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TWI768172B - cutting device - Google Patents

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Publication number
TWI768172B
TWI768172B TW108100368A TW108100368A TWI768172B TW I768172 B TWI768172 B TW I768172B TW 108100368 A TW108100368 A TW 108100368A TW 108100368 A TW108100368 A TW 108100368A TW I768172 B TWI768172 B TW I768172B
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TW
Taiwan
Prior art keywords
cutting
light
blade
cleaning
sliding member
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TW108100368A
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Chinese (zh)
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TW201931453A (en
Inventor
笠井剛史
小野隆之
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日商迪思科股份有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0076Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Dicing (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Confectionery (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Abstract

[課題]得到一種切割裝置,其可簡單地且確實地洗淨對切割刀片進行檢測的刀片檢測組件。 [解決手段]在一邊將工作夾台切割進給一邊以切割組件的切割刀片進行被加工物之切割的切割裝置中,設成:具備洗淨機構,前述洗淨機構具有:收容殼體,收容滑接構件並且具備使滑接構件進出之啟閉自如的開口;定位組件,將滑接構件選擇性地定位到收容於收容殼體內的收容位置、與插入發光部及受光部之間並進行洗淨的洗淨位置;以及滑動組件,使滑接構件與刀片檢測組件相對地滑動,且將滑接構件定位在洗淨位置並藉由滑動組件使其滑動,以使滑接構件對發光部及受光部進行洗淨。[Subject] To obtain a dicing device capable of easily and surely cleaning a blade detection unit that detects a dicing blade. [Solution] In the cutting device for cutting the workpiece with the cutting blade of the cutting unit while cutting and feeding the table, it is provided that a cleaning mechanism is provided, and the cleaning mechanism includes a storage case, a storage case, and a storage case. The sliding member is also provided with an opening that allows the sliding member to enter and exit freely; the positioning component selectively locates the sliding member to the receiving position accommodated in the receiving housing, inserts it between the light-emitting part and the light-receiving part, and washes it. a clean cleaning position; and a sliding assembly for sliding the sliding member and the blade detection assembly relative to each other, and positioning the sliding member at the cleaning position and sliding the sliding member so that the sliding member is responsive to the light-emitting portion and the The light-receiving part is cleaned.

Description

切割裝置cutting device

發明領域 本發明是有關於一種切割裝置。Field of Invention The present invention relates to a cutting device.

發明背景 在對半導體晶圓等的被加工物進行分割加工的切割裝置等的精密切割裝置中具備有非接觸式測高感測器,前述非接觸式測高感測器是檢測切割刀片的上下方向(Z方向)位置來對切割刀片的磨耗進行檢測。非接觸式測高感測器是形成為具備發光部及受光部,並將切割刀片的周緣部配置在該發光部與受光部之間,以依據在受光部的受光狀態來檢測切割刀片的磨耗。Background of the Invention Precision dicing devices such as dicing devices that divide and process workpieces such as semiconductor wafers are provided with a non-contact height sensor that detects the vertical direction of the dicing blade ( Z direction) position to detect the wear of the cutting blade. The non-contact height sensor is formed with a light-emitting part and a light-receiving part, and the peripheral edge of the cutting blade is arranged between the light-emitting part and the light-receiving part, so as to detect the wear of the cutting blade according to the light-receiving state of the light-receiving part .

藉由以切割刀片對被加工物進行切割而產生的切割屑會被攝入切割液,並且伴隨著切割刀片的高速旋轉而飛散到周圍。若包含此切割屑的切割液附著在非接觸式測高感測器而將發光部或受光部污染時,因為會使發光量或受光量降低,所以會使正確的切割刀片的檢測變得不可行。The cutting chips generated by cutting the workpiece with the cutting blade are absorbed into the cutting liquid, and are scattered around with the high-speed rotation of the cutting blade. If the cutting liquid containing the cutting dust adheres to the non-contact height measuring sensor and contaminates the light-emitting part or the light-receiving part, the light-emitting amount or the light-receiving amount will decrease, so that it becomes impossible to detect the correct cutting blade. Row.

作為其對策,已提出有下述的切割裝置:具備有對非接觸式測高感測器的發光部或受光部供給洗淨水及空氣的噴嘴之切割裝置(參照例如專利文獻1)、或者以裝設在主軸的洗淨刷將發光部或受光部的髒污去除之切割裝置(參照例如專利文獻2)。 先前技術文獻 專利文獻As a countermeasure for this, a cutting device including a nozzle for supplying washing water and air to a light-emitting portion or a light-receiving portion of a non-contact height sensor has been proposed (see, for example, Patent Document 1), or A dicing device that removes contamination from a light-emitting portion or a light-receiving portion with a cleaning brush attached to a spindle (see, for example, Patent Document 2). prior art literature Patent Literature

專利文獻1:日本專利特開2001-298001號公報 專利文獻2:日本專利特開2014-78544號公報Patent Document 1: Japanese Patent Laid-Open No. 2001-298001 Patent Document 2: Japanese Patent Laid-Open No. 2014-78544

發明概要 發明欲解決之課題 當附著在發光部或受光部的髒污為大量,並且髒污的附著強固時,會有僅利用如專利文獻1的洗淨水及空氣的供給的話並無法獲得充分的洗淨性的情形。又,專利文獻2之洗淨刷是形成為裝設在旋轉驅動切割刀片的主軸之構造。因此,洗淨作業必須從切割刀片更換為洗淨刷來進行,而具有可以進行洗淨的時間受限的問題。Summary of Invention The problem to be solved by the invention When a large amount of contamination adheres to the light-emitting portion or the light-receiving portion and the adhesion of the contamination is strong, sufficient cleaning performance may not be obtained only by the supply of washing water and air as in Patent Document 1. In addition, the cleaning brush of Patent Document 2 is structured to be attached to the main shaft of the rotary drive of the cutting blade. Therefore, the cleaning operation has to be performed by replacing the cutting blade with the cleaning brush, and there is a problem that the time during which cleaning can be performed is limited.

本發明是有鑒於這樣的問題而作成的發明,其目的在於提供一種切割裝置,前述切割裝置可以在合宜的時間點將對切割刀片進行檢測的刀片檢測組件確實地洗淨。 用以解決課題之手段The present invention has been made in view of such a problem, and an object of the present invention is to provide a dicing device that can surely clean a blade detection unit that detects a dicing blade at a suitable timing. means of solving problems

本發明是有關於一種切割裝置的發明,前述切割裝置是具備:工作夾台,保持被加工物;切割組件,裝設有切割刀片,前述切割刀片具有用於對保持在工作夾台的被加工物進行切割的圓環狀的切割刀刃;切割進給組件,將保持在工作夾台的被加工物朝X軸方向切割進給;以及刀片檢測組件,具有發光部及受光部,前述發光部及受光部是包夾切割刀片的切割刀刃並且互相面對面而配設。特徵在於:設有洗淨機構,前述洗淨機構具有:滑接構件,插入發光部與受光部之間來進行洗淨,其中前述發光部與受光部是面對面來配設於刀片檢測組件中;收容殼體,收容滑接構件並且具備使滑接構件進出之啟閉自如的開口;定位組件,將滑接構件選擇性地定位到收容於收容殼體內的收容位置、與插入發光部及受光部之間並進行洗淨的洗淨位置;以及滑動組件,使滑接構件與刀片檢測組件相對地滑動,且將滑接構件定位在洗淨位置並藉由滑動組件使其滑動,以使滑接構件對發光部及受光部進行洗淨。The present invention relates to a cutting device, wherein the cutting device is provided with: a work chuck for holding a workpiece; a cutting assembly, which is provided with a cutting blade, and the cutting blade is used for cutting the workpiece held on the work chuck. A ring-shaped cutting blade for cutting objects; a cutting feed assembly, which cuts and feeds the workpiece held on the work chuck in the X-axis direction; and a blade detection assembly, which has a light-emitting part and a light-receiving part, the light-emitting part and the The light-receiving parts are arranged to face each other by sandwiching the cutting edge of the cutting blade. It is characterized in that: a cleaning mechanism is provided, and the cleaning mechanism has: a sliding member inserted between the light-emitting portion and the light-receiving portion for cleaning, wherein the light-emitting portion and the light-receiving portion are arranged in the blade detection assembly facing each other; The accommodating case accommodates the sliding member and is provided with an opening that allows the sliding member to enter and exit; the positioning assembly selectively locates the sliding member to the accommodating position accommodated in the accommodating casing, and inserts the light-emitting part and the light-receiving part A cleaning position for cleaning between them; and a sliding assembly for sliding the sliding contact member and the blade detection assembly relative to each other, and positioning the sliding contact member at the cleaning position and sliding it by the sliding component, so as to make the sliding contact The member cleans the light-emitting portion and the light-receiving portion.

根據以上的切割裝置,因為藉由相對於刀片檢測組件相對地滑動的滑接構件來進行發光部及受光部的洗淨,所以可以獲得優異的洗淨效果。因為將滑接構件配置成可相對於與切割組件不同地另外設置的收容殼體進出,所以可以在不變更切割組件的構成的情形下,在任意的時間點進行洗淨。According to the above dicing device, since the light-emitting portion and the light-receiving portion are cleaned by the sliding member that slides relative to the blade detection unit, an excellent cleaning effect can be obtained. Since the sliding member is arranged so as to be movable in and out of the housing case provided separately from the cutting unit, cleaning can be performed at an arbitrary timing without changing the configuration of the cutting unit.

可以將刀片檢測組件配設在切割進給組件,並將切割進給組件作為滑動組件來使用。在此形態中,是將滑接構件定位在洗淨位置並藉由切割進給組件使刀片檢測組件朝X軸方向滑動,藉此使滑接構件對發光部及受光部進行洗淨。由於使用於對工作夾台進行切割進給的切割進給組件在洗淨時作為滑動組件而發揮功能,因此可以簡化洗淨機構的構成。 發明效果The blade detection unit may be arranged on the cutting feed unit, and the cutting feed unit may be used as a sliding unit. In this embodiment, the sliding member is positioned at the cleaning position, and the blade detection member is slid in the X-axis direction by the cutting feed member, thereby cleaning the light-emitting portion and the light-receiving portion by the sliding member. Since the cutting and feeding unit for cutting and feeding the work chuck functions as a sliding unit during cleaning, the configuration of the cleaning mechanism can be simplified. Invention effect

如以上,依據本發明的切割裝置,變得可以在合宜的時間點將對切割刀片進行檢測的刀片檢測組件確實地洗淨。As described above, according to the dicing device of the present invention, it becomes possible to surely clean the blade detection unit that detects the dicing blade at a suitable timing.

用以實施發明之形態 以下,參照附加圖式,說明本實施形態的切割裝置。圖1是顯示本實施形態之切割裝置整體的立體圖,圖2至圖8是顯示切割裝置的一部分之圖。在各圖式中,是將切割裝置中的切割進給方向設為X軸方向來表示,將相對於切割進給方向垂直的分度進給(分度移動進給)方向設為Y軸方向來表示,將相對於切割進給方向及分度進給方向垂直的切入方向(上下方向)設為Z軸方向來表示。Form for carrying out the invention Hereinafter, the cutting device of the present embodiment will be described with reference to the attached drawings. FIG. 1 is a perspective view showing the whole of the cutting device according to the present embodiment, and FIGS. 2 to 8 are views showing a part of the cutting device. In each drawing, the cutting feed direction in the cutting device is shown as the X-axis direction, and the index feed (index movement feed) direction perpendicular to the cutting feed direction is the Y-axis direction. It is shown by assuming that the cutting direction (up and down direction) perpendicular to the cutting feed direction and the indexing feed direction is the Z-axis direction.

圖1所示之切割裝置10是對被加工物即晶圓W(參照圖2)進行切割加工的裝置。如圖2所示,在晶圓W的正面上形成有格子狀的分割預定線,在以分割預定線所區劃的各區域中形成有半導體晶片等的器件。晶圓W是以透過貼附於背面的切割膠帶T而被環狀的環形框架F所支撐的狀態搬送至切割裝置10。The dicing apparatus 10 shown in FIG. 1 is an apparatus for dicing a wafer W (see FIG. 2 ) that is a workpiece. As shown in FIG. 2 , on the front surface of the wafer W, grid-shaped planned dividing lines are formed, and devices such as semiconductor wafers are formed in each region defined by the planned dividing lines. The wafer W is conveyed to the dicing apparatus 10 in a state supported by the ring-shaped ring frame F through the dicing tape T attached to the back surface.

在切割裝置10的基台11的上表面是將開口12形成為朝向X軸方向延伸。開口12是被可和工作夾台13一起朝X軸方向移動的X軸工作台14及蛇腹狀的防水蓋15所覆蓋。在圖2中是省略防水蓋15的圖示。An opening 12 is formed on the upper surface of the base 11 of the cutting device 10 so as to extend in the X-axis direction. The opening 12 is covered by the X-axis table 14 that can move in the X-axis direction together with the work clamp table 13 and the accordion-shaped waterproof cover 15 . In FIG. 2, the illustration of the waterproof cover 15 is abbreviate|omitted.

如圖2所示,在開口12內設有將工作夾台13朝X軸方向切割進給的切割進給組件16。切割進給組件16具有配置在基台11上並且朝X軸方向延伸之一對X軸導軌17、可相對於各X軸導軌17在X軸方向上滑動地被支撐的X軸工作台14、以及位於一對X軸導軌17之間並且朝X軸方向延伸的滾珠螺桿18。滾珠螺桿18可藉由設置在端部的馬達19而以X軸方向的軸為中心來旋轉。X軸工作台14具有滾珠螺桿18螺合的螺帽(圖示省略)。當藉由馬達19使滾珠螺桿18旋轉時,會使X軸工作台14朝X軸方向移動。As shown in FIG. 2 , a cutting and feeding unit 16 for cutting and feeding the work chuck 13 in the X-axis direction is provided in the opening 12 . The cutting and feeding unit 16 includes a pair of X-axis guide rails 17 arranged on the base 11 and extending in the X-axis direction, an X-axis table 14 supported slidably in the X-axis direction with respect to each X-axis guide rail 17, and a ball screw 18 located between a pair of X-axis guide rails 17 and extending in the X-axis direction. The ball screw 18 is rotatable around an axis in the X-axis direction by a motor 19 provided at the end. The X-axis table 14 has a nut (not shown) to which the ball screw 18 is screwed. When the ball screw 18 is rotated by the motor 19, the X-axis table 14 is moved in the X-axis direction.

在X軸工作台14上,是透過θ工作台20將工作夾台13以可繞著Z軸方向的軸且可旋轉的方式支撐。工作夾台13是在上表面側具備有藉由多孔質陶瓷材所形成的保持面21,並且可以藉由吸引源(圖示省略)對保持面21帶來負壓。藉由此負壓,可夾著切割膠帶T而將晶圓W吸引保持在保持面21。於工作夾台13的周圍設有4個夾具22,可藉由各夾具22來夾持固定晶圓W周圍的環形框架F。On the X-axis table 14, the work chuck 13 is rotatably supported around the axis in the Z-axis direction through the θ table 20. FIG. The table 13 is provided with a holding surface 21 formed of a porous ceramic material on the upper surface side, and a negative pressure can be applied to the holding surface 21 by a suction source (not shown). By this negative pressure, the wafer W can be sucked and held on the holding surface 21 with the dicing tape T sandwiched therebetween. Four clamps 22 are provided around the work chuck 13 , and the ring frame F around the wafer W can be clamped and fixed by each clamp 22 .

如圖1所示,於基台11的上表面設有門型的柱部25,前述柱部25是以跨越往X軸方向的工作夾台13及X軸工作台14的移動路徑的方式豎立設置。在柱部25上設有將切割組件30朝Y軸方向分度進給的分度進給組件31、及將切割組件30朝Z軸方向切入進給的切入進給組件32。As shown in FIG. 1 , a portal-shaped column portion 25 is provided on the upper surface of the base 11, and the column portion 25 is erected so as to span the movement paths of the table 13 and the X-axis table 14 in the X-axis direction. set up. The column portion 25 is provided with an indexing feed unit 31 for indexing and feeding the cutting unit 30 in the Y-axis direction, and a cutting feed unit 32 for cutting and feeding the cutting unit 30 in the Z-axis direction.

分度進給組件31具有配置在柱部25的前表面並且朝Y軸方向延伸之一對Y軸導軌33、可滑動地支撐在各Y軸導軌33的Y軸工作台34、及位於一對Y軸導軌33之間並且朝Y軸方向延伸的滾珠螺桿35。滾珠螺桿35可藉由設置在端部的馬達(在圖1中是位於Y軸工作台34的背後而未顯示)而以Y軸方向的軸為中心來旋轉。Y軸工作台34具有滾珠螺桿35螺合的螺帽(圖示省略),當藉由馬達旋轉驅動滾珠螺桿35時,會使Y軸工作台34沿著Y軸導軌33朝Y軸方向移動。The indexing feed unit 31 includes a pair of Y-axis guide rails 33 arranged on the front surface of the column portion 25 and extending in the Y-axis direction, a Y-axis table 34 slidably supported on each Y-axis guide rail 33, and a pair of Y-axis guide rails 34 . A ball screw 35 between the Y-axis guide rails 33 and extending in the Y-axis direction. The ball screw 35 is rotatable around the axis of the Y-axis direction by a motor provided at the end (it is located behind the Y-axis table 34 in FIG. 1 and not shown). The Y-axis table 34 has a nut (not shown) to which the ball screw 35 is screwed. When the ball screw 35 is driven to rotate by a motor, the Y-axis table 34 is moved in the Y-axis direction along the Y-axis guide 33 .

切入進給組件32具有配置在Y軸工作台34上並且朝Z軸方向延伸的一對Z軸導軌36、可滑動地支撐在各Z軸導軌36的Z軸工作台37、及位於一對的Z軸導軌36之間並且朝Z軸方向延伸的滾珠螺桿38。滾珠螺桿38可藉由設置在端部的馬達39而以Z軸方向的軸為中心來旋轉。Z軸工作台37具有滾珠螺桿38螺合的螺帽(圖示省略),當藉由馬達39旋轉驅動滾珠螺桿38時,會使Z軸工作台37沿著Z軸導軌36朝Z軸方向移動。The plunge feed unit 32 includes a pair of Z-axis guide rails 36 arranged on the Y-axis table 34 and extending in the Z-axis direction, a Z-axis table 37 slidably supported on each Z-axis guide rail 36, and a pair of Z-axis guide rails 37 . A ball screw 38 between the Z-axis guide rails 36 and extending in the Z-axis direction. The ball screw 38 is rotatable around an axis in the Z-axis direction by a motor 39 provided at the end. The Z-axis table 37 has a nut (not shown) to which the ball screw 38 is screwed, and when the ball screw 38 is rotated and driven by the motor 39 , the Z-axis table 37 is moved in the Z-axis direction along the Z-axis guide rail 36 .

