[go: up one dir, main page]

KR910010624A - 배기가스 처리장치 - Google Patents

배기가스 처리장치 Download PDF

Info

Publication number
KR910010624A
KR910010624A KR1019900017982A KR900017982A KR910010624A KR 910010624 A KR910010624 A KR 910010624A KR 1019900017982 A KR1019900017982 A KR 1019900017982A KR 900017982 A KR900017982 A KR 900017982A KR 910010624 A KR910010624 A KR 910010624A
Authority
KR
South Korea
Prior art keywords
exhaust gas
anodes
pair
discharge tube
electrode
Prior art date
Application number
KR1019900017982A
Other languages
English (en)
Other versions
KR940000553B1 (ko
Inventor
타까시 오오에
히로야스 미노시마
아끼코 미우라
토시노리 마츠다
료오헤이 이타다니
Original Assignee
사와무라 하루오
미쓰이도오아쓰 가가쿠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 사와무라 하루오, 미쓰이도오아쓰 가가쿠 가부시키가이샤 filed Critical 사와무라 하루오
Publication of KR910010624A publication Critical patent/KR910010624A/ko
Application granted granted Critical
Publication of KR940000553B1 publication Critical patent/KR940000553B1/ko

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B01D53/323Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/46Removing components of defined structure
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/80Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818Employing electrical discharges or the generation of a plasma
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S204/00Chemistry: electrical and wave energy
    • Y10S204/05Magnetic plus electrolytic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Biomedical Technology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Treating Waste Gases (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Exhaust Gas After Treatment (AREA)

Abstract

내용 없음.

Description

배기가스 처리장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도, 제5도, 본 발명의 실시의 태양을 나타내는 횡단면도이다.
제3도는 본 발명의 실시태양을 나타내는 횡단면도이다.

Claims (1)

  1. 가스도입구와 가스도출구를 구비하는 관상의 용기내에 음극과 양극으로 이루어지는 적어도 한쌍의 전극을 설치하여 구성한 방전관과, 상기 전극과 접속되는 직류 또는 교류전압 및 상기 방전관내에 형성된 가스유로와를 포함하는 배기가스처리장치에 있어서, 상기 유로내에 적어도 한쌍의 양극을 대향시켜 설치하여 양극대로 하고, 상기 양극대로 이루어진 공간부에 적어도 한쌍의 음극을 상기 양극과 거의 직각 방향으로 상기 양극과 접촉됨이 없이 대향시켜 설치하여 음극대로 하고, 상기 양극대와 상기 음극대로부터 전극조를 구성함과 동시에, 전부를 복수의 판 또는 기둥으로써 구성하고, 이들을 도전적으로 접속일체화시키고, 한편 상기 음극의 대향방향에 직류 또는 교류자계를 형성하는 자계인가장치를 상기 방전관에 설치한 것을 특징으로 하는 배기가스처리장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900017982A 1989-11-08 1990-11-07 배기가스 처리장치 KR940000553B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1-288694 1989-11-08
JP1288694A JPH084708B2 (ja) 1989-11-08 1989-11-08 排ガス処理装置

Publications (2)

Publication Number Publication Date
KR910010624A true KR910010624A (ko) 1991-06-29
KR940000553B1 KR940000553B1 (ko) 1994-01-24

Family

ID=17733485

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900017982A KR940000553B1 (ko) 1989-11-08 1990-11-07 배기가스 처리장치

Country Status (6)

