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TWI623001B - Device for manufacturing coil parts - Google Patents

Device for manufacturing coil parts Download PDF

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Publication number
TWI623001B
TWI623001B TW106122772A TW106122772A TWI623001B TW I623001 B TWI623001 B TW I623001B TW 106122772 A TW106122772 A TW 106122772A TW 106122772 A TW106122772 A TW 106122772A TW I623001 B TWI623001 B TW I623001B
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TW
Taiwan
Prior art keywords
laser
core
dust
wire
laser oscillator
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Application number
TW106122772A
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Chinese (zh)
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TW201807721A (en
Inventor
村上隆史
三宅和夫
橫邦元
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村田製作所股份有限公司
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Publication of TW201807721A publication Critical patent/TW201807721A/en
Application granted granted Critical
Publication of TWI623001B publication Critical patent/TWI623001B/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/06Coil winding
    • H01F41/064Winding non-flat conductive wires, e.g. rods, cables or cords
    • H01F41/066Winding non-flat conductive wires, e.g. rods, cables or cords with insulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/06Coil winding
    • H01F41/076Forming taps or terminals while winding, e.g. by wrapping or soldering the wire onto pins, or by directly forming terminals from the wire

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Cores, Coils, And Magnets (AREA)
  • Laser Beam Processing (AREA)
  • Coil Winding Methods And Apparatuses (AREA)

Abstract

本發明提供一種可防止由粉塵所導致之雷射振盪器之故障之線圈零件之製造裝置。 The invention provides a manufacturing device for a coil part which can prevent the failure of a laser oscillator caused by dust.

本發明之線圈零件之製造裝置具有:芯支持部,其支持芯;噴嘴,其對芯陸續送出導線;雷射振盪器,其對導線照射雷射光而將導線之絕緣膜之至少一部分剝離;雷射保護玻璃,其配置於導線中之被照射雷射光之被照射部分與雷射振盪器之間,且使自雷射振盪器射出之雷射光透過;及粉塵去除機構,其於雷射保護玻璃中之導線側之一面產生氣流,並對雷射保護玻璃之一面之粉塵進行抽吸,而將雷射保護玻璃之一面之粉塵去除。 The coil component manufacturing device of the present invention includes a core supporting portion that supports the core, a nozzle that successively sends out a wire to the core, and a laser oscillator that irradiates the wire with laser light to peel off at least a part of the insulating film of the wire; A laser protective glass, which is arranged between the irradiated portion of the irradiated laser light in the wire and the laser oscillator, and transmits the laser light emitted from the laser oscillator; and a dust removing mechanism, which is in the laser protective glass One side of the lead wire generates airflow and sucks dust on one side of the laser protective glass, and removes dust on one side of the laser protective glass.

Description

線圈零件之製造裝置 Device for manufacturing coil parts

本發明係關於一種線圈零件之製造裝置。 The invention relates to a manufacturing device for a coil part.

先前,作為線圈零件之製造裝置,有日本特開2009-224599號公報(專利文獻1)中所記載者。該製造裝置係於將導線捲繞於芯之中途,自雷射振盪器對導線之絕緣膜照射雷射光,而將導線之絕緣膜剝離。 Conventionally, as a manufacturing apparatus of a coil component, there exists what is described in Unexamined-Japanese-Patent No. 2009-224599 (patent document 1). This manufacturing device is based on winding a lead wire around a core, radiating laser light from the laser oscillator to the insulating film of the lead wire, and peeling off the insulating film of the lead wire.

[先前技術文獻] [Prior technical literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2009-224599號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2009-224599

然而,於實際使用上述習知之線圈零件之製造裝置時,發現有以下問題。 However, when the conventional coil component manufacturing apparatus was actually used, the following problems were found.

對導線之絕緣膜照射雷射光而將絕緣膜剝離時,會產生粉塵。並且,有該粉塵進入雷射振盪器內而雷射振盪器發生故障之虞。於雷射振盪器發生故障之情形時,雷射振盪器之維護之成本增大。 When the insulating film of a lead is irradiated with laser light and the insulating film is peeled off, dust is generated. In addition, the dust may enter the laser oscillator and the laser oscillator may fail. In the event of a laser oscillator failure, the cost of laser oscillator maintenance increases.

因此,本發明之課題在於提供一種可防止由粉塵所導致之雷射振盪器之故障之線圈零件之製造裝置。 Therefore, an object of the present invention is to provide a manufacturing device for a coil part which can prevent a failure of a laser oscillator caused by dust.

為了解決上述課題,本發明之線圈零件之製造裝置係製造線圈零件者,該線圈零件具有:芯;導線,其捲繞於該芯,且利用絕緣膜將導體覆蓋而成;及電極,其設置於該芯,且與該導線連接;該線圈零件之製造裝置具備:芯支持部,其支持上述芯;噴嘴,其對上述芯陸續送出上述導線;雷射振盪器,其對上述導線照射雷射光而將上述導線之絕緣膜之至少一部分剝離;雷射保護玻璃,其配置於上述導線中之被照射雷射光之被照射部分與上述雷射振盪器之間,且使自上述雷射振盪器射出之雷射光透過;及粉塵去除機構,其於上述雷射保護玻璃中之上述導線側之一面產生氣流,並對上述雷射保護玻璃之上述一面之粉塵進行抽吸,而將上述雷射保護玻璃之上述一面之粉塵去除。 In order to solve the above-mentioned problems, the coil component manufacturing apparatus of the present invention is a coil component manufacturer. The coil component has a core, a wire wound around the core, and a conductor covered with an insulating film; and an electrode, which is provided. The core is connected to the wire, and the manufacturing device of the coil component includes a core supporting part that supports the core, a nozzle that successively sends the wire to the core, and a laser oscillator that irradiates the wire with laser light. At least a part of the insulating film of the wire is peeled off; a laser protective glass is arranged between the irradiated portion of the wire where the laser light is irradiated and the laser oscillator, and is emitted from the laser oscillator Laser light transmission; and a dust removing mechanism that generates airflow on one side of the lead wire side in the laser protective glass, and sucks dust on the one side of the laser protective glass, and the laser protective glass Removal of dust on the above side.

根據本發明之線圈零件之製造裝置,雷射保護玻璃配置於導線之被照射部分與雷射振盪器之間,且使自雷射振盪器射出之雷射光透過。藉此,雖然於藉由雷射光之照射將絕緣膜剝離時會產生粉塵,但是雷射保護玻璃防止粉塵進入雷射振盪器。因此,可防止雷射振盪器因粉塵而發生故障。 According to the coil component manufacturing device of the present invention, the laser protective glass is disposed between the irradiated portion of the wire and the laser oscillator, and transmits laser light emitted from the laser oscillator. Thereby, although dust is generated when the insulating film is peeled off by irradiation with laser light, the laser protection glass prevents dust from entering the laser oscillator. Therefore, failure of the laser oscillator due to dust can be prevented.

又,粉塵去除機構係於雷射保護玻璃之一面產生氣流,並對 雷射保護玻璃之一面之粉塵進行抽吸,而將雷射保護玻璃之一面之粉塵去除。藉此,防止粉塵附著於雷射保護玻璃之一面。因此,粉塵不會遮擋雷射光之光路。 In addition, the dust removing mechanism is attached to one side of the laser protective glass to generate airflow, and The dust on one side of the laser protective glass is sucked, and the dust on one side of the laser protective glass is removed. This prevents dust from adhering to one side of the laser protective glass. Therefore, the dust does not block the light path of the laser light.

因此,可防止由粉塵所導致之雷射振盪器之故障,進而,可防止由粉塵所導致之雷射光之強度降低。 Therefore, failure of the laser oscillator caused by dust can be prevented, and further, the intensity of laser light caused by dust can be prevented from being lowered.

又,於線圈零件之製造裝置之一實施形態中,上述雷射保護玻璃配置於上述導線之被照射部分之下側,且上述雷射振盪器配置於上述雷射保護玻璃之下側。 Furthermore, in one embodiment of the manufacturing apparatus for the coil component, the laser protection glass is disposed below the irradiated portion of the lead wire, and the laser oscillator is disposed below the laser protection glass.