如圖5及圖6所示,切割組件30是將切割刀片41裝設在主軸40而構成,前述主軸40是以朝向Y軸方向的軸心40x為中心來旋轉。切割刀片41是沿著相對於主軸40的軸心40x垂直的平面而配置,並且在周緣部具有以軸心40x為中心之圓環狀的切割刀刃。藉由相對於保持在工作夾台13的晶圓W一邊以軸心40x為中心來旋轉切割刀片41一邊使切割刀刃切入,以進行切割。藉由合宜地進行由切割進給組件16所進行的工作夾台13(X軸工作台14)的X軸方向的移動(切割進給)、由分度進給組件31所進行的切割組件30(Y軸工作台34)的Y軸方向的移動(分度進給)、以及由切入進給組件32所進行的切割組件30(Z軸工作台37)的Z軸方向的移動(切入進給),可以實施沿著晶圓W之正面上的分割預定線的切割加工。As shown in FIGS. 5 and 6 , the cutting unit 30 is configured by attaching a cutting blade 41 to a main shaft 40 that rotates around an axis 40x in the Y-axis direction. The cutting blade 41 is arranged along a plane perpendicular to the axis 40x of the main shaft 40, and has an annular cutting edge with the axis 40x as the center at the peripheral edge. Dicing is performed by cutting the dicing blade 41 with respect to the wafer W held on the table 13 while rotating the dicing blade 41 about the axis 40x. The cutting unit 30 by the indexing feeding unit 31 is appropriately moved (cutting feeding) in the X-axis direction of the table 13 (X-axis table 14 ) by the cutting feeding unit 16 . Movement in the Y-axis direction of the (Y-axis table 34 ) (indexing feed), and movement in the Z-axis direction of the cutting unit 30 (Z-axis table 37 ) by the plunging feed unit 32 (plunging feed unit 32 ) ), a dicing process along the dividing line on the front surface of the wafer W can be performed.

更詳細地說,是一邊將切割刀片41對切割對象的分割預定線進行對位而使旋轉的切割刀片41的切割刀刃切入晶圓W,一邊藉由切割進給組件16將工作夾台13朝X軸方向切割進給,藉此來進行切割。若完成1條切割線的切割後,即可使切入進給組件32動作而將切割組件30朝上方拉起,之後藉由分度進給組件31使切割組件30朝Y軸方向移動,而讓切割刀片41對下一條分割預定線進行對位,並同樣地進行切割。若在Y軸方向上排列之全部的分割預定線的切割完成後,使工作夾台13旋轉90度,以設成使未切割的分割預定線在Y軸方向上排列,並對未切割的分割預定線同樣地進行切割。若全部的分割預定線的切割完成後,即可使切割進給組件16動作,以使工作夾台13在X軸方向上朝比切割組件30更近前側(圖5中的右側)移動,並定位成可將加工後的晶圓W從切割裝置10搬出。More specifically, the table 13 is moved toward the wafer W by the dicing feed unit 16 while aligning the dicing blade 41 with the planned dividing line of the dicing target and cutting the dicing edge of the rotating dicing blade 41 into the wafer W. The cutting feed in the X-axis direction is used for cutting. After the cutting of one cutting line is completed, the cutting and feeding assembly 32 can be actuated to pull the cutting assembly 30 upward, and then the indexing and feeding assembly 31 is used to move the cutting assembly 30 in the Y-axis direction, so that the The cutting blade 41 aligns the next planned dividing line, and similarly cuts. After the cutting of all the planned dividing lines arranged in the Y-axis direction is completed, the table 13 is rotated 90 degrees so that the uncut planned dividing lines are aligned in the Y-axis direction, and the uncut dividing lines are arranged in the Y-axis direction. The predetermined line is similarly cut. After the cutting of all the planned dividing lines is completed, the cutting and feeding assembly 16 can be actuated, so that the work clamp table 13 is moved closer to the front side (the right side in FIG. 5 ) than the cutting assembly 30 in the X-axis direction, and It is positioned so that the processed wafer W can be carried out from the dicing apparatus 10 .

切割裝置10具備有整合控制各部的控制組件45(參照圖1)。控制組件45是依據由操作切割裝置10之操作人員所輸入的各種指示,來控制工作夾台13或切割組件30等的動作。控制組件45是藉由使切割裝置10的各構成要件動作的處理器或記憶體等所構成。The cutting device 10 includes a control unit 45 (see FIG. 1 ) that integrally controls each part. The control unit 45 controls the actions of the work table 13 or the cutting unit 30 according to various instructions input by the operator who operates the cutting device 10 . The control unit 45 is constituted by a processor, a memory, or the like for operating each component of the cutting device 10 .

切割裝置10具備刀片檢測組件50來作為非接觸式測高感測器,前述非接觸式測高感測器是對與切割組件30中的切割刀片41的磨耗相應之切入方向(Z軸方向)的基準位置進行檢測的感測器。如圖3及圖4所示,刀片檢測組件50在支撐於X軸工作台14上的支撐腳部51的前端附近具有基部52,且在Y軸方向上隔開且面對面的相向部53及相向部54為突出於基部52上。在相向部53內配置有發光部55,在相向部54內配置有受光部56。在相向部53與相向部54之間形成有切割刀片41的周緣部可進入的溝部57。在相向部53上,是在朝向溝部57之側的面(與相向部54相向之側的面)上形成有發光部55中的投光窗。在相向部54上,是在朝向溝部57之側的面(與相向部53相向之側的面)上形成有受光部56中的受光窗。將圖示省略之光源所發出的光為通過光纖等而被導向發光部55,並且從投光窗朝向受光部56投光。來自發光部55之光是進入受光部56的受光窗並以受光元件進行光電轉換,而輸出相應於受光量的電壓。The cutting device 10 is provided with a blade detection assembly 50 as a non-contact height-measuring sensor, and the aforementioned non-contact height-measuring sensor measures the cutting direction (Z-axis direction) corresponding to the wear of the cutting blade 41 in the cutting assembly 30 The sensor that detects the reference position. As shown in FIGS. 3 and 4 , the blade detection unit 50 has a base portion 52 near the front end of the support leg portion 51 supported on the X-axis table 14 , and an opposing portion 53 and an opposing portion that are spaced apart in the Y-axis direction and face each other. The portion 54 protrudes from the base portion 52 . The light-emitting portion 55 is arranged in the facing portion 53 , and the light-receiving portion 56 is arranged in the facing portion 54 . A groove portion 57 into which the peripheral edge portion of the cutting blade 41 can enter is formed between the facing portion 53 and the facing portion 54 . In the facing portion 53, a light projection window in the light emitting portion 55 is formed on the surface facing the groove portion 57 side (the surface facing the facing portion 54). In the facing portion 54 , a light receiving window in the light receiving portion 56 is formed on the surface facing the groove portion 57 side (the surface facing the facing portion 53 ). The light emitted from the light source (not shown) is guided to the light-emitting portion 55 through an optical fiber or the like, and is projected from the light-projecting window toward the light-receiving portion 56 . The light from the light-emitting portion 55 enters the light-receiving window of the light-receiving portion 56, is photoelectrically converted by the light-receiving element, and outputs a voltage corresponding to the light-receiving amount.

藉由刀片檢測組件50進行切割刀片41的檢測之時,是使切割刀片41的切割刀刃相對於溝部57從上方進入。當切割刀片41位在未遮住來自發光部55所發出之光的位置時,在受光部56所接收的光量成為最大。若切割刀片41下降而使得藉由該切割刀片41所遮住的光量逐漸地增加時,會使在受光部56所接收的光量減少而使輸出電壓降低。藉由參照此輸出電壓,可以對切割刀片41的切割刀刃的磨耗狀態或切入方向的基準位置進行檢測。例如,將切割刀片41的周緣部接觸於工作夾台13的保持面21的位置上的刀片檢測組件50的輸出電壓設定作為基準電壓,並且將此基準電壓輸入控制組件45的儲存部。並且,在安裝時,可以藉由一邊使成為對象的切割刀片41下降一邊比較刀片檢測組件50的輸出電壓與基準電壓,而決定切割刀片41的基準位置。When the cutting blade 41 is detected by the blade detection unit 50 , the cutting edge of the cutting blade 41 is caused to enter from above with respect to the groove portion 57 . When the cutting blade 41 is positioned at a position where the light emitted from the light-emitting portion 55 is not blocked, the amount of light received by the light-receiving portion 56 is maximized. When the cutting blade 41 is lowered and the amount of light blocked by the cutting blade 41 is gradually increased, the amount of light received by the light receiving unit 56 is decreased, and the output voltage is lowered. By referring to this output voltage, the wear state of the cutting edge of the cutting blade 41 or the reference position in the cutting direction can be detected. For example, the output voltage of the blade detection unit 50 at the position where the peripheral edge of the cutting blade 41 is in contact with the holding surface 21 of the table 13 is set as the reference voltage, and the reference voltage is input to the storage unit of the control unit 45 . In addition, at the time of mounting, the reference position of the dicing blade 41 can be determined by comparing the output voltage of the blade detection unit 50 with the reference voltage while lowering the dicing blade 41 to be the target.

在刀片檢測組件50的基部52上進一步設有二個洗淨水噴嘴60、61及二個空氣噴嘴62、63,前述二個洗淨水噴嘴60、61是用以噴射從洗淨水供給源(圖示省略)所輸送的洗淨水,前述二個空氣噴嘴62、63是用以噴射從壓縮空氣供給源(圖示省略)所輸送的空氣。洗淨水噴嘴60及空氣噴嘴62分別將開口朝向發光部55的投光窗,且洗淨水噴嘴61及空氣噴嘴63分別將開口朝向受光部56的受光窗。可以從洗淨水噴嘴60對發光部55的投光窗供給洗淨水,並藉由從空氣噴嘴62所噴附的空氣來將已附著在該投光窗的水滴等吹走。同樣地,可以從洗淨水噴嘴61對受光部56的受光窗供給洗淨水,並藉由從空氣噴嘴63所噴附的空氣將已附著在該受光窗的水滴等吹走。The base 52 of the blade detection assembly 50 is further provided with two washing water nozzles 60, 61 and two air nozzles 62, 63, and the two washing water nozzles 60, 61 are used for spraying from the washing water supply source (illustration omitted) to deliver the washing water, the aforementioned two air nozzles 62 and 63 are used for jetting air delivered from a compressed air supply source (illustration omitted). The washing water nozzle 60 and the air nozzle 62 respectively face the light projection window of the light emitting unit 55 , and the washing water nozzle 61 and the air nozzle 63 face the light receiving window of the light receiving unit 56 , respectively. The washing water can be supplied from the washing water nozzle 60 to the light projection window of the light emitting unit 55 , and the water droplets and the like attached to the light projection window can be blown away by the air sprayed from the air nozzle 62 . Similarly, washing water can be supplied to the light receiving window of the light receiving unit 56 from the washing water nozzle 61 , and water droplets and the like that have adhered to the light receiving window can be blown away by the air sprayed from the air nozzle 63 .

