TWD232581S - Inner tube of reaction tube for semiconductor manufacturing equipment - Google Patents
Inner tube of reaction tube for semiconductor manufacturing equipment Download PDFInfo
- Publication number
- TWD232581S TWD232581S TW111305738F TW111305738F TWD232581S TW D232581 S TWD232581 S TW D232581S TW 111305738 F TW111305738 F TW 111305738F TW 111305738 F TW111305738 F TW 111305738F TW D232581 S TWD232581 S TW D232581S
- Authority
- TW
- Taiwan
- Prior art keywords
- semiconductor manufacturing
- tube
- manufacturing equipment
- reaction tube
- inner tube
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract description 5
- 239000004065 semiconductor Substances 0.000 title abstract description 5
Abstract
【物品用途】;本設計的物品是半導體製造裝置用反應管的內管,係安裝於反應管之內側而被使用的內管,而該反應管係被使用於半導體製造裝置。;【設計說明】;(無)[Purpose of the article]; The article of this design is an inner tube of a reaction tube for a semiconductor manufacturing device, which is an inner tube installed on the inner side of the reaction tube and used, and the reaction tube is used in a semiconductor manufacturing device. ;[Design description];(None)
Description
本設計的物品是半導體製造裝置用反應管的內管,係安裝於反應管之內側而被使用的內管,而該反應管係被使用於半導體製造裝置。The article of this design is an inner tube of a reaction tube for a semiconductor manufacturing device, which is an inner tube installed on the inner side of a reaction tube and used, and the reaction tube is used in a semiconductor manufacturing device.
(無)(without)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022011409F JP1731673S (en) | 2022-05-30 | 2022-05-30 | |
JP2022-011409 | 2022-05-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD232581S true TWD232581S (en) | 2024-08-01 |
Family
ID=84322290
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111305738F TWD232581S (en) | 2022-05-30 | 2022-11-18 | Inner tube of reaction tube for semiconductor manufacturing equipment |
Country Status (3)
Country | Link |
---|---|
US (1) | USD1019581S1 (en) |
JP (1) | JP1731673S (en) |
TW (1) | TWD232581S (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1054992S1 (en) * | 2023-05-05 | 2024-12-24 | Molex, Llc | Connector |
USD1065091S1 (en) | 2023-05-05 | 2025-03-04 | Molex, Llc | Connector |
USD1051061S1 (en) | 2023-05-05 | 2024-11-12 | Molex, Llc | Connector |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWD213081S (en) | 2020-06-15 | 2021-08-01 | 日商東京威力科創股份有限公司 | Reaction tube for semiconductor manufacturing equipment (1) |
Family Cites Families (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5637153A (en) * | 1993-04-30 | 1997-06-10 | Tokyo Electron Limited | Method of cleaning reaction tube and exhaustion piping system in heat processing apparatus |
USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
USD405430S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Inner tube for use in a semiconductor wafer heat processing apparatus |
USD423463S (en) * | 1997-01-31 | 2000-04-25 | Tokyo Electron Limited | Quartz process tube |
USD551634S1 (en) * | 2005-02-28 | 2007-09-25 | Tokyo Electron Limited | Wafer-boat for heat-processing of semiconductor wafers |
USD552047S1 (en) * | 2005-02-28 | 2007-10-02 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
JP4331768B2 (en) * | 2007-02-28 | 2009-09-16 | 東京エレクトロン株式会社 | Heat treatment furnace and vertical heat treatment equipment |
US8023806B2 (en) * | 2007-03-20 | 2011-09-20 | Tokyo Electron Limited | Heat processing furnace and vertical-type heat processing apparatus |
TWD127410S1 (en) * | 2007-04-20 | 2009-02-11 | 東京威力科創股份有限公司 | Process tubes for semiconductor manufacturing |
TWD125601S (en) * | 2007-05-08 | 2008-10-21 | 東京威力科創股份有限公司 | Processing tubes for semiconductor manufacturing |
TWD143034S1 (en) * | 2008-03-28 | 2011-10-01 | 東京威力科創股份有限公司 | Processing tubes for semiconductor manufacturing |
USD610559S1 (en) * | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube |
US8398773B2 (en) * | 2011-01-21 | 2013-03-19 | Asm International N.V. | Thermal processing furnace and liner for the same |
USD724551S1 (en) * | 2011-11-18 | 2015-03-17 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
USD720308S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
USD720309S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
TWD166332S (en) * | 2013-03-22 | 2015-03-01 | 日立國際電氣股份有限公司 | Part of the wafer boat for substrate processing equipment |
TWD167985S (en) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | part of reaction tube |
TWD168774S (en) * | 2013-06-28 | 2015-07-01 | 日立國際電氣股份有限公司 | part of reaction tube |
USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
TWD167987S (en) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | part of reaction tube |
TWD167986S (en) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | part of reaction tube |
TWD168827S (en) * | 2013-07-29 | 2015-07-01 | 日立國際電氣股份有限公司 | Wafer boats for semiconductor manufacturing equipment |
TWD167988S (en) * | 2013-07-29 | 2015-05-21 | 日立國際電氣股份有限公司 | Wafer boats for semiconductor manufacturing equipment |
JP1535455S (en) * | 2015-02-25 | 2015-10-19 | ||
JP1546512S (en) * | 2015-09-04 | 2016-03-22 | ||
JP1546345S (en) * | 2015-09-04 | 2016-03-22 | ||
JP1563649S (en) * | 2016-02-12 | 2016-11-21 | ||
JP1563524S (en) | 2016-03-30 | 2016-11-21 | ||
JP1605460S (en) * | 2017-08-09 | 2021-05-31 | ||
JP1605462S (en) * | 2017-08-10 | 2021-05-31 | ||
JP1605461S (en) * | 2017-08-10 | 2021-05-31 | ||
JP1605982S (en) * | 2017-12-27 | 2021-05-31 | ||
USD846514S1 (en) * | 2018-05-03 | 2019-04-23 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
USD847105S1 (en) * | 2018-05-03 | 2019-04-30 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
JP6856576B2 (en) * | 2018-05-25 | 2021-04-07 | 株式会社Kokusai Electric | Substrate processing equipment, semiconductor equipment manufacturing methods and programs |
JP1638282S (en) * | 2018-09-20 | 2019-08-05 | ||
JP1640260S (en) * | 2018-11-19 | 2019-09-02 | ||
JP1644260S (en) | 2019-03-20 | 2019-10-28 | ||
JP1658652S (en) * | 2019-08-07 | 2020-04-27 | ||
JP1665228S (en) * | 2019-11-28 | 2020-08-03 | ||
USD931823S1 (en) * | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube |
JP1678273S (en) * | 2020-03-10 | 2021-02-01 | reaction tube | |
JP1678278S (en) * | 2020-03-19 | 2021-02-01 | Boat for substrate processing equipment | |
CN115989568A (en) * | 2020-09-28 | 2023-04-18 | 株式会社国际电气 | Temperature control method, method for manufacturing semiconductor device, program, and substrate processing apparatus |
JP1700777S (en) * | 2021-03-15 | 2021-11-29 | Boat for substrate processing equipment |
-
2022
- 2022-05-30 JP JP2022011409F patent/JP1731673S/ja active Active
- 2022-11-18 TW TW111305738F patent/TWD232581S/en unknown
- 2022-11-28 US US29/861,167 patent/USD1019581S1/en active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWD213081S (en) | 2020-06-15 | 2021-08-01 | 日商東京威力科創股份有限公司 | Reaction tube for semiconductor manufacturing equipment (1) |
Also Published As
Publication number | Publication date |
---|---|
JP1731673S (en) | 2022-12-08 |
USD1019581S1 (en) | 2024-03-26 |
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