KR960030386A - 반도체 장치 - Google Patents
반도체 장치 Download PDFInfo
- Publication number
- KR960030386A KR960030386A KR1019960000776A KR19960000776A KR960030386A KR 960030386 A KR960030386 A KR 960030386A KR 1019960000776 A KR1019960000776 A KR 1019960000776A KR 19960000776 A KR19960000776 A KR 19960000776A KR 960030386 A KR960030386 A KR 960030386A
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor device
- oxide
- range
- weight ratio
- substrate
- Prior art date
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract 14
- 239000000919 ceramic Substances 0.000 claims abstract 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract 7
- 229910052802 copper Inorganic materials 0.000 claims abstract 7
- 239000010949 copper Substances 0.000 claims abstract 7
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract 5
- 230000017525 heat dissipation Effects 0.000 claims abstract 4
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract 4
- 229910001928 zirconium oxide Inorganic materials 0.000 claims abstract 4
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 claims abstract 3
- 239000000292 calcium oxide Substances 0.000 claims abstract 3
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims abstract 3
- 229910000420 cerium oxide Inorganic materials 0.000 claims abstract 3
- 239000000395 magnesium oxide Substances 0.000 claims abstract 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims abstract 3
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims abstract 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims abstract 3
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims abstract 3
- 239000000843 powder Substances 0.000 claims abstract 3
- 239000002994 raw material Substances 0.000 claims abstract 3
- 239000000654 additive Substances 0.000 claims 7
- 230000000996 additive effect Effects 0.000 claims 6
- 239000002245 particle Substances 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 238000005452 bending Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
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- H01L23/15—Ceramic or glass substrates
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- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
- C04B35/111—Fine ceramics
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- C04B35/119—Composites with zirconium oxide
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- H01L2224/484—Connecting portions
- H01L2224/4847—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
- H01L2224/48472—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
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- H01L2924/01322—Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
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- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
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- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
- H01L2924/13055—Insulated gate bipolar transistor [IGBT]
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- H01L2924/181—Encapsulation
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Abstract
Description
Claims (14)
- 리드 프레임을 갖는 절열수지제의 케이스 틀과, 상기 케이스 틀의 한쪽의 개구를 폐쇄하는 금속제의 방열 베이스와, 상기 방열 베이스의 내면에 고착되어 상기 리드 프레임의 내부 리드 선단에 접속되는 반도체 소자가 실장된 절열기판과, 상기 케이스 틀의 내부 공간에 충전되어 상기 절열 기판 및 상기 내부 리드를 침지하는 겔형 수지 말봉재와, 상기 케이스 틀의 다른쪽의 개구를 뚜껑으로 폐쇄하는 절열수지제의 뚜껑을 가지며, 상기 절열 기판이 절연성 세라믹 기판의 외면과 내면에 접합하여 맞붙인 박(箔)형의 동판으로 이루어진 반도체 장치에 있어서, 상기 절연성 세라믹 기판은 산화 알루미늄을 주성분으로 하여 산화지르코늄을 첨가하고, 이것에 산화이트륨, 산화칼슘, 산화마그네슘, 산화세륨으로 이루어지는 군(群)에서 선택된 1종류 이상의 첨가제를 첨가하여 제작된 세라믹 소성체로 이루어지는 것을 특징으로 하는 반도체 장치.
- 제1항에 있어서, 상기 산화 알루미늄의 중량비가 70% 이상 100% 미만의 범위에, 상기 산화지르코늄의 중량비가 0%를 초과하여 30%까지의 범위에, 상기 선택된 첨가제의 총량의 중량비가 0.02% 이상 2% 이하의 범위에 있는 것을 특징으로 하는 반도체 장치.
- 제2항에 있어서, 상기 선택된 첨가제는 산화이트륨으로서, 그 중량비는 0.1% 이상 2% 이하의 범위인 것을 특징으로 하는 반도체 장치.
- 제2항에 있어서, 상기 선택된 첨가제는 산화칼슘으로서, 그 중량비는 0.02% 이상 0.5% 이하의 범위인 것을 특징으로 하는 반도체 장치.
