TWI506111B - And then peeling off the adhesive composition, adhesive sheet, and electronic parts of the cutting process - Google Patents
And then peeling off the adhesive composition, adhesive sheet, and electronic parts of the cutting process Download PDFInfo
- Publication number
- TWI506111B TWI506111B TW103123699A TW103123699A TWI506111B TW I506111 B TWI506111 B TW I506111B TW 103123699 A TW103123699 A TW 103123699A TW 103123699 A TW103123699 A TW 103123699A TW I506111 B TWI506111 B TW I506111B
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- TW
- Taiwan
- Prior art keywords
- peeling
- adhesive
- monomer
- adhesive composition
- adhesive sheet
- Prior art date
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- 239000000853 adhesive Substances 0.000 title claims description 133
- 230000001070 adhesive effect Effects 0.000 title claims description 126
- 238000005520 cutting process Methods 0.000 title claims description 60
- 239000000203 mixture Substances 0.000 title claims description 47
- 239000000178 monomer Substances 0.000 claims description 65
- -1 alkyl carbon Chemical compound 0.000 claims description 55
- 238000000034 method Methods 0.000 claims description 53
- 239000012790 adhesive layer Substances 0.000 claims description 43
- 239000000758 substrate Substances 0.000 claims description 42
- 239000010410 layer Substances 0.000 claims description 39
- 239000003431 cross linking reagent Substances 0.000 claims description 38
- 229920006243 acrylic copolymer Polymers 0.000 claims description 30
- 229920005989 resin Polymers 0.000 claims description 30
- 239000011347 resin Substances 0.000 claims description 30
- 125000000217 alkyl group Chemical group 0.000 claims description 28
- 239000003795 chemical substances by application Substances 0.000 claims description 25
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 17
- 239000002253 acid Substances 0.000 claims description 15
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 10
- 150000002148 esters Chemical class 0.000 claims description 9
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 238000005187 foaming Methods 0.000 claims description 8
- 125000000524 functional group Chemical group 0.000 claims description 8
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 239000003985 ceramic capacitor Substances 0.000 claims description 7
- 229920001519 homopolymer Polymers 0.000 claims description 7
- 230000009477 glass transition Effects 0.000 claims description 6
- RSAZYXZUJROYKR-UHFFFAOYSA-N indophenol Chemical group C1=CC(O)=CC=C1N=C1C=CC(=O)C=C1 RSAZYXZUJROYKR-UHFFFAOYSA-N 0.000 claims description 6
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical group COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 5
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims description 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 4
- 238000010008 shearing Methods 0.000 claims description 4
- 125000005250 alkyl acrylate group Chemical group 0.000 claims description 3
- WDUAYVHCYGZARQ-UHFFFAOYSA-N 4-prop-1-enylmorpholine Chemical compound CC=CN1CCOCC1 WDUAYVHCYGZARQ-UHFFFAOYSA-N 0.000 claims description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 2
- NXBBFAKHXAMPOM-UHFFFAOYSA-N n,n-dimethylprop-1-en-1-amine Chemical compound CC=CN(C)C NXBBFAKHXAMPOM-UHFFFAOYSA-N 0.000 claims description 2
- IGFHQQFPSIBGKE-UHFFFAOYSA-N Nonylphenol Natural products CCCCCCCCCC1=CC=C(O)C=C1 IGFHQQFPSIBGKE-UHFFFAOYSA-N 0.000 claims 1
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical group CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 53
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 50
- 235000012431 wafers Nutrition 0.000 description 31
- 239000000243 solution Substances 0.000 description 29
- 238000005227 gel permeation chromatography Methods 0.000 description 19
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 18
- 239000000463 material Substances 0.000 description 18
- YLLIGHVCTUPGEH-UHFFFAOYSA-M potassium;ethanol;hydroxide Chemical compound [OH-].[K+].CCO YLLIGHVCTUPGEH-UHFFFAOYSA-M 0.000 description 18
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 17
- 238000012545 processing Methods 0.000 description 16
- 239000004088 foaming agent Substances 0.000 description 14
- 239000012948 isocyanate Substances 0.000 description 13
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 12
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- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Inorganic materials [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 12
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 11
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- 230000000052 comparative effect Effects 0.000 description 10
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- 238000010438 heat treatment Methods 0.000 description 9
- 150000002513 isocyanates Chemical class 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- 239000004814 polyurethane Substances 0.000 description 7
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- 239000004065 semiconductor Substances 0.000 description 7
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 239000002390 adhesive tape Substances 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 description 6
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- 238000006116 polymerization reaction Methods 0.000 description 6
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 6
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- 238000003786 synthesis reaction Methods 0.000 description 6
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- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 5
- 229920000103 Expandable microsphere Polymers 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 5
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- 239000011737 fluorine Substances 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 230000001965 increasing effect Effects 0.000 description 5
- 230000014759 maintenance of location Effects 0.000 description 5
- 229920000728 polyester Polymers 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 4
- OQLZINXFSUDMHM-UHFFFAOYSA-N Acetamidine Chemical compound CC(N)=N OQLZINXFSUDMHM-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 229920005601 base polymer Polymers 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- 238000011109 contamination Methods 0.000 description 4
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 4
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
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- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 3
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- RJGDLRCDCYRQOQ-UHFFFAOYSA-N anthrone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3CC2=C1 RJGDLRCDCYRQOQ-UHFFFAOYSA-N 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
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- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 description 1
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- 239000011888 foil Substances 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
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- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- PBZROIMXDZTJDF-UHFFFAOYSA-N hepta-1,6-dien-4-one Chemical compound C=CCC(=O)CC=C PBZROIMXDZTJDF-UHFFFAOYSA-N 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
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- 239000004615 ingredient Substances 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 239000001282 iso-butane Substances 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000004658 ketimines Chemical class 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Chemical group CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- 239000003094 microcapsule Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- JAYXSROKFZAHRQ-UHFFFAOYSA-N n,n-bis(oxiran-2-ylmethyl)aniline Chemical compound C1OC1CN(C=1C=CC=CC=1)CC1CO1 JAYXSROKFZAHRQ-UHFFFAOYSA-N 0.000 description 1
- YWWNNLPSZSEZNZ-UHFFFAOYSA-N n,n-dimethyldecan-1-amine Chemical compound CCCCCCCCCCN(C)C YWWNNLPSZSEZNZ-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- ZQXSMRAEXCEDJD-UHFFFAOYSA-N n-ethenylformamide Chemical compound C=CNC=O ZQXSMRAEXCEDJD-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229920006113 non-polar polymer Polymers 0.000 description 1
- 125000001196 nonadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- NWAHZAIDMVNENC-UHFFFAOYSA-N octahydro-1h-4,7-methanoinden-5-yl methacrylate Chemical compound C12CCCC2C2CC(OC(=O)C(=C)C)C1C2 NWAHZAIDMVNENC-UHFFFAOYSA-N 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 229920000223 polyglycerol Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000004060 quinone imines Chemical class 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 150000007659 semicarbazones Chemical class 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 description 1
- 229940029284 trichlorofluoromethane Drugs 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FUSUHKVFWTUUBE-UHFFFAOYSA-N vinyl methyl ketone Natural products CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
- C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
- C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/062—Copolymers with monomers not covered by C09J133/06
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/40—Adhesives in the form of films or foils characterised by release liners
- C09J7/403—Adhesives in the form of films or foils characterised by release liners characterised by the structure of the release feature
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
Description
本發明係關於一種再剝離黏著劑組合物、利用該再剝離黏著劑組合物製作之黏著片、及使用該黏著片之電子零件之切斷加工方法。The present invention relates to a re-peeling adhesive composition, an adhesive sheet produced using the re-peelable adhesive composition, and a cutting method for an electronic component using the adhesive sheet.
於半導體等領域推進晶圓之大口徑化(450mm)、薄型化(100μm以下),又,LED等操作時需要注意之化合物半導體之需要大幅增大。In the field of semiconductors and other fields, the diameter of the wafer is increased (450 mm) and the thickness is reduced (100 μm or less), and the demand for compound semiconductors that require attention during operation such as LEDs is greatly increased.
又,近年來,電子零件發展小型化或精密化,例如,於陶瓷電容器中,0603(0.6mm×0.3mm)尺寸或0402(0.4mm×0.2mm)尺寸所代表之大小亦未達1mm之小型化、或由嚴重超過數百層之高積層化造成之高容量化變顯著。Moreover, in recent years, the development of electronic components has been miniaturized or refined. For example, in ceramic capacitors, the size of 0603 (0.6 mm × 0.3 mm) or 0402 (0.4 mm × 0.2 mm) is not as small as 1 mm. The high capacity caused by the high buildup of the particles, which is severely more than several hundred layers, becomes remarkable.
伴隨此種小型化或精密化,對尤其是陶瓷電容器等陶瓷之焙燒前片(生片)要求加工時之較高之精度。With such miniaturization or precision, high precision is required for processing of a ceramic pre-fired sheet (green sheet), such as a ceramic capacitor.
陶瓷電容器例如係藉由以下之步驟而製造。The ceramic capacitor is manufactured, for example, by the following steps.
(1)對生片之內部電極印刷步驟(1) Steps for printing internal electrodes of green sheets
(2)積層步驟(2) Lamination step
(3)加壓步驟(加壓壓製步驟)(3) Pressurization step (pressurization pressing step)
(4)切斷步驟(4) Cutting step
(5)焙燒步驟(5) Calcination step
(於將積層步驟(2)與加壓步驟(3)反覆進行特定次數後,轉移至切斷步驟(4))(After repeating the layering step (2) and the pressurizing step (3) a certain number of times, the process proceeds to the cutting step (4))
於此種步驟中,作為所要求之精度,例如可列舉:於對生片之內部電極印刷步驟(1)中之內部電極印刷之精度等、積層步驟(2)中之電極位置對準之精度等、加壓步驟(3)中之藉由因加壓而生片變形電極位置發生偏移而防止電極位置之偏移之精度等,切斷步驟(4)中之切斷精度等,列舉其等作為尤其是製造時應注意之方面。而且,若該等步驟中之一種精度較差,則所得之製品成為不良品,伴隨其導致生產性大幅下降。In such a step, as the required precision, for example, the accuracy of the internal electrode printing in the internal electrode printing step (1) of the green sheet, and the accuracy of the electrode position alignment in the laminating step (2) can be cited. In the pressurization step (3), the position of the green sheet deformed by the pressurization is shifted, the accuracy of the offset of the electrode position is prevented, and the cutting accuracy in the step (4) is cut off. Etc. as an aspect that should be noted especially when manufacturing. Further, if one of the steps is inferior in accuracy, the obtained product becomes a defective product, and the productivity is drastically lowered.
該等步驟中,關於對生片之內部電極印刷步驟(1)、積層步驟(2)、及切斷步驟(4),由於要求機械精度,因此可藉由裝置之改良、精度之提昇而應對。In these steps, the internal electrode printing step (1), the laminating step (2), and the cutting step (4) of the green sheet are required to be improved by the improvement and precision of the device because mechanical precision is required. .
另外,於步驟(4)之切斷步驟中,為了提昇切斷精度而廣泛使用熱剝離性黏著片。藉此,雖然切斷時牢固地固定生片,但切斷步驟後因加熱而使黏著力消失,可簡單地將經切斷過之陶瓷電容器自片剝離。Further, in the cutting step of the step (4), the heat-peelable pressure-sensitive adhesive sheet is widely used in order to improve the cutting accuracy. Thereby, the green sheet is firmly fixed at the time of cutting, but the adhesive force is lost by heating after the cutting step, and the cut ceramic capacitor can be easily peeled off from the sheet.
然而,近年來為了使切斷加工時之切斷精度提昇,而廣泛地使用尤其是切斷加工時於藉由加熱使生片變軟之狀態下進行切斷之方法。However, in recent years, in order to improve the cutting accuracy at the time of cutting processing, a method of cutting in a state where the green sheet is softened by heating, in particular, during cutting processing is widely used.
而且,伴隨其而對熱剝離型黏著片要求即便於高溫環境下亦具有進而較高之生片保持性。Further, the heat-peelable pressure-sensitive adhesive sheet is required to have a higher green sheet retention property even in a high-temperature environment.
然而,目前為止之膠帶具有高溫環境下之生片保持性較常溫大幅變差之傾向,存在高溫切斷加工中無法獲得充分之生片保持性而發生晶片飛濺或晶片偏移之情形。因此,小型、高積體且高容量之晶片之加工變困難。However, the conventional tape has a tendency that the green sheet retainability in a high-temperature environment is greatly deteriorated from the normal temperature, and there is a case where sufficient green sheet retention cannot be obtained in the high-temperature cutting process, and wafer splash or wafer shift occurs. Therefore, processing of a small, high-volume, high-capacity wafer becomes difficult.
針對此,有將黏著賦予樹脂添加至黏著劑中而使黏著力上升並提高被加工體對黏著劑之保持性之方法,因此根據該方法藉由添加黏著賦予劑而使黏著力增大,謀求抑制晶片飛濺。然而,雖然晶片飛濺 頻度略微減少,但與飛躍性改善無關。若進一步增加黏著賦予劑之添加量使黏著力增大,則剝離晶片時由於殘存對黏著劑層充分強之黏著力,因此成為剝離變困難之結果。In view of the above, there is a method in which the adhesion-imparting resin is added to the adhesive to increase the adhesive force and improve the retention of the adherend to the adhesive. Therefore, the adhesion is increased by the addition of the adhesion-imparting agent. Suppress wafer spatter. However, although the wafer splashes The frequency is slightly reduced, but it has nothing to do with the dramatic improvement. When the addition amount of the adhesion-imparting agent is further increased to increase the adhesion, the adhesion to the adhesive layer is sufficiently strong when the wafer is peeled off, which is a result of difficulty in peeling.
為了消除此種現象,使用非熱膨脹性之剝離性暫時固定片切斷生片如專利文獻1所記載般為公知,又,設置含有熱膨脹性微小球與層狀矽酸鹽之熱膨脹性黏著劑層而成之熱剝離型黏著片亦如專利文獻2所記載般為公知。In order to eliminate such a phenomenon, it is known to use a non-thermally expandable releasable temporary fixing sheet to cut a green sheet as disclosed in Patent Document 1, and a heat-expandable adhesive layer containing a thermally expandable microsphere and a layered niobate is provided. The formed heat-peelable pressure-sensitive adhesive sheet is also known as described in Patent Document 2.
然而,該等公知之方法並非使黏著劑自身加熱時之晶片之保持特性良好者。However, such known methods are not intended to maintain the retention characteristics of the wafer when the adhesive itself is heated.
又,於半導體領域中,LED等化合物半導體之需要急速擴展,但化合物半導體容易因較小之衝擊而破損,於將晶圓薄層化時之背面研磨或將晶圓晶片化時之切割步驟等加工之時需要細心注意。Further, in the field of semiconductors, there is a need for a compound semiconductor such as an LED to be rapidly expanded, but a compound semiconductor is likely to be damaged by a small impact, and a back surface polishing or a wafer cutting step is performed when the wafer is thinned. Care must be taken when processing.
[專利文獻1]日本專利特開2012-52038號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2012-52038
[專利文獻2]日本專利特開2008-266455號公報[Patent Document 2] Japanese Patent Laid-Open Publication No. 2008-266455
先前之熱剝離黏著片及膠帶因切斷時高溫環境下之黏著性不足而無法充分地消除由所謂的「晶片飛濺」等引起之良率下降。The conventional heat-peelable adhesive sheet and tape cannot sufficiently eliminate the drop in yield caused by so-called "wafer splash" or the like due to insufficient adhesion in a high-temperature environment at the time of cutting.
同樣地,例如於切割半導體晶圓時,切割刀片因摩擦而變高溫,又,黏著劑亦變高溫,因此存在對晶片之保持性重要之黏著片之剪切接著力下降而發生「晶片飛濺」或「晶片缺損」之情形。Similarly, for example, when the semiconductor wafer is diced, the dicing blade becomes high in temperature due to friction, and the adhesive also becomes high in temperature, so that the shearing force of the adhesive sheet which is important for the retention of the wafer is lowered to cause "wafer splattering". Or the case of "wafer defect".
