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TWI230687B - A method for growing arrays of carbon nanotubes - Google Patents

A method for growing arrays of carbon nanotubes Download PDF

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TWI230687B
TWI230687B TW92107181A TW92107181A TWI230687B TW I230687 B TWI230687 B TW I230687B TW 92107181 A TW92107181 A TW 92107181A TW 92107181 A TW92107181 A TW 92107181A TW I230687 B TWI230687 B TW I230687B
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TW92107181A
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TW200418721A (en
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Liang Liu
Shou-Shan Fan
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Hon Hai Prec Ind Co Ltd
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Abstract

The present invention pertains to a method for growing arrays of carbon nanotubes on a surface of a metal substrate. The method includes selecting a metal substrate having a smooth surface, oxidizing the metal substrate so as to form an oxide layer on the smooth surface of the metal substrate, depositing a catalyst layer on the oxide layer, and exposing the catalyst layer to a carbon source gas, thereby forming the arrays of carbon nanotubes extending from the metal substrate, following the formation of carbon nanotubes a by-product, such as hydrogen gas is produced and reduces the oxide layer.

Description

1230687 五、發明說明(1) 【發明所屬之技術領域】 本發明係關於一種奈米碳管之製備方法,特別係關於 一種於普通金屬基底製備奈米碳管陣列之方法。 【先前技術】 山Μ 1991年’日本NEC公司研究人員J i j ima意外發現奈米 反言 σ月參見· Helical microtubules of graphitic carbon , S. Iijima, Nature, vol. 354, P56(1991) ^ 因為示米碳官之優異特性,其潛在的應用一直受到人們廣 泛關$ ’尤其係在電子領域。由於奈米碳管之直徑極小, 大、力成不米至十幾奈米,在較小電場之作用下就可以從其 尖端發射電子,因而可用作場發射陰極。 近年來,人們在奈米材料及其應用領域進行各種研 $,尤其係對奈米碳管陣列之製備方法及其應用進行研 九。吳國專利第6,232,706號揭露一種場發射裝置, 化學氣相沈積)法在多孔石夕基底 ; = = = ;管陣列,*包括下列步驟··先在基底上 二=層在= ρνη ^ ^ ^ , 反4礼 任一疋溫度條件下,以 〉生長不米碳管,結果在多孔矽 於基底 '高度為幾百微米之奈 列。生長伸到垂直 或…,其導=差遠 性且能夠承載較大電流的電極 :::良好導電 搶、大功率行波管等器件之陰極亦·需要他 1230687 五、發明說明(2) 載較大電流之電極。為能夠充分發揮奈米碳管之優良導電 性,需要用優良導體與之相連,故,金屬仍然係最佳選 擇。因為金屬材料對CVD法影響較大,金屬容易與催化劑 形成合金,或者因自身具有催化作用而強烈分解碳氫氣形 成積碳,導致無法正常生長奈米碳管。1230687 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a method for preparing a carbon nanotube, and more particularly to a method for preparing a carbon nanotube array on a common metal substrate. [Previous Technology] Shan M, 1991, Researcher J ij ima of NEC Company of Japan accidentally found nanometers and sigma. See Helical microtubules of graphitic carbon, S. Iijima, Nature, vol. 354, P56 (1991) ^ The excellent characteristics of rice carbon official, its potential application has been widely concerned by people, especially in the field of electronics. Due to the extremely small diameter of carbon nanotubes, which can be as large as ten to a few nanometers, they can emit electrons from their tips under the action of a small electric field, so they can be used as field emission cathodes. In recent years, people have conducted various researches in nanomaterials and their application fields, especially the research on the preparation methods and applications of nanometer carbon tube arrays. Wu Guo Patent No. 6,232,706 discloses a field emission device (Chemical Vapor Deposition) method on a porous stone substrate; = = =; tube array, * including the following steps: · First on the substrate = two layers = ρνη ^ ^ ^ Under the conditions of any temperature, the carbon nanotubes are grown at a temperature of> 1 m, and the result is that the porous silicon-on-substrate 'height is a few hundred microns. The electrode that grows to the vertical or ... whose conductivity = differential and can carry a large current ::: The cathode of a device with good conductivity and high-power traveling wave tubes is also required. 1230687 V. Description of the invention (2) Higher current electrode. In order to make full use of the excellent conductivity of carbon nanotubes, it is necessary to connect them with a good conductor, so metal is still the best choice. Because metal materials have a great influence on the CVD method, metals are likely to form alloys with catalysts, or due to their catalytic effect, they strongly decompose carbon and hydrogen to form carbon deposits, which leads to the inability to grow nano carbon tubes.

Ch· Emmenegger等人提出一種在石夕或金屬|呂基底上生 長奈米碳管陣列之方法,發表於Applied SurfaceCh. Emmenegger et al. Proposed a method for growing nanometer carbon tube arrays on Shi Xi or metal | Lu substrate, published on Applied Surface

Science 1 6 2- 1 63 ( 2 0 0 0 ),45 2-45 6,該方法包括以下步 驟: 1·在石夕或銘基底表面塗覆Fe(N〇3)3薄膜,厚度為5〜 1 Onm ; 2·將基底放置於反應爐内,真空環境中加熱至奈米碳 管合成溫度; 3·通入5分鐘氮氣’流速為iQ〇mi/mirl ; 4·通入2ral/min的乙稀以及98 m][/niin的氮氣,在環境 氣壓為0· 5 bar條件下反應〇· 5至3小時; 結果’奈米碳管陣列生長在催化劑生長點上,奈米碳 管之直徑取決於催化劑顆粒之直徑,高度為丨〇 _丨5微米。Science 1 6 2- 1 63 (2 0 0 0), 45 2-45 6, the method includes the following steps: 1. Coating the surface of Shi Xi or Ming substrate with Fe (N〇3) 3 film, the thickness is 5 ~ 1 Onm; 2 · Place the substrate in the reaction furnace, and heat it to the carbon nanotube synthesis temperature in a vacuum environment; 3 · Put nitrogen for 5 minutes' flow rate is iQ〇mi / mirl; 4 · Put 2 ral / min Dilute and 98 m] / niin of nitrogen, react at 0.5 to 3 hours at an ambient pressure of 0.5 bar; Result 'Nano carbon tube array grows on the catalyst growth point, the diameter of the nano carbon tube depends on The diameter of the catalyst particles is 5 microns.

上述方法可以在金屬鋁基底上生長奈米碳管陣列,雖 然怒係普遍使用的催化劑載體,卻不適合做場發射陰極, 而且’該方法可選擇之基底材料有限,只能選擇鋁以及盥 鋁性質相近的有限幾種金屬材料,仍未能解決前面所述^ 普通金屬基底上生長奈米碳管之問題。The above method can grow a nano-carbon tube array on a metal aluminum substrate. Although the catalyst carrier commonly used in the Ang system is not suitable as a field emission cathode, and 'the method has limited substrate materials, only aluminum and aluminum can be selected. Similar limited metal materials have not been able to solve the aforementioned problem of growing carbon nanotubes on a common metal substrate.

12306871230687

五、發明說明(3) 碳管陣列的方法實為必要。 【内容】 本發明之目的在於提供一種適宜在普通金屬基底上生 長奈米碳管之方法。 本發明之另一目的在於提供一種場發射陰極之製 法0 為實現上述目的’本發明提供的方法包括步驟:提供 一金屬基底;氧化該金屬基底,於其表面形成一層氧化/、 層;於氧化層表面形成一催化劑層;通入碳氫氣^,並於 催化劑作用下發生化學反應,使得奈米碳管從催=劑^生 長’同時產生還原性氣體將該氧化層還原。 曰 相較於現有技術’本發明具有如下優點:因催化劑層 與金屬基底之間通過氧化層間隔開,從而避免反應過^二 金屬基底對催化劑產生不良影響,反應生成奈米碳管過程 中’產生IL氣將氧化層還原,可使得奈米碳管直接生長 金屬基底上,提高奈米碳管與金屬基底之電連接。 、 【實施方式】 請參見第一圖,係本發明奈米碳管製備方法义。 圖,其包括下列步驟: w & 步驟1係提供金屬基底。本步驟提供之金屬基 生長奈来碳管之支撐基底,此金屡基底可以為一金屬用作 合金片,也可以在其他材料之基片表面形成金屬或人片, 極本發明對所採用的金屬或合金材料沒有特別^去金电 需在奈米碳管之生長溫度(一般約為700 °C〜10〇〇。' 1 ,只 L )滿足 1230687 五、發明說明(4) 下列條件即可 a )不發生炫化; b)不與所選用的其他材料的基片發生共溶; 所選用 c )在室溫至生長溫度範圍内,其熱膨脹係數愈 的基片相容; 〃 化 d)不會在生長過程中因吸氫而產生膨脹或碎裂等變5. Description of the invention (3) The method of carbon tube array is really necessary. [Content] The object of the present invention is to provide a method suitable for growing a carbon nanotube on a common metal substrate. Another object of the present invention is to provide a method for manufacturing a field emission cathode. In order to achieve the above object, the method provided by the present invention includes the steps of: providing a metal substrate; oxidizing the metal substrate to form an oxide layer on the surface; A catalyst layer is formed on the surface of the layer; carbon and hydrogen gas is introduced, and a chemical reaction occurs under the action of the catalyst, so that the carbon nanotubes grow from the catalyst and generate reducing gas to reduce the oxide layer. Compared with the prior art, the present invention has the following advantages: the catalyst layer and the metal substrate are separated by an oxide layer, thereby avoiding overreaction of the bimetal substrate to adversely affect the catalyst, and the process of generating carbon nanotubes by the reaction. The generation of IL gas reduces the oxide layer, which can make the nano carbon tube grow directly on the metal substrate, and improve the electrical connection between the nano carbon tube and the metal substrate. [Embodiment] Please refer to the first figure, which is the meaning of the method for preparing a nano carbon tube according to the present invention. The figure includes the following steps: w & Step 1 provides a metal substrate. The support substrate for the metal-based growth of the carbon nanotubes provided in this step. The gold substrate can be a metal used as an alloy sheet, or a metal or human piece can be formed on the surface of the substrate of other materials. There is no special metal or alloy material. The growth temperature of the carbon nanotubes is generally about 700 ° C ~ 100,000. '1, only L' meet 1230687 V. Description of the invention (4) The following conditions can be a) no glare occurs; b) no co-solubility with the substrates of other materials selected; c) selected substrates whose thermal expansion coefficients are more compatible from room temperature to growth temperature; Does not cause swelling or chipping due to hydrogen absorption during growth

如果直接選用金屬片或合金片,則只需滿足&及 即可。 π JT 大部分金屬材料均可滿足上述條件,如Ta、Ni、Ag、If you choose metal or alloy sheet directly, you only need to satisfy & and. π JT Most metal materials can meet the above conditions, such as Ta, Ni, Ag,