根據上述實施形態,雷射保護玻璃配置於導線之被照射部分之下側,且雷射振盪器配置於雷射保護玻璃之下側。藉此,自雷射振盪器射出之雷射光自下側通過雷射保護玻璃,並自下側對導線進行照射。因此,即便粉塵(尤其是固體狀態之粉塵)因重力之影響而掉落至雷射保護玻璃之一面,亦可藉由粉塵去除機構而將掉落之粉塵有效地去除。 According to the above embodiment, the laser protection glass is disposed on the lower side of the irradiated portion of the wire, and the laser oscillator is disposed on the lower side of the laser protection glass. Thereby, the laser light emitted from the laser oscillator passes through the laser protective glass from the lower side, and the lead is irradiated from the lower side. Therefore, even if the dust (especially solid dust) is dropped on one side of the laser protective glass due to the influence of gravity, the dropped dust can be effectively removed by the dust removing mechanism.

又,於線圈零件之製造裝置之一實施形態中,上述雷射保護玻璃配置於上述導線之被照射部分之上側,且上述雷射振盪器配置於上述雷射保護玻璃之上側。 Moreover, in one embodiment of the manufacturing apparatus of the coil component, the laser protection glass is disposed on an upper side of the irradiated portion of the lead wire, and the laser oscillator is disposed on an upper side of the laser protection glass.

根據上述實施形態,雷射保護玻璃配置於導線之被照射部分之上側,且雷射振盪器配置於雷射保護玻璃之上側。藉此,自雷射振盪器射出之雷射光自上側通過雷射保護玻璃,並自上側對導線進行照射。因此,即便粉塵因上升氣流之影響而上升直至到達雷射保護玻璃,亦可藉由粉塵去除機構而將已上升之粉塵有效地去除。 According to the above embodiment, the laser protection glass is disposed on the upper side of the irradiated portion of the lead wire, and the laser oscillator is disposed on the upper side of the laser protection glass. Thereby, the laser light emitted from the laser oscillator passes through the laser protection glass from the upper side, and the lead is irradiated from the upper side. Therefore, even if the dust rises due to the influence of the updraft until it reaches the laser protective glass, the ascended dust can be effectively removed by the dust removal mechanism.

又,於線圈零件之製造裝置之一實施形態中, 上述雷射振盪器具有第1雷射振盪器及第2雷射振盪器,且上述第1雷射振盪器與上述第2雷射振盪器配置於相對於上述導線之被照射部分相互對向之位置。 Furthermore, in one embodiment of a manufacturing apparatus for a coil part, The laser oscillator includes a first laser oscillator and a second laser oscillator, and the first laser oscillator and the second laser oscillator are disposed to face each other with respect to an irradiated portion of the lead wire. position.

此處,對向之位置係指第1雷射振盪器與第2雷射振盪器之雷射光之光軸可位於同軸上,亦可不位於同軸上。亦可為雷射光之光軸彼此平行且錯開既定距離。亦可為雷射光之光軸彼此以非平行之角度(179°等除180°以外之角度)相交。 Here, the opposite position means that the optical axes of the laser light of the first laser oscillator and the second laser oscillator may be located on the same axis or not. It is also possible that the optical axes of the laser light are parallel to each other and staggered by a predetermined distance. It is also possible that the optical axes of the laser light intersect each other at a non-parallel angle (an angle other than 180 ° such as 179 °).

根據上述實施形態,第1雷射振盪器與第2雷射振盪器係配置於相對於導線之被照射部分相互對向之位置,故而可自第1雷射振盪器及第2雷射振盪器照射雷射光而將導線之絕緣膜之全周剝離。 According to the above embodiment, the first laser oscillator and the second laser oscillator are disposed at positions facing each other with respect to the irradiated portion of the wire, so that the first laser oscillator and the second laser oscillator can be Irradiate the laser light to peel off the entire circumference of the insulating film of the wire.

又,於線圈零件之製造裝置之一實施形態中,上述雷射振盪器之雷射光之射出孔位於不與上述導線之被照射部分之正下方重疊而錯開之位置。 Moreover, in one embodiment of the manufacturing apparatus of the coil component, the laser light exit hole of the laser oscillator is located at a position that does not overlap with and is offset from directly below the irradiated portion of the wire.

根據上述實施形態,雷射振盪器之雷射光之射出孔位於不與導線之被照射部分之正下方重疊而錯開之位置,故而可自導線之被照射部分之斜下方照射雷射振盪器之雷射光。藉此,粉塵不會掉落至雷射振盪器之射出孔之正上方,而可防止雷射光之強度降低。 According to the above embodiment, the laser light exit hole of the laser oscillator is located at a position which does not overlap and stagger directly below the irradiated portion of the wire, so the laser oscillator can be irradiated from the obliquely below of the irradiated portion of the wire. Shoot light. Thereby, the dust will not fall directly above the exit hole of the laser oscillator, and the intensity of the laser light can be prevented from decreasing.

又,於線圈零件之製造裝置之一實施形態中,具有於上側安裝上述芯支持部之底板,上述雷射保護玻璃及上述雷射振盪器配置於上述底板之下側,且上述底板具有:貫通孔,其供自上述雷射振盪器射出之雷射光通過;及壁部,其將上述貫通孔之上側之開口端包圍。 Furthermore, in one embodiment of the manufacturing device for the coil component, a bottom plate on which the core support portion is mounted is provided, the laser protection glass and the laser oscillator are arranged below the bottom plate, and the bottom plate has: A hole through which laser light emitted from the laser oscillator passes; and a wall portion surrounding the open end on the upper side of the through hole.

根據上述實施形態,底板具有:貫通孔,其供自雷射振盪器射出之雷射光通過;及壁部,其將貫通孔之上側之開口端包圍。藉此,即便粉塵堆積於底板之上面,亦可藉由壁部而防止堆積之粉塵掉落至底板之貫通孔。 According to the above embodiment, the bottom plate includes a through hole through which laser light emitted from the laser oscillator passes, and a wall portion surrounding the open end on the upper side of the through hole. Thereby, even if dust is accumulated on the bottom plate, it is possible to prevent the accumulated dust from falling to the through hole of the bottom plate by the wall portion.

又,於線圈零件之製造裝置之一實施形態中,上述壁部之上部自上下方向觀察時與上述貫通孔重疊,且上述壁部之上部之開口寬度窄於上述貫通孔之上側之開口端之開口寬度。 In one embodiment of the coil component manufacturing device, the upper portion of the wall portion overlaps the through hole when viewed from above and below, and an opening width of the upper portion of the wall portion is narrower than an opening end of the upper side of the through hole. Opening width.

根據上述實施形態,壁部之上部自上下方向觀察時與貫通孔重疊,且壁部之上部之開口寬度窄於貫通孔之上側之開口端之開口寬度。藉此,壁部可進一步防止粉塵向底板之貫通孔掉落。 According to the above embodiment, the upper portion of the wall portion overlaps the through hole when viewed from the up and down direction, and the opening width of the upper portion of the wall portion is narrower than the opening width of the open end on the upper side of the through hole. Thereby, the wall portion can further prevent dust from falling into the through hole of the bottom plate.

又,於線圈零件之製造裝置之一實施形態中,上述粉塵去除機構具有:鼓風機,其對上述雷射保護玻璃之上述一面吹送空氣;及真空吸塵器,其對上述雷射保護玻璃之上述一面之粉塵進行抽吸。 Furthermore, in one embodiment of the manufacturing apparatus of the coil part, the dust removing mechanism includes: a blower that blows air to the one side of the laser protective glass; and a vacuum cleaner that applies one of the The dust is sucked.

根據上述實施形態,粉塵去除機構具有鼓風機及真空吸塵器。藉此,可使粉塵去除機構為簡單之構成。 According to the above embodiment, the dust removing mechanism includes a blower and a vacuum cleaner. Thereby, the dust removal mechanism can be made simple.

根據本發明之線圈零件之製造裝置,雷射保護玻璃配置於導線之被照射部分與雷射振盪器之間,且使自雷射振盪器射出之雷射光透過,故而可防止由粉塵所導致之雷射振盪器之故障。又,粉塵去除機構係於雷射保護玻璃之一面產生氣流,並對雷射保護玻璃之一面之粉塵進行抽吸,而將雷射保護玻璃之一面之粉塵去除,故而可防止由粉塵所導致之雷射光之強度降低。 According to the coil component manufacturing device of the present invention, the laser protective glass is arranged between the irradiated part of the wire and the laser oscillator, and transmits the laser light emitted from the laser oscillator, so that it can be prevented from being caused by dust. Failure of laser oscillator. In addition, the dust removing mechanism generates air flow on one side of the laser protective glass, and sucks the dust on one side of the laser protective glass to remove the dust on one side of the laser protective glass, so it can prevent the dust caused by the dust. The intensity of the laser light is reduced.