為了解決該等問題,例如進行下述操作:進行將丙烯酸等具有官能基之單體與丙烯酸系共聚物共聚合等而提高與晶片零件之接著性。然而,於增強黏著劑之接著力之情形時,存在一部分被黏著體於 進行剝離時無法再剝離之情況。In order to solve such problems, for example, an operation of copolymerizing a monomer having a functional group such as acrylic acid with an acrylic copolymer to improve adhesion to a wafer component is performed. However, in the case of enhancing the adhesion of the adhesive, there is a part of being adhered to It is impossible to peel off when peeling.
又,亦可添加黏著賦予劑(黏著賦予樹脂)使接著性提昇。然而,根據黏著劑之種類,亦存在有與黏著劑之相溶性較差之黏著賦予劑之情形,於該情形時,亦存在接著性反而下降之情況。因此,黏著賦予劑必須嚴格地選擇。Further, an adhesion-imparting agent (adhesion-imparting resin) may be added to improve adhesion. However, depending on the type of the adhesive, there is also a case where the adhesion-imparting agent having poor compatibility with the adhesive is present, and in this case, there is a case where the adhesion is decreased. Therefore, the adhesion-imparting agent must be strictly selected.
本發明之課題在於:於晶片之切斷步驟中,於切斷後亦可充分地固定晶片,切斷時防止晶片飛濺等,使切斷晶片時之良率提昇。An object of the present invention is to prevent the wafer from being sufficiently fixed after the cutting in the cutting step of the wafer, and to prevent the wafer from splashing or the like during the cutting, thereby improving the yield when the wafer is cut.
本申請案發明者等為了解決上述先前之問題方面而潛心研究,結果發現,含有特定之丙烯酸系共聚物(A)與交聯劑(B)之組合物可達成上述問題,從而完成本發明。即本發明提供以下之再剝離黏著劑組合物、使用其之再剝離黏著片及電子零件之切斷加工方法。The inventors of the present application have intensively studied to solve the above-mentioned problems, and have found that the composition containing the specific acrylic copolymer (A) and the crosslinking agent (B) can attain the above problems, and the present invention has been completed. That is, the present invention provides the following re-peeling adhesive composition, a re-peelable adhesive sheet using the same, and a cutting method for an electronic component.
本發明之再剝離黏著劑組合物係含有丙烯酸系共聚物(A)及交聯劑(B)而成者,構成上述丙烯酸系共聚物(A)之單體成分含有至少烷基之碳數為4以下之(甲基)丙烯酸烷基酯(a)、均聚物之玻璃轉移溫度(Tg)為80℃以上之共聚單體(b)、及具有可與交聯劑(B)反應之官能基之單體(c),上述(甲基)丙烯酸烷基酯單體(a)之比率相對於單體成分總量為50重量%以上。The re-peeling adhesive composition of the present invention comprises an acrylic copolymer (A) and a crosslinking agent (B), and the monomer component constituting the acrylic copolymer (A) contains at least an alkyl group having a carbon number of a comonomer (b) having a glass transition temperature (Tg) of 80 or higher or higher and a functional group capable of reacting with the crosslinking agent (B) having an alkyl (meth) acrylate (a) or a homopolymer of 4 or less The ratio of the above-mentioned (meth)acrylic acid alkyl ester monomer (a) to the monomer (c) is 50% by weight or more based on the total amount of the monomer components.
較佳為相對於構成上述丙烯酸系共聚物(A)之單體成分總量而上述共聚單體(b)之比率為1~20重量%,且上述單體(c)之比率為0.1~10重量%。Preferably, the ratio of the comonomer (b) is from 1 to 20% by weight based on the total amount of the monomer components constituting the acrylic copolymer (A), and the ratio of the monomer (c) is from 0.1 to 10 weight%.
又,較佳為上述單體(c)為含羧基之單體、含羰基之單體、含羥基之單體及含縮水甘油基之單體中之至少1種。Moreover, it is preferable that the monomer (c) is at least one of a carboxyl group-containing monomer, a carbonyl group-containing monomer, a hydroxyl group-containing monomer, and a glycidyl group-containing monomer.
又,較佳為上述共聚單體(b)為甲基丙烯酸甲酯、丙烯腈、(甲基)丙烯酸異酯、N,N-二甲基丙烯醯胺及N-丙烯醯基嗎啉中之至少1 種。Further, it is preferred that the comonomer (b) is methyl methacrylate, acrylonitrile or (meth)acrylic acid At least one of an ester, N,N-dimethylpropenylamine and N-propenylmorpholine.
本發明之再剝離黏著劑組合物亦可進而含有黏著賦予劑。The re-peeling adhesive composition of the present invention may further contain an adhesion-imparting agent.
較佳為上述黏著賦予劑為羥值為70KOHmg/g以上之萜酚樹脂。The adhesion-imparting agent is preferably an indophenol resin having a hydroxyl value of 70 KOHmg/g or more.
本發明之再剝離黏著劑組合物亦可進而含有發泡劑。The re-peeling adhesive composition of the present invention may further contain a foaming agent.
較佳為本發明之再剝離黏著劑組合物於再剝離黏著劑組合物對甲苯之溶解成分中重量平均分子量為1萬以下之溶解成分之比率相對於再剝離黏著劑組合物總量為40%以下。Preferably, the ratio of the re-peeling adhesive composition of the present invention to the dissolved component of the re-peeling adhesive composition to the dissolved component of toluene having a weight average molecular weight of 10,000 or less is 40% relative to the total amount of the re-peeling adhesive composition. the following.
又,本發明之再剝離黏著片具有包含本發明之再剝離黏著劑組合物之再剝離黏著劑層。Further, the re-peelable adhesive sheet of the present invention has a re-peeling adhesive layer comprising the re-peeling adhesive composition of the present invention.
較佳為本發明之再剝離黏著片之23℃下之剪切接著力為10N/25mm×25mm以上。It is preferred that the re-peeling adhesive sheet of the present invention has a shearing force at 23 ° C of 10 N / 25 mm × 25 mm or more.
較佳為上述再剝離黏著片具有基材、及於基材之至少單側由再剝離黏著劑組合物形成之再剝離黏著劑層。Preferably, the re-peelable adhesive sheet has a substrate and a re-peeling adhesive layer formed of at least one side of the substrate by a re-peeling adhesive composition.
再者,亦可於基材之至少單側直接設置上述再剝離黏著劑層。Further, the re-peeling adhesive layer may be directly provided on at least one side of the substrate.
又,亦可於基材之至少單側介隔底塗劑層設置上述再剝離黏著劑層。Further, the re-peeling adhesive layer may be provided on at least one side of the substrate with a primer layer interposed therebetween.
再者,較佳為上述底塗劑層之厚度為100μm以下。Further, it is preferable that the thickness of the primer layer is 100 μm or less.
較佳為本發明之再剝離黏著片係於電子零件之切斷時使用。Preferably, the re-peelable adhesive sheet of the present invention is used in the cutting of electronic parts.
又,較佳為本發明之再剝離黏著片係用於陶瓷電容器用構件之切斷。Further, it is preferable that the re-peelable adhesive sheet of the present invention is used for cutting a member for a ceramic capacitor.
本發明之電子零件之切斷加工方法具備將電子零件貼合於本發明之再剝離黏著片之步驟、及對該電子零件實施切斷加工處理之步驟。The cutting method for an electronic component according to the present invention includes a step of bonding an electronic component to the re-adhesive sheet of the present invention, and a step of performing a cutting process on the electronic component.
根據本發明,發揮如下效果:於將被加工物暫時固定之狀態下進行切斷等加工,藉此可確實地固定經切斷之晶片,因此可防止晶片 飛濺或偏移等之發生。According to the present invention, it is possible to perform a process such as cutting in a state in which the workpiece is temporarily fixed, whereby the cut wafer can be surely fixed, thereby preventing the wafer from being cut. Splash or offset, etc. occur.
圖1係表示剪切黏著力之測定方法之圖。Fig. 1 is a view showing a method of measuring shear adhesion.
以下,對本發明之含有丙烯酸系共聚物(A)及交聯劑(B)而成之再剝離黏著劑組合物、再剝離黏著片及電子零件之切斷加工方法詳細地進行說明。再者,於本說明書中「片」為亦包含膠帶狀者在內之概念。Hereinafter, the re-peeling adhesive composition containing the acrylic copolymer (A) and the crosslinking agent (B) of the present invention, the re-peeling adhesive sheet, and the cutting method of the electronic component will be described in detail. Furthermore, in the present specification, "slice" is a concept including a tape.
上述丙烯酸系共聚物(A)係使用(甲基)丙烯酸烷基酯之1種或2種以上作為單體成分之丙烯酸系共聚物。The acrylic copolymer (A) is an acrylic copolymer in which one or two or more kinds of alkyl (meth)acrylates are used as a monomer component.
作為上述(甲基)丙烯酸烷基酯,例如可列舉:甲基、乙基、丙基、異丙基、正丁基、第三丁基、異丁基、戊基、異戊基、己基、庚基、環己基、2-乙基己基、辛基、異辛基、壬基、異壬基、癸基、異癸基、十一烷基、月桂基、十三烷基、十四烷基、硬脂基、十八烷基、十二烷基等具有碳數30以下之直鏈狀或支鏈狀烷基之(甲基)丙烯酸烷基酯。該等可單獨使用或將2種以上組合使用。再者,於本說明書中,所謂「(甲基)丙烯酸系」,意指「丙烯酸系」及/或「甲基丙烯酸系」。Examples of the alkyl (meth)acrylate include a methyl group, an ethyl group, a propyl group, an isopropyl group, a n-butyl group, a tert-butyl group, an isobutyl group, a pentyl group, an isopentyl group, and a hexyl group. Heptyl, cyclohexyl, 2-ethylhexyl, octyl, isooctyl, decyl, isodecyl, decyl, isodecyl, undecyl, lauryl, tridecyl, tetradecyl An alkyl (meth)acrylate having a linear or branched alkyl group having a carbon number of 30 or less, such as a stearyl group, an octadecyl group or a dodecyl group. These may be used alone or in combination of two or more. In the present specification, the term "(meth)acrylic" means "acrylic" and/or "methacrylic".
於本發明中,為了使加工時之接著性與加工後之剝離性提昇,較佳為使用具有碳數4以下之直鏈狀或支鏈狀烷基之(甲基)丙烯酸烷基酯(a)。作為烷基之碳數為4以下之(甲基)丙烯酸烷基酯(a)之具體例,例如可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯等,其中烷基之碳數為4以下之丙烯酸烷基酯較佳,可較佳地使用丙烯酸乙酯、丙烯酸丁酯。具有碳數4以下之直鏈狀或支鏈狀烷基之(甲基)丙烯酸烷基酯(a)之含量相對於 構成丙烯酸系共聚物之單體成分總量(100重量%)為50重量%以上,較佳為55重量%以上,進而較佳為80重量%以上。In the present invention, in order to improve the adhesion at the time of processing and the peelability after the processing, it is preferred to use an alkyl (meth)acrylate having a linear or branched alkyl group having 4 or less carbon atoms (a). ). Specific examples of the alkyl (meth)acrylate (a) having 4 or less carbon atoms in the alkyl group include methyl (meth)acrylate, ethyl (meth)acrylate, and (meth)acrylic acid. Propyl ester, butyl (meth)acrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate, tert-butyl (meth)acrylate, etc., wherein the carbon number of the alkyl group is 4 or less The alkyl acrylate is preferably used, and ethyl acrylate or butyl acrylate is preferably used. The content of the alkyl (meth)acrylate (a) having a linear or branched alkyl group having 4 or less carbon atoms is relative to The total amount (100% by weight) of the monomer component constituting the acrylic copolymer is 50% by weight or more, preferably 55% by weight or more, and more preferably 80% by weight or more.
上述丙烯酸系共聚物(A)除具有碳數4以下之直鏈狀或支鏈狀烷基之(甲基)丙烯酸烷基酯(a)以外,亦可含有具有碳數5以上之直鏈狀或支鏈狀烷基之(甲基)丙烯酸烷基酯。作為具有碳數5以上之直鏈狀或支鏈狀烷基之(甲基)丙烯酸烷基酯之具體例,例如可列舉:丙烯酸辛酯、丙烯酸2-乙基己酯、丙烯酸異辛酯、丙烯酸異壬酯、丙烯酸癸酯等,可較佳地使用丙烯酸2-乙基己酯。於該情形時,具有碳數5以上之直鏈狀或支鏈狀烷基之(甲基)丙烯酸烷基酯之含量相對於構成丙烯酸系聚合物之單體成分總量(100重量%)較佳為40重量%以下,較佳為35重量%以下。The acrylic copolymer (A) may contain a linear one having a carbon number of 5 or more, in addition to the alkyl (meth)acrylate (a) having a linear or branched alkyl group having 4 or less carbon atoms. Or an alkyl (meth)acrylate of a branched alkyl group. Specific examples of the alkyl (meth)acrylate having a linear or branched alkyl group having 5 or more carbon atoms include octyl acrylate, 2-ethylhexyl acrylate, and isooctyl acrylate. As the isodecyl acrylate, decyl acrylate or the like, 2-ethylhexyl acrylate can be preferably used. In this case, the content of the alkyl (meth)acrylate having a linear or branched alkyl group having 5 or more carbon atoms is compared with the total amount of the monomer component (100% by weight) constituting the acrylic polymer. It is preferably 40% by weight or less, preferably 35% by weight or less.
