KR20090084726A - 열처리로 - Google Patents
열처리로 Download PDFInfo
- Publication number
- KR20090084726A KR20090084726A KR1020090007212A KR20090007212A KR20090084726A KR 20090084726 A KR20090084726 A KR 20090084726A KR 1020090007212 A KR1020090007212 A KR 1020090007212A KR 20090007212 A KR20090007212 A KR 20090007212A KR 20090084726 A KR20090084726 A KR 20090084726A
- Authority
- KR
- South Korea
- Prior art keywords
- resistance heating
- heating element
- insulating material
- heat insulating
- heat treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 130
- 239000011810 insulating material Substances 0.000 claims abstract description 65
- 238000012545 processing Methods 0.000 claims abstract description 29
- 230000000903 blocking effect Effects 0.000 claims abstract description 27
- 239000000463 material Substances 0.000 claims description 5
- 238000003466 welding Methods 0.000 claims description 5
- 239000012212 insulator Substances 0.000 claims description 2
- 230000008602 contraction Effects 0.000 abstract description 10
- 230000002093 peripheral effect Effects 0.000 abstract description 5
- 239000011295 pitch Substances 0.000 description 8
- 235000012431 wafers Nutrition 0.000 description 7
- 238000001816 cooling Methods 0.000 description 5
- 239000012809 cooling fluid Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000009825 accumulation Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- 238000007664 blowing Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 229910000953 kanthal Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B17/00—Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00
- F27B17/0016—Chamber type furnaces
- F27B17/0025—Chamber type furnaces specially adapted for treating semiconductor wafers
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D11/00—Arrangement of elements for electric heating in or on furnaces
- F27D11/02—Ohmic resistance heating
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D99/00—Subject matter not provided for in other groups of this subclass
- F27D99/0001—Heating elements or systems
- F27D99/0006—Electric heating elements or system
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
- H05B3/06—Heater elements structurally combined with coupling elements or holders
- H05B3/08—Heater elements structurally combined with coupling elements or holders having electric connections specially adapted for high temperatures
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Furnace Details (AREA)
- Resistance Heating (AREA)
Abstract
Description
Claims (8)
- 피처리체를 수용하여 열처리하기 위한 처리 용기를 둘러싸는 통 형상의 단열재와,상기 단열재의 내주면에 나선 형상으로 설치된 저항 발열체와,상기 단열재의 내주면에 설치되고, 상기 저항 발열체를 직경 방향으로 열팽창 수축 가능하게 지지하는 지지체와,상기 저항 발열체에 설치되고, 상기 지지체의 일측면에 접촉함으로써 상기 저항 발열체의 하방으로의 이동을 저지하는 이동 저지 부재를 구비한 것을 특징으로 하는 열처리로.
- 제1항에 있어서, 상기 저항 발열체에 설치되고, 상기 단열재를 직경 방향으로 관통하여 외부로 연장 돌출된 복수의 단자판을 더 구비한 것을 특징으로 하는 열처리로.
- 제1항에 있어서, 상기 이동 저지 부재는 상기 단열재측으로 돌출되지 않고 또한 상하 방향으로 돌출되는 형상으로 저항 발열체에 용접으로 고정되어 있는 것을 특징으로 하는 열처리로.
- 제1항에 있어서, 상기 지지체는 선단부가 상기 단열재에 매립 설치되는 동시 에 수평 방향으로 연장된 수평부와, 상기 수평부의 후단부에 설치되는 동시에 연직 방향으로 연장된 수직부를 갖고,상기 수평부의 상면과 상기 수직부의 전방면이 곡면 형상으로 형성되어 있는 것을 특징으로 하는 열처리로.
- 제4항에 있어서, 상기 수평부의 하면에 길이 방향에 따른 홈이 마련되어 있는 것을 특징으로 하는 열처리로.
- 제1항에 있어서, 상기 이동 저지 부재는 복수 설치되고,하나의 이동 저지 부재는 상하 방향에서 인접하는 다른 이동 저지 부재에 대해, 상기 단열재의 둘레 방향에서 어긋난 위치에 배치되는 것을 특징으로 하는 열처리로.
- 제6항에 있어서, 상기 지지체는 상기 단열재의 둘레 방향을 따라 복수 설치되고,하나의 이동 저지 부재가 접촉 가능한 지지체는, 상하 방향에서 인접하는 다른 이동 저지 부재가 접촉 가능한 지지체에 대해, 상기 단열재의 둘레 방향에서 다른 위치에 배치되어 있는 것을 특징으로 하는 열처리로.
- 제1항에 있어서, 상기 이동 저지 부재는 상기 저항 발열체와 같은 재질로 형 성되어 있는 것을 특징으로 하는 열처리로.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2008-021231 | 2008-01-31 | ||
JP2008021231A JP5096182B2 (ja) | 2008-01-31 | 2008-01-31 | 熱処理炉 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20090084726A true KR20090084726A (ko) | 2009-08-05 |
KR101142686B1 KR101142686B1 (ko) | 2012-05-10 |
Family
ID=40930652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020090007212A Active KR101142686B1 (ko) | 2008-01-31 | 2009-01-30 | 열처리로 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8476560B2 (ko) |
JP (1) | JP5096182B2 (ko) |
KR (1) | KR101142686B1 (ko) |
CN (1) | CN101499410A (ko) |
TW (1) | TWI425584B (ko) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101319197B1 (ko) * | 2010-05-11 | 2013-10-16 | 가부시키가이샤 히다치 고쿠사이 덴키 | 히터 지지 장치 |
KR20140047531A (ko) * | 2012-10-12 | 2014-04-22 | 도쿄엘렉트론가부시키가이샤 | 히터 장치 및 열처리 장치 |
KR20200144977A (ko) | 2019-06-20 | 2020-12-30 | 이준연 | 와류분출식 냉각노즐이 구비된 열처리로 |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4930438B2 (ja) * | 2008-04-03 | 2012-05-16 | 東京エレクトロン株式会社 | 反応管及び熱処理装置 |
KR101844602B1 (ko) | 2010-06-25 | 2018-04-02 | 샌드빅 써멀 프로세스. 인크. | 발열체 코일용 지지구조물과 스페이서 및 발열체 코일의 위치를 제어하는 방법 |
JP5565188B2 (ja) * | 2010-08-10 | 2014-08-06 | 東京エレクトロン株式会社 | ヒータ装置 |
JP5520771B2 (ja) * | 2010-10-01 | 2014-06-11 | 本田技研工業株式会社 | メタルボンド砥石の製造方法 |
JP5686467B2 (ja) * | 2010-10-15 | 2015-03-18 | 株式会社日立国際電気 | 基板処理装置及び半導体装置の製造方法 |
US8987641B2 (en) * | 2011-06-20 | 2015-03-24 | Arsalan Emami | High performance heater |
JP5868619B2 (ja) * | 2011-06-21 | 2016-02-24 | ニチアス株式会社 | 熱処理炉及び熱処理装置 |
CN102706133B (zh) * | 2012-07-12 | 2014-02-19 | 尹彦征 | 一种烧制三米高镉红色釉瓷器电窑 |
US20140166640A1 (en) * | 2012-12-13 | 2014-06-19 | Sandvik Thermal Process Inc | Support for resisting radial creep of a heating element coil |
JP6170847B2 (ja) * | 2013-03-25 | 2017-07-26 | 株式会社日立国際電気 | 断熱構造体、加熱装置、基板処理装置および半導体装置の製造方法 |
TWD167986S (zh) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | 反應管之部分 |
TWD168774S (zh) * | 2013-06-28 | 2015-07-01 | 日立國際電氣股份有限公司 | 反應管之部分 |
TWD167987S (zh) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | 反應管之部分 |
TWD167985S (zh) * | 2013-06-28 | 2015-05-21 | 日立國際電氣股份有限公司 | 反應管之部分 |
USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
CN103779258B (zh) * | 2014-02-20 | 2016-06-15 | 北京七星华创电子股份有限公司 | 一种半导体热处理设备的加热装置、维修件及维修方法 |
JP1535455S (ko) * | 2015-02-25 | 2015-10-19 | ||
US9860940B2 (en) * | 2015-03-17 | 2018-01-02 | Arsalan Emami | Methods and systems for alignment of a high performance heater |
JP1548462S (ko) * | 2015-09-04 | 2016-04-25 | ||
JP1546512S (ko) * | 2015-09-04 | 2016-03-22 | ||
JP1546345S (ko) * | 2015-09-04 | 2016-03-22 | ||
