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TW201424497A - Circuit board and method for manufacturing same - Google Patents

Circuit board and method for manufacturing same Download PDF

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Publication number
TW201424497A
TW201424497A TW101150396A TW101150396A TW201424497A TW 201424497 A TW201424497 A TW 201424497A TW 101150396 A TW101150396 A TW 101150396A TW 101150396 A TW101150396 A TW 101150396A TW 201424497 A TW201424497 A TW 201424497A
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Taiwan
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conductive
circuit board
hole segment
opening
substrate
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TW101150396A
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Chinese (zh)
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TWI463931B (en
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Wen-Hung Hu
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Zhen Ding Technology Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

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  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Abstract

A circuit board includes a substrate, a number of pads a dielectrical layer and conductive bumps. The pads are formed on a surface of the substrate. The dielectrical layer is laminated on an side surface of the substrate having the pads. The dielectrical layer has a first surface far from the substrate. A number of openings corresponding to pads are defined in the dielectrical layer. Each opening includes a first section and a second section. The first section adjoins to the pad, the second section adjoins to the first surface. A diameter of the second section is larger than that of the first section. The conductive bumps are formed in the openings. The present disclosure also provides a method for manufacturing the circuit board.

Description

電路板及其製作方法Circuit board and manufacturing method thereof

本發明涉及電路板製作技術領域,尤其涉及一種電路板及其製作方法。The present invention relates to the field of circuit board manufacturing technology, and in particular, to a circuit board and a manufacturing method thereof.

採用倒裝晶片球柵格陣列(FCBGA)進行封裝晶片的電路板,通常需要製作陣列排布的多個導電凸塊結構,以用於承載錫球。所述導電凸塊需要貫穿防焊層並與對應的導電線路相互電連接。現有技術中,通常採用在所述導電線路上形成對應的防焊層開口,然後在防焊層上形成電鍍阻擋層,並在電鍍阻擋層中形成與防焊層開口對應的電鍍阻擋層。由於防焊層開口和電鍍阻擋層開口均需要顯影形成,並且需要相互連通,在製作過程中需要對應的電鍍阻擋層開口與防焊層開口進行對位。之後,在防焊層的開口內化學鍍然後電鍍的方式形成導電凸塊。最後,去除電鍍阻擋層,得到凸出於防焊層的導電凸塊。在上述的製作方法中,需要將防焊層開口製作的相對較大,以便於顯影形成電鍍阻擋層開口時進行對位。並且,由於形成的導電凸塊與防焊層相互接觸,且接觸面積較小,從而容易導致導電凸塊於防焊層相互分離,得到的電路板的信賴性較差。並且,這樣的製作方法決定了製作的導電凸塊結構的分佈密度較小,不利於多個導電凸塊結構密集分佈。A printed circuit board using a flip chip ball grid array (FCBGA) typically requires a plurality of conductive bump structures arranged in an array for carrying solder balls. The conductive bumps need to penetrate the solder resist layer and are electrically connected to the corresponding conductive lines. In the prior art, a corresponding solder resist opening is formed on the conductive line, and then a plating barrier layer is formed on the solder resist layer, and a plating barrier corresponding to the solder resist opening is formed in the plating barrier layer. Since both the solder resist opening and the plating barrier opening need to be formed by development and need to communicate with each other, a corresponding plating barrier opening is required to be aligned with the solder resist opening during the fabrication process. Thereafter, conductive bumps are formed by electroless plating and then electroplating in the openings of the solder resist layer. Finally, the plating barrier is removed to obtain conductive bumps protruding from the solder resist layer. In the above manufacturing method, it is necessary to make the solder resist layer opening relatively large in order to perform alignment when developing the plating barrier opening. Moreover, since the formed conductive bumps and the solder resist layer are in contact with each other and the contact area is small, the conductive bumps are easily separated from each other in the solder resist layer, and the obtained circuit board has poor reliability. Moreover, such a manufacturing method determines that the distributed density of the conductive bump structures is small, which is disadvantageous for the dense distribution of the plurality of conductive bump structures.

有鑑於此,提供一種電路板及其製作方法,可以提高電路板的導電金屬塊的信賴性實屬必要。In view of the above, it is necessary to provide a circuit board and a manufacturing method thereof, which can improve the reliability of the conductive metal block of the circuit board.

一種電路板的製作方法,包括步驟:提供電路基板,其包括基底及形成於基底一表面的導電墊;在所述電路基板具有導電墊的一側壓合介電層,所述介電層具有遠離所述基底的第一表面;採用雷射在介電層內形成多個與導電墊一一對應的多個開孔,每個所述開孔為階梯孔,所述開孔包括相互連接的第一孔段和第二孔段,第一孔段與導電墊相鄰,第二孔段與第一表面相鄰,第二孔段的孔徑大於第一孔段的孔徑;以及在所述開孔內形成導電金屬塊,每個導電金屬塊與對應的導電墊相互電連接。A method of manufacturing a circuit board, comprising the steps of: providing a circuit substrate comprising a substrate and a conductive pad formed on a surface of the substrate; and pressing a dielectric layer on a side of the circuit substrate having a conductive pad, the dielectric layer having Moving away from the first surface of the substrate; forming a plurality of openings in the dielectric layer corresponding to the conductive pads in a plurality of holes, each of the openings being a stepped hole, the openings comprising interconnecting a first hole segment and a second hole segment, the first hole segment being adjacent to the conductive pad, the second hole segment being adjacent to the first surface, the second hole segment having a larger diameter than the first hole segment; and Conductive metal blocks are formed in the holes, and each of the conductive metal blocks and the corresponding conductive pads are electrically connected to each other.

一種電路板,其包括基底、導電墊、介電層及導電金屬塊,所述導電墊形成於基底的一表面,所述介電層壓合於基底具有導電墊的一側,所述介電層具有遠離基底的第一表面,在介電層內形成有與導電墊對應開孔,所述開孔為階梯孔,每個所述開孔包括相互連接的第一孔段和第二孔段,第一孔段與導電墊相鄰,第二孔段與第一表面相鄰,第二孔段的孔徑大於第一孔段的孔徑,導電金屬塊形成於開孔內,並完全填充所述開孔。A circuit board comprising a substrate, a conductive pad, a dielectric layer and a conductive metal block, the conductive pad being formed on a surface of the substrate, the dielectric laminate being bonded to a side of the substrate having a conductive pad, the dielectric The layer has a first surface away from the substrate, and an opening corresponding to the conductive pad is formed in the dielectric layer, the opening is a stepped hole, and each of the openings comprises a first hole segment and a second hole segment connected to each other a first hole segment adjacent to the conductive pad, the second hole segment being adjacent to the first surface, the second hole segment having a larger aperture than the first hole segment, the conductive metal block being formed in the opening, and completely filling the hole Open the hole.

本技術方案提供的電路板及其製作方法,由於導電金屬塊形成於介電層內,且介電層內的用於收容導電金屬塊的開孔為階梯孔。相較於先前技術中,在防焊層中形成開口,然後形成凸出於防焊層表面金屬凸塊,可以增加導電金屬塊與介電層的接觸面積。相較於防焊層,介電層與金屬的結合能力優於防焊層與金屬的結合能力。因此,本技術方案提供的電路板的信賴性較好。The circuit board provided by the technical solution and the manufacturing method thereof are formed by forming a conductive metal block in the dielectric layer, and the opening for receiving the conductive metal block in the dielectric layer is a stepped hole. Compared with the prior art, forming an opening in the solder resist layer and then forming a metal bump protruding from the surface of the solder resist layer can increase the contact area of the conductive metal block with the dielectric layer. Compared with the solder resist layer, the dielectric layer and metal bonding ability is superior to the solder resist layer and metal bonding ability. Therefore, the circuit board provided by the technical solution has better reliability.

本技術方案提供的電路板製作方法包括如下步驟:The circuit board manufacturing method provided by the technical solution includes the following steps:

第一步,請參閱圖1,提供電路基板110。In the first step, referring to FIG. 1, a circuit substrate 110 is provided.

所述電路基板110包括基底111及多個導電墊112。The circuit substrate 110 includes a substrate 111 and a plurality of conductive pads 112.

電路基板110可以為單層電路基板也可以為多層電路基板。當電路基板110為單層電路基板時,基底111為單層的介電層。當電路基板110為多層電路基板時,基底111可以為多層導電線路層及多層介電層交替層疊的結構。多個導電墊112與基底111的一層介電層相接觸。本實施例中,基底111的一表面形成有導電線路層113,導電線路層113包括多個導電墊112及多根導電線路(圖未示)。The circuit substrate 110 may be a single layer circuit substrate or a multilayer circuit substrate. When the circuit substrate 110 is a single-layer circuit substrate, the substrate 111 is a single-layer dielectric layer. When the circuit substrate 110 is a multilayer circuit substrate, the substrate 111 may have a structure in which a plurality of conductive wiring layers and a plurality of dielectric layers are alternately laminated. A plurality of conductive pads 112 are in contact with a dielectric layer of the substrate 111. In this embodiment, a surface of the substrate 111 is formed with a conductive circuit layer 113. The conductive circuit layer 113 includes a plurality of conductive pads 112 and a plurality of conductive lines (not shown).

第二步,請參閱圖2,在電路基板110的多個導電墊112表面及從導電線路層113露出的基底111的表面形成介電層120。In the second step, referring to FIG. 2, a dielectric layer 120 is formed on the surface of the plurality of conductive pads 112 of the circuit substrate 110 and the surface of the substrate 111 exposed from the conductive wiring layer 113.

本步驟中,介電層120通過壓合的方式形成於多個導電墊112表面及從導電墊112露出的基底111,使得介電層120完全覆蓋導電線路層113。介電層120具有遠離基底111的第一表面122。In this step, the dielectric layer 120 is formed on the surface of the plurality of conductive pads 112 and the substrate 111 exposed from the conductive pads 112 by pressing, so that the dielectric layer 120 completely covers the conductive circuit layer 113. Dielectric layer 120 has a first surface 122 that is remote from substrate 111.

第三步,請參閱圖3,採用雷射在介電層120內形成有多個開孔121,每個開孔121與一個導電墊112相互對應,每個導電墊112從對應的開孔121露出。In the third step, referring to FIG. 3, a plurality of openings 121 are formed in the dielectric layer 120 by using a laser. Each of the openings 121 and one of the conductive pads 112 correspond to each other, and each of the conductive pads 112 is corresponding to the opening 121. Exposed.

本步驟中,採用準分子雷射形成開孔121。開孔121呈階梯狀。開孔121包括相互連通的第一孔段1211和第二孔段1212。第一孔段1211與導電墊112相鄰,第二孔段1212靠近第一表面122。其中,第一孔段1211的孔徑小於第二孔段1212的孔徑。優選地,第一孔段1211與第二孔段1212同軸設置。由於開孔121採用雷射形成,第一孔段1211及第二孔段1212的縱截面均為倒梯形。在第一孔段1211和第二孔段1212的連接處,形成有連接面1213,所述連接面1213從第二孔段1212一側露出,所述連接面1213大致平行於第一表面122。In this step, the opening 121 is formed by using a pseudo-molecular laser. The opening 121 is stepped. The opening 121 includes a first hole segment 1211 and a second hole segment 1212 that communicate with each other. The first hole segment 1211 is adjacent to the conductive pad 112, and the second hole segment 1212 is adjacent to the first surface 122. Wherein, the aperture of the first hole segment 1211 is smaller than the aperture of the second hole segment 1212. Preferably, the first bore segment 1211 is disposed coaxially with the second bore segment 1212. Since the opening 121 is formed by laser, the longitudinal sections of the first hole segment 1211 and the second hole segment 1212 are all inverted trapezoids. At the junction of the first bore section 1211 and the second bore section 1212, a joint face 1213 is formed, the joint face 1213 being exposed from the side of the second bore section 1212, the joint face 1213 being substantially parallel to the first surface 122.

由於開孔121採用準分子雷射形成,在形成準分子雷射時,可以通過控制不同位置的雷射的能量,即位於開孔121中心區域,採用較大的能量,使得介電層120被完全貫穿,同時形成第一孔段1211和第二孔段1212。在外繞中心區域的邊緣區域,採用較小的雷射能量,使得僅部分的介電層120被燒蝕去除,僅形成第二孔段1212,從而得到階梯形狀的開孔121。Since the opening 121 is formed by using a pseudo-molecular laser, when the excimer laser is formed, the energy of the laser at different positions can be controlled, that is, the central region of the opening 121 is used, and the larger energy is used, so that the dielectric layer 120 is The first hole section 1211 and the second hole section 1212 are formed at the same time. At the edge region of the outer winding center region, a small amount of laser energy is applied, so that only a portion of the dielectric layer 120 is ablated and only the second hole segment 1212 is formed, thereby obtaining a stepped opening 121.

第四步,請參閱圖4至圖6,在每個開孔121內形成導電金屬塊150,得到電路板100。In the fourth step, referring to FIG. 4 to FIG. 6, a conductive metal block 150 is formed in each of the openings 121 to obtain the circuit board 100.

本步驟具體為:This step is specifically as follows:

首先,在開孔121的內壁及介電層120的第一表面122形成金屬種子層130。First, a metal seed layer 130 is formed on the inner wall of the opening 121 and the first surface 122 of the dielectric layer 120.

所述金屬種子層130可以採用化學鍍金屬的方式形成。如化學鍍銅的方式形成。當然,金屬種子層130也可以採用黑影等方式,使得開孔121的內壁及介電層120的表面形成金屬種子層130。The metal seed layer 130 may be formed by electroless metal plating. Formed by means of electroless copper plating. Of course, the metal seed layer 130 can also be formed by a black shadow or the like such that the inner wall of the opening 121 and the surface of the dielectric layer 120 form the metal seed layer 130.

然後,通過電鍍的方式,在金屬種子層130表面形成電鍍金屬材料140,使得所述開孔121被完全填充。Then, a plating metal material 140 is formed on the surface of the metal seed layer 130 by electroplating so that the opening 121 is completely filled.

本步驟中,電鍍的金屬材料可以為銅、銀等。本實施例中,電鍍金屬材料140完全填充開孔121,並形成在介電層120的第一表面122的金屬種子層130的表面。In this step, the plated metal material may be copper, silver or the like. In the present embodiment, the plated metal material 140 completely fills the opening 121 and is formed on the surface of the metal seed layer 130 of the first surface 122 of the dielectric layer 120.

最後,去除介電層120的第一表面122的電鍍金屬材料140及金屬種子層130,位於開孔121內的電鍍金屬材料140及金屬種子層130形成導電金屬塊150,從而得到電路板100。Finally, the plated metal material 140 and the metal seed layer 130 of the first surface 122 of the dielectric layer 120 are removed, and the plated metal material 140 and the metal seed layer 130 located in the opening 121 form the conductive metal block 150, thereby obtaining the circuit board 100.

本步驟中,可以採用化學蝕刻的方式去除介電層120的第一表面122的電鍍金屬材料140及金屬種子層130。通過控制蝕刻的時間,使得開孔121內的電鍍金屬材料140及金屬種子層130仍留在開孔121內形成導電金屬塊150。導電金屬塊150具有遠離導電墊112的端面151。所述端面151與第一表面122平齊。In this step, the plated metal material 140 and the metal seed layer 130 of the first surface 122 of the dielectric layer 120 may be removed by chemical etching. By controlling the etching time, the plated metal material 140 and the metal seed layer 130 in the opening 121 remain in the opening 121 to form the conductive metal block 150. The conductive metal block 150 has an end surface 151 remote from the conductive pad 112. The end surface 151 is flush with the first surface 122.

導電金屬塊150包括相互連接的連接部152及承載部153。所述連接部152的位於所述第一孔段1211內,所述承載部153位於第二孔段1212內。連接部152的形狀與第一孔段1211的形狀相對應,承載部153的形狀與第二孔段1212的形狀相對應。所述連接部152電連接導電墊112及承載部153,承載部153用於與其他元件進行焊接。連接部152及承載部153均為倒圓臺形,連接部152的橫截面積小於承載部153的橫截面積。The conductive metal block 150 includes a connecting portion 152 and a bearing portion 153 that are connected to each other. The connecting portion 152 is located in the first hole segment 1211, and the bearing portion 153 is located in the second hole segment 1212. The shape of the connecting portion 152 corresponds to the shape of the first hole segment 1211, and the shape of the bearing portion 153 corresponds to the shape of the second hole segment 1212. The connecting portion 152 electrically connects the conductive pad 112 and the carrying portion 153 for soldering with other components. The connecting portion 152 and the carrying portion 153 are all in the shape of a truncated cone, and the cross-sectional area of the connecting portion 152 is smaller than the cross-sectional area of the carrying portion 153.

請參閱圖7,本技術方案提供的電路板製作方法,還可以包括在端面151形成表面處理層160的步驟。所述表面處理層160可以為有機保焊層,也可以為鎳金鍍層等,以保護導電金屬塊150。Referring to FIG. 7 , the circuit board manufacturing method provided by the technical solution may further include the step of forming the surface treatment layer 160 on the end surface 151 . The surface treatment layer 160 may be an organic solder resist layer or a nickel gold plating layer or the like to protect the conductive metal block 150.

請參閱圖6及圖7,本技術方案還提供一種採用上述方法制得的電路板100,所述電路板100包括基底111、導電墊112、介電層120及導電金屬塊150。Referring to FIG. 6 and FIG. 7 , the technical solution further provides a circuit board 100 prepared by the above method. The circuit board 100 includes a substrate 111 , a conductive pad 112 , a dielectric layer 120 , and a conductive metal block 150 .

所述導電墊112形成於基底111的一表面。所述介電層120壓合於基底111具有導電墊112的一側。在介電層120內形成有開孔121,開孔121為階梯孔。所述介電層120具有遠離基底111的第一表面122。導電金屬塊150形成於開孔121內,並與對應的導電墊112相互電連接。導電金屬塊150具有遠離對應的導電墊112的端面151,端面151與介電層120的第一表面122平齊。The conductive pad 112 is formed on a surface of the substrate 111. The dielectric layer 120 is pressed against one side of the substrate 111 having the conductive pads 112. An opening 121 is formed in the dielectric layer 120, and the opening 121 is a stepped hole. The dielectric layer 120 has a first surface 122 that is remote from the substrate 111. The conductive metal block 150 is formed in the opening 121 and electrically connected to the corresponding conductive pad 112. The conductive metal block 150 has an end surface 151 away from the corresponding conductive pad 112, and the end surface 151 is flush with the first surface 122 of the dielectric layer 120.

導電金屬塊150包括相互連接的連接部152及承載部153。所述連接部152的位於所述第一孔段1211內,所述承載部153位於第二孔段1212內。連接部152的形狀與第一孔段1211的形狀相對應,承載部153的形狀與第二孔段1212的形狀相對應。所述連接部152電連接導電墊112及承載部153,承載部153用於與其他元件進行焊接。連接部152及承載部153均為倒圓臺形,連接部152的橫截面積小於承載部153的橫截面積。The conductive metal block 150 includes a connecting portion 152 and a bearing portion 153 that are connected to each other. The connecting portion 152 is located in the first hole segment 1211, and the bearing portion 153 is located in the second hole segment 1212. The shape of the connecting portion 152 corresponds to the shape of the first hole segment 1211, and the shape of the bearing portion 153 corresponds to the shape of the second hole segment 1212. The connecting portion 152 electrically connects the conductive pad 112 and the carrying portion 153 for soldering with other components. The connecting portion 152 and the carrying portion 153 are all in the shape of a truncated cone, and the cross-sectional area of the connecting portion 152 is smaller than the cross-sectional area of the carrying portion 153.

導電金屬塊150由與開孔121的內壁相接觸的金屬種子層130及形成於金屬種子層130表面的電鍍金屬材料140組成。The conductive metal block 150 is composed of a metal seed layer 130 in contact with the inner wall of the opening 121 and a plated metal material 140 formed on the surface of the metal seed layer 130.

進一步的,在每個導電金屬塊150的端面151還形成有表面處理層160,以保護導電金屬塊150。Further, a surface treatment layer 160 is further formed on the end surface 151 of each of the conductive metal blocks 150 to protect the conductive metal block 150.

本技術方案提供的電路板及其製作方法,由於導電金屬塊150形成於介電層120內,且介電層120內的用於收容導電金屬塊150的開孔121為階梯孔。相比於現有技術中,在防焊層中形成開口,然後形成凸出於防焊層表面金屬凸塊,可以增加導電金屬塊150與介電層120的接觸面積。相比於防焊層,介電層與金屬的結合能力優於防焊層與金屬的結合能力。因此,本技術方案提供的電路板的信賴性較好。The circuit board and the manufacturing method thereof are provided. The conductive metal block 150 is formed in the dielectric layer 120, and the opening 121 for receiving the conductive metal block 150 in the dielectric layer 120 is a stepped hole. Compared with the prior art, forming an opening in the solder resist layer and then forming a metal bump protruding from the surface of the solder resist layer can increase the contact area of the conductive metal block 150 with the dielectric layer 120. Compared with the solder resist layer, the dielectric layer and metal bonding ability is superior to the solder resist layer and metal bonding ability. Therefore, the circuit board provided by the technical solution has better reliability.

並且,介電層中的開孔採用一次雷射燒蝕形成,從而可以形成比較密集分佈的開孔,近而可以形成比較密集分佈的導電金屬塊,提高電路板的佈線密度。Moreover, the openings in the dielectric layer are formed by one laser ablation, so that relatively densely-distributed openings can be formed, and relatively densely distributed conductive metal blocks can be formed to increase the wiring density of the circuit board.

惟,以上所述者僅為本發明之較佳實施方式,自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士爰依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

100...電路板100. . . Circuit board

110...電路基板110. . . Circuit substrate

111...基底111. . . Base

112...導電墊112. . . Conductive pad

113...導電線路層113. . . Conductive circuit layer

120...介電層120. . . Dielectric layer

121...開孔121. . . Opening

1211...第一孔段1211. . . First hole

1212...第二孔段1212. . . Second hole section

1213...連接面1213. . . Connection surface

122...第一表面122. . . First surface

130...金屬種子層130. . . Metal seed layer

140...電鍍金屬材料140. . . Plating metal material

150...導電金屬塊150. . . Conductive metal block

151...端面151. . . End face

152...連接部152. . . Connection

153...承載部153. . . Carrying part

160...表面處理層160. . . Surface treatment layer

圖1係本技術方案實施例提供的電路基板的剖面示意圖。1 is a schematic cross-sectional view of a circuit substrate provided by an embodiment of the present technical solution.

圖2係圖1的電路基板一側壓合介電層後的剖面示意圖。FIG. 2 is a schematic cross-sectional view showing a state in which a dielectric layer is laminated on a side of a circuit substrate of FIG. 1. FIG.

圖3係在圖2的介電層中形成開孔後的剖面示意圖。3 is a schematic cross-sectional view showing an opening in the dielectric layer of FIG. 2.

圖4係圖3的介電層表面及開孔內壁形成金屬種子層後的剖面示意圖。4 is a schematic cross-sectional view showing the surface of the dielectric layer and the inner wall of the opening of FIG. 3 after forming a metal seed layer.

圖5係在圖4的金屬種子層表面形成電鍍金屬材料後的剖面示意圖。Figure 5 is a schematic cross-sectional view showing the formation of a plated metal material on the surface of the metal seed layer of Figure 4.

圖6係本技術方案提供的電路板的剖面示意圖。6 is a schematic cross-sectional view of a circuit board provided by the present technical solution.

圖7係在圖6的電路板的導電金屬塊表面形成表面處理層後的剖面示意圖。Figure 7 is a schematic cross-sectional view showing the surface of the conductive metal block of the circuit board of Figure 6 after the surface treatment layer is formed.

100...電路板100. . . Circuit board

111...基底111. . . Base

112...導電墊112. . . Conductive pad

120...介電層120. . . Dielectric layer

121...開孔121. . . Opening

130...金屬種子層130. . . Metal seed layer

140...電鍍金屬材料140. . . Plating metal material

150...導電金屬塊150. . . Conductive metal block

151...端面151. . . End face

152...連接部152. . . Connection

153...承載部153. . . Carrying part

Claims (11)

一種電路板的製作方法,包括步驟:
提供電路基板,其包括基底及形成於基底一表面的導電墊;
在所述電路基板具有導電墊的一側壓合介電層,所述介電層具有遠離所述基底的第一表面;
採用雷射在介電層內形成多個與導電墊一一對應的多個開孔,每個所述開孔為階梯孔,所述開孔包括相互連接的第一孔段和第二孔段,第一孔段與導電墊相鄰,第二孔段與第一表面相鄰,第二孔段的孔徑大於第一孔段的孔徑;以及
在所述開孔內形成導電金屬塊,每個導電金屬塊與對應的導電墊相互電連接。
A method of manufacturing a circuit board, comprising the steps of:
Providing a circuit substrate comprising a substrate and a conductive pad formed on a surface of the substrate;
Pressing a dielectric layer on a side of the circuit substrate having a conductive pad, the dielectric layer having a first surface away from the substrate;
Forming, by using a laser, a plurality of openings corresponding to the conductive pads in a one-to-one manner in the dielectric layer, each of the openings being a stepped hole, wherein the opening comprises a first hole segment and a second hole segment connected to each other The first hole segment is adjacent to the conductive pad, the second hole segment is adjacent to the first surface, the second hole segment has a larger aperture than the first hole segment; and a conductive metal block is formed in the opening, each The conductive metal blocks are electrically connected to the corresponding conductive pads.
如請求項1所述的電路板的製作方法,其中,每個導電金屬塊具有遠離對應導電墊的端面,所述端面與第一表面平齊。The method of fabricating a circuit board according to claim 1, wherein each of the conductive metal blocks has an end surface away from the corresponding conductive pad, and the end surface is flush with the first surface. 如請求項1所述的電路板的製作方法,其中,在所述開孔內形成導電金屬塊包括步驟:
在開孔的內壁及介電層的第一表面形成金屬種子層;
通過電鍍的方式,在金屬種子層表面形成電鍍金屬材料,使得所述開孔被完全填充;以及
去除介電層的第一表面的電鍍金屬材料及金屬種子層,位於開孔內的電鍍金屬材料及金屬種子層形成導電金屬塊。
The method of fabricating a circuit board according to claim 1, wherein the forming a conductive metal block in the opening comprises the steps of:
Forming a metal seed layer on the inner wall of the opening and the first surface of the dielectric layer;
Forming a plated metal material on the surface of the metal seed layer by electroplating so that the opening is completely filled; and removing the plated metal material and the metal seed layer of the first surface of the dielectric layer, and plating metal material located in the opening And the metal seed layer forms a conductive metal block.
如請求項1所述的電路板的製作方法,其中,採用準分子雷射形成所述開孔。The method of fabricating a circuit board according to claim 1, wherein the opening is formed by using a pseudo-molecular laser. 如請求項1所述的電路板的製作方法,其中,所述第一孔段和第二孔段連接處形成有連接面,所述連接面從第二孔段一側露出,所述連接面平行於第一表面。The manufacturing method of the circuit board of claim 1, wherein the connection between the first hole segment and the second hole segment is formed with a connection surface, the connection surface being exposed from a side of the second hole segment, the connection surface Parallel to the first surface. 如請求項1所述的電路板的製作方法,其中,所述導電金屬塊包括相互連接的連接部及承載部,所述連接部的位於所述第一孔段內,所述承載部位於第二孔段內,所述連接部連接於對應的導電墊與承載部之間,所述連接部的橫截面積小於承載部的橫截面積。The manufacturing method of the circuit board of claim 1, wherein the conductive metal block comprises a connecting portion and a carrying portion connected to each other, the connecting portion is located in the first hole segment, and the bearing portion is located in the first In the two-hole section, the connecting portion is connected between the corresponding conductive pad and the carrying portion, and the connecting portion has a cross-sectional area smaller than a cross-sectional area of the carrying portion. 如請求項1所述的電路板的製作方法,其中,還包括在所述端面形成表面處理層。The method of manufacturing a circuit board according to claim 1, further comprising forming a surface treatment layer on the end surface. 一種電路板,其包括基底、導電墊、介電層及導電金屬塊,所述導電墊形成於基底的一表面,所述介電層壓合於基底具有導電墊的一側,所述介電層具有遠離基底的第一表面,在介電層內形成有與導電墊對應開孔,所述開孔為階梯孔,每個所述開孔包括相互連接的第一孔段和第二孔段,第一孔段與導電墊相鄰,第二孔段與第一表面相鄰,第二孔段的孔徑大於第一孔段的孔徑,導電金屬塊形成於開孔內,並完全填充所述開孔。A circuit board comprising a substrate, a conductive pad, a dielectric layer and a conductive metal block, the conductive pad being formed on a surface of the substrate, the dielectric laminate being bonded to a side of the substrate having a conductive pad, the dielectric The layer has a first surface away from the substrate, and an opening corresponding to the conductive pad is formed in the dielectric layer, the opening is a stepped hole, and each of the openings comprises a first hole segment and a second hole segment connected to each other a first hole segment adjacent to the conductive pad, the second hole segment being adjacent to the first surface, the second hole segment having a larger aperture than the first hole segment, the conductive metal block being formed in the opening, and completely filling the hole Open the hole. 如請求項8所述的電路板,其中,所述導電金屬塊包括相互連接的連接部及承載部,所述連接部的位於所述第一孔段內,所述承載部位於第二孔段內,所述連接部連接於對應的導電墊與承載部之間,所述連接部的橫截面積小於承載部的橫截面積。The circuit board of claim 8, wherein the conductive metal block comprises a connecting portion and a bearing portion connected to each other, the connecting portion is located in the first hole segment, and the bearing portion is located in the second hole segment The connecting portion is connected between the corresponding conductive pad and the carrying portion, and the connecting portion has a cross-sectional area smaller than a cross-sectional area of the carrying portion. 如請求項8所述的電路板,其中,每個導電金屬塊具有遠離對應導電墊的端面,所述端面與第一表面平齊。The circuit board of claim 8, wherein each of the conductive metal blocks has an end surface remote from the corresponding conductive pad, the end surface being flush with the first surface. 如請求項10所述的電路板,其中,所述端面形成有表面處理層。
The circuit board of claim 10, wherein the end surface is formed with a surface treatment layer.
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