上述丙烯酸系共聚物(A)亦可含有與可與上述(甲基)丙烯酸烷基酯共聚合之其他單體成分對應的單元。作為此種單體成分,例如可列舉:丙烯酸、甲基丙烯酸、丙烯酸羧基乙酯、丙烯酸羧基戊酯、伊康酸、順丁烯二酸、反丁烯二酸、丁烯酸等含羧基之單體;順丁烯二酸酐、伊康酸酐等酸酐單體;(甲基)丙烯酸羥基乙酯、(甲基)丙烯酸羥基丙酯、(甲基)丙烯酸羥基丁酯、(甲基)丙烯酸羥基己酯、(甲基)丙烯酸羥基辛酯、(甲基)丙烯酸羥基癸酯、(甲基)丙烯酸羥基月桂酯、甲基丙烯酸(4-羥基甲基環己基)甲酯等含羥基之單體;苯乙烯磺酸、烯丙基磺酸、2-(甲基)丙烯醯胺-2-甲基丙磺酸、(甲基)丙烯醯胺丙磺酸、(甲基)丙烯酸磺丙酯、(甲基)丙烯醯氧基萘磺酸等含磺酸基之單體;(甲基)丙烯醯胺、N,N-二甲基(甲基)丙烯醯胺、N-丁基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-羥甲基丙烷(甲基)丙烯醯胺等(N-取代)醯胺系單體;(甲基)丙烯酸胺基乙酯、(甲基)丙烯酸N,N-二甲基胺基乙酯、(甲基)丙烯酸第三丁基胺基乙酯等(甲基)丙烯酸胺基烷基酯系單體;(甲基)丙烯酸甲氧基乙酯、(甲基)丙烯酸乙氧基乙酯 等(甲基)丙烯酸烷氧基烷基酯系單體;N-環己基順丁烯二醯亞胺、N-異丙基順丁烯二醯亞胺、N-月桂基順丁烯二醯亞胺、N-苯基順丁烯二醯亞胺等順丁烯二醯亞胺系單體;N-甲基伊康醯亞胺、N-乙基伊康醯亞胺、N-丁基伊康醯亞胺、N-辛基伊康醯亞胺、N-2-乙基己基伊康醯亞胺、N-環己基伊康醯亞胺、N-月桂基伊康醯亞胺等伊康醯亞胺系單體;N-(甲基)丙烯醯氧基亞甲基丁二醯亞胺、N-(甲基)丙烯醯基-6-氧基六亞甲基丁二醯亞胺、N-(甲基)丙烯醯基-8-氧基八亞甲基丁二醯亞胺等丁二醯亞胺系單體;乙酸乙烯酯、丙酸乙烯酯、N-乙烯基吡咯啶酮、甲基乙烯基吡咯啶酮、乙烯基吡啶、乙烯基哌啶酮、乙烯基嘧啶、乙烯基哌、乙烯基吡、乙烯基吡咯、乙烯基咪唑、乙烯基唑、乙烯基嗎啉、N-乙烯基羧醯胺類、苯乙烯、α-甲基苯乙烯、N-乙烯基己內醯胺等乙烯系單體;丙烯腈、甲基丙烯腈等氰基丙烯酸酯單體;(甲基)丙烯酸縮水甘油酯等含環氧基之丙烯酸系樹脂系單體;(甲基)丙烯酸聚乙二醇酯、(甲基)丙烯酸聚丙二醇酯、(甲基)丙烯酸甲氧基乙二醇酯、(甲基)丙烯酸甲氧基聚丙二醇酯等二醇系丙烯酸酯系單體;(甲基)丙烯酸四氫糠酯、氟(甲基)丙烯酸酯、矽酮(甲基)丙烯酸酯等具有雜環、鹵素原子、矽原子等之(甲基)丙烯酸酯系單體;己二醇二(甲基)丙烯酸酯、(聚)乙二醇二(甲基)丙烯酸酯、(聚)丙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、環氧丙烯酸酯、聚酯丙烯酸、丙烯酸胺基甲酸酯等多官能單體;異戊二烯、丁二烯、異丁烯等烯烴系單體;乙烯醚等乙烯醚系單體等。該等單體成分可使用1種或2種以上。The acrylic copolymer (A) may further contain a unit corresponding to another monomer component copolymerizable with the above (meth)acrylic acid alkyl ester. Examples of such a monomer component include carboxyl groups such as acrylic acid, methacrylic acid, carboxyethyl acrylate, carboxy amyl acrylate, itaconic acid, maleic acid, fumaric acid, and crotonic acid. Monomer; anhydride monomer such as maleic anhydride or itaconic anhydride; hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate, hydroxybutyl (meth)acrylate, hydroxyl group (meth)acrylate Hydroxyl-containing monomer such as hexyl ester, hydroxyoctyl (meth)acrylate, hydroxydecyl (meth)acrylate, hydroxylauryl (meth)acrylate, (4-hydroxymethylcyclohexyl)methyl methacrylate ; styrene sulfonic acid, allyl sulfonic acid, 2-(methyl) propylene decylamine-2-methylpropane sulfonic acid, (meth) acrylamide propylene sulfonic acid, sulfopropyl (meth) acrylate, a sulfonic acid group-containing monomer such as (meth)acryloxynaphthalenesulfonic acid; (meth)acrylamide, N,N-dimethyl(meth)acrylamide, N-butyl (methyl) a (N-substituted) guanamine monomer such as acrylamide, N-methylol (meth) acrylamide, N-methylolpropane (meth) acrylamide or the like; Ethyl ester, N,N-di(meth)acrylate Aminoalkyl (meth) acrylate monomer such as arylaminoethyl ester or tert-butylaminoethyl (meth)acrylate; methoxyethyl (meth)acrylate, (meth)acrylic acid (A) alkoxyalkyl (meth) acrylate monomer such as ethoxyethyl ester; N-cyclohexyl maleimide, N-isopropyl maleimide, N-lauryl a maleimide-based monomer such as maleimide or N-phenyl maleimide; N-methyl Ikonide, N-ethyl Ikonide , N-butyl Ikonium imidate, N-octyl ikyl imine, N-2-ethylhexyl ketimine, N-cyclohexyl ketimine, N-Lauryl Ikon Ikonide imine monomer such as quinone imine; N-(methyl) propylene oxime methylene butyl quinone imine, N-(methyl) propylene fluorenyl-6-oxy hexamethylene Butadiene imine monomer such as butadiene imine, N-(methyl)propenyl-8-oxy octamethylbutanediimide; vinyl acetate, vinyl propionate, N- Vinylpyrrolidone, methylvinylpyrrolidone, vinylpyridine, vinylpiperidone, vinylpyrimidine, vinylpiper Vinylpyr , vinyl pyrrole, vinyl imidazole, vinyl a vinyl monomer such as azole, vinylmorpholine, N-vinylcarboxamide, styrene, α-methylstyrene or N-vinyl caprolactam; cyano group such as acrylonitrile or methacrylonitrile Acrylate monomer; epoxy group-containing acrylic resin monomer such as glycidyl (meth)acrylate; (meth)acrylic acid polyethylene glycol ester, (meth)acrylic acid polypropylene glycol ester, (methyl) a diol-based acrylate monomer such as methoxyethylene glycol acrylate or methoxypolypropylene glycol (meth)acrylate; tetrahydrofurfuryl (meth) acrylate, fluorine (meth) acrylate, fluorenone a (meth) acrylate monomer having a hetero ring, a halogen atom or a ruthenium atom such as a (meth) acrylate; hexanediol di(meth) acrylate or (poly)ethylene glycol di(methyl) Acrylate, (poly)propylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, pentaerythritol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol Tris (meth) acrylate, dipentaerythritol hexa (meth) acrylate, epoxy acrylate, polyester acrylate, urethane acrylate, etc. Functional monomer; isoprene, butadiene, isobutylene and other olefin-based monomers; vinyl ether, vinyl ether-based monomers. These monomer components can be used alone or in combination of two or more.
於本發明中,為了使黏著劑之凝聚力、加工時之接著性、黏著劑與基材之抓固性、及加工後之黏著膠帶之再剝離性提昇,而使用均 聚物之玻璃轉移溫度(Tg)為80℃以上之共聚單體(b)作為可與上述(甲基)丙烯酸烷基酯共聚合之其他單體成分。較好係使用進而較佳為均聚物之玻璃轉移溫度(Tg)為90℃以上、進而較佳為100℃以上之共聚單體。尤其是於用於在黏著劑中調配發泡劑等使其加熱發泡並再剝離之用途之情形等時,加熱時之發泡劑之發泡狀態穩定,可穩定地進行再剝離。作為此種共聚單體,具體而言,可列舉:甲基丙烯酸環己酯(Tg:83℃)、丙烯酸二環戊酯(Tg:120℃)、甲基丙烯酸二環戊酯(Tg:175℃)、丙烯酸異酯(Tg:94℃)、甲基丙烯酸異酯(Tg:150℃)、甲基丙烯酸第三丁酯(Tg:118℃)、甲基丙烯酸甲酯(Tg:105℃)、三羥甲基丙烷三丙烯酸酯(Tg:>250℃)、苯乙烯(Tg:80℃)、丙烯腈(Tg:97℃)、N-丙烯醯基嗎啉(Tg:145℃)、N,N-二甲基丙烯醯胺(Tg:89℃)等,可較佳地使用甲基丙烯酸甲酯。再者,除上述以外之(甲基)丙烯酸烷基酯之均聚物之Tg可根據「Polymer Handbook」(第4版、John Wiley & Sons,Inc、1999年)判斷。再者,於該文獻中,於記載有多個Tg值之情形時,採用「conventional」之值。上述共聚單體之調配量較佳為相對於構成丙烯酸系共聚物之單體成分總量(100重量%)較佳為1~20重量%,進而較佳為1~10重量%。In the present invention, in order to improve the cohesive force of the adhesive, the adhesion during processing, the adhesion of the adhesive to the substrate, and the removability of the adhesive tape after processing, the glass transition temperature of the homopolymer is used ( The comonomer (b) having a Tg) of 80 ° C or higher is used as another monomer component copolymerizable with the above alkyl (meth)acrylate. It is preferred to use a comonomer having a glass transition temperature (Tg) of a homopolymer of 90 ° C or higher, more preferably 100 ° C or higher. In particular, when it is used for the purpose of foaming and re-peeling a foaming agent or the like in an adhesive, the foaming state of the foaming agent during heating is stable, and re-peeling can be stably performed. Specific examples of such a comonomer include cyclohexyl methacrylate (Tg: 83 ° C), dicyclopentanyl acrylate (Tg: 120 ° C), and dicyclopentanyl methacrylate (Tg: 175). °C), acrylic acid Ester (Tg: 94 ° C), methacrylic acid Ester (Tg: 150 ° C), butyl methacrylate (Tg: 118 ° C), methyl methacrylate (Tg: 105 ° C), trimethylolpropane triacrylate (Tg: > 250 ° C), Styrene (Tg: 80 ° C), acrylonitrile (Tg: 97 ° C), N-propylene decylmorpholine (Tg: 145 ° C), N, N-dimethyl decylamine (Tg: 89 ° C), etc. Methyl methacrylate can be preferably used. Further, the Tg of the homopolymer of the alkyl (meth)acrylate other than the above can be judged according to "Polymer Handbook" (4th edition, John Wiley & Sons, Inc, 1999). Furthermore, in this document, when a plurality of Tg values are described, the value of "conventional" is used. The amount of the comonomer to be added is preferably from 1 to 20% by weight, and more preferably from 1 to 10% by weight, based on the total amount of the monomer component (100% by weight) constituting the acrylic copolymer.
於本發明中,就使加工時之接著性提昇之觀點而言,使用進而具有可與交聯劑(B)反應之官能基之單體(c)作為構成丙烯酸系共聚物之可共聚合之成分。作為具有此種官能基之單體,具體而言,可列舉:含羧基之單體、含羰基之單體、含羥基之單體、含縮水甘油基之單體等。作為上述具有可與交聯劑(B)反應之官能基之單體(c)之調配量,相對於構成丙烯酸系共聚物之單體成分總量(100重量%),較佳為10重量%以下(例如0.1~10重量%以下),尤佳為6重量%以下(例如0.1~6重量%以下)。In the present invention, the monomer (c) having a functional group reactive with the crosslinking agent (B) is used as a copolymerizable copolymer constituting the acrylic copolymer from the viewpoint of improving the adhesion at the time of processing. ingredient. Specific examples of the monomer having such a functional group include a carboxyl group-containing monomer, a carbonyl group-containing monomer, a hydroxyl group-containing monomer, and a glycidyl group-containing monomer. The amount of the monomer (c) having the functional group reactive with the crosslinking agent (B) is preferably 10% by weight based on the total amount of the monomer component (100% by weight) constituting the acrylic copolymer. The following (for example, 0.1 to 10% by weight or less) is particularly preferably 6% by weight or less (for example, 0.1 to 6% by weight or less).
作為上述含羧酸基之單體,例如有丙烯酸、甲基丙烯酸、順丁 烯二酸酐等,可較佳地使用丙烯酸。As the above carboxylic acid group-containing monomer, for example, acrylic acid, methacrylic acid, and cis-butyl Acrylic acid anhydride or the like can be preferably used.
作為含羰基之單體,例如只要為含有酮基及/或醛基者,則並無特別限制,例如可列舉:雙丙酮丙烯醯胺、雙丙酮甲基丙烯酸系醯胺、丙烯醛、甲醯基苯乙烯、乙烯基甲基酮、乙烯基乙基酮、乙烯基異丁基酮、二丙酮丙烯酸酯、二丙酮甲基丙烯酸酯、乙腈丙烯酸酯、丙烯酸2-羥基丙酯乙醯乙酸酯、丁二醇丙烯酸酯乙醯乙酸酯等。該等之中,尤其是可較佳地使用雙丙酮丙烯醯胺。The carbonyl group-containing monomer is not particularly limited as long as it contains a ketone group and/or an aldehyde group, and examples thereof include diacetone acrylamide, diacetone methacrylamide, acrolein, and formamidine. Styrene, vinyl methyl ketone, vinyl ethyl ketone, vinyl isobutyl ketone, diacetone acrylate, diacetone methacrylate, acetonitrile acrylate, 2-hydroxypropyl acetate acetate , butanediol acrylate acetamidine acetate and the like. Among these, in particular, diacetone acrylamide can be preferably used.
作為含羥基之單體,例如為(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸3-羥基丙酯、(甲基)丙烯酸4-羥基丁酯等,可較佳地使用丙烯酸2-羥基乙酯。As the hydroxyl group-containing monomer, for example, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 4-hydroxyl (meth)acrylate As the butyl ester or the like, 2-hydroxyethyl acrylate can be preferably used.
上述丙烯酸系共聚物(A)可利用公知或慣用之聚合方法將上述單體成分聚合而製備,例如可列舉:溶液聚合方法、塊狀聚合法或藉由活性能量線照射之聚合方法(活性能量線聚合方法)等。上述之中,就透明性、耐水性、成本等方面而言,較佳為溶液聚合方法、活性能量線聚合方法,更佳為溶液聚合方法。作為其他聚合方法,有乳化聚合等,但由於乳化聚合中使用乳化劑、鏈轉移劑等,因此擔心對被黏著體之污染,因而於本申請案中不佳。於上述溶液聚合時,可使用各種通常之溶劑。作為此種溶劑,例如可列舉:乙酸正丁酯等酯類;甲苯、苯等芳香族烴類;正己烷、正庚烷等脂肪族烴類;環己烷、甲基環己烷等脂環式烴類;甲基乙基酮、甲基異丁基酮等酮類等有機溶劑。該等可單獨使用或將2種以上組合使用。本申請案中所使用之黏著劑之丙烯酸系共聚物亦可摻合單體組成比不同之至少2種以上之丙烯酸系共聚物。The acrylic copolymer (A) can be produced by polymerizing the above monomer component by a known or conventional polymerization method, and examples thereof include a solution polymerization method, a bulk polymerization method, or a polymerization method by active energy ray irradiation (active energy). Line polymerization method) and so on. Among the above, in terms of transparency, water resistance, cost, and the like, a solution polymerization method and an active energy ray polymerization method are preferred, and a solution polymerization method is more preferred. Other polymerization methods include emulsion polymerization and the like. However, since an emulsifier, a chain transfer agent, or the like is used in the emulsion polymerization, contamination of the adherend is feared, which is not preferable in the present application. When the above solution is polymerized, various usual solvents can be used. Examples of such a solvent include esters such as n-butyl acetate; aromatic hydrocarbons such as toluene and benzene; aliphatic hydrocarbons such as n-hexane and n-heptane; and alicyclic rings such as cyclohexane and methylcyclohexane. An organic solvent such as a hydrocarbon such as a ketone such as methyl ethyl ketone or methyl isobutyl ketone. These may be used alone or in combination of two or more. The acrylic copolymer of the adhesive used in the present application may be blended with at least two or more acrylic copolymers having different monomer composition ratios.
作為上述丙烯酸系共聚物之重量平均分子量,就再剝離性之觀點而言,較佳為至少300000以上,較佳為400000以上。該重量平均分子量(Mw)可藉由凝膠滲透層析(GPC)法而測定。更具體而言,可使用 商品名「HLC-8120GPC」(Tosoh股份有限公司製造)作為GPC測定裝置,並藉由聚苯乙烯換算值於以下之GPC之測定條件下進行測定而求出。The weight average molecular weight of the acrylic copolymer is preferably at least 300,000 or more, and more preferably 400,000 or more from the viewpoint of removability. The weight average molecular weight (Mw) can be determined by a gel permeation chromatography (GPC) method. More specifically, it can be used The product name "HLC-8120GPC" (manufactured by Tosoh Co., Ltd.) was determined as a GPC measurement device by measuring the polystyrene conversion value under the measurement conditions of the following GPC.
GPC之測定條件GPC measurement conditions
.樣品濃度:0.2重量%(四氫呋喃溶液). Sample concentration: 0.2% by weight (tetrahydrofuran solution)
.樣品注入量:10μL. Sample injection amount: 10 μL
.溶析液:四氫呋喃(THF). Lysate: tetrahydrofuran (THF)
.流量(流速):0.6mL/min. Flow rate (flow rate): 0.6mL/min
.管柱溫度(測定溫度):40℃. Column temperature (measuring temperature): 40 ° C
.管柱:商品名「TSKgelSuperHM-H/H4000/H3000/H2000」(Tosoh股份有限公司製造). Pipe column: trade name "TSKgelSuperHM-H/H4000/H3000/H2000" (manufactured by Tosoh Co., Ltd.)
.檢測器:示差折射計(RI). Detector: Differential Refractometer (RI)
於本發明中之再剝離黏著劑組合物中,為了進一步提昇再剝離性,亦可調配發泡劑。發泡劑作為,可使用無機系或有機系發泡劑,作為通常所使用之無機系發泡劑之例,可列舉:水、碳酸銨、碳酸氫銨、碳酸氫鈉、亞硝酸銨、氫硼化鈉、石墨等。In the re-peeling adhesive composition of the present invention, in order to further improve the re-peelability, a foaming agent may be formulated. As the foaming agent, an inorganic or organic foaming agent can be used. Examples of the inorganic foaming agent which is usually used include water, ammonium carbonate, ammonium hydrogencarbonate, sodium hydrogencarbonate, ammonium nitrite, and hydrogen. Sodium boride, graphite, and the like.
