KR20180077743A - 네가티브 감광성 수지 조성물 - Google Patents
네가티브 감광성 수지 조성물 Download PDFInfo
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- KR20180077743A KR20180077743A KR1020160182393A KR20160182393A KR20180077743A KR 20180077743 A KR20180077743 A KR 20180077743A KR 1020160182393 A KR1020160182393 A KR 1020160182393A KR 20160182393 A KR20160182393 A KR 20160182393A KR 20180077743 A KR20180077743 A KR 20180077743A
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- photosensitive resin
- negative photosensitive
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
[화학식 1]
상기 화학식 1에서, D는 탄소수 1 내지 20의 탄화수소기이고, n 및 m은 각각 독립적으로 0 내지 2의 정수이다.
Description
단차(Å) | 감도(mJ) | 해상력(㎛) | 잔막율 | |
실시예 1 | ○ | 20 | ○ | ○ |
실시예 2 | △ | 20 | ○ | ○ |
실시예 3 | ○ | 15 | △ | ○ |
실시예 4 | ○ | 20 | ○ | ○ |
실시예 5 | ○ | 15 | △ | ○ |
실시예 6 | ○ | 15 | ○ | △ |
비교예 1 | △ | 15 | X | ○ |
비교예 2 | ○ | 15 | X | ○ |
비교예 3 | ○ | 10 | X | △ |
실시예 1 | 실시예 2 | 실시예 3 | 실시예 4 | 실시예 5 | 실시예 6 | |
강도(Gpa) | 0.31 | 0.29 | 0.32 | 0.35 | 0.36 | 0.32 |
Claims (9)
- 제 1항에 있어서, 상기 다관능 우레탄계 메타아크릴레이트 불포화 화합물, 라디칼 광개시제 및 용매의 함량은, 상기 아크릴계 공중합체 100 중량부에 대하여, 각각 1 내지 100 중량부, 0.1 내지 30 중량부 및 10 내지 500 중량부인 것인, 네가티브 감광성 수지 조성물.
- 제 1항에 있어서, 상기 D는 탄소수 6 내지 13의 알킬렌기, 아릴렌기 또는 나프탈렌기인 것인, 네가티브 감광성 수지 조성물.
- 제 1항에 있어서, 상기 다관능 우레탄계 메타아크릴레이트 화합물의 중량평균분자량은 100 내지 10,000인 것인, 네가티브 감광성 수지 조성물.
- 제 1항에 있어서, 고형분의 함량이 10 내지 50 중량%인 것인, 네가티브 감광성 수지 조성물.
- 제 1항에 있어서, 다관능 아크릴레이트 올리고머 및/또는 에틸렌성 불포화 결합을 가지는 다관능성 단량체를 더욱 포함하는 것인, 네가티브 감광성 수지 조성물.
- 제 1항에 있어서, 실란커플링제, 계면활성제 및 이들의 혼합물로 이루어진 군으로부터 선택되는 첨가제를 더욱 포함하고,
상기 첨가제의 함량은 상기 아크릴계 공중합체 100 중량부에 대하여, 0.01 내지 5 중량부인 것인, 네가티브 감광성 수지 조성물. - 제 1항에 있어서, 상기 화학식 1의 n 및 m은 n+m>0을 만족시키는 것인, 네가티브 감광성 수지 조성물.
- 제 1항에 있어서, 상기 화학식 1의 n 및 m은 n+m=2를 만족시키는 것인, 네가티브 감광성 수지 조성물.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020160182393A KR102792073B1 (ko) | 2016-12-29 | 2016-12-29 | 네가티브 감광성 수지 조성물 |
TW106146311A TWI771355B (zh) | 2016-12-29 | 2017-12-28 | 負型感光性樹脂組合物 |
CN201711460405.3A CN108255017B (zh) | 2016-12-29 | 2017-12-28 | 负型感光性树脂组合物 |
Applications Claiming Priority (1)
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KR1020160182393A KR102792073B1 (ko) | 2016-12-29 | 2016-12-29 | 네가티브 감광성 수지 조성물 |
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Publication Number | Publication Date |
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KR20180077743A true KR20180077743A (ko) | 2018-07-09 |
KR102792073B1 KR102792073B1 (ko) | 2025-04-08 |
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KR (1) | KR102792073B1 (ko) |
CN (1) | CN108255017B (ko) |
TW (1) | TWI771355B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022145795A1 (ko) * | 2020-12-31 | 2022-07-07 | 주식회사 동진쎄미켐 | 저온 경화가 가능하며 굴절률이 낮은 네가티브 감광성 수지 조성물 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN108957955B (zh) * | 2018-08-13 | 2021-06-04 | 深圳市华星光电半导体显示技术有限公司 | 白色色阻及其制备方法、阵列基板 |
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WO2013161630A1 (ja) * | 2012-04-27 | 2013-10-31 | 日産化学工業株式会社 | 低離型力性を有するインプリント材料 |
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JP2016153834A (ja) * | 2015-02-20 | 2016-08-25 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜の製造方法、硬化膜、タッチパネル、タッチパネル表示装置、液晶表示装置、及び、有機el表示装置 |
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CN103282829B (zh) * | 2010-12-24 | 2016-08-17 | 旭化成株式会社 | 感光性树脂组合物 |
TWI513685B (zh) * | 2014-04-28 | 2015-12-21 | Daxin Materials Corp | 具有羥基的芴系化合物、感光性組成物及透明膜 |
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2016
- 2016-12-29 KR KR1020160182393A patent/KR102792073B1/ko active Active
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2017
- 2017-12-28 TW TW106146311A patent/TWI771355B/zh active
- 2017-12-28 CN CN201711460405.3A patent/CN108255017B/zh active Active
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KR20100018572A (ko) * | 2007-06-01 | 2010-02-17 | 후지필름 가부시키가이샤 | 컬러 필터용 경화성 조성물, 컬러 필터용 경화성 조성물의 제조 방법, 착색 경화성 수지 조성물, 착색 패턴 형성 방법, 착색 패턴, 컬러 필터의 제조 방법, 컬러 필터 및 액정 표시 소자 |
WO2013161630A1 (ja) * | 2012-04-27 | 2013-10-31 | 日産化学工業株式会社 | 低離型力性を有するインプリント材料 |
WO2015005546A1 (ko) * | 2013-07-11 | 2015-01-15 | 제일모직 주식회사 | 흑색 감광성 수지 조성물 및 이를 이용한 차광층 |
JP2016153834A (ja) * | 2015-02-20 | 2016-08-25 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜の製造方法、硬化膜、タッチパネル、タッチパネル表示装置、液晶表示装置、及び、有機el表示装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022145795A1 (ko) * | 2020-12-31 | 2022-07-07 | 주식회사 동진쎄미켐 | 저온 경화가 가능하며 굴절률이 낮은 네가티브 감광성 수지 조성물 |
Also Published As
Publication number | Publication date |
---|---|
TW201832008A (zh) | 2018-09-01 |
CN108255017A (zh) | 2018-07-06 |
CN108255017B (zh) | 2023-03-31 |
TWI771355B (zh) | 2022-07-21 |
KR102792073B1 (ko) | 2025-04-08 |
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