- 제2항에 있어서, 상기 선택된 첨가제는 산화마그네슘으로서, 그 중량비는 0.02% 이상 0.4% 이하의 범위인 것을 특징으로 하는 반도체 장치
- 제2항에 있어서, 상기 선택된 첨가제는 산화세륨으로서, 그 중량비는 0.02% 이상 0.5% 이하의 범위인 것을 특징으로 하는 반도체 장치
- 제2항에 있어서, 적어도 상기 첨가제의 2종류가 첨가되어 있고, 그 총점가량의 mol%가 0.05% 이상 1.0% 이하의 범위에 있는 것을 특징으로 하는 반도체 장치
- 제3항 내지 제7항 중 어느 한 항에 있어서, 상기 산화 알루미늄의 중량비가 82% 이상 97% 이하의 범위이고, 상기 산화지르코늄의 중량비가 2.5% 이상 17.5% 이하의 범위인 것을 특징으로 하는 반도체 장치.
- 제1항 내지 제7항중 어느 한 항에 있어서, 상기 세라믹스 원료 분말체의 입자 직경은 0.5㎛ 이상 3㎛ 이하인 것을 특징으로 하는 반도체 장치.
- 제8항에 있어서, 상기 세라믹스 원료 분말체의 입자 직경은 0.5㎛ 이상 3㎛ 이하인 것을 특징으로 하는 반도체 장치.
- 제1항 내지 제7항중 어느 한 항에 있어서, 절연성 세라믹 기판의 외면과 내면에 박형의 동판을 접합하여 이루어지는 것을 특징으로 하는 반도체 장치.
- 제8항에 있어서, 절연성 세라믹 기판의 외면과 내면에 박형의 동판을 접합하여 이루어지는 것을 특징으로 하는 반도체 장치.
- 제9항에 있어서, 절연성 세라믹 기판의 외면과 내면에 박형의 동판을 접합하여 이루어지는 것을 특징으로 하는 반도체 장치.
- 제10항에 있어서, 절연성 세라믹 기판의 외면과 내면에 박형의 동판을 접합하여 이루어지는 것을 특징으로 하는 반도체 장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP95-006104 | 1995-01-19 | ||
JP07006104A JP3127754B2 (ja) | 1995-01-19 | 1995-01-19 | 半導体装置 |
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KR960030386A true KR960030386A (ko) | 1996-08-17 |
KR100363054B1 KR100363054B1 (ko) | 2003-02-05 |
Family
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KR1019960000776A KR100363054B1 (ko) | 1995-01-19 | 1996-01-17 | 반도체장치 |
Country Status (4)
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---|---|
US (1) | US5869890A (ko) |
EP (1) | EP0723292A3 (ko) |
JP (1) | JP3127754B2 (ko) |
KR (1) | KR100363054B1 (ko) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
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DE19649798A1 (de) * | 1996-12-02 | 1998-06-04 | Abb Research Ltd | Leistungshalbleitermodul |
DE10062108B4 (de) * | 2000-12-13 | 2010-04-15 | Infineon Technologies Ag | Leistungsmodul mit verbessertem transienten Wärmewiderstand |
US6522859B1 (en) * | 2001-10-16 | 2003-02-18 | Xerox Corporation | Fiber removal device |
US6885562B2 (en) * | 2001-12-28 | 2005-04-26 | Medtronic Physio-Control Manufacturing Corporation | Circuit package and method for making the same |
US7754976B2 (en) | 2002-04-15 | 2010-07-13 | Hamilton Sundstrand Corporation | Compact circuit carrier package |
JP4057407B2 (ja) * | 2002-12-12 | 2008-03-05 | 三菱電機株式会社 | 半導体パワーモジュール |
JP4756165B2 (ja) * | 2004-08-26 | 2011-08-24 | Dowaメタルテック株式会社 | アルミニウム−セラミックス接合基板 |
US8120153B1 (en) | 2005-09-16 | 2012-02-21 | University Of Central Florida Research Foundation, Inc. | High-temperature, wirebondless, injection-molded, ultra-compact hybrid power module |
JP2007165588A (ja) * | 2005-12-14 | 2007-06-28 | Omron Corp | パワーモジュール構造及びこれを用いたソリッドステートリレー |