作為有機系發泡劑之例,可列舉:三氯單氟甲烷或二氯單氟甲烷之類之氯氟化烷烴;偶氮雙異丁腈或偶氮二甲醯胺、鋇偶氮二羧酸酯之偶氮系化合物;對甲苯磺醯基醯肼或二苯基碸-3,3'-二磺醯基醯肼、4,4'-氧基雙(苯磺醯基醯肼)、烯丙基雙(磺醯基醯肼)之類之肼系化合物;ρ-甲苯基磺醯基半卡肼或4,4'-氧基雙(苯磺醯基半卡肼)之類之半卡肼系化合物;5-嗎啉基-1,2,3,4-噻三唑之類之三唑系化合物;N,N'-二亞硝基五亞甲基四胺或N,N'-二甲基-N,N'-二亞硝基對苯二甲醯胺之類之N-亞硝基系化合物等。又,亦可使用利用光等產生氣體之偶氮化合物或迭氮化合物等。Examples of the organic foaming agent include chlorofluorinated alkane such as trichloromonofluoromethane or dichloromonofluoromethane; azobisisobutyronitrile or azodimethylamine, hydrazine azodicarboxylate; An azo compound of an acid ester; p-toluenesulfonyl hydrazine or diphenyl hydrazine-3,3'-disulfonyl hydrazine, 4,4'-oxybis(phenylsulfonyl hydrazine), An oxime compound such as allyl bis(sulfonyl hydrazine); ρ-tolylsulfonyl semicarbazone or 4,4'-oxybis(phenylsulfonyl sulphonium) Carbene compound; triazole compound such as 5-morpholinyl-1,2,3,4-thiatriazole; N,N'-dinitrosopentamethylenetetramine or N,N' An N-nitroso compound such as dimethyl-N,N'-dinitroso-p-xylyleneamine or the like. Further, an azo compound or an azide compound which generates a gas by light or the like can also be used.
作為可最佳地使用之發泡劑,為使低沸點之液體內包於殼內所 得之微小球之熱膨脹性微小球,例如,只要為使異丁烷、丙烷、戊烷等因加熱而容易發生氣體化並膨脹之物質內包於具有彈性之殼內所得之微小球即可。上述殼多數情況下由熱熔融性物質或藉由熱膨脹而破壞之物質形成。作為形成上述殼之物質,例如可列舉:偏二氯乙烯-丙烯腈共聚物、聚乙烯醇、聚乙烯丁醛、聚甲基丙烯酸甲酯、聚丙烯腈、聚偏二氯乙烯、聚碸等。熱膨脹性微小球可利用慣用之方法例如凝聚法、界面聚合法等而製造。再者,關於熱膨脹性微小球,例如亦有松本油脂製藥股份有限公司製造之「Matsumoto Microsphere」(製品名F-30、F-36LV、F-50、F-65、FN-100SS、FN-180SS、F-190D、F-260D、F-2800D)、Japan Fillite股份有限公司製造之「Expancel」(製品名053-40、031-40、920-40、909-80、930-120)、吳羽化學工業股份有限公司製造之「DAIFOAM」(製品名H750、H850、H1100、S2320D、S2640D、M330、M430、M520)、積水化學工業股份有限公司製造之「ADVANCELL」(製品名EML101、EMH204、EHM301、EHM302、EHM303、EM304、EHM401、EM403、EM501)等市售品。As a foaming agent which can be optimally used, a liquid having a low boiling point is enclosed in a shell. The heat-expandable microspheres of the microspheres may be, for example, a microsphere obtained by encapsulating a substance which is easily gasified and expanded by heating, such as isobutane, propane or pentane, in an elastic shell. In many cases, the shell is formed of a hot melt material or a substance that is destroyed by thermal expansion. Examples of the material for forming the above shell include a vinylidene chloride-acrylonitrile copolymer, polyvinyl alcohol, polyvinyl butyral, polymethyl methacrylate, polyacrylonitrile, polyvinylidene chloride, polyfluorene, and the like. . The heat-expandable microspheres can be produced by a conventional method such as a coacervation method, an interfacial polymerization method, or the like. In addition, as for the heat-expandable microspheres, for example, "Matsumoto Microsphere" manufactured by Matsumoto Oil & Fat Pharmaceutical Co., Ltd. (product names F-30, F-36LV, F-50, F-65, FN-100SS, FN-180SS) , F-190D, F-260D, F-2800D), "Expancel" manufactured by Japan Fillite Co., Ltd. (product names 053-40, 031-40, 920-40, 909-80, 930-120), Wu Yu "DAIFOAM" (product name H750, H850, H1100, S2320D, S2640D, M330, M430, M520) manufactured by Chemical Industry Co., Ltd., "ADVANCELL" manufactured by Sekisui Chemical Industry Co., Ltd. (product names EML101, EMH204, EHM301, Commercial products such as EHM302, EHM303, EM304, EHM401, EM403, EM501).
於本發明中,為了使再剝離黏著劑組合物之接著性提昇,亦可使用黏著賦予劑。作為此種黏著賦予劑,例如,可調配公知或慣用之黏著賦予劑(萜酚樹脂、松香系樹脂、石油樹脂、香豆酮-茚樹脂、苯乙烯系樹脂等),可單獨調配1種以上之黏著賦予劑。其中,可較佳地使用萜酚樹脂。In the present invention, in order to improve the adhesion of the re-peeling adhesive composition, an adhesion-imparting agent can also be used. As such an adhesion-imparting agent, for example, a known or conventional adhesive-imparting agent (indophenol resin, rosin-based resin, petroleum resin, coumarone-indene resin, styrene-based resin, etc.) may be blended, and one or more types may be blended alone. Adhesive imparting agent. Among them, an indophenol resin can be preferably used.
作為上述黏著賦予樹脂之羥值,較佳為70KOH mg/g以上。尤其是於使用(甲基)丙烯酸烷基酯單體之烷基之碳數為4以下的(甲基)丙烯酸烷基酯單體(a)作為主單體之丙烯酸系共聚物(A)之情形時,若羥值未達70KOH mg/g,則與丙烯酸系共聚物之相溶性變差,接著特性或再剝離時由糊劑殘留所致之污染性變差。又,作為上述黏著賦予樹脂之酸值,較佳為10KOH mg/g以下,進而較佳為7KOH mg/g以下,最 佳為5KOH mg/g以下。上述黏著賦予樹脂之中有酸值大於10KOH mg/g之樹脂,若使用此種黏著賦予樹脂,則於丙烯酸系共聚物中調配有交聯劑之情形時,黏著賦予樹脂與交聯劑反應,從而減少丙烯酸系共聚物與交聯劑之反應。此種交聯障礙成為原因,黏著劑之凝膠成分下降,導致污染性或再剝離性變差。該羥值或酸值之測定方法係依據JIS K 0070-1992而進行評價。The hydroxyl value of the adhesion-imparting resin is preferably 70 KOH mg/g or more. In particular, an acrylic copolymer (A) having a carbon number of alkyl (meth) acrylate monomer of 4 or less and having an alkyl (meth) acrylate monomer (a) as a main monomer is used. In the case where the hydroxyl value is less than 70 KOH mg/g, the compatibility with the acrylic copolymer is deteriorated, and the contamination due to the residual of the paste at the time of the characteristics or re-peeling is deteriorated. Further, the acid value of the adhesion-imparting resin is preferably 10 KOH mg/g or less, more preferably 7 KOH mg/g or less, and most Preferably it is 5 KOH mg/g or less. In the above-mentioned adhesion-imparting resin, a resin having an acid value of more than 10 KOH mg/g is used. When such an adhesion-imparting resin is used, when a crosslinking agent is blended in the acrylic copolymer, the adhesion-providing resin reacts with the crosslinking agent. Thereby reducing the reaction of the acrylic copolymer with the crosslinking agent. This cross-linking disorder is a cause, and the gel component of the adhesive is lowered, resulting in deterioration of contamination or re-peelability. The method for measuring the hydroxyl value or the acid value was evaluated in accordance with JIS K 0070-1992.
(羥值之測定方法)(Method for measuring hydroxyl value)
樣品之羥值係依據JIS K 0070-1992(乙醯化法)而進行評價。取乙酸酐約25g並添加吡啶使總量為100mL,充分攪拌而製作乙醯化試劑。The hydroxyl value of the sample was evaluated in accordance with JIS K 0070-1992 (Ethyl acetate method). About 25 g of acetic anhydride was added and pyridine was added so that the total amount was 100 mL, and the mixture was sufficiently stirred to prepare an acetamidine reagent.
準確稱量試樣約2g並採取置於平底燒瓶中,添加乙醯化試劑5mL及吡啶10mL,並安裝空氣冷凝管。於100℃下加熱70分鐘後放置冷卻,自冷凝管上部添加甲苯35mL作為溶劑並攪拌後,添加水1mL並攪拌,而將乙酸酐分解。為了使分解完全,而再次加熱10分鐘並放置冷卻。Accurately weigh about 2 g of the sample and place it in a flat-bottomed flask, add 5 mL of acetamidine reagent and 10 mL of pyridine, and install an air condenser. After heating at 100 ° C for 70 minutes, it was left to cool, and 35 mL of toluene was added as a solvent from the upper portion of the condenser, and the mixture was stirred. Then, 1 mL of water was added and stirred to decompose acetic anhydride. In order to complete the decomposition, it was heated again for 10 minutes and left to cool.
利用乙醇5mL清洗冷凝管並拆卸,添加吡啶50mL作為溶劑並攪拌。使用全移液管向該溶液中添加0.5mol/L氫氧化鉀乙醇溶液25mL,利用0.5mol/L氫氧化鉀乙醇溶液進行電位差滴定並根據以下之式(3)算出羥值。The condenser was washed with 5 mL of ethanol and removed, and 50 mL of pyridine was added as a solvent and stirred. To the solution, 25 mL of a 0.5 mol/L potassium hydroxide ethanol solution was added using a full pipette, and potentiometric titration was performed using a 0.5 mol/L potassium hydroxide ethanol solution, and a hydroxyl value was calculated according to the following formula (3).
B:空白試驗所使用之0.5mol/L氫氧化鉀乙醇溶液之量(mL)B: The amount of 0.5 mol/L potassium hydroxide ethanol solution used in the blank test (mL)
C:試樣所使用之0.5mol/L氫氧化鉀乙醇溶液之量(mL)C: The amount of 0.5 mol/L potassium hydroxide ethanol solution used in the sample (mL)
f:0.5mol/L氫氧化鉀乙醇溶液之係數f: coefficient of 0.5 mol/L potassium hydroxide ethanol solution
S:試樣之採取量(g)S: the amount of sample taken (g)
D:酸值D: acid value
(酸值之測定方法)(Method for measuring acid value)
樣品之酸值係依據JIS K 0070-1992(電位差滴定方法)而進行評價。於將二乙醚與乙醇混合成以體積比計4:1所得之溶劑中添加酚酞溶液作為指示劑,以0.1mol/L氫氧化鉀乙醇溶液進行中和。準確稱量並採取試樣約5g置於燒杯中,添加溶劑50mL,於面板加熱器(80℃)上進行攪拌使其完全溶解,利用0.1mol/L氫氧化鉀乙醇溶液中進行電位差滴定。酸值係根據以下之式(4)求出。The acid value of the sample was evaluated in accordance with JIS K 0070-1992 (potential difference titration method). To the solvent obtained by mixing diethyl ether and ethanol to a volume ratio of 4:1, a phenolphthalein solution was added as an indicator, and the mixture was neutralized with a 0.1 mol/L potassium hydroxide ethanol solution. Accurately weigh and take about 5 g of the sample in a beaker, add 50 mL of solvent, stir on a panel heater (80 ° C) to completely dissolve it, and perform potentiometric titration using a 0.1 mol/L potassium hydroxide ethanol solution. The acid value was determined according to the following formula (4).
B:試樣所使用之0.1mol/L氫氧化鉀乙醇溶液之量(mL)B: The amount of 0.1 mol/L potassium hydroxide ethanol solution used in the sample (mL)
F:0.1mol/L氫氧化鉀乙醇溶液之係數F: coefficient of 0.1 mol/L potassium hydroxide ethanol solution
S:試樣之採取量(g)S: the amount of sample taken (g)
又,關於本發明中之再剝離黏著劑組合物,較佳為於對甲苯之溶解成分中重量平均分子量為1萬以下之溶解成分相對於再剝離黏著劑組合物總量較佳為40%以下,進而較佳為35%以下,更佳為30%以下,尤佳為25%以下,最佳為20%以下。若含有多於40%,則存在對再剝離性與污染性造成不良影響之情況。該再剝離黏著劑組合物對甲苯之溶解成分之重量平均分子量之測定方法係藉由以下詳述之方法而測定。Further, in the re-peeling adhesive composition of the present invention, it is preferable that the dissolved component having a weight average molecular weight of 10,000 or less in the dissolved component of p-toluene is preferably 40% or less based on the total amount of the re-peeling adhesive composition. Further, it is preferably 35% or less, more preferably 30% or less, still more preferably 25% or less, and most preferably 20% or less. If it contains more than 40%, it may have a bad influence on re-peelability and contamination. The method for measuring the weight average molecular weight of the re-peeling adhesive composition to the dissolved component of toluene is measured by the method described in detail below.
採取並準確稱量試樣(質量:Wa1 mg),利用平均孔徑0.2μm之四氟乙烯樹脂製多孔質膜(日東電工股份有限公司製造「NITOFLON(註冊商標)NTF1122」(平均孔徑0.2μm,氣孔率75%,厚度0.085mm))(質量:Wa2 mg)包成腰包狀,利用風箏線(質量:Wa3 mg)綁住 口。將該包裹放在容量50mL(預先於無蓋之狀態下測定容量50mL螺旋管之主質量:Wa4 mg)螺旋管中(每1個包裹使用1根螺旋管),於該螺旋管中充滿甲苯。將其於23℃下放置7天後,取出上述包裹並自溶解有溶膠成分之甲苯溶液將甲苯於30℃下減壓乾燥,測定含有溶膠成分之固形物之狀態之螺旋管之重量(質量:Wa5 mg)算出溶膠成分(質量:Wa6 mg)。Weighed and accurately weighed the sample (mass: W a1 mg), and made a porous film made of tetrafluoroethylene resin having an average pore diameter of 0.2 μm (NITOFLON (registered trademark) NTF1122 manufactured by Nitto Denko Co., Ltd.) (average pore size 0.2 μm, The porosity is 75%, the thickness is 0.085 mm)) (mass: W a2 mg) is wrapped into a waist pack, and the mouth is tied with a kite line (mass: W a3 mg). The capacity of 50mL placed parcel (in the state without cover previously measured capacity of the main mass of the spiral 50mL: W a4 mg) in a spiral (per one package using a spiral tube), in the helical tube filled with toluene. After leaving it at 23 ° C for 7 days, the above-mentioned package was taken out and the toluene solution in which the sol component was dissolved was dried under reduced pressure at 30 ° C to measure the weight of the spiral tube in the state of the solid matter containing the sol component (mass: W a5 mg) The sol component (mass: W a6 mg) was calculated.
Wa6 =(Wa5 -Wa4 )W a6 =(W a5 -W a4 )
繼而利用GPC(凝膠滲透層析法)測定溶膠成分之分子量。The molecular weight of the sol component was then measured by GPC (gel permeation chromatography).
上述溶膠成分之固形物成分之重量平均分子量(Mw)可利用凝膠滲透層析(GPC)法而測定。更具體而言,可使用商品名「HLC-8120GPC」(Tosoh股份有限公司製造)作為GPC測定裝置,並藉由聚苯乙烯換算值於以下之GPC之測定條件下進行測定而求出。The weight average molecular weight (Mw) of the solid content component of the sol component can be measured by a gel permeation chromatography (GPC) method. More specifically, the product name "HLC-8120GPC" (manufactured by Tosoh Co., Ltd.) can be used as a GPC measuring device, and can be obtained by measuring the polystyrene-converted value under the measurement conditions of the following GPC.
GPC之測定條件GPC measurement conditions
.樣品濃度:0.2重量%(四氫呋喃溶液). Sample concentration: 0.2% by weight (tetrahydrofuran solution)
.樣品注入量:10μL. Sample injection amount: 10 μL
.溶析液:四氫呋喃(THF). Lysate: tetrahydrofuran (THF)
.流量(流速):0.6mL/min. Flow rate (flow rate): 0.6mL/min
.管柱溫度(測定溫度):40℃. Column temperature (measuring temperature): 40 ° C
.管柱:商品名「TSKgelSuperHM-H/H4000/H3000/H2000」(Tosoh股份有限公司製造). Pipe column: trade name "TSKgelSuperHM-H/H4000/H3000/H2000" (manufactured by Tosoh Co., Ltd.)
.檢測器:示差折射計(RI). Detector: Differential Refractometer (RI)
根據溶膠成分之重量平均分子量之曲線整體求出重量平均分子量1萬以下之比率Wm(%),以相對於試樣整體之比率A10000 (%)之形式算出試樣對甲苯之溶解成分中之重量平均分子量1萬以下之溶解成分。The ratio Wm (%) of the weight average molecular weight of 10,000 or less is calculated from the curve of the weight average molecular weight of the sol component as a whole, and the sample is calculated as a dissolved component of toluene in the form of a ratio A 10000 (%) to the entire sample. A dissolved component having a weight average molecular weight of 10,000 or less.
A10000 (%)=[Wa6 (mg)×Wm(%)/Wa1 (mg)]×100A 10000 (%) = [W a6 (mg) × Wm (%) / W a1 (mg)] × 100
作為再剝離黏著劑組合物所調配之交聯劑(B),例如,除異氰酸酯系交聯劑、環氧系交聯劑、三聚氰胺系交聯劑、過氧化物系交聯劑以外,可列舉:脲系交聯劑、金屬烷氧化物系交聯劑、金屬螯合物系交聯劑、金屬鹽系交聯劑、碳二醯亞胺系交聯劑、唑啉系交聯劑、氮丙啶系交聯劑、胺系交聯劑等,可較佳地使用異氰酸酯系交聯劑、環氧系交聯劑。The crosslinking agent (B) to be blended as the re-peeling adhesive composition is, for example, an isocyanate-based crosslinking agent, an epoxy-based crosslinking agent, a melamine-based crosslinking agent, or a peroxide-based crosslinking agent. : a urea-based crosslinking agent, a metal alkoxide crosslinking agent, a metal chelate crosslinking agent, a metal salt crosslinking agent, a carbon diimide crosslinking agent, As the oxazoline crosslinking agent, the aziridine crosslinking agent, the amine crosslinking agent, and the like, an isocyanate crosslinking agent or an epoxy crosslinking agent can be preferably used.
(異氰酸酯系交聯劑)(isocyanate crosslinking agent)
作為上述異氰酸酯系交聯劑,具體而言,可例示:丁烯二異氰酸酯、六亞甲基二異氰酸酯等低級脂肪族聚異氰酸酯類;二異氰酸伸環戊酯、二異氰酸伸環己酯、異佛爾酮二異氰酸酯等脂環族異氰酸酯類,2,4-甲苯二異氰酸酯、4,4'-二苯基甲烷二異氰酸酯、苯二甲基二異氰酸酯等芳香族異氰酸酯類;三羥甲基丙烷/甲苯二異氰酸酯三聚物加成物(商品名Coronate L,日本聚胺酯工業股份有限公司製造)、三羥甲基丙烷/六亞甲基二異氰酸酯三聚物加成物(商品名Coronate HL,日本聚胺酯工業股份有限公司製造)、六亞甲基二異氰酸酯之異氰尿酸酯物(商品名Coronate HX,日本聚胺酯工業股份有限公司製造)等異氰酸酯加成物等。該等化合物可單獨使用,又,亦可將兩種以上混合使用。Specific examples of the isocyanate-based crosslinking agent include lower aliphatic polyisocyanates such as butylene diisocyanate and hexamethylene diisocyanate; cyclopentyl diisocyanate and diisocyanate ring An alicyclic isocyanate such as an ester or isophorone diisocyanate; an aromatic isocyanate such as 2,4-toluene diisocyanate, 4,4'-diphenylmethane diisocyanate or benzodimethyl diisocyanate; Propane/toluene diisocyanate trimer adduct (trade name: Coronate L, manufactured by Japan Polyurethane Industry Co., Ltd.), trimethylolpropane/hexamethylene diisocyanate trimer adduct (trade name Coronate HL) , manufactured by Japan Polyurethane Industry Co., Ltd.), an isocyanate adduct such as hexamethylene diisocyanate isocyanurate (trade name: Coronate HX, manufactured by Japan Polyurethane Industry Co., Ltd.). These compounds may be used singly or in combination of two or more.
於使用異氰酸酯交聯劑之情形時,亦可使用觸媒等。例如可使用二辛基二月桂酸錫(EMBILIZER OL-1,Tokyo Fine Chemical公司製造)、或其他通常之胺類或有機金屬系之觸媒。異氰酸酯系交聯劑之調配量可根據所控制之黏著力而適當決定。通常,每基礎聚合物100重量份中調配1~20重量份,較佳為調配1~10重量份。In the case of using an isocyanate crosslinking agent, a catalyst or the like can also be used. For example, tin dioctyltin laurate (EMBILIZER OL-1, manufactured by Tokyo Fine Chemical Co., Ltd.) or other usual amine or organometallic catalyst can be used. The blending amount of the isocyanate crosslinking agent can be appropriately determined depending on the adhesion to be controlled. Usually, 1 to 20 parts by weight, preferably 1 to 10 parts by weight, per 100 parts by weight of the base polymer are blended.
(環氧系交聯劑)(epoxy crosslinker)
作為上述環氧系交聯劑,例如,除N,N,N',N'-四縮水甘油基間苯二甲胺、二縮水甘油基苯胺、1,3-雙(N,N-縮水甘油基胺基甲基)環己 烷(製品名「Tetrad C」,三菱瓦斯化學股份有限公司製造)、1,6-己二醇二縮水甘油醚(製品名「Epolight 1600」,共榮社化學股份有限公司製造)、新戊二醇二縮水甘油醚(製品名「Epolight 1500NP」,共榮社化學股份有限公司製造)、乙二醇二縮水甘油醚(製品名「Epolight 40E」,共榮社化學股份有限公司製造)、丙二醇二縮水甘油醚(製品名「Epolight 70P」,共榮社化學股份有限公司製造)、聚乙二醇二縮水甘油醚(製品名「EPIOL E-400」,日本油脂股份有限公司製造)、聚丙二醇二縮水甘油醚(製品名「EPIOL P-200」,日本油脂股份有限公司製造)、山梨糖醇聚縮水甘油醚(製品名「DENACOL EX-611」,Nagase chemteX股份有限公司製造)、甘油聚縮水甘油醚(製品名「DENACOL EX-314」,Nagase chemteX股份有限公司製造)、季戊四醇聚縮水甘油醚、聚甘油聚縮水甘油醚(製品名「DENACOL EX-512」,Nagase chemteX股份有限公司製造)、山梨糖醇酐聚縮水甘油醚、三羥甲基丙烷聚縮水甘油醚、己二酸二縮水甘油酯、鄰苯二甲酸二縮水甘油酯、三(2-羥基乙基)異氰尿酸三縮水甘油酯、間苯二酚二縮水甘油醚、雙酚-S-二縮水甘油醚以外,可列舉分子內具有2個以上之環氧基之環氧系樹脂等。該等交聯劑可單獨使用,又,亦可將兩種以上混合使用。As the above epoxy-based crosslinking agent, for example, N,N,N',N'-tetraglycidyl meta-xylylenediamine, diglycidylaniline, 1,3-bis(N,N-glycidol) Aminomethyl)cyclohexyl Alkane (product name "Tetrad C", manufactured by Mitsubishi Gas Chemical Co., Ltd.), 1,6-hexanediol diglycidyl ether (product name "Epolight 1600", manufactured by Kyoeisha Chemical Co., Ltd.), Niigata Alcohol diglycidyl ether (product name "Epolight 1500NP", manufactured by Kyoeisha Chemical Co., Ltd.), ethylene glycol diglycidyl ether (product name "Epolight 40E", manufactured by Kyoeisha Chemical Co., Ltd.), propylene glycol II Glycidyl ether (product name "Epolight 70P", manufactured by Kyoeisha Chemical Co., Ltd.), polyethylene glycol diglycidyl ether (product name "EPIOL E-400", manufactured by Nippon Oil Co., Ltd.), polypropylene glycol II Glycidyl ether (product name "EPIOL P-200", manufactured by Nippon Oil & Fat Co., Ltd.), sorbitol polyglycidyl ether (product name "DENACOL EX-611", manufactured by Nagase ChemteX Co., Ltd.), glycerol polyglycidyl Ether (product name "DENACOL EX-314", manufactured by Nagase chemteX Co., Ltd.), pentaerythritol polyglycidyl ether, polyglycerol polyglycidyl ether (product name "DENACOL EX-512", Nagase chemt Manufactured by eX Co., Ltd., sorbitan polyglycidyl ether, trimethylolpropane polyglycidyl ether, diglycidyl adipate, diglycidyl phthalate, tris(2-hydroxyethyl) In addition to the triglycidyl isocyanurate, the resorcinol diglycidyl ether, and the bisphenol-S-diglycidyl ether, an epoxy resin having two or more epoxy groups in the molecule may be mentioned. These crosslinking agents may be used singly or in combination of two or more.
環氧系交聯劑之調配量可根據控制黏著力而適當地決定。通常,每基礎聚合物100重量份中調配0.1~5重量份,較佳為調配0.1~3重量份。The amount of the epoxy-based crosslinking agent can be appropriately determined depending on the control adhesion. Usually, 0.1 to 5 parts by weight, preferably 0.1 to 3 parts by weight, per 100 parts by weight of the base polymer are blended.
作為於本發明中可使用之交聯劑,並無特別限定,例如可使用環氧系、異氰酸酯系、肼系、三聚氰胺系、碳二醯亞胺系、唑啉系、金屬螯合物等。The crosslinking agent which can be used in the present invention is not particularly limited, and examples thereof include epoxy-based, isocyanate-based, guanidine-based, melamine-based, and carbodiimide-based. An oxazoline system, a metal chelate compound, and the like.
作為除此以外之添加劑,可列舉:填充劑(亦包含玻璃粒子等在內)、著色劑(顏料或染料等)、抗氧化劑、紫外線吸收劑、界面活性 劑、塑化劑、導電粒子等公知之各種添加劑。Examples of the other additives include a filler (including glass particles and the like), a colorant (pigment or dye), an antioxidant, an ultraviolet absorber, and an interfacial activity. Various known additives such as a agent, a plasticizer, and conductive particles.
本發明之再剝離黏著片至少具有由上述再剝離黏著劑組合物形成之再剝離黏著劑層。可為將此種再剝離黏著劑層設置於片狀基材(支持體)之單面或兩面之形態之黏著片(所謂附有基材之黏著片),或亦可為將上述再剝離黏著劑層設置於例如隔片之具有剝離性之支持體上之形態(將貼附時支持黏著劑層之基材去除剝離襯墊之形態)的黏著片(所謂無基材之黏著片)。The re-peelable adhesive sheet of the present invention has at least a re-peeling adhesive layer formed of the above-mentioned re-peeling adhesive composition. An adhesive sheet in which the re-peeling adhesive layer is provided on one side or both sides of a sheet-like substrate (support) (so-called adhesive sheet with a substrate) may be used, or the above-mentioned re-peelable adhesive may be used. The adhesive layer is provided on, for example, a form of a release sheet of a separator (a form in which a base material supporting the adhesive layer is removed to remove a release liner) (a so-called substrate-free adhesive sheet).
作為上述基材,例如多數情況下使用塑膠系基材,但除塑膠基材以外,亦無特別限定,可使用紙、金屬箔、織物、纖維等。作為塑膠系基材之原料,例如可列舉:聚酯(聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、聚對苯二甲酸乙二酯、聚萘二甲酸丁二酯等)、聚烯烴(聚乙烯、聚丙烯、聚甲基戊烯、乙烯-丙烯共聚物等)、聚乙烯醇、聚偏二氯乙烯、聚氯乙烯、氯乙烯-乙酸乙烯酯共聚物、聚乙酸乙烯酯、聚醯胺、聚醯亞胺、纖維素類、氟系樹脂、聚醚、聚醚醯胺、聚醚腈、聚醚醚酮、聚苯硫醚、聚苯乙烯系樹脂(聚苯乙烯等)、聚碳酸酯、聚醚碸等。該等可單獨使用或將2種以上組合使用。於本發明中,其中就耐熱性方面而言,較佳為以選自聚對苯二甲酸乙二酯等聚酯、聚丙烯等聚烯烴等、聚醯亞胺及氟系樹脂中之樹脂作為原料之基材。作為基材之厚度,並無特別限定,較佳為8~300μm左右,更佳為10~200μm左右。若基材之厚度低於上述範圍,則黏著膠帶之強度不足,而存在有損實用性之虞。As the base material, for example, a plastic base material is often used, but the plastic base material is not particularly limited, and paper, metal foil, woven fabric, fiber, or the like can be used. Examples of the raw material of the plastic base material include polyester (polyethylene terephthalate, polyethylene naphthalate, polyethylene terephthalate, polybutylene naphthalate, etc.). , polyolefin (polyethylene, polypropylene, polymethylpentene, ethylene-propylene copolymer, etc.), polyvinyl alcohol, polyvinylidene chloride, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, polyvinyl acetate Ester, polyamide, polyimine, cellulose, fluorine resin, polyether, polyether amide, polyether nitrile, polyether ether ketone, polyphenylene sulfide, polystyrene resin (polystyrene) Etc.), polycarbonate, polyether oxime, etc. These may be used alone or in combination of two or more. In the present invention, in terms of heat resistance, a resin selected from the group consisting of polyesters such as polyethylene terephthalate and polyolefins such as polypropylene, polyimine and fluorine resins is preferably used. The substrate of the raw material. The thickness of the substrate is not particularly limited, but is preferably about 8 to 300 μm, more preferably about 10 to 200 μm. If the thickness of the base material is less than the above range, the strength of the adhesive tape is insufficient, which may impair the practicality.
上述基材可為單層,亦可為2層以上之積層體。於基材為2層以上之積層體之情形時,各層可具有相同之組成,亦可組合不同組成之層而進行積層。The substrate may be a single layer or a laminate of two or more layers. In the case where the substrate is a laminate of two or more layers, each layer may have the same composition, or may be laminated by combining layers of different compositions.
又,為了提高與黏著劑層等之抓固力,可視需要對基材之表面實施表面處理,例如藉由電暈處理、鉻酸處理、臭氧暴露、火焰暴 露、高壓電擊暴露、離子化輻射、金屬鈉處理等化學或物理方法的氧化處理等,作為基材表面之表面自由能量,較佳為有35mN/m以上。Further, in order to improve the gripping force with the adhesive layer or the like, the surface of the substrate may be subjected to surface treatment as needed, for example, by corona treatment, chromic acid treatment, ozone exposure, flame storm The surface free energy of the surface of the substrate is preferably 35 mN/m or more, such as exposure, high-voltage electric shock exposure, ionizing radiation, oxidation treatment by chemical or physical methods such as metal sodium treatment.
為了提昇上述基材與再剝離黏著劑層之抓固性,亦可視需要於基材之黏著劑層側設置底塗劑層。底塗劑層係視需要而設置之層,可未必設置。In order to improve the grip of the substrate and the re-adhesive layer, it is also possible to provide a primer layer on the side of the adhesive layer of the substrate. The primer layer is a layer provided as needed, and may not necessarily be provided.