KR102466140B1 (ko) * | 2016-01-29 | 2022-11-11 | 삼성전자주식회사 | 가열 장치 및 이를 갖는 기판 처리 시스템 |
WO2017156503A1 (en) | 2016-03-10 | 2017-09-14 | Arsalan Emami | Improved industrial heater |
US20180292133A1 (en) * | 2017-04-05 | 2018-10-11 | Rex Materials Group | Heat treating furnace |
JP1605460S (ko) * | 2017-08-09 | 2021-05-31 | ||
JP1605462S (ko) * | 2017-08-10 | 2021-05-31 | ||
JP1605461S (ko) * | 2017-08-10 | 2021-05-31 | ||
KR101838110B1 (ko) * | 2017-08-11 | 2018-03-14 | 한전케이피에스 주식회사 | 발전기 리테이닝 링의 유도가열 시스템 |
JP7122856B2 (ja) * | 2018-05-02 | 2022-08-22 | 東京エレクトロン株式会社 | 熱処理装置 |
JP1644260S (ko) * | 2019-03-20 | 2019-10-28 | ||
CN110265329B (zh) * | 2019-06-18 | 2020-12-18 | 德淮半导体有限公司 | 内管固定装置 |
CN112195442B (zh) * | 2020-09-16 | 2022-08-19 | 苏州方昇光电股份有限公司 | 一种聚热罩的束源结构 |
CN116007390A (zh) * | 2022-12-15 | 2023-04-25 | 湖南优热科技有限责任公司 | 一种带有快速主动冷却系统的石墨化炉 |
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JP3375704B2 (ja) * | 1993-12-22 | 2003-02-10 | 株式会社日立国際電気 | 製造装置 |
JP3471100B2 (ja) | 1994-11-07 | 2003-11-25 | 東京エレクトロン株式会社 | 縦型熱処理装置 |
JPH10233277A (ja) * | 1997-02-18 | 1998-09-02 | Tokyo Electron Ltd | 熱処理装置 |
JP2001255069A (ja) * | 2000-03-09 | 2001-09-21 | Tokyo Electron Ltd | 熱処理装置およびその抵抗発熱体の製造方法 |
US6807220B1 (en) | 2003-05-23 | 2004-10-19 | Mrl Industries | Retention mechanism for heating coil of high temperature diffusion furnace |
JP4208246B2 (ja) * | 2004-02-26 | 2009-01-14 | 坂口電熱株式会社 | 電気炉 |
JP5248826B2 (ja) * | 2006-09-22 | 2013-07-31 | 東京エレクトロン株式会社 | 熱処理炉及びその製造方法 |
KR20060133504A (ko) * | 2006-11-17 | 2006-12-26 | 에이스하이텍 주식회사 | 열처리 장치의 히터 어셈블리 및 그 제조 방법 |
JP4445519B2 (ja) * | 2007-06-01 | 2010-04-07 | 東京エレクトロン株式会社 | 熱処理炉及びその製造方法 |
-
2008
- 2008-01-31 JP JP2008021231A patent/JP5096182B2/ja active Active
-
2009
- 2009-01-21 TW TW098102216A patent/TWI425584B/zh active
- 2009-01-24 CN CNA2009100019717A patent/CN101499410A/zh active Pending
- 2009-01-26 US US12/320,433 patent/US8476560B2/en active Active
- 2009-01-30 KR KR1020090007212A patent/KR101142686B1/ko active Active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101319197B1 (ko) * | 2010-05-11 | 2013-10-16 | 가부시키가이샤 히다치 고쿠사이 덴키 | 히터 지지 장치 |
KR20140047531A (ko) * | 2012-10-12 | 2014-04-22 | 도쿄엘렉트론가부시키가이샤 | 히터 장치 및 열처리 장치 |
KR20200144977A (ko) | 2019-06-20 | 2020-12-30 | 이준연 | 와류분출식 냉각노즐이 구비된 열처리로 |
Also Published As
Publication number | Publication date |
---|---|
JP5096182B2 (ja) | 2012-12-12 |
US20090194521A1 (en) | 2009-08-06 |
JP2009180462A (ja) | 2009-08-13 |
KR101142686B1 (ko) | 2012-05-10 |
US8476560B2 (en) | 2013-07-02 |
CN101499410A (zh) | 2009-08-05 |
TW200947589A (en) | 2009-11-16 |
TWI425584B (zh) | 2014-02-01 |
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