SE522682C2 - Jodoniumsalter som fotoinitiatorer, belagt substrat, fotoresist och förening innefattande salterna och användning av salterna samt förfarande för fotopolymerisation för framställning av reliefbilder och vid framställning av ytbeläggningskompositioner - Google Patents

Jodoniumsalter som fotoinitiatorer, belagt substrat, fotoresist och förening innefattande salterna och användning av salterna samt förfarande för fotopolymerisation för framställning av reliefbilder och vid framställning av ytbeläggningskompositioner

Info

Publication number: SE522682C2
Authority: SE; Sweden
Prior art keywords: acid; compounds; alkyl; compound; groups
Prior art date: 1999-12-21

Application number

SE0004681A

Other languages

English (en)

Swedish (sv)

Other versions

SE0004681D0 (sv

SE0004681L (sv

Inventor

Hitoshi Yamato

Jean-Luc Birbaum

Jean-Pierre Wolf

Reinhard Schulz

Stephan Ilg

Toshikage Asakura

Original Assignee

Ciba Sc Holding Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1999-12-21

Filing date

2000-12-18

Publication date

2004-02-24

2000-12-18 Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag

2000-12-18 Publication of SE0004681D0 publication Critical patent/SE0004681D0/xx

2001-07-09 Publication of SE0004681L publication Critical patent/SE0004681L/xx

2004-02-24 Publication of SE522682C2 publication Critical patent/SE522682C2/sv

Links

150000001875 compounds Chemical class 0.000 title claims abstract description 158
229920002120 photoresistant polymer Polymers 0.000 title claims description 47
238000000034 method Methods 0.000 title claims description 34
239000000758 substrate Substances 0.000 title claims description 33
238000002360 preparation method Methods 0.000 title claims description 17
230000008569 process Effects 0.000 title claims description 14
239000008199 coating composition Substances 0.000 title claims description 11
XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 title description 20
150000003839 salts Chemical class 0.000 title description 10
239000000203 mixture Substances 0.000 claims abstract description 182
239000002253 acid Substances 0.000 claims abstract description 126
230000005855 radiation Effects 0.000 claims abstract description 38
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 25
229910052739 hydrogen Inorganic materials 0.000 claims abstract description 21
125000004432 carbon atom Chemical group C* 0.000 claims abstract description 16
150000001450 anions Chemical class 0.000 claims abstract description 14
150000002367 halogens Chemical group 0.000 claims abstract description 14
229910052736 halogen Inorganic materials 0.000 claims abstract description 13
239000001257 hydrogen Substances 0.000 claims abstract description 13
230000009471 action Effects 0.000 claims abstract description 12
MIOPJNTWMNEORI-UHFFFAOYSA-N camphorsulfonic acid Chemical compound C1CC2(CS(O)(=O)=O)C(=O)CC1C2(C)C MIOPJNTWMNEORI-UHFFFAOYSA-N 0.000 claims abstract description 12
125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims abstract description 7
229910052740 iodine Inorganic materials 0.000 claims abstract description 6
ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims abstract description 5
125000005520 diaryliodonium group Chemical group 0.000 claims abstract description 5
230000000269 nucleophilic effect Effects 0.000 claims abstract description 5
229920000642 polymer Polymers 0.000 claims description 79
229920001577 copolymer Polymers 0.000 claims description 62
229920005989 resin Polymers 0.000 claims description 58
239000011347 resin Substances 0.000 claims description 58
125000000217 alkyl group Chemical group 0.000 claims description 54
238000000576 coating method Methods 0.000 claims description 47
238000006243 chemical reaction Methods 0.000 claims description 34
GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims description 29
QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims description 28
238000004519 manufacturing process Methods 0.000 claims description 28
239000004593 Epoxy Substances 0.000 claims description 26
NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 25
229920000877 Melamine resin Polymers 0.000 claims description 25
239000000976 ink Substances 0.000 claims description 25
238000004132 cross linking Methods 0.000 claims description 23
239000000463 material Substances 0.000 claims description 20
150000002148 esters Chemical class 0.000 claims description 19
125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 17
125000000524 functional group Chemical group 0.000 claims description 16
238000007639 printing Methods 0.000 claims description 15
SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 12
239000000975 dye Substances 0.000 claims description 12
125000003545 alkoxy group Chemical group 0.000 claims description 10
125000000753 cycloalkyl group Chemical group 0.000 claims description 9
239000000853 adhesive Substances 0.000 claims description 8
230000001070 adhesive effect Effects 0.000 claims description 8
SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical class [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 claims description 8
239000000843 powder Substances 0.000 claims description 8
150000008052 alkyl sulfonates Chemical class 0.000 claims description 7
125000005228 aryl sulfonate group Chemical group 0.000 claims description 7
239000012965 benzophenone Substances 0.000 claims description 7
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
230000000181 anti-adherent effect Effects 0.000 claims description 5
RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 5
150000002431 hydrogen Chemical class 0.000 claims description 5
238000006116 polymerization reaction Methods 0.000 claims description 5
MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims description 4
238000010894 electron beam technology Methods 0.000 claims description 4
YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 claims description 4
125000005396 acrylic acid ester group Chemical group 0.000 claims description 3
FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 3
150000002921 oxetanes Chemical class 0.000 claims description 3
125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
229910018286 SbF 6 Inorganic materials 0.000 claims description 2
239000003086 colorant Substances 0.000 claims description 2
229920003145 methacrylic acid copolymer Polymers 0.000 claims description 2
238000003384 imaging method Methods 0.000 claims 1
229940117841 methacrylic acid copolymer Drugs 0.000 claims 1
-1 C1-C12alkyl Chemical group 0.000 abstract description 208
125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 abstract description 4
125000004435 hydrogen atom Chemical group [H]* 0.000 abstract description 4
125000004642 (C1-C12) alkoxy group Chemical group 0.000 abstract 2
125000004641 (C1-C12) haloalkyl group Chemical group 0.000 abstract 1
150000001732 carboxylic acid derivatives Chemical class 0.000 description 131
229920000180 alkyd Polymers 0.000 description 62
238000009472 formulation Methods 0.000 description 38
239000000178 monomer Substances 0.000 description 35
125000002887 hydroxy group Chemical group [H]O* 0.000 description 32
ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 30
NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 30
125000004185 ester group Chemical group 0.000 description 30
239000000243 solution Substances 0.000 description 23
IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 22
239000011248 coating agent Substances 0.000 description 22
239000010410 layer Substances 0.000 description 22
VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 22
PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 21
OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 21
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 21
238000001723 curing Methods 0.000 description 21
150000001252 acrylic acid derivatives Chemical class 0.000 description 20
VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 20
239000011976 maleic acid Substances 0.000 description 20
ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 20
229920005862 polyol Polymers 0.000 description 20
TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 18
230000005540 biological transmission Effects 0.000 description 18
239000002904 solvent Substances 0.000 description 18
FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 17
FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 17
CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 17
229920000647 polyepoxide Polymers 0.000 description 17
239000000600 sorbitol Substances 0.000 description 17
125000001931 aliphatic group Chemical group 0.000 description 16
239000011230 binding agent Substances 0.000 description 16
238000010438 heat treatment Methods 0.000 description 16
229920003986 novolac Polymers 0.000 description 16
150000003077 polyols Chemical class 0.000 description 16
LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 15
239000000654 additive Substances 0.000 description 15
MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 15
229910052751 metal Inorganic materials 0.000 description 15
239000002184 metal Substances 0.000 description 15
239000003921 oil Substances 0.000 description 15
235000019198 oils Nutrition 0.000 description 15
229960000834 vinyl ether Drugs 0.000 description 15
FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 14
229940052303 ethers for general anesthesia Drugs 0.000 description 14
239000012948 isocyanate Substances 0.000 description 14
239000000049 pigment Substances 0.000 description 14
229920000728 polyester Polymers 0.000 description 14
239000007787 solid Substances 0.000 description 14
150000007513 acids Chemical class 0.000 description 13
239000003112 inhibitor Substances 0.000 description 13
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 13
229910052757 nitrogen Inorganic materials 0.000 description 13
LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 13
XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 12
YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 12
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
150000002170 ethers Chemical class 0.000 description 12
229920002635 polyurethane Polymers 0.000 description 12
239000004814 polyurethane Substances 0.000 description 12
150000001241 acetals Chemical class 0.000 description 11
125000003277 amino group Chemical group 0.000 description 11
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238000011161 development Methods 0.000 description 11
125000006239 protecting group Chemical group 0.000 description 11
125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 11
229920002554 vinyl polymer Polymers 0.000 description 11
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 10
239000003513 alkali Substances 0.000 description 10
238000001035 drying Methods 0.000 description 10
150000002513 isocyanates Chemical class 0.000 description 10
JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 10
229920000570 polyether Polymers 0.000 description 10
229920001228 polyisocyanate Polymers 0.000 description 10
239000005056 polyisocyanate Substances 0.000 description 10
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UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 9
YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 9
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238000012360 testing method Methods 0.000 description 9
GBXQPDCOMJJCMJ-UHFFFAOYSA-M trimethyl-[6-(trimethylazaniumyl)hexyl]azanium;bromide Chemical compound [Br-].C[N+](C)(C)CCCCCC[N+](C)(C)C GBXQPDCOMJJCMJ-UHFFFAOYSA-M 0.000 description 9
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
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150000001491 aromatic compounds Chemical class 0.000 description 8
125000004122 cyclic group Chemical group 0.000 description 8
239000003822 epoxy resin Substances 0.000 description 8
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WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 8
