof layer, wherein the waterproof layer is positioned on the surface of the weak absorption low-reflection clear background color blue light prevention film layer;
further, the UV cutoff wavelength of the resin lens substrate is 399-402 nm;
further, the main material component of the hardening layer is organic silicon;
Further, the weak absorption low-reflection bottom color blue light prevention film layer comprises a silicon aluminum composite oxide layer, a titanium niobium composite oxide layer, a tantalum nitride (i.e. TaN) layer, a silicon chromium absorption layer, silicon dioxide (SiO) 2 ) Layer and dopingAn indium tin oxide (i.e., ITO) layer; further, the weak absorption low-reflection clear background color blue light prevention film layer comprises three silicon-aluminum composite oxide layers, two titanium-niobium composite oxide layers, one TaN layer, one silicon-chromium absorption layer and one SiO layer 2 A layer and an ITO layer;
further, the silicon-aluminum composite oxide layer is formed by SiO 2 And Al 2 O 3 Composite material composition, and wherein SiO 2 The mole fraction of the composite material is 70% -95%; further preferred, wherein SiO 2 92% of the mole fraction of the composite material;
further, the titanium-niobium composite oxide layer is formed by TiO 2 And Nb (Nb) 2 O 5 Composite material composition, wherein TiO 2 Accounting for 10 to 90 percent of the mole fraction of the composite material; preferably, wherein TiO 2 80% of the mole fraction of the composite material;
further, the purity of TaN in the tantalum nitride layer is more than 99.9%;
further, the silicon-chromium absorption layer material is formed by compounding SiO and Cr, wherein the molar ratio of SiO to Cr is 1:1;
Further, the thickness of the hardening layer is 1-5 mu m;
further, the thickness of the weak absorption low-reflection clear background color blue light prevention film layer is 150-500 nm;
further, the thickness of the waterproof layer is 4-20 nm;
further, the average reflectivity of the weak-absorption low-reflection clear-background-color blue-light-preventing resin lens is less than or equal to 0.3%;
further, the peak reflectivity of the weak-absorption low-reflection clear-background color blue light prevention resin lens at the visible light wave band 400-700 nm is less than or equal to 2.2%;
further, the reflection light color coordinate H value of the weak absorption low-reflection clear background color blue light prevention resin lens is 270-295, and the C value is 12-25;
further, the yellow index of the weak-absorption low-reflection clear-background-color blue-light-prevention resin lens is less than or equal to 3.5%;
the second aspect of the utility model provides a method for preparing any of the weak absorption low-reflection bottom color blue-light-proof resin lenses, comprising the following steps:
s1, preparing a hardening layer: forming a hardening layer on the surface of the resin lens substrate to obtain a resin lens containing the hardening layer;
s2, preparing a weak absorption low-reflection clear background color blue light prevention film layer: forming the weak-absorption low-reflection clear background color blue light prevention film layer on the surface of the resin lens obtained in the step S1, namely obtaining the resin lens containing the weak-absorption low-reflection clear background color blue light prevention film layer, which specifically comprises the following steps:
S21: forming a first silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S1;
s22: forming a second layer of a resin lens containing a tantalum nitride (TaN) layer on the surface of the resin lens obtained in step S21;
s23: forming a third resin lens containing a silicon-chromium absorption layer on the surface of the resin lens obtained in the step S22;
s24: forming a fourth layer of silicon dioxide (SiO) on the surface of the resin lens obtained in step S23 2 ) A resin lens of the layer;
s25: forming a resin lens containing a titanium-niobium-containing composite oxide layer forming a fifth layer on the surface of the resin lens obtained in step S24;
s26: forming a sixth silicon-aluminum composite oxide layer-containing resin lens on the surface of the resin lens obtained in the step S25;
s27: forming a resin lens containing a titanium-niobium-containing composite oxide layer forming a seventh layer on the surface of the resin lens obtained in step S26;
s28: forming a resin lens containing an eighth Indium Tin Oxide (ITO) -containing layer on the surface of the resin lens obtained in step S26;
s29: forming a ninth resin lens containing a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S28;
s3, preparing a waterproof layer: and (3) forming a waterproof layer on the surface of the resin lens obtained in the step S2.
Advantageous effects
1. The utility model adopts a specific resin substrate and a combined film system structure, thereby realizing effective blocking of harmful blue light and transmission of beneficial blue light; meanwhile, the yellow index of the product is less than or equal to 3.5%, and the product has good visual effect;
2. according to the utility model, the UV400 substrate is adopted, and compared with the UV410 substrate, the hardness is higher, and the friction-resistant steel wool test effect of the prepared resin lens is better.
3. The utility model adopts a specific process to prepare the silicon-chromium absorption layer, and utilizes the absorption characteristic to meet the blue light prevention standard.
4. According to the utility model, a specific process is adopted to prepare the TaN layer, the blue light prevention standard is satisfied, the yellow index is reduced to increase the clear bottom color effect, the film layer absorbs 1.8% of a 415-445 nm wave band single face which is important for the blue light prevention standard, the lens is ensured to conform to the blue light prevention standard, and the human eyes are protected from being damaged by blue light; the absorption of yellow light is about 0.6 percent higher than that of blue light, so that the yellow index is effectively reduced, and the clear and white appearance of the lens is ensured.
5. The film material also adopts the niobium-titanium composite oxide material, so that the antireflection bandwidth is wider, the reflectivity is lower, the peak reflectivity and the peak reflectivity of the average wave band of visible light are effectively controlled, the light transmittance of the resin lens is obviously improved, and the ultra-low reflection effect is obtained; and good high temperature resistance and durability are obtained.
Drawings
FIG. 1 is a schematic diagram of the structure of each layer of a weak absorption low-reflection bottom color blue-light-preventing resin lens prepared in example 1 of the present utility model; a resin lens substrate 1, a hardening layer 2, a weak absorption low-reflection blue light prevention film layer 3 and a waterproof layer 4; wherein, the blue light preventing film layer 3 is prevented to weak absorption low back clear ground color includes: 3-1 silicon aluminum composite oxide layer, 3-2 tantalum nitride layer, 3-3 silicon chromium absorption layer, 3-4 silicon dioxide layer, 3-5 titanium niobium composite oxide layer, 3-6 silicon aluminum composite oxide layer, 3-7 titanium niobium composite oxide layer, 3-8 ITO layer and 3-9 silicon aluminum composite oxide layer
Detailed Description
In a specific embodiment, the weak absorption low-reflection bottom color blue light prevention film layer comprises three silicon-aluminum composite oxide layers, two titanium-niobium composite oxide layers and one nitriding layerTantalum (TaN) layer, a silicon-chromium absorber layer, a silicon dioxide (SiO) 2 ) The tin-doped indium oxide (ITO) film comprises a layer and a tin-doped indium oxide (ITO) layer, wherein in the weak absorption low-reflection bottom color blue light prevention film layer, the layers are as follows: (1) silicon aluminum composite oxide layer, (2) TaN layer, (3) silicon chromium absorption layer, (4) SiO 2 A layer, (5) a titanium niobium composite oxide layer, (6) a silicon aluminum composite oxide layer, (7) a titanium niobium composite oxide layer, (8) an ITO layer, and (9) a silicon aluminum composite oxide layer; the first silicon-aluminum composite oxide layer is positioned on the surface of the hardening layer;
Further, in a specific embodiment, the thickness of each layer of the weak absorption low-reflection clear under-color blue light preventing film layer is as follows:
the thickness of the first silicon-aluminum composite oxide layer is 0-180 nm, preferably 5-30 nm;
the thickness of the second TaN layer is 0.4-1.5 nm, preferably 0.6-0.9 nm;
the thickness of the third silicon chromium absorption layer is 5-10 nm, preferably 6-8.5 nm;
the fourth layer of SiO 2 The thickness of the layer is 6-20 nm, preferably 8-15 nm;
the thickness of the fifth titanium-niobium composite oxide layer is 15-30 nm, preferably 18-25 nm;
the thickness of the sixth silicon-aluminum composite oxide layer is 15-50 nm, preferably 20-30 nm;
the thickness of the seventh titanium-niobium composite oxide layer is 80-120 nm, preferably 100-112 nm;
the thickness of the eighth ITO layer is 2-10 nm, preferably 4-5 nm;
the thickness of the ninth silicon-aluminum composite oxide layer is 60-130 nm, preferably 70-95 nm;
in a specific embodiment, the step of S1 preparing a stiffening layer includes: immersing the resin lens substrate cleaned by ultrasonic waves into a hardening liquid aqueous solution with the mass percentage of 25-30%, wherein the immersing temperature is 10-20 ℃, extracting the solution at the speed of 1.0-3.0 mm/s after immersing for 4-8 seconds, drying the solution at the temperature of 70-90 ℃ for 2-5 hours, taking out the substrate, drying and curing the substrate in a drying box, and curing the substrate at the temperature of 100-150 ℃ for 120-180 minutes to obtain the resin lens containing the hardening layer;
In a specific embodiment, the step S2 of preparing the weak absorbing low-reflection clear under color blue light preventing film layer includes:
in a vacuum coating machine, adopting a vacuum coating process, evaporating a silicon aluminum composite oxide layer, a titanium niobium composite oxide, tantalum nitride, silicon dioxide and an ITO solid film layer material, and then carrying out gas phase transmission, and depositing the surface of the resin lens obtained in the step S1 into a film to form a weak absorption low-reflection clear bottom color blue light prevention film layer, wherein the method specifically comprises the following steps of:
s21: the background vacuum degree of the surface of the resin lens obtained in the step S1 is less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, 50-70 ℃ of temperature in a coating cabin and an ion source assisted deposition process, heating the silicon-aluminum composite oxide by adopting a high-energy electron beam at a rate ofDepositing the evaporated silicon-aluminum composite oxide in a nanoscale molecular form to obtain a resin lens containing a first silicon-aluminum composite oxide layer;
s22: forming a second tantalum nitride layer on the surface of the resin lens obtained in the step S21, specifically comprising:
s221: in the step S21, the surface of the resin lens is vacuumized until the background vacuum degree is less than or equal to 8 multiplied by 10 -4 Bombarding Pa for 50-80 seconds by using an ion source Hall source, wherein the bombarding parameters are as follows: anode voltage: anode current of 90-140V: 2.5-5A, wherein the auxiliary gas is Ar, and the flow is 5-20 sccm; preferably, the bombardment time of the ion source hall source is 60 seconds, and the bombardment parameters are as follows: anode voltage: 110V, anode current: 3A, the auxiliary gas is Ar, and the flow is 10sccm;
S222: after ion source Hall source bombardment is completed, depositing TaN under the auxiliary process of the ion source, heating the TaN by adopting high-energy electron beams at a speedDepositing the vaporized TaN in the form of nanoscale molecules, the ion source assisting the referenceThe number is as follows: anode voltage: anode current of 90-140V: 2.5-5A, the auxiliary gas is Ar and N 2 Ar flow is 5-15 sccm, N 2 The flow is 3-15 sccm; preferably, at a rate +.>Depositing the evaporated TaN in a nanoscale molecular form, wherein the ion source auxiliary parameters are as follows: anode voltage: 110V, anode current: 3A, the auxiliary gas is Ar and N 2 Ar flow is 10sccm, N 2 The flow rate is 5sccm;
s223: after the ion source assisted process is finished for depositing the TaN, the TaN film surface is bombarded by the ion source Hall source for 20-40 seconds, wherein the bombarding parameters are as follows: anode voltage: anode current of 90-140V: 2.5-5A, the auxiliary gas is Ar and N 2 Ar flow is 5-15 sccm, N 2 The flow rate is as follows: 3-15 sccm; preferably, the bombardment time of the ion source hall source is 30 seconds, and the bombardment parameters are as follows: anode voltage: 110V, anode current: 3A, the auxiliary gas is Ar and N 2 Ar flow is 10sccm, N 2 The flow rate is 5sccm;
s23: the surface of the resin lens obtained in S22 has the background vacuum degree less than or equal to 1 multiplied by 10 -3 Under the conditions of Pa, 50-70 ℃ of temperature in a coating cabin and ion source auxiliary process, high-energy electron beam is adopted to heat SiO and Cr composite materials at the rate ofDepositing the evaporated SiO and Cr composite material in a nanoscale molecular form to obtain a resin lens containing a third silicon-chromium absorption layer; the auxiliary process parameters of the ion source are as follows: anode voltage: anode current of 90-140V: 2.5-5A, wherein the auxiliary gas is Ar, and the flow is 5-20 sccm; preferably, the ion source assisted process is performed at a rate +.>The evaporated SiO and Cr composite material is deposited in a nanoscale molecular form, and the auxiliary parameters of an ion source are as follows: anode voltage: 110V, anode current: 3A, the auxiliary gas is Ar, and the flow is 10sccm;
s24: obtained at S23The surface of the obtained resin lens has the background vacuum degree less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, 50-70 ℃ of temperature in a coating cabin and ion source auxiliary process, high-energy electron beam is adopted to heat SiO 2 At a rate ofSiO after evaporation 2 Depositing in a nanoscale molecular form to obtain a SiO-containing fourth layer 2 A resin lens of the layer; the ion source auxiliary parameters are as follows: anode voltage: anode current of 90-140V: 2.5-5A, wherein the auxiliary gas is Ar, and the flow is 5-20 sccm; preferably, the ion source is used with the aid of a rate +. >SiO to be evaporated 2 Deposition in nanoscale molecular form, ion source auxiliary parameters are: anode voltage: 110V, anode current: 3A, the auxiliary gas is Ar, and the flow is 10sccm;
