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KR20010112499A - 팔라듐 전기도금욕 및 전기도금방법 - Google Patents

팔라듐 전기도금욕 및 전기도금방법 Download PDF

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Publication number
KR20010112499A
KR20010112499A KR1020010031712A KR20010031712A KR20010112499A KR 20010112499 A KR20010112499 A KR 20010112499A KR 1020010031712 A KR1020010031712 A KR 1020010031712A KR 20010031712 A KR20010031712 A KR 20010031712A KR 20010112499 A KR20010112499 A KR 20010112499A
Authority
KR
South Korea
Prior art keywords
sulfonic acid
metal
electroplating
electroplating bath
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020010031712A
Other languages
English (en)
Korean (ko)
Inventor
엡스타인피터
애비스조셉에이
둘라간코너안소니
메사노조셉존2세
Original Assignee
루센트 테크놀러지스 인크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 루센트 테크놀러지스 인크 filed Critical 루센트 테크놀러지스 인크
Publication of KR20010112499A publication Critical patent/KR20010112499A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
    • C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
KR1020010031712A 2000-06-08 2001-06-07 팔라듐 전기도금욕 및 전기도금방법 Withdrawn KR20010112499A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US59023400A 2000-06-08 2000-06-08
US09/590,234 2000-06-08

Publications (1)

Publication Number Publication Date
KR20010112499A true KR20010112499A (ko) 2001-12-20

Family

ID=24361404

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020010031712A Withdrawn KR20010112499A (ko) 2000-06-08 2001-06-07 팔라듐 전기도금욕 및 전기도금방법

Country Status (4)

Country Link
EP (1) EP1162289A1 (fr)
JP (1) JP2002060989A (fr)
KR (1) KR20010112499A (fr)
HK (1) HK1038383A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180107101A (ko) * 2016-02-16 2018-10-01 루미실드 테크놀로지스 인코포레이티드 수성 매질 중 원소의 전기화학적 증착

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4098656A (en) * 1976-03-11 1978-07-04 Oxy Metal Industries Corporation Bright palladium electroplating baths
FR2403399A1 (fr) * 1977-09-19 1979-04-13 Oxy Metal Industries Corp Bains de revetement electrolytique de palladium brillant
IT1107840B (it) * 1978-07-25 1985-12-02 Alfachimici Spa Soluzione catalitica per la deposizione anelettrica di metalli
US4465563A (en) * 1982-12-22 1984-08-14 Learonal, Inc. Electrodeposition of palladium-silver alloys
US4478692A (en) * 1982-12-22 1984-10-23 Learonal, Inc. Electrodeposition of palladium-silver alloys
US4673472A (en) * 1986-02-28 1987-06-16 Technic Inc. Method and electroplating solution for deposition of palladium or alloys thereof
JP3365866B2 (ja) * 1994-08-01 2003-01-14 荏原ユージライト株式会社 非シアン性貴金属めっき浴
DE19629658C2 (de) * 1996-07-23 1999-01-14 Degussa Cyanidfreies galvanisches Bad zur Abscheidung von Gold und Goldlegierungen
US6251249B1 (en) * 1996-09-20 2001-06-26 Atofina Chemicals, Inc. Precious metal deposition composition and process
JPH10204676A (ja) * 1996-11-25 1998-08-04 C Uyemura & Co Ltd 錫−銀合金電気めっき浴及び錫−銀合金電気めっき方法
US6099713A (en) * 1996-11-25 2000-08-08 C. Uyemura & Co., Ltd. Tin-silver alloy electroplating bath and tin-silver alloy electroplating process
KR100840451B1 (ko) * 1999-03-19 2008-06-20 테크닉,인코포레이티드 수성 전기도금욕, 수성 전기도금욕의 제조 방법, 및 그 수성 전기도금욕을 이용한 도금 방법
DE19928047A1 (de) * 1999-06-19 2000-12-21 Gerhard Hoffacker Schadstoffarme bis schadstoffreie wäßrige Systeme zur galvanischen Abscheidung von Edelmetallen und Edelmetall-Legierungen

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180107101A (ko) * 2016-02-16 2018-10-01 루미실드 테크놀로지스 인코포레이티드 수성 매질 중 원소의 전기화학적 증착

Also Published As

Publication number Publication date
JP2002060989A (ja) 2002-02-28
HK1038383A1 (en) 2002-03-15
EP1162289A1 (fr) 2001-12-12

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Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20010607

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid