CN103857197A - Circuit board and manufacturing method of circuit board - Google Patents
Circuit board and manufacturing method of circuit board Download PDFInfo
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- CN103857197A CN103857197A CN201210511978.5A CN201210511978A CN103857197A CN 103857197 A CN103857197 A CN 103857197A CN 201210511978 A CN201210511978 A CN 201210511978A CN 103857197 A CN103857197 A CN 103857197A
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Abstract
一种电路板,其包括基底、导电垫、介电层及导电金属块,所述导电垫形成于基底的一表面,所述介电层压合于基底具有导电垫的一侧,所述介电层具有远离基底的第一表面,在介电层内形成有与导电垫对应开孔,所述开孔为阶梯孔,每个所述开孔包括相互连接的第一孔段和第二孔段,第一孔段与导电垫相邻,第二孔段与第一表面相邻,第二孔段的孔径大于第一孔段的孔径,导电金属块形成于开孔内,并完全填充所述开孔。本发明还提供一种所述电路板的制作方法。
A circuit board, which includes a base, a conductive pad, a dielectric layer and a conductive metal block, the conductive pad is formed on a surface of the base, the dielectric layer is pressed on the side of the base with the conductive pad, the dielectric The electrical layer has a first surface away from the substrate, and openings corresponding to the conductive pads are formed in the dielectric layer, the openings are stepped holes, and each opening includes a first hole segment and a second hole connected to each other Section, the first hole section is adjacent to the conductive pad, the second hole section is adjacent to the first surface, the aperture of the second hole section is larger than the aperture of the first hole section, and the conductive metal block is formed in the opening and completely fills the hole. Describe the opening. The invention also provides a manufacturing method of the circuit board.
Description
技术领域 technical field
本发明涉及电路板制作技术领域,尤其涉及一种电路板及其制作方法。 The invention relates to the technical field of circuit board production, in particular to a circuit board and a production method thereof.
背景技术 Background technique
采用倒装芯片球栅格阵列(FCBGA)进行封装芯片的电路板,通常需要制作阵列排布的多个导电凸块结构,以用于承载锡球。所述导电凸块需要贯穿防焊层并与对应的导电线路相互电连接。现有技术中,通常采用在所述导电线路上形成对应的防焊层开口,然后在防焊层上形成电镀阻挡层,并在电镀阻挡层中形成与防焊层开口对应的电镀阻挡层。由于防焊层开口和电镀阻挡层开口均需要显影形成,并且需要相互连通,在制作过程中需要对应的电镀阻挡层开口与防焊层开口进行对位。之后,在防焊层的开口内化学镀然后电镀的方式形成导电凸块。最后,去除电镀阻挡层,得到凸出于防焊层的导电凸块。在上述的制作方法中,需要将防焊层开口制作的相对较大,以便于显影形成电镀阻挡层开口时进行对位。并且,由于形成的导电凸块与防焊层相互接触,且接触面积较小,从而容易导致导电凸块于防焊层相互分离,得到的电路板的信赖性较差。并且,这样的制作方法决定了制作的导电凸块结构的分布密度较小,不利于多个导电凸块结构密集分布。 A circuit board that uses a flip-chip ball grid array (FCBGA) to package chips usually needs to make a plurality of conductive bump structures arranged in an array for carrying solder balls. The conductive bumps need to penetrate through the solder resist layer and be electrically connected to corresponding conductive lines. In the prior art, it is common to form corresponding openings in the solder resist layer on the conductive lines, then form an electroplating barrier layer on the solder resist layer, and form an electroplating barrier layer corresponding to the openings in the solder resist layer in the electroplating barrier layer. Since both the openings of the solder resist layer and the openings of the electroplating barrier layer need to be developed and communicated with each other, the corresponding openings of the electroplating barrier layer and the openings of the solder resist layer need to be aligned during the manufacturing process. Afterwards, conductive bumps are formed in the openings of the solder resist layer by means of electroless plating and then electroplating. Finally, the electroplating barrier layer is removed to obtain conductive bumps protruding from the solder resist layer. In the above manufacturing method, the opening of the solder resist layer needs to be made relatively large, so as to facilitate the alignment when developing and forming the opening of the electroplating barrier layer. Moreover, since the formed conductive bumps and the solder resist layer are in contact with each other, and the contact area is small, the conductive bumps and the solder resist layer are easily separated from each other, and the reliability of the obtained circuit board is poor. Moreover, such a manufacturing method determines that the distribution density of the manufactured conductive bump structures is relatively small, which is not conducive to the dense distribution of multiple conductive bump structures.
发明内容 Contents of the invention
因此,有必要提供一种电路板及其制作方法,可以提高电路板的导电金属块的信赖性。 Therefore, it is necessary to provide a circuit board and a manufacturing method thereof, which can improve the reliability of the conductive metal block of the circuit board.
一种电路板的制作方法,包括步骤:提供电路基板,其包括基底及形成于基底一表面的导电垫;在所述电路基板具有导电垫的一侧压合介电层,所述介电层具有远离所述基底的第一表面;采用激光在介电层内形成多个与导电垫一一对应的多个开孔,每个所述开孔为阶梯孔,所述开孔包括相互连接的第一孔段和第二孔段,第一孔段与导电垫相邻,第二孔段与第一表面相邻,第二孔段的孔径大于第一孔段的孔径;以及在所述开孔内形成导电金属块,每个导电金属块与对应的导电垫相互电连接。 A method for manufacturing a circuit board, comprising the steps of: providing a circuit substrate, which includes a base and a conductive pad formed on one surface of the base; pressing a dielectric layer on the side of the circuit substrate with the conductive pad, the dielectric layer It has a first surface away from the base; a plurality of openings corresponding to the conductive pads are formed in the dielectric layer by using a laser, each of the openings is a stepped hole, and the openings include interconnected The first hole segment and the second hole segment, the first hole segment is adjacent to the conductive pad, the second hole segment is adjacent to the first surface, and the aperture of the second hole segment is larger than the aperture of the first hole segment; and in the opening Conductive metal blocks are formed in the holes, and each conductive metal block is electrically connected to a corresponding conductive pad.
一种电路板,其包括基底、导电垫、介电层及导电金属块,所述导电垫形成于基底的一表面,所述介电层压合于基底具有导电垫的一侧,所述介电层具有远离基底的第一表面,在介电层内形成有与导电垫对应开孔,所述开孔为阶梯孔,每个所述开孔包括相互连接的第一孔段和第二孔段,第一孔段与导电垫相邻,第二孔段与第一表面相邻,第二孔段的孔径大于第一孔段的孔径,导电金属块形成于开孔内,并完全填充所述开孔。 A circuit board, which includes a base, a conductive pad, a dielectric layer and a conductive metal block, the conductive pad is formed on a surface of the base, the dielectric layer is pressed on the side of the base with the conductive pad, the dielectric The electrical layer has a first surface away from the substrate, and openings corresponding to the conductive pads are formed in the dielectric layer, the openings are stepped holes, and each opening includes a first hole segment and a second hole connected to each other segment, the first hole segment is adjacent to the conductive pad, the second hole segment is adjacent to the first surface, the aperture of the second hole segment is larger than the aperture of the first hole segment, and the conductive metal block is formed in the opening and completely fills the Describe the opening.
与现有技术相比,本技术方案提供的电路板及其制作方法,由于导电金属块形成于介电层内,且介电层内的用于收容导电金属块的开孔为阶梯孔。相比于现有技术中,在防焊层中形成开口,然后形成凸出于防焊层表面金属凸块,可以增加导电金属块与介电层的接触面积。相比于防焊层,介电层与金属的结合能力优于防焊层与金属的结合能力。因此,本技术方案提供的电路板的信赖性较好。 Compared with the prior art, in the circuit board and its manufacturing method provided by the technical solution, the conductive metal blocks are formed in the dielectric layer, and the openings in the dielectric layer for accommodating the conductive metal blocks are stepped holes. Compared with the prior art, forming an opening in the solder resist layer and then forming a metal bump protruding from the surface of the solder resist layer can increase the contact area between the conductive metal block and the dielectric layer. Compared with the solder mask layer, the bonding ability of the dielectric layer to the metal is better than that of the solder mask layer to the metal. Therefore, the reliability of the circuit board provided by the technical solution is better.
附图说明 Description of drawings
图1是本技术方案实施例提供的电路基板的剖面示意图。 FIG. 1 is a schematic cross-sectional view of a circuit substrate provided by an embodiment of the technical solution.
图2是图1的电路基板一侧压合介电层后的剖面示意图。 FIG. 2 is a schematic cross-sectional view of one side of the circuit substrate in FIG. 1 after lamination of a dielectric layer.
图3是在图2的介电层中形成开孔后的剖面示意图。 FIG. 3 is a schematic cross-sectional view after openings are formed in the dielectric layer of FIG. 2 .
图4是图3的介电层表面及开孔内壁形成金属种子层后的剖面示意图。 FIG. 4 is a schematic cross-sectional view of the surface of the dielectric layer and the inner wall of the opening in FIG. 3 after a metal seed layer is formed.
图5是在图4的金属种子层表面形成电镀金属材料后的剖面示意图。 FIG. 5 is a schematic cross-sectional view after forming an electroplated metal material on the surface of the metal seed layer in FIG. 4 .
图6是本技术方案提供的电路板的剖面示意图。 Fig. 6 is a schematic cross-sectional view of the circuit board provided by the technical solution.
图7是在图6的电路板的导电金属块表面形成表面处理层后的剖面示意图。 FIG. 7 is a schematic cross-sectional view after forming a surface treatment layer on the surface of the conductive metal block of the circuit board in FIG. 6 .
主要元件符号说明 Description of main component symbols
如下具体实施方式将结合上述附图进一步说明本发明。 The following specific embodiments will further illustrate the present invention in conjunction with the above-mentioned drawings.
具体实施方式 Detailed ways
本技术方案提供的电路板制作方法包括如下步骤: The circuit board manufacturing method provided by the technical solution includes the following steps:
第一步,请参阅图1,提供电路基板110。
The first step, please refer to FIG. 1 , is to provide a
所述电路基板110包括基底111及多个导电垫112。
The
电路基板110可以为单层电路基板也可以为多层电路基板。当电路基板110为单层电路基板时,基底111为单层的介电层。当电路基板110为多层电路基板时,基底111可以为多层导电线路层及多层介电层交替层叠的结构。多个导电垫112与基底111的一层介电层相接触。本实施例中,基底111的一表面形成有导电线路层113,导电线路层113包括多个导电垫112及多根导电线路(图未示)。
The
第二步,请参阅图2,在电路基板110的多个导电垫112表面及从导电线路层113露出的基底111的表面形成介电层120。
The second step, please refer to FIG. 2 , is to form a
本步骤中,介电层120通过压合的方式形成于多个导电垫112表面及从导电垫112露出的基底111,使得介电层120完全覆盖导电线路层113。介电层120具有远离基底111的第一表面122。
In this step, the
第三步,请参阅图3,采用激光在介电层120内形成有多个开孔121,每个开孔121与一个导电垫112相互对应,每个导电垫112从对应的开孔121露出。
The third step, referring to FIG. 3 , is to use a laser to form a plurality of
本步骤中,采用准分子激光形成开孔121。开孔121呈阶梯状。开孔121包括相互连通的第一孔段1211和第二孔段1212。第一孔段1211与导电垫112相邻,第二孔段1212靠近第一表面122。其中,第一孔段1211的孔径小于第二孔段1212的孔径。优选地,第一孔段1211与第二孔段1212同轴设置。由于开孔121采用激光形成,第一孔段1211及第二孔段1212的纵截面均为倒梯形。在第一孔段1211和第二孔段1212的连接处,形成有连接面1213,所述连接面1213从第二孔段1212一侧露出,所述连接面1213大致平行于第一表面122。
In this step, an excimer laser is used to form the
由于开孔121采用准分子激光形成,在形成准分子激光时,可以通过控制不同位置的激光的能量,即位于开孔121中心区域,采用较大的能量,使得介电层120被完全贯穿,同时形成第一孔段1211和第二孔段1212。在外绕中心区域的边缘区域,采用较小的激光能量,使得仅部分的介电层120被烧蚀去除,仅形成第二孔段1212,从而得到阶梯形状的开孔121。
Since the
第四步,请参阅图4至图6,在每个开孔121内形成导电金属块150,得到电路板100。
In the fourth step, referring to FIGS. 4 to 6 , a
本步骤具体为: This step is specifically:
首先,在开孔121的内壁及介电层120的第一表面122形成金属种子层130。
First, the
所述金属种子层130可以采用化学镀金属的方式形成。如化学镀铜的方式形成。当然,金属种子层130也可以采用黑影等方式,使得开孔121的内壁及介电层120的表面形成金属种子层130。
The
然后,通过电镀的方式,在金属种子层130表面形成电镀金属材料140,使得所述开孔121被完全填充。
Then, an
本步骤中,电镀的金属材料可以为铜、银等。本实施例中,电镀金属材料140完全填充开孔121,并形成在介电层120的第一表面122的金属种子层130的表面。
In this step, the metal material for electroplating may be copper, silver or the like. In this embodiment, the
最后,去除介电层120的第一表面122的电镀金属材料140及金属种子层130,位于开孔121内的电镀金属材料140及金属种子层130形成导电金属块150,从而得到电路板100。
Finally, the electroplated
本步骤中,可以采用化学蚀刻的方式去除介电层120的第一表面122的电镀金属材料140及金属种子层130。通过控制蚀刻的时间,使得开孔121内的电镀金属材料140及金属种子层130仍留在开孔121内形成导电金属块150。导电金属块150具有远离导电垫112的端面151。所述端面151与第一表面122平齐。
In this step, the electroplated
导电金属块150包括相互连接的连接部152及承载部153。所述连接部152的位于所述第一孔段1211内,所述承载部153位于第二孔段1212内。连接部152的形状与第一孔段1211的形状相对应,承载部153的形状与第二孔段1212的形状相对应。所述连接部152电连接导电垫112及承载部153,承载部153用于与其他元件进行焊接。连接部152及承载部153均为倒圆台形,连接部152的横截面积小于承载部153的横截面积。
The
请参阅图7,本技术方案提供的电路板制作方法,还可以包括在端面151形成表面处理层160的步骤。所述表面处理层160可以为有机保焊层,也可以为镍金镀层等,以保护导电金属块150。
Please refer to FIG. 7 , the circuit board manufacturing method provided by this technical solution may further include a step of forming a
请参阅图6及图7,本技术方案还提供一种采用上述方法制得的电路板100,所述电路板100包括基底111、导电垫112、介电层120及导电金属块150。
Please refer to FIG. 6 and FIG. 7 , the technical solution also provides a
所述导电垫112形成于基底111的一表面。所述介电层120压合于基底111具有导电垫112的一侧。在介电层120内形成有开孔121,开孔121为阶梯孔。所述介电层120具有远离基底111的第一表面122。导电金属块150形成于开孔121内,并与对应的导电垫112相互电连接。导电金属块150具有远离对应的导电垫112的端面151,端面151与介电层120的第一表面122平齐。
The
导电金属块150包括相互连接的连接部152及承载部153。所述连接部152的位于所述第一孔段1211内,所述承载部153位于第二孔段1212内。连接部152的形状与第一孔段1211的形状相对应,承载部153的形状与第二孔段1212的形状相对应。所述连接部152电连接导电垫112及承载部153,承载部153用于与其他元件进行焊接。连接部152及承载部153均为倒圆台形,连接部152的横截面积小于承载部153的横截面积。
The
导电金属块150由与开孔121的内壁相接触的金属种子层130及形成于金属种子层130表面的电镀金属材料140组成。
The
进一步的,在每个导电金属块150的端面151还形成有表面处理层160,以保护导电金属块150。
Further, a
本技术方案提供的电路板及其制作方法,由于导电金属块150形成于介电层120内,且介电层120内的用于收容导电金属块150的开孔121为阶梯孔。相比于现有技术中,在防焊层中形成开口,然后形成凸出于防焊层表面金属凸块,可以增加导电金属块150与介电层120的接触面积。相比于防焊层,介电层与金属的结合能力优于防焊层与金属的结合能力。因此,本技术方案提供的电路板的信赖性较好。
In the circuit board and its manufacturing method provided by this technical solution, the
并且,介电层中的开孔采用一次激光烧蚀形成,从而可以形成比较密集分布的开孔,近而可以形成比较密集分布的导电金属块,提高电路板的布线密度。 In addition, the openings in the dielectric layer are formed by laser ablation once, so that densely distributed openings can be formed, and relatively densely distributed conductive metal blocks can be formed to increase the wiring density of the circuit board.
可以理解的是,对于本领域的普通技术人员来说,可以根据本发明的技术构思做出其它各种相应的改变与变形,而所有这些改变与变形都应属于本发明权利要求的保护范围。 It can be understood that those skilled in the art can make various other corresponding changes and modifications according to the technical concept of the present invention, and all these changes and modifications should belong to the protection scope of the claims of the present invention.
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| CN107689358A (en) * | 2016-08-04 | 2018-02-13 | 胡迪群 | Metal pad structure |
| CN107808859A (en) * | 2016-09-09 | 2018-03-16 | 思鹭科技股份有限公司 | Semiconductor structure |
| CN111212527A (en) * | 2020-01-15 | 2020-05-29 | 广东科翔电子科技股份有限公司 | Through hole filling and plating method applied to optical module high-density interconnection HDI board |
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| TWI239594B (en) * | 2004-10-06 | 2005-09-11 | Advanced Semiconductor Eng | Redistribution layer structure of a wafer and the fabrication method thereof |
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Also Published As
| Publication number | Publication date |
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| TW201424497A (en) | 2014-06-16 |
| TWI463931B (en) | 2014-12-01 |
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