US8253233B2 (en) * | 2008-02-14 | 2012-08-28 | Infineon Technologies Ag | Module including a sintered joint bonding a semiconductor chip to a copper surface |
KR101757648B1 (ko) | 2009-04-03 | 2017-07-14 | 가부시키가이샤 스미토모 긴조쿠 엘렉트로 디바이스 | 세라믹스 소결체 및 이를 사용한 반도체장치용 기판 |
JP4766162B2 (ja) * | 2009-08-06 | 2011-09-07 | オムロン株式会社 | パワーモジュール |
US8776551B2 (en) * | 2011-05-23 | 2014-07-15 | Johns Manville | Transverse row bushings having ceramic supports |
JP2013032265A (ja) * | 2011-07-01 | 2013-02-14 | Maruwa Co Ltd | 半導体装置用アルミナジルコニア焼結基板及びその製造方法 |
TWI541488B (zh) * | 2011-08-29 | 2016-07-11 | 奇鋐科技股份有限公司 | 散熱裝置及其製造方法 |
CN102956576B (zh) * | 2011-08-29 | 2015-12-02 | 奇鋐科技股份有限公司 | 散热装置及其制造方法 |
JP6009295B2 (ja) * | 2012-09-21 | 2016-10-19 | 京セラクリスタルデバイス株式会社 | 水晶デバイス |
JP2015224151A (ja) * | 2014-05-27 | 2015-12-14 | Ngkエレクトロデバイス株式会社 | Cu/セラミック基板 |
WO2016121660A1 (ja) * | 2015-01-29 | 2016-08-04 | 京セラ株式会社 | 回路基板および電子装置 |
JP6519305B2 (ja) * | 2015-05-11 | 2019-05-29 | 富士電機株式会社 | 封止材用シリコーン樹脂組成物及び該組成物を用いたパワー半導体モジュール |
JP7052426B2 (ja) * | 2018-03-02 | 2022-04-12 | 富士電機株式会社 | 半導体装置および半導体装置の製造方法 |
KR102098829B1 (ko) * | 2018-04-20 | 2020-04-09 | 나노팀 주식회사 | 고방열 탄소시트 및 이의 제조방법 |
EP3648156A1 (en) * | 2018-11-02 | 2020-05-06 | Infineon Technologies AG | Semiconductor substrate |
JP6602450B2 (ja) * | 2018-12-11 | 2019-11-06 | Ngkエレクトロデバイス株式会社 | Cu/セラミック基板 |
Family Cites Families (6)
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JP2872273B2 (ja) * | 1989-06-26 | 1999-03-17 | 三菱電機株式会社 | セラミツク基板材料 |
DE4029066A1 (de) * | 1990-09-13 | 1992-03-19 | Friedrichsfeld Ag | Keramischer formkoerper |
JPH0590444A (ja) * | 1991-09-26 | 1993-04-09 | Toshiba Corp | セラミツクス回路基板 |
JPH05166969A (ja) * | 1991-10-14 | 1993-07-02 | Fuji Electric Co Ltd | 半導体装置 |
WO2004074210A1 (ja) * | 1992-07-03 | 2004-09-02 | Masanori Hirano | セラミックス-金属複合体およびその製造方法 |
JP2883787B2 (ja) * | 1993-07-20 | 1999-04-19 | 富士電機株式会社 | パワー半導体装置用基板 |
-
1995
- 1995-01-19 JP JP07006104A patent/JP3127754B2/ja not_active Expired - Lifetime
-
1996
- 1996-01-17 KR KR1019960000776A patent/KR100363054B1/ko not_active IP Right Cessation
- 1996-01-19 EP EP96100790A patent/EP0723292A3/en not_active Withdrawn
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- 1997-09-30 US US08/938,484 patent/US5869890A/en not_active Expired - Lifetime
Also Published As
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JP3127754B2 (ja) | 2001-01-29 |
JPH08195458A (ja) | 1996-07-30 |
EP0723292A2 (en) | 1996-07-24 |
US5869890A (en) | 1999-02-09 |
KR100363054B1 (ko) | 2003-02-05 |
EP0723292A3 (en) | 1997-07-30 |
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