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KR970704664A - 2,6-디니트로벤질기를 기재로하는 양성 광합성 화합물(positive photoactive compounds based on 2,6-dinitrobenzyl groups) - Google Patents

2,6-디니트로벤질기를 기재로하는 양성 광합성 화합물(positive photoactive compounds based on 2,6-dinitrobenzyl groups) Download PDF

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KR970704664A
KR970704664A KR1019970700170A KR19970700170A KR970704664A KR 970704664 A KR970704664 A KR 970704664A KR 1019970700170 A KR1019970700170 A KR 1019970700170A KR 19970700170 A KR19970700170 A KR 19970700170A KR 970704664 A KR970704664 A KR 970704664A
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dinitro
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찰스 에프 2세 카알
네일 디 멕머디
라파엘 오 콜라
다니엘 이 라르돈
그레고리 제이 맥콜럼
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리타 버그스트롬
피피지 인더스트리즈 인코포레이티드
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Abstract

광활성 화합물은 2,5- 또는 2,6-디니트로벤질기로부터 합성된다. 또한 본 발명은 2,5- 또는 2,6-디니트로벤질기를 함유하는 반응성 단량체를 합성하는 방법에 관한 것이다.

Description

2.6-디니트로벤질기를 기재로하는 양성 광활성 화합물(POSITIVE PHOTOACTIVE COMPOUNDS BASED ON 2,6-DINITROBENZYL GROUPS)
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (20)

  1. 하기 구조를 포함하는 광활성 화합물:
    상기 식에서, X 및 Y는 할로겐, -OH, -OR, -O-SO2R, -SR 및 -NRR'로 이루어지는 그룹으로부터 선택되는 동일하거나 다른 구성원일 수 있고; R 및 R'는 수소 또는 치환되거나 미치환된 알킬, 아릴 또는 아르알킬 치환제이다.
  2. 제1항에 있어서, X 및 Y가 할로겐 및 하이드록실기로 이루어지는 그룹으로부터 선택되는 화합물.
  3. 제2항에 있어서, X 및 Y가 동일한 화합물.
  4. 제2항에 있어서, X 및 Y가 서로 다른 화합물.
  5. 제2항에 있어서, X 및 Y가 할로겐인 화합물.
  6. 제5항에 있어서, X 및 Y가 염화물인 화합물.
  7. 제1항에 있어서, X 및 Y가 하이드록실기인 화합물.
  8. 제1항에 있어서, R이 반응기를 포함하는 화합물.
  9. 제1항에 있어서, 하나 이상의 X 및 Y가 우레탄, 카보네이트, 에스테르, 에테르, 아민 또는 설파이드인 화합물.
  10. 제1항에 있어서, 우레탄, 카보네이트, 에스테르, 에테르, 아민 또는 설파이드의 반복단위를 갖는 중합체를 포함하는 화합물.
  11. 제10항에 있어서, 제1항의 구조의 반복단위를 갖는 중합체를 포함하는 화합물.
  12. 제1항에 있어서, 2,6-디니트로 치환제를 갖고, X 및 Y가 염화물기인 화합물.
  13. 제1항에 있어서, 2,6-디니트로 치환제를 갖고, X 및 Y가 하이드록실기인 화합물.
  14. α,α'-디클로로크실렌을 제조하고; α,α'-디클로로크실렌을 질화하여 디니트로-비스(클로로메틸)벤젠을 형성하는 것을 포함함을 특징으로 하는 디니트로비스(클로로메틸)벤젠의 제조방법.
  15. (a) α,α'-디클로로크실렌을 질화하여 디니트로비스(클로로메틸)벤젠을 형성하고; (b) (a)의 생성물 또는 그의 유도체를 가수분해하여 디니트로비스(하이드록시메틸)벤젠을 형성하는 것을 포함함을 특징으로 하는 디니트로비스(하이드록시메틸)벤젠의 제조방법.
  16. 제4항에 있어서, 단계 (a)의 반응물이 α,α'-디클로로-p-크실렌이고, 단계 (b)의 생성물이 디니트로-1,4-비스(하이드록시메틸)벤젠인 방법.
  17. 하기 구조를 갖는 그룹들을 함유하는 광활성 화합물, 상기 광활성 화합물과 동일한 화합물 또는 다른 화합물인 염 형성기 그룹을 갖는 화합물 및 물을 포함함을 특징으로 하는 전착가능한 포토레지스트 조성물 :
    상기 식에서, X 및 Y는 할로겐, -OH, -OR, -O-SO2R, -SR 및 -NRR'로 이루어지는 그룹으로부터 선택되는 동일하거나 다른 구성원일 수 있고; R 및 R'는 수소 또는 치환되거나 미치환된 알킬, 아릴 또는 아르알킬 치환제이다.
  18. 제17항에 있어서, 상기 염 형성 그룹이 수성 매질중에서 음이온을 형성하는 포토레지스트 조성물.
  19. 제17항에 있어서, 상기 염 형성 그룹이 수성 매질중에서 양이온을 형성하는 포토레지스트 조성물.
  20. 제17항에 있어서, 상기 염 형성 그룹을 갖는 중합체가 에폭시-아민 수지를 포함하는 포토레지스트 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019970700170A 1994-07-13 1995-06-29 2,6-디니트로벤질기를 기재로하는 양성 광활성 화합물 KR100227061B1 (ko)

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KR1019997002616A KR100231955B1 (ko) 1994-07-13 1999-03-26 2,6-디니트로벤질기를 기재로한 광활성 중합체를 포함하는 포토레지스트 조성물

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US8/274,614 1994-07-13
US08/274,614 1994-07-13
US08/274,614 US5600035A (en) 1994-07-13 1994-07-13 Positive photoactive compounds based on 2,6-dinitro benzyl groups and 2,5-dinitro benzyl groups
PCT/US1995/008121 WO1996002491A1 (en) 1994-07-13 1995-06-29 Positive photoactive compounds based on 2,6-dinitrobenzyl groups

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KR1019997002616A KR100231955B1 (ko) 1994-07-13 1999-03-26 2,6-디니트로벤질기를 기재로한 광활성 중합체를 포함하는 포토레지스트 조성물

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CA2195014A1 (en) 1996-02-01
IL114504A0 (en) 1995-11-27
WO1996002491A1 (en) 1996-02-01
DE69511559T2 (de) 2000-05-04
MY118639A (en) 2004-12-31
ZA955686B (en) 1997-01-07
IL114504A (en) 1999-12-31
DE69511559D1 (de) 1999-09-23
KR100227061B1 (ko) 1999-10-15
EP0770053A1 (en) 1997-05-02
EP0770053B1 (en) 1999-08-18
MX9700349A (es) 1998-03-31
PE23796A1 (es) 1996-06-15
ATE183494T1 (de) 1999-09-15
ES2138219T3 (es) 2000-01-01
US5600035A (en) 1997-02-04
TW422943B (en) 2001-02-21
JPH09508139A (ja) 1997-08-19
TR199500850A2 (tr) 1996-10-21
KR100231955B1 (ko) 2000-03-15
GR3031802T3 (en) 2000-02-29
HK1009266A1 (en) 1999-05-28
AU2912295A (en) 1996-02-16
CA2195014C (en) 2001-12-04
DK0770053T3 (da) 2000-03-13
JP2871859B2 (ja) 1999-03-17
US5733479A (en) 1998-03-31

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