1‧‧‧線圈零件之製造裝置 1‧‧‧ Coil part manufacturing device

10‧‧‧芯 10‧‧‧ core

11‧‧‧第1凸緣部 11‧‧‧ the first flange

12‧‧‧第2凸緣部 12‧‧‧ 2nd flange

13‧‧‧捲芯部 13‧‧‧ core core

14‧‧‧第1電極 14‧‧‧The first electrode

15‧‧‧第2電極 15‧‧‧Second electrode

19‧‧‧第1噴嘴 19‧‧‧The first nozzle

20‧‧‧第2噴嘴 20‧‧‧ 2nd nozzle

21‧‧‧第1導線 21‧‧‧The first wire

21a‧‧‧被照射部分 21a‧‧‧Irradiated part

22‧‧‧第2導線 22‧‧‧ 2nd wire

22a‧‧‧被照射部分 22a‧‧‧Irradiated part

31‧‧‧第1雷射振盪器 31‧‧‧1st laser oscillator

31a‧‧‧射出孔 31a‧‧‧shot hole

32‧‧‧第2雷射振盪器 32‧‧‧ 2nd laser oscillator

32a‧‧‧射出孔 32a‧‧‧ shooting hole

41‧‧‧第1雷射保護玻璃 41‧‧‧The first laser protection glass

41a‧‧‧一面 41a‧‧‧ side

42‧‧‧第2雷射保護玻璃 42‧‧‧The second laser protection glass

42a‧‧‧一面 42a‧‧‧ side

51‧‧‧第1粉塵去除機構 51‧‧‧The first dust removal mechanism

52‧‧‧第2粉塵去除機構 52‧‧‧The second dust removal mechanism

55‧‧‧鼓風機 55‧‧‧blower

56‧‧‧真空吸塵器 56‧‧‧Vacuum cleaner

60‧‧‧芯支持部 60‧‧‧ core support department

61‧‧‧夾具 61‧‧‧Fixture

70、70A、70B‧‧‧底板 70, 70A, 70B‧‧‧ floor

71‧‧‧貫通孔 71‧‧‧through hole

71a‧‧‧開口端 71a‧‧‧ open end

72、72B‧‧‧壁部 72, 72B‧‧‧Wall

F‧‧‧粉塵 F‧‧‧ dust

L‧‧‧雷射光 L‧‧‧ laser light

H1‧‧‧(壁部之)開口寬度 H1‧‧‧ (of the wall) opening width

H2‧‧‧(貫通孔之)開口寬度 H2‧‧‧ (through hole) opening width

圖1係表示本發明之線圈零件之製造裝置之第1實施形態之簡略構成圖。 FIG. 1 is a schematic configuration diagram showing a first embodiment of a manufacturing apparatus for a coil part according to the present invention.

圖2係表示線圈零件之製造裝置之一部分之簡略立體圖。 Fig. 2 is a schematic perspective view showing a part of a manufacturing apparatus for a coil part.

圖3係說明藉由第1雷射振盪器照射雷射光時之狀態之說明圖。 FIG. 3 is an explanatory diagram illustrating a state when laser light is irradiated by the first laser oscillator.

圖4係說明藉由第2雷射振盪器照射雷射光時之狀態之說明圖。 FIG. 4 is an explanatory diagram illustrating a state when laser light is irradiated by a second laser oscillator.

圖5係說明將導線捲繞至芯之狀態之說明圖。 FIG. 5 is an explanatory diagram illustrating a state in which a wire is wound around a core.

圖6係表示本發明之線圈零件之製造裝置之第2實施形態之簡略構成圖。 Fig. 6 is a schematic configuration diagram showing a second embodiment of the manufacturing apparatus for a coil part according to the present invention.

圖7係表示本發明之線圈零件之製造裝置之第3實施形態之簡略構成圖。 Fig. 7 is a schematic configuration diagram showing a third embodiment of the coil component manufacturing apparatus of the present invention.

圖8係表示本發明之線圈零件之製造裝置之第4實施形態之簡略構成圖。 FIG. 8 is a schematic configuration diagram showing a fourth embodiment of a manufacturing apparatus for a coil part according to the present invention.

以下,藉由圖示之實施形態對本發明詳細地進行說明。 Hereinafter, the present invention will be described in detail with reference to the illustrated embodiments.

(第1實施形態) (First Embodiment)

圖1係表示本發明之線圈零件之製造裝置之第1實施形態之簡略構成圖。圖2係表示線圈零件之製造裝置之一部分之簡略立體圖。如圖1及圖2所示,線圈零件之製造裝置1具有:芯支持部60,其支持線圈零件之芯10;第1噴嘴19,其對芯10陸續送出第1導線21;及第2噴嘴20,其對芯10 陸續送出第2導線22。再者,於圖1中,省略第2噴嘴20及第2導線22而進行繪圖。 FIG. 1 is a schematic configuration diagram showing a first embodiment of a manufacturing apparatus for a coil part according to the present invention. Fig. 2 is a schematic perspective view showing a part of a manufacturing apparatus for a coil part. As shown in FIGS. 1 and 2, the coil component manufacturing device 1 includes a core support portion 60 that supports the core 10 of the coil component, a first nozzle 19 that successively sends a first lead 21 to the core 10, and a second nozzle 20 for its core 10 The second wire 22 is successively sent out. Note that in FIG. 1, the second nozzle 20 and the second lead 22 are omitted for drawing.

線圈零件之製造裝置1進而具有:第1雷射振盪器31,其對第1、第2導線21、22照射雷射光L而將第1、第2導線21、22之絕緣膜剝離;第1雷射保護玻璃41,其使自第1雷射振盪器31射出之雷射光L透過;及第1粉塵去除機構51,其將第1雷射保護玻璃41上之粉塵去除。 The coil component manufacturing device 1 further includes a first laser oscillator 31 that irradiates the first and second wires 21 and 22 with laser light L to peel off the insulating films of the first and second wires 21 and 22; The laser protective glass 41 transmits the laser light L emitted from the first laser oscillator 31, and the first dust removing mechanism 51 removes the dust on the first laser protective glass 41.

線圈零件之製造裝置1進而具有:第2雷射振盪器32,其對第1、第2導線21、22照射雷射光L而將第1、第2導線21、22之絕緣膜剝離;第2雷射保護玻璃42,其使自第2雷射振盪器32射出之雷射光L透過;及第2粉塵去除機構52,其將第2雷射保護玻璃42上之粉塵去除。 The coil component manufacturing device 1 further includes a second laser oscillator 32 that irradiates the first and second wires 21 and 22 with laser light L to peel off the insulating films of the first and second wires 21 and 22; the second The laser protective glass 42 transmits the laser light L emitted from the second laser oscillator 32; and the second dust removing mechanism 52 removes the dust on the second laser protective glass 42.

線圈零件之製造裝置1係藉由使芯10以芯10之捲芯部13之軸心A為旋轉軸進行旋轉而遍及芯10之捲芯部13之大致整體捲繞第1、第2導線21、22,而製造雙線(bifilar)構造之線圈零件。該線圈零件例如為共模扼流線圈(common mode choke coil)。 The coil component manufacturing device 1 is configured to rotate the core 10 around the entire core portion 13 of the core 10 by rotating the core 10 around the core A of the core portion 13 of the core 10 as a rotation axis. , 22, and manufacture coil parts with bifilar structure. The coil component is, for example, a common mode choke coil.

芯10具有:捲芯部13;第1凸緣部11,其設置於捲芯部13之一端;及第2凸緣部12,其設置於捲芯部13之另一端。作為芯10之材料,例如,使用氧化鋁(非磁體)、或Ni-Zn系鐵氧體(ferrite)(磁體、絕緣體)、或樹脂等材料。 The core 10 includes a core winding portion 13, a first flange portion 11 provided at one end of the core winding portion 13, and a second flange portion 12 provided at the other end of the core winding portion 13. As the material of the core 10, for example, materials such as alumina (non-magnet), Ni-Zn-based ferrite (magnet, insulator), or resin are used.

