KR20170121171A - 봉지용 필름 및 이것을 사용한 전자 부품 장치 - Google Patents
봉지용 필름 및 이것을 사용한 전자 부품 장치 Download PDFInfo
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- KR20170121171A KR20170121171A KR1020177022300A KR20177022300A KR20170121171A KR 20170121171 A KR20170121171 A KR 20170121171A KR 1020177022300 A KR1020177022300 A KR 1020177022300A KR 20177022300 A KR20177022300 A KR 20177022300A KR 20170121171 A KR20170121171 A KR 20170121171A
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- epoxy resin
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- film
- sealing film
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- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
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- LKGYNSULFSODJP-UHFFFAOYSA-N hexane-1,1-diol;phenol Chemical compound OC1=CC=CC=C1.OC1=CC=CC=C1.CCCCCC(O)O LKGYNSULFSODJP-UHFFFAOYSA-N 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
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- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
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- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
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- DRXHEPWCWBIQFJ-UHFFFAOYSA-N methyl(triphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(C)OC1=CC=CC=C1 DRXHEPWCWBIQFJ-UHFFFAOYSA-N 0.000 description 1
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- 238000002715 modification method Methods 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
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- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
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- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- ALVYUZIFSCKIFP-UHFFFAOYSA-N triethoxy(2-methylpropyl)silane Chemical compound CCO[Si](CC(C)C)(OCC)OCC ALVYUZIFSCKIFP-UHFFFAOYSA-N 0.000 description 1
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- FBBATURSCRIBHN-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyldisulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSCCC[Si](OCC)(OCC)OCC FBBATURSCRIBHN-UHFFFAOYSA-N 0.000 description 1
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical compound CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- NLSXASIDNWDYMI-UHFFFAOYSA-N triphenylsilanol Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(O)C1=CC=CC=C1 NLSXASIDNWDYMI-UHFFFAOYSA-N 0.000 description 1
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C08K3/0033—
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L9/00—Compositions of homopolymers or copolymers of conjugated diene hydrocarbons
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2203/00—Applications
- C08L2203/16—Applications used for films
- C08L2203/162—Applications used for films sealable films
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- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
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- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
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- Epoxy Resins (AREA)
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JPJP-P-2015-036722 | 2015-02-26 | ||
JP2015036722 | 2015-02-26 | ||
PCT/JP2016/055264 WO2016136741A1 (ja) | 2015-02-26 | 2016-02-23 | 封止用フィルム及びそれを用いた電子部品装置 |
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KR (1) | KR20170121171A (ja) |
CN (1) | CN107210274B (ja) |
TW (1) | TW201703207A (ja) |
WO (1) | WO2016136741A1 (ja) |
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TWI852242B (zh) * | 2017-06-29 | 2024-08-11 | 日商力森諾科股份有限公司 | 密封用樹脂組成物、再配置晶圓、半導體封裝及半導體封裝的製造方法 |
JP7065389B2 (ja) * | 2017-11-08 | 2022-05-12 | パナソニックIpマネジメント株式会社 | エポキシ樹脂組成物、エポキシ樹脂組成物の製造方法及び半導体装置 |
US11718770B2 (en) * | 2018-11-14 | 2023-08-08 | Nagase Chemtex Corporation | Curable resin composition and curable sheet |
CN111757911B (zh) * | 2018-12-29 | 2023-02-28 | 广东生益科技股份有限公司 | 树脂组合物、预浸料、层压板、覆金属箔层压板和印刷线路板 |
KR102463618B1 (ko) * | 2020-07-22 | 2022-11-04 | 가부시키가이샤 아리사와 세이사쿠쇼 | 열경화성 수지 조성물, 커버레이 필름, 접착 시트 및 플렉시블 프린트 배선판 |
JP6950844B1 (ja) | 2020-09-25 | 2021-10-13 | 東洋インキScホールディングス株式会社 | 硬化性組成物、硬化物およびその製造方法 |
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JP3736349B2 (ja) * | 1998-08-21 | 2006-01-18 | 日立化成工業株式会社 | ペースト組成物並びにこれを用いた保護膜及び半導体装置 |
US20120248634A1 (en) * | 2009-11-13 | 2012-10-04 | Kazuyuki Mitsukura | Method for manufacturing film-like adhesive, adhesive sheet, semiconductor device, and method for manufacturing semiconductor device |
JP5703010B2 (ja) * | 2010-12-16 | 2015-04-15 | 新光電気工業株式会社 | 半導体パッケージ及びその製造方法 |
CN103703093B (zh) * | 2011-06-28 | 2016-06-15 | 琳得科株式会社 | 一种粘着性组合物以及粘着性片 |
KR20130073191A (ko) * | 2011-12-23 | 2013-07-03 | 제일모직주식회사 | 이방 전도성 필름 |
JP2015166403A (ja) * | 2012-06-29 | 2015-09-24 | 太陽ホールディングス株式会社 | 熱硬化型樹脂組成物および熱硬化型樹脂フィルム |
JP6171280B2 (ja) * | 2012-07-31 | 2017-08-02 | 味の素株式会社 | 半導体装置の製造方法 |
JP6135991B2 (ja) * | 2012-10-11 | 2017-05-31 | パナソニックIpマネジメント株式会社 | 封止用エポキシ樹脂無機複合シート |
JP2014086598A (ja) * | 2012-10-24 | 2014-05-12 | Hitachi Chemical Co Ltd | 半導体装置の製造方法、半導体装置、及び感光性樹脂組成物 |
JP6456027B2 (ja) * | 2013-03-27 | 2019-01-23 | 日東電工株式会社 | 封止シート、封止シートの製造方法及び電子部品パッケージの製造方法 |
JP6018967B2 (ja) * | 2013-04-26 | 2016-11-02 | 日東電工株式会社 | 熱硬化性封止樹脂シート及び電子部品パッケージの製造方法 |
JP2015026821A (ja) * | 2013-06-20 | 2015-02-05 | 日東電工株式会社 | 電子デバイスの封止方法、電子デバイスパッケージの製造方法及び封止シート |
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