於上述再剝離黏著劑組合物中含有發泡劑之情形時,就對再剝離黏著片賦予變形性或使加熱後之剝離性提昇之觀點而言,較佳為於基材與再剝離黏著劑層之間設置底塗劑層。如此,藉由設置底塗劑層,而於利用包括含有發泡劑之再剝離黏著劑組合物之再剝離黏著片與被黏著體(被加工品等)接著時,使上述再剝離黏著片中之再剝離黏著劑層之表面良好地追隨被黏著體之表面形狀,從而可增大接著面積。又,於將上述再剝離黏著片自被黏著體加熱剝離時,可高度(精度良好地)控制再剝離黏著劑層之加熱膨脹,可使再剝離黏著劑層優先且均勻地向厚度方向膨脹。即,底塗劑層具備於使再剝離黏著片與被黏著體接著時該表面追隨被黏著體之表面形狀從而提供較大之接著面積之功能。另外,底塗劑層亦具有如下功能:為了自再剝離黏著片剝離被黏著體而於加熱再剝離黏著劑層使其發泡及/或膨脹時減少再剝離黏著片於面方向之發泡及/或膨脹之約束,再剝離黏著層發生立體構造變化,藉此促進起伏構造形成。In the case where the foaming agent is contained in the above-mentioned re-peeling adhesive composition, it is preferred to provide a substrate and a re-peeling adhesive from the viewpoint of imparting deformability to the re-peelable adhesive sheet or improving the peeling property after heating. A primer layer is disposed between the layers. In this manner, by providing the primer layer, the re-peeling adhesive sheet including the re-peeling adhesive composition containing the foaming agent is adhered to the adherend (processed product, etc.) The surface of the re-adhesive adhesive layer satisfactorily follows the surface shape of the adherend, thereby increasing the adhesion area. Moreover, when the re-peelable adhesive sheet is heated and peeled off from the adherend, the thermal expansion of the re-adhesive adhesive layer can be controlled with high precision (precision), and the re-peeling adhesive layer can be preferentially and uniformly expanded in the thickness direction. That is, the primer layer is provided to provide a large contact area when the surface of the adherend adheres to the surface of the adherend when the re-peelable adhesive sheet and the adherend are attached. In addition, the primer layer also has the function of reducing the foaming of the re-peelable adhesive sheet in the surface direction in order to peel off the adherend from the re-peelable adhesive sheet and to heat and then peel the adhesive layer to cause foaming and/or expansion. / or expansion constraints, and then peeling the adhesive layer to undergo a three-dimensional structural change, thereby promoting the formation of the relief structure.
於再剝離黏著片為附有基材之黏著片之情形時,底塗劑層較佳為設置於片狀基材與再剝離黏著劑層之間,底塗劑層可設置於基材之單面或兩面。又,於再剝離黏著片為無基材之黏著片之情形時,底塗劑層較佳為設置於再剝離黏著劑層之與貼附有被黏著體側之面相反側之面。In the case where the adhesive sheet is a substrate-attached adhesive sheet, the primer layer is preferably disposed between the sheet substrate and the re-peeling adhesive layer, and the primer layer may be disposed on the substrate. Face or two sides. Further, in the case where the adhesive sheet is a substrate-free adhesive sheet, the primer layer is preferably provided on the surface of the re-peeling adhesive layer opposite to the side to which the adherend side is attached.
底塗劑層可採用黏著劑層,作為其材料,並無特別限制,可較佳地使用上述再剝離黏著劑組合物所例示之黏著劑等作為構成材料。 作為上述黏著劑,可自丙烯酸系黏著劑、橡膠系黏著劑、乙烯基烷基醚系黏著劑、矽酮系黏著劑、聚酯系黏著劑、聚醯胺系黏著劑、胺基甲酸酯系黏著劑、苯乙烯-二烯嵌段共聚物系黏著劑、蠕變特性改良型黏著劑、放射線硬化型黏著劑等中適當選擇。The primer layer may be an adhesive layer, and the material thereof is not particularly limited, and an adhesive or the like exemplified as the above-mentioned re-peeling adhesive composition can be preferably used as a constituent material. The adhesive may be an acrylic adhesive, a rubber adhesive, a vinyl alkyl ether adhesive, an anthrone adhesive, a polyester adhesive, a polyamide adhesive, or a urethane. The adhesive, the styrene-diene block copolymer-based adhesive, the creep-modified adhesive, and the radiation-curable adhesive are appropriately selected.
更具體而言,例如可列舉:以天然橡膠或合成橡膠作為基礎聚合物之橡膠系黏著劑;以下述(甲基)丙烯酸系聚合物作為基礎聚合物之丙烯酸系黏著劑等:該(甲基)丙烯酸系聚合物係以具有甲基、乙基、丙基、丁基、2-乙基己基、異辛基、異壬基、異癸基、十二烷基、月桂基、十三烷基、十五烷基、十六烷基、十七烷基、十八烷基、十九烷基、二十烷基等碳數為20以下之烷基之丙烯酸或甲基丙烯酸等(甲基)丙烯酸系烷基酯、丙烯酸、甲基丙烯酸、伊康酸、丙烯酸羥基乙酯、甲基丙烯酸羥基乙酯、丙烯酸羥基丙酯、甲基丙烯酸羥基丙酯、N-羥甲基丙烯醯胺、丙烯腈、甲基丙烯腈、丙烯酸縮水甘油酯、甲基丙烯酸縮水甘油酯、乙酸乙烯酯、苯乙烯、異戊二烯、丁二烯、異丁烯、乙烯醚等作為主成分。More specifically, for example, a rubber-based adhesive using natural rubber or synthetic rubber as a base polymer, an acrylic adhesive having a (meth)acrylic polymer as a base polymer, and the like: Acrylic polymer has methyl, ethyl, propyl, butyl, 2-ethylhexyl, isooctyl, isodecyl, isodecyl, dodecyl, lauryl, tridecyl , pentadecyl, hexadecyl, heptadecyl, octadecyl, nonadecyl, eicosyl, etc., such as acrylic acid or methacrylic acid having an alkyl group having a carbon number of 20 or less (methyl) Acrylic alkyl ester, acrylic acid, methacrylic acid, itaconic acid, hydroxyethyl acrylate, hydroxyethyl methacrylate, hydroxypropyl acrylate, hydroxypropyl methacrylate, N-methylol acrylamide, propylene Nitrile, methacrylonitrile, glycidyl acrylate, glycidyl methacrylate, vinyl acetate, styrene, isoprene, butadiene, isobutylene, vinyl ether or the like as a main component.
作為底塗劑層,除由上述之黏著劑構成以外,亦可由天然橡膠、合成橡膠或具有橡膠彈性之合成樹脂形成。作為上述合成樹脂,例如可列舉:腈系、二烯系、丙烯酸系樹脂系等合成橡膠;聚烯烴系、聚酯系等熱塑性彈性體;乙烯-乙酸乙烯酯共聚物、聚胺基甲酸酯、聚丁二烯、軟質聚氯乙烯等具有橡膠彈性之合成樹脂等。The primer layer may be formed of natural rubber, synthetic rubber or a synthetic resin having rubber elasticity in addition to the above-mentioned adhesive. Examples of the synthetic resin include synthetic rubbers such as nitrile-based, diene-based, and acrylic-based resins; thermoplastic elastomers such as polyolefins and polyesters; and ethylene-vinyl acetate copolymers and polyurethanes. A rubber-elastic synthetic resin such as polybutadiene or soft polyvinyl chloride.
再者,即便如聚氯乙烯等般本質上為硬質系聚合物,亦可藉由與塑化劑或柔軟劑等調配劑之組合而表現橡膠彈性而使用。Further, even if it is a hard polymer as in the case of polyvinyl chloride or the like, it can be used by expressing a rubber elasticity by a combination with a compounding agent such as a plasticizer or a softener.
又,包括該等材料之底塗劑層與上述再剝離黏著劑層同樣,亦可為於上述黏著劑或合成樹脂中調配有交聯劑、黏著賦予樹脂、塑化劑、填充劑、抗老化劑等適當之添加劑者。Further, the primer layer including the materials may be a crosslinking agent, an adhesion-imparting resin, a plasticizer, a filler, and an anti-aging agent in the adhesive or synthetic resin as in the above-mentioned re-peeling adhesive layer. Suitable additives such as agents.
底塗劑層之形成例如可利用以下適當之方式而進行:將含有底 塗劑層之構成材料之塗佈液塗佈於片狀基材上之方式(塗佈法)、將包括橡膠狀有機彈性層形成材之膜或預先於包括1層以上之熱膨脹性黏著劑層上形成有包括上述橡膠狀有機彈性層形成材之層的積層膜與片狀基材接著之方式(乾式層壓法)、將含有片狀基材之構成材料之樹脂組合物與含有上述橡膠狀有機彈性層形成材之樹脂組合物共擠出之方式(共擠出法)等。The formation of the primer layer can be carried out, for example, in the following manner: A method in which a coating liquid of a constituent material of a coating layer is applied onto a sheet substrate (coating method), a film including a rubber-like organic elastic layer forming material, or a thermal expansion adhesive layer including one or more layers in advance a laminated film having a layer of the rubber-like organic elastic layer forming material and a sheet-form substrate formed thereon (dry lamination method), a resin composition containing a constituent material of the sheet-form substrate, and the rubber-like material A method of co-extruding a resin composition of an organic elastic layer forming material (co-extrusion method) or the like.
再者,底塗劑層亦可由以該等成分作為主體之發泡膜等形成。發泡可藉由慣用之方法例如藉由機械攪拌之方法、利用反應生成氣體之方法、使用發泡劑之方法、去除可溶性物質之方法、藉由噴霧之方法、形成混凝泡之方法、燒結法等而進行。橡膠狀有機彈性層可由包含單層或由2層以上之層之積層構造構成。Further, the primer layer may be formed of a foamed film or the like mainly composed of the components. The foaming can be carried out by a conventional method such as a method of mechanical stirring, a method of generating a gas by a reaction, a method of using a foaming agent, a method of removing a soluble substance, a method of spraying, a method of forming a coagulation bubble, and sintering. Law and so on. The rubber-like organic elastic layer may be composed of a laminated structure including a single layer or a layer of two or more layers.
此種底塗劑層之厚度為0.1~100μm,較佳為0.1~50μm,更佳為0.1~5μm。只要為此種範圍,則不會過薄,且可表現再剝離黏著片追隨被黏著體之表面形狀而提供較大之接著面積的功能、與再剝離黏著劑層藉由發生立體構造變化而促進起伏構造形成之功能。又,由於並非厚至必要以上,因此發泡後亦不會於橡膠狀有機彈性層發生凝聚破壞。The primer layer has a thickness of 0.1 to 100 μm, preferably 0.1 to 50 μm, more preferably 0.1 to 5 μm. As long as it is in such a range, it is not too thin, and it can exhibit the function of providing a large contact area following the surface shape of the adherend by the re-peelable adhesive sheet, and promoting the three-dimensional structural change with the re-peeling adhesive layer. The function of the undulating structure. Further, since it is not thicker than necessary, it does not cause aggregation failure in the rubber-like organic elastic layer after foaming.
作為於保管時或移送時等使用前用以保護再剝離黏著劑層等之表面(黏著面)之保護材,可使用用以被覆該表面之隔片,但隔片可視需要而使用,可不一定使用。作為隔片,可為兩面成為脫模面者,亦可為僅一面(單面)成為脫模面者。再者,隔片係於利用被該隔片保護之黏著劑層時被剝離。As a protective material for protecting the surface (adhesive surface) of the re-peeling adhesive layer or the like before use, such as during storage or transfer, a spacer for covering the surface may be used, but the spacer may be used as needed, and may not necessarily be used. use. As the separator, the both surfaces may be the release surface, or the one surface (one surface) may be the release surface. Further, the separator is peeled off when the adhesive layer protected by the separator is used.
作為此種隔片,可使用公知或慣用之剝離紙等。As such a separator, a known or conventional release paper or the like can be used.
具體而言,作為隔片,例如可使用經藉由矽酮系、長鏈烷基系、氟系、硫化鉬等之剝離劑進行過表面處理之塑膠膜或紙等具有剝離劑層之基材;包括聚四氟乙烯、聚氯三氟乙烯、聚氟乙烯、聚偏二 氟乙烯、四氟乙烯-六氟丙烯共聚物、氯氟乙烯-偏二氟乙烯共聚物等氟系聚合物之低接著性基材;包括烯烴系樹脂(例如,聚乙烯、聚丙烯等)等無極性聚合物之低接著性基材等。當然,若為具有剝離劑層之基材,則剝離劑層表面為脫模面,若為低接著性基材,則低接著性基材之表面為脫模面。Specifically, as the separator, for example, a substrate having a release agent layer such as a plastic film or paper which has been surface-treated with a release agent such as an anthrone-based, a long-chain alkyl group, a fluorine-based or a molybdenum sulfide can be used. ; including PTFE, polychlorotrifluoroethylene, polyvinyl fluoride, polyethylene a low-adhesive substrate of a fluorine-based polymer such as a vinyl fluoride, a tetrafluoroethylene-hexafluoropropylene copolymer or a chlorofluoroethylene-vinylidene fluoride copolymer; and an olefin-based resin (for example, polyethylene, polypropylene, etc.) A low-adhesive substrate or the like of a non-polar polymer. Of course, in the case of a substrate having a release agent layer, the surface of the release agent layer is a release surface, and if it is a low adhesion substrate, the surface of the low adhesion substrate is a release surface.
上述再剝離黏著片之23℃下之剪切接著力較佳為10N/25mm×25mm以上,進而較佳為20N/25mm×25mm以上。藉由設為此種範圍,則可防止加工時零件飛濺,可獲得加工後之剝離性良好之再剝離黏著片。The shearing force at 23 ° C of the above-mentioned re-peelable adhesive sheet is preferably 10 N / 25 mm × 25 mm or more, and further preferably 20 N / 25 mm × 25 mm or more. By setting it as such a range, it is possible to prevent the component from splashing during processing, and it is possible to obtain a re-peelable adhesive sheet having good peelability after processing.
上述再剝離黏著片於23℃下與聚對苯二甲酸乙二酯膜(厚度:25μm)貼合後,於23℃環境下放置30分鐘時23℃下之再剝離黏著劑層之黏著力(剝離角度:180°,拉伸速度:300mm/min)較良好為0.2~20N/20mm寬度、較佳為0.5~20N/20mm寬度。於23℃環境下之上述黏著力為0.2~20N/20mm寬度之情形時,可充分保持被黏著體,於切斷加工時晶片不會被剝離。於上述黏著力未達0.2N/20mm寬度之情形時,難以充分保持被黏著體,存在於切斷加工時發生晶片之剝離。又,於上述黏著力為20N/20mm寬度以上之情形時,存在發生無法自被黏著體再剝離之不良情況之情形。After adhering the above-mentioned re-peelable adhesive sheet to a polyethylene terephthalate film (thickness: 25 μm) at 23 ° C, the adhesion of the adhesive layer at 23 ° C was further removed at 23 ° C for 30 minutes ( The peeling angle: 180°, the stretching speed: 300 mm/min) is preferably 0.2 to 20 N/20 mm width, preferably 0.5 to 20 N/20 mm width. When the adhesive force in the environment of 23 ° C is 0.2 to 20 N / 20 mm width, the adherend can be sufficiently held, and the wafer is not peeled off during the cutting process. When the adhesion is less than 0.2 N/20 mm, it is difficult to sufficiently hold the adherend, and peeling of the wafer occurs during the cutting process. Further, when the adhesive force is 20 N/20 mm or more, there is a case where the adhesive is not peeled off from the adherend.
於上述再剝離黏著片中,於在基材之一面設置含有發泡層之再剝離黏著劑層之情形時,於基材之另一面可設置例如用以使再剝離黏著片固定於為了至少於切斷被切斷物時等使應固定之對象物固定之期間使對象物固定而另外準備之基台的接著劑層。此時之接著劑層亦必須對例如切斷等加工中產生之熱或振動等刺激穩定。作為該接著劑層,例如可使用以上述黏著劑所使用之樹脂作為基礎者。In the above-mentioned re-peelable adhesive sheet, when a re-peeling adhesive layer containing a foamed layer is provided on one surface of the substrate, the other side of the substrate may be provided, for example, to fix the re-peelable adhesive sheet to at least The adhesive layer of the base which is prepared by fixing the object to be fixed while the object to be fixed is being fixed, such as when the object to be cut is cut. The adhesive layer at this time must also be stable to heat or vibration generated during processing such as cutting. As the adhesive layer, for example, a resin used as the above-mentioned adhesive can be used as a basis.
(本發明之熱剝離型黏著膠帶之使用方法)(Method of using the heat-peelable adhesive tape of the present invention)
本發明之再剝離黏著片可用作用以於專門切斷電子零件時使電 子零件於基板上固定之黏著膠帶。作為所切斷之電子零件,為電容器、或電感器、或線圈、或電阻、或壓電元件、或振盪器、或LED、或半導體、或顯示裝置等之電子零件,為被任意之機構切斷之電子零件。尤佳為於切斷陶瓷電容器用構件時使用。The re-peelable adhesive sheet of the present invention can be used to make electricity when specifically cutting off electronic parts. The adhesive tape that the sub-parts are fixed on the substrate. The electronic component to be cut is a capacitor, an inductor, or a coil, or a resistor, or a piezoelectric element, or an oscillator, or an electronic component such as an LED, a semiconductor, or a display device, which is cut by an arbitrary mechanism. Broken electronic parts. It is especially preferable to use when cutting off the member for ceramic capacitors.