捲芯部13之形狀例如為長方體。第1凸緣部11之形狀及第2凸緣部12之形狀例如為矩形之平板。於第1凸緣部11之底面及第2凸緣部12之底面分別設置有第1電極14及第2電極15。第1、第2電極14、15之材料例如為Ag等。第1導線21之前端接合於芯10之第1凸緣部11之 第1電極14。第2導線22之前端接合於芯10之第1凸緣部11之第2電極15。芯10係以連結第1凸緣部11與第2凸緣部12之軸心A方向與Y方向一致之方式設置於XY面上。Z方向與上下方向一致。 The core portion 13 has a rectangular parallelepiped shape, for example. The shape of the first flange portion 11 and the shape of the second flange portion 12 are, for example, rectangular flat plates. A first electrode 14 and a second electrode 15 are provided on the bottom surface of the first flange portion 11 and the bottom surface of the second flange portion 12, respectively. The material of the first and second electrodes 14 and 15 is, for example, Ag. The front end of the first lead 21 is joined to the first flange portion 11 of the core 10. First electrode 14. The front end of the second lead 22 is bonded to the second electrode 15 of the first flange portion 11 of the core 10. The core 10 is provided on the XY plane so that the axial center A direction and the Y direction connecting the first flange portion 11 and the second flange portion 12 coincide with each other. The Z direction is the same as the up and down direction.

第1、第2導線21、22係呈線圈狀捲繞於捲芯部13,且利用絕緣膜將導體覆蓋而成。例如,導體由銅線所構成,絕緣膜由作為耐熱性材料之聚醯胺醯亞胺(polyamide-imide)(AIW)所構成。第1導線21藉由捲繞於芯10,而構成一次側線圈。第2導線22藉由捲繞於芯10,而構成二次側線圈。 The first and second lead wires 21 and 22 are wound around the core portion 13 in a coil shape, and the conductor is covered with an insulating film. For example, the conductor is made of copper wire, and the insulating film is made of polyamide-imide (AIW), which is a heat-resistant material. The first lead wire 21 is wound around the core 10 to form a primary-side coil. The second lead 22 is wound around the core 10 to form a secondary-side coil.

芯支持部60安裝於底板70之上側。底板70透過支持腳75而設置於水平面。芯支持部60以可保持芯10之一方之第1凸緣部11之方式構成。又,芯支持部60構成為以由芯支持部60支持之芯10之捲芯部13之軸心A為旋轉軸進行旋轉。將第1、第2導線21、22捲繞至芯10之捲芯部13時,藉由在利用芯支持部60支持芯10之狀態下旋轉,而芯10亦以捲芯部13之軸心A為旋轉軸進行旋轉,將自第1、第2噴嘴19、20拉出之第1、第2導線21、22捲繞至捲芯部13。 The core support portion 60 is mounted on the upper side of the bottom plate 70. The bottom plate 70 is provided on a horizontal plane through the support legs 75. The core support portion 60 is configured to hold the first flange portion 11 of one of the cores 10. The core support portion 60 is configured to rotate around the axis A of the core portion 13 of the core 10 supported by the core support portion 60 as a rotation axis. When the first and second wires 21 and 22 are wound around the core portion 13 of the core 10, the core 10 is rotated while the core 10 is supported by the core support portion 60, and the core 10 is also wound on the axis of the core portion 13. A is a rotating shaft that rotates, and the first and second wires 21 and 22 drawn from the first and second nozzles 19 and 20 are wound around the core portion 13.

又,於芯支持部60設置有夾具61,夾具61分別夾持自噴嘴18分別拉出之第1、第2導線21、22之一端,夾持於夾具61之第1、第2導線21、22之一端相對於芯支持部60被固定。因此,於使噴嘴18移動時,第1、第2導線21、22之一端被固定,故而伴隨著第1、第2噴嘴19、20之移動而將第1、第2導線21、22自第1、第2噴嘴19、20分別拉出。 A clamp 61 is provided on the core supporting portion 60. The clamp 61 clamps one end of the first and second wires 21 and 22 respectively drawn from the nozzle 18, and clamps the first and second wires 21 and 21 of the clamp 61. One end of 22 is fixed to the core support portion 60. Therefore, when the nozzle 18 is moved, one end of the first and second lead wires 21 and 22 is fixed. Therefore, the first and second lead wires 21 and 22 are moved from the first and second wires along with the movement of the first and second nozzles 19 and 20. 1. The second nozzles 19 and 20 are pulled out, respectively.

第1、第2雷射振盪器31、32分別向配置於芯10之附近位置之第1、第2導線21、22照射雷射光L,而將第1、第2導線21、22之 絕緣膜之至少一部分剝離。將第1、第2導線21、22中分別被照射雷射光L之部分設為被照射部分21a、22a。關於被照射部分21a、22a,於圖1中,以黑圓點表示,於圖2中,以影線表示。 The first and second laser oscillators 31 and 32 irradiate the laser light L to the first and second wires 21 and 22 arranged near the core 10, respectively, and the first and second wires 21 and 22 respectively At least a part of the insulating film is peeled. The portions to be irradiated with the laser light L among the first and second lead wires 21 and 22 are irradiated portions 21a and 22a, respectively. The irradiated portions 21a and 22a are indicated by black dots in FIG. 1 and hatched in FIG. 2.

此處,第1、第2雷射振盪器31、32各自可一面使雷射光L掃描,一面照射300毫米見方之範圍,使第1、第2導線21、22配置於該300毫米見方之雷射照射範圍而分別照射雷射光L。再者,1次之照射時間為約數ms左右,即便連續照射多次而進行多次剝離,整體所耗費之時間亦成為約1秒以內。 Here, each of the first and second laser oscillators 31 and 32 can scan the laser light L while irradiating a range of 300 mm square, and the first and second wires 21 and 22 can be arranged in the 300 mm square light. The laser beam L is irradiated into the irradiation range. In addition, the irradiation time for one time is about several ms, and even if the continuous irradiation is performed multiple times and the peeling is performed multiple times, the overall time taken is within about one second.

雷射光L例如為二次諧波(SHG(second harmonic generation))之雷射光,該雷射之波長為約532nm左右。因此,可透過由作為耐熱性材料之聚醯胺醯亞胺所構成之各第1、第2導線21、22之絕緣膜,從而可於絕緣膜與各第1、第2導線21、22之界面位置將絕緣膜最佳地去除。 The laser light L is, for example, laser light of a second harmonic generation (SHG), and the wavelength of the laser is about 532 nm. Therefore, it is possible to pass through the insulating film of each of the first and second wires 21 and 22 made of polyimide and imine, which is a heat-resistant material. The interface position optimally removes the insulating film.

第1雷射振盪器31與第2雷射振盪器32配置於相對於第1導線21之被照射部分21a及第2導線22之被照射部分22a相互對向之位置。此處,對向之位置係指第1雷射振盪器31與第2雷射振盪器32之雷射光L之光軸可位於同軸上,亦可不位於同軸上。亦可為雷射光L之光軸彼此平行且錯開既定距離。亦可為雷射光L之光軸彼此以非平行之角度(179°等除180°以外之角度)相交。 The first laser oscillator 31 and the second laser oscillator 32 are disposed at positions where the irradiated portion 21a of the first lead 21 and the irradiated portion 22a of the second lead 22 face each other. Here, the opposite position means that the optical axes of the laser light L of the first laser oscillator 31 and the second laser oscillator 32 may be located on the same axis or not. The optical axes of the laser light L may be parallel to each other and staggered by a predetermined distance. The optical axes of the laser light L may intersect at a non-parallel angle (an angle other than 180 °, such as 179 °).

第1雷射振盪器31配置於第1、第2導線21、22之被照射部分21a、22a之下側,第2雷射振盪器32配置於第1、第2導線21、22之被照射部分21a、22a之上側。藉此,可自第1雷射振盪器31及第2雷射振盪器32照射雷射光L,而將第1、第2導線21、22之絕緣膜之全周剝離。 因此,可進一步縮短剝離絕緣膜所需之步驟作業時間(產距時間)。 The first laser oscillator 31 is arranged below the irradiated portions 21a and 22a of the first and second wires 21 and 22, and the second laser oscillator 32 is arranged under the irradiated portions of the first and second wires 21 and 22. Parts 21a, 22a are on the upper side. Thereby, the laser light L can be irradiated from the 1st laser oscillator 31 and the 2nd laser oscillator 32, and the whole periphery of the insulating film of the 1st, 2nd lead 21, 22 can be peeled. Therefore, it is possible to further shorten the time required for the steps (the distance between steps) required for peeling the insulating film.

第1雷射振盪器31配置於底板70之下側。底板70具有供自第1雷射振盪器31射出之雷射光L通過之貫通孔71。貫通孔71例如形成為狹縫狀,而使雷射光L可沿著狹縫進行掃描。 The first laser oscillator 31 is disposed below the bottom plate 70. The bottom plate 70 has a through hole 71 through which the laser light L emitted from the first laser oscillator 31 passes. The through hole 71 is formed in a slit shape, for example, so that the laser light L can be scanned along the slit.

第1雷射保護玻璃41配置於第1、第2導線21、22之被照射部分21a、22a與第1雷射振盪器31之間,且使自第1雷射振盪器31射出之雷射光L透過。第1雷射保護玻璃41配置於第1、第2導線21、22之被照射部分21a、22a之下側,第1雷射振盪器31配置於第1雷射保護玻璃41之下側。第1雷射保護玻璃41配置於底板70之下側。底板70之貫通孔71於上下方向與第1雷射保護玻璃41重疊。 The first laser protective glass 41 is disposed between the irradiated portions 21a and 22a of the first and second lead wires 21 and 22 and the first laser oscillator 31, and allows laser light emitted from the first laser oscillator 31 to be emitted. L through. The first laser protection glass 41 is disposed below the irradiated portions 21a and 22a of the first and second wires 21 and 22, and the first laser oscillator 31 is disposed below the first laser protection glass 41. The first laser protection glass 41 is disposed below the bottom plate 70. The through hole 71 of the bottom plate 70 overlaps the first laser protection glass 41 in the vertical direction.

第2雷射保護玻璃42配置於第1、第2導線21、22之被照射部分21a、22a與第2雷射振盪器32之間,且使自第2雷射振盪器32射出之雷射光L透過。第2雷射保護玻璃42配置於第1、第2導線21、22之被照射部分21a、22a之上側,第2雷射振盪器32配置於第2雷射保護玻璃42之上側。第2雷射保護玻璃42配置於底板70之上側。 The second laser protection glass 42 is disposed between the irradiated portions 21a and 22a of the first and second lead wires 21 and 22 and the second laser oscillator 32, and allows laser light emitted from the second laser oscillator 32 to be emitted. L through. The second laser protection glass 42 is disposed on the upper side of the irradiated portions 21 a and 22 a of the first and second leads 21 and 22, and the second laser oscillator 32 is disposed on the upper side of the second laser protection glass 42. The second laser protection glass 42 is disposed on the upper side of the bottom plate 70.

第1粉塵去除機構51係於第1雷射保護玻璃41中之導線21、22側之一面41a(於本實施形態中為上面)產生氣流,並對第1雷射保護玻璃41之一面41a之粉塵進行抽吸,而將第1雷射保護玻璃41之一面41a之粉塵去除。第1粉塵去除機構51具有:鼓風機55,其對第1雷射保護玻璃41之一面41a吹送空氣;及真空吸塵器56,其對第1雷射保護玻璃41之一面41a之粉塵進行抽吸。鼓風機55與真空吸塵器56係以鼓風機55之吹出側與真空吸塵器56之吸入側對向之方式配置於第1雷射保護玻璃41 之一面41a側。如此,第1粉塵去除機構51由鼓風機55及真空吸塵器56所構成,故而可使第1粉塵去除機構51為簡單之構成。 The first dust removing mechanism 51 is formed on one surface 41a (the upper surface in the present embodiment) of one side of the leads 21 and 22 of the first laser protective glass 41, and generates airflow to one of the surfaces 41a of the first laser protective glass 41. The dust is sucked, and the dust on one surface 41a of the first laser protective glass 41 is removed. The first dust removing mechanism 51 includes a blower 55 that blows air on one surface 41 a of the first laser protective glass 41, and a vacuum cleaner 56 that sucks dust on one surface 41 a of the first laser protective glass 41. The blower 55 and the vacuum cleaner 56 are arranged on the first laser protective glass 41 so that the blow-out side of the blower 55 and the suction side of the vacuum cleaner 56 face each other. One surface 41a side. As described above, the first dust removing mechanism 51 is constituted by the blower 55 and the vacuum cleaner 56. Therefore, the first dust removing mechanism 51 can be made simple.

第2粉塵去除機構52係於第2雷射保護玻璃42中之導線21、22側之一面42a(於本實施形態中為下表面)產生氣流,並對第2雷射保護玻璃42之一面42a之粉塵進行抽吸,而將第2雷射保護玻璃42之一面42a之粉塵去除。第2粉塵去除機構52與第1粉塵去除機構51同樣地具有:鼓風機55,其對第2雷射保護玻璃42之一面42a吹送空氣;及真空吸塵器56,其對第2雷射保護玻璃42之一面42a之粉塵進行抽吸。 The second dust removing mechanism 52 is a surface 42a (lower surface in the present embodiment) on one surface 42a (the lower surface in this embodiment) of the second laser protective glass 42 on the one side of the lead wires 21 and 22, and generates a current on the one surface 42a of the second laser protective glass 42. The dust is sucked, and the dust on one surface 42a of the second laser protection glass 42 is removed. The second dust removing mechanism 52 includes, similarly to the first dust removing mechanism 51, a blower 55 that blows air to one surface 42a of the second laser protective glass 42 and a vacuum cleaner 56 that applies air to the second laser protective glass 42. The dust on one side 42a is sucked.

其次,對線圈零件之製造方法進行說明。於線圈零件之製造方法中,將2根第1、第2導線21、22同時捲繞至芯10,並分別接合於第1、第2電極14、15。以下,對該步驟進行詳細說明。 Next, the manufacturing method of a coil component is demonstrated. In the manufacturing method of the coil component, two first and second lead wires 21 and 22 are wound around the core 10 at the same time and are respectively bonded to the first and second electrodes 14 and 15. This step will be described in detail below.

如圖2所示,藉由芯支持部60抓持芯10之一方之第1凸緣部11並將其固定。此處,芯10可以芯10之捲芯部13之軸心A為旋轉軸進行旋轉。 As shown in FIG. 2, the first flange portion 11 of one of the cores 10 is grasped and fixed by the core support portion 60. Here, the core 10 can be rotated by using the axis A of the wound core portion 13 of the core 10 as a rotation axis.

繼而,自第1、第2噴嘴19、20分別將第1、第2導線21、22拉出,並利用夾具61夾持各第1、第2導線21、22之一端而使之相對於芯支持部60固定。 Then, the first and second lead wires 21 and 22 are respectively pulled out from the first and second nozzles 19 and 20, and one end of each of the first and second lead wires 21 and 22 is clamped by the clamp 61 to be opposed to the core. The support part 60 is fixed.

繼而,分別將接合於第1凸緣部11之第1、第2電極14、15之第1、第2導線21、22之接合部位之絕緣膜全周剝離。具體而言,使第1、第2導線21、22之接合部位移動至第1、第2雷射振盪器31、32之雷射光L之照射範圍,並自第1、第2雷射振盪器31、32照射雷射光L,而將第1、第2導線21、22之被照射部分21a、21b之絕緣膜全周剝離。 Then, the insulating film which is bonded to the joint portions of the first and second electrodes 14 and 15 of the first flange portion 11 and the first and second lead wires 21 and 22 is peeled off all around. Specifically, the joints of the first and second lead wires 21 and 22 are moved to the irradiation range of the laser light L of the first and second laser oscillators 31 and 32, and from the first and second laser oscillators. 31 and 32 irradiate the laser light L, and the insulation films of the irradiated portions 21a and 21b of the first and second lead wires 21 and 22 are peeled off all around.

此處,對藉由第1雷射振盪器31照射雷射光L時之狀態進行說明。如圖3所示,自第1雷射振盪器31射出之雷射光L自下側通過第1雷射保護玻璃41,並自下側對第1導線21進行照射。再者,關於第2導線22,亦與第1導線21同樣,故而省略其說明。 Here, a state when the laser light L is irradiated by the first laser oscillator 31 will be described. As shown in FIG. 3, the laser light L emitted from the first laser oscillator 31 passes through the first laser protective glass 41 from the lower side, and irradiates the first lead 21 from the lower side. The second lead wire 22 is also the same as the first lead wire 21, and a description thereof will be omitted.

於藉由照射雷射光L而將第1導線21之被照射部分21a之絕緣膜剝離時,會產生粉塵F。粉塵F(尤其是固體狀態之粉塵F)會因重力之影響而通過底板70之貫通孔71,並朝第1雷射振盪器31側掉落。於圖3中,為了易於理解,將粉塵F之量描繪得較多。此時,第1雷射保護玻璃41防止粉塵F進入第1雷射振盪器31。因此,可防止第1雷射振盪器31因粉塵F而發生故障。 When the insulating film of the irradiated portion 21a of the first lead 21 is peeled by irradiating the laser light L, dust F is generated. Dust F (especially, dust F in a solid state) passes through the through hole 71 of the bottom plate 70 due to the influence of gravity, and falls toward the first laser oscillator 31 side. In FIG. 3, for ease of understanding, the amount of dust F is depicted in large amounts. At this time, the first laser protective glass 41 prevents dust F from entering the first laser oscillator 31. Therefore, failure of the first laser oscillator 31 due to the dust F can be prevented.

進而,第1粉塵去除機構51之鼓風機55對第1雷射保護玻璃41之一面41a吹送空氣,第1粉塵去除機構51之真空吸塵器56對第1雷射保護玻璃41之一面41a之粉塵F進行抽吸。藉此,即便粉塵F掉落至第1雷射保護玻璃41之一面41a,亦可藉由第1粉塵去除機構51而將掉落之粉塵F去除,從而防止粉塵F堆積於第1雷射保護玻璃41之一面41a。因此,粉塵F不會遮擋雷射光L之光路。 Furthermore, the blower 55 of the first dust removal mechanism 51 blows air to one surface 41a of the first laser protection glass 41, and the vacuum cleaner 56 of the first dust removal mechanism 51 performs dust F to the one surface 41a of the first laser protection glass 41 Suction. Thereby, even if the dust F falls on one surface 41a of the first laser protective glass 41, the dropped dust F can be removed by the first dust removing mechanism 51, thereby preventing the dust F from accumulating on the first laser protection. One surface 41a of the glass 41. Therefore, the dust F does not block the optical path of the laser light L.

如此,線圈零件之製造裝置1具有第1雷射保護玻璃41及第1粉塵去除機構51,故而可防止由粉塵F所導致之第1雷射振盪器31之故障,進而,可防止由粉塵F所導致之雷射光L之強度降低。 In this way, the coil component manufacturing device 1 includes the first laser protective glass 41 and the first dust removing mechanism 51, so that the failure of the first laser oscillator 31 caused by the dust F can be prevented, and furthermore, the dust F can be prevented. The resulting intensity of the laser light L decreases.

繼而,對藉由第2雷射振盪器32照射雷射光L時之狀態進行說明。如圖4所示,自第2雷射振盪器32射出之雷射光L自上側通過第2雷射保護玻璃42,並自上側對第1導線21進行照射。再者,關於第2導 線22,亦與第1導線21同樣,故而省略其說明。 Next, a state when the laser light L is irradiated by the second laser oscillator 32 will be described. As shown in FIG. 4, the laser light L emitted from the second laser oscillator 32 passes through the second laser protective glass 42 from the upper side, and irradiates the first lead 21 from the upper side. Furthermore, regarding the second guide Since the line 22 is also the same as the first lead 21, its description is omitted.

於藉由照射雷射光L而將第1導線21之被照射部分21a之絕緣膜剝離時,會產生粉塵F。粉塵F會因上升氣流之影響而上升直至到達第2雷射保護玻璃42。於圖4中,為了易於理解,將粉塵F之量描繪得較多。此時,第2雷射保護玻璃42防止粉塵F進入第2雷射振盪器32。因此,可防止第2雷射振盪器32因粉塵F而發生故障。 When the insulating film of the irradiated portion 21a of the first lead 21 is peeled by irradiating the laser light L, dust F is generated. The dust F rises under the influence of the updraft until it reaches the second laser protective glass 42. In FIG. 4, in order to facilitate understanding, the amount of dust F is depicted more. At this time, the second laser protective glass 42 prevents dust F from entering the second laser oscillator 32. Therefore, it is possible to prevent the second laser oscillator 32 from malfunctioning due to the dust F.

進而,第2粉塵去除機構52之鼓風機55對第2雷射保護玻璃42之一面42a吹送空氣,第2粉塵去除機構52之真空吸塵器56對第2雷射保護玻璃42之一面42a之粉塵F進行抽吸。藉此,即便粉塵F到達至第2雷射保護玻璃42之一面42a,亦可藉由第2粉塵去除機構52而將已上升之粉塵F去除,從而防止粉塵F附著於第2雷射保護玻璃42之一面42a。因此,粉塵F不會遮擋雷射光L之光路。 Furthermore, the blower 55 of the second dust removal mechanism 52 blows air to one surface 42a of the second laser protection glass 42, and the vacuum cleaner 56 of the second dust removal mechanism 52 performs dust F to the one surface 42a of the second laser protection glass 42 Suction. Thereby, even if the dust F reaches the first surface 42 a of the second laser protective glass 42, the raised dust F can be removed by the second dust removing mechanism 52, thereby preventing the dust F from adhering to the second laser protective glass. 42 一个 面 42a。 42 one surface 42a. Therefore, the dust F does not block the optical path of the laser light L.

如此,線圈零件之製造裝置1具有第2雷射保護玻璃42及第2粉塵去除機構52,故而可防止由粉塵F所導致之第2雷射振盪器32之故障,進而,可防止由粉塵F所導致之雷射光L之強度降低。 In this way, the coil component manufacturing device 1 includes the second laser protection glass 42 and the second dust removing mechanism 52, so that the failure of the second laser oscillator 32 caused by the dust F can be prevented, and furthermore, the dust F can be prevented. The resulting intensity of the laser light L decreases.

其後,將第1、第2導線21、22捲繞至芯10之捲芯部13。如圖5所示,一面使芯10及芯支持部60以由芯支持部60支持之芯10之捲芯部13之軸心A為旋轉軸進行旋轉,一面使第1、第2噴嘴19、20於芯10之捲芯部13之軸向上移動,而遍及捲芯部13整體捲繞第1、第2導線21、22。然後,於最終圈之前1圈之捲繞動作完成之時間點停止芯支持部60進行之旋轉動作,而停止捲繞動作。 Thereafter, the first and second lead wires 21 and 22 are wound around the wound core portion 13 of the core 10. As shown in FIG. 5, while rotating the core 10 and the core support portion 60 around the axis A of the core portion 13 of the core 10 supported by the core support portion 60 as a rotation axis, the first and second nozzles 19, 20 moves in the axial direction of the core portion 13 of the core 10, and the first and second wires 21 and 22 are wound around the entire core portion 13 as a whole. Then, at the time point when the winding operation is completed 1 turn before the final lap, the rotation operation by the core support portion 60 is stopped, and the winding operation is stopped.

繼而,分別將連接於第2凸緣部12之第1、第2電極14、 15之第1、第2導線21、22之連接部位之絕緣膜全周剝離。具體而言,使第1、第2導線21、22之連接部位移動至第1、第2雷射振盪器31、32之雷射光L之照射範圍,並自第1、第2雷射振盪器31、32照射雷射光L,而將第1、第2導線21、22之被照射部分21a、21b之絕緣膜全周剝離。此處,藉由第1、第2雷射振盪器31、32照射雷射光L時之狀態係如利用上述圖3、圖4所說明般。 Then, the first and second electrodes 14 connected to the second flange portion 12 and The insulation films at the connection portions of the first and second lead wires 21 and 22 of 15 are peeled off all around. Specifically, the connection portions of the first and second lead wires 21 and 22 are moved to the irradiation range of the laser light L of the first and second laser oscillators 31 and 32, and from the first and second laser oscillators. 31 and 32 irradiate the laser light L, and the insulation films of the irradiated portions 21a and 21b of the first and second lead wires 21 and 22 are peeled off all around. Here, the state when the laser light L is irradiated by the first and second laser oscillators 31 and 32 is as described using FIG. 3 and FIG. 4 described above.

