JP2019181584A - Processing device - Google Patents

Abstract

To effectively use a coolant used in a spindle housing for cooling of the spindle housing.SOLUTION: A processing device includes: a chuck table which holds a workpiece; a spindle to which a grinder tool for processing the workpiece held by the chuck table is attached; a spindle housing which rotatably supports the spindle and includes a coolant passage; a processing water nozzle which jets processing water for removing processed waste occurring from the workpiece from the workpiece; a housing cleaning water nozzle which jets cleaning water for removing the processed waste adhering to the spindle housing; a water supply passage which is connected to the coolant passage and supplies a coolant to the coolant passage; a drain passage which is connected with the coolant passage and drains the coolant that has flowed through the coolant passage; and a branch drain supply passage which is branched from the drain passage and supplies a part of the coolant to at lease one of the processing water nozzle and the housing cleaning water nozzle.SELECTED DRAWING: Figure 5

Description

  The present invention relates to a processing apparatus including a spindle.

  2. Description of the Related Art A cutting apparatus that cuts a plate-like workpiece such as a semiconductor wafer, a ceramic substrate, or a resin package substrate with an annular cutting blade is known. The workpiece is cut along the movement path by relatively moving the cutting blade and the workpiece while cutting the cutting blade rotated at a high speed with respect to the workpiece.

  There is also known a grinding apparatus that thins the workpiece by grinding. The grinding apparatus includes, for example, a chuck table that sucks and holds a workpiece, and a grinding wheel that is disposed above the chuck table and has a grinding wheel fixed to the lower surface. The workpiece is thinned by lowering the grinding wheel and pressing the grinding wheel against the workpiece while rotating the chuck table and the grinding wheel.

  In processing apparatuses such as a cutting apparatus and a grinding apparatus, a spindle on which a processing tool such as a cutting blade and a grinding wheel is mounted rotates at a high speed and can generate heat. Due to the heat generation, deformation of a member such as a spindle tends to be a problem.

  Therefore, for example, a flow path is provided in a spindle housing that accommodates the spindle, and cooling water is supplied to the flow path, thereby cooling the spindle and suppressing the extension of the spindle in the rotation axis direction (for example, patents). Reference 1). As a result, high-precision machining is realized in the machining apparatus.

  Further, in the processing chamber where the workpiece is processed, a part of the workpiece is removed by the above processing tool, so that a large amount of processing waste is generated. Therefore, by supplying processing water such as pure water to the processing point of the workpiece, processing is performed while removing processing waste.

  By the way, machining waste tends to adhere to a spindle housing or the like located in the machining chamber during machining. If the processing waste adhering to the spindle housing or the like falls and adheres to the workpiece, it may cause damage or malfunction of the device in the workpiece in a subsequent process. Therefore, it is necessary for an operator to periodically clean the inside of the processing apparatus.

JP 2011-214605 A

  Usually, the cooling water supplied to the spindle housing is discharged from the processing apparatus and disposed of after use. Since a large amount of cooling water, for example, about 2 liters per minute is used per spindle, it is desirable to use this cooling water effectively before disposal.

  The present invention has been made in view of these points, and an object of the present invention is to provide a processing apparatus that effectively uses the cooling water used in the spindle housing for cooling the spindle. is there.

  According to the present invention, a chuck table for holding a workpiece, a spindle on which a grindstone tool for processing the workpiece held on the chuck table is mounted, a spindle that rotatably supports the spindle, and a cooling water channel inside. A spindle housing, a machining water nozzle that ejects machining water that removes machining waste generated from the workpiece from the workpiece, and a cleaning water that ejects machining waste adhering to the spindle housing. A housing wash water nozzle, a water supply channel connected to the cooling water channel and supplying cooling water to the cooling water channel, a drainage channel connected to the cooling water channel and discharging the cooling water flowing through the cooling water channel, and A processing apparatus is provided that includes a branch drainage supply path that branches from a drainage path and supplies a part of the cooling water to at least one of the processing water nozzle and the housing cleaning water nozzle.

  Preferably, the processing apparatus further includes a valve provided in the branch drainage supply path.

  According to the processing apparatus of the present invention, a part of the cooling water used for cooling the spindle can be used as at least one of the processing water and the washing water. Therefore, the cooling water after use can be used effectively.

It is a perspective view which shows the structural example of the processing apparatus which concerns on embodiment of this invention. It is a partial cross section side view which shows the inside of the processing chamber at the time of processing of a to-be-processed object. It is a partial cross section side view which shows the inside of the processing chamber at the time of washing | cleaning of a spindle housing. It is a schematic diagram which shows the back surface of a spindle housing at the time of washing | cleaning of a spindle housing. It is a schematic diagram explaining reuse of the cooling water in 1st Embodiment. It is a schematic diagram explaining reuse of the cooling water in 2nd Embodiment. It is a schematic diagram explaining reuse of the cooling water in 3rd Embodiment.

  Embodiments according to one aspect of the present invention will be described with reference to the accompanying drawings. FIG. 1 is a perspective view showing a configuration example of a processing apparatus 2 according to an embodiment of the present invention. It is assumed that the X-axis direction, the Y-axis direction, and the Z-axis direction used in the following description are perpendicular to each other.

  As shown in FIG. 1, the processing apparatus (cutting apparatus) 2 includes a base 4 that supports each component. An opening 4a is formed at the front corner of the base 4, and a cassette elevator 6 that is lifted and lowered by a lifting mechanism (not shown) is provided in the opening 4a. A cassette 8 for accommodating a plurality of workpieces 11 is placed on the upper surface of the cassette elevator 6. In FIG. 1, only the outline of the cassette 8 is shown for convenience of explanation.

  The workpiece 11 is a disk-shaped wafer made of a semiconductor material such as silicon, for example. The surface of the workpiece 11 (upper surface in FIG. 1) is divided into a plurality of regions by a plurality of division lines (streets) intersecting each other, and each region includes a device such as an IC (Integrated Circuit). Is formed.

  A pressure-sensitive adhesive tape (dicing tape) 13 having a larger area than the workpiece 11 is affixed to the back surface (the lower surface in FIG. 1) side of the workpiece 11. An outer peripheral portion of the adhesive tape 13 is fixed to an annular frame 15. The workpiece 11 is accommodated in the cassette 8 while being supported by the frame 15 via the adhesive tape 13.

  In the present embodiment, a disk-shaped wafer made of a semiconductor material such as silicon is used as the workpiece 11. However, the material, shape, structure, size, etc. of the workpiece 11 are not limited. For example, a substrate made of another semiconductor, ceramics, resin, metal, or the like can be used as the workpiece 11. Similarly, there are no restrictions on the type, quantity, shape, structure, size, arrangement, etc. of the device. A device may not be formed on the workpiece 11.

  An opening 4b that is long in the X-axis direction (machining feed direction) is formed on the side of the cassette elevator 6. In the opening 4b, a ball screw type X-axis moving mechanism (processing feed unit) 10 and a bellows-like cover 12 covering the upper part of the X-axis moving mechanism 10 are arranged.

  The X-axis movement mechanism 10 includes an X-axis movement table (not shown), and this X-axis movement table is movable in the X-axis direction. The upper part of the X-axis moving table is covered with a table cover 10a.

  On the X-axis moving table, a chuck table (holding table) 14 for holding the workpiece 11 is arranged in a manner exposed from the table cover 10a. The chuck table 14 is connected to a rotation drive source (not shown) such as a motor, and can rotate around a rotation axis substantially parallel to the Z-axis direction (vertical direction).

  The chuck table 14 is moved in the X-axis direction together with the X-axis moving table by the X-axis moving mechanism 10 described above (processing feed). A part of the upper surface of the chuck table 14 is a holding surface 14 a for holding the workpiece 11.

  The holding surface 14a is formed substantially in parallel to the X-axis direction and the Y-axis direction (left-right direction, indexing feed direction), and is a vacuum pump via a suction path (not shown) formed inside the chuck table 14. It connects to suction means (not shown). In addition, around the chuck table 14, four clamps 16 are provided for fixing an annular frame 15 that supports the workpiece 11 via an adhesive tape 13 from four directions.

  A transport unit (not shown) for transporting the workpiece 11 and the frame 15 described above to the chuck table 14 and the like is disposed above the opening 4b. The workpiece 11 transported by the transport unit is placed on the holding surface 14a of the chuck table 14 so that the surface side is exposed upward, for example.

  A gate-type support structure 20 that straddles the X-axis moving mechanism 10 is disposed at a position adjacent to the opening 4b. Two sets of machining unit moving mechanisms (index feed unit and cut feed unit) 22 are provided on the upper front surface of the support structure 20.