229920001568 phenolic resin Polymers 0.000 description 8
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GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 8
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WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 8
CIZFAASMIWNDTR-UHFFFAOYSA-N (4-methylphenyl)-[4-(2-methylpropyl)phenyl]iodanium Chemical compound C1=CC(CC(C)C)=CC=C1[I+]C1=CC=C(C)C=C1 CIZFAASMIWNDTR-UHFFFAOYSA-N 0.000 description 7
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239000004721 Polyphenylene oxide Substances 0.000 description 7
XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 7
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
229940106691 bisphenol a Drugs 0.000 description 7
229910052799 carbon Inorganic materials 0.000 description 7
239000003054 catalyst Substances 0.000 description 7
150000002009 diols Chemical class 0.000 description 7
238000005516 engineering process Methods 0.000 description 7
LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 7
IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 7
239000002609 medium Substances 0.000 description 7
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238000005809 transesterification reaction Methods 0.000 description 7
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 7
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230000004913 activation Effects 0.000 description 6
238000007259 addition reaction Methods 0.000 description 6
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150000001299 aldehydes Chemical class 0.000 description 6
150000008064 anhydrides Chemical class 0.000 description 6
239000002585 base Substances 0.000 description 6
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150000002118 epoxides Chemical class 0.000 description 6
LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 6
125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 6
RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
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239000005011 phenolic resin Substances 0.000 description 6
230000036211 photosensitivity Effects 0.000 description 6
239000003504 photosensitizing agent Substances 0.000 description 6
XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 6
125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 6
WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 6
150000003254 radicals Chemical class 0.000 description 6
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239000004094 surface-active agent Substances 0.000 description 6
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JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 6
ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 6
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239000011495 polyisocyanurate Substances 0.000 description 1
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HPBNICVODIHXKB-UHFFFAOYSA-N tert-butyl 4-ethenylbenzoate Chemical compound CC(C)(C)OC(=O)C1=CC=C(C=C)C=C1 HPBNICVODIHXKB-UHFFFAOYSA-N 0.000 description 1
XKXIQBVKMABYQJ-UHFFFAOYSA-N tert-butyl hydrogen carbonate Chemical group CC(C)(C)OC(O)=O XKXIQBVKMABYQJ-UHFFFAOYSA-N 0.000 description 1
150000005621 tetraalkylammonium salts Chemical class 0.000 description 1
229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
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239000004753 textile Substances 0.000 description 1
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239000004416 thermosoftening plastic Substances 0.000 description 1
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239000002562 thickening agent Substances 0.000 description 1
JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
239000004408 titanium dioxide Substances 0.000 description 1
231100000331 toxic Toxicity 0.000 description 1
230000002588 toxic effect Effects 0.000 description 1
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150000003624 transition metals Chemical class 0.000 description 1
HFFLGKNGCAIQMO-UHFFFAOYSA-N trichloroacetaldehyde Chemical compound ClC(Cl)(Cl)C=O HFFLGKNGCAIQMO-UHFFFAOYSA-N 0.000 description 1
125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
LGMUVWLDYISOQX-UHFFFAOYSA-N trimethyl(2-phenylethenoxy)silane Chemical compound C[Si](C)(C)OC=CC1=CC=CC=C1 LGMUVWLDYISOQX-UHFFFAOYSA-N 0.000 description 1
BBVLBQPCBBGYHH-UHFFFAOYSA-N trimethyl-[2-(3-prop-1-enylphenoxy)propan-2-yloxy]silane Chemical compound CC=CC1=CC=CC(OC(C)(C)O[Si](C)(C)C)=C1 BBVLBQPCBBGYHH-UHFFFAOYSA-N 0.000 description 1
150000004072 triols Chemical class 0.000 description 1
AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
XHGIFBQQEGRTPB-UHFFFAOYSA-N tris(prop-2-enyl) phosphate Chemical compound C=CCOP(=O)(OCC=C)OCC=C XHGIFBQQEGRTPB-UHFFFAOYSA-N 0.000 description 1
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
229910052721 tungsten Inorganic materials 0.000 description 1
239000010937 tungsten Substances 0.000 description 1
235000013799 ultramarine blue Nutrition 0.000 description 1
238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
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150000003673 urethanes Chemical class 0.000 description 1
235000015112 vegetable and seed oil Nutrition 0.000 description 1
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LVLANIHJQRZTPY-UHFFFAOYSA-N vinyl carbamate Chemical group NC(=O)OC=C LVLANIHJQRZTPY-UHFFFAOYSA-N 0.000 description 1
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239000001993 wax Substances 0.000 description 1
229910052724 xenon Inorganic materials 0.000 description 1
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Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C25/00—Compounds containing at least one halogen atom bound to a six-membered aromatic ring
- C07C25/18—Polycyclic aromatic halogenated hydrocarbons
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/08—Saturated oxiranes
- C08G65/10—Saturated oxiranes characterised by the catalysts used
- C08G65/105—Onium compounds
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic

Landscapes

Physics & Mathematics (AREA)
Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Chemical Kinetics & Catalysis (AREA)
Health & Medical Sciences (AREA)
Medicinal Chemistry (AREA)
Polymers & Plastics (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Materials For Photolithography (AREA)
Epoxy Resins (AREA)
Polymerization Catalysts (AREA)
Medicinal Preparation (AREA)

SE0004681A 1999-12-21 2000-12-18 Jodoniumsalter som fotoinitiatorer, belagt substrat, fotoresist och förening innefattande salterna och användning av salterna samt förfarande för fotopolymerisation för framställning av reliefbilder och vid framställning av ytbeläggningskompositioner SE522682C2 (sv)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
CH234399		1999-12-21

Publications (3)

Publication Number	Publication Date
SE0004681D0 SE0004681D0 (sv)	2000-12-18
SE0004681L SE0004681L (sv)	2001-07-09
SE522682C2 true SE522682C2 (sv)	2004-02-24

Family

ID=4231594

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BE (1)	BE1013871A3 (fi)
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- 2000-12-15 IT IT2000MI002715A patent/IT1319694B1/it active
- 2000-12-18 US US09/740,205 patent/US6306555B1/en not_active Expired - Lifetime
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Publication number	Publication date
JP4966446B2 (ja)	2012-07-04
TWI225183B (en)	2004-12-11
DK176764B1 (da)	2009-07-06
FR2802539B1 (fr)	2004-06-11
CA2328819A1 (en)	2001-06-21
CZ20004772A3 (cs)	2001-08-15
SE0004681D0 (sv)	2000-12-18
IT1319694B1 (it)	2003-10-23
FR2802539A1 (fr)	2001-06-22
BR0006227B1 (pt)	2009-08-11
NL1016959A1 (nl)	2001-06-25
AU7245900A (en)	2001-06-28
NL1016959C2 (nl)	2002-08-27
BE1013871A3 (fr)	2002-11-05
CA2328819C (en)	2008-11-04
AU778995B2 (en)	2004-12-23
SE0004681L (sv)	2001-07-09
CN1306224A (zh)	2001-08-01
MY120646A (en)	2005-11-30
CN1213343C (zh)	2005-08-03
KR20010082594A (ko)	2001-08-30
DE10063066B4 (de)	2010-11-11
FI20002767A0 (fi)	2000-12-18
SG98433A1 (en)	2003-09-19
GB2357759A (en)	2001-07-04
FI20002767L (fi)	2001-06-22
US20010036591A1 (en)	2001-11-01
DE10063066A1 (de)	2001-06-13
GB2357759A8 (en)	2001-07-11
DK200001910A (da)	2001-06-22
GB2357759B (en)	2002-02-20
JP2001181221A (ja)	2001-07-03
AT413103B (de)	2005-11-15
ITMI20002715A1 (it)	2002-06-15
US6306555B1 (en)	2001-10-23
CZ299309B6 (cs)	2008-06-11
BR0006227A (pt)	2002-07-30
ES2181563A1 (es)	2003-02-16
ATA112001A (de)	2005-04-15
GB0030716D0 (en)	2001-01-31
KR100753350B1 (ko)	2007-08-30
ES2181563B1 (es)	2004-04-01

Publication	Publication Date	Title
DK176764B1 (da)	2009-07-06	Strålingsfölsom sammensætning indeholdende et diaryliodoniumsalt, anvendelse af et diaryliodoniumsalt som fotolatent syredonor, fremgangsmåde til polymerisation eller tværbinding, overtrukket substrat, fremgangsmåde til fremstilling af reliefbilleder,
US7901867B2 (en)	2011-03-08	Sulphonium salt initiators
JP5721630B2 (ja)	2015-05-20	スルホニウム誘導体および潜在酸としてのその使用
CN102026967B (zh)	2013-09-18	锍盐引发剂
CN107207456B (zh)	2021-05-04	潜酸及其用途
KR20100074261A (ko)	2010-07-01	술포늄 염 개시제
CH694562A5 (de)	2005-03-31	Iodoniumsalze als latente Säurespender.

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