其後,進行最終圈之捲繞動作。即,將第1、第2導線21、22於芯10之捲芯部13僅捲繞1圈。藉此,第1、第2導線21、22向捲芯部13之所有捲繞動作完成。 Thereafter, the winding operation of the final loop is performed. That is, the first and second lead wires 21 and 22 are wound around the core portion 13 of the core 10 only once. Thereby, all winding operations of the first and second lead wires 21 and 22 to the winding core portion 13 are completed.

然後,藉由熱壓接或雷射焊接而將第1、第2導線21、22之捲繞開始之剝離部位(連接部位)與第1凸緣部11之第1、第2電極14、15連接,進而,藉由熱壓接或雷射焊接而將第1、第2導線21、22之捲繞結束之剝離部位(連接部位)與第2凸緣部12之第1、第2電極14、15連接。 Then, the peeling portion (connection portion) at which winding of the first and second lead wires 21 and 22 is started and the first and second electrodes 14 and 15 of the first flange portion 11 are performed by thermocompression bonding or laser welding. The connection is performed, and further, the peeling portion (connecting portion) where winding of the first and second lead wires 21 and 22 is completed and the first and second electrodes 14 of the second flange portion 12 by thermocompression bonding or laser welding. , 15 connections.

最後,使未圖示之切割器依序移動至芯10之第1、第2凸緣部11、12附近之位置,將各第1、第2導線21、22之一端(始端)部及另一端(終端)部分別切斷。藉此,製造線圈零件。 Finally, the cutter (not shown) is sequentially moved to a position near the first and second flange portions 11 and 12 of the core 10, and one end (starting end) of each of the first and second lead wires 21 and 22 and another One end (terminal) is cut off. Thereby, a coil part is manufactured.

根據上述線圈零件之製造裝置1,由於具有第1、第2雷射保護玻璃41、42,故而防止粉塵進入第1、第2雷射振盪器31、32。因此,可防止第1、第2雷射振盪器31、32因粉塵而發生故障。 According to the above-mentioned coil component manufacturing apparatus 1, since the first and second laser protective glasses 41 and 42 are provided, dust is prevented from entering the first and second laser oscillators 31 and 32. Therefore, failure of the first and second laser oscillators 31 and 32 due to dust can be prevented.

又,由於具有第1、第2粉塵去除機構51、52,故而防止粉塵附著於第1、第2雷射保護玻璃41、42之一面41a、42a。因此,粉塵不 會遮擋雷射光L之光路。 In addition, since the first and second dust removing mechanisms 51 and 52 are provided, dust is prevented from adhering to one of the surfaces 41 a and 42 a of the first and second laser protective glasses 41 and 42. Therefore, dust does not Will block the light path of the laser light L.

因此,可防止由粉塵所導致之第1、第2雷射振盪器31、32之故障,進而,可防止由粉塵所導致之雷射光L之強度降低。 Therefore, failures of the first and second laser oscillators 31 and 32 caused by dust can be prevented, and further, the intensity of the laser light L caused by dust can be prevented from being lowered.

(第2實施形態) (Second Embodiment)

圖6係表示本發明之線圈零件之製造裝置之第2實施形態之簡略構成圖。第2實施形態中,第1雷射振盪器之位置與第1實施形態不同。以下,對該不同之構成進行說明。再者,於第2實施形態中,關於與第1實施形態相同之符號,由於為與第1實施形態相同之構成,故而省略其說明。 Fig. 6 is a schematic configuration diagram showing a second embodiment of the manufacturing apparatus for a coil part according to the present invention. In the second embodiment, the position of the first laser oscillator is different from that of the first embodiment. The different configurations will be described below. In addition, in the second embodiment, the same symbols as those in the first embodiment have the same configuration as those in the first embodiment, and therefore descriptions thereof are omitted.

如圖6所示,第1雷射振盪器31之雷射光L之射出孔31a位於不與第1導線21之被照射部分21a之正下方(箭頭Z方向)重疊而錯開之位置。即,雷射光L之光軸與被照射部分21a之正下方方向(箭頭Z方向)不一致而交叉。同樣地,第1雷射振盪器31之射出孔31a位於不與第2導線22之被照射部分22a之正下方重疊而錯開之位置,但未圖示。 As shown in FIG. 6, the exit hole 31 a of the laser light L of the first laser oscillator 31 is located at a position that does not overlap with and directly offset from the irradiated portion 21 a of the first lead 21 (in the direction of the arrow Z). That is, the optical axis of the laser light L does not coincide with the direction (arrow Z direction) immediately below the irradiated portion 21a. Similarly, the exit hole 31a of the first laser oscillator 31 is located at a position that does not overlap with the portion directly below the irradiated portion 22a of the second lead 22, but is not shown.

藉此,可自第1、第2導線21、22之被照射部分21a、22a之斜下方照射第1雷射振盪器31之雷射光L。因此,粉塵不會掉落至第1雷射振盪器31之射出孔31a之正上方,而可防止雷射光L之強度降低。 Thereby, the laser light L of the first laser oscillator 31 can be irradiated obliquely below the irradiated portions 21a, 22a of the first and second lead wires 21, 22. Therefore, the dust does not fall directly above the exit hole 31a of the first laser oscillator 31, and the intensity of the laser light L can be prevented from decreasing.

(第3實施形態) (Third Embodiment)

圖7係表示本發明之線圈零件之製造裝置之第3實施形態之簡略構成圖。第3實施形態中,底板之構成與第1實施形態不同。以下,對該不同之構成進行說明。再者,於第3實施形態中,關於與第1實施形態相同之符號,由於為與第1實施形態相同之構成,故而省略其說明。 Fig. 7 is a schematic configuration diagram showing a third embodiment of the coil component manufacturing apparatus of the present invention. In the third embodiment, the configuration of the bottom plate is different from that of the first embodiment. The different configurations will be described below. In the third embodiment, the same symbols as those in the first embodiment have the same configuration as those in the first embodiment, and therefore descriptions thereof are omitted.

如圖7所示,底板70A具有將貫通孔71之上側之開口端71a 包圍之壁部72。壁部72以覆蓋開口端71a之周圍之方式構成。壁部72較佳為沿著開口端71a之周圍連續地形成,但亦可沿著開口端71a之周圍間斷地形成。 As shown in FIG. 7, the bottom plate 70A has an open end 71 a that extends above the through hole 71. Surrounded wall portion 72. The wall portion 72 is configured to cover the periphery of the open end 71a. The wall portion 72 is preferably formed continuously along the periphery of the open end 71a, but may be formed intermittently along the periphery of the open end 71a.

藉此,即便粉塵F堆積於底板70A之上面,亦可藉由壁部72而防止堆積之粉塵F掉落至底板70A之貫通孔71。 Accordingly, even if the dust F is deposited on the bottom plate 70A, the accumulated dust F can be prevented from falling to the through hole 71 of the bottom plate 70A by the wall portion 72.

(第4實施形態) (Fourth Embodiment)

圖8係表示本發明之線圈零件之製造裝置之第4實施形態之簡略構成圖。第4實施形態中,底板之壁部之構成與第3實施形態不同。以下,對該不同之構成進行說明。再者,於第4實施形態中,關於與第3實施形態相同之符號,由於為與第3實施形態相同之構成,故而省略其說明。 FIG. 8 is a schematic configuration diagram showing a fourth embodiment of a manufacturing apparatus for a coil part according to the present invention. In the fourth embodiment, the configuration of the wall portion of the bottom plate is different from that in the third embodiment. The different configurations will be described below. In addition, in the fourth embodiment, the same symbols as those in the third embodiment are the same as those in the third embodiment, and therefore descriptions thereof are omitted.

如圖8所示,底板70B之壁部72B之上部自上下方向觀察時與貫通孔71重疊。即,壁部72B之上部向貫通孔71側傾斜。並且,壁部72B之上部之開口寬度H1窄於貫通孔71之上側之開口端71a之開口寬度H2。 As shown in FIG. 8, the upper portion of the wall portion 72B of the bottom plate 70B overlaps the through hole 71 when viewed from the up-down direction. That is, the upper portion of the wall portion 72B is inclined toward the through-hole 71 side. The opening width H1 of the upper portion of the wall portion 72B is narrower than the opening width H2 of the opening end 71 a on the upper side of the through hole 71.