s25: the surface of the resin lens obtained in S24 has the background vacuum degree less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, the temperature in a coating cabin being 50-70 ℃ and an ion source assisted deposition process, heating the titanium-niobium composite oxide by adopting a high-energy electron beam at the rate ofDepositing the evaporated titanium-niobium composite oxide in a nanoscale molecular form to obtain a resin lens containing a fifth titanium-niobium composite oxide layer;
s26: repeating the step S21, and forming a resin lens containing a sixth silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S25;
s27: repeating the step S25, and forming a resin lens containing a seventh titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S26;
s28: the surface of the resin lens obtained in the step S27 has the background vacuum degree less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, 50-70 ℃ of temperature in a coating cabin and ion source assisted deposition process, heating ITO by adopting high-energy electron beams at a rate ofDepositing the evaporated ITO in a nanoscale molecular form to obtain a resin lens containing an eighth ITO layer;
S29: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S28, repeating the process step of the step S21, and forming a resin lens containing a ninth silicon-aluminum composite oxide layer;
further, in the steps S21, S25 to S29, the ion source assisted deposition process parameters are as follows: the ion source is a Hall source, and the anode voltage is as follows: anode current of 90-140V: 2.5-5A, the auxiliary gas is O 2 The flow is 10-30 sccm; preferably, the ion source assisted deposition process parameters are: the ion source is a Hall source, and the anode voltage is as follows: 110V, anode current: 3A, the auxiliary gas is O 2 The flow is 15sccm;
in a specific embodiment, the step of forming a waterproof layer in the step S3 includes: the vacuum coating process is continuously adopted on the surface of the lens obtained in the step S29, and the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa and 50-70 ℃ of the temperature in the coating cabin, heating the waterproof material by adopting high-energy electron beams at the rate ofThe evaporated fluorine-containing waterproof material (preferably containing a perfluoro (C) 12 F 27 N) depositing in the form of nano-molecules to obtain a resin lens containing a waterproof layer;
in a specific embodiment, the tantalum nitride material has a molecular formula of TaN and a purity of 99.9%, is prepared by sintering tantalum nitride powder by a conventional process, and is specifically entrusted to development and production by the company of the product of the photoelectric technology, incorporated by the company of the product of the photoelectric technology, prospective, changzhou;
In a specific embodiment, the silicon-chromium absorption layer material is made of SiO and Cr in a composite mode, wherein the mol ratio of the SiO to the Cr is 1:1; developed and produced by Koda coating material Co., ltd. In Danyang, model W-56;
in a specific embodiment, the silicon-aluminum composite oxide we delegate the trade name of Changzhou market to the electro-optical technology Co., ltdDeveloped and produced by a company, the silicon-aluminum composite oxide layer is formed by SiO 2 And Al 2 O 3 Composite material composition, and wherein SiO 2 The mole fraction of the composite material is 92 percent, and the model is as follows: SA56;
in a specific embodiment, the titanium niobium composite oxide was developed and produced by the company of the photoelectric technology Co., ltd. In Changzhou, otsu, inc., the titanium niobium composite oxide was prepared from TiO 2 And Nb (Nb) 2 O 5 Composition of TiO wherein 2 The mole fraction of (3) 80%, model is: PTN28;
the resin lens substrate selected by the utility model is used for adjusting the content of UV powder of a conventional lens in the field so that the UV cut-off wavelength is 399-402 nm, and the definition of the UV cut-off wavelength refers to 5.4.2.4.4 of optical resin lens standard QB/T2506-2017; in a specific embodiment, a resin lens substrate having a model number of MR-8 (refractive index 1.60) or MR-7 (refractive index 1.67) and a UV cut-off wavelength of 399 to 402nm, hereinafter referred to as "MR-8-UV400" or "MR-7-UV400", is purchased from Mitsui chemical Co., ltd; or in a specific embodiment, a resin lens substrate with a refractive index of 1.56 and a UV cut-off wavelength of 399-402 nm, which is developed and produced by Jiangsu-visual Material Co., ltd, is purchased, and the specific preparation method of the resin lens substrate is described in patent of the optical company of View, which is hereinafter abbreviated as 'SK 1.56-UV 400': CN201410245692.6.
The present utility model may be selected from conventional hardening liquids, for example, in a specific embodiment, a model Z117 or Z118 (hereinafter referred to as "Z117" or "Z118") hardening liquid of the company of the optical industry, for example; or in a specific embodiment, selecting a hardening liquid with the model of VH56 (hereinafter simply referred to as VH 56) of the Schenz optical (common) company, and preparing the lens according to the utility model by selecting the hardening liquid greatly improves the compact linking property between the film layers.
Example (one)
Example 1
A weak absorption low-reflection clear bottom color blue light-proof resin lens sequentially comprises: resin lens substrate 1 (MR-8-UV 400); stiffening layer 2(Z117)/2.6-3 mu m; the weak absorption low-reflection blue light prevention film layer 3 comprises: silicon aluminum composite oxide layer 3-1 (wherein SiO 2 And Al 2 O 3 Mole percent: 92% SiO 2 ：8％Al 2 O 3 The method comprises the steps of carrying out a first treatment on the surface of the Entrusted with development and production of Hezhou photoelectric technology Co., ltd, the material model is SA 56)/25 nm, the tantalum nitride layer 3-2 (molecular formula TaN, purity is above 99.9%, sintered by Hezhou photoelectric technology Co., ltd.) 0.8nm, the silicon chromium absorption layer 3-3 (molecular formula SiO: cr, molar ratio is 1:1, developed and produced by Danyang Korea coating material Co., ltd., model W-56)/7 nm, the silicon dioxide layer 3-4/10.95nm (molecular formula SiO) 2 Purity 99.99%, sintered by Kodada coating material Co., ltd.) titanium niobium composite oxide layer 3-5 (wherein TiO 2 And Nb (Nb) 2 O 5 The mole percentages are as follows: 80% TiO 2 ：20％Nb 2 O 5 The method comprises the steps of carrying out a first treatment on the surface of the Entrusted to development and production of Changzhou city, prospective phototechnology and technology, and the model of the material is PTN 28)/20.77 nm, and 3-6/24.46nm (the same material as 3-1) of the silicon aluminum composite oxide layer; 3-7 (materials are same as 3-5)/107.58 nm of titanium-niobium composite oxide layer; 3-8/5nm of ITO layer; 3-9/85.1nm (material same as 3-1) of silicon-aluminum composite oxide layer; waterproof layer 4 (with C) 12 F 27 N waterproof material/10 nm);
the preparation method of the resin lens comprises the following steps:
s1: and (3) manufacturing a hardening layer: immersing the resin lens substrate cleaned by ultrasonic waves into a hardening liquid water solution with the mass percentage of 27% and the model of Z117, wherein the immersion temperature is 15 ℃, and extracting the solution at the speed of 2.0mm/s after 5 seconds of immersion; and (3) drying at 80 ℃ for 3 hours, taking out the substrate, conveying the substrate into a drying box for drying and curing, wherein the curing temperature is 120 ℃, and the curing time is 150 minutes, so that the resin mirror S2 containing the hardening layer is prepared into the weak absorption low-reflection clear background color blue light prevention film layer: in a vacuum coating machine, a vacuum coating process is adopted, solid film materials are evaporated and then are transmitted through gas phase, and the surface of the resin lens obtained in the step S1 is deposited into a film to form a weak absorption low-reflection bottom color blue light prevention film layer, which comprises the following steps:
S21: the resin lens surface obtained in step S1The background vacuum degree is less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, 50-70 ℃ of temperature in a coating cabin and an ion source assisted deposition process, heating the silicon-aluminum composite oxide by adopting a high-energy electron beam at a rate ofDepositing the evaporated silicon-aluminum composite oxide in a nanoscale molecular form to obtain a resin lens containing a first silicon-aluminum composite oxide layer;