於基板上經由本發明之再剝離黏著片利用黏著力貼合並固定此種電子零件。此後,利用藉由切割刀之切割方法或藉由旋轉刀之切斷方法等任意方法切斷電子零件,此後,自本發明之再剝離黏著片拾取電子零件。尤其是於再剝離黏著劑層中含有發泡劑之情形時,藉由使再剝離黏著劑層發泡,可使被切斷之電子零件對再剝離黏著劑層之黏著力下降,從而可拾取被切斷之電子零件。The electronic component is bonded and fixed on the substrate via the re-peeling adhesive sheet of the present invention by adhesive force. Thereafter, the electronic component is cut by any method such as a cutting method by a dicing blade or a cutting method by a rotary blade, and thereafter, the electronic component is picked up from the detached adhesive sheet of the present invention. In particular, when the foaming agent is contained in the re-adhesive adhesive layer, by foaming the re-peeling adhesive layer, the adhesion of the cut electronic component to the re-peeling adhesive layer can be lowered, thereby picking up Electronic parts that have been cut.
以下,藉由實施例具體地說明本發明,但本發明並不受該等實施例限定。實施例中之評價方法如以下所述。又,於實施例中,只要無特別記載,則「份」及「%」係以重量為基準。Hereinafter, the present invention will be specifically described by examples, but the present invention is not limited by the examples. The evaluation methods in the examples are as follows. Further, in the examples, "parts" and "%" are based on weight unless otherwise specified.
(1)(黏著力之測定方法)(1) (Method for measuring adhesion)
將實施例及比較例之黏著膠帶或片切斷為寬度20mm、長度140mm之尺寸,剝離黏著劑層側之隔片後,依據JIS Z 0237(2000年)於黏著劑層上貼合作為被黏著體之聚對苯二甲酸乙二酯膜(商品名「Lumirror S-10」Toray股份有限公司製造;厚度:25μm,寬度30mm)後(具體而言,於溫度:23±2℃及濕度:65±5%RH之環境下使2kg之輥進行1個往返進行壓接貼合),安放於附有設定為23℃之恆溫槽之拉伸試驗機(商品名「島津自動立體測圖儀AG-120kN」,島津製作所股份有限公司製造)上,並放置30分鐘。放置後,測定將被黏著體於剝離角度:180°、拉伸速度:300mm/min之條件下自實施例及比較例之黏著膠帶或片剝離時之荷重(除去測定初期之峰頂之荷重之最大值)作為黏著力。The adhesive tape or sheet of the examples and the comparative examples was cut into a size of 20 mm in width and 140 mm in length, and after peeling off the separator on the side of the adhesive layer, it was adhered to the adhesive layer in accordance with JIS Z 0237 (2000). Polyethylene terephthalate film (trade name "Lumirror S-10" manufactured by Toray Co., Ltd.; thickness: 25 μm, width 30 mm) (specifically, at temperature: 23 ± 2 ° C and humidity: 65 In a ±5% RH environment, a 2 kg roller is subjected to one-way crimping and lamination), and placed in a tensile tester equipped with a thermostat set at 23 ° C (trade name "Shimadzu Auto-stereograph AG- 120kN", manufactured by Shimadzu Corporation, and placed for 30 minutes. After standing, the load to be peeled off from the adhesive tape or sheet of the examples and the comparative examples at a peeling angle of 180° and a stretching speed of 300 mm/min was measured (the load at the peak of the initial stage of the measurement was removed). Maximum) as adhesion.
(2)剪切黏著力之測定方法(2) Method for measuring shear adhesion
將實施例及比較例中獲得之黏著片切斷為寬度20mm、長度20mm之尺寸而獲得試驗片。The adhesive sheets obtained in the examples and the comparative examples were cut into a size of 20 mm in width and 20 mm in length to obtain test pieces.
應用5kg荷重用5分鐘於所得之試驗片之黏著劑層表面貼合作為被黏著體之不鏽鋼板(SUS304BA,被砂紙No.360研磨後)後,於23±2℃下放置0.5小時。Using a 5 kg load for 5 minutes, the surface of the adhesive layer of the obtained test piece was adhered to a stainless steel plate (SUS304BA, ground by sandpaper No. 360) to be adhered, and then left at 23 ± 2 ° C for 0.5 hour.
放置後,於溫度:23±2℃、濕度:65±5%RH之條件下測定將試驗片與不鏽鋼板如圖1所示般於分別不同之方向(相反之方向)上於拉伸速度50mm/min之條件下拉伸時之荷重(最大荷重)作為剪切黏著力。After standing, the test piece and the stainless steel plate were measured in a different direction (opposite direction) at a tensile speed of 50 mm as shown in Fig. 1 under the conditions of temperature: 23 ± 2 ° C and humidity: 65 ± 5% RH. The load (maximum load) at the time of stretching under the condition of /min is used as the shear adhesion.
(3)加熱剝離性(3) Heat stripping
將實施例(除實施例2及實施例11以外)及比較例中獲得之黏著片12cm×12cm貼合於15cm×15cm(厚度1mm)之不鏽鋼板SUS304-BA上,於下述切斷加工條件下切斷SUS304板後,使用恆溫器(熱風乾燥器)(ESPEC股份有限公司製造,「SPH-201」)於150℃下實施10分鐘加熱處理。加熱後,以目視觀察自黏著片之單片化SUS304板之剝離狀態,將所有晶片均剝離之情形判斷為良(○),將即便1片未剝離之情形判斷為不良(×)。The adhesive sheets 12 cm×12 cm obtained in the examples (except for the second embodiment and the eleventh embodiment) and the comparative examples were bonded to a stainless steel plate SUS304-BA of 15 cm×15 cm (thickness: 1 mm), and the cutting conditions were cut as described below. After the SUS304 plate was cut, it was heat-treated at 150 ° C for 10 minutes using a thermostat (hot air dryer) ("SPH-201" manufactured by ESPEC Co., Ltd.). After the heating, the peeling state of the SUS304 plate from the adhesive sheet was visually observed, and the case where all the wafers were peeled off was judged to be good (○), and the case where one piece was not peeled off was judged to be defective (×).
(切斷加工條件)(cutting processing conditions)
環境溫度:室溫(23℃)Ambient temperature: room temperature (23 ° C)
切割裝置:DISCO公司製造之DFD651Cutting device: DFD651 manufactured by DISCO
切割速度:30mm/secCutting speed: 30mm/sec
切割刀片:DISCO公司製造之GIA850Cutting blade: GIA850 manufactured by DISCO
切割刀片轉數:30000rpmCutting blade revolutions: 30000rpm
切割切口深度:25μmCutting depth: 25μm
切割尺寸:10mm×10mmCutting size: 10mm × 10mm
切割模式:順切Cutting mode: smooth
(4)切斷後小片分離性評價(4) Separation evaluation of small pieces after cutting
於實施例1、3、4、5、6、7、8、9、10、12、13及14、以及比較例中獲得之黏著片上貼合40×50mm(厚度500μm)之積層陶瓷片。以UHT公司製造之切斷裝置「G-CUT8AA」將黏著片上之積層陶瓷片以成為1mm×0.5mm之小片之方式切斷為骰子網狀。The laminated ceramic sheets of 40 × 50 mm (thickness: 500 μm) were bonded to the adhesive sheets obtained in Examples 1, 3, 4, 5, 6, 7, 8, 9, 10, 12, 13 and 14 and Comparative Examples. In the cutting device "G-CUT8AA" manufactured by UHT, the laminated ceramic sheet on the adhesive sheet was cut into a sub-network shape so as to be a small piece of 1 mm × 0.5 mm.
使用恆溫器(熱風乾燥器)(ESPEC股份有限公司製造,「SPH-201」)使於150℃下實施10分鐘加熱處理之發泡劑發泡,藉此將小片自黏著片剝離,計算切斷部位之晶片間不分離之晶片個數。將不分離之晶片個數除以100%完全分離之情形時之晶片個數所得之數作為分離性之指標。將指標未達2%記作◎,將指標為2%以上且未達5%記作○,將指標為5%以上且未達15%記作△,將指標為15%以上記作×。The foaming agent which was heat-treated at 150 ° C for 10 minutes was foamed by using a thermostat (hot air dryer) ("SPH-201" manufactured by ESPEC Co., Ltd.), thereby peeling off the small piece from the adhesive sheet, and calculating the cut. The number of wafers that are not separated between the wafers of the portion. The number of wafers obtained by dividing the number of unseparated wafers by 100% completely separated is used as an index of separation. When the index is less than 2%, it is denoted by ◎, and the index is 2% or more and less than 5% is denoted by ○, and the index of 5% or more and less than 15% is denoted by Δ, and the index of 15% or more is denoted by ×.
積層陶瓷片之組成以及切斷裝置之切斷條件之詳情如下所述。Details of the composition of the laminated ceramic sheet and the cutting conditions of the cutting device are as follows.
(積層陶瓷片)(Laminated ceramic sheets)
於甲苯溶劑中添加鈦酸鋇粉末100份、聚乙烯丁醛樹脂15份、鄰苯二甲酸雙(2-乙基己基)酯6份及二甘油硬脂酸酯2份並利用球磨機分散機進行混合及分散,藉此獲得作為介電體之甲苯溶液。使用敷料器將該溶液以溶劑揮發後之厚度成為50μm之方式塗佈於附有矽酮脫模劑處理面之聚對苯二甲酸乙二酯膜(三菱聚酯膜股份有限公司製造,商品名「MRF38」,厚度:38μm)之矽脫模劑處理面並乾燥,而獲得陶瓷片。將所得之陶瓷片以厚度成為500μm之方式積層複數片而獲得積層陶瓷片。100 parts of barium titanate powder, 15 parts of polyvinyl butyral resin, 6 parts of bis(2-ethylhexyl) phthalate, and 2 parts of diglyceryl stearate were added to a toluene solvent, and the ball mill disperser was used. The mixture was mixed and dispersed, whereby a toluene solution as a dielectric was obtained. The solution was applied to a polyethylene terephthalate film having a surface treated with an anthrone release agent by using an applicator, and the thickness of the solution was 50 μm (manufactured by Mitsubishi Polyester Film Co., Ltd., trade name) The "MRF38", thickness: 38 μm) was applied to the release agent treatment surface and dried to obtain a ceramic sheet. The obtained ceramic sheet was laminated in a plurality of sheets so as to have a thickness of 500 μm to obtain a laminated ceramic sheet.
(切斷條件)(cutting condition)
.切斷溫度:60℃,切斷深度(距離檯面之殘餘量):約20μm. Cutting temperature: 60 ° C, cutting depth (residual amount from the table top): about 20 μm
.切斷刀:UHT股份有限公司製造之「U-BLADE2」:刀厚50μm,刀尖角度15°. Cutting knife: "U-BLADE2" manufactured by UHT Co., Ltd.: knife thickness 50μm, tip angle 15°
(5)切斷面切割性評價(5) Cut surface cutting evaluation
以與上述切斷後小片分離性評價相同之方式將積層陶瓷片以成為1mm×0.5mm之小片之方式切斷為骰子網狀。自經切斷之小片中選出任意10個,以50倍率之放大鏡觀察切斷面確認有無碎片(因切斷加工而產生之積層陶瓷片之缺損),將10個小片中產生之碎片總數之平均值設為指標。將指標為0~未達10處記作◎,將10處以上且未達20處記作○,將20處以上且未達40處記作△,將40處以上記作×。The laminated ceramic sheet was cut into a sub-network shape so as to be a small piece of 1 mm × 0.5 mm in the same manner as the evaluation of the separation property of the small pieces after the cutting. Select any 10 pieces from the cut pieces, and observe the cut surface with a magnifying glass of 50 times to confirm the presence or absence of fragments (defects of the laminated ceramic sheets due to cutting processing), and average the total number of pieces generated in 10 small pieces. The value is set to the indicator. When the index is 0 to less than 10, it is denoted by ◎, and 10 or more and less than 20 are denoted by ○, and 20 or more and less than 40 shall be denoted by Δ, and 40 or more shall be denoted by ×.
(6)基材與黏著層之抓固性(實施例3~8)(6) Grabber property of the substrate and the adhesive layer (Examples 3 to 8)
以與上述(5)相同之方式將黏著片貼附於積層陶瓷片並實施切斷、加熱處理後,以目視觀察黏著層自基材之「隆起」情況。將看不到「隆起」之情形判斷為良(○),將能看到「隆起」之情形判斷為不良(×)。The adhesive sheet was attached to the laminated ceramic sheet in the same manner as in the above (5), and subjected to cutting and heat treatment, and then the "bumping" of the adhesive layer from the substrate was visually observed. The case where the "lift" is not seen is judged as good (○), and the case where the "lift" is seen is judged as bad (×).
(7)羥值與酸值之測定方法(7) Method for determining hydroxyl value and acid value
(羥值之測定方法)(Method for measuring hydroxyl value)
樣品之羥值係依據JIS K 0070-1992(乙醯化法)進行評價。取乙酸酐約25g並添加吡啶使總量為100mL,充分攪拌而製作乙醯化試劑。The hydroxyl value of the sample was evaluated in accordance with JIS K 0070-1992 (Ethylation Method). About 25 g of acetic anhydride was added and pyridine was added so that the total amount was 100 mL, and the mixture was sufficiently stirred to prepare an acetamidine reagent.
準確稱量並採取試樣約2g置於平底燒瓶中,添加乙醯化試劑5mL及吡啶10mL,並安裝空氣冷凝管。於100℃下加熱70分鐘後放置冷卻,自冷凝管上部添加作為溶劑之甲苯35mL並攪拌後,添加水1mL並攪拌,而將乙酸酐分解。為了使分解完全再次加熱10分鐘並放置冷卻。Accurately weigh and take about 2 g of the sample in a flat-bottomed flask, add 5 mL of acetamidine reagent and 10 mL of pyridine, and install an air condenser. After heating at 100 ° C for 70 minutes, it was left to cool, and 35 mL of toluene as a solvent was added from the upper portion of the condenser tube and stirred, and then 1 mL of water was added thereto and stirred to decompose acetic anhydride. In order to completely decompose the decomposition for another 10 minutes and place to cool.
利用乙醇5mL清洗冷凝管並拆卸,添加作為溶劑之吡啶50mL並攪拌。使用全移液管向該溶液中添加0.5mol/L氫氧化鉀乙醇溶液25mL,利用0.5mol/L氫氧化鉀乙醇溶液進行電位差滴定並根據以下之式(3)算出羥值。The condenser was washed with 5 mL of ethanol and removed, and 50 mL of pyridine as a solvent was added and stirred. To the solution, 25 mL of a 0.5 mol/L potassium hydroxide ethanol solution was added using a full pipette, and potentiometric titration was performed using a 0.5 mol/L potassium hydroxide ethanol solution, and a hydroxyl value was calculated according to the following formula (3).
B:空白試驗所使用之0.5mol/L氫氧化鉀乙醇溶液之量(mL)B: The amount of 0.5 mol/L potassium hydroxide ethanol solution used in the blank test (mL)
C:試樣所使用之0.5mol/L氫氧化鉀乙醇溶液之量(mL)C: The amount of 0.5 mol/L potassium hydroxide ethanol solution used in the sample (mL)
f:0.5mol/L氫氧化鉀乙醇溶液之係數f: coefficient of 0.5 mol/L potassium hydroxide ethanol solution
S:試樣之採取量(g)S: the amount of sample taken (g)
D:酸值D: acid value
(酸值之測定方法)(Method for measuring acid value)
樣品之酸值係依據JIS K 0070-1992(電位差滴定方法)而進行評價。於將二乙醚與乙醇混合成以體積比計為4:1所得之溶劑中添加酚酞溶液作為指示劑,以0.1mol/L氫氧化鉀乙醇溶液進行中和。準確稱量並採取試樣約5g置於燒杯中,添加溶劑50mL,於面板加熱器(80℃)上攪拌使其完全溶解,以0.1mol/L氫氧化鉀乙醇溶液進行電位差滴定。酸值係根據以下之式(4)而求出。The acid value of the sample was evaluated in accordance with JIS K 0070-1992 (potential difference titration method). To the solvent obtained by mixing diethyl ether and ethanol to a volume ratio of 4:1, a phenolphthalein solution was added as an indicator, and the mixture was neutralized with a 0.1 mol/L potassium hydroxide ethanol solution. Accurately weigh and take about 5 g of the sample into a beaker, add 50 mL of solvent, stir on a panel heater (80 ° C) to completely dissolve it, and perform potentiometric titration with a 0.1 mol/L potassium hydroxide ethanol solution. The acid value was determined according to the following formula (4).
B:試樣所使用之0.1mol/L氫氧化鉀乙醇溶液之量(mL)B: The amount of 0.1 mol/L potassium hydroxide ethanol solution used in the sample (mL)
F:0.1mol/L氫氧化鉀乙醇溶液之係數F: coefficient of 0.1 mol/L potassium hydroxide ethanol solution
S:試樣之採取量(g)S: the amount of sample taken (g)
(8)污染性之評價(8) Evaluation of pollution
利用手動輥將藉由實施例及比較例所得之各黏著片10cm×10cm以不進入氣泡之方式貼附於15cm×15cm(厚度1mm)之不鏽鋼板SUS304-BA之表面並放置1小時後,於130℃之熱風乾燥器中進行3分鐘加熱處理後於23℃放置2小時。將各黏著片剝離並以目視觀察矽晶圓面之濁度,將即便稍微模糊之情形記作×。Each of the adhesive sheets obtained in the examples and the comparative examples was attached to a surface of a stainless steel plate SUS304-BA of 15 cm × 15 cm (thickness: 1 mm) without leaving air bubbles by a hand roll, and left for 1 hour. The mixture was heated in a hot air dryer at 130 ° C for 3 minutes and then placed at 23 ° C for 2 hours. Each of the adhesive sheets was peeled off, and the turbidity of the enamel wafer surface was visually observed, and even a slight blur was recorded as ×.
(9)對甲苯之溶解成分之重量平均分子量之測定方法(9) Method for measuring weight average molecular weight of dissolved components of toluene
採取並準確稱量試樣(質量:Wa1 mg),利用平均孔徑0.2μm之四氟乙烯樹脂製多孔質膜(日東電工股份有限公司製造「NITOFLON(註冊商標)NTF1122」(平均孔徑0.2μm、氣孔率75%、厚度0.085mm))(質量:Wa2 mg)包成腰包狀,利用風箏線(質量:Wa3 mg)綁住口。將該包裹放在容量50mL(預先於無蓋之狀態下測定容量50mL螺旋管之主質量:Wa4 mg)螺旋管(每1個包裹使用1根螺旋管),於該螺旋管中充滿甲苯。將其於23℃下放置7天後,取出上述包裹並於30℃下將甲苯自溶解有溶膠成分之甲苯溶液中減壓乾燥,測定含有溶膠成分之固形物之狀態之螺旋管之重量(質量:Wa5 mg)算出溶膠成分(質量:Wa6 mg)。Weighed and accurately weighed the sample (mass: W a1 mg), and made a porous film made of tetrafluoroethylene resin having an average pore diameter of 0.2 μm (NITOFLON (registered trademark) NTF1122 manufactured by Nitto Denko Co., Ltd.) (average pore size 0.2 μm, The porosity is 75% and the thickness is 0.085 mm)) (mass: W a2 mg) is wrapped into a waist pack, and the mouth is tied with a kite line (mass: W a3 mg). The package was placed in a spiral tube having a capacity of 50 mL (predetermined in a state of no cover, a main mass of a 50 mL spiral tube: W a 4 mg) (one spiral tube per one package), and the spiral tube was filled with toluene. After leaving it at 23 ° C for 7 days, the above-mentioned package was taken out, and toluene was dried under reduced pressure from a toluene solution in which a sol component was dissolved at 30 ° C, and the weight of the spiral tube in the state of the solid matter containing the sol component was measured. :W a5 mg) Calculate the sol component (mass: W a6 mg).
Wa6 =(Wa5 -Wa4 )W a6 =(W a5 -W a4 )
繼而利用GPC(凝膠滲透層析法)測定溶膠成分之分子量。The molecular weight of the sol component was then measured by GPC (gel permeation chromatography).
上述溶膠成分之固形之重量平均分子量(Mw)可藉由凝膠滲透層析(GPC)法而測定。更具體而言,可使用商品名「HLC-8120GPC」(Tosoh股份有限公司製造)作為GPC測定裝置,並利用聚苯乙烯換算值於以下之GPC之測定條件下進行測定而求出。The weight average molecular weight (Mw) of the solid content of the above sol component can be measured by a gel permeation chromatography (GPC) method. More specifically, the product name "HLC-8120GPC" (manufactured by Tosoh Co., Ltd.) can be used as a GPC measuring device, and can be obtained by measuring the polystyrene-converted value under the measurement conditions of the following GPC.
GPC之測定條件GPC measurement conditions
.樣品濃度:0.2重量%(四氫呋喃溶液). Sample concentration: 0.2% by weight (tetrahydrofuran solution)
.樣品注入量:10μL. Sample injection amount: 10 μL
.溶析液:四氫呋喃(THF). Lysate: tetrahydrofuran (THF)
.流量(流速):0.6mL/min. Flow rate (flow rate): 0.6mL/min
.管柱溫度(測定溫度):40℃. Column temperature (measuring temperature): 40 ° C
.管柱:商品名「TSKgelSuperHM-H/H4000/H3000/H2000」(Tosoh股份有限公司製造). Pipe column: trade name "TSKgelSuperHM-H/H4000/H3000/H2000" (manufactured by Tosoh Co., Ltd.)
.檢測器:示差折射計(RI). Detector: Differential Refractometer (RI)
根據溶膠成分之重量平均分子量之曲線整體求出重量平均分子 量1萬以下之比率Wm(%),以相對於試樣整體之比率A10000 (%)之形式算出試樣對甲苯之溶解成分中之重量平均分子量1萬以下之溶解成分。The ratio Wm (%) of the weight average molecular weight of 10,000 or less is calculated from the curve of the weight average molecular weight of the sol component as a whole, and the sample is calculated as a dissolved component of toluene in the form of a ratio A 10000 (%) to the entire sample. A dissolved component having a weight average molecular weight of 10,000 or less.
A10000 (%)=[Wa6 (mg)×Wm(%)/Wa1 (mg)]×100A 10000 (%) = [W a6 (mg) × Wm (%) / W a1 (mg)] × 100
以下對聚合物製備法、底塗劑調整法、本發明之實施例、比較例所使用之基材膜進行詳述。The base film used in the polymer preparation method, the primer adjustment method, the examples of the present invention, and the comparative examples will be described in detail below.
[聚合物合成例1][Polymer Synthesis Example 1]
於具備冷凝管、氮導入管、溫度計及攪拌裝置之反應容器中添加丙烯酸丁酯86重量份、甲基丙烯酸甲酯10重量份、丙烯酸4重量份、聚合起始劑(商品名「Nyper BW」,日本油脂股份有限公司製造)0.4重量份、乙酸乙酯100重量份,於氮氣流中且於60℃下進行8小時聚合處理,而獲得丙烯酸系共聚物。86 parts by weight of butyl acrylate, 10 parts by weight of methyl methacrylate, 4 parts by weight of acrylic acid, and a polymerization initiator (trade name "Nyper BW") were added to a reaction vessel equipped with a condenser, a nitrogen inlet tube, a thermometer, and a stirring device. 0.4 parts by weight of ethyl acetate and 100 parts by weight of ethyl acetate were subjected to polymerization treatment in a nitrogen stream at 60 ° C for 8 hours to obtain an acrylic copolymer.
以下依照合成例1獲得表1記載之合成例1~18之丙烯酸系共聚物。The acrylic copolymers of Synthesis Examples 1 to 18 described in Table 1 were obtained in accordance with Synthesis Example 1.
[底塗劑製備例][Substrate preparation example]
底塗劑A:以相對於固形物成分為50重量份之比率調配合成例13中獲得之丙烯酸系共聚物50重量份與三官能性異氰酸酯系化合物(商品名「Coronate L」,日本聚胺酯工業股份有限公司製造)而獲得於甲苯中固形物成分為5%之底塗劑A。Primer A: 50 parts by weight of the acrylic copolymer obtained in Synthesis Example 13 and a trifunctional isocyanate compound (trade name "Coronate L", Japan Polyurethane Industrial Co., Ltd. were blended in a ratio of 50 parts by weight to the solid content. Co., Ltd. manufactured) to obtain a primer A having a solid content of 5% in toluene.
底塗劑B:調配合成例13中獲得之丙烯酸系共聚物100重量份(固形物成分)與三官能性異氰酸酯系化合物(商品名「Coronate L」,日本聚胺酯工業股份有限公司製造)5重量份(固形物成分),而獲得底塗劑B。Primer B: 100 parts by weight (solid content) of the acrylic copolymer obtained in Synthesis Example 13 and 5 parts by weight of a trifunctional isocyanate compound (trade name "Coronate L", manufactured by Japan Polyurethane Industry Co., Ltd.) (Solid component) to obtain primer B.
[實施例.比較例所使用之基材膜][Examples. Substrate film used in the comparative example]
基材膜A1:於商品名「Lumirror S10#100」(Toray股份有限公司製造)上以乾燥後之塗佈厚度成為1μm之方式塗佈底塗劑A並進行乾燥。The base film A1 was applied to the product name "Lumirror S10 #100" (manufactured by Toray Co., Ltd.) and the primer A was applied and dried to a thickness of 1 μm after drying.
基材膜A2:於商品名「Lumirror S10#100」(Toray股份有限公司 製造)上以乾燥後之塗佈厚度成為30μm之方式塗佈底塗劑B並進行乾燥。Substrate film A2: under the trade name "Lumirror S10#100" (Toray Co., Ltd. The primer B was applied and dried to have a coating thickness after drying of 30 μm.
基材膜A3:商品名「Lumirror S10#100」(Toray股份有限公司製造)Substrate film A3: trade name "Lumirror S10#100" (manufactured by Toray Co., Ltd.)
基材膜B:於單面電暈處理型商品名「Lumirror S105#100」(Toray股份有限公司製造)上直接塗佈黏著劑。Substrate film B: An adhesive was directly applied to a single-sided corona treatment type product name "Lumirror S105 #100" (manufactured by Toray Co., Ltd.).
(實施例1)(Example 1)
以聚合物合成例1之丙烯酸系共聚物(固形物成分)100重量份、環氧系交聯劑(三菱瓦斯化學製造:Tetrad-C)0.5重量份、作為熱膨脹性微小球之商品名「Expancel 920-40」(Japan Fillite股份有限公司製造)30重量份之比率進行調配,而獲得丙烯酸系黏著劑。100 parts by weight of the acrylic copolymer (solid content) of the polymer synthesis example 1 and 0.5 part by weight of an epoxy-based crosslinking agent (Tetrad-C manufactured by Mitsubishi Gas Chemical Co., Ltd.), and the product name "Expancel" as a heat-expandable microsphere. 920-40" (manufactured by Japan Fillite Co., Ltd.) was blended in a ratio of 30 parts by weight to obtain an acrylic adhesive.
將所得之丙烯酸系黏著劑以乾燥後之厚度成為35μm之方式塗佈於基材膜A1之底塗劑面並進行乾燥,貼合經剝離處理之膜而獲得再剝離黏著片。The obtained acrylic pressure-sensitive adhesive was applied onto the primer surface of the base film A1 so as to have a thickness of 35 μm after drying, and dried, and the release-treated film was bonded to obtain a re-peelable pressure-sensitive adhesive sheet.
(實施例2~12、比較例1~6)(Examples 2 to 12, Comparative Examples 1 to 6)
實施例2~12及比較例1~6係以表2所示之方式設定各構成及成分,除此以外,以與實施例1同樣之方式獲得再剝離黏著片。又,評價結果亦一併示於表2。In Examples 2 to 12 and Comparative Examples 1 to 6, the re-peelable adhesive sheets were obtained in the same manner as in Example 1 except that the respective compositions and components were set as shown in Table 2. Further, the evaluation results are also shown in Table 2.
Coronate L 異氰酸酯交聯劑(日本聚胺酯工業股份有限公司製造)Coronate L isocyanate crosslinker (manufactured by Japan Polyurethane Industry Co., Ltd.)
Tetrad C 環氧交聯劑:(三菱瓦斯化學股份有限公司製造)Tetrad C epoxy crosslinker: (Mitsubishi Gas Chemical Co., Ltd.)
YS Polyster U115 萜酚樹脂(YASUHARA CHEMICAL股份有限公司製造)YS Polyster U115 phenolic resin (manufactured by YASUHARA CHEMICAL Co., Ltd.)
YS Polyster T115 萜酚樹脂(YASUHARA CHEMICAL股份有限公司製造)YS Polyster T115 Indophenol Resin (manufactured by YASUHARA CHEMICAL Co., Ltd.)
YS Polyster S145 萜酚樹脂(YASUHARA CHEMICAL股份有限公司製造)YS Polyster S145 phenolic resin (manufactured by YASUHARA CHEMICAL Co., Ltd.)
Mighty Ace G125 萜酚樹脂(YASUHARA CHEMICAL股份有限公司製造)Mighty Ace G125 phenolic resin (manufactured by YASUHARA CHEMICAL Co., Ltd.)
Mighty Ace k125 萜酚樹脂(YASUHARA CHEMICAL股份有限公司製造)Mighty Ace k125 phenolic resin (manufactured by YASUHARA CHEMICAL Co., Ltd.)
SUMILITE RESIN PR12603 萜酚樹脂(SUMITOMO BAKELITE股份有限公司製造)SUMILITE RESIN PR12603 Indophenol resin (manufactured by SUMITOMO BAKELITE Co., Ltd.)
920-40 熱膨脹性微膠囊(Japan Fillite股份有限公司製造)920-40 Thermal expansion microcapsule (manufactured by Japan Fillite Co., Ltd.)
根據表2可知,本發明之再剝離黏著片於暫時固定被加工物之狀態下進行切斷加工,藉此可確實固定被切斷之晶片,可實現優異之切斷精度。又,再剝離時無污染,具有良好之剝離性。As can be seen from Table 2, the re-peelable adhesive sheet of the present invention is subjected to cutting processing in a state in which the workpiece is temporarily fixed, whereby the cut wafer can be surely fixed, and excellent cutting precision can be achieved. Moreover, it is non-polluting when peeled off, and has good peelability.
又,參照特定之實施態樣詳細地說明本發明,但業者明確於不脫離本發明之精神與範圍下可加以各種變更或修正。Further, the present invention will be described in detail with reference to the specific embodiments thereof. It is obvious that various changes and modifications may be made without departing from the spirit and scope of the invention.
本申請案係基於在2013年7月19日提出申請之日本專利申請2013-151141者,其內容係以參照之方式併入至本文中。The present application is based on Japanese Patent Application No. 2013-151141, filed on Jan. 19, 2013, the content of which is incorporated herein by reference.
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JP6419626B2 (en) * | 2015-03-30 | 2018-11-07 | 日本カーバイド工業株式会社 | Adhesive composition and adhesive film |
JPWO2017110839A1 (en) * | 2015-12-21 | 2018-10-04 | 積水化学工業株式会社 | Adhesive composition and adhesive tape |
KR102748561B1 (en) * | 2016-12-02 | 2025-01-03 | 삼성디스플레이 주식회사 | Thermally releasable adhesive member and display apparatus including the same |
KR20180136029A (en) * | 2017-06-13 | 2018-12-24 | 삼성디스플레이 주식회사 | Thermally releasable adhesive member and display apparatus including the same |
JP7469856B2 (en) * | 2018-07-10 | 2024-04-17 | 日東電工株式会社 | Adhesive sheet |
WO2020196224A1 (en) * | 2019-03-26 | 2020-10-01 | リンテック株式会社 | Release sheet |
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JP2015021083A (en) | 2015-02-02 |
KR101505373B1 (en) | 2015-03-23 |
CN104130726A (en) | 2014-11-05 |
JP5700466B2 (en) | 2015-04-15 |
CN104130726B (en) | 2016-08-17 |
KR20150010646A (en) | 2015-01-28 |
TW201506107A (en) | 2015-02-16 |
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