藉此,即便粉塵因重力之影響而朝貫通孔71側掉落,亦可藉由開口寬度H1較窄之壁部72B而減少粉塵向貫通孔71掉落。又,即便粉塵堆積於底板70B之上面,亦可藉由壁部72B而防止粉塵向貫通孔71掉落。因此,可藉由壁部72B進一步防止粉塵向貫通孔71掉落。 Thereby, even if the dust falls toward the through-hole 71 side due to the influence of gravity, it is possible to reduce the dust falling to the through-hole 71 by the wall portion 72B having the narrow opening width H1. Moreover, even if dust is deposited on the upper surface of the bottom plate 70B, it is possible to prevent the dust from falling into the through hole 71 by the wall portion 72B. Therefore, the wall portion 72B can further prevent dust from falling into the through hole 71.

再者,本發明並不限定於上述實施形態,可於不脫離本發明之主旨之範圍內進行設計變更。例如,亦可將第1至第4實施形態之各自之特徵點進行各種組合。 In addition, the present invention is not limited to the above-mentioned embodiments, and design changes can be made without departing from the gist of the present invention. For example, various characteristic points of the first to fourth embodiments may be combined in various ways.

於上述實施形態中,使用上下之2個雷射振盪器,但亦可使 用下側之第1雷射振盪器或上側之第2雷射振盪器之任一者。此時,較佳為藉由1個雷射振盪器向第1、第2導線之一部分照射雷射而將第1、第2導線之周向之大致一半剝離之後,使絕緣膜已被剝離之側翻轉而使絕緣膜殘留之側與雷射振盪器對向,並再次照射雷射而將殘留之絕緣膜剝離,從而將全周剝離。 In the above embodiment, two laser oscillators are used, but it is also possible to use Either use the first laser oscillator on the lower side or the second laser oscillator on the upper side. At this time, it is preferable to irradiate a part of the first and second wires with a laser by a laser oscillator to peel off approximately half of the first and second wires in the circumferential direction, and then reverse the side where the insulation film has been peeled off. Then, the remaining side of the insulating film faces the laser oscillator, and the laser is irradiated again to peel off the remaining insulating film, thereby peeling off the entire periphery.

於上述實施形態中,將2個雷射振盪器上下配置,但亦可將2個雷射振盪器沿水平方向配置。此時,較佳為以相對於第1、第2導線之被照射部分對向之方式配置2個雷射振盪器。 In the above embodiment, the two laser oscillators are arranged up and down, but the two laser oscillators may be arranged in a horizontal direction. At this time, it is preferable to arrange two laser oscillators so as to face the irradiated portions of the first and second lead wires.

於上述實施形態中,藉由使芯以芯之捲芯部之軸心為旋轉軸進行旋轉,而使第1、第2導線捲繞至捲芯部,但亦可使噴嘴於芯之周圍公轉而將第1、第2導線捲繞至芯之捲芯部。 In the above embodiment, the first and second wires are wound around the core portion by rotating the core around the core of the core portion of the core as the rotation axis, but it is also possible to orbit the nozzle around the core. The first and second wires are wound around the core portion of the core.

於上述實施形態中,將2根導線捲繞於芯,但亦可將1根或3根以上之導線捲繞於芯。 In the above embodiment, two wires are wound around the core, but one or three or more wires may be wound around the core.

Claims (8)

一種線圈零件之製造裝置,其係製造線圈零件者,該線圈零件具有:芯;導線,其捲繞於該芯,且利用絕緣膜將導體覆蓋而成;及電極,其設置於該芯,且與該導線連接;該線圈零件之製造裝置具備:芯支持部,其支持上述芯;噴嘴,其對上述芯陸續送出上述導線;雷射振盪器,其對上述導線照射雷射光而將上述導線之絕緣膜之至少一部分剝離;雷射保護玻璃,其配置於上述導線中之被照射雷射光之被照射部分與上述雷射振盪器之間,且使自上述雷射振盪器射出之雷射光透過;及粉塵去除機構,其於上述雷射保護玻璃中之上述導線側之一面產生氣流,並對上述雷射保護玻璃之上述一面之粉塵進行抽吸,而將上述雷射保護玻璃之上述一面之粉塵去除。A coil component manufacturing device is a coil component manufacturing device. The coil component includes: a core; a wire wound around the core and a conductor covered with an insulating film; and an electrode provided on the core, and Connected to the wire; the coil component manufacturing device includes: a core supporting part that supports the core; a nozzle that successively sends out the wire to the core; a laser oscillator that irradiates the wire with laser light to convert the wire At least a part of the insulating film is peeled off; a laser protective glass is disposed between the irradiated portion of the above-mentioned wire and the laser oscillator, and transmits the laser light emitted from the laser oscillator; And a dust removing mechanism that generates airflow on one side of the wire side in the laser protective glass, sucks dust on the one side of the laser protective glass, and dusts the one side of the laser protective glass. Remove. 如申請專利範圍第1項之線圈零件之製造裝置,其中上述雷射保護玻璃配置於上述導線之被照射部分之下側,且上述雷射振盪器配置於上述雷射保護玻璃之下側。For example, the manufacturing apparatus of a coil part according to the scope of the patent application, wherein the laser protection glass is disposed below the irradiated portion of the wire, and the laser oscillator is disposed below the laser protection glass. 如申請專利範圍第1項之線圈零件之製造裝置,其中上述雷射保護玻璃配置於上述導線之被照射部分之上側,且上述雷射振盪器配置於上述雷射保護玻璃之上側。For example, the apparatus for manufacturing a coil part according to the scope of the patent application, wherein the laser protection glass is disposed on an upper side of the irradiated portion of the wire, and the laser oscillator is disposed on an upper side of the laser protection glass. 如申請專利範圍第1項之線圈零件之製造裝置,其中上述雷射振盪器具有第1雷射振盪器及第2雷射振盪器,且上述第1雷射振盪器與上述第2雷射振盪器配置於相對於上述導線之被照射部分相互對向之位置。For example, the manufacturing apparatus of a coil part according to the scope of the patent application, wherein the laser oscillator has a first laser oscillator and a second laser oscillator, and the first laser oscillator and the second laser oscillation The device is disposed at a position facing each other with respect to the irradiated portion of the wire. 如申請專利範圍第2項之線圈零件之製造裝置,其中上述雷射振盪器之雷射光之射出孔位於不與上述導線之被照射部分之正下方重疊而錯開之位置。For example, the coil part manufacturing device according to the scope of the patent application, wherein the laser light exit hole of the laser oscillator is located at a position that does not overlap with and is offset from directly below the irradiated portion of the wire. 如申請專利範圍第2項之線圈零件之製造裝置,其具有於上側安裝上述芯支持部之底板,上述雷射保護玻璃及上述雷射振盪器配置於上述底板之下側,且上述底板具有:貫通孔,其供自上述雷射振盪器射出之雷射光通過;及壁部,其將上述貫通孔之上側之開口端包圍。For example, the coil part manufacturing device of the scope of the patent application has a base plate on which the core support portion is installed on the upper side, the laser protective glass and the laser oscillator are arranged below the base plate, and the base plate has: A through-hole for passing laser light emitted from the laser oscillator; and a wall part surrounding the open end on the upper side of the through-hole. 如申請專利範圍第6項之線圈零件之製造裝置,其中上述壁部之上部自上下方向觀察時與上述貫通孔重疊,且上述壁部之上部之開口寬度窄於上述貫通孔之上側之開口端之開口寬度。For example, in a coil component manufacturing device according to item 6, the upper part of the wall portion overlaps the through hole when viewed from above and below, and the opening width of the upper part of the wall portion is narrower than the open end on the upper side of the through hole. Opening width. 如申請專利範圍第1項之線圈零件之製造裝置,其中上述粉塵去除機構具有:鼓風機,其對上述雷射保護玻璃之上述一面吹送空氣;及真空吸塵器,其對上述雷射保護玻璃之上述一面之粉塵進行抽吸。For example, the manufacturing apparatus of coil parts according to item 1 of the patent scope, wherein the dust removing mechanism has: a blower that blows air to the above side of the laser protection glass; and a vacuum cleaner that does the same to the above side of the laser protection glass The dust is sucked.
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