s22: forming a second tantalum nitride layer on the surface of the resin lens obtained in the step S21, specifically comprising:
s221: in the step S21, the surface of the resin lens is vacuumized until the background vacuum degree is less than or equal to 8 multiplied by 10 -4 Bombarding Pa for 60 seconds by using an ion source Hall source, wherein the bombarding parameters are as follows: anode voltage: 110V, anode current: 3A, the auxiliary gas is Ar, and the flow is 10sccm;
s222: after ion source Hall source bombardment is completed, depositing TaN under the auxiliary process of the ion source, heating the TaN by adopting high-energy electron beams at a speedDepositing the evaporated TaN in a nanoscale molecular form, wherein the ion source auxiliary parameters are as follows: anode voltage: 110V, anode current: 3A, the auxiliary gas is Ar and N 2 Ar flow is 10sccm, N 2 The flow rate is 5sccm;
s223: after the ion source assisted process is used for depositing the TaN, the ion source Hall source is used for bombarding the surface of the TaN film layer for 30 seconds, and the bombarding parameters are as follows: anode voltage: 110V, anode current: 3A, the auxiliary gas is Ar and N 2 Ar flow is 10sccm, N 2 The flow rate is 5sccm;
s23: the surface of the resin lens obtained in S22 has the background vacuum degree less than or equal to 1 multiplied by 10 -3 Under the conditions of Pa, 50-70 ℃ of temperature in a coating cabin and ion source auxiliary process, high-energy electron beam is adopted to heat SiO and Cr composite materials at the rate ofThe SiO and Cr composite material after evaporation is in nanometer fractionAnd (3) performing subtype deposition to obtain a resin lens containing a third silicon-chromium absorption layer, wherein the ion source auxiliary parameters are as follows: anode voltage: 110V, anode current: 3A, the auxiliary gas is Ar, and the flow is 10sccm;
s24: the surface of the resin lens obtained in S23 has the background vacuum degree less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, 50-70 ℃ of temperature in a coating cabin and ion source auxiliary process, high-energy electron beam is adopted to heat SiO 2 At a rate ofSiO after evaporation 2 Depositing in a nanoscale molecular form to obtain a SiO-containing fourth layer 2 Resin lens of layer, the auxiliary parameter of ion source is: anode voltage: 110V, anode current: 3A, the auxiliary gas is Ar, and the flow is 10sccm;
s25: the surface of the resin lens obtained in S24 has the background vacuum degree less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, the temperature in a coating cabin being 50-70 ℃ and an ion source assisted deposition process, heating the titanium-niobium composite oxide by adopting a high-energy electron beam at the rate of Depositing the evaporated titanium-niobium composite oxide in a nanoscale molecular form to obtain a resin lens containing a fifth titanium-niobium composite oxide layer;
s26: repeating the step S21, and forming a resin lens containing a sixth silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S25;
s27: repeating the step S25, and forming a resin lens containing a seventh titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S26;
s28: the surface of the resin lens obtained in the step S27 has the background vacuum degree less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, 50-70 ℃ of temperature in a coating cabin and ion source assisted deposition process, heating ITO by adopting high-energy electron beams at a rate ofDepositing the evaporated ITO in a nanoscale molecular form to obtainObtaining a resin lens containing an eighth ITO layer;
s29: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S28, repeating the process step of the step S21, and forming a resin lens containing a ninth silicon-aluminum composite oxide layer;
in the steps S21, S25 to S29, the ion source auxiliary deposition process parameters are as follows: the ion source is a Hall source, and the anode voltage is as follows: 110V, anode current: 3A, the auxiliary gas is O 2 The flow is 15sccm;
S3, preparing a waterproof layer: the vacuum coating process is continuously adopted on the surface of the lens obtained in the step S29, and the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Heating the material by high-energy electron beam under the conditions of Pa and 60 ℃ in a coating cabin at a rate ofEvaporating the mixture to obtain a mixture containing C 12 F 27 The waterproof material of N is deposited in a nano molecular form to obtain the resin lens containing the waterproof layer.
Example 2
A weak absorption low-reflection clear bottom color blue light-proof resin lens sequentially comprises: resin lens substrate 1 (SK 1.56-UV 400); hardened layer 2 (VH 56)/1-2.6 μm; the weak absorption low-reflection blue light prevention film layer 3 comprises: silicon aluminum composite oxide layer 3-1 (wherein SiO 2 And Al 2 O 3 Mole percent: 92% SiO 2 ：8％Al 2 O 3 The method comprises the steps of carrying out a first treatment on the surface of the Entrusted with development and production of Hezhou photoelectric technology Co., ltd, the material model is SA 56)/25 nm, the tantalum nitride layer 3-2 (molecular formula TaN, purity is above 99.9%, sintered by Hezhou photoelectric technology Co., ltd.) 0.8nm, the silicon chromium absorption layer 3-3 (molecular formula SiO: cr, molar ratio is 1:1, developed and produced by Danyang Korea coating material Co., ltd., model W-56)/7 nm, the silicon dioxide layer 3-4/14.4nm (molecular formula SiO) 2 Purity 99.99%, sintered by Kodada coating material Co., ltd.) titanium niobium composite oxide layer 3-5 (wherein TiO 2 And Nb (Nb) 2 O 5 The mole percentages are as follows: 80% TiO 2 ：20％Nb 2 O 5 The method comprises the steps of carrying out a first treatment on the surface of the Entrusting ChangzhouDeveloped and produced by the city-level photoelectric technology Co., ltd, the material model is PTN 28)/20.02 nm, and the silicon-aluminum composite oxide layer is 3-6/25.23nm (the material is 3-1); 3-7 (materials are same as 3-5)/107.05 nm of titanium-niobium composite oxide layer; 3-8/5nm of ITO layer; 3-9/85.2nm (material same as 3-1) of silicon-aluminum composite oxide layer; waterproof layer 4 (with C) 12 F 27 N waterproof material/10 nm).
The preparation method of the resin lens comprises the following steps:
s1, manufacturing a hardening layer: immersing the resin lens substrate cleaned by ultrasonic waves into a hardening liquid water solution with the mass percentage of 30 percent and the model of VH56, wherein the immersion temperature is 15 ℃, and extracting the solution at the speed of 2.0mm/s after 5 seconds of immersion; drying at 80deg.C for 3 hr, taking out the substrate, drying in a drying oven at 120deg.C for 150min to obtain resin lens containing hardening layer;
the rest of the procedure is the same as in example 1.
Example 3
A weak absorption low-reflection clear bottom color blue light-proof resin lens sequentially comprises: resin lens substrate 1 (MR-7-UV 400); hardening layer 2 (Z118)/1-2.6 mu m; the weak absorption low-reflection blue light prevention film layer 3 comprises: silicon aluminum composite oxide layer 3-1 (wherein SiO 2 And Al 2 O 3 Mole percent: 92% SiO 2 ：8％Al 2 O 3 The method comprises the steps of carrying out a first treatment on the surface of the Entrusted with development and production of Hezhou photoelectric technology Co., ltd, the material model is SA 56)/20 nm, the tantalum nitride layer 3-2 (molecular formula TaN, purity is above 99.9 percent, sintered by Hezhou photoelectric technology Co., ltd.), the silicon chromium absorption layer 3-3 (molecular formula SiO: cr, molar ratio is 1:1, developed and produced by Danyang Koda coating material Co., ltd., model is W-56)/7 nm, the silicon dioxide layer 3-4/9.02nm (molecular formula SiO) 2 Purity 99.99%, sintered by Kodada coating material Co., ltd.) titanium niobium composite oxide layer 3-5 (wherein TiO 2 And Nb (Nb) 2 O 5 The mole percentages are as follows: 80% TiO 2 ：20％Nb 2 O 5 The method comprises the steps of carrying out a first treatment on the surface of the Entrusted to development and production of Changzhou city, photoelectric technology and technology Co., ltd., material model PTN 28)/22.46 nm, silicon aluminum3-6/23.16nm (material same as 3-1) of composite oxide layer; 3-7 (materials are same as 3-5)/108.72 nm of titanium-niobium composite oxide layer; 3-8/5nm of ITO layer; 3-9/85.0nm (the material is 3-1) of silicon-aluminum composite oxide layer; waterproof layer 4 (with C) 12 F 27 N waterproof material/10 nm).
The preparation method of the resin lens comprises the following steps:
s1: and (3) manufacturing a hardening layer: immersing the resin lens substrate cleaned by ultrasonic waves into a hardening liquid water solution with the mass percentage of 27% and the model of Z118, wherein the immersion temperature is 15 ℃, and extracting the solution at the speed of 2.0mm/s after 5 seconds of immersion; drying at 80deg.C for 3 hr, taking out the substrate, drying in a drying oven at 120deg.C for 150min to obtain resin lens containing hardening layer;
The rest of the procedure is the same as in example 1.
(II) comparative example
Comparative example 1
A weak absorption low-reflection clear bottom color blue light-proof resin lens sequentially comprises: resin lens substrate 1 (MR-8-UV 400); hardening layer 2 (Z117)/2.6-3 mu m; the weak absorption low-reflection blue light prevention film layer 3 comprises: silicon aluminum composite oxide layer 3-1 (wherein SiO 2 And Al 2 O 3 Mole percent: 92% SiO 2 ：8％Al 2 O 3 The method comprises the steps of carrying out a first treatment on the surface of the Entrusted with development and production of Hezhou City, photoelectric technology Co., ltd., model SA 56/25 nm, silicon chromium absorption layer 3-2 (molecular formula SiO: cr, molar ratio 1:1, developed and produced by Danyang Koda coating material Co., ltd., model W-56)/9 nm, silicon dioxide layer 3-3/10.95nm (molecular formula SiO) 2 Purity 99.99%, sintered by Kodada coating material Co., ltd.) titanium niobium composite oxide layer 3-4 (wherein TiO 2 And Nb (Nb) 2 O 5 The mole percentages are as follows: 80% TiO 2 ：20％Nb 2 O 5 The method comprises the steps of carrying out a first treatment on the surface of the Entrusted to development and production of Changzhou city, the model of the material is PTN 28)/20.77 nm, and 3-5 (the same material as 3-1)/24.46 nm of silicon-aluminum composite oxide layer; 3-6 (the materials are the same as 3-5)/107.58 nm of a titanium-niobium composite oxide layer; 3-7/5nm of ITO layer; silicon-aluminum composite oxide layer 3-8 (same material as 3-1) 85.1nm; waterproof layer 4 (with C) 12 F 27 N waterproof material/10 nm);
the preparation method of the resin lens comprises the following steps:
s1: and (3) manufacturing a hardening layer: immersing the resin lens substrate cleaned by ultrasonic waves into a hardening liquid water solution with the mass percentage of 27% and the model of Z117, wherein the immersion temperature is 15 ℃, and extracting the solution at the speed of 2.0mm/s after 5 seconds of immersion; drying at 80deg.C for 3 hr, taking out the substrate, drying in a drying oven at 120deg.C for 150min to obtain resin lens containing hardening layer;
s2, preparing a weak absorption low-reflection clear background color blue light prevention film layer: in a vacuum coating machine, a vacuum coating process is adopted, solid film materials are evaporated and then are transmitted through gas phase, and the surface of the resin lens obtained in the step S1 is deposited into a film to form a weak absorption low-reflection bottom color blue light prevention film layer, which comprises the following steps:
s21: and (3) forming a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S1. At the background vacuum degree of less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, 50-70 ℃ of temperature in a coating cabin and an ion source auxiliary process, heating the silicon-aluminum composite oxide by adopting a high-energy electron beam at a rate ofDepositing the evaporated silicon-aluminum composite oxide in a nanoscale molecular form to obtain a resin lens containing a first silicon-aluminum composite oxide layer;
S22: the surface of the resin lens obtained in S21 has the background vacuum degree less than or equal to 1 multiplied by 10 -3 Under the conditions of Pa, 50-70 ℃ of temperature in a coating cabin and ion source auxiliary process, heating the silicon-chromium absorption layer by adopting high-energy electron beams at the rate ofDepositing the evaporated silicon-chromium absorption layer in a nano molecular form to obtain a silicon-chromium-containing film 2 A resin lens of the layer; the ion source auxiliary parameters are as follows: anode voltage: 110V, anode current: 3A, the auxiliary gas is Ar, and the flow is 10sccm.
S23: the surface of the resin lens obtained in S22 has the background vacuum degree less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, 50-70 ℃ of temperature in a coating cabin and ion source auxiliary process, high-energy electron beam is adopted to heat SiO 2 At a rate ofSiO after evaporation 2 Deposited in the form of nano-scale molecules to obtain SiO-containing material 2 A resin lens of the layer; the ion source auxiliary parameters are as follows: anode voltage: 110V, anode current: 3A, the auxiliary gas is Ar, and the flow is 10sccm.
S24: a titanium niobium composite oxide layer is formed on the surface of the resin lens obtained in step S23. The surface of the resin lens obtained in S24 has the background vacuum degree less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, the temperature in a coating cabin being 50-70 ℃ and an ion source auxiliary process, heating the titanium-niobium composite oxide by adopting a high-energy electron beam at the rate of Depositing the evaporated titanium-niobium composite oxide in a nanoscale molecular form to obtain a resin lens containing a second titanium-niobium composite oxide layer;
s25: repeating the step S21, and forming a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S24;
s26: repeating the step S24, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S25;
s27: the surface of the resin lens obtained in S26 has the background vacuum degree less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, 50-70 ℃ of temperature in a coating cabin and ion source auxiliary process, heating ITO by adopting high-energy electron beam at a rate ofDepositing the evaporated ITO in a nanoscale molecular form to obtain a resin lens containing an ITO layer;
s28: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S27, repeating the process step of the step S21, and forming a layer of resin lens containing the silicon-aluminum composite oxide layer;
s3, preparing a waterproof layer: forming a waterproof layer on the surface of the resin lens obtained in S29: the vacuum coating process is continuously adopted on the surface of the lens obtained in the step S29, and the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Heating the material by high-energy electron beam under the conditions of Pa and 60 ℃ in a coating cabin at a rate of Evaporating the mixture to obtain a mixture containing C 12 F 27 And (3) depositing the N waterproof material on the surface of the resin lens obtained in the step (S24) in a nano molecular form.
Comparative example 2
A weak absorption low-reflection clear bottom color blue light-proof resin lens sequentially comprises: resin lens substrate 1 (MR-8-UV 400); hardening layer 2 (Z117)/2.6-3 mu m; the weak absorption low-reflection blue light prevention film layer 3 comprises: silicon aluminum composite oxide layer 3-1 (wherein SiO 2 And Al 2 O 3 Mole percent: 92% SiO 2 ：8％Al 2 O 3 The method comprises the steps of carrying out a first treatment on the surface of the The material model is SA 56)/25 nm, the tantalum nitride layer (molecular formula TaN, purity is above 99.9%, sintered by He Zhou He Zhou photoelectric technology Co., ltd.) 3-2/1.5nm, and the silicon chromium absorption layer 3-3 (molecular formula SiO: cr, molar ratio 1:1, developed and produced by Koda coating material Co., ltd. In Danyang, model W-56)/5.5 nm, silicon dioxide layer 3-4/10.95nm (molecular formula SiO) 2 Purity 99.99%, sintered by Kodada coating material Co., ltd.) titanium niobium composite oxide layer 3-5 (wherein TiO 2 And Nb (Nb) 2 O 5 The mole percentages are as follows: 80% TiO 2 ：20％Nb 2 O 5 The method comprises the steps of carrying out a first treatment on the surface of the Entrusted to development and production of Changzhou city, the model of the material is PTN 28)/20.77 nm, and the silicon aluminum composite oxide layer (3-1) is 3-6/24.46nm; 3-7 (materials are same as 3-5)/107.58 nm of titanium-niobium composite oxide layer; 3-8/5nm of ITO layer; 3-9 (the same material as 3-1)/85.1 nm of silicon-aluminum composite oxide layer; waterproof layer 4 (with C) 12 F 27 N waterproof material/10 nm);
the preparation method is the same as in example 1.
Comparative example 3
The low-reflection clear-background color blue light prevention resin lens sequentially comprises: resin lens substrate 1 (MR-8-UV 405); hardening layer 2 (Z117)/2.6-3 mu m; the weak absorption low-reflection blue light prevention film layer 3 comprises: siO (SiO) 2 Layer 3-1/25.6nm, zrO 2 Layer 3-2/21.9nm, siO 2 Layer 3-3/41.55nm, zrO 2 Layer 3-4/49.18nm, siO 2 Layer 3-5/10.11nm, zrO 2 Layer 3-6/55.73nm, ITO layer 3-7/5nm; siO (SiO) 2 Layer 3-8/89.26nm; waterproof layer 4 (using a water-repellent layer containing C 12 F 27 N waterproof material/10 nm);
the preparation method comprises the following steps:
s1: and (3) manufacturing a hardening layer: immersing the resin lens substrate cleaned by ultrasonic waves into a hardening liquid water solution with the mass percentage of 27% and the model of Z117, wherein the immersion temperature is 15 ℃, and extracting the solution at the speed of 2.0mm/s after 5 seconds of immersion; drying at 80deg.C for 3 hr, taking out the substrate, drying in a drying oven at 120deg.C for 150min to obtain resin lens containing hardening layer;
s2, preparing a low-reflection clear background color blue light prevention film layer: in a vacuum coating machine, a vacuum coating process is adopted, solid film materials are evaporated and then are transmitted through gas phase, and the surface of the resin lens obtained in the step S1 is deposited into a film to form a low-reflection clear-background-color blue-light-preventing film layer, and the method specifically comprises the following steps:
S21: the method comprises the following steps:
s211: the surface of the resin lens obtained in S1 has the background vacuum degree less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, the temperature in a coating cabin being 60 ℃ and no auxiliary process of an ion source, high-energy electron beams are adopted to heat SiO 2 At a rate ofSiO after evaporation 2 Depositing in a nanoscale molecular form to obtain a SiO-containing first layer 2 A resin lens of the layer;
s212: the surface of the resin lens obtained in S211 has the background vacuum degree less than or equal to 3 multiplied by 10 -3 Pa, and in the coating cabinThe ZrO is heated by high-energy electron beams under the conditions of 60 ℃ and no auxiliary process of an ion source 2 At a rate ofZrO after evaporation 2 Depositing in the form of nano-scale molecules to obtain a second layer containing ZrO 2 A resin lens of the layer;
s213: repeating the steps S211 and S212 twice to alternately form a third layer of SiO respectively 2 Fourth layer ZrO 2 Layer, fifth layer SiO 2 And a sixth layer of ZrO 2 A layer, i.e. formed comprising a third layer of SiO 2 Layer, fourth layer ZrO 2 Layer, fifth layer SiO 2 And a sixth layer of ZrO 2 A resin lens of the layer;
s22: the surface of the resin lens obtained in S21 has the background vacuum degree less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, 60 ℃ temperature in a coating cabin and ion source auxiliary process, heating ITO by adopting high-energy electron beams at a rate of Depositing the evaporated ITO in a nanoscale molecular form to obtain a resin lens containing a seventh ITO layer;
s23: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S22, repeating the process steps of the step S211, and forming an eighth SiO-containing layer 2 A resin lens of the layer;
s3, preparing a waterproof layer: forming a waterproof layer on the surface of the resin lens obtained in S23: and (2) continuously adopting a vacuum coating process on the surface of the lens obtained in the step (S2), wherein the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Heating the material by high-energy electron beam under the conditions of Pa and 60 ℃ in a coating cabin at a rate ofAnd (3) depositing the evaporated waterproof material on the surface of the resin lens obtained in the step (S23) in a nano molecular form.
Comparative example 4
A weak absorption low-reflection clear bottom color blue light-proof resin lens sequentially comprises: resin lensSubstrate 1 (MR-8-UV 405); hardening layer 2 (Z117)/2.6-3 mu m; the weak absorption low-reflection clear under color film layer 3 comprises: silicon aluminum composite oxide layer 3-1 (wherein SiO 2 And Al 2 O 3 Mole percent: 92% SiO 2 ：8％Al 2 O 3 The method comprises the steps of carrying out a first treatment on the surface of the Entrusted to development and production of Changzhou City, photoelectric technology Co., ltd., material model SA 56)/24 nm, titanium-niobium composite oxide layer 3-2 (wherein TiO 2 And Nb (Nb) 2 O 5 The mole percentages are as follows: 80% TiO 2 ：20％Nb 2 O 5 The method comprises the steps of carrying out a first treatment on the surface of the Entrusted with development and production of the photoelectric technology Co., ltd. In Changzhou city, the material model is PTN 28)/17.42 nm, the silicon-chromium absorption layer 3-3 (SiO: cr molar ratio is 1:1, sintered by the coating material Co., ltd. In Danyang city)/1.2 nm, the silicon dioxide layer 3-4/32.1nm (molecular formula SiO) 2 Purity 99.99%, sintered by Kogyo coating material Co., ltd.) titanium niobium composite oxide layer 3-5 (material same as 3-2)/48.9 nm, silicon aluminum composite oxide layer 3-6 (material same as 3-1)/12.1 nm; 3-7 (same material as 3-2)/34.95 nm of titanium-niobium composite oxide layer; 3-8/5nm of ITO layer; 3-9 (the same material as 3-1)/91.1 nm of silicon-aluminum composite oxide layer; waterproof layer 4 (with C) 12 F 27 N waterproof material/10 nm);
the preparation method comprises the following steps:
s1: and (3) manufacturing a hardening layer: immersing the resin lens substrate cleaned by ultrasonic waves into a hardening liquid water solution with the mass percentage of 27% and the model of Z117, wherein the immersion temperature is 15 ℃, and extracting the solution at the speed of 2.0mm/s after 5 seconds of immersion; drying at 80deg.C for 3 hr, taking out the substrate, drying in a drying oven at 120deg.C for 150min to obtain resin lens containing hardening layer;
s2, preparing an ultralow-reflection clear background color film layer: in a vacuum coating machine, adopting a vacuum coating process, evaporating a solid film material, then carrying out gas phase transmission, and depositing a film on the surface of the resin lens obtained in the step S1 to form an ultralow-reflection clear-background color film, wherein the method specifically comprises the following steps of:
S21: and (3) forming a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S1. At the background vacuum degree of less than or equal to 3 multiplied by 10 -3 Pa, and the temperature in the coating cabinUnder the conditions of 50-70 ℃ and an ion source auxiliary process, heating the silicon-aluminum composite oxide by adopting a high-energy electron beam at the rate ofDepositing the evaporated silicon-aluminum composite oxide in a nanoscale molecular form to obtain a resin lens containing a first silicon-aluminum composite oxide layer;
s22: a titanium niobium composite oxide layer is formed on the surface of the resin lens obtained in step S21. The surface of the resin lens obtained in S21 has the background vacuum degree less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, the temperature in a coating cabin being 50-70 ℃ and an ion source auxiliary process, heating the titanium-niobium composite oxide by adopting a high-energy electron beam at the rate ofDepositing the evaporated titanium-niobium composite oxide in a nanoscale molecular form to obtain a resin lens containing a second titanium-niobium composite oxide layer;
s23: an sio—cr layer is formed on the surface of the resin lens obtained in step S22. Firstly, vacuumizing until the background vacuum degree is less than or equal to 1.2 multiplied by 10 -4 Pa. Then depositing under the auxiliary process of an ion source Hall source, heating SiO-Cr by adopting a high-energy electron beam at a speedAnd depositing the evaporated SiO-Cr in a nano molecular form to obtain the resin lens containing the SiO-Cr layer. The ion source auxiliary parameters here are: anode voltage: 110V, anode current: 3A, ar flow was 12sccm.
S24: the surface of the resin lens obtained in S23 has the background vacuum degree less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, 50-70 ℃ of temperature in a coating cabin and ion source auxiliary process, high-energy electron beam is adopted to heat SiO 2 At a rate ofSiO after evaporation 2 Deposited in the form of nano-scale molecules to obtain SiO-containing material 2 A resin lens of the layer; the ion source auxiliary parameters are as follows: anode voltage: 110V, anodic electricityFlow: 3A, the auxiliary gas is Ar, and the flow is 10sccm.
S25: repeating the step S22, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S24;
s26: repeating the step S21, and forming a silicon-aluminum composite oxide layer on the surface of the resin lens obtained in the step S25;
s27: repeating the step S22, and forming a titanium-niobium composite oxide layer on the surface of the resin lens obtained in the step S26;
s28: the surface of the resin lens obtained in the step S27 has the background vacuum degree less than or equal to 3 multiplied by 10 -3 Under the conditions of Pa, 50-70 ℃ of temperature in a coating cabin and ion source auxiliary process, heating ITO by adopting high-energy electron beam at a rate ofDepositing the evaporated ITO in a nanoscale molecular form to obtain a resin lens containing an ITO layer;
s29: continuously adopting a vacuum coating process on the surface of the resin lens obtained in the step S28, repeating the process step of the step S21, and forming a layer of resin lens containing the silicon-aluminum composite oxide layer;
S3, preparing a waterproof layer: forming a waterproof layer on the surface of the resin lens obtained in S29: the vacuum coating process is continuously adopted on the surface of the lens obtained in the step S29, and the background vacuum degree is less than or equal to 3 multiplied by 10 -3 Heating the material by high-energy electron beam under the conditions of Pa and 60 ℃ in a coating cabin at a rate ofEvaporating the mixture to obtain a mixture containing C 12 F 27 And (3) depositing the N waterproof material on the surface of the resin lens obtained in the step (S24) in a nano molecular form.
2. Experimental example
1. The main examples and comparative example bill of materials are as follows, examples 1 to 3, comparative example 2 and comparative example 4 are 9-layer antireflection film layer structures, and comparative example 1 and comparative example 3 are 8-layer antireflection film systems.
TABLE 1
| Substrate sheet | High refractive index material | Low refractive index material | TaN thickness | Thickness of SiO-Cr | |
| Example 1 | MR-8UV400 | 80％TiO 2 +20％Nb 2 O 5 | 92％SiO 2 +8％Al 2 O 3 | 0.8nm | 7nm |
| Example 2 | SK1.56UV400 | 80％TiO 2 +20％Nb 2 O 5 | 92％SiO 2 +8％Al 2 O 3 | 0.8nm | 7nm |
| Example 3 | MR-7UV400 | 80％TiO 2 +20％Nb 2 O 5 | 92％SiO 2 +8％Al 2 O 3 | 0.8nm | 7nm |
| Comparative example 1 | MR-8UV400 | 80％TiO 2 +20％Nb 2 O 5 | 92％SiO 2 +8％Al 2 O 3 | / | 9nm |
| Comparative example 2 | MR-8UV400 | 80％TiO 2 +20％Nb 2 O 5 | 92％SiO 2 +8％Al 2 O 3 | 1.5nm | 5.5nm |
| Comparative example 3 | MR-8UV405 | ZrO 2 | SiO 2 | / | / |
| Comparative example 4 | MR-8UV405 | 80％TiO 2 +20％Nb 2 O 5 | 92％SiO 2 +8％Al 2 O 3 | / | 1.2nm |
2. Measuring optical effects such as peak reflectance, average reflectance, blue light and yellow index of lens
(1) Determination of average and peak reflectivities, blue light prevention national Standard and yellow index for examples 1 to 3 and comparative examples 1 to 4
The average reflectances (average reflectances: mean visual average reflectances under illumination with C light (light source of color temperature 6774K defined in CIE), referred to herein as single-sided reflectances, and peak visible light reflectances (mean highest reflectances of single-sided at 00-700 nm) of the lenses prepared in examples 1-3 and comparative examples 1-4 were measured and are reported in Table 2 below.
The lenses prepared in examples 1 to 3 and comparative examples 1 to 4 were measured for arithmetic average transmittance of main harmful blue light (415 to 445 nm) with reference to the requirements of blue light protective film in new blue light protection national standard QBT-38120-2019, and for transmission yellow index (national standard required average transmittance of harmful blue light 415 to 445nm is not more than 80%, average transmittance is > 80%, yellow index is < 5.0), and the measurement results are recorded in Table 2 below.
TABLE 2
It can be seen that the film system with the low absorption layer satisfies the blue light prevention effect and particularly has a far lower peak reflectance than the film system without the absorption layer. The common process adopts SiO-Cr as an absorption layer, and can effectively meet the requirement of blue light prevention. But its yellow-green light absorption is lower, resulting in an increase in yellow index. Most weak absorbent materials are of this nature.
The tantalum nitride absorption layer can obviously reduce the yellow index when the overall visible light transmittance is reduced. If the tantalum nitride is thicker, the transmittance is obviously reduced, the lens is grey, and the visual selling point is not good.
