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KR102730712B1 - 기판 수납 용기 관리 시스템, 로드 포트, 기판 수납 용기 관리 방법 - Google Patents

기판 수납 용기 관리 시스템, 로드 포트, 기판 수납 용기 관리 방법 Download PDF

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Publication number
KR102730712B1
KR102730712B1 KR1020190060782A KR20190060782A KR102730712B1 KR 102730712 B1 KR102730712 B1 KR 102730712B1 KR 1020190060782 A KR1020190060782 A KR 1020190060782A KR 20190060782 A KR20190060782 A KR 20190060782A KR 102730712 B1 KR102730712 B1 KR 102730712B1
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KR
South Korea
Prior art keywords
storage container
substrate storage
foup
load port
sensor
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KR1020190060782A
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English (en)
Korean (ko)
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KR20190134523A (ko
Inventor
이즈미 이토
도모야 미즈타니
Original Assignee
신포니아 테크놀로지 가부시끼가이샤
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Publication of KR20190134523A publication Critical patent/KR20190134523A/ko
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Publication of KR102730712B1 publication Critical patent/KR102730712B1/ko
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • H01L21/67265Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67276Production flow monitoring, e.g. for increasing throughput
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67282Marking devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67294Apparatus for monitoring, sorting or marking using identification means, e.g. labels on substrates or labels on containers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Warehouses Or Storage Devices (AREA)
KR1020190060782A 2018-05-24 2019-05-23 기판 수납 용기 관리 시스템, 로드 포트, 기판 수납 용기 관리 방법 Active KR102730712B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2018099494 2018-05-24
JPJP-P-2018-099494 2018-05-24
JP2019031789A JP7295384B2 (ja) 2018-05-24 2019-02-25 基板収納容器管理システム、ロードポート、基板収納容器管理方法
JPJP-P-2019-031789 2019-02-25

Publications (2)

Publication Number Publication Date
KR20190134523A KR20190134523A (ko) 2019-12-04
KR102730712B1 true KR102730712B1 (ko) 2024-11-18

Family

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KR1020190060782A Active KR102730712B1 (ko) 2018-05-24 2019-05-23 기판 수납 용기 관리 시스템, 로드 포트, 기판 수납 용기 관리 방법

Country Status (3)

Country Link
JP (2) JP7256358B2 (ja)
KR (1) KR102730712B1 (ja)
TW (1) TWI821293B (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7256358B2 (ja) * 2018-05-24 2023-04-12 シンフォニアテクノロジー株式会社 基板収納容器管理システム、基板収納容器管理方法
KR102389879B1 (ko) * 2020-06-29 2022-04-22 송춘기 질소 누출 방지 기능을 구비한 이에프이엠 시스템
CN116848629A (zh) * 2021-02-17 2023-10-03 应用材料公司 用于支持多个半导体处理模块或腔室的模块化主机布局
US12131454B2 (en) * 2021-09-15 2024-10-29 Onto Innovation, Inc. Substrate mapping using deep neural-networks
CN114548708B (zh) * 2022-01-30 2022-08-26 弥费实业(上海)有限公司 空晶圆盒管理方法、装置、计算机设备和存储介质
CN116525508B (zh) * 2023-05-23 2024-03-26 乐孜芯创半导体设备(上海)有限公司 一种密闭式晶圆盒装载口及其气体置换方法
CN117672928B (zh) * 2023-10-19 2024-06-25 重庆鹰谷光电股份有限公司 一种开盒方法
CN119314916B (zh) * 2024-12-13 2025-04-08 北京锐洁机器人科技有限公司 一种提供氮气保护环境的晶圆盒装载装置及其使用方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004517463A (ja) 2000-08-15 2004-06-10 アシスト テクノロジーズ インコーポレイテッド キャリアモニター及び工場レベルでのキャリア管理システムと統合されたスマート装填ポート
KR101732290B1 (ko) 2012-12-10 2017-05-02 도쿄엘렉트론가부시키가이샤 기판 처리 장치, 기판 처리 시스템 및 반송 용기의 이상 검출 방법

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US6901971B2 (en) * 2001-01-10 2005-06-07 Entegris, Inc. Transportable container including an internal environment monitor
JP2002313867A (ja) * 2001-02-09 2002-10-25 Toshiba Corp 半導体装置の製造方法
US6595075B1 (en) * 2002-05-06 2003-07-22 Taiwan Semiconductor Manufacturing Co., Ltd Method and apparatus for testing cassette pod door
JP4253252B2 (ja) 2003-12-22 2009-04-08 富士通マイクロエレクトロニクス株式会社 品質改善システム
JP2009503899A (ja) * 2005-08-03 2009-01-29 インテグリス・インコーポレーテッド 移送容器
TW200725442A (en) * 2005-12-16 2007-07-01 Powerchip Semiconductor Corp Method for storage management of wafer in process
JP2012190821A (ja) * 2011-03-08 2012-10-04 Hitachi Kokusai Electric Inc 基板処理装置および群管理装置
JP6403431B2 (ja) * 2013-06-28 2018-10-10 株式会社Kokusai Electric 基板処理装置、流量監視方法及び半導体装置の製造方法並びに流量監視プログラム
JP6539199B2 (ja) * 2015-12-18 2019-07-03 株式会社荏原製作所 基板搬送用移載機及び基板移載方法
JP6689672B2 (ja) 2016-05-25 2020-04-28 信越ポリマー株式会社 基板収納容器及びその管理システム並びに基板収納容器の管理方法
JP6882656B2 (ja) * 2016-07-08 2021-06-02 シンフォニアテクノロジー株式会社 ロードポート及びロードポートを備える基板搬送システム
JP7256358B2 (ja) 2018-05-24 2023-04-12 シンフォニアテクノロジー株式会社 基板収納容器管理システム、基板収納容器管理方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004517463A (ja) 2000-08-15 2004-06-10 アシスト テクノロジーズ インコーポレイテッド キャリアモニター及び工場レベルでのキャリア管理システムと統合されたスマート装填ポート
KR101732290B1 (ko) 2012-12-10 2017-05-02 도쿄엘렉트론가부시키가이샤 기판 처리 장치, 기판 처리 시스템 및 반송 용기의 이상 검출 방법

Also Published As

Publication number Publication date
JP7256358B2 (ja) 2023-04-12
JP2019208007A (ja) 2019-12-05
JP7295384B2 (ja) 2023-06-21
TW202003353A (zh) 2020-01-16
JP2019208001A (ja) 2019-12-05
TWI821293B (zh) 2023-11-11
KR20190134523A (ko) 2019-12-04

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