  Each processing unit moving mechanism 22 is commonly provided with a pair of Y-axis guide rails 24 arranged on the front surface of the support structure 20 and substantially parallel to the Y-axis direction. A Y-axis moving plate 26 constituting each processing unit moving mechanism 22 is slidably attached to the Y-axis guide rail 24.

  A nut portion (not shown) is provided on the back surface (rear surface) side of the Y-axis moving plate 26, and a Y-axis ball screw 28 substantially parallel to the Y-axis guide rail 24 is screwed into the nut portion. Yes.

  A Y-axis pulse motor 26 a is connected to one end of the Y-axis ball screw 28. If the Y-axis ball screw 28 is rotated by the Y-axis pulse motor 26 a, the Y-axis moving plate 26 moves in the Y-axis direction along the Y-axis guide rail 24.

  A pair of Z-axis guide rails 30 that are substantially parallel to the Z-axis direction are provided on the surface (front surface) of each Y-axis moving plate 26. A Z-axis moving plate 32 is slidably attached to the Z-axis guide rail 30.

  A nut portion (not shown) is provided on the back surface side (rear surface side) of the Z-axis moving plate 32, and a Z-axis ball screw 34 parallel to the Z-axis guide rail 30 is screwed into the nut portion. Yes. A Z-axis pulse motor 36 is connected to one end of the Z-axis ball screw 34. When the Z-axis ball screw 34 is rotated by the Z-axis pulse motor 36, the Z-axis moving plate 32 moves in the Z-axis direction along the Z-axis guide rail 30.

  A processing unit (cutting unit) 18 is provided below the Z-axis moving plate 32. The processing unit 18 includes a cylindrical spindle housing 38. The processing unit 18 is accommodated in a processing chamber 46 (not shown in FIG. 1) described later.

  An imaging unit (camera unit) 90 for imaging the workpiece 11 is provided at a position adjacent to the processing unit 18. The captured image of the workpiece 11 is used for alignment between the workpiece 11 and the machining unit 18.

  An opening 4c is provided at a position opposite to the opening 4a with respect to the opening 4b. A cleaning unit 92 for cleaning the processed workpiece 11 and the like after processing is disposed in the opening 4c. The workpiece 11 processed in the processing unit 18 is conveyed from the chuck table 14 to the cleaning unit 92 and cleaned.

  The cleaning unit 92 is supported by a cleaning table 96 that holds and rotates the workpiece 11 and a substantially L-shaped cleaning arm, and the workpiece cleaning water in which an injection port is disposed so as to face the cleaning table 96. Nozzle 94.

  The cleaning table 96 is provided with a clamp (not shown) that fixes an annular frame 15 that supports the workpiece 11, and a vacuum pump that sucks the surface of the workpiece 11 on the adhesive tape 13 side. The suction means is connected. The workpiece 11 is fixed on the cleaning table 96 and rotates together with the cleaning table 96 about the Z axis as a rotation axis.

  When the cleaning water is sprayed from the workpiece cleaning water nozzle 94 to the surface (upper surface) of the workpiece 11, the processing dust or the like attached to the workpiece 11 is removed. The cleaning unit 92 may further include an air nozzle (not shown) that dries the workpiece 11 after cleaning.

  A liquid supply source 84 and a constant temperature water supply device 86 are provided outside the base 4 having the cleaning unit 92 and the like. The liquid supplied by the liquid supply source 84 is water such as pure water, for example, but the type of liquid is not limited to water. The liquid supply source 84 has a pump function for sending the liquid to the constant temperature water supply device 86.

  The constant temperature water supply device 86 is connected to the spindle housing 38 and the like in the processing unit 18 through the water supply channel 54, the drainage channel 58 and the processing water channel 60. The constant temperature water supply device 86 has a function of maintaining the liquid supplied from the liquid supply source 84 at a predetermined temperature (for example, 23 ° C. or more and 24 ° C. or less).

  The cooling water 52 maintained at a predetermined temperature by the constant temperature water supply device 86 is supplied to the spindle housing 38 via the water supply passage 54. As the cooling water 52 flows through the spindle housing 38, the spindle housing 38 is cooled. The spindle 40 is cooled by heat exchange between the cooled spindle housing 38 and the heated spindle 40 (shown in FIG. 2).

  The cooling water 52 that has flowed through the spindle housing 38 is discharged through the drainage channel 58 and disposed of. As will be described later, a part of the cooling water 52 before returning to the constant temperature water supply device 86 is used as cleaning water 72 for the spindle housing 38 or the like, for example.

  A part of the liquid maintained at a predetermined temperature by the constant temperature water supply device 86 is supplied to the processing unit 18 as processing water 62. The processing water 62 is sprayed on the workpiece 11 or the like being processed, and is used, for example, to remove processing waste generated from the workpiece 11 or to cool a processing point. The used processed water 62 is discharged together with the processing waste from the drainage section 98 to a wastewater treatment apparatus (not shown) outside the processing apparatus 2.

  FIG. 2 is a partial cross-sectional side view showing the inside of the processing chamber 46 when the workpiece 11 is processed. In FIG. 2, the frame 15 disposed on the chuck table 14 and the clamp 16 are omitted for the purpose of making the drawing easier to see. The spindle housing 38 is hidden by a grindstone tool (cutting blade) 42 and is not shown in FIG.

  The processing unit 18 has a spindle 40 in addition to the spindle housing 38. The spindle housing 38 accommodates a part of the spindle 40 serving as a rotation axis parallel to the Y-axis direction. The spindle housing 38 can rotatably support the spindle 40 by a so-called air bearing.

  One end of the spindle 40 is exposed to the outside of the spindle housing 38 from one end side of the spindle housing 38. A grindstone tool 42 for cutting the workpiece 11 is attached to one end of the spindle 40 using a blade mount (not shown) or the like. A rotation drive source (not shown) including a motor is connected to the other end side of the spindle 40. The spindle 40 becomes a rotation axis of the grindstone tool 42.

  A machining water nozzle 64a is provided facing the cutting edge on the outer periphery of the grindstone tool 42, and a pair of machining water nozzles 64b extending in the X-axis direction so as to sandwich both side surfaces of the grindstone tool 42 are provided. In addition, in FIG. 2, the machining water nozzle 64b facing one side surface of the grindstone tool 42 is shown. The machining water nozzle 64 (64a, 64b) is located at a height below the rotation axis of the grindstone tool.

  The processing water nozzle 64a is connected to the constant temperature water supply device 86 through the processing water channel 60a (processing water channel 60), and the processing water nozzle 64b is connected to the constant temperature water supply device 86 through the processing water channel 60b (processing water channel 60). Yes.

  At the time of machining, the machining water nozzle 64 a injects machining water 62 supplied from the machining water channel 60 a toward the front portion of the grindstone tool 42, and the machining water nozzle 64 b moves toward the side surface of the grindstone tool 42. The processing water 62 supplied from is injected.

  By spraying the machining water 62 onto the machining point, machining waste generated from the workpiece 11 during machining can be removed. Thereby, it can suppress that processing waste adheres to work piece 11.

  The processing chamber 46 that houses the processing unit 18 has a substantially box shape that covers the chuck table 14 and the processing unit 18. The processing chamber 46 has a rectangular top plate 46a on the XY plane, a pair of side plates 46b extending downward from edges along the X-axis direction of the top plate 46a, and a Y-axis direction of the top plate 46a. And a pair of side plates 46c extending downward from the edges. The processing chamber 46 further includes a protective cover 46 f for protecting the processing unit moving mechanism 22 such as the Y-axis ball screw 28 from the splash of the processing water 62.

  Between the processing unit 18 and the imaging unit 90, a partition plate 46d extending along the Z-axis direction from just below the protective cover 46f to a position lower than the holding surface 14a of the chuck table 14 is disposed.

  The partition plate 46d divides the processing chamber 46 into a processing region 48A for cutting the workpiece 11 held on the chuck table 14 and an attachment / detachment region 48B for attaching / detaching the workpiece 11 to / from the chuck table 14. The partition plate 46d protects the attachment / detachment region 48B from the splash of the processing water 62 generated in the processing region 48A.

  An opening 46e that allows the chuck table 14 to pass in the X-axis direction is provided below the partition plate 46d. The opening 46e has an opening area through which the workpiece 11 and the chuck table 14 can pass in the YZ plane. The workpiece 11 and the chuck table 14 can move in the X-axis direction between the machining area 48A and the attachment / detachment area 48B through the opening 46e.

  Due to the high-speed rotation of the grindstone tool 42, the machining water 62 scatters on the rear side in the rotation direction at the machining point. A part of the scattered processing water 62 falls to the table cover 10a, the bellows-like cover 12 and the like, and passes through a water channel (not shown) provided at the end of the bellows-like cover 12 in the Y-axis direction to the drainage part 98. Flowing.

  The drainage part 98 is provided below the processing region 48 </ b> A of the processing chamber 46. The drainage part 98 has a fluid receiving part 98a provided in contact with the side plate 46c on the processing region 48A side. Moreover, the drainage part 98 has the drainage pipe 98b connected to the fluid receiving part 98a.

  The cross-sectional area in the XY plane of the drain pipe 98b is smaller than the cross-sectional area in the XY plane of the fluid receiving part 98a. The processed water 62 flowing into the drainage section 98 is discharged out of the processing apparatus 2 through the drain pipe 98b, but the inflow amount of the processed water 62 flowing into the drain section 98 is based on the drainage flow rate from the drain pipe 98b. If there are too many, the fluid receiving part 98a temporarily stores the processed water 62.

  The processing chamber 46 has an exhaust port 46g for exhausting the atmosphere in the processing chamber 46 above the side plate 46b on the processing region 48A side. An exhaust unit (not shown) that exhausts the atmosphere in the processing region 48A to the outside is connected to the exhaust port 46g.

  Of the processing water 62 scattered in the processing region 48A, the mist-like processing water 62 having a small droplet diameter does not fall on the bellows-shaped cover 12 but floats in the processing region 48A. The mist-like processed water 62 is discharged to the outside through the exhaust port 46g together with the atmosphere in the processed region 48A.

  FIG. 3 is a partial cross-sectional side view showing the inside of the processing chamber 46 during cleaning of the spindle housing 38 and the like. The cleaning is performed in a period (downtime) after the processed workpiece 11 is retracted from the processing area 48A to the attachment / detachment area 48B. Thus, the spindle housing 38 and the grindstone tool 42 are cleaned by spraying an appropriate amount of cleaning water 72 for 10 seconds, for example, during the downtime of the machining operation.

  If the workpiece 11 is not retracted to the attachment / detachment region 48B during cleaning of the spindle housing 38 and the like, machining scraps dropped from the spindle housing 38 and the like due to cleaning may adhere to the workpiece 11.

  When processing such as cutting and grinding is performed in this state, the device in the workpiece 11 malfunctions in the cutting device, or scratches (scratches) due to processing scraps are attached to the workpiece 11 in the grinding device. To do. In the present embodiment, since cleaning is performed after the workpiece 11 is retracted, it is possible to prevent malfunction of the device and damage to the workpiece 11 during processing.

  On the upper and lower parts of the spindle housing 38, substantially cylindrical housing cleaning water nozzles 74a and 74b extending in the Y-axis direction are provided. The housing cleaning water nozzle 74 (74a and 74b) is a branched drainage supply path 76 (shown in FIGS. 5 to 7) branched from the drainage path 58 of the cooling water 52 that has flowed through the spindle housing 38 when the workpiece 11 is processed. Connected to.

  The housing cleaning water nozzles 74a and 74b have injection ports 74c and 74d designed to spread the cleaning water 72 to be sprayed at a predetermined spray angle. The housing cleaning water nozzles 74a and 74b spray the cleaning water 72 in a conical shape at a predetermined spread angle (acute angle) in the XZ plane from the injection ports 74c and 74d.

  The injection port 74 c is disposed toward the spindle housing 38 obliquely downward from above the spindle housing 38. The cleaning water 72 sprayed from the housing cleaning water nozzle 74a mainly cleans the processing waste adhering to the upper part of the outside of the spindle housing 38, piping, and the like.

  The injection port 74d is disposed obliquely upward from below the spindle housing 38 toward the spindle housing 38. The cleaning water 72 sprayed from the housing cleaning water nozzle 74 b mainly cleans the processing waste adhering to the lower part etc. outside the spindle housing 38. Further, the grinding stone tool 42 and the blade cover that covers the top of the grinding stone tool 42 may be washed with the cleaning water 72.

  Since the lower part on the outer side of the spindle housing 38 faces the workpiece 11, there is a high possibility that if the machining waste falls from the lower part on the outer side of the spindle housing 38, it adheres to the surface of the workpiece 11. By cleaning the lower part outside the spindle housing 38 with the housing cleaning water nozzle 74b, it is possible to suppress the attachment of the processing scraps to the workpiece 11.

  When machining the workpiece 11, the machining water 62 is sprayed from the machining water nozzles 64a and 64B to the machining point of the workpiece 11, but the spindle housing 38 is not washed using the housing washing nozzles 74a and 74b. .

  Since the machining waste is removed from the spindle housing 38 before or after the cutting, it is possible to prevent the machining waste that has dropped from the spindle housing 38 during the machining from adhering to the workpiece 11. Note that the used cleaning water 72 also flows to the drainage section 98 in the same manner as the processed water 62 after use.

  FIG. 4 is a schematic diagram showing the back surface of the spindle housing 38 during cleaning of the spindle housing 38 and the like. FIG. 5 is a schematic diagram for explaining the reuse of the cooling water 52 in the first embodiment.

  As shown in FIG. 5, the liquid supply source 84 is connected to a branching portion 86 a disposed in the constant temperature water supply device 86. The branch portion 86a is connected to the upstream ends of the processing water channel 60 and the water supply channel 54, and the liquid supplied from the liquid supply source 84 is supplied to the processing water channel 60 and the water supply channel 54 via the branch portion 86a.

  The processing water channel 60 is connected to the processing water nozzles 64 (64a, 64b) through a chiller 86b and a valve 66a positioned downstream of the chiller 86b, which are respectively disposed in the constant temperature water supply device 86.

  The chiller 86b maintains the liquid in the flow path in the chiller 86b at a predetermined temperature. In addition, when the liquid of the liquid supply source 84 is lower than a predetermined temperature, the chiller 86b may warm the liquid. The liquid maintained at a predetermined temperature by the chiller 86 b is supplied to the processing water nozzle 64 as the processing water 62.

  In the first embodiment, the flow path of the processed water 62 between the branch portion 86 a and the processed water nozzle 64 is referred to as a processed water path 60. However, the flow path of the processing water 62 from the branch part 80b in the branch drainage supply path 76 to the processing water nozzle 64 may be called the processing water path 60 like 2nd Embodiment mentioned later.

  In FIG. 4, in the housing cleaning water nozzles 74a and 74b extending in the Y-axis direction, the cleaning water 72 sprayed from the spray ports 74c and 74d discretely provided in the Y-axis direction is indicated by broken arrows. Show.

  Returning to FIG. 5, the flow rate of the processing water 62 supplied to the processing point when the workpiece 11 is processed is adjusted by a valve 66 a disposed in the constant temperature water supply device 86. The valve 66a is an electromagnetic valve, and its opening / closing is appropriately controlled by a control unit (not shown). The valve 66a may be a manually operated valve.

  The water supply path 54 is connected to the upstream end of the cooling water path 50 provided in the spindle housing 38 via a chiller 86b and a valve 54a positioned downstream of the chiller 86b, which are respectively disposed in the constant temperature water supply device 86. . In the present embodiment, the flow path of the cooling water 52 from the branch portion 86 a in the constant temperature water supply device 86 to the spindle housing 38 is referred to as a water supply path 54.

  As shown in FIG. 4, the cooling water channel 50 is disposed inside the spindle housing 38 so that the whole spindle housing 38 can be cooled, for example. The cooling water channel 50 located inside the spindle housing 38 is indicated by a broken line.

  Returning to FIG. 5, the downstream end of the cooling water channel 50 is connected to the upstream end of the drainage channel 58. The drainage channel 58 of the present embodiment extends from the processing device 2 to the outside of the constant temperature water supply device 86 via a valve 82b provided in the constant temperature water supply device 86. The downstream end of the drainage channel 58 is connected to a wastewater treatment device (not shown) or the like. In the present embodiment, the flow path of the cooling water 52 inside the spindle housing 38 is referred to as a cooling water path 50.

  The flow rate of the cooling water 52 is adjusted by a valve 54 a disposed in the constant temperature water supply device 86. Similarly to the valve 66a, the valve 54a is an electromagnetic valve whose opening / closing is appropriately controlled by a control unit (not shown), but may be a manually operated valve. Valves 82a and 82b described later are similarly electromagnetic valves or manually operated valves.

  The drainage channel 58 is provided with a branching portion 80 a that branches from the drainage channel 58 to the branch drainage supply channel 76. The upstream end of the branch drainage supply path 76 is connected to the branch portion 80a, and the downstream end of the branch drainage supply path 76 is connected to the housing cleaning water nozzle 74 (74a and 74b).

  In the present embodiment, the cooling water 52 is discharged from the spindle housing 38 after flowing through the cooling water passage 50 in the spindle housing 38, and is discharged to a wastewater treatment device (not shown) or the like via the valve 82b. The flow path of the cooling water 52 is referred to as a drainage path 58.

  When the valve 82 b is in the open state, the cooling water 52 that has not branched from the branching portion 80 a to the branch drainage supply path 76 is discharged through the drainage path 58. The valve 82b is basically in an open state during processing, but may be closed at an appropriate timing during processing to ensure the water pressure of the cleaning water 72 during cleaning.

  The branch drainage supply path 76 is provided with a valve 82a. The valve 82 a adjusts the flow rate of the cleaning water 72 supplied to the housing cleaning water nozzle 74. As described above, after the processing of the workpiece 11 is finished, the valve 82a is opened, and a part of the cooling water 52 is supplied to the housing cleaning water nozzle 74 as the cleaning water 72.

  Thereby, the spindle housing 38 is cleaned. In the present embodiment, since a part of the cooling water 52 flowing to the drainage channel 58 is reused as the cleaning water 72, the used cooling water 52 can be used effectively.

  FIG. 6 is a schematic diagram for explaining the reuse of the cooling water 52 in the second embodiment. In this embodiment, arrangement | positioning of the process water channel 60 differs from 1st Embodiment. In the present embodiment, a branch portion 80b is provided in the branch drainage supply path 76 between the valve 82a and the housing cleaning nozzle 74, the upstream end of the processing water channel 60 is connected to the branch portion 80b, and the downstream end of the processing water channel 60 Is connected to the processing water nozzle 64.

  Further, in the present embodiment, the branch portion 86 a that is disposed in the constant temperature water supply device 86 and connected to the liquid supply source 84 is not provided. Therefore, the upstream end of the water supply channel 54 is connected to the liquid supply source 84. Therefore, in the present embodiment, the flow path of the cooling water 52 between the liquid supply source 84 and the spindle housing 38 is referred to as a water supply path 54.

  In the present embodiment, the flow rates of the processing water 62 and the cleaning water 72 are both adjusted by the valve 82a. However, in the modification of the present embodiment, the flow rates of the processing water 62 and the cleaning water 72 may be adjusted by independent valves. Also in this embodiment, the used cooling water 52 can be used effectively.

  When processing a workpiece 11 such as a package substrate and a ceramic substrate not provided with a precise circuit structure, a semiconductor substrate provided with a precise circuit structure (ie, a semiconductor substrate including a number of bare chips). As compared with the case of processing the above, even if the cooling water 52 after use is reused as the processing water 62, problems are less likely to occur.

  Therefore, when processing the workpiece 11 such as a package substrate, it is preferable to use the used cooling water 52 as the processing water 62 and the cleaning water 72. Thereby, the used cooling water 52 can be used more effectively.

  FIG. 7 is a schematic diagram for explaining the reuse of the cooling water 52 in the third embodiment. The third embodiment is similar to the first embodiment, but mainly differs in that the downstream end has a return portion 78 connected to the drainage channel 58 and the upstream end connected to the water supply channel 54.

  The return portion 78 includes a coupling portion 88a located between the branching portion 86a and the chiller 86b located in the water supply channel 54, and a coupling portion 88b located between the branching portion 80a and the valve 82b respectively located in the drainage channel 58. Between. The cooling water 52 that has entered the return portion 78 from the drainage channel 58 is temperature-adjusted in the chiller 86 b and reused as the cooling water 52.

  Thus, since the cooling water 52 discharged to the drainage channel 58 is circulated to the water supply channel 54, the used cooling water 52 in the cooling channel 50 can be reused as new cooling water 52. Therefore, the used cooling water 52 can be used more effectively than in the first and second embodiments.

  Further, in the present embodiment, the cooling water 52 that has flowed through the cooling water channel 50 and returned to the water supply channel 54 is reused for a certain period (for example, one month). All the cooling water 52 is discharged from 58. Thereby, compared with 1st and 2nd embodiment which continues supplying new cooling water 52 from the liquid supply source 84, the load to the chiller 86b can be reduced.

  The flow rate (l / min) of the cleaning water 72 is adjusted by the valve 82a so as to be smaller than the flow rate (l / min) of the cooling water 52 flowing in the spindle housing 38. By adjusting the valve 82a in this way, the cooling water 52 flowing in the spindle housing 38 is not insufficient, and a cleaning effect can be achieved.

  In the present embodiment, the amount of the cooling water 52 that circulates in the water supply channel 54, the cooling water channel 50, the drainage channel 58, and the return portion 78 is used as the cleaning water 72 in a certain period of time when the cooling water 52 is reused. Decrease by minutes. Therefore, in order to compensate for this decrease, the liquid is replenished from the liquid supply source 84 to the water supply channel 54.

  The replenishment of the liquid is started at an appropriate timing such as before the housing cleaning water nozzle 74 ejects the cleaning water 72, during the ejection, and after the ejection. The liquid replenished from the liquid supply source 84 to the water supply channel 54 is supplied at a flow rate ΔQ for a predetermined time, for example.

  In addition, in the modification of this embodiment, the cooling water 52 after use is processed water by arrange | positioning the branch part 86a downstream (for example, between the connection part 88a and the valve | bulb 54a) rather than the connection part 88a. 62 may be reused. Moreover, after arranging the branch part 86a on the upstream side of the coupling part 88a, the used cooling water 52 is supplied from the branch drainage supply path 76 to the processing water path 60 as the processing water 62 as in the second embodiment. It may be reused.

  In the first to third embodiments described above, the cooling water 52 is reused (first and second embodiments) when the cooling water 52 is disposed without being circulated, and the cooling water 52 is circulated. Although the reuse of the cooling water 52 when disposing later (third embodiment) has been described, the wastewater from the drainage section 98 may be further collected and reused.

  The processing device 2 of the first to third embodiments described above is a cutting device for cutting the workpiece 11, but may be a grinding device for grinding the workpiece 11. When the processing apparatus 2 is a grinding apparatus, each nozzle is disposed at an appropriate position for use as a grinding apparatus. In addition, the structure, method, and the like according to the above-described embodiment can be appropriately modified and implemented without departing from the scope of the object of the present invention.

2 Processing equipment (cutting equipment)
4 Base 4a, 4b, 4c Opening 6 Cassette elevator 8 Cassette 10 X-axis moving mechanism (machining feed unit)
10a Table cover 11 Work piece 12 Bellows cover 13 Adhesive tape (dicing tape)
14 Chuck table (holding table)
14a Holding surface 15 Frame 16 Clamp 18 Processing unit (cutting unit)
20 Support structure 22 Processing unit moving mechanism (index feed unit, cutting feed unit)
24 Y-axis guide rail 26 Y-axis moving plate 26a Y-axis pulse motor 28 Y-axis ball screw 30 Z-axis guide rail 32 Z-axis moving plate 34 Z-axis ball screw 36 Z-axis pulse motor 38 Spindle housing 40 Spindle 42 Grinding wheel tool (cutting blade)
46 Processing chamber 46a Top plate 46b, 46c Side plate 46d Partition plate 46e Opening 46f Protective cover 46g Exhaust port 48A Processing region 48B Detachable region 50 Cooling water channel 52 Cooling water 54 Water supply channel 54a Valve 58 Drain channel 60, 60a, 60b Processing channel 62 Process water 64, 64a, 64b Process water nozzle 66a Valve 72 Wash water 74, 74a, 74b Housing wash water nozzle 74c, 74d Injection port 76 Branch drainage supply path 78 Return part 80a, 80b Branch part 82a, 82b Valve 84 Liquid supply source 86 Constant temperature water supply device 86a Branching portion 86b Chillers 88a, 88b Joining portion 90 Imaging unit 92 Cleaning unit 94 Workpiece cleaning water nozzle 96 Cleaning table 98 Drainage portion 98a Fluid receiving portion 98b Drain pipe

Claims (2)

A chuck table for holding the workpiece;
A spindle on which a grindstone tool for processing the workpiece held on the chuck table is mounted;
A spindle housing that rotatably supports the spindle and includes a cooling water channel therein;
A machining water nozzle for injecting machining water for removing machining waste generated from the workpiece from the workpiece;
A housing cleaning water nozzle for injecting cleaning water for removing processing waste adhering to the spindle housing;
A water supply channel connected to the cooling water channel and supplying cooling water to the cooling water channel;
A drainage channel connected to the cooling channel and discharging the cooling water flowing through the cooling channel;
A branched drainage supply path branched from the drainage path and supplying a part of the cooling water to at least one of the processing water nozzle and the housing washing water nozzle;
A processing apparatus comprising:   The processing apparatus according to claim 1, further comprising a valve provided in the branch drainage supply path.