3. High temperature resistance, durability and high temperature adhesion experiments
(1) High temperature resistance experiment:
after the samples (examples 1 to 3 and comparative examples 1 to 4) were completed, the samples were tested for temperature resistance after one week of storage. The test method of the high temperature resistance is to refer to the 5.8 clause in the national resin lens temperature resistance standard (GB 10810.4-2012): pass a baking test at 55℃for 30 minutes. The lenses were tested by the same method, each time baked at 5℃for 30 minutes until the lenses failed, such as by cracking or orange peel, and the acceptable maximum temperatures were recorded, and the results are shown in Table 3 below.
(2) Durability experiment:
the photovoltaic industry and the optical communication industry use high temperature and high humidity to evaluate the durability of products. The Test method of the photovoltaic industry Test standard (GB/T18911-2002, IEC61646:1996, item 10.13) and the optical communication industry (Ballcore Test, GR-1221-Core, item 6.2.5) are used for defining the high-temperature and high-humidity resistance Test and debugging of the resin lens as follows: storing for 12 hours at 85 ℃ and 85% humidity, and checking whether the prepared lens has obvious failure phenomena such as film cracking or orange peel and the like; 3 resin lenses placed in different positions were tested each time at high temperature and high humidity. The test results of examples 1 to 3 and comparative examples 1 to 4 are recorded in the following table 3.
(3) High temperature adhesion experiments:
the adhesion test refers to the film adhesion test of the 5.9 th strip in the national standard GB 10810.4-2012. The high temperature film adhesion test refers to the 5.9 th test of national standard GB 10810.4-2012 by the Xinwanxin company, the boiling condition is changed to 90+/-2 ℃ for 60 minutes, and other test methods are the same. Adhesion and high temperature adhesion test results: grade A means that the film is not removed or the film removing area is less than 5%, grade B means that the film removing area is between 5% and 15%, and grade C (unqualified) means that the film removing area is obviously more than 15%. To verify the product adhesion distribution, high temperature adhesion tests were performed from 5 different positions in the coating chamber. The test results of examples 1 to 3 and comparative examples 1 to 4 are recorded in the following table 3.
(4) Steel wool experiment:
the steel wool experiment method is tested by referring to the steel wool test method in the 5 th strip of national standard GB 10810.5-2012. The hardness of the lenses was characterized by the observation of significant haze after rubbing with 000# 0000# steel wool. Generally, the substrate hardness of UV400 is greater than the substrate hardness of UV 410. The test results of examples 1 to 3 and comparative examples 1 to 4 are recorded in the following table 3.
TABLE 3 Table 3
Conclusion:
(1) Ultralow adverse effects: examples 1-3 all have lower average reflectance of visible light of 0.2-0.28%, and lower peak reflectance of 1.5-2.2%; while comparative example 3 did not achieve the above technical effect, i.e., the effect of ultra low reflection.
(2) The embodiments 1 to 3 can effectively cut off harmful blue light and transmit beneficial blue light, and the yellow index is as low as 3% to realize the clear effect of the lens while meeting the national blue light prevention standard; while comparative examples 1,3, and 4 meet the national blue light prevention standard, but have a higher yellow index, and do not achieve the visual effect of excellent clear lenses. Comparative example 2, although having a low yellowness index, had a too low transmittance and the lenses were visibly grayed out.
(3) Under the condition that other conditions are unchanged, the high-temperature resistance, high-temperature adhesive force and durability of the titanium-niobium composite oxide adopted by the high-refractive-index material of the lens are better than those of other conventional materials; the high temperature resistance, high temperature adhesive force and durability of the low refractive index material adopting the silicon-aluminum composite oxide are better than those of other conventional materials; the film system and the proper process thereof are prepared by adopting the two materials with specific proportions so as to ensure the high temperature resistance and durability of the ultra-low-reflection clear-background blue light prevention product.
(4) The hardness of the substrate using UV400 was greater and was able to pass the 000# steel wool test. Whereas the UV405 substrate can only pass the 0000# steel wool test.
Claims (5)
1. A weak absorption low-reflection blue-light-resistant resin lens, comprising: a resin lens substrate, a hardening layer and a weak absorption low-reflection bottom color blue light prevention film layer; the resin lens comprises a resin lens substrate, a hardening layer and a weak absorption low-reflection clear background color blue light prevention film layer, wherein the resin lens substrate, the hardening layer and the weak absorption low-reflection clear background color blue light prevention film layer are sequentially arranged, the hardening layer is positioned on the surface of the resin lens substrate, and the weak absorption low-reflection clear background color blue light prevention film layer is positioned on the surface of the hardening layer; the weak absorption low-reflection bottom color blue light prevention resin lens further comprises a waterproof layer, wherein the waterproof layer is positioned on the surface of the weak absorption low-reflection bottom color blue light prevention film layer, and the thickness of the waterproof layer is 4-20 nm;
the UV cutoff wavelength of the resin lens substrate is 399-402 nm;
the main material component of the hardening layer is organic silicon, and the thickness of the hardening layer is 1-5 mu m;
the thickness of the weak absorption low-reflection bottom color blue light prevention film layer is 150-500 nm, and the weak absorption low-reflection bottom color blue light prevention film layer comprises three silicon-aluminum composite oxide layers, two titanium-niobium composite oxide layers, a TaN layer, a silicon-chromium absorption layer and a SiO layer 2 A layer and an ITO layer;
wherein the thickness of the first silicon-aluminum composite oxide layer is 5-30 nm;
the thickness of the second TaN layer is 0.6-0.9 nm;
the thickness of the third silicon chromium absorption layer is 6-8.5 nm;
the fourth layer of SiO 2 The thickness of the layer is 8-15 nm;
the thickness of the fifth titanium-niobium composite oxide layer is 18-25 nm;
the thickness of the sixth silicon-aluminum composite oxide layer is 20-30 nm;
the thickness of the seventh titanium-niobium composite oxide layer is 100-112 nm;
the thickness of the eighth ITO layer is 4-5 nm;
the thickness of the ninth silicon-aluminum composite oxide layer is 70-95 nm.
2. The low-absorption low-reflection, low-clear primer blue-light-preventing resin lens according to claim 1, wherein the average reflectance of the low-absorption, low-reflection, low-clear primer blue-light-preventing resin lens is 0.3% or less.
3. The weak absorption low reflection primer blue light preventing resin lens according to claim 1, wherein the peak reflectance of the weak absorption low reflection primer blue light preventing resin lens at a visible light wave band of 400-700 nm is less than or equal to 2.2%.
4. The low-reflectance low-back-color blue-light-preventing resin lens according to claim 1, wherein the reflection color coordinate H value of the low-reflectance low-back-color blue-light-preventing resin lens is 270 to 295 and the C value is 12 to 25.
5. The low-absorption low-reflection, low-clear primer blue-light-preventing resin lens according to claim 1, wherein the low-absorption, low-reflection, low-clear primer blue-light-preventing resin lens has a yellowness index of 3.5% or less.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2024138918A1 (en) * | 2022-12-30 | 2024-07-04 | 江苏万新光学有限公司 | Weak-absorption, low-reflection, clear-base-color and anti-blue-light resin lens and preparation method therefor |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2024138918A1 (en) * | 2022-12-30 | 2024-07-04 | 江苏万新光学有限公司 | Weak-absorption, low-reflection, clear-base-color and anti-blue-light resin lens and preparation method therefor |
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