Fe Cu、不銹鋼及其它合金。所述其他材料的基片可以係 玻璃矽或石英片等,為能在其表面形成金屬或合金電 極 要求其表面有一定平整度,形成電極的方法有電鑛、 磁控賤射法等。 為邊得到排列有序的奈米碳管陣列,可進一步將所述 金屬f底表面利用機械拋光或電化學拋光等方法使其表面 有一定平整度’以滿足普通CVD法生長奈米碳管陣列之需 要0 步驟2係氧化金屬基底生成氧化層。將步驟1提供之金 f基底表面氧化,形成金屬氧化層,氧化層之厚度小於1 ,f即可。實現表面氧化的方法很多,較簡單之方法係在 二氣中加熱至一定溫度,經過一定時間,金屬基底表面即 可形成氧化層。 步驟3係在氧化廣上形成催化劑層。即在步驟2形成的 1230687Fe Cu, stainless steel and other alloys. The substrate of the other material may be glass silicon or quartz wafer, etc. In order to form a metal or alloy electrode on the surface, a certain flatness is required on the surface. The method for forming the electrode includes electric ore, magnetic control, and the like. In order to obtain an ordered carbon nanotube array, the bottom surface of the metal f may be further polished by mechanical polishing or electrochemical polishing to make the surface have a certain degree of flatness, so as to satisfy the growth of the nano carbon tube array by the ordinary CVD method. It requires 0 step 2 to oxidize the metal substrate to form an oxide layer. The surface of the gold f substrate provided in step 1 is oxidized to form a metal oxide layer, and the thickness of the oxide layer may be less than 1, f. There are many ways to achieve surface oxidation. The simpler method is to heat to a certain temperature in two gases. After a certain time, an oxide layer can be formed on the surface of the metal substrate. Step 3 is to form a catalyst layer on the oxidation substrate. I.e. 1230687 formed in step 2

五、發明說明(5) 金屬基底表面氧化層上形成催化劑層。目前,CVD法生長 奈米碳管陣列常用的催化劑為金屬鐵、鈷、鎳及其氧化 物,形成催化劑層的方法有··電子束蒸發法、其他電化學 方法等。催化劑層的厚度只需i奈米至丨〇奈米即可。 步驟4係退火處理催化劑層。將步驟3形成的具有金屬 催化劑層的金屬基底進行退火處理,使得催化劑層形成奈 米級催化劑顆粒,若催化劑為金屬,則在退火過程中伴隨 著發生氧化反應,將金屬氧化成金屬氧化物。退火所得之 顆粒大小將決定以後生長奈米碳管之直徑大小。5. Description of the invention (5) A catalyst layer is formed on the oxide layer on the surface of the metal substrate. Currently, the commonly used catalysts for growing carbon nanotube arrays by CVD are metallic iron, cobalt, nickel, and their oxides. The methods for forming the catalyst layer include electron beam evaporation and other electrochemical methods. The thickness of the catalyst layer only needs to be from 1 nm to 0 nm. Step 4 is an annealing treatment of the catalyst layer. The metal substrate with the metal catalyst layer formed in step 3 is annealed so that the catalyst layer forms nano-sized catalyst particles. If the catalyst is a metal, the metal is oxidized to a metal oxide during the annealing process. The particle size obtained by annealing will determine the diameter of the carbon nanotubes to be grown in the future.

步驟5係CVD法生長奈米碳管陣列,並將氧化層還原為 金屬。利用CVD法在上述金屬基底上生長奈米碳管陣列, 同時將步驟2形成的金屬基底表面氧化層還原為金屬。CVD 法的生長條件與在多孔矽基底上生長奈米碳管的條件基本 相同’通入碳源氣,例如乙稀或乙炔等,在一定溫度(例 如:700 °C〜1 00 0 °C )下反應,在催化劑顆粒上生長出奈米 碳管;在反應的同時,碳源氣釋放出氫氣,將金屬基底表 面氧化層還原為金屬,使得奈米碳管直接與金屬基底接 觸0 下面結合具體實施例說明本發明方法的過程。 請參照第二圖,本發明第一實施例中選用不銹鋼丨0作 為金屬基底’其係一種高熔點合金,熔點可超過】〇 〇 〇 t, 且不會在反應過程中吸氫而為生膨脹或碎裂,其尺寸大小 可視具體要求而確定。不銹鋼1〇之表面須具有一定平整度 以適應生長奈米碳管陣列需要(一般而言,平整度越好,Step 5 is a CVD method for growing a carbon nanotube array and reducing the oxide layer to a metal. A nano-carbon tube array is grown on the metal substrate by a CVD method, and the surface oxide layer of the metal substrate formed in step 2 is reduced to metal. The growth conditions of the CVD method are basically the same as the conditions for growing carbon nanotubes on a porous silicon substrate. 'A carbon source gas, such as ethylene or acetylene, is passed at a certain temperature (for example: 700 ° C ~ 100 0 ° C) Under the reaction, carbon nanotubes grow on the catalyst particles; at the same time as the reaction, the carbon source gas releases hydrogen to reduce the surface oxidation layer of the metal substrate to metal, so that the carbon nanotubes directly contact the metal substrate. The examples illustrate the process of the method of the invention. Please refer to the second figure. In the first embodiment of the present invention, stainless steel 丨 0 is used as the metal substrate. It is a high melting point alloy with a melting point of more than 0.0000t, and does not absorb hydrogen during the reaction for expansion. Or broken, its size can be determined according to specific requirements. The surface of stainless steel 10 must have a certain flatness to meet the needs of growing carbon nanotube arrays (in general, the better the flatness,

$ 9頁 1230687 五、發明說明(6) 所得之奈米碳管有序性越 1 械為光、電化學為光等方法子丄現:表面平整度可以通過機 。接三圖所示’將不銹鋼1 〇在空氣中加妖至 5 0 0 C,散生乳化反應,經汛—…、芏 成一層金屬氧化層12,:严過产应义間不銹鋼10的表面形 ^ 具各度與虱化反應的時間有關,护 間越長,厚度越厚,金屬氧化f , 可 ,優選為!〇,〇奈米。層2的尽度小於1微米即 如第四圖所示’通過電子束蒸發法在金屬氧化層12上 形成-層催化劑層1 4,所述催化劑層! 4 一般為金屬鐵、 鈷、鎳或其氧化物等,催化劑層14的厚度約為卜1〇夺土。 從而,催化劑層14與不銹鋼1〇之間通過金屬氧化層12造 接,使得催化劑層14與不銹鋼10間隔開。優選再將催= 層14置於空氣中’在300 °c溫度下進行退火處理一段時 間,使得催化劑層1 4氧化並收縮成為奈米級催化劑顆粒。 最後’通入碳源氣體乙烯,以CVD法在催化劑層14上生長 出奈米碳管陣列16 ’因催化劑層14與不銹鋼1〇之間通過~金 屬氧化層1 2間隔開’所以’在發生反應的過程中不錄麵i 〇 不會影響催化劑之催化作用,可順利生長出奈米碳管。乙 烯裂解反應生成奈米碳管16的同時釋放出氫氣,氫氣與不 錢鋼1 0表面金屬氧化層1 2發生還原反應,最終將金屬氧化 層12還原為金屬’從而奈米碳管直接與不錢鋼1〇接觸, 如第五圖所示。 本發明第二實施例中,先提供一矽基片,將該矽基片 表面進行拋光處理’使其具有一定平整度;然後在該矽基$ 9 pages 1230687 V. Description of the invention (6) The orderliness of the obtained carbon nanotubes is as follows: 1) Mechanical and optical methods, electrochemical and optical methods have emerged: the surface flatness can pass the machine. As shown in the next three pictures, 'stainless steel 10 is added to the air to 5 0 C, the emulsification reaction is scattered, and after a flood-..., a metal oxide layer 12 is formed: strictly over the surface of the stainless steel 10 The shape is related to the time of the lice reaction. The longer the shield, the thicker the thickness, and the metal oxide f may be, preferably, 〇, 〇nm. The degree of the layer 2 is less than 1 micron, that is, as shown in the fourth figure, a -layer catalyst layer 14 is formed on the metal oxide layer 12 by the electron beam evaporation method, said catalyst layer! 4 Generally, it is metallic iron, cobalt, nickel or its oxides, etc. The thickness of the catalyst layer 14 is approximately 10 Å. Thus, the catalyst layer 14 and the stainless steel 10 are connected by the metal oxide layer 12, so that the catalyst layer 14 and the stainless steel 10 are spaced apart. Preferably, the catalyst layer 14 is left in the air and annealed at 300 ° C for a period of time, so that the catalyst layer 14 is oxidized and shrunk into nano-sized catalyst particles. Finally, the carbon source gas ethylene was passed in, and a carbon nanotube array 16 was grown on the catalyst layer 14 by the CVD method. 'Because the catalyst layer 14 passed through the stainless steel 10 and the metal oxide layer 12 was spaced apart,' this occurred. The absence of surface i 〇 during the reaction will not affect the catalytic effect of the catalyst, and nano carbon tubes can be grown smoothly. The ethylene cracking reaction generates nano-carbon tubes 16 while releasing hydrogen gas. The hydrogen reacts with the metal oxide layer 12 on the surface of the stainless steel 10, and finally reduces the metal oxide layer 12 to a metal. Qian Gang 10 contacts, as shown in the fifth figure. In the second embodiment of the present invention, a silicon substrate is first provided, and the surface of the silicon substrate is polished to make it have a certain flatness;

1230687 五、發明說明(7) 片表面上通過電鍍方法形成金屬或合金層,作為金屬基 底;再將該金屬基底經過前面所述步驟2、步驟3、步驟4 以及步驟5,在金屬基底上生成奈米碳管。上述矽基片亦 可用玻璃、石英等其他非金屬材料替代。 本發明提供之奈米碳管製備方法,可以選用普通金屬 或合金作為金屬基底,不限於前面所述的幾種;另外,將 金屬基底氧化、形成催化劑層的方法也不限於實施例中所 列舉的方法;並且,生長奈米碳管所用的碳源氣體、催化 劑也不限於前面所述幾種,所屬技術領域普通技術人員所 月b知曉的碳源氣體以及催化劑均可使用。 綜上所述,本發明確已符合發明專利之要件,遂依法 提出專利申請。惟’以上所述者僅為本發明之較佳實施 例丄自不能以此限制本案之申請專利範圍。舉凡熟悉本案 技蟄之人士援依本發明之精神所作之等效修飾或變化,皆 應涵蓋於以下申請專利範圍内。1230687 V. Description of the invention (7) A metal or alloy layer is formed on the surface of the sheet by electroplating as a metal substrate; the metal substrate is then formed on the metal substrate through steps 2, 3, 4, and 5 described above. Nano carbon tubes. The above silicon substrate can also be replaced by other non-metal materials such as glass and quartz. The method for preparing a nano carbon tube provided by the present invention may use ordinary metals or alloys as the metal substrate, and is not limited to the aforementioned ones. In addition, the method of oxidizing the metal substrate to form a catalyst layer is not limited to those listed in the examples. In addition, the carbon source gas and catalyst used for growing the carbon nanotubes are not limited to those described above, and any carbon source gas and catalyst known to those skilled in the art can be used. In summary, the present invention has indeed met the requirements for an invention patent, and a patent application was filed in accordance with the law. However, the above is only a preferred embodiment of the present invention, and it cannot be used to limit the scope of patent application in this case. Any equivalent modifications or changes made by those familiar with the technology of the case with the aid of the spirit of the present invention should be covered by the scope of the following patent applications.

第11頁 1230687 圖式簡單說明 第一圖係本發明奈米碳管之製備方法流程圖。 第二圖係本發明奈米碳管之製備方法所用基底示意 圖。 第三圖係在所用基底表面形成氧化層之示意圖。 第四圖係在氧化層上形成催化劑層之示意圖。 第五圖係利用本發明奈米碳管製備方法所得之奈米碳 管陣列示意圖。 【主要元件符號說明】 不銹鋼 催化劑層 10 14 金屬氧化層 奈米碳管陣列 12 16Page 11 1230687 Brief description of the diagram The first diagram is a flowchart of a method for preparing a nano carbon tube according to the present invention. The second figure is a schematic view of a substrate used in the method for preparing a carbon nanotube of the present invention. The third figure is a schematic diagram of forming an oxide layer on the surface of the substrate used. The fourth diagram is a schematic diagram of forming a catalyst layer on an oxide layer. The fifth figure is a schematic view of a nano carbon tube array obtained by using the method for preparing a nano carbon tube according to the present invention. [Description of Symbols of Main Components] Stainless Steel Catalyst Layer 10 14 Metal Oxide Layer Nano Carbon Tube Array 12 16

第12頁Page 12

Claims (1)

1230687 六、申請專利範圍 1. 一種奈米碳管之製備方法,其包括步驟: 提供一金屬基底; 氧化金屬基底,於其表面形成一氧化層; 於氧化層表面形成一催化劑層; 通入碳氫氣體,並於催化劑作用下發生化學反應, 使得奈米碳管從催化劑層生長,同時產生還原性氣體 將該氧化層還原。 2. 如申請專利範圍第1項所述之奈米碳管之製備方法,其 中該金屬基底包括Ta、Ni、Ag、Fe、Cu。 3 .如申請專利範圍第1項所述之奈米碳管之製備方法,其 丨_ 中該金屬基底包括金屬合金。 4. 如申請專利範圍第3項所述之奈米碳管之製備方法,其 中該合金包括不鎊鋼。 5. 如申請專利範圍第1項所述之奈米碳管之製備方法,其 - 中該氧化層厚度為卜1 0 0 0奈米。 6. 如申請專利範圍第1項所述之奈米碳管之製備方法,其 中該催化劑層包括金屬催化劑或其氧化物。 7. 如申請專利範圍第6項所述之奈米碳管之製備方法,其 中該金屬催化劑包括鐵、始、鎳或其合金。 8. 如申請專利範圍第1項所述之奈米碳管之製備方法,其 _ 中該催化劑層厚度為1〜10奈米。 9. 如申請專利範圍第1項所述之奈米碳管之製備方法,其 中該還原性氣體為氫氣。 10. —種奈米碳管場發射陰極之製備方法,其包括步驟:1230687 6. Scope of patent application 1. A method for preparing a nano carbon tube, comprising the steps of: providing a metal substrate; oxidizing the metal substrate to form an oxide layer on its surface; forming a catalyst layer on the surface of the oxide layer; passing in carbon The hydrogen gas undergoes a chemical reaction under the action of the catalyst, so that the carbon nanotubes grow from the catalyst layer, and a reducing gas is generated to reduce the oxide layer. 2. The method for preparing a nano carbon tube according to item 1 of the scope of patent application, wherein the metal substrate includes Ta, Ni, Ag, Fe, Cu. 3. The method for preparing a nano carbon tube according to item 1 of the scope of patent application, wherein the metal substrate comprises a metal alloy. 4. The method for preparing a nano carbon tube as described in item 3 of the scope of patent application, wherein the alloy includes stainless steel. 5. The method for preparing a nano carbon tube as described in item 1 of the scope of patent application, wherein the thickness of the oxide layer is 100 nm. 6. The method for preparing a nano carbon tube according to item 1 of the scope of patent application, wherein the catalyst layer comprises a metal catalyst or an oxide thereof. 7. The method for preparing a nano carbon tube according to item 6 of the scope of patent application, wherein the metal catalyst includes iron, starting, nickel, or an alloy thereof. 8. The method for preparing a nano carbon tube according to item 1 of the scope of patent application, wherein the thickness of the catalyst layer is 1 to 10 nanometers. 9. The method for preparing a nano carbon tube according to item 1 of the scope of the patent application, wherein the reducing gas is hydrogen. 10. —A method for preparing a carbon nanotube field emission cathode, comprising the steps of: 第13頁 1230687 六、申請專利範圍 提供一陰極基底; 於陰極基底表面形成金屬電極; 氧化該金屬電極,於其表面形成一氧化層; 於該氧化層表面形成一催化劑層; 通入碳氫氣體,並於催化劑作用下發生化學反應, 使得奈米碳管從催化劑層生長,同時產生還原性氣體 將該氧化層還原。 1 1 ·如申請專利範圍第1 〇項所述之奈米碳管場發射陰極之 製備方法,其中該陰極基底包括玻璃、矽或石英。Page 13 1230687 6. The scope of the patent application provides a cathode substrate; forming a metal electrode on the surface of the cathode substrate; oxidizing the metal electrode to form an oxide layer on the surface; forming a catalyst layer on the surface of the oxide layer; passing in a hydrocarbon gas A chemical reaction occurs under the action of the catalyst, so that the carbon nanotubes grow from the catalyst layer, and a reducing gas is generated to reduce the oxide layer. 1 1 · The method for preparing a nano-carbon tube field emission cathode as described in item 10 of the patent application scope, wherein the cathode substrate includes glass, silicon or quartz. 1 2 ·如申請專利範圍第丨〇項所述之奈米碳管場發射陰極之 製備方法,其中該金屬電極包括Ta、Ni、Ag、Fe、 Cu ° ' 1 3 ·如申請專利範圍第丨〇項所述之奈米碳管場發射陰極之 製備方法,其中該金屬電極包括金屬合金。 1 4 ·如申請專利範圍第丨3項所述之奈米碳管場發射陰極之 製備方法,其中該合金包枯不錄鋼。 1 5 ·如申請專利範圍第丨〇項所述之奈米碳管場發射陰極之 製備方法,其中該氧化層摩度為1〜1 000奈米。 1 6 ·如申請專利範圍第丨〇項所述之奈米碳管場發射陰極之 製備方法,其中該催化劑層包括金屬催化劑或其氧化 物。 17,如申請專利範 斫述之奈米碳管場發射陰極之 製備方法,其中該金屬催牝劑包括鐵、鈷、鎳或其合 金01 2 · The method for preparing a nano-carbon tube field emission cathode as described in item No. 丨 0, wherein the metal electrode includes Ta, Ni, Ag, Fe, Cu ° '1 3 The method for preparing a nano-carbon tube field emission cathode according to item 〇, wherein the metal electrode includes a metal alloy. 1 4. The method for preparing a field emission cathode of a nano carbon tube according to item 3 of the scope of the patent application, wherein the alloy is covered with no steel. 15 · The method for preparing a nanometer carbon tube field emission cathode as described in item No. 0 of the patent application range, wherein the oxide layer has a friction of 1 to 1,000 nanometers. 16 · The method for preparing a nano-carbon tube field emission cathode as described in item No. 0 of the patent application, wherein the catalyst layer comprises a metal catalyst or an oxide thereof. 17. A method for preparing a nano-carbon tube field emission cathode as described in the patent application, wherein the metal catalyst includes iron, cobalt, nickel, or an alloy thereof. 1230687 六、申請專利範圍 1 8.如申請專利範圍第1 0項所述之奈米碳管場發射陰極之 製備方法,其中該催化劑層厚度為卜1 0奈米。 1 9.如申請專利範圍第1 0項·所述之奈米碳管場發射陰極之 製備方法,其中該還原性氣體為氫氣。1230687 6. Scope of patent application 1 8. The method for preparing a nanometer carbon tube field emission cathode as described in item 10 of the scope of patent application, wherein the thickness of the catalyst layer is 10 nanometers. 19. The method for preparing a nano-carbon tube field emission cathode according to item 10 of the scope of the patent application, wherein the reducing gas is hydrogen. 第15頁Page 15
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