刀片檢測組件50具備有可啟閉的防護罩65。防護罩65具有可從上方覆蓋基部52的箱形形狀,並且以配置在基部52的側部之朝X軸方向延伸的鉸鏈銷66為軸而可旋動地被支撐。圖1及圖2是顯示防護罩65已關閉的狀態。在此狀態下,基部52上的相向部53(發光部55)及相向部54(受光部56)、溝部57、洗淨水噴嘴60及61、空氣噴嘴62及63之各要件為全部被防護罩65從上方所覆蓋。圖3及圖4是顯示藉由以鉸鏈銷66為軸的旋動而將防護罩65開啟的狀態。在此狀態下會露出基部52上的上述各要件。在如對晶圓W之切割加工的進行中,在不使用刀片檢測組件50時,會關閉防護罩65。在藉由刀片檢測組件50對切割刀片41的切入方向(Z軸方向)的基準位置進行檢測之時,是將防護罩65開啟。The blade detection unit 50 is provided with an openable and closable protective cover 65 . The shield 65 has a box shape that can cover the base 52 from above, and is rotatably supported around a hinge pin 66 arranged on the side of the base 52 and extending in the X-axis direction. 1 and 2 show a state in which the protective cover 65 is closed. In this state, the opposing portion 53 (light-emitting portion 55 ) and opposing portion 54 (light-receiving portion 56 ), the groove portion 57 , the washing water nozzles 60 and 61 , and the air nozzles 62 and 63 on the base portion 52 are all protected. The cover 65 is covered from above. 3 and 4 show a state in which the protective cover 65 is opened by the rotation of the hinge pin 66 as an axis. In this state, the above elements on the base portion 52 are exposed. During the dicing process such as the wafer W, when the blade inspection unit 50 is not in use, the protective cover 65 is closed. When the reference position in the cutting direction (Z-axis direction) of the cutting blade 41 is detected by the blade detection unit 50, the guard 65 is opened.

在以切割組件30切割晶圓W之時,是從設置在切割組件30的切割液供給噴嘴朝向切割刀片41及其周圍供給切割液。藉由切割所產生的切割屑(污染物)會被攝入切割液,且包含切割屑的切割液會藉由高速旋轉的主軸40或切割刀片41而朝周圍飛散。當這樣形成的切割屑及切割液附著在刀片檢測組件50而污染發光部55或受光部56時,會使來自發光部55的發光量或在受光部56的受光量降低,恐有對切割刀片41的位置檢測精度造成影響之虞。When the wafer W is diced by the dicing unit 30 , the dicing fluid is supplied from the dicing fluid supply nozzle provided in the dicing unit 30 toward the dicing blade 41 and its surroundings. Cutting chips (contaminants) generated by cutting are absorbed into the cutting liquid, and the cutting liquid containing the cutting chips is scattered around by the spindle 40 or the cutting blade 41 rotating at a high speed. When the cutting debris and cutting liquid formed in this way adhere to the blade detection unit 50 and contaminate the light-emitting portion 55 or the light-receiving portion 56, the amount of light emitted from the light-emitting portion 55 or the amount of light received by the light-receiving portion 56 is reduced, and there is a possibility that the cutting blade may be damaged. The position detection accuracy of 41 may be affected.

在晶圓W的切割時,是如圖1、圖2及圖5所示,將防護罩65關閉,並且可以藉由防護罩65一定程度地防止切割屑或切割液對刀片檢測組件50的發光部55或受光部56的附著。但是,如圖1或圖5所示,在切割裝置10中,會在進行對晶圓W之切割加工的工作夾台13附近的位置配置有刀片檢測組件50,而存在有飛散的切割屑或切割液容易落在刀片檢測組件50的位置關係。又,在切割加工時,切割刀片41是朝圖1的箭頭R方向旋轉,此旋轉方向是在X軸方向中使切割屑或切割液從工作夾台13側朝向刀片檢測組件50側飛濺的方向。因此,僅以防護罩65要從伴隨於切割加工的髒污中完全地防護刀片檢測組件50是困難的。During dicing of the wafer W, as shown in FIG. 1 , FIG. 2 and FIG. 5 , the protective cover 65 is closed, and the protective cover 65 can prevent the dicing chips or dicing liquid from emitting light to the blade detection unit 50 to a certain extent. part 55 or the light-receiving part 56 is attached. However, as shown in FIG. 1 or FIG. 5 , in the dicing apparatus 10 , the blade detection unit 50 is arranged at a position near the table 13 where the dicing process of the wafer W is performed, and there are scattered dicing chips or The cutting liquid easily falls on the positional relationship of the blade detection assembly 50 . In addition, during the cutting process, the cutting blade 41 is rotated in the direction of the arrow R in FIG. 1 , and this rotation direction is the direction in which the cutting chips or cutting liquid are splashed from the side of the table 13 to the side of the blade detection unit 50 in the X-axis direction. . Therefore, it is difficult to completely protect the blade detection assembly 50 from the contamination accompanying the cutting process only by the protective cover 65 .

為了確實地洗淨像這樣的條件下的刀片檢測組件50,切割裝置10除了洗淨水噴嘴60、61及空氣噴嘴62、63之外,更具備有可藉由滑接構件來直接地洗淨發光部55及受光部56的洗淨機構。本實施形態的洗淨機構是藉由洗淨單元70及切割進給組件16所構成。In order to surely clean the blade detection unit 50 under such conditions, the dicing device 10 is equipped with a sliding member that can be directly cleaned in addition to the cleaning water nozzles 60 and 61 and the air nozzles 62 and 63 . A cleaning mechanism for the light-emitting portion 55 and the light-receiving portion 56 . The cleaning mechanism of this embodiment is constituted by the cleaning unit 70 and the cutting and feeding unit 16 .

如圖1及圖2所示,在面向開口12的X軸方向的一端部的位置上,設有從基台11朝上方突出的側壁26。刀片檢測組件50的支撐腳部51是從X軸工作台14朝向側壁26側在X軸方向上延伸設置。在側壁26之中朝向開口12側的側面上設有洗淨單元70(參照圖2)。當如圖5地進行上表面觀看時,洗淨單元70是位於刀片檢測組件50的X軸方向的延長上。As shown in FIGS. 1 and 2 , a side wall 26 protruding upward from the base 11 is provided at a position facing the one end portion in the X-axis direction of the opening 12 . The support leg 51 of the blade detection unit 50 is extended in the X-axis direction from the X-axis table 14 toward the side wall 26 side. A cleaning unit 70 (see FIG. 2 ) is provided on the side surface of the side wall 26 facing the opening 12 side. When viewed from the top as shown in FIG. 5 , the cleaning unit 70 is located on the extension of the blade detection assembly 50 in the X-axis direction.

洗淨單元70具有相對於側壁26而固定之箱型的海綿收容殼體71以及可收容在海綿收容殼體71內之洗淨用的滑接構件即海綿構件72。如圖7及圖8所示,海綿收容殼體71是在下端部具有可使海綿構件72進出的開口71a,並且設有將此開口71a啟閉的啟閉蓋73。啟閉蓋73是以在Y軸方向延伸的鉸鏈銷74為軸旋動來進行相對於開口71a的啟閉動作,並藉由省略圖示的賦與勢能組件(扭力彈簧等)而朝向關閉開口71a的位置(圖7)被賦與勢能。The cleaning unit 70 includes a box-shaped sponge accommodating case 71 fixed to the side wall 26 , and a sponge member 72 , which is a sliding member for cleaning that can be accommodated in the sponge accommodating case 71 . As shown in FIGS. 7 and 8 , the sponge accommodating case 71 has an opening 71a at the lower end portion through which the sponge member 72 can be inserted and withdrawn, and is provided with an opening and closing cover 73 that opens and closes the opening 71a. The opening and closing cover 73 is opened and closed relative to the opening 71a by rotating the hinge pin 74 extending in the Y-axis direction as an axis, and is directed to close the opening by a potential energy imparting element (torsion spring, etc.) not shown in the figure. The position of 71a (Fig. 7) is given potential energy.

海綿收容殼體71內設有海綿定位組件75。海綿定位組件75具備有活塞桿76,前述活塞桿76可相對於固定在海綿收容殼體71內的壓缸管而在Z軸方向上進退,並且可以藉由驅動源的驅動力使往下方之活塞桿76的突出量變化。海綿定位組件75的驅動源可以使用壓縮空氣或致動器等任意的驅動源。The sponge accommodating housing 71 is provided with a sponge positioning assembly 75 . The sponge positioning assembly 75 is provided with a piston rod 76, and the aforementioned piston rod 76 can advance and retreat in the Z-axis direction relative to the cylinder tube fixed in the sponge containing housing 71, and can be driven downward by the driving force of the driving source. The protrusion amount of the piston rod 76 changes. As the drive source of the sponge positioning unit 75, an arbitrary drive source such as compressed air and an actuator can be used.

在活塞桿76的下端裝設有海綿構件72。海綿構件72是由具有柔軟性的材質所構成,並且具有各邊朝X軸方向、Y軸方向及Z軸方向延伸之大致直方體的形狀。海綿構件72具有可一邊被壓縮變形一邊插入相向部53與相向部54之間(即,比溝部57的寬度稍微大)之Y軸方向的寬度。又,海綿構件72具有在X軸方向上比相向部53及相向部54更長的形狀(參照圖3、圖4及圖8)。A sponge member 72 is attached to the lower end of the piston rod 76 . The sponge member 72 is made of a material having flexibility, and has a substantially rectangular parallelepiped shape whose sides extend in the X-axis direction, the Y-axis direction, and the Z-axis direction. The sponge member 72 has a width in the Y-axis direction that can be inserted between the opposing portion 53 and the opposing portion 54 while being compressed and deformed (ie, slightly larger than the width of the groove portion 57 ). Moreover, the sponge member 72 has a shape longer than the opposing part 53 and the opposing part 54 in the X-axis direction (refer FIG. 3, FIG. 4, and FIG. 8).

海綿定位組件75是藉由使活塞桿76在Z軸方向上進退,而將海綿構件72選擇性地定位到收容位置(圖7)及洗淨位置(圖4、圖8)。在收容位置中,是將海綿構件72的整體收容在海綿收容殼體71內,且藉由賦與勢能之力將啟閉蓋73關閉。藉由切割組件30所進行的切割加工中,是將海綿構件72保持在收容位置,而以不讓飛散的切割屑或切割液附著的方式進行保護。The sponge positioning assembly 75 selectively positions the sponge member 72 at the accommodating position ( FIG. 7 ) and the washing position ( FIGS. 4 and 8 ) by advancing and retreating the piston rod 76 in the Z-axis direction. In the accommodating position, the entire sponge member 72 is accommodated in the sponge accommodating housing 71, and the opening and closing cover 73 is closed by imparting a force with potential energy. In the cutting process performed by the cutting unit 30, the sponge member 72 is held in the storage position, and is protected so as not to adhere to scattered cutting chips or cutting liquid.

在洗淨位置中,是使海綿構件72一邊抵抗對啟閉蓋73賦與勢能之力而開啟,一邊朝海棉收容殼體71的下方突出。洗淨位置中的海綿構件72是在Z軸方向中位於與刀片檢測組件50的相向部53及相向部54相同的高度位置,並且在Y軸方向上是位於與相向部53及相向部54之間的溝部57相對應的位置。亦即,在洗淨位置的海綿構件72是位在溝部57的X軸方向的延伸上,且當使刀片檢測組件50與海綿構件72在X軸方向上相對地接近時,可以將海綿構件72插入溝部57內。In the washing position, the sponge member 72 protrudes below the sponge accommodating case 71 while being opened against the force imparted to the opening and closing cover 73 with potential energy. The sponge member 72 in the cleaning position is located at the same height position as the facing portion 53 and the facing portion 54 of the blade detection unit 50 in the Z-axis direction, and is located between the facing portion 53 and the facing portion 54 in the Y-axis direction. The positions corresponding to the grooves 57 between them. That is, the sponge member 72 in the washing position is located on the extension of the groove portion 57 in the X-axis direction, and when the blade detection unit 50 and the sponge member 72 are relatively close to each other in the X-axis direction, the sponge member 72 can be It is inserted into the groove portion 57 .

如圖7及圖8所示,在海綿收容殼體71內具備有水供給部77,前述水供給部77可經常地或者間歇地對位於收容位置的海綿構件72供給水。水供給部77是連接於設置在基台11內的水供給源(圖示省略),並且可以藉由從水供給部77供給水,而不使海綿構件72乾燥並保持適合於洗淨的濕潤狀態。又,也可將因為洗淨而附著在海綿構件72的髒污等,藉由來自水供給部77的水的噴射來洗掉。在海綿收容殼體71的內部形成有排水路(圖示省略),前述排水路即使在啟閉蓋73關閉的狀態下也可進行往外部的水的排出,而讓洗淨海綿構件72的水不滯留在海綿收容殼體71內。As shown in FIGS. 7 and 8 , the sponge housing case 71 is provided with a water supply unit 77 that can supply water to the sponge member 72 located at the storage position constantly or intermittently. The water supply portion 77 is connected to a water supply source (not shown) provided in the base 11, and by supplying water from the water supply portion 77, the sponge member 72 can be kept moist and suitable for cleaning without drying the sponge member 72. state. In addition, the contamination or the like adhering to the sponge member 72 due to washing may be washed away by the jet of water from the water supply unit 77 . A drainage channel (not shown) is formed inside the sponge housing case 71 , and the drainage channel can discharge water to the outside even in the state where the opening and closing cover 73 is closed, and allow the water that washes the sponge member 72 to drain. It does not stay in the sponge accommodating case 71 .

如上述,在藉由切割組件30所進行之晶圓W的切割加工之時,是藉由切割進給組件16使工作夾台13(X軸工作台14)朝X軸方向移動(切割進給)。圖5是顯示切割組件30的主軸40的軸心40x於工作夾台13的保持面21的中心通過的狀態,並且此狀態成為切割進給的動作範圍的中央位置。As described above, when the wafer W is diced by the dicing unit 30 , the table 13 (X-axis table 14 ) is moved in the X-axis direction by the dicing feed unit 16 (dicing feed ). 5 shows a state in which the axis 40x of the main shaft 40 of the cutting unit 30 passes through the center of the holding surface 21 of the table 13, and this state becomes the center position of the motion range of the cutting feed.

在圖5以一點鏈線表示之刀片檢測組件50的第1位置50A及第2位置50B,是假想地表示下述情形:以從上述之中央位置到相當於保持面21之半徑的移動量來使X軸工作台14朝前後移動後的情況下的刀片檢測組件50的X軸方向的位置變化。再者,為了容易觀看,在圖5的第1位置50A及第2位置50B是以將實際的刀片檢測組件50在Y軸方向上錯開位置的狀態來描繪。由於保持在工作夾台13上之晶圓W的直徑不會超過保持面21的直徑,因此為了對晶圓W上之最長的分割預定線進行切割,只要有至少保持面21的直徑量之工作夾台13的切割進給量就足夠。也就是說,在藉由切割裝置10所進行的切割加工時,與工作夾台13一起朝X軸方向移動之刀片檢測組件50的動作範圍,不會超過圖5所示之從第1位置50A至第2位置50B。如圖5所示,刀片檢測組件50即使是在已最朝側壁26側移動之第1位置50A上,仍存在有相對於洗淨單元70在X軸方向上隔開的位置關係。因此,即使在藉由切割組件30所進行的切割加工時將工作夾台13 切割進給,也不會有刀片檢測組件50與洗淨單元70互相干涉之情形。The first position 50A and the second position 50B of the blade detection unit 50 shown by the one-dot chain line in FIG. 5 are hypothetically shown as follows: the movement amount from the above-mentioned central position to the radius corresponding to the holding surface 21 is The position of the blade detection unit 50 in the X-axis direction changes when the X-axis table 14 is moved back and forth. In addition, for easy viewing, the first position 50A and the second position 50B in FIG. 5 are drawn in a state where the actual blade detection unit 50 is shifted in the Y-axis direction. Since the diameter of the wafer W held on the work chuck 13 does not exceed the diameter of the holding surface 21 , in order to cut the longest planned dividing line on the wafer W, a work of at least the diameter of the holding surface 21 is required. The cutting feed amount of the clamping table 13 is sufficient. That is, during the cutting process by the cutting device 10, the movement range of the blade detection unit 50 that moves in the X-axis direction together with the work chuck 13 does not exceed the movement range from the first position 50A shown in FIG. 5 . to 2nd position 50B. As shown in FIG. 5 , even at the first position 50A that has moved most toward the side wall 26, the blade detection unit 50 has a positional relationship with respect to the cleaning unit 70 in the X-axis direction. Therefore, even if the table 13 is cut and fed during the cutting process by the cutting unit 30, the blade detection unit 50 and the cleaning unit 70 do not interfere with each other.

在使用洗淨單元70進行刀片檢測組件50的洗淨時,是藉由切割進給組件16使X軸工作台14比切割加工時的動作範圍(刀片檢測組件50的第1位置50A)更朝側壁26側移動。此時,刀片檢測組件50是如圖3地預先開啓防護罩65而成為露出溝部57的狀態。防護罩65的開放動作可以用手動方式進行,亦可以機械方式執行。When the cleaning unit 70 is used to clean the blade detection unit 50 , the cutting feed unit 16 moves the X-axis table 14 more toward the operating range (the first position 50A of the blade detection unit 50 ) than the operating range during the cutting process (the first position 50A of the blade detection unit 50 ). The side wall 26 side moves. At this time, the blade detection unit 50 is in a state in which the shield 65 is opened in advance and the groove portion 57 is exposed as shown in FIG. 3 . The opening action of the protective cover 65 can be performed manually or mechanically.

在使防護罩65以機械方式進行開放動作的情況下,作為一例可以使用如下的機構。藉由扭力彈簧等的賦與勢能組件,以事先在圖1及圖2所示的閉鎖位置對防護罩65賦與勢能。又,設置從防護罩65突出的被按壓部。在基台11或側壁26等的固定物上設置按壓部,前述按壓部是在刀片檢測組件50朝X軸方向移動而靠近側壁26時供防護罩65的被按壓部抵接。在被按壓部與按壓部的抵接部位形成有使其從X軸方向的移動力產生將防護罩65朝開放方向按壓的分力的凸輪面或導引面等。並且,當刀片檢測組件50在X軸方向上接近側壁26時,可藉由將被按壓部按壓於按壓部而抵抗賦與勢能組件的賦與勢能力來開啟防護罩65。相反地,當刀片檢測組件50在X軸方向上朝遠離側壁26的方向移動時,可將藉由按壓部所進行的按壓解除,並藉由賦與勢能組件的賦與勢能力來將防護罩65自動地關閉。When the protective cover 65 is mechanically opened, the following mechanism can be used as an example. Potential energy is imparted to the protective cover 65 at the locked position shown in FIGS. 1 and 2 in advance by a potential energy imparting element such as a torsion spring. Also, a pressed portion protruding from the protective cover 65 is provided. Fixing objects such as the base 11 and the side wall 26 are provided with pressing portions for contacting the pressed portions of the shield 65 when the blade detection unit 50 moves in the X-axis direction and approaches the side walls 26 . A cam surface, a guide surface, or the like is formed at the contact portion between the pressed portion and the pressing portion so that the moving force in the X-axis direction generates a component force that presses the shield 65 in the opening direction. Furthermore, when the blade detection assembly 50 approaches the side wall 26 in the X-axis direction, the protective cover 65 can be opened by pressing the pressed portion against the pressing portion against the potential imparting force of the potential imparting element. Conversely, when the blade detection component 50 moves in the direction away from the side wall 26 in the X-axis direction, the pressing by the pressing portion can be released, and the protective cover can be removed by the imparting potential energy of the potential energy imparting component. 65 turns off automatically.

在進行刀片檢測組件50的洗淨時,在洗淨單元70側中,是如圖8所示,海綿定位組件75使海綿構件72從收容位置移動至洗淨位置。在此移動之時,海綿構件72抵抗賦與勢能力而使啟閉蓋73開啟。When cleaning the blade detection unit 50, on the side of the cleaning unit 70, as shown in FIG. 8, the sponge positioning unit 75 moves the sponge member 72 from the storage position to the cleaning position. At the time of this movement, the sponge member 72 resists the imparting of the potential force to open the opening and closing cover 73 .

然後,當藉由切割進給組件16朝X軸方向移動的刀片檢測組件50到達如圖6及圖8地與洗淨單元70重疊的位置(海綿收容殼體71的下方)時,即如圖4所示,將海綿構件72插入溝部57。海綿構件72是在Y軸方向一邊稍微壓縮變形一邊進入溝部57,海綿構件72的兩側面是相對於相向部53與相向部54之互相的相向面而具有規定的接觸壓並成為滑接的狀態。在此狀態下,如圖4、圖6及圖8以粗箭頭S所示,藉由切割進給組件16使X軸工作台14朝X軸方向往返移動,藉此使海綿構件72及刀片檢測組件50相對地滑動。其結果,在相向部53與相向部54之互相的相向面滑接的海綿構件72,可將附著在溝部57內的切割屑等的髒污去除並將刀片檢測組件50洗淨。尤其,可將面向溝部57的發光部55的投光窗或受光部56的受光窗藉由與海綿構件72的滑接而擦拭乾淨。也就是說,進行洗淨時的海綿構件72及刀片檢測組件50之相對的滑動之切割進給組件16,是與洗淨單元70一起作為洗淨機構而發揮功能。Then, when the blade detection unit 50 moved in the X-axis direction by the cutting and feeding unit 16 reaches a position (below the sponge accommodating case 71 ) overlapping the cleaning unit 70 as shown in FIGS. 6 and 8 , as shown in FIG. As shown in FIG. 4 , the sponge member 72 is inserted into the groove portion 57 . The sponge member 72 enters the groove portion 57 while being slightly compressed and deformed in the Y-axis direction, and both side surfaces of the sponge member 72 are in a state of sliding contact with a predetermined contact pressure with respect to the opposing surfaces of the opposing portion 53 and the opposing portion 54 . . In this state, as shown by the thick arrow S in FIG. 4 , FIG. 6 and FIG. 8 , the X-axis table 14 is moved back and forth in the X-axis direction by the cutting and feeding unit 16 , whereby the sponge member 72 and the blade are detected. The assemblies 50 slide relatively. As a result, the sponge member 72 slidably in contact with the opposing surfaces of the opposing portion 53 and the opposing portion 54 removes contamination such as cutting chips adhering to the groove portion 57 and cleans the blade detection unit 50 . In particular, the light-projecting window of the light-emitting portion 55 facing the groove portion 57 or the light-receiving window of the light-receiving portion 56 can be wiped clean by sliding contact with the sponge member 72 . That is, the cutting and feeding unit 16 for the relative sliding of the sponge member 72 and the blade detecting unit 50 during cleaning functions as a cleaning mechanism together with the cleaning unit 70 .

因為海綿構件72是利用海綿收容殼體71內的水供給部77來保持已預先含有水的狀態,所以可在使其朝洗淨位置突出的階段立即進行有效的洗淨。又,如圖4所示,在將海綿構件72插入溝部57的狀態下,因為洗淨水噴嘴60、61位於海綿構件72的附近,所以可以將來自洗淨水噴嘴60、61的洗淨水的供給也併用來進行洗淨。又,在藉由海綿構件72所進行的洗淨後,可以藉由來自空氣噴嘴62、63的空氣的噴射,將附著在洗淨完成之發光部55或受光部56的水滴去除。Since the sponge member 72 is kept in a state of preliminarily containing water by the water supply portion 77 in the sponge housing case 71, it is possible to perform effective cleaning immediately at the stage of protruding toward the cleaning position. 4, in the state where the sponge member 72 is inserted into the groove portion 57, since the washing water nozzles 60, 61 are located in the vicinity of the sponge member 72, the washing water from the washing water nozzles 60, 61 can be supply is also used for cleaning. In addition, after the cleaning by the sponge member 72, the water droplets adhering to the cleaned light-emitting portion 55 or the light-receiving portion 56 can be removed by jetting air from the air nozzles 62 and 63.

亦可使海綿構件72含有研磨劑。藉由在海綿構件72含有的研磨劑,可以將附著在刀片檢測組件50的溝部57周圍之髒污的去除效果提升,而實現更有效率的洗淨。The sponge member 72 may also contain an abrasive. By the abrasive contained in the sponge member 72, the removal effect of the contamination adhering to the periphery of the groove part 57 of the blade detection unit 50 can be improved, and more efficient cleaning can be realized.

當藉由洗淨單元70所進行的洗淨完成後,使X軸工作台14朝遠離側壁26的方向移動。在洗淨時所開啟的防護罩65可藉由手動方式或者機械式的連動而關閉。但是,在洗淨後立即(而不進行切割)地進行由刀片檢測組件50所進行之切割刀片41的檢測的情況下,亦可將防護罩65設成原樣開啟的狀態。After the cleaning by the cleaning unit 70 is completed, the X-axis table 14 is moved in a direction away from the side wall 26 . The protective cover 65 opened during cleaning can be closed manually or mechanically. However, when the detection of the cutting blade 41 by the blade detection unit 50 is performed immediately after cleaning (without cutting), the protective cover 65 may be opened as it is.

又,在洗淨後,海綿定位組件75使海綿構件72從洗淨位置(圖4、圖8)移動至收容位置(圖7)。因為洗淨而附著在海綿構件72的髒污可在收容位置藉由來自水供給部77所輸送的水而被洗掉。較理想的是,為了可進行像這樣的海綿構件72的洗淨,水供給部77是構成為對海綿構件72的整體以較強的力道噴射水。Moreover, after washing, the sponge positioning unit 75 moves the sponge member 72 from the washing position ( FIGS. 4 and 8 ) to the storage position ( FIG. 7 ). The dirt adhering to the sponge member 72 due to cleaning can be washed away by the water supplied from the water supply unit 77 at the storage position. Preferably, in order to perform the cleaning of the sponge member 72 as described above, the water supply unit 77 is preferably configured to spray water with a strong force on the entire sponge member 72 .

使用以上的洗淨單元70之刀片檢測組件50的洗淨過程,是預先對切割裝置10的控制組件45設為洗淨模式而進行程式設計,且可以藉由操作切割裝置10的操作人員選擇洗淨模式而自動地執行一連串的動作。或者,也可設成以操作人員的手動輸入來逐次地進行洗淨的各動作。The cleaning process using the blade detection unit 50 of the cleaning unit 70 above is programmed by setting the control unit 45 of the cutting device 10 to the cleaning mode in advance, and the operator who operates the cutting device 10 can select the cleaning process. Clean mode automatically executes a series of actions. Alternatively, each operation of cleaning may be performed sequentially by manual input by an operator.

如以上,本實施形態的切割裝置10是在切割組件30的附近具備有洗淨單元70,並且在使刀片檢測組件50接近洗淨單元70的狀態下使海綿構件72與刀片檢測組件50相對地滑動來進行洗淨。此洗淨可毋須將切割刀片41從切割組件30取下而在合宜的時間點執行,且可以不費工夫而容易地進行。又,因為是藉由海綿構件72相對於刀片檢測組件50的滑動來進行洗淨,所以可以相較於只進行洗淨水的噴射的情況,獲得較高的洗淨效果。As described above, the dicing device 10 of the present embodiment includes the cleaning unit 70 in the vicinity of the dicing unit 30 , and the sponge member 72 faces the blade detection unit 50 in a state where the blade detection unit 50 is brought close to the cleaning unit 70 . Swipe to wash. This cleaning can be performed at a convenient point in time without removing the cutting blade 41 from the cutting assembly 30, and can be performed easily and with little effort. In addition, since the cleaning is performed by sliding the sponge member 72 with respect to the blade detection unit 50, a higher cleaning effect can be obtained as compared with the case where only the cleaning water is sprayed.

又,因為對工作夾台13進行切割進給的切割進給組件16,也作為使海綿構件72與刀片檢測組件50相對地滑動的滑動組件而發揮功能,所以並不存在滑動組件專用的驅動部,而可以將洗淨機構的構成形成得較簡略。又,雖然在滑動時是使刀片檢測組件50側動作,但由於對刀片檢測組件50本身可以不設置單獨的動作部分而構成(防護罩65的啟閉機構除外),所以不會有對刀片檢測組件50的檢測精度造成不良影響的疑慮。In addition, since the cutting and feeding unit 16 for cutting and feeding the table 13 also functions as a sliding unit for sliding the sponge member 72 and the blade detection unit 50 relative to each other, there is no drive unit dedicated to the sliding unit. , and the structure of the cleaning mechanism can be formed to be simpler. In addition, although the side of the blade detection unit 50 is actuated during sliding, the blade detection unit 50 itself can be constructed without a separate operating part (except for the opening and closing mechanism of the protective cover 65), so there is no detection of the blade. The detection accuracy of the assembly 50 raises concerns about adverse effects.

也可採用與上述之實施形態相異的變形例。例如,在上述實施形態中,是使用切割進給組件16來使海綿構件72與刀片檢測組件50相對地滑動。與此相異,亦可使用海綿定位組件75作為滑動組件,並藉由海綿構件72的X軸方向的移動來進行相對於刀片檢測組件50的滑動。也就是說,亦可移動海綿構件72側而非刀片檢測組件50側,來進行洗淨時的滑動。或者,亦可併用切割進給組件16及海綿定位組件75作為滑動組件,並使刀片檢測組件50側與海綿構件72側之雙方動作。Modifications different from the above-described embodiments may also be employed. For example, in the above-described embodiment, the cutting feed unit 16 is used to slide the sponge member 72 relative to the blade detection unit 50 . In contrast to this, the sponge positioning element 75 can also be used as a sliding element, and the sponge member 72 can slide relative to the blade detection element 50 through the movement of the sponge member 72 in the X-axis direction. That is, it is also possible to move the sponge member 72 side instead of the blade detection unit 50 side to perform sliding during cleaning. Alternatively, the cutting feed unit 16 and the sponge positioning unit 75 may be used together as a sliding unit, and both the blade detection unit 50 side and the sponge member 72 side may be operated.

又,亦可具備使海綿構件72相對於海綿收容殼體71以朝向Z軸方向的軸中心來旋轉的旋轉驅動部,並以此旋轉驅動部作為滑動組件。在此情況下,當變更海綿構件72的形狀而形成為以朝向Z軸方向之軸為中心的圓筒狀時,可以抑制在海綿構件72的旋轉時對於刀片檢測組件50之接觸壓的變動。Moreover, you may provide the rotation drive part which rotates the sponge member 72 toward the axial center of the Z-axis direction with respect to the sponge accommodating case 71, and may use this rotation drive part as a slide unit. In this case, when the shape of the sponge member 72 is changed and formed into a cylindrical shape centered on the axis in the Z-axis direction, fluctuations in the contact pressure to the blade detection unit 50 during rotation of the sponge member 72 can be suppressed.

設置在洗淨單元70之洗淨用的滑接構件所要求的是,可以相對於發光部55的投光窗或受光部56的受光窗來確實地滑接並進行洗淨,並且不會損傷投光窗或受光窗。上述實施形態的海綿構件72由於具有柔軟性並且可以保持水份,因此是滿足這些要求的理想的材質。但是,滑接構件的材質亦可選擇海綿以外,且其形狀或構造等也可任意地選擇。例如,也可採用刷子作為洗淨用的滑接構件來取代海綿構件72。又,也可使用以橡膠或樹脂等形成Y軸方向的中央部分,且以海綿或者布等形成接觸於其兩側的發光部55或受光部56的部分之多層構造的滑接構件。The sliding contact member for cleaning provided in the cleaning unit 70 is required to be able to be slidably connected to the light projecting window of the light emitting portion 55 or the light receiving window of the light receiving portion 56 and cleaned without being damaged. Projecting window or receiving window. Since the sponge member 72 of the above-described embodiment has flexibility and can retain moisture, it is an ideal material that satisfies these requirements. However, the material of the sliding contact member may be selected other than sponge, and its shape, structure, and the like may be arbitrarily selected. For example, a brush may be used instead of the sponge member 72 as a sliding member for cleaning. Also, a sliding contact member of a multilayer structure in which the central portion in the Y-axis direction is formed of rubber or resin, and the portions in contact with the light-emitting portion 55 or the light-receiving portion 56 on both sides thereof are formed of sponge or cloth.

在上述實施形態中,也可選擇將設置在刀片檢測組件50的洗淨水噴嘴60、61或者空氣噴嘴62、63省略的構成。In the above-described embodiment, a configuration in which the washing water nozzles 60 and 61 or the air nozzles 62 and 63 provided in the blade detection unit 50 is omitted may be selected.

適用本發明的切割裝置所切割的被加工物的材質或者形成在被加工物上的器件的種類等並無限定。例如,作為被加工物,除了半導體器件晶圓以外,亦可使用光器件晶圓、封裝基板、半導體基板、無機材料基板、氧化物晶圓、未燒結陶瓷基板、壓電基板等的各種工件。作為半導體器件晶圓,亦可使用器件形成後之矽晶圓或化合物半導體晶圓。作為光器件晶圓,亦可使用器件形成後之藍寶石晶圓或碳化矽晶圓。又,作為封裝基板亦可使用CSP(晶片尺寸封裝,Chip Size Package)基板,且亦可使用矽或砷化鎵等作為半導體基板,亦可使用藍寶石、陶瓷、玻璃等作為無機材料基板。此外,亦可使用器件形成後或器件形成前的鉭酸鋰、鈮酸鋰作為氧化物晶圓。The material of the workpiece to be cut by the cutting device to which the present invention is applied, the types of devices formed on the workpiece, and the like are not limited. For example, in addition to semiconductor device wafers, various workpieces such as optical device wafers, package substrates, semiconductor substrates, inorganic material substrates, oxide wafers, green ceramic substrates, and piezoelectric substrates can be used as workpieces. As the semiconductor device wafer, a silicon wafer or a compound semiconductor wafer after device formation can also be used. As the optical device wafer, a sapphire wafer or a silicon carbide wafer after device formation can also be used. Further, CSP (Chip Size Package) substrates may be used as package substrates, silicon, gallium arsenide, etc. may be used as semiconductor substrates, and sapphire, ceramics, glass, etc. may be used as inorganic material substrates. In addition, lithium tantalate and lithium niobate after device formation or before device formation can also be used as oxide wafers.

又,雖然已說明本發明的各實施形態,但作為本發明的其他實施形態,亦可為將上述實施形態及變形例整體地或者部分地組合而成之形態。In addition, although each embodiment of this invention has been described, as another embodiment of this invention, the form which combined the above-mentioned embodiment and modification in whole or part may be sufficient.

又,本發明之實施形態並不限定於上述之實施形態及變形例,且亦可在不脫離本發明之技術思想的主旨的範圍內進行各種變更、置換、變形。此外,若能經由技術之進步或衍生之其他技術而以其他的方式來實現本發明之技術思想的話,亦可使用該方法來實施。從而,申請專利範圍涵蓋了可包含在本發明之技術思想的範圍內的所有的實施形態。 產業上之可利用性In addition, the embodiment of the present invention is not limited to the above-described embodiment and modification examples, and various changes, substitutions, and deformations can be made within the scope not departing from the spirit of the technical idea of the present invention. In addition, if the technical idea of the present invention can be realized in other ways through technological progress or other derived technologies, this method can also be used to implement. Therefore, the scope of the patent application covers all the embodiments that can be included in the scope of the technical idea of the present invention. industrial availability

如以上所說明的,根據本發明的切割裝置,可以在合宜的時間點將對切割刀片進行檢測的刀片檢測組件確實地洗淨,且可以顯著地提升切割裝置的運轉效率或便利性。As described above, according to the dicing device of the present invention, the blade detection component that detects the dicing blade can be surely cleaned at a suitable timing, and the operation efficiency or convenience of the dicing device can be significantly improved.

10‧‧‧切割裝置 11‧‧‧基台 12‧‧‧開口 13‧‧‧工作夾台 14‧‧‧X軸工作台 15‧‧‧防水蓋 16‧‧‧切割進給組件(洗淨機構、滑動組件) 17‧‧‧X軸導軌 18、35、38‧‧‧滾珠螺桿 19、39‧‧‧馬達 20‧‧‧θ工作台 21‧‧‧保持面 22‧‧‧夾具 25‧‧‧柱部 26‧‧‧側壁 30‧‧‧切割組件 31‧‧‧分度進給組件 32‧‧‧切入進給組件 33‧‧‧Y軸導軌 34‧‧‧Y軸工作台 36‧‧‧Z軸導軌 37‧‧‧Z軸工作台 40‧‧‧主軸 40x‧‧‧軸心 41‧‧‧切割刀片 45‧‧‧控制組件 50‧‧‧刀片檢測組件 50A‧‧‧第1位置 50B‧‧‧第2位置 51‧‧‧支撐腳部 52‧‧‧基部 53、54‧‧‧相向部 55‧‧‧發光部 56‧‧‧受光部 57‧‧‧溝部 60、61‧‧‧洗淨水噴嘴 62、63‧‧‧空氣噴嘴 65‧‧‧防護罩 66、74‧‧‧鉸鏈銷 70‧‧‧洗淨單元(洗淨機構) 71‧‧‧海綿收容殼體(收容殼體) 71a‧‧‧開口 72‧‧‧海綿構件(滑接構件) 73‧‧‧啟閉蓋 75‧‧‧海綿定位組件(定位組件) 76‧‧‧活塞桿 77‧‧‧水供給部 F‧‧‧環形框架 R‧‧‧箭頭 S‧‧‧粗箭頭 T‧‧‧切割膠帶 W‧‧‧晶圓(被加工物) X、Y、Z‧‧‧方向10‧‧‧Cutting device 11‧‧‧Abutment 12‧‧‧Opening 13‧‧‧Working table 14‧‧‧X-axis table 15‧‧‧Waterproof cover 16‧‧‧Cutting feed assembly (cleaning mechanism, sliding assembly) 17‧‧‧X-axis guide 18, 35, 38‧‧‧ball screw 19, 39‧‧‧motor 20‧‧‧θ Workbench 21‧‧‧Maintaining Surface 22‧‧‧ Fixtures 25‧‧‧Pillar 26‧‧‧Sidewall 30‧‧‧Cutting components 31‧‧‧Indexing feed components 32‧‧‧Plunge feed assembly 33‧‧‧Y-axis guide 34‧‧‧Y-axis table 36‧‧‧Z-axis guide 37‧‧‧Z-axis table 40‧‧‧Spindle 40x‧‧‧Axis 41‧‧‧Cutting blades 45‧‧‧Control components 50‧‧‧Blade detection kit 50A‧‧‧1st position 50B‧‧‧2nd position 51‧‧‧Support feet 52‧‧‧Base 53, 54‧‧‧Department 55‧‧‧Light-emitting part 56‧‧‧Light Receiver 57‧‧‧Goube 60, 61‧‧‧Washing water nozzle 62, 63‧‧‧Air Nozzle 65‧‧‧Protective cover 66, 74‧‧‧Hinge pin 70‧‧‧Cleaning unit (cleaning mechanism) 71‧‧‧Sponge housing (receiving housing) 71a‧‧‧Opening 72‧‧‧Sponge components (sliding components) 73‧‧‧Opening and closing cover 75‧‧‧Sponge positioning assembly (positioning assembly) 76‧‧‧Piston rod 77‧‧‧Water Supply Department F‧‧‧Ring Frame R‧‧‧arrow S‧‧‧Thick arrow T‧‧‧Cutting Tape W‧‧‧Wafer (Workpiece) X, Y, Z‧‧‧ directions

圖1是顯示本實施形態之切割裝置的立體圖。 圖2是將切割裝置的一部分放大的立體圖。 圖3是顯示切割裝置所具備的刀片檢測組件與洗淨機構的關係的立體圖。 圖4是顯示以海綿構件將刀片檢測組件洗淨的狀態的立體圖。 圖5是顯示切割時的工作夾台及刀片檢測組件的位置的俯視圖。 圖6是顯示洗淨時的工作夾台及刀片檢測組件的位置的俯視圖。 圖7是將切割時的洗淨機構的狀態局部透視而顯示的側視圖。 圖8是將洗淨時的洗淨機構的狀態局部透視而顯示的側視圖。FIG. 1 is a perspective view showing a cutting device according to this embodiment. FIG. 2 is an enlarged perspective view of a part of the cutting device. 3 is a perspective view showing a relationship between a blade detection unit and a cleaning mechanism included in the cutting device. 4 is a perspective view showing a state in which the blade detection unit is cleaned with a sponge member. FIG. 5 is a plan view showing the positions of the work chuck and the blade detection unit during cutting. 6 is a plan view showing the positions of the work chuck and the blade detection unit during cleaning. FIG. 7 is a side view showing a part of the state of the cleaning mechanism at the time of cutting through perspective. FIG. 8 is a side view showing a part of the state of the washing mechanism at the time of washing in a perspective view.

50‧‧‧刀片檢測組件 50‧‧‧Blade detection kit

51‧‧‧支撐腳部 51‧‧‧Support feet

52‧‧‧基部 52‧‧‧Base

53、54‧‧‧相向部 53, 54‧‧‧Department

55‧‧‧發光部 55‧‧‧Light-emitting part

56‧‧‧受光部 56‧‧‧Light Receiver

57‧‧‧溝部 57‧‧‧Goube

60、61‧‧‧洗淨水噴嘴 60, 61‧‧‧Washing water nozzle

62、63‧‧‧空氣噴嘴 62, 63‧‧‧Air Nozzle

65‧‧‧防護罩 65‧‧‧Protective cover

66‧‧‧鉸鏈銷 66‧‧‧Hinge pins

70‧‧‧洗淨單元(洗淨機構) 70‧‧‧Cleaning unit (cleaning mechanism)

71‧‧‧海綿收容殼體(收容殼體) 71‧‧‧Sponge housing (receiving housing)

72‧‧‧海綿構件(滑接構件) 72‧‧‧Sponge components (sliding components)

75‧‧‧海綿定位組件(定位組件) 75‧‧‧Sponge positioning assembly (positioning assembly)

76‧‧‧活塞桿 76‧‧‧Piston rod

X、Y、Z‧‧‧方向 X, Y, Z‧‧‧ directions

Claims (2)

一種切割裝置,具備有:工作夾台,保持被加工物;切割組件,裝設有切割刀片,前述切割刀片具有用於對保持在該工作夾台的被加工物進行切割之圓環狀的切割刀刃;切割進給組件,將保持在該工作夾台的被加工物朝X軸方向切割進給;以及刀片檢測組件,具有發光部及受光部,前述發光部及前述受光部是包夾該切割刀片的該切割刀刃並互相面對面而配設,前述切割裝置之特徵在於: 具備洗淨機構,前述洗淨機構是具有: 滑接構件,插入面對面而配設之該發光部及該受光部之間來進行洗淨; 收容殼體,收容該滑接構件並且具備使該滑接構件進出之啟閉自如的開口; 定位組件,將該滑接構件選擇性地定位到收容於該收容殼體內的收容位置、與插入該發光部及該受光部間並進行洗淨的洗淨位置;以及 滑動組件,使該滑接構件與該刀片檢測組件相對地滑動, 將該滑接構件定位在該洗淨位置並藉由該滑動組件使其滑動,以使該滑接構件對該發光部及該受光部進行洗淨。A cutting device is provided with: a work clamping table for holding a workpiece; a cutting assembly equipped with a cutting blade, the cutting blade having an annular cutting blade for cutting the workpiece held on the work clamping table A cutting edge; a cutting and feeding assembly, which cuts and feeds the workpiece held on the working chuck in the X-axis direction; and a blade detection assembly, which has a light-emitting part and a light-receiving part, and the light-emitting part and the light-receiving part are used to sandwich the cutting The cutting edges of the blade are arranged facing each other, and the aforementioned cutting device is characterized by: Equipped with a cleaning mechanism, the aforementioned cleaning mechanism has: A sliding member is inserted between the light-emitting portion and the light-receiving portion that are arranged facing each other for cleaning; an accommodating casing, accommodating the sliding member and having an opening that allows the sliding member to enter and exit freely; a positioning assembly for selectively positioning the sliding member to an accommodation position accommodated in the accommodation casing, and a cleaning position inserted between the light-emitting portion and the light-receiving portion for cleaning; and a sliding assembly, so that the sliding member and the blade detection assembly slide relative to each other, The sliding member is positioned at the cleaning position and is slid by the sliding assembly, so that the sliding member cleans the light-emitting portion and the light-receiving portion. 如請求項1之切割裝置,其中該刀片檢測組件是配設在該切割進給組件, 該滑動組件是該切割進給組件, 將該滑接構件定位在該洗淨位置並藉由該切割進給組件使該刀片檢測組件朝X軸方向滑動來使該滑接構件對該發光部及該受光部進行洗淨。The cutting device of claim 1, wherein the blade detection component is disposed on the cutting feed component, the slide assembly is the cutting feed assembly, The sliding member is positioned at the cleaning position, and the blade detection assembly is slid in the X-axis direction by the cutting and feeding assembly, so that the sliding member cleans the light-emitting portion and the light-receiving portion.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110744731B (en) * 2019-10-30 2021-07-27 许昌学院 A wafer slicing device based on photoelectric control
JP7521173B2 (en) 2020-06-15 2024-07-24 株式会社東京精密 Blade detection device and method for cleaning the blade detection device
CN112658941B (en) * 2020-11-26 2023-02-07 重庆新久融科技有限公司 Cutting device is used in aluminum alloy plate processing
CN112606234A (en) * 2020-12-28 2021-04-06 郑州光力瑞弘电子科技有限公司 Scribing machine blade monitoring device and scribing machine
CN115609439B (en) * 2022-12-16 2023-05-05 广东启新模具有限公司 Auto-parts lathe of high-efficient dust removal

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201237952A (en) * 2011-01-19 2012-09-16 Disco Corp Processing device
JP2014078544A (en) * 2012-10-09 2014-05-01 Disco Abrasive Syst Ltd Cleaning tool and cleaning method
JP2014079833A (en) * 2012-10-16 2014-05-08 Disco Abrasive Syst Ltd Cutting device

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2511370Y2 (en) * 1990-10-11 1996-09-25 株式会社ディスコ Cleaner jig for blade damage detector
JP4590058B2 (en) 2000-04-12 2010-12-01 株式会社ディスコ Cutting blade detection mechanism of cutting equipment
JP2003211354A (en) * 2002-01-18 2003-07-29 Disco Abrasive Syst Ltd Cutting device
JP5068621B2 (en) * 2007-10-03 2012-11-07 株式会社ディスコ Cutting equipment
JP5615022B2 (en) * 2010-04-13 2014-10-29 株式会社ディスコ Mobile device
JP2014108463A (en) * 2012-11-30 2014-06-12 Disco Abrasive Syst Ltd Cutting device
JP2016082195A (en) * 2014-10-22 2016-05-16 Towa株式会社 Cutting device and cutting method
JP6746198B2 (en) * 2016-04-01 2020-08-26 株式会社ディスコ Cutting equipment
JP6727699B2 (en) * 2016-04-19 2020-07-22 株式会社ディスコ How to set up cutting equipment
CN205683150U (en) * 2016-05-04 2016-11-16 杨飞 Automatically chamber mirror cleaning machine
CN107470184A (en) * 2017-07-10 2017-12-15 中国电子科技集团公司第十八研究所 Auxiliary polar plate scrubbing tool for silver oxide electrode formation
CN107433276A (en) * 2017-09-12 2017-12-05 于乐军 Biochemistry Experiment test tube cleaning device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201237952A (en) * 2011-01-19 2012-09-16 Disco Corp Processing device
JP2014078544A (en) * 2012-10-09 2014-05-01 Disco Abrasive Syst Ltd Cleaning tool and cleaning method
JP2014079833A (en) * 2012-10-16 2014-05-08 Disco Abrasive Syst Ltd Cutting device

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