Country Link
US (1) US5130007A (ko)
EP (1) EP0427503B1 (ko)
JP (1) JPH084708B2 (ko)
KR (1) KR940000553B1 (ko)
CA (1) CA2029437C (ko)
DE (1) DE69011044T2 (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4230630A1 (de) * 1992-09-12 1994-03-17 Amann & Soehne Verfahren zur Herstellung oder zur Zerstörung von chemischen Verbindungen
JPH0822367B2 (ja) * 1992-11-27 1996-03-06 富士通株式会社 ガス浄化装置
JP4955027B2 (ja) * 2009-04-02 2012-06-20 クリーン・テクノロジー株式会社 排ガス処理装置における磁場によるプラズマの制御方法
JP5735270B2 (ja) 2010-12-27 2015-06-17 ジャパンレントオール株式会社 間仕切りパネル及びパネルの連結構造
WO2018221067A1 (ja) * 2017-05-29 2018-12-06 カンケンテクノ株式会社 排ガスの減圧除害方法及びその装置
CN111282410B (zh) * 2020-02-19 2021-07-06 华中师范大学 电化学法降解气态污染物的装置及其方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3655547A (en) * 1969-08-27 1972-04-11 Lockheed Aircraft Corp Electrochemical cell having a bipolar electrode
DE2941559C2 (de) * 1979-10-13 1983-03-03 Messerschmitt-Bölkow-Blohm GmbH, 8000 München Verfahren zum Abscheiden von Silizium auf einem Substrat
US4253925A (en) * 1979-10-22 1981-03-03 The Board Of Trustees Of The Leland Stanford Junior University Method and apparatus for catalytic dissociation of NO
US4780277A (en) * 1985-05-10 1988-10-25 Shinryo Corporation Method and apparatus for subjecting gases to discharge treatment
US4735633A (en) * 1987-06-23 1988-04-05 Chiu Kin Chung R Method and system for vapor extraction from gases
JPH01297126A (ja) * 1988-05-26 1989-11-30 Mitsui Toatsu Chem Inc 排ガス処理装置
JPH0814021B2 (ja) * 1989-07-20 1996-02-14 松下電器産業株式会社 スパッタ装置

Also Published As

Publication number Publication date
CA2029437A1 (en) 1991-05-09
EP0427503B1 (en) 1994-07-27
JPH03151022A (ja) 1991-06-27
JPH084708B2 (ja) 1996-01-24
DE69011044D1 (de) 1994-09-01
DE69011044T2 (de) 1995-01-26
CA2029437C (en) 1994-01-04
US5130007A (en) 1992-07-14
EP0427503A1 (en) 1991-05-15
KR940000553B1 (ko) 1994-01-24

Similar Documents

Publication Publication Date Title
DE69634516D1 (de) Nicht verschmutzender durchflusskondensator, trennsystem und trennmethode
ATE60961T1 (de) Luftbehandlungssystem.
ES2061180T3 (es) Procedimiento y aparato para ionizar fluidos mediante efecto capacitivo.
RU2002125110A (ru) Плазменный ускоритель
KR880011022A (ko) 물의 전해장치
KR910010634A (ko) 건식 처리장치
KR890016996A (ko) 배출가스 처리장치
KR920002473A (ko) 유체를 처리하기 위한 방법 및 장치
KR880012797A (ko) 극판 유니트를 이용한 전해정련방법
MX159262A (es) Mejoras en aparato de electrolisis bipolar con catodo consumidor de oxigeno
KR910010624A (ko) 배기가스 처리장치
KR880003707A (ko) 전해조 및 개스킷
SE8502655L (sv) Gaslaseranordning
KR900010878A (ko) 플라즈마 표시소자의 구조 및 그 구동 방법
RU96100608A (ru) Электрический очиститель диэлектрических жидкостей
JPH0441141Y2 (ko)
SU1007669A1 (ru) Устройство дл электрофореза
SU827406A1 (ru) Электрокоагул тор
RU96105597A (ru) Литиевый источник тока
JPS55154307A (en) Plate discharge electrode plate capable of forming ozone by silent discharge and ozonizer of its composite assembly
GB1229402A (ko)
EP0209311A3 (en) Gas laser apparatus
KR950021003A (ko) 대면적 화학기상 증착장치
JPS5739590A (en) Lateral discharge type laser tube
KR970065429A (ko) 물을 연속적으로 처리하기 위한 방법, 장치, 및 시스템

Legal Events

Date Code Title Description
A201 Request for examination
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 19901107

PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 19901107

Comment text: Request for Examination of Application

PG1501 Laying open of application
G160 Decision to publish patent application
PG1605 Publication of application before grant of patent

Comment text: Decision on Publication of Application

Patent event code: PG16051S01I

Patent event date: 19931230

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

Patent event code: PE07011S01D

Comment text: Decision to Grant Registration

Patent event date: 19940331

GRNT Written decision to grant
PR0701 Registration of establishment

Comment text: Registration of Establishment

Patent event date: 19940623

Patent event code: PR07011E01D

PR1002 Payment of registration fee

Payment date: 19940623

End annual number: 